Abstract: A semiconductor package includes a partitioned package substrate that is composed of multiple discrete substrates arranged in a side-by-side manner. The discrete substrates include a central substrate and peripheral substrates surrounding the central substrate. At least one integrated circuit die is mounted on a first surface of the partitioned package substrate. A plurality of solder balls is mounted on a second surface of the partitioned package substrate opposite to the first surface.

Abstract: An adhesion layer may be formed over portions of a redistribution layer (RDL) in a redistribution structure of a semiconductor device package. The portions of the RDL over which the adhesion layer is formed may be located in the “shadow” of (e.g., the areas under and/or over and within the perimeter of) one or more TIVs that are connected with the redistribution layer structure. The adhesion layer, along with a seed layer on which the portions of the RDL are formed, encapsulate the portions of the RDL in the shadow of the one or more TIVs, which promotes and/or increases adhesion between the portions of the RDL and the polymer layers of the redistribution structure.

Abstract: Semiconductor devices of the type currently referred to as a System in a Package (SiP) and having embedded therein a transformer are produced by embedding at least one semiconductor chip in an insulating encapsulation at a first portion thereof. Over a second portion thereof at least partly non-overlapping with the first portion, a stacked structure is formed including multiple layers of electrically insulating material as well as respective patterns of electrically conductive material. The respective patterns of electrically conductive material have: a planar coil geometry for providing electrically conductive coils such as the windings of a transformer and a geometrical distribution providing electrically conductive connections to one or more semiconductor chips.

Abstract: A circuit board arrangement includes a circuit board having an upper side and an underside, and an electrical module having an upper side and an underside. The upper side of the electrical module is arranged on the underside of the circuit board. The electrical module includes a solder pad that is in electrical contact via a solder layer with an associated solder pad of the circuit board. The electrical module includes a metallization layer located at a distance from the upper side, an electrical component that is arranged on the metallization layer and is electrically connected thereto, and at least one via extending from the solder pad on the upper side of the electrical module up to the metallization layer. A solder resist is partially arranged on the solder pad such that the at least one via, applied to the solder pad, is shielded from the solder.

Abstract: According to an aspect of the present disclosure, there is provided a pre-mold substrate including an electroconductive base member, which includes a first pre-mold groove formed in a bottom surface and a second pre-mold groove formed in a top surface and constitutes a circuit pattern; a first pre-mold resin disposed in the first pre-mold groove; and a second pre-mold resin disposed in the second pre-mold groove.

Abstract: A structure for a capacitor is provided. The structure includes a first metal electrode, such as a copper electrode, having at least one dielectric region, such as a dielectric, therein. A first dielectric layer is on the first metal electrode, and a second metal electrode is on the first dielectric layer. At least one via is on the second metal electrode. Each via is over the at least one dielectric region in the first metal electrode.

Abstract: A semiconductor device and a method of manufacturing the semiconductor device are disclosed. In one aspect, at least one active deep trench capacitor (DTC), the at least one active DTC including a plurality of conductive layers and an insulating layer disposed between adjacent conductive layers of the plurality of conductive layers. The semiconductor device includes a plurality of dummy DTCs disposed on opposing sides of the at least one active DTC, the plurality of dummy DTCs and the at least one active DTC arranged in a row. The semiconductor device includes a plurality of conductive structures connected to the plurality of conductive layers of the active DTC, the plurality of dummy DTCs insulated from the at least one active DTC.

Abstract: Disclosed herein is an apparatus that includes a plurality of signal wiring patterns, a plurality of shield patterns each provided between corresponding two of the signal wiring patterns, a common pattern coupled to each of the plurality of shield patterns, and a transistor coupled between the common pattern and a power line supplied with a fixed power potential.

Abstract: A microelectronic structure comprises a first interconnect line at a first interconnect level, a second interconnect line at a second interconnect level, and at least one via connecting the first interconnect line at the first interconnect level to the second interconnect line at the second interconnect level. The at least one via comprises a vertical section and at least one horizontal section, the at least one horizontal section being in contact with at least a portion of one of a top surface of the first interconnect line and a bottom surface of the second interconnect line.

Abstract: A method is described including creating a partial through substrate via (TSV) plug in a front side of a wafer, the partial TSV plug having a front side and a back side, the back side of the partial TSV extending through the front side of the substrate. A cavity is etched in a back side of the wafer that exposes the back side of the partial TSV plug. An insulator is applied to the etched back side of the wafer. A back side of the partial TSV plug is exposed by removing one or more of a portion of the insulator and a liner. A conductive material is deposited to connect the exposed, back side of the partial TSV plug to a surface on the back side of the wafer.

Abstract: A semiconductor device includes a source region and a drain region, a first source contact, a first drain contact, a first drain via and a first source via. The source region and the drain region are located over a substrate. The first source contact is disposed on the source region, and the first drain contact is disposed on the drain region. The first drain via is connected to the first drain contact, wherein the first drain via includes a barrier-less body portion. The first source via is connected to the first source contact, wherein the first source via includes a body portion and a barrier layer surrounding the body portion, and a size of the first source via is greater than a size of the first drain via.

Abstract: A semiconductor device includes a substrate; a conductive layer; and a contact plug connected to the conductive layer. The contact plug includes a first portion; and a second portion, sequentially stacked, wherein a width of an upper surface of the first portion is wider than a width of a lower surface of the second portion. The contact plug includes a barrier layer; a first conductive layer on the barrier layer; and a second conductive layer on the first conductive layer. The second conductive layer comprises voids. The barrier layer, the first conductive layer, and the second conductive layer extend continuously in the first and second portions. The barrier layer has a first thickness, the second conductive layer has a second thickness, equal to or greater than the first thickness, and the first conductive layer has a third thickness, equal to or greater than the second thickness.

Abstract: A semiconductor device includes a substrate including a memory cell region and a connection region. A memory stack includes a plurality of word lines extending in the memory cell region and the connection region in a horizontal direction that is parallel with an upper surface of the substrate. The plurality of word lines overlaps with each other in a vertical direction. A support is in the connection region and positioned at a side of the memory stack. The support includes a plurality of steps. A plurality of pad parts is on a top surface of the support. A plurality of contact plugs passes through at least some of the plurality of word lines in the vertical direction. The plurality of contact plugs directly contacts the plurality of pad parts for electrical connection therewith.

Abstract: Integrated circuit (IC) structures, computing devices, and related methods are disclosed. An IC structure includes an interlayer dielectric (ILD), an interconnect, and a liner material separating the interconnect from the ILD. The interconnect includes a first end extending to or into the ILD and a second end opposite the first end. A second portion of the interconnect extending from the second end to a first portion of the interconnect proximate to the first end does not include the liner material thereon. A method of manufacturing an IC structure includes removing an ILD from between interconnects, applying a conformal hermetic liner, applying a carbon hard mask (CHM) between the interconnects, removing a portion of the CHM, removing the conformal hermetic liner to a remaining CHM, and removing the exposed portion of the liner material to the remaining CHM to expose the second portion of the interconnects.

Abstract: A semiconductor device includes a first wiring extending in a first direction and a second wiring extending in a second direction crossing the first direction and having an end that faces the first wiring and is a predetermined distance away from the first wiring. The predetermined distance is approximately equal to a width of the second wiring, and the end of the second wiring is formed into one or more loops.

Abstract: In a method for fabricating a semiconductor device, an initial stack of sacrificial word line layers and insulating layers is formed over a substrate of the semiconductor device. The sacrificial word line layers and the insulating layers are disposed over the substrate alternately. A first staircase is formed in a first staircase region of a connection region of the initial stack. A second staircase is formed in a second staircase region of the connection region of the initial stack. The connection region of the initial stack includes a separation region between the first and second staircases, and the connection region is positioned between array regions of the initial stack at opposing sides of the initial stack.

Abstract: Provided are a wiring material for a semiconductor device, the wiring material including a boride-based compound containing boron and at least one metal selected from elements of Groups 2 to 14, a wiring for a semiconductor device including the same, and a semiconductor device including the wiring containing the wiring material.

Abstract: An interconnection structure is provided to include an interlayer dielectric (ILD) layer that is disposed over a substrate, a metal via that is disposed in the ILD layer, and a metal wire that is disposed over the metal via in the ILD layer and that is electrically connected to the metal via. The ILD layer includes silicon carbon nitride.

Abstract: A semiconductor device includes a substrate and an interconnect layer disposed over the substrate. The interconnect layer includes a dielectric layer, an interconnect structure disposed in the dielectric layer, and an etch stop layer which is disposed on a lower end surface of the interconnect structure and which includes silicon carbonitride represented by a general formula of SixCyNz, wherein x is a silicon content ranging from 30 atomic % to 60 atomic %, y is a carbon content ranging from 25 atomic % to 60 atomic %, z is a nitrogen content ranging from 10 atomic % to 20 atomic %, and a sum of x, y, and z is 100 atomic %.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers, a composite insulating cap layer located over the alternating stack, memory openings vertically extending through the composite insulating cap layer and the alternating stack, and memory opening fill structures located in the memory openings. Each of the memory opening fill structures includes a vertical semiconductor channel and a vertical stack of memory elements. The composite insulating layer includes a bottom insulating cap layer, a top insulating cap layer, and an etch-stop dielectric layer located between the bottom insulating cap layer and the top insulating cap layer.

Abstract: A structure includes a base layer and conductive element in a dielectric region. The base layer includes a first material and is perpendicular to a direction. The conductive element includes a conductive material and contacts the base layer and the dielectric region. An interface parallel to the direction is formed between the conductive element and the dielectric region. A deposition rate of the conductive material over a surface of the base layer is higher than that over a surface of the dielectric region.

Abstract: A method includes forming a reconstructed wafer, which includes forming a redistribution structure over a carrier, bonding a first plurality of memory dies over the redistribution structure, bonding a plurality of bridge dies over the redistribution structure, and bonding a plurality of logic dies over the first plurality of memory dies and the plurality of bridge dies. Each of the plurality of bridge dies interconnects, and is overlapped by corner regions of, four of the plurality of logic dies. A second plurality of memory dies are bonded over the plurality of logic dies. The plurality of logic dies form a first array, and the second plurality of memory dies form a second array.

Abstract: An electronic package is provided, in which a circuit board and a circuit block are embedded in an encapsulating layer at a distance to each other, and circuit structures are formed on the two opposite surfaces of the encapsulating layer with electronic components arranged on one of the circuit structures. The circuit block and the circuit board embedded in the encapsulating layer are spaced apart from each other to allow to separate current conduction paths. As such, the circuit board will not overheat, and issues associated with warpage of the circuit board can be eliminated. Moreover, by embedding the circuit block and the circuit board in the encapsulating layer at a distance to each other, the structural strength of the encapsulating layer can be improved.

Abstract: A multi-chip package includes a substrate (110) having a first side (111), an opposing second side (112), and a third side (213) that extends from the first side to the second side, a first die (120) attached to the first side of the substrate and a second die (130) attached to the first side of the substrate, and a bridge (140) adjacent to the third side of the substrate and attached to the first die and to the second die. No portion of the substrate is underneath the bridge. The bridge creates a connection between the first die and the second die. Alternatively, the bridge may be disposed in a cavity (615, 915) in the substrate or between the substrate and a die layer (750). The bridge may constitute an active die and may be attached to the substrate using wirebonds (241, 841, 1141, 1541).

Abstract: A package comprising a substrate comprising at least one dielectric layer and a plurality of interconnects; a first integrated device coupled to the substrate through a first plurality of solder interconnects, wherein the first plurality of solder interconnects includes a first plurality of inner solder interconnects and a first plurality of perimeter solder interconnects; and a second integrated device coupled to the substrate through a second plurality of solder interconnects. The first integrated device is configured to be electrically coupled to the second integrated device through an electrical path. The electrical path comprises an inner solder interconnect from the first plurality of inner solder interconnects, at least one interconnect from the plurality of interconnects, and a solder interconnect from the second plurality of solder interconnects.

Abstract: A microelectronic device comprises a first microelectronic device structure and a second microelectronic device structure attached to the first microelectronic device structure. The first microelectronic device structure comprises memory arrays comprising memory cells comprising access devices and storage node devices, digit lines coupled to the access devices and extending in a first direction to a digit line exit region, and word lines coupled to the access devices and extending in a second direction to a word line exit region. The second microelectronic device structure comprises control logic devices over and in electrical communication with the memory cells.

Abstract: A package includes a die and a redistribution structure. The die has an active surface and is wrapped around by an encapsulant. The redistribution structure disposed on the active surface of the die and located above the encapsulant, wherein the redistribution structure comprises a conductive via connected with the die, a routing pattern located above and connected with the conductive via, and a seal ring structure, the seal ring structure includes a first seal ring element and a second seal ring element located above and connected with the first seal ring element, wherein the second seal ring element includes a seed layer sandwiched between the first seal ring element and the second seal ring element, and a top surface of the first seal ring element is substantially coplanar with a top surface of the conductive via.

Abstract: A semiconductor device may include a plurality of chip regions on a substrate, at least one scribe lane surrounding each of the plurality of chip regions on the substrate, a plurality of first align key patterns and a plurality of first test element group patterns included in the plurality of chip regions, and a plurality of second align key patterns and a plurality of second test element group patterns included in the at least one scribe lane.

Abstract: Provided are an array substrate, a preparation method thereof, a display panel, and a display device. The array substrate includes a substrate, an alignment mark, a mark covering layer, and a light-shielding layer. The alignment mark is disposed on a side of the substrate. The mark covering layer is disposed on a side of the alignment mark facing away from the substrate. The mark covering layer at least partially overlaps the alignment mark. The transmittance of the light-shielding layer is less than the transmittance of the mark covering layer. The light-shielding layer is in contact with the mark covering layer and exposes at least a portion of the mark covering layer.

Abstract: A semiconductor device package and a method of manufacturing a semiconductor device package are provided. The semiconductor device package includes a carrier, a protective element, and a sensor device. The protective element encapsulates the carrier. The sensor device is embedded in the carrier and the protective element. The sensor device includes a sensing portion and a protective portion adjacent to the sensing portion, and the protective portion of the sensor device has a first surface exposed from the protective element and the carrier.

Abstract: The present disclosure provides an electronic device. The electronic device includes a first interposer, a first interconnection array, a first shielding wall, and a second interconnection array. The first interconnection array is disposed in the first interposer and electrically connected to ground. The first shielding wall continuously extends at a side of the first interconnection array. The second interconnection array is disposed between the first shielding wall and the first interconnection array. The second interconnection array is configured to transmit a signal.

Abstract: The present disclosure provides an electronic device. The electronic device includes a first electronic component, a first conductive element, and a voltage regulator. The voltage regulator is disposed adjacent to the first electronic component. The voltage regulator is configured to regulate a first voltage from the first EMI shielding layer and to provide the first electronic component with a second voltage.

Abstract: A device for shielding at least one component from thermal radiation, the device comprising at least a first substrate with a first surface and a second surface and a second substrate with a first surface and second surface, the first surface of the second substrate being arranged to at least partially face the second surface of the first substrate. The device additionally comprises at least a first component arranged on the first surface of the second substrate or the second surface of the first substrate and a shielding arrangement comprising a plurality of shielding elements-comprising electrically conductive material, the shielding elements being configured to essentially surround at least the first component to provide a shielded area within which the first component is located, wherein electromagnetic radiation having wavelength longer than a selected first wavelength is essentially prevented from reaching the shielded area.

Abstract: The memory device includes a substrate, a first ball grid array, a first integrated circuit chip, and a first electrostatic discharge protection element. The first ball grid array is disposed on the substrate. The first integrated circuit chip is disposed on the first ball grid array. The first electrostatic discharge protection element is coupled between the second input/output pad of the first integrated circuit chip and the first internal circuit. The first electrostatic discharge protection element is configured to form a first electrostatic discharge path from the second input/output pad to a first voltage supply line. The first electrostatic discharge protection element includes multiple electrostatic discharge units, and at least one of the electrostatic discharge units is free of coupling between the second input/output pad, the first voltage supply line, and the first internal circuit.

Abstract: A laser grooving operation is performed to form a plurality of grooves in a semiconductor die prior to attaching the semiconductor die to a semiconductor device package substrate. In addition to forming a first groove through which blade sawing is to be performed to separate the semiconductor die from other semiconductor dies, a second groove may be formed between the first groove and a seal ring of the semiconductor die. The second groove is configured to contain any potential delamination that might otherwise propagate to an active region of the semiconductor die. Accordingly, the second groove and the associated laser grooving operation described herein may reduce the likelihood of delamination that might otherwise be caused by swelling and/or expansion in a molding compound formed around the semiconductor die after the semiconductor die is attached to the semiconductor device package substrate.

Abstract: A method of manufacturing a semiconductor device is provided. The method includes placing a package substrate on a carrier substrate, forming a frame on the package substrate, and affixing an active side of a semiconductor die on the package substrate. The semiconductor die together with the frame and the package substrate form a cavity between the semiconductor die and the package substrate. At least a portion of the semiconductor die and the package substrate are encapsulated with an encapsulant. The frame is configured to prevent the encapsulant from entering the cavity.

Abstract: A semiconductor structure including a substrate and protection structures is provided. The substrate includes a die region. The die region includes corner regions. The protection structures are located in the corner region. Each of the protection structures has a square top-view pattern. The square top-view patterns located in the same corner region have various sizes.

Abstract: An electronic package is provided and includes an electronic structure and a plurality of conductive pillars embedded in a cladding layer, a circuit structure formed on the cladding layer, and a reinforcing member bonded to a side surface of the cladding layer, where a plurality of electronic elements are disposed on and electrically connected to the circuit structure, such that the electronic structure electrically bridges any two of the electronic elements via the circuit structure, so as to enhance the structural strength of the electronic package and avoid warpage by means of the design of the reinforcing member.

Abstract: A semiconductor device includes a first and second semiconductor chip having a respective first surface and a second surface opposite to each other. The semiconductor device can include a second semiconductor chip having a third surface and a fourth surface opposite to each other. The third surface of the second semiconductor chip can face the second surface of the first semiconductor chip. A first portion of a dielectric filling material can be in contact with a first sidewall of the first semiconductor chip. A second portion of a dielectric filling material can be in contact with a second sidewall of the second semiconductor chip. The first and second portions of the dielectric filling material can have a width that decreases in a corresponding increasing depth toward the first surface of the first semiconductor chip.

Abstract: Embodiments disclosed herein include electronic packages and methods of fabricating electronic packages. In an embodiment, an electronic package comprises an interposer, where a cavity passes through the interposer, and a nested component in the cavity. In an embodiment, the electronic package further comprises a die coupled to the interposer by a first interconnect and coupled to the nested component by a second interconnect. In an embodiment, the first and second interconnects comprise a first bump, a bump pad over the first bump, and a second bump over the bump pad.

Abstract: A device includes a molding compound, a plurality of through vias, a seal ring structure, and a protection layer. The plurality of through vias are embedded in the molding compound. The seal ring structure is over the molding compound and surrounds the through vias in a top view. The protection layer covers the seal ring and extends toward the molding compound in a cross-sectional view.

Abstract: Chip sealing structures and methods of manufacture are described. In an embodiment, a chip structure includes a main body area formed of a substrate, a back-end-of-the-line (BEOL) build-up structure spanning over the substrate, and chip edge sidewalls extending from a back surface of the substrate to a top surface of the BEOL build-up structure and laterally surrounding the substrate and the BEOL build-up structure. In accordance with embodiments, the chip structure may further include a conformal sealing layer covering at least a first chip edge sidewall of the chip edge sidewalls and a portion of the top surface of the BEOL build-up structure, and forming a lip around the top surface of the BEOL build-up structure.

Abstract: A semiconductor device includes an electronic device, a guard trace and a first trace. The guard trace is connecting to a ground layer through a first ground via. The first trace is disposed adjacent to the electronic device and the guard trace and includes a first segment. A phase or a direction of a first current signal conducted on the first trace is changed in the first segment. The electronic device and the first trace are disposed at different sides of the guard trace and the first ground via is beside the first segment.

Abstract: In a described example, an apparatus includes: a semiconductor device mounted to a device side surface of a package substrate, the package substrate having a board side surface opposite the device side surface; an antenna module mounted to the package substrate and coupled to the semiconductor device; and mold compound covering the semiconductor device and a portion of the package substrate.

Abstract: A high-frequency module includes a first module substrate including first and second major surfaces, and a second module substrate including third and fourth major surfaces. The first major surface (faces the second major surface. Electronic components are disposed between the second and third major surfaces, on the first major surface, and on the fourth major surface. External connection terminals are disposed on the fourth major surface. A recess is formed in the first major surface. The electronic components include a first electronic component and a second electronic component (shorter in height than the first electronic component. The first electronic component is disposed in the recess, and the second electronic component is disposed in a region outside of the recess on the first major surface.

Abstract: A semiconductor structure including chips is provided. The chips are arranged in a stack. Each of the chips includes a radio frequency (RF) device. Two adjacent chips are bonded to each other. The RF devices in the chips are connected in parallel. Each of the RF devices includes a gate, a source region, and a drain region. The gates in the RF devices connected in parallel have the same shape and the same size. The source regions in the RF devices connected in parallel have the same shape and the same size. The drain regions in the RF devices connected in parallel have the same shape and the same size.

Abstract: A method is described. The method includes creating a partial through-substrate via (TSV) plug in a front side of a wafer, the partial TSV having a front side and a back side. The back side of the partial TSV extending toward a front side of a substrate but not into a bulk of the substrate. A cavity is etched in a back side of the wafer that exposes the partial TSV plug. An insulator is applied to the etched back side of the wafer. A portion of the partial TSV plug is exposed by removing a portion of the insulator. A conductive material is deposited to connect the exposed, partial TSV plug to a surface on the back side of the wafer.

Abstract: One embodiment is a method including forming a partial through-substrate via (TSV) plug in a front side of a wafer, the partial TSV plug having a front side, a back side, and a body with a variable dimension in the body so that a largest dimension is at the back side of partial TSV plug. A cavity is etched in a back side of the wafer that exposes the back side of the partial TSV plug and a portion of a front side interconnect in a common etched cavity. A conductive material is deposited to connect the exposed portion of the front side interconnect to the back side of the wafer and to connect the exposed back side of the partial TSV plug to the back side of the wafer without connecting the partial TSV plug and the portion of the front side interconnect.

Abstract: An apparatus is provided that includes a substrate. In addition, the apparatus includes a first electrically conductive path arranged in a second layer above the substrate and forming a first connection of the apparatus, and a second electrically conductive pad arranged in the second layer and forming a second connection of the apparatus. An electrically conductive element is arranged in a first layer spaced apart from the second layer. The electrically conductive element forms a first capacitor with either the first pad or the second pad. In addition, a first coil is arranged in the first layer, the second layer, or in both layers. A first end of the first coil is connected to the second pad.

Abstract: A display panel, a method of manufacturing the display panel, and a display device are provided. According to the display panel provided by the embodiment of the present application, a bonding structure is arranged between a display substrate and a circuit board to connect the display substrate and the circuit board together, and a width of the bonding structure is set to be 50 microns (?m)-200 ?m, so that when a plurality of display panels are spliced to realize a large-screen display, a width of an interval area between the adjacent display areas of the display panels may be significantly reduced.