Polishes Patents (Class 106/3)
  • Patent number: 5998541
    Abstract: Finishing agents comprise the combination of an alkoxysilane surface active agent, a silanol condensing catalyst, and a nonaqueous liquid or solid medium, or the combination of an alkoxysilane surface active agent, an acid catalyst and a liquid or solid medium. In the latter embodiment, it is preferred that at least one of the alkoxysilane surface active agent and the acid catalyst be microencapsuled. The finishing agent permits formation of chemically adsorbed protecting films. Such protecting films are used for substrates of such equipments as electronics products, electric domestic products, automobiles, industrial equipments, mirrors, lenses for glasses and the like. The protecting films have a durability and heat, weather and abrasion resistance, and also water and oil repellent properties.
    Type: Grant
    Filed: June 11, 1996
    Date of Patent: December 7, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Kazufumi Ogawa
  • Patent number: 5994252
    Abstract: There is a process for producing spherical metal-oxide powder particles. They are used as finely ground raw and filler materials in mineral, ceramic and refractory construction, technical and auxiliary materials, as well as for polishing and grinding agents.
    Type: Grant
    Filed: October 5, 1998
    Date of Patent: November 30, 1999
    Assignee: RW silicium GmbH
    Inventors: Reinhard Feige, Friedhelm Bramsiepe
  • Patent number: 5994246
    Abstract: A feldspathic porcelain composition is provided which comprises a continuous glassy matrix phase and a discontinuous, substantially uniformly dispersed cubic leucite crystalline phase, said composition possessing a fusion temperature of from about 800.degree. to about 1200.degree. C. Methods of making the feldspathic porcelain composition are also provided, said methods comprising the steps of forming an alkali aluminosilicate powder comprising SiO.sub.2, Al.sub.2 O.sub.3, K.sub.2 O and Na.sub.2 O and at least one metal salt of rubidium, cesium, calcium, strontium, barium or thallium; heating the powder to effect an exchange of alkali cations with metal cations derived from said metal salt to provide a feldspathic porcelain composition which comprises a continuous glassy matrix phase and a discontinuous crystalline phase comprising cubic leucite.
    Type: Grant
    Filed: October 30, 1997
    Date of Patent: November 30, 1999
    Assignee: Ohio State University
    Inventor: Isabelle L. Denry
  • Patent number: 5989301
    Abstract: An optical polishing slurry with alumina and ceria components is found to produce an improved polishing performance over either component used alone.
    Type: Grant
    Filed: February 18, 1998
    Date of Patent: November 23, 1999
    Assignee: Saint-Gobain Industrial Ceramics, Inc.
    Inventors: Ronald W. Laconto, Sr., Rami Schlair
  • Patent number: 5980775
    Abstract: A chemical mechanical polishing composition comprising an oxidizing agent at least one catalyst having multiple oxidation states, and at least one stabilizer, the composition being useful when combined with an abrasive or with an abrasive pad to remove metal layers from a substrate.
    Type: Grant
    Filed: April 8, 1997
    Date of Patent: November 9, 1999
    Assignee: Cabot Corporation
    Inventors: Steven K. Grumbine, Christopher C. Streinz, Brian L. Mueller
  • Patent number: 5968238
    Abstract: An improved polishing composition is provided that includes an emulsion of a oil-based components and water-based components and a water soluble polishing agent. The polishing composition of the present invention is rubbed on a painted surface, hosed off with water and wiped or towel dried. Because of the use of a water soluble polishing agent in the polishing composition, all or substantially all of the polishing agent is washed away with the water. This eliminates the need for a two-step polishing process wherein a polishing composition is applied to a surface and allowed to dry in a first step and the surface is buffed with a dry cloth in a second step. One preferred embodiment of the present invention includes silicones, water, a nonionic or anionic surfactant and a water soluble polishing agent. Optionally, the polishing composition may include a solvent, mineral oil, wax, and a preservative.
    Type: Grant
    Filed: February 18, 1998
    Date of Patent: October 19, 1999
    Assignee: Turtle Wax, Inc.
    Inventors: Denis J. Healy, Harvey Kornhaber, Maharaj Talwar
  • Patent number: 5968239
    Abstract: A polishing slurry for use in chemical mechanical polishing is disclosed. The polishing slurry contains a solvent and polishing particles dispersed in this solvent. The polishing particles are selected from silicon nitride, silicon carbide, and graphite. The primary particle size of the polishing particles dispersed in the solvent is appropriately 0.01 to 1000 nm. When the polishing particles are colloidally dispersed in the solvent, the secondary particle size of the polishing particles is appropriately 60 to 300 nm.
    Type: Grant
    Filed: November 2, 1998
    Date of Patent: October 19, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Naoto Miyashita, Masahiro Abe, Mariko Shimomura
  • Patent number: 5954864
    Abstract: A furniture polish including a conventional active polishing ingredient is provided with a fragrance micro-encapsulated in a plurality of naturally self-adhesive microcapsules of varying wall thicknesses. The microcapsules may be produced by a wide variety of encapsulation methods generally known to various technical arts, including a coacervation, three-phase method.
    Type: Grant
    Filed: January 11, 1999
    Date of Patent: September 21, 1999
    Inventor: Keith A. Roe
  • Patent number: 5944994
    Abstract: A coating material is provided which has fragments of a gel membrane filter in a liquid. The gel membrane filter has a plurality of electronegative particles provided in an ordered crystalline array. The gel membrane filter has been hardened with a polymer and is embodied in refractive fragments which alter the surface appearance of the resultant coating material. The coating material may be employed as a nail polish or as a paint.
    Type: Grant
    Filed: June 4, 1997
    Date of Patent: August 31, 1999
    Assignee: University of Pittsburgh of the Commonwealth System of Higher Education
    Inventors: Sanford A. Asher, Jay Henis
  • Patent number: 5935278
    Abstract: An abrasive composition for polishing a substrate for a magnetic recording disc is described, which comprises finely divided zirconium oxide particles, an abrasion promoter, an optional water-soluble oxidizing agent, and water. This abrasive composition is used for polishing a substrate for a magnetic recording disc by a process wherein the substrate is polished with a pad while the abrasive composition is supplied between the substrate and the pad, and at least one of the pad and the substrate is rotated. The contents of the finely divided zirconium oxide particles, the abrasion promoter and the optional water-soluble oxidizing agent are 2-20 wt. %, 1-20 wt. % and up to 10 wt. %, respectively, based on the weight of the abrasive composition as used for polishing the substrate.
    Type: Grant
    Filed: July 9, 1997
    Date of Patent: August 10, 1999
    Assignee: Showa Denko Kabushiki Kaisha
    Inventors: Ken Ishitobi, Takanori Kido, Hiromu Sakamoto
  • Patent number: 5934978
    Abstract: A method of making a chemical-mechanical polishing slurry includes mixing a ferric salt oxidizer with a solution to produce a mixture with a dissolved ferric salt oxidizer, filtering the mixture to remove most preexisting particles therein that exceed a selected particle size, adding a suspension agent to the mixture, and adding abrasive particles to the mixture after filtering the mixture. Advantageously, when polishing occurs, scratching by the preexisting particles is dramatically reduced.
    Type: Grant
    Filed: August 15, 1997
    Date of Patent: August 10, 1999
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Peter A. Burke, Peter J. Beckage
  • Patent number: 5932328
    Abstract: A furniture surface having a coating consisting of a bottom layer comprising a silicone oil adjacent to the furniture surface and a top layer comprising an oil having a specific gravity less than the silicone oil in the bottom layer and a water repelling film-forming fluorinated polymer. The coating may consist of a bottom layer comprising a silicone oil adjacent to the furniture surface, an intermediate layer comprising a water repelling film-forming fluorinated polymer, and a top layer comprising an oil having a specific gravity less than the silicone oil in the bottom layer. The coating may also consist of a bottom layer comprising a silicone oil adjacent to the furniture surface, an intermediate layer comprising an oil having a specific gravity less than the silicone oil in the bottom layer, and a top layer comprising a water repelling film-forming fluorinated polymer.
    Type: Grant
    Filed: April 1, 1996
    Date of Patent: August 3, 1999
    Assignee: Sara Lee Corporation
    Inventors: Peter A. Burke, Kenneth J. Flanagan, Abul Mansur
  • Patent number: 5925607
    Abstract: A furniture cleaning and polishing composition that provides protection against water. The composition contains an admixture of A) about 0.01 to 4% by weight of a water repelling halofluoro polymer; B) up to 15% mineral oil; C) about 3 to 25% hydrocarbon solvent; D) about 0.1 to 5% silicone oil; about 0.01 to 5% surfactant, and the remainder water.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: July 20, 1999
    Assignee: Sara Lee Corporation
    Inventor: Kenneth J. Flanagan
  • Patent number: 5916855
    Abstract: A polishing slurry composition and its method of making for planarization of silicon semiconductor wafers by chemical mechanical polishing of the wafer. A slurry formulation utilizing a ferric salt tungsten oxidizer, an ammonium persulfate titanium oxidizer, a fatty acid suspension agent, alumina particles with a small diameter and tight diameter range, coated with a solubility coating, and a chemical stabilizer, provides high tungsten and titanium polish rates with high selectivity to silicon dioxide, and good oxide defectivity for use in tungsten local interconnect applications. A method for making a tungsten slurry includes first thoroughly blending small diameter alumina particles with a tight diameter range in an aqueous concentrate with a suspension agent, then mixing with water and oxidizers. Ferric salt tungsten slurries made by this method provide excellent tungsten polish characteristics for via plug and local interconnect applications.
    Type: Grant
    Filed: March 26, 1997
    Date of Patent: June 29, 1999
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Steven C. Avanzino, Christy Mei-Chu Woo, Diana Marie Schonauer, Peter Austin Burke
  • Patent number: 5913969
    Abstract: A protective composition for automotive painted surfaces is provided, comprising emulsified silicone, an evaporation modifier and an agent which increases wetting speed, dispersed in water.
    Type: Grant
    Filed: November 13, 1996
    Date of Patent: June 22, 1999
    Assignee: Armor All Products Corp.
    Inventor: Michael W. Howe
  • Patent number: 5897675
    Abstract: A finely-divided cerium metal/metalloid oxide mixture, containing pyrogenically produced metal/metalloid oxide and 0.001 to 95 wt. % cerium oxide, has a specific surface area between 10 and 400 m.sup.2 /g. The mixture is produced by mixing pyrogenically produced metal/metalloid oxide, having a specific surface area between 30 and 400 m.sup.2 /g, with a cerium compound decomposable to an oxide at elevated temperature, the cerium compound being thermally decomposed to the oxide. The cerium oxide-metal/metalloid oxide mixture can be used as a polishing agent or filler.
    Type: Grant
    Filed: April 25, 1997
    Date of Patent: April 27, 1999
    Assignee: Degussa Aktiengesellschaft
    Inventors: Helmut Mangold, Werner Hartmann, Richard Akam
  • Patent number: 5897375
    Abstract: A method for chemical mechanical polishing (CMP) a copper layer (22) begins by forming the copper layer (22). The copper layer (22) is then exposed to a slurry (24). The slurry (24) contains an oxidizing agent such as H.sub.2 O.sub.2, a carboxylate salt such as ammonium citrate, an abrasive slurry such as alumna abrasive, an optional triazole or triazole derivative, and a remaining balance of a solvent such as deionized water. The use of the slurry (24) polishes the copper layer (22) with a high rate of removal whereby pitting and corrosion of the copper layer (22) is reduced and good copper interconnect planarity is achieved. This slurry (24) has good selectivity of copper to oxide, and results in copper devices which have good electrical performance. In addition, disposal of the slurry (24) is not environmentally difficult since the slurry (24) is environmentally sound when compared to other prior art slurries.
    Type: Grant
    Filed: October 20, 1997
    Date of Patent: April 27, 1999
    Assignee: Motorola, Inc.
    Inventors: David Watts, Rajeev Bajaj, Sanjit Das, Janos Farkas, Chelsea Dang, Melissa Freeman, Jaime A. Saravia, Jason Gomez, Lance B. Cook
  • Patent number: 5891205
    Abstract: A chemical mechanical polishing composition for polishing an oxide layer of a semiconductor device, the composition comprising an alkaline aqueous dispersion containing generally uniformly-shaped nanocrystalline particles of cerium oxide derived from a physical vapor synthesis process, generally uniformly-shaped particles of silicon dioxide, and wherein the cerium oxide particles are substantially the same or smaller in size and size distribution to the silicon dioxide particles. The ratio of the weight of the silicon dioxide in the composition to the weight of the cerium oxide in the composition is in the range from about 7.5:1 to about 1:1.
    Type: Grant
    Filed: August 14, 1997
    Date of Patent: April 6, 1999
    Assignee: EKC Technology, Inc.
    Inventors: S. Charles Picardi, Mitch Mircea Tanase
  • Patent number: 5885334
    Abstract: The present invention provides a polishing fluid composition which can effectively polish a surface of a semiconductor silicon wafer or a surface of a film comprising silicon to be formed on silicon wafers with a markedly reduced amount of colloidal silica to be used as abrasives, or a polishing fluid composition which is particularly useful for a polishing step after removal of an oxide layer in a two-step polishing method. The former polishing fluid composition comprises an alkaline suspension which contains a water-soluble silicic acid component, colloidal silica and an alkaline component, and which has a pH value of 8.5 to 13. Meanwhile, the latter polishing fluid composition comprises an alkaline solution which contains a water-soluble silicic acid component and an alkaline component, and which has a pH value of 8.5 to 13; and is substantially free of abrasive particles.
    Type: Grant
    Filed: May 15, 1997
    Date of Patent: March 23, 1999
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Tetsuo Suzuki, Yoshihiro Hara
  • Patent number: 5882387
    Abstract: The present invention relates to a wipe-on polish composition which contains no wax or abrasive components. The polish requires minimal effort to wipe out to a thin, glossy, streak-free, hydrophobic film. The polish is comprised of an emulsion that contains an organopolysiloxane and a volatile diluent.
    Type: Grant
    Filed: August 6, 1997
    Date of Patent: March 16, 1999
    Assignee: Wacker Silicones Corporation
    Inventors: Eugene R. Martin, Michael D. Lowery
  • Patent number: 5882636
    Abstract: A phthalate-free long-lasting nail polish enamel composition consisting essentially of a film-forming agent, solvents, one or more colorants, one or more suspending agents, adhesion promoters and plasticizers selected from the group consisting essentially of the adipates, pentaerythrityl tetrabenzoate, 2,2,4-trimethyl-1,3-pentanediol diisobutyrate, pentaerythrityl tetraacetate and mixtures thereof. Preferably, the nail composition is free of any toluene-containing components as well.
    Type: Grant
    Filed: July 21, 1997
    Date of Patent: March 16, 1999
    Assignee: Tevco, Inc.
    Inventors: Ronnie F. Mui, Thomas R. Candia, James F. Joyce, Eric P. Wimmer
  • Patent number: 5876490
    Abstract: A slurry containing abrasive particles and exhibiting normal stress effects. The slurry further contains non-polishing particles resulting in reduced polishing rate at recesses, while the abrasive particles maintain high polish rates at elevations. This leads to improved planarization.
    Type: Grant
    Filed: January 24, 1997
    Date of Patent: March 2, 1999
    Assignee: International Business Machines Corporatin
    Inventor: Maria Ronay
  • Patent number: 5869569
    Abstract: An emulsion polymer composition having fast drying properties that provides floor polish coating materials having superior resistance to black heel marks, resistance to scuffing, resistance to abrasion, adhesion, and resistance to cleaning agents characteristics, is obtained from a film forming emulsion polymer composition comprising from greater than 60 wt % to 95 wt % of a first emulsion copolymer having a glass transition temperature within the range of from 10.degree.-100.degree. C., and from 5 wt % to less than 40 wt % of a second emulsion copolymer having a glass transition temperature that is lower than that of the first emulsion copolymer and is within the range of from 0.degree.-50.degree. C.
    Type: Grant
    Filed: March 24, 1997
    Date of Patent: February 9, 1999
    Assignee: Rohm and Haas Company
    Inventors: Zenichi Arai, Tomohiro Shinoda, Kunihide Takarabe
  • Patent number: 5866532
    Abstract: A cleaning and protectant composition for automotive painted surfaces is provided. The composition includes a low-foaming nonionic surfactant, a silicone antifoam emulsion, and a volatile silicone fluid. A method of cleaning and protecting an automotive surface includes applying the composition to the surface.
    Type: Grant
    Filed: August 29, 1997
    Date of Patent: February 2, 1999
    Assignee: Amway Corporation
    Inventors: Ronald C. Jackson, Robert D. Faber
  • Patent number: 5861055
    Abstract: A polishing composition is shown which includes (1) a polishing media particle; (2) a film forming binder for suspending the particle and forming a temporary film on an exposed surface of the workpiece, the temporary film being dissolvable in a subsequently applied polishing wash, whereby the polishing media particle is freed to polish the workpiece; (3) a solvent for suspending the polishing media particle in the film forming binder to facilitate forming the temporary film; and (4) a wetting agent to improve the wettability of the composition on the exposed surface of the workpiece.
    Type: Grant
    Filed: March 20, 1997
    Date of Patent: January 19, 1999
    Assignee: LSI Logic Corporation
    Inventors: Derryl D. J. Allman, William J. Crosby, James A. Maiolo
  • Patent number: 5861054
    Abstract: A polishing slurry for use in chemical mechanical polishing is disclosed. The polishing slurry contains a solvent and polishing particles dispersed in this solvent. The polishing particles are selected from silicon nitride, silicon carbide, and graphite. The primary particle size of the polishing particles dispersed in the solvent is appropriately 0.01 to 1000 nm. When the polishing particles are colloidally dispersed in the solvent, the secondary particle size of the polishing particles is appropriately 60 to 300 nm.
    Type: Grant
    Filed: November 12, 1996
    Date of Patent: January 19, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Naoto Miyashita, Masahiro Abe, Mariko Shimomura
  • Patent number: 5855633
    Abstract: Improved lapping slurries provide for easier and more thorough cleaning of alumina workpieces, as well as inhibit corrosion of the lapping table and provide for easier cleaning of the lapping equipment. The unthickened lapping slurry comprises abrasive grains such as diamond abrasive dispersed in a carrier comprising water, glycerine, and triethanolamine. The thickened lapping slurry comprises abrasive grains such as diamond abrasive dispersed in a carrier comprising water, glycerine, triethanolamine, a water soluble silicate, and acid.
    Type: Grant
    Filed: June 6, 1997
    Date of Patent: January 5, 1999
    Assignee: Lockheed Martin Energy Systems, Inc.
    Inventors: Ronald F. Simandl, Victor S. Upchurch, Michael E. Leitten
  • Patent number: 5856254
    Abstract: Spherical metal-oxide powder particles are used as finely ground raw and filler materials in mineral, ceramic and refractory construction, technical and auxiliary materials, as well as for polishing and grinding agents. There is a process for producing the powder particles, and there is a process for treating ceramic and refractory residual materials.
    Type: Grant
    Filed: February 13, 1997
    Date of Patent: January 5, 1999
    Assignee: VAW silizium GmbH
    Inventors: Reinhard Feige, Friedhelm Bramsiepe
  • Patent number: 5849838
    Abstract: Aqueous oil-in-water emulsion scratch cover compositions for covering scratches, blemishes and other damage to finished wooden articles such as furniture, wooden trim and wooden floors with characteristics comparable to volatile organic solvent-based scratch cover compositions are described which are substantially free of added volatile organic solvents and conventional surfactants. These emulsion compositions comprise 2-10% of an animal, vegetable or mineral oil that is a liquid and substantially nonvolatile at 25.degree. C., 0.0001-1% of at least one organic solvent soluble dye that is soluble in the oil and is substantially water insoluble, an effective amount, preferably 0.01-5%, of a polymeric electrostatic emulsifier such as an acrylates/C.sub.10 -C.sub.30 alkyl acrylate cross polymer that takes the place of conventional surfactants with the balance comprising water, and optionally, non-ionic waxes, nonionic nonvolatile silicone fluids, pigments or no more than about 1% of nonionic surfactants.
    Type: Grant
    Filed: April 27, 1995
    Date of Patent: December 15, 1998
    Assignee: S. C. Johnson & Son, Inc.
    Inventor: Ian John Barlow
  • Patent number: 5814113
    Abstract: The invention is directed to an abrasive composition comprising an abrasive component in a liquid base component and methods of making the same. More specifically, the present invention is directed to an abrasive composition comprising water, an alcohol, a surfactant, polymer, and an abrasive and methods of making the same.
    Type: Grant
    Filed: April 8, 1997
    Date of Patent: September 29, 1998
    Assignee: Diamond Scientific, Inc.
    Inventor: Edward J. Neuland
  • Patent number: 5804513
    Abstract: An abrasive composition is provided comprising an oxidizing agent and abrasive particles which have a mean particle size of 2 .mu.m or less, wherein each of the abrasive particles comprises (i) at least one oxide selected from aluminum oxide and silicon oxide and (ii) cerium oxide in an amount of 5% to 40% by weight in terms of cerium based on the oxide (i). A method for polishing and planarizing a metal layer formed on a semiconductor substrate using the abrasive composition is also provided.
    Type: Grant
    Filed: August 29, 1997
    Date of Patent: September 8, 1998
    Assignee: Sumitomo Chemical Company, Ltd.
    Inventors: Yoshiaki Sakatani, Kazumasa Ueda, Yoshiaki Takeuchi
  • Patent number: 5804095
    Abstract: A magnetorheological fluid comprises non-colloidal magnetic particles, an abrasive, water, glycerol, and an alkaline buffer. The abrasive may be CeO.sub.2, the non-colloidal magnetic particles may be carbonyl iron, and the alkaline buffer may be Na.sub.2 CO.sub.3. The fluid is useful for magnetorheological finishing.
    Type: Grant
    Filed: December 12, 1996
    Date of Patent: September 8, 1998
    Assignees: Byelocorp Scientific, Inc., University of Rochester
    Inventors: Stephen David Jacobs, William Kordonski, Igor Victorovich Prokhorov, Donald Golini, Gennadii Rafailovich Gorodkin, Tvasta David Strafford
  • Patent number: 5800577
    Abstract: A polishing composition for chemical mechanical polishing which comprises a carboxylic acid, an oxidizing agent, and water and has pH adjusted to 5 to 9 with an alkali. In chemical mechanical polishing for obtaining a high precision surface, particularly in chemical mechanical polishing for forming a circuit layer in production of semiconductor devices, the polishing composition shows a high polishing rate, has a high selectivity for circuit materials from insulation films, forms few corrosion marks or dishing, has neutral pH, does not contain any metal components which adversely affect properties of semiconductor devices, does not require any special expensive chemical agents, and does not comprise any substances harmful for human health as the main component.
    Type: Grant
    Filed: July 17, 1997
    Date of Patent: September 1, 1998
    Assignee: Showa Denko K.K.
    Inventor: Takanori Kido
  • Patent number: 5782962
    Abstract: A surface protective composition especially for use on automobiles is prepared which contains about 0.1 to 5% of a film forming fluorine containing polymer, 0 to 10% of micronized wax, a hydrocarbon solvent, an organosilicone compound, a surfactant and water.
    Type: Grant
    Filed: October 16, 1996
    Date of Patent: July 21, 1998
    Assignee: Sara Lee Corporation
    Inventors: Peter A. Burke, Kenneth J. Flanagan, Abul Mansur
  • Patent number: 5783489
    Abstract: A chemical mechanical polishing slurry comprising at least two oxidizing agents, an organic acid and an abrasive and a method for using the chemical mechanical polishing slurry to remove titanium, titanium nitride, and an aluminum alloy containing layer from a substrate.
    Type: Grant
    Filed: September 24, 1996
    Date of Patent: July 21, 1998
    Assignee: Cabot Corporation
    Inventors: Vlasta Brusic Kaufman, Shumin Wang
  • Patent number: 5769689
    Abstract: A composition is provided, which is suitable for polishing SiO.sub.2, silicates, and silicon nitride, comprising an aquesous slurry of submicron SiO.sub.2 particles and a soluble inorganic salt or combination of soluble inorganic salts of total solution concentration below the critical coagulation concentration for the slurry, wherein the slurry pH is adjusted to within the range of about 9 to 10 by addition of a soluble amine or mixture of soluble amines. Optionally, the compositions of this invention may also comprise a polyhydric alcohol.
    Type: Grant
    Filed: February 28, 1996
    Date of Patent: June 23, 1998
    Assignee: Rodel, Inc.
    Inventors: David Cossaboon, Jiun-Fang Wang, Lee Melbourne Cook
  • Patent number: 5770640
    Abstract: Finishing agents comprise the combination of an alkoxysilane surface active agent, a silanol condensing catalyst, and a nonaqueous liquid or solid medium, or the combination of an alkoxysilane surface active agent, an acid catalyst and a liquid or solid medium. In the latter embodiment, it is preferred that at least one of the alkoxysilane surface active agent and the acid catalyst be microencapsuled. The finishing agent permits formation of chemically adsorbed protecting films. Such protecting films are used for substrates of such equipments as electronics products, electric domestic products, automobiles, industrial equipment, mirrors, lenses for glasses and the like. The protecting films have a durability and heat, weather and abrasion resistance, and also water and oil repellent properties.
    Type: Grant
    Filed: January 2, 1997
    Date of Patent: June 23, 1998
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Kazufumi Ogawa
  • Patent number: 5766279
    Abstract: A fine particulate polishing agent is based on cerium oxide and silicon oxide; a slurry polishing agent comprises the foregoing fine particulate polishing agent which can be prepared by a method which comprises the steps of mixing, with stirring, cerium oxide fine particles, silica sol and a liquid; drying the mixture; mixing the material with a liquid; and then subjecting the mixture to deagglomeration using a wet pulverizing mill to give a slurry. Preferably, the dried particulate material is subjected to a thermal treatment at a high temperature of 150.degree. to 1200.degree. C., preferably 800.degree. to 900.degree. C., thereby to produce a solid solution of cerium oxide and silicon oxide. The slurry polishing agent can ensure the achievement of surface roughness comparable to or superior to that achieved by the colloidal silica polishing agents and a high polishing rate at least comparable to that achieved by the conventional cerium oxide polishing agents.
    Type: Grant
    Filed: September 25, 1996
    Date of Patent: June 16, 1998
    Assignee: Mitsui Mining and Smelting Co., Ltd.
    Inventors: Naruo Ueda, Norikazu Yamamoto, Kenzo Hanawa, Kazuhiko Kato
  • Patent number: 5767016
    Abstract: In forming a wiring layer on a semiconductor stepped substrate (wafer) 15, the wiring layer is polished by using a slurry 12 which contains polishing particles treated in advance with a surface treatment agent containing at least an amino group. During polishing, a uniformity of polishing of the surface of the wafer 15 is maintained by rotating a wafer carrier rotation shaft 17 and a platen rotation shaft 14 while supplying slurry 12 through a guide tube 11. Consequently, scratches are prevented from being caused on surfaces of a multilayer wiring layer and an interlayer insulation film on a semiconductor device and, in addition, the wiring layer can be stably polished.
    Type: Grant
    Filed: July 7, 1995
    Date of Patent: June 16, 1998
    Assignee: Sony Corporation
    Inventor: Masakazu Muroyama
  • Patent number: 5756398
    Abstract: An aqueous slurry is provided which is useful for the chemical-mechanical polishing of substrates containing titanium comprising: water, submicron abrasive particles, an oxidizing agent, and a combination of complexing agents comprising a phthalate compound and a compound which is a di- or tri-carboxylic acid with at least one hydroxyl group in an alpha position relative to one of the carboxyl groups.
    Type: Grant
    Filed: March 17, 1997
    Date of Patent: May 26, 1998
    Assignee: Rodel, Inc.
    Inventors: Jiun-Fang Wang, Anantha R. Sethuraman, Lee Melbourne Cook
  • Patent number: 5753607
    Abstract: A furniture cleaning and polishing composition that provides protection against water. The composition contains an admixture of A) about 0.01 to 4% by weight of a water repelling fluorinated polymer; B) up to 15% mineral oil; C) about 3 to 25% hydrocarbon solvent; D) about 0.1 to 5% silicone oil; about 0.01 to 5% surfactant, and the remainder water.
    Type: Grant
    Filed: April 1, 1996
    Date of Patent: May 19, 1998
    Assignee: Sara Lee Corporation
    Inventors: Peter A. Burke, Kenneth J. Flanagan, Abul Mansur
  • Patent number: 5749773
    Abstract: A solid buffing compound made up of polishing powder and a bonding agent, wherein the bonding agent to be used is a good amount of water-soluble surface active agent and/or polyalkylene glycol which is an intermediate thereof; the melting point of said bonding agent is 30.degree. C. or more, and said bonding agent is water soluble so that a buff residue adhering on the surface of product, etc. after buffing may be washed out easily by use of water.
    Type: Grant
    Filed: March 18, 1996
    Date of Patent: May 12, 1998
    Inventor: Toshikazu Tabata
  • Patent number: 5746811
    Abstract: A composition and method are described for repairing surface defects in plastic objects, particularly laser-readable discs such as audio compact discs, video laser discs and CD-ROM discs. Using the composition and method, a surface defect in the disc is smoothed over and filled with a waxy material having a refractive index approximating that of the plastic substrate, thereby forming a repair which does not distract the laser and permits continued use of the disc.
    Type: Grant
    Filed: September 23, 1996
    Date of Patent: May 5, 1998
    Inventor: Michael J. Smithlin
  • Patent number: 5733819
    Abstract: A polishing composition comprising silicon nitride fine powder, water and an acid.
    Type: Grant
    Filed: January 27, 1997
    Date of Patent: March 31, 1998
    Assignee: Fujimi Incorporated
    Inventors: Hitoshi Kodama, Satoshi Suzumura, Noritaka Yokomichi, Shirou Miura, Hideki Otake, Atsunori Kawamura, Masatoki Ito
  • Patent number: 5700312
    Abstract: An auto finish-treating composition universally useful on paint, metal, vinyl and other plastic finishes comprises micronized wax dispersed in a water/organic solvent emulsion also containing silicone liquid emulsified in both the organic and aqueous phases.
    Type: Grant
    Filed: March 6, 1997
    Date of Patent: December 23, 1997
    Assignee: Blue Coral, Inc.
    Inventors: Ronald L. Fausnight, David A. Lupyan
  • Patent number: 5700303
    Abstract: This invention is directed to a chrome polish/exhaust pipe de-bluer consisting of 20 lbs aluminum powder and 8 oz walnut shell powder.
    Type: Grant
    Filed: October 31, 1996
    Date of Patent: December 23, 1997
    Inventors: Richard A. Zander, Jeffrey S. McKenzie
  • Patent number: 5700383
    Abstract: Slurries and methods for the chemical mechanical polishing of thin films used in integrated circuit manufacturing are described. A first slurry comprises an oxidant, such as water, a halogen, such as fluorine, an abrasive, such as silica, and a chelating agent, such as citric acid, and has a pH between four and nine. The first slurry is ideal for the chemical mechanical polish of an aluminum film. Another slurry comprises an abrasive, such as silica, and an acid, such as citric acid, and has a pH of approximately three. The second slurry is ideal for the chemical mechanical polish of titanium aluminide and is compatible with the first slurry.
    Type: Grant
    Filed: December 21, 1995
    Date of Patent: December 23, 1997
    Assignee: Intel Corporation
    Inventors: A. Daniel Feller, Kenneth C. Cadien
  • Patent number: 5697993
    Abstract: This invention is directed to a hard water stain remover for glass and glazed surfaces consisting of 20 lbs. pumice powder and 8 oz. walnut shell powder.
    Type: Grant
    Filed: November 1, 1996
    Date of Patent: December 16, 1997
    Inventors: Richard A. Zander, Jeffrey S. McKenzie
  • Patent number: 5693704
    Abstract: A dry, non-oily, non-greasy, rubber or vinyl surface protectant contains a silicone component and an acrylic component in its formulation. When only the silicone component is applied to rubber and vinyl surfaces, the surfaces become glossy but feel oily. When only the acrylic component is applied, they are glossy and feel dry but are tacky and draggy as if a heavy residue was present. When components are blended and applied to rubber and vinyl surfaces, the surfaces have a dry shine with good gloss and feel completely dry. The treated surfaces are also not tacky and give no sensation of heavy residue presence.
    Type: Grant
    Filed: November 3, 1995
    Date of Patent: December 2, 1997
    Assignee: Dow Corning Corporation
    Inventor: Tara Nicole Estes
  • Patent number: 5681377
    Abstract: A wax-free silicone containing furniture polish is prepared using 1) a low viscosity silicone fluid and a silicone gum; or 2) a low visosity silicone fluid and a polydiorganosiloxane; or 3) a low visocity silicone fluid, a silicone gum, and a polydiorganosiloxane together with water and one or more suitable surfactants.
    Type: Grant
    Filed: December 20, 1995
    Date of Patent: October 28, 1997
    Inventors: Robert H. Lohr, Phillip J. Uebe