Electrical contact
Latest EBARA CORPORATION Patents:
- Damper control system and damper control method
- Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane
- Polishing apparatus having surface-property measuring device of polishing pad and polishing system
- POLISHING APPARATUS
- Optical film-thickness measuring apparatus and polishing apparatus
Description
1. Electrical contact
The left view is omitted because it is a mirror image of the right view.
Claims
The ornamental design for an electrical contact, as shown and described.
Referenced Cited
U.S. Patent Documents
D555595 | November 20, 2007 | Yahagi |
D556692 | December 4, 2007 | Yahagi |
D651178 | December 27, 2011 | Fujikata |
D669439 | October 23, 2012 | Fujikata |
D706224 | June 3, 2014 | Kimura |
D717736 | November 18, 2014 | Kimura |
D719101 | December 9, 2014 | Kimura |
D725600 | March 31, 2015 | Fujikata |
D742329 | November 3, 2015 | Fujikata |
D758973 | June 14, 2016 | Fujikata |
D776621 | January 17, 2017 | Miyamoto |
D825629 | August 14, 2018 | Miyamoto |
D845907 | April 16, 2019 | Suzuki |
Patent History
Patent number: D884650
Type: Grant
Filed: Apr 6, 2018
Date of Patent: May 19, 2020
Assignee: EBARA CORPORATION (Tokyo)
Inventors: Kiyoshi Suzuki (Tokyo), Jumpei Fujikata (Tokyo)
Primary Examiner: Nathaniel D. Buckner
Application Number: 35/505,847
Type: Grant
Filed: Apr 6, 2018
Date of Patent: May 19, 2020
Assignee: EBARA CORPORATION (Tokyo)
Inventors: Kiyoshi Suzuki (Tokyo), Jumpei Fujikata (Tokyo)
Primary Examiner: Nathaniel D. Buckner
Application Number: 35/505,847
Classifications