Abstract: A method for operating a gluing system (10) for gluing blanks for producing and/or packaging cigarettes or other smokable objects, in which the blanks are conveyed along glue valves (11) of the gluing system (10), in which case, in order to control and/or regulate the glue valves (11), a superordinate master controller (13) respectively transmits values of at least one control and/or regulation parameter to individual controllers (15) which are assigned to the glue valves (11), are subordinate to the master controller (13) and are each connected to the superordinate master controller (13) via a suitable data connection, the subordinate controller (15) using said values to control and/or regulate the glue valve (11) assigned to it.

Abstract: A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater. The substrate coating device (10) includes at least a slider driving motor (4), a pump (8), a delivery state quantity measuring section (82), and a control section (5). The slider driving motor (4) scans a slit nozzle (1) over a substrate (100) at an established velocity relative to the substrate (100). The pump (8) controls the supply of the coating liquid to the slit nozzle (1). The delivery state quantity measuring section (82) is configured to measure a state quantity indicative of a delivery state of the coating liquid from the tip of the slit nozzle (1).

Abstract: There is provided a liquid application apparatus capable of performing stable application without providing a new mechanism, by efficiently removing an application liquid increased in viscosity and fixedly adhered to an abutting portion between an application member and a liquid supplying member. A liquid application apparatus includes an application member that applies a liquid supplied to an applied face to a printing medium by rotating an application roller and a liquid holding member that abuts against the applied face to form a liquid holding space for holding the liquid, and the amount of liquid that is held in the liquid holding space and makes contact with the application member in unit time is larger before an applying operation for applying the liquid to the printing medium than in the applying operation.

Abstract: An electron gun evaporation apparatus capable of efficiently using an evaporation source includes an electron beam position controller which determines, as an applicable range, a range within which the distribution of the film thickness growth rate is almost constant in each scanning direction of an electron beam to be applied to an evaporation source in a crucible for the irradiation position of the electron beam, on the basis of information pertaining to the electron beam irradiation position and the film thickness growth rate in the electron beam irradiation position.

Abstract: An apparatus for formation of element(s) of an electrochemical cell using a complete process. The apparatus includes a first work piece configured to a transfer device, a source of material in fluid form, a reaction region operably coupled to the source of material and a second work piece configured within a vicinity of the reaction region. The apparatus also has an energy source configured to the reaction region to subject a portion of the material to energy to substantially evaporate the portion of the material within a time period and cause deposition of a gaseous species derived from the evaporated material onto a surface region of the second work piece to form a thickness of material for a component of the solid state electrochemical device and a vacuum chamber to maintain at least the first and second work pieces, the reaction region, and the material within a vacuum environment.

Abstract: A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including at least one of data on storage temperature for the chemical solution to be loaded and data on pressure applied to the chemical solution to be loaded; and a determining unit which determines whether or not the chemical solution holds expected quality thereof on the bases of the correlation data.

Abstract: A plasma etching apparatus capable of performing processing with excellent in-plane uniformity on an object to be processed having a large diameter is provided.

Abstract: A system and method for measuring the velocity of gas flow between multiple plasma deposition chambers is provided. A passage atmospherically linking two plasma processing chambers conducts a gas flow therebetween due to differential pressures within the respective chambers. The gas flow velocity is measured by a linear or non-linear ultrasonic energy acoustic path between two transducers located exteriorly to the chambers using the difference in transit time in a forward and reverse direction due to the velocity of gas in the passage. The pressure of process gas in one or more chambers is adjustable based on the measured velocity of gas flow in the passage.

Abstract: An apparatus for coating a film on a substrate are presented. According to principle of the invention, firstly, a control device controls a first coating device to spray a coating solution onto the substrate. Then, a sensor monitors viscosity data of the coating solution presented between the first coating device and the substrate during movement of the first coating device and sends the viscosity data to the control device, or the sensor monitors viscosity data of the coating solution coated on the substrate and sends the viscosity data to the control device. Lastly, the control device controls a second coating device to spray a coating solution onto the substrate after the first coating device according to signals about the viscosity data from the control device.

Abstract: Methods and hardware for depositing ultra-smooth silicon-containing films and film stacks are described. In one example, an embodiment of a method for forming a silicon-containing film on a substrate in a plasma-enhanced chemical vapor deposition apparatus is disclosed, the method including supplying a silicon-containing reactant to the plasma-enhanced chemical vapor deposition apparatus; supplying a co-reactant to the plasma-enhanced chemical vapor deposition apparatus; supplying a capacitively-coupled plasma to a process station of the plasma-enhanced chemical vapor deposition apparatus, the plasma including silicon radicals generated from the silicon-containing reactant and co-reactant radicals generated from the co-reactant; and depositing the silicon-containing film on the substrate, the silicon-containing film having a refractive index of between 1.4 and 2.1, the silicon-containing film further having an absolute roughness of less than or equal to 4.5 ? as measured on a silicon substrate.

Abstract: An additive manufacturing powder dispenser has a metering member for dispensing a line of powder to be used in an additive manufacturing process. The metering member has one or more metering voids that extend through the metering member with entrance openings defined in a first face of the metering member and exit openings defined in a second face of the metering member. In use, powder passes into the metering member through the entrance openings, is maintained within the metering member, and passes out of the metering member through the exit openings to dispense a line of powder.

Abstract: A painting material charging device may comprise a cartridge attaching unit, a painting material supplying path, a first switching unit, a painting material supplying unit, a discharging path, a second switching unit, a painting material sensor and a controlling unit. The controlling unit may be configured to be connected to the painting material sensor and the second switching unit. The controlling unit may be configured to cause the second switching unit to fully close the discharging path in a case where the painting material sensor detects the painting material.

Abstract: An vapor deposition control system includes a multi-level control scheme.

Abstract: A dispenser for dispensing a volume of viscous material on a substrate includes a frame, a gantry system coupled to the frame, and a dispenser unit coupled to the gantry system. The dispenser unit includes a housing having a chamber and a piston disposed in the chamber. The piston is configured to move between a pre-dispense position and a dispense position within the chamber. The dispenser unit further includes a dispensing bore configured to receive the piston therein and a nozzle coupled to the housing. A controller is coupled to the piston to control the operation of the piston. The dispenser is constructed such that a volume of viscous material dispensed from the dispensing bore is substantially equal to the volume of the piston entering the dispensing bore when moving the piston to the dispense position. Other embodiments and methods of dispensing viscous material are further disclosed.

Abstract: [Problem] To provide a flip-chip mounting method and a bump formation method applicable to flip-chip mounting of a next generation LSI and having high productivity and high reliability. [Means for Solving Problem] A semiconductor chip 20 having a plurality of electrode terminals 12 is held to oppose a circuit board 21 having a plurality of connection terminals 11 with a given gap provided therebetween, and the semiconductor chip 20 and the circuit board 21 in this state are dipped in a dipping bath 40 containing a melted resin 14 including melted solder particles for a given period of time. In this dipping process, the melted solder particles self-assemble between the connection terminals 11 of the circuit board 21 and the electrode terminals 12 of the semiconductor chip 20, so as to form connectors 22 between these terminals.

Abstract: In a measurement mechanism for continuously measuring a thickness of a coating layer, provided in an apparatus for forming the coating layer on a conductive elongate base material in a coating treatment base station while the base material is fed, a sensing portion for measuring a capacitance value of the coating layer is arranged before and after the base station, and tension applied to the base material at the sensing portion is set to be greater than tension applied to the base material at the base station. Thus, in forming the coating layer on the elongate base material while the base material is continuously fed, variation in a feeding speed is suppressed, influence of sway of a measurement surface in a direction of thickness at the thickness sensing portion during feeding is minimized, and a thickness of the coating layer can be measured with higher accuracy.

Abstract: An apparatus including a vacuum chamber having a substrate holding unit that holds a substrate and a plasma electrode facing the substrate, a first gas supply unit that supplies a H2 gas to the vacuum chamber at a constant flow rate, a second gas supply unit that opens or closes a valve to turn on or off the supply of a SiH4 gas, a high-frequency power source that applies a high frequency voltage to the plasma electrode, a shield box that is connected to a ground so as to surround the plasma electrode outside the vacuum chamber, and a control unit that controls the valve such that the SiH4 gas is periodically supplied to the vacuum chamber and modulates the amplitude of high frequency power in synchronization with the opening or closing of the valve, and the valve is provided in the shield box.

Abstract: To provide a method of controlling film thickness of dielectric multilayer film, such as optical thin film, with high precision, an optical film thickness controlling apparatus and a dielectric multilayer film manufacturing apparatus that can control the film thickness based on the same method, and dielectric multilayer film manufactured using the controlling apparatus or manufacturing apparatus. An optical film thickness controlling apparatus includes a film formation device 15 having a rotatable substrate 23 and a sputtering target 28, a photodiode 16 that detects each of a plurality of monochromatic light beams applied to the rotatable substrate along a radius thereof at predetermined intervals, and an A/D converter 17, in which a movable shutter 29 that moves along the direction of the radius of the rotatable substrate 23 to shut off film formation on the substrate 23 is provided between the substrate 23 and the target 28.

Abstract: A film forming apparatus is provided which includes a device A that generates liquid fine particles having controlled particle diameters; a device B including a via for guiding the generated liquid fine particles while controlling a temperature thereof; a device C that sprays the guided liquid fine particles; and a device D including a space for forming a transparent conductive film by coating the sprayed liquid fine particles onto a subject to be processed.

Abstract: The hydrophobicizing apparatus includes a vaporizing surface forming member of which surface is located in a vaporizing room; a vaporizing surface heating unit that heats the vaporizing surface forming member; a liquid chemical supply port that supplies a liquid chemical for a hydrophobicizing process on the surface of the vaporizing surface forming member; a gas inlet port that introduces a carrier gas into the vaporizing room; an outlet port that supplies a hydrophobicizing gas vaporized in the vaporizing room; and a processing chamber that performs the hydrophobicizing process on a substrate accommodated therein by the hydrophobicizing gas supplied through the outlet port. With this configuration, the hydrophobicizing gas of a high concentration can be supplied onto the substrate. Further, since the stored liquid chemical is not in contact with the carrier gas when a process is not being performed, degradation of the liquid chemical is suppressed.

Abstract: An additive layer manufacturing method comprising applying a material, for example a strong Raman scatterer material, treating the applied material using a laser, monitoring a characteristic of the applied material using a vibrational spectroscopy technique, for example a Raman technique, and using the output of the monitoring operation in controlling the treatment of the material. An apparatus for use in the method is also described.

Abstract: A substrate processing apparatus, a method of manufacturing a semiconductor device, and a method of confirming an operation of a liquid flowrate control device are provided. The substrate processing apparatus comprises: a process chamber accommodating a substrate; a liquid source supply system supplying a liquid source into the process chamber; a solvent supply system supplying a solvent having a vapor pressure greater than that of the liquid source into the process chamber; a liquid flowrate control device controlling flowrates of the liquid source and the solvent; and a controller controlling the liquid source supply system, the solvent supply system, and the liquid flowrate control device so that the solvent is supplied into the liquid flowrate control device than the solvent supply system to confirm an operation of the liquid flowrate control device before the liquid source supply system supplies the liquid source into the process chamber.

Abstract: A film-forming apparatus includes a mixing section which mixes material particles and core particles having a large particle size than that of the material particles; a separating section which separates the material particles and the core particles; an aerosol-generator which generates aerosol by dispersing the separated material particles in a carrier gas; and a nozzle which ejects the aerosol containing the material particles. The core particles having the large particle size can be easily controlled in terms of transport amount of the core particles, as compared to the material particles which are fine particles used for the film formation. Further, since the core particles hardly cause clog-up in the system, the concentration of aerosol can be maintained stably by appropriately controlling the transport amount of the core particles.

Abstract: An atomic layer film forming apparatus includes a plurality of gas supply pipes (121-123) for supplying a source gas to a film forming chamber (101), and an exhaust portion (105) for evacuating the inside of the film forming chamber (101). Valves (131-133) are attached to the gas supply pipes (121-123), respectively. In the film forming chamber (101), film forming chamber monitors (141-149) are arranged to measure a state in the film forming chamber (101). Based on the results of measurement by the film forming chamber monitors (141-149), a controller (107) controls the openings or opening times of the valves (131-133). The atomic layer film forming apparatus can improve gas uniformity when a plurality of gas supply ports are used.

Abstract: A method and apparatus by which flowers or food products are treated for the elimination of pathogenic and spoilage bacteria, the scavenging of free radicals that cause oxidative decay, the enhancement of flavor, the stabilization of fats, and the extension of shelf life that consists of alternately exposing the product to a vacuum environment and a saline solution containing organic acids for a predetermined period of time, including such method and means that includes automated devices that is pre-programmed to maximize effectiveness of the process for its intended purpose while minimizing any associated damage to the processed product.

Abstract: A vacuum vapor deposition apparatus includes a vaporization container which has a plurality of equally-diametered release holes arranged linearly and in which the release holes are arranged densely on both end portion sides of the vaporization container. The vaporization container includes therein a current plate having a plurality of equally-diametered passage holes through which vapor of a vaporization material passes. The passage holes are arranged densely on both end portion sides in such a manner that, as conductance per unit length in the arrangement direction of the release holes, conductance by the passage holes is proportional to conductance by the release holes.

Abstract: Methods and apparatuses for dispensing samples or reagents onto a target object are provided. A dispensing position designating section (62) designates the dispensing position on the target object (50), such as a membrane, based on an image of the target object (50) displayed on a monitoring section (60). A dispensing control section (64) positions the target object and the dispensing device relative to each other so that the designated dispensing position on the target object is placed beneath the dispensing device (10) and controls the dispensing operation of the dispensing device (10). A dispensing position information creating section (68) creates dispensing position information about the dispensing position on the target object (50) which is designated by the dispensing position designating section (62) and to which the dispensing operation has been performed and outputs it to the outside.

Abstract: A delivery system (10) for delivering species (12) to a processing chamber (14), so as to coat the surface of a large item, thereby imparting specific properties thereto, comprises: a species container (16) for containing species supplied from a source (18) of liquid species; evaporation means (20) for evaporating liquid species in said container; flow guide means (22, 24) for guiding flow of evaporated species to a processing chamber; and monitoring means (28) for measuring a rate over time of evaporation of species from said container so that flow of evaporated species delivered to said processing chamber can be monitored.

Abstract: A bar coater includes: a bar for applying a coating liquid to a web; a support member which is arranged on a lower side of the bar so as to rotatably support the bar; a weir arranged at an upstream side of the bar, the weir having a leading end surface at its distal end portion to form a bead of the coating liquid in a space between the leading end surface and the web; a reservoir including the bar, the support member and the weir, the reservoir for accumulating the coating liquid; a pump for supplying the coating liquid to the reservoir; a liquid discharge passage through which the coating liquid excessively supplied to the reservoir is discharged; and a controlling device for controlling the pump so as not to cause distortion of a dynamic contact line which is formed at interface between the coating liquid and the atmosphere.

Abstract: A process (300) is disclosed to measure predetermined wavelength reflectance spectra of a photo resist coated wafer (305,310,315,320) at a nominal thickness. After coating, the predetermined wavelength reflectance (325,330) is measured and the peak heights and valleys in the vicinity of the predetermined wavelength are tabulated. The relative swing ratio is computed (335) as the average peak height of the spectra at the exposure wavelength. This relative swing ratio is then compared to similar computations on other processes to determine which provides the best critical dimension (CD) control.

Abstract: A powder spraycoating method and powder spraycoating equipment. A dense phase powder pump is used. According to a predetermined conveying-air function in a control unit, different rates of compressed conveying air can be defined for different powder rates. In one predetermined total-air function in the control unit, the sum of total-air rate composed of the rate of compressed conveying air and of the rate of supplemental compressed air can be kept constant even if the rate of compressed conveying air changes.

Abstract: Methods are disclosed of determining a fill level of a precursor in a bubbler. The bubbler is fluidicly coupled with a substrate processing chamber through a vapor-delivery system. The bubbler and vapor-delivery system are backfilled with a known dose of a backfill gas. A pressure and temperature of the backfill gas are determined, permitting a total volume for the backfill gas in the bubbler and vapor-delivery system to be determined by application of a gas law. The fill level of the precursor in the bubbler is determined as a difference between (1) a total volume of the bubbler and vapor-delivery system and (2) the determined total volume for the backfill gas.

Abstract: An electrostatic coating method is provided. The electrostatic coating method includes: providing a rotary atomization type coating apparatus; supplying a coating material to a rotary atomization head of the rotary atomization type coating apparatus; changing the number of rotations of the rotary atomization head to change a particle diameter of particles of the coating material; adding a solvent to the coating material so that a NV value of a coated film formed on a coated surface of a workpiece falls within a predetermined range; and electrostatically coating the coated surface with the coating material.

Abstract: A hot melt adhesive system includes a melting unit configured to liquefy a bulk form of hot melt adhesive and deliver the liquefied hot melt adhesive to an application location. The melting unit includes a controller for establishing and/or verifying at least one system condition, such as temperatures associated with system operation. A machine reading unit is coupled with the controller and is capable of receiving information from a machine readable element and communicating the information to the controller for use in establishing and/or verifying the system condition. A method of operating the system includes scanning information on at least one system condition into the controller from a machine readable element, and using the scanned information during operation of the melting unit.

Abstract: A dynamic film thickness control system/method and its utilization consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for real-time control over deposited film thickness and gradually moves the mask plate according to the film thickness control value acquired by the film thickness control device, enabling the mask plate to mask film zones on the said substrate to achieve the film thickness of a design objective. When the required zones of deposition are masked, the deposition of a particular film layer is completed.

Abstract: Methods and apparatuses for forming components or circuits by ejecting a fluid including materials in a single ligament are disclosed.

Abstract: A method and apparatus for controlling coating material deposition on to a medical device. Images of material drops in flight are captured and an average single drop volume value is calculated by conversion of the captured drop images to a volume measurement. The average single drop volume value is used to calculate a total number of drops necessary to apply a desired amount of coating. Alternately, material is applied and the amount of material deposited is accumulated and adjustments are made to deposit only a desired amount of coating material. A drop volume is determined for either every drop or a sampling of drops as the drops are being applied. Adjustments to the coating process include changing drop size and changing a number of drops to be deposited.

Abstract: Delivery of gas by a pulsed gas delivery device is monitored using a sensor. The sensor may include a source that generates radiation at a spectral range that includes an absorption frequency of the gas being delivered. The radiation is transmitted through a receptacle into which the delivered gas has been received. A detector detects the intensity of the radiation that reaches the detector from the source after transmission through the gas in the receptacle. A controller measures a precise quantity of the gas that was delivered by the gas delivery device, by determining from the detected intensity the amount of the radiation that was absorbed by the gas in the receptacle. The controller monitors in real time the delivery of the gas, by adaptively adjusting the quantity of gas being delivered to a desired quantity. The sensor and controller can also monitor for failures or for out-of-specification behavior of the gas delivery device.

Abstract: A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including at least one of data on storage temperature for the chemical solution to be loaded and data on pressure applied to the chemical solution to be loaded; and a determining unit which determines whether or not the chemical solution holds expected quality thereof on the bases of the correlation data.

Abstract: A plasma processing apparatus includes a process chamber, a platen positioned in the process chamber for supporting a workpiece, a source configured to generate a plasma in the process chamber, and a monitoring system including an ion mobility spectrometer configured to monitor a condition of the plasma. A monitoring method including generating a plasma in a process chamber of a plasma processing apparatus, supporting a workpiece on a platen in the process chamber, and monitoring a condition of the plasma with an ion mobility spectrometer is also provided.

Abstract: A fluid supply apparatus is provided for feeding a fluid to two faces relatively moving in a clearance direction, a continuous flow supplied from the fluid supply apparatus is converted to an intermittent flow by utilizing pressure change caused by a fluctuation of a clearance space of the relative moving faces, and an intermittent discharge quantity per dot is adjusted by the number of revolutions of the fluid supply apparatus.

Abstract: An apparatus for manufacturing a composite structure body is provided which forms structure body having the constitution in which the crystals of more than one type of brittle material are dispersed and having novel properties without involving a heating/sintering process. The apparatus includes an aerosol generator configured to generate an aerosol. The aerosol is generated through dispersing fine particles of more than one type of brittle material, or dispersing composite fine particles, in a gas. The apparatus also includes a nozzle configured to spray the aerosol, a classifier configured to classify the brittle material fine particles in the aerosol, and a disintegrating machine for disintegrating agglomerations of the brittle material fine particles in the aerosol. The composite structure body is manufactured in reduced pressure conditions by bombarding a substrate with the aerosol at a high velocity, whereby at least one of crystals and microstructures of said brittle materials are dispersed.

Abstract: A method of monitoring synthesis of PCMO precursor solutions includes preparing a PCMO precursor solution and withdrawing samples of the precursor solution at intervals during a reaction phase of the PCMO precursor solution synthesis. The samples of the PCMO precursor solution are analyzed by UV spectroscopy to determine UV transmissivity of the samples of the PCMO precursor solution and the samples used to form PCMO thin films. Electrical characteristics of the PCMO thin films formed from the samples are determined to identify PCMO thin films having optimal electrical characteristics. The UV spectral characteristics of the PCMO precursor solutions are correlated with the PCMO thin films having optimal electrical characteristics. The UV spectral characteristics are used to monitor synthesis of future batches of the PCMO precursor solutions, which will result in PCMO thin films having optimal electrical characteristics.

Abstract: A coating apparatus and an operating method thereof that prevent damage to the nozzle of a spinless coater from impurities on a substrate during resin coating of the substrate, and impurities remaining on a stage at the bottom of the substrate. The coating apparatus comprises a stage, a nozzle, a nozzle cleaner, and a stage cleaner. A substrate is placed upon the stage. The nozzle discharges resin on the substrate to perform coating. The nozzle cleaner cleans the nozzle. The stage cleaner cleans the stage. The operating method includes removing a coated first substrate from atop a stage, cleaning the stage using a stage cleaner, introducing a second substrate to be coated onto the cleaned stage, and discharging resin through a nozzle onto the second substrate and coating the second substrate.

Abstract: An apparatus for moistening flaps of envelopes has a liquid dispenser for dispensing liquid to the envelope flap of each envelope to be moistened. A liquid sensor is provided for sensing liquid carried by the dispenser and generating a humidity signal indicating an amount of the liquid held by the dispenser. A method for moistening flaps of envelopes is also described.

Abstract: A coating mechanism is provided with a supply roller that rotates in contact with, and applies treatment liquid to, conveyed paper. A control section controls the rotational velocity of the supply roller such that the rotational velocity when applying the treatment liquid to a first sheet of paper after commencement of application of the treatment liquid is slower than the rotational velocity when applying the treatment liquid to a second sheet of paper. An increase in the coating amount caused by an initialization operation is offset by a reduction in the amount of treatment liquid supplied caused by decreasing the rotational velocity of the supply roller, thereby inhibiting the occurrence of a disparity between the coating amount of treatment liquid applied to the first sheet of paper after commencement of treatment liquid application and the coating amount of treatment liquid applied to the second sheet of paper.

Abstract: A method and an apparatus (10) for making thin layers from particles, wherein the particles are deposited on a carrier fluid flowing by gravity along a ramp (12) leading to a dam (18). The particles are held back at the bottom of the ramp (12), thereby causing the particles to be piled up one against the other in a monolayer configuration.

Abstract: A method for monitoring photolithography processing includes monitoring application of a light sensitive material to the surface of each of a plurality of substrates and detecting that a supply of the light sensitive material applied to the substrates has changed from a first batch of light sensitive material to a second batch light sensitive material. A change in photolithography process results caused by the change from the first batch to the second batch of light sensitive material is determined. Also included is initiating corrective action based on the change in photolithography process results.

Abstract: A droplet formation method of a mixed liquid is a method that the droplets 71, 72 and 73 are each delivered from each capillary tip to form the droplet 74 of the mixed liquid consisting of a raw material liquid on a substrate by applying a pulse voltage between the raw material liquids stored for each of a plurality of capillaries 1, 2 and 3 and the substrate disposed opposite to each capillary tip. In addition, a droplet formation device of the mixed liquid is provided with a plurality of capillaries for realizing formation of the droplet 74 of the aforementioned mixed liquid, a substrate, a voltage applying device for applying a pulse voltage and a controller for controlling the voltage applying device.

Abstract: A liquid crystal dispensing apparatus and a method of controlling a liquid crystal dropping amount are provided to drop liquid crystal onto a substrate corresponding to at least one unit panel area. In one aspect, the apparatus uses a liquid crystal dispensing unit to dispense liquid crystal. The liquid crystal dispensing unit includes a nozzle having a discharging hole through which the liquid crystal is dropped onto the substrate, a needle moveable between a down position in which the needle blocks the discharging hole and an up position in which the needle is separated from the discharging hole, a spring member to bias the needle toward the down position, and a solenoid coil to provide a magnetic force to move the needle to the up position. The dropping amount liquid crystal dispensing unit may be electrically controlled by controlling the solenoid coil or by controlling a gas pressure used to drive the liquid crystal through the discharging hole.