Responsive To Condition Of Coating Material Patents (Class 118/688)
  • Patent number: 7332036
    Abstract: The invention relates to a device and a method for control of the operation of a thermal projection torch (12), characterized in that the characteristics of the jet (16) and the temperature of the deposit (24) on the piece (22) are measured by means of a camera (54) and a combined pyrometer (70). The correction to be made to the supply parameters of the torch (12) are deduced therefrom and the corrected parameters are transmitted to the unit (30) controlling the torch (12).
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: February 19, 2008
    Assignee: Snecma Services
    Inventors: Michel Vardelle, Thierry Renault, Cédric Bossoutrot, Frédéric Braillard, Hakim Hoffmann
  • Patent number: 7323061
    Abstract: The invention relates to a device and method for controlling the operation of a thermal spray torch (12). The inventive device and method are characterised in that an on-board camera (54) and pyrometer (70) are used to measure the properties of the jet (16) and the temperature of the deposit (24) on the part (22) and in that the correction to be made to the supply parameters of the torch (12) is deduced. Furthermore, the invention is characterised in that the corrected parameters are sent to the cabinet (30) that controls the torch (12).
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: January 29, 2008
    Assignee: SNECMA Services
    Inventors: Michel Vardelle, Thierry Renault, Cédric Bossoutrot, Frédéric Braillard, Hakim Hoffmann
  • Patent number: 7323062
    Abstract: The invention relates to a device and a method for control of the operation of a thermal projection torch (12), characterized in that the characteristics of the jet (16) and the temperature of the deposit (24) on the piece (22) are measured by means of a camera (54) and a combined pyrometer (70). The correction to be made to the supply parameters of the torch (12) are deduced therefrom and the corrected parameters are transmitted to the unit (30) controlling the torch (12).
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: January 29, 2008
    Assignee: Snecma Services
    Inventors: Michel Vardelle, Thierry Renault, Cédric Bossoutrot, Frédéric Braillard, Hakim Hoffmann
  • Patent number: 7314537
    Abstract: The present invention presents an improved apparatus and method for monitoring a material processing system, where the material processing system includes a processing tool, test signal source, and a filter/detector. The test signal source providing a first test signal and a second test signal to the processing chamber, and the filter/detector detecting an intermodulation product of the first test signal and the second test signal generated when a plasma is created.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: January 1, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Craig T. Baldwin, Carl M. Spearow, Mirko Vukovic
  • Patent number: 7252715
    Abstract: The present invention provides a system to dispense a liquid, contained in a cartridge, onto a substrate employing a dispensing system under control of a processor in data communication with a memory.
    Type: Grant
    Filed: June 15, 2004
    Date of Patent: August 7, 2007
    Assignee: Molecular Imprints, Inc.
    Inventors: Michael P. C. Watts, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Patent number: 7226510
    Abstract: In a film forming apparatus according to the aerosol deposition method, the thickness of a structure being formed can be controlled accurately. The film forming apparatus includes an aerosol generating part in which raw material powder is to be provided, a compressed gas cylinder and a pressure regulating part for introducing a gas into the aerosol generating part to blow up the raw material powder thereby generating an aerosol, a substrate holder for holding a substrate on which a structure is to be formed, a nozzle for spraying the aerosol generated in the aerosol generating part toward the substrate, and a sensor to be used for obtaining an amount of primary particles that have contributed to film formation by impinging on the substrate or the structure formed thereon from among the raw material powder contained in the aerosol sprayed from the nozzle.
    Type: Grant
    Filed: October 15, 2004
    Date of Patent: June 5, 2007
    Assignee: Fujifilm Corporation
    Inventor: Tetsu Miyoshi
  • Patent number: 7186296
    Abstract: A film formation apparatus by which a film thickness can be precisely measured and whether the film quality is good or bad can be confirmed in a process of performing film formation according to the aerosol deposition method. The film formation apparatus includes: an aerosol generating unit for generating an aerosol by dispersing a raw material powder by a gas; a holding unit for holding a substrate on which a structure is to be formed; a nozzle for injecting the aerosol generated by the aerosol generating unit toward the substrate; and a measurement unit for measuring an electric potential of a film formation surface on the substrate.
    Type: Grant
    Filed: December 5, 2005
    Date of Patent: March 6, 2007
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Tsutomu Sasaki
  • Patent number: 7179334
    Abstract: A semiconductor process system (10) includes a measuring section (40), an information processing section (51), and a control section (52). The measuring section (40) measures a characteristic of a test target film formed on a target substrate (W) by a semiconductor process. The information processing section (51) calculates a positional correction amount of the target substrate (W) necessary for improving planar uniformity of the characteristic, based on values of the characteristic measured by the measuring section (40) at a plurality of positions on the test target film. The control section (52) controls a drive section (30A, 32A) of a transfer device (30), based on the positional correction amount, when the transfer device (30) transfers a next target substrate (W) to the support member (17) to perform the semiconductor process.
    Type: Grant
    Filed: March 19, 2002
    Date of Patent: February 20, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Koichi Sakamoto, Yamato Tonegawa, Takehiko Fujita
  • Patent number: 7112246
    Abstract: The invention relates to an adhesive robot, comprising a device for applying adhesive to a workpiece. The adhesive robot has a nozzle head (18), which has an application nozzle (24) and can be supplied with a pressurized viscous adhesive, the nozzle head (18) and the workpiece (14) being displaceable in relation to one another. The adhesive which is issued from the application nozzle (24) in a spray jet (28) is applied to a workpiece (14) along a predefined line of application (36) in the form of a strip of adhesive (40). To facilitate the adjustment and re-calibration process, the system comprises at least one camera unit (42), which is located on the nozzle head (18) and whose leans is directed towards the spray jet (28) or the adhesive strip (40). The output of said camera unit is connected to an image evaluation unit (45). The image data (40) recorded by the camera unit (42) is buffered and compared with predetermined image values (40).
    Type: Grant
    Filed: August 2, 2001
    Date of Patent: September 26, 2006
    Inventor: Josef Schucker
  • Patent number: 7092855
    Abstract: A method of designing and the resulting thermally stable heated coating die apparatus, the die apparatus including a die having a die geometry and a heating system with heaters and temperature sensors. The method and resultant apparatus provides minimized temperature gradients, flat die lip faces in a die to roll plane and a flat die in a plane perpendicular to die flat lip faces and parallel to substrate width. The method optimizes simultaneously: die geometry, placement of the heaters, placement of temperature sensors, and shielding from operating conditions, using heat transfer and structural numerical modeling and statistical analysis while considering die functionality characteristics, minimum increment of temperature measurement and control accuracy related to minimum acceptable deviation from flatness, coating die material of construction relative to thermo-structural material properties, and desirable coating die material properties.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: August 15, 2006
    Assignee: Avery Dennison Corporation
    Inventors: Mark James Wyatt, Erik Martin Pedersen, Luigi Sartor
  • Patent number: 7070657
    Abstract: This invention provides a stable process for depositing an antireflective layer. Helium gas is used to lower the deposition rate of plasma-enhanced silane oxide, silane oxynitride, and silane nitride processes. Helium is also used to stabilize the process, so that different films can be deposited. The invention also provides conditions under which process parameters can be controlled to produce antireflective layers with varying optimum refractive index, absorptive index, and thickness for obtaining the desired optical behavior.
    Type: Grant
    Filed: October 15, 1999
    Date of Patent: July 4, 2006
    Assignee: Applied Materials Inc.
    Inventors: David Cheung, Joe Feng, Judy H. Huang, Wai-Fan Yau
  • Patent number: 7052576
    Abstract: A desired level of pressure is established in at least one chamber that forms part of a closed atmosphere, such as in a semiconductor device processing facility. A pressure control system includes at least one space increase/decrease device that has a partition which is movable to increase and/or decrease the volume of free space within the chamber(s), a pressure sensor for detecting the pressure within the chamber(s), and a controller for controlling the movement of the partition based on the detected pressure. A chamber is provided with positive or negative pressure to increase or decrease the pressure therein while the pressure in the chamber is monitored. As soon as the pressure within the chamber equals a predetermined pressure, the providing of the positive or negative pressure is stopped. The partition is moved to vary the effective volume of free space in the chamber(s) to change the pressure in the chamber from the predetermined pressure to the desired pressure.
    Type: Grant
    Filed: December 19, 2002
    Date of Patent: May 30, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin-Jun Park, Jin-Seok Hong
  • Patent number: 6923023
    Abstract: Methods and apparatuses estimate and control optical fiber primary coating diameter for wet-on-wet optical fiber manufacturing. The primary coating diameter for a particular length of optical fiber is calculated based upon a measurement of the weight of primary and/or secondary coating material consumed during optical fiber manufacturing. Control of the primary coating diameter is effected by a coating controller which can increase or decrease the primary coating diameter through control of glass temperature, coating viscosity and/or other parameters during wet-on-wet fiber manufacture.
    Type: Grant
    Filed: October 1, 2002
    Date of Patent: August 2, 2005
    Assignee: Fitel U.S.A. Corporation
    Inventors: Siu-Ping Hong, Jason W. Shiroishi, Nirupama Kenkare
  • Patent number: 6881267
    Abstract: A photoresist supply apparatus is provided. The photoresist supply apparatus includes a lower photoresist sensor and an upper photoresist sensor respectively installed near the bottom and the top of a trap tank to detect a photoresist in the trap tank. A drain line is connected to an upper side of the trap tank to release air. A photoresist-blocking valve is installed at the drain line, the photoresist-blocking valve structured to be opened to release air or closed to prevent photoresist loss according to signals detected by the lower photoresist sensor and the upper photoresist sensor. While the photoresist is supplied into the trap tank, the photoresist-blocking valve is opened to release air. After the photoresist supply into the trap tank is completed, the photoresist-blocking valve is closed to prevent the loss of a large amount of the photoresist through the drain line.
    Type: Grant
    Filed: February 3, 2004
    Date of Patent: April 19, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Kwang-Il Kim
  • Patent number: 6878232
    Abstract: A method and apparatus for improving an operating efficiency for a process including temperature dependent fluid delivery including determining a projected time period to start a process during a non-operating time period; delivering a process fluid for performing the process along at least one fluid recirculation pathway for at least one selected time period the at least one fluid recirculation pathway including a substantial portion of a fluid delivery pathway for providing the process fluid to the process at a predetermined process temperature; and, providing the process fluid following the at least one selected time period to the process at the predetermined process temperature.
    Type: Grant
    Filed: December 17, 2002
    Date of Patent: April 12, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Peir-Horng Chen, Yi-Ping Chen, Hong-San Lan
  • Patent number: 6869482
    Abstract: A slurry raw material is applied onto a carrier film 3 in a coating section 4, and a predetermined property related to the thickness of the slurry raw material is measured in a property-measuring section 5 in a wet mode before the slurry raw material is dried in a drying section 6. A processing sub-section 7a calculates an estimated value t of the thickness of a sheet from the target thickness of the sheet, a measurement of the slurry raw material property, and the slurry raw material density, to compare the estimated value t with the target value T of the sheet thickness. An adjusting output sub-section 7b transmits signals for adjusting the thickness to a thickness-adjusting device 9 on the basis of the above comparison result, to efficiently and precisely control the thickness of the slurry raw material applied onto the carrier film 3.
    Type: Grant
    Filed: June 23, 2003
    Date of Patent: March 22, 2005
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Norio Mutsui, Tamotsu Mitsutani
  • Patent number: 6855206
    Abstract: A controller for a moisture adjusting device of the present invention reads out a target moisture content set in advance in a data table in accordance with a type of a planographic printing plate; determines, every predetermined control period, a moisture content of an overcoat layer (measured moisture content) based on a measured signal SW; and calculates a difference (deviation) between the measured moisture content and the target moisture content. For example, if the measured moisture content of the overcoat layer is lower than the target moisture content, the controller sets an adjusted moisture content which is higher than the measured moisture content and controls the humidity and the temperature within a humidity conditioning zone so that an interposing paper web (protective sheet material) attains the adjusted moisture content within the humidity conditioning zone.
    Type: Grant
    Filed: August 20, 2003
    Date of Patent: February 15, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Shinichiro Minato
  • Patent number: 6849469
    Abstract: Real-time analysis and control of a semiconductor silicidation process. The architecture includes system and methods for monitor and control of a silicidation process during rapid thermal anneal. An FTIR system analyzes selected and/or random regions where silicidation is occurring, and signals the process control system to control the process according to the status of the analyzed silicide formations.
    Type: Grant
    Filed: October 1, 2003
    Date of Patent: February 1, 2005
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Ciby Thomas Thuruthiyil, Bhanwar Singh, Ramkumar Subramanian
  • Publication number: 20040255848
    Abstract: A coating apparatus coats a liquid material on a substrate in a coating chamber. A first liquid supply system that supplies the liquid material is provided in the coating chamber. A second liquid supply system is provided in the first liquid supply system that supplies a liquid that cleans or that deactivates the liquid material remaining in the coating chamber and/or in the first liquid supply system. A coating apparatus, a thin film forming method, a thin film forming apparatus, a semiconductor device manufacturing method, an electro-optic device, and an electronic instrument are provided that enable a high performance thin film with few defects and with a high degree of reproducibility to be obtained, that allow maintenance of the apparatus to be performed efficiently and safely, and that enable a thin film to be formed at low cost.
    Type: Application
    Filed: April 5, 2004
    Publication date: December 23, 2004
    Applicant: Seiko Epson Corporation
    Inventor: Ichio Yudasaka
  • Patent number: 6824813
    Abstract: A substrate processing apparatus comprises a chamber 28 capable of processing a substrate 20. A radiation source 58 provides radiation that is at least partially reflected from the substrate in the chamber. A radiation detector 62 is provided to detect the reflected radiation and generate a signal. A controller 100 is adapted to receive the signal and determine a property of the substrate 20 in situ during processing, before an onset of during or after processing of a material on the substrate 20.
    Type: Grant
    Filed: April 6, 2000
    Date of Patent: November 30, 2004
    Assignee: Applied Materials Inc
    Inventors: Thorsten B. Lill, Michael N. Grimbergen, Jitske Trevor, Wei-Nan Jiang, Jeffrey Chinn
  • Patent number: 6805747
    Abstract: A method and apparatus for coating hams is provided. Sugar is uniformly dispensed on an inclined plate that is heated to melt the sugar. The sugar flows into a reservoir from which it is poured onto hams passing below the reservoir on a conveyor. Spices are poured onto the melted sugar that sticks to the ham to form a glaze. Jets of water can cool the glaze to increase retention on the ham. The process can be repeated.
    Type: Grant
    Filed: January 30, 2003
    Date of Patent: October 19, 2004
    Assignee: Honey Baked Ham, Inc.
    Inventors: Richard E. Gore, Allen Mottershead
  • Publication number: 20040187776
    Abstract: A color adjustment system for changing the color of fluid flowing from a source. The color adjustment system includes a main mixing pipe connected to storage vessels to continuously receive flows of colorants from the storage vessels. A fluid inspection cell is connected to the main mixing pipe for continuously receiving a sample portion of the flow of the fluid composition. A spectrophotometer is positioned to view the sample portion of the flow of the fluid composition through a window of the fluid inspection cell. The spectrophotometer transmits measured color values to a control unit, which generates control signals in response thereto. The control signals are transmitted to colorant pumps, which pump colorants to the main mixing pipe in response to the control signals.
    Type: Application
    Filed: March 4, 2004
    Publication date: September 30, 2004
    Inventors: Daniel S. Wierzbicki, James C. M. Manter
  • Patent number: 6780380
    Abstract: An automatic tissue processor for processing tissue samples for histological analysis. The tissue processor in one configuration includes a retort chamber, a wax storage chamber holding multiple wax containers, a reagent storage chamber holding multiple reagent containers, and a fluid transporting system including a rotary valve operated by a Maltese Cross gear, for selectively connecting the retort chamber with a particular wax or reagent container to supply wax or reagents to the retort chamber. Differential heating of the wax chamber is accommodated by multiple heating elements, with indirect heating of the rotary valve and the fluid transporting system. A computerized central control system for automatic monitoring and control of such tissue processor is advantageously arranged to execute a reagent management program, which enables the central control system to automatically manage reagent usage and replacement.
    Type: Grant
    Filed: January 16, 2001
    Date of Patent: August 24, 2004
    Assignee: Triangle Biomedical Sciences, Inc.
    Inventors: Jack E. Hunnell, Sergio Cometto
  • Publication number: 20040161531
    Abstract: During the application of glue, in particular hot-melt glue, to a material web (21) for blanks, the transfer of glue is dependent on the conveying speed of the material web (21) and other parameters. In particular, a glue pressure, which is exerted on the glue in accordance with the movement of the material web, is regulated by means of a pressure control valve (37) which is connected to a central machine control unit (31). This ensures a uniform delivery of glue.
    Type: Application
    Filed: January 5, 2004
    Publication date: August 19, 2004
    Applicant: FOCKE & CO (GmbH & Co.)
    Inventors: Ingo Ferber, Thomas Kracke
  • Patent number: 6770141
    Abstract: Methods and systems for controlling evaporative drying processes using environmental equivalency control process parameters to provide a specified product quality. In an environmental equivalency-based control system, measured values are received by environmental equivalency calculation hardware or software. An environmental equivalency value is calculated based on the measured parameters. One or more of the process parameters may then be varied to maintain the environmental equivalency value for the process within a predetermined range of environmental equivalency values.
    Type: Grant
    Filed: March 26, 2002
    Date of Patent: August 3, 2004
    Assignee: SmithKline Beecham Corporation
    Inventors: Dwayne A Campbell, Joseph T. Marranca, Raymond E. Pope, Robert Allen Stagner
  • Patent number: 6753272
    Abstract: An apparatus and method supports thermal processing of a microelectronic device such as a semiconductor chip in a substrate by heating the substrate with secondary radiation from an energy transfer device 40, which has a first set of energy transfer regions comprised of an emissive and thermally conductive material, and a second set of thermally insulating regions comprised of a reduced emissivity and reduced thermal conductivity material or free space. A multi-zone-radiant energy source 30 provides radiative energy to energy transfer device 40, with a process controller 36, preferably a multi-zone controller, altering the amount of energy provided by each heat zone associated with each emissive region of energy transfer device 40. Sensors detect the thermal energy level of each energy transfer region to allow controller 36 to adjust the secondary radiation emitted by each region in real time, resulting in a predetermined and controlled distribution of thermal energy on substrate 20.
    Type: Grant
    Filed: September 25, 2000
    Date of Patent: June 22, 2004
    Inventors: Yong Jin Lee, Mehrdad M. Moslehi, Jalil Kamali, Sergey Belikov
  • Patent number: 6746712
    Abstract: The present invention pertains to an arrangement for the controlled application of adhesive to substrate. In at least one embodiment, the arrangement comprises a) an adhesive reservoir, b) a pump, c) an applicator head having at least one applicator nozzle, d) a volume throughput sensor, and e) a monitoring unit. The reservoir, the pump, and the applicator head are connected together by a conduit system carrying the adhesive. The volume throughput sensor and the monitoring unit are connected together by a pulse transmission line. The monitoring unit, the feed pump, and the applicator head are connected together by control lines. In at least one embodiment, the application of adhesive to substrates is controlled by measuring the volume throughput of the adhesive, transmitting signals indicative of volume throughout to the monitoring unit, and controlling the amount of adhesive applied to the substrate material in-line in response to the signals.
    Type: Grant
    Filed: December 31, 2002
    Date of Patent: June 8, 2004
    Assignee: Henkel Kommanditgesellschaft auf Aktien (Henkel KGaA)
    Inventors: Gunter Hoffmann, Volker Kels, Joerg Hurdelbrink, Richard Scholta, Willi Borst, Roland Heume
  • Patent number: 6746579
    Abstract: An object of the present invention is to provide a method of monitoring deterioration of an electrolytic gold plating solution which can always stably performing gold plating by continuously detecting a deterioration state of the gold sulfite complex plating solution, and to provide an apparatus for monitoring the deterioration of the electrolytic gold plating solution. The present invention is characterized by an electrolytic gold plating method for performing electrolytic gold plating on a surface of a substrate body using a gold sulfite plating solution, wherein the gold plating is performed while deterioration of the plating solution is being always or intermittently detected during plating.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: June 8, 2004
    Assignee: Hitachi Kyowa Engineering Co., Ltd.
    Inventor: Hiroyuki Kadota
  • Patent number: 6740163
    Abstract: A method of performing dip coating of a layer of a resist material on a surface of a substrate, comprising steps of: (a) providing a dip coating vessel having an interior space containing a dip coating liquid comprising a solution of the resist material in a solvent, the dip coating vessel being open at the top thereof; (b) providing a substrate having a surface, immersing the substrate in the dip coating liquid in the vessel via the open top, and withdrawing the substrate from the vessel via the open top thereof, thereby forming a layer of resist material on the surface; and (c) monitoring and maintaining the viscosity of the dip coating liquid supplied to the dip coating vessel at a predetermined value. Also disclosed is an apparatus for performing the method.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: May 25, 2004
    Assignee: Seagate Technology LLC
    Inventors: Donald Everett Curtiss, Joseph Leigh, Frank Quan
  • Patent number: 6736902
    Abstract: A deposit is formed on a deposition substrate using a deposition gun that bums a mixture of a fuel and an oxidizer to form a deposition gas flow, mixes a powder into the deposition gas flow to form a deposition mixture flow, and projects the deposition mixture flow therefrom. The deposition gun is provided with a flowing coolant. A flow rate of the fuel to the deposition gun, a flow rate of the oxidizer to the deposition gun, a flow rate of the powder to the deposition gun, and a cooling capacity of the coolant flow are all measured. The flow rate of the fuel, the flow rate of the oxidizer, the flow rate of the powder, and the cooling capacity of the coolant flow are all controlled responsive to the step of measurements.
    Type: Grant
    Filed: June 20, 2002
    Date of Patent: May 18, 2004
    Assignee: General Electric Company
    Inventors: Stephen Wayne Tefft, Paul Charles Madix, James Robert Reinhardt, Tag Allen Koenig
  • Publication number: 20040083958
    Abstract: Apparatus and methods for monitoring the application of a viscous material onto at least one moving strand or other narrow substrates. A detection unit, such as a machine vision system, an infrared sensor, an ultraviolet detector, or a light curtain with multiple detectors, senses radiation originating from the viscous material after it is applied to the strand or strands and, typically, before each strand is contacted with a substrate. The detection unit determines a detected value representative of a characteristic of the pattern from the sensed radiation, compares the detected value with a reference value representative of a desired standard for the characteristic, and outputs a signal in accordance with the result of the comparison.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Applicant: Nordson Corporation
    Inventors: Laurence B. Saidman, David Zgonc, Patrick L. Crane
  • Patent number: 6726774
    Abstract: A bubble detection system to detect bubbles in photoresist. The system includes photoresist at least one tank, a buffer tank, a pump, and a bubble sensor. The photoresist tank provides the photoresist. The buffer tank stores the photoresist from the photoresist tank. The pump pumps the photoresist from the buffer tank to an end terminal. The bubble sensor is set between the buffer tank and the pump to detect bubbles in the photoresist, and outputs an alarm signal when bubbles are detected. The nozzle is set at the end terminal to output the photoresist.
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: April 27, 2004
    Assignee: Macronix International Co., Ltd.
    Inventors: Jia-Hau Tzeng, Yuh-Tong Tsay, Chung-Te Tsai, Cheng-Yi Lin, Mao-I Ting
  • Publication number: 20040071888
    Abstract: The present invention is generally relates to the field of research for the discovery of films with desirable properties, and to a process for making such films. More particularly, the present invention is directed to a system or an apparatus and a method for the rapid formation of a library of liquid samples and a library of thin films therefrom, as well as to the rapid screening of these films to identify those having desirable properties, all of which may be achieved using combinatorial techniques.
    Type: Application
    Filed: May 30, 2003
    Publication date: April 15, 2004
    Applicants: Symyx Technologies, Inc., Air Products and Chemicals, Inc.
    Inventors: Konstantinos Chondroudis, Keith Cendak, Martin Devenney, C. Eric Ramberg, Xuejun (Jason) Wang, Raymond E. Carhart, Scott Jeffrey Weigel, John Francis Kirner, Thomas Alan Deis, Earl Danielson, James Edward MacDougall, Lisa Deis, Sum Nguyen
  • Patent number: 6718775
    Abstract: An integrated phase separator for use in an ultra high vacuum system, for example, a molecular beam epitaxy system, is described. The vacuum chamber has a cryogenic panel disposed therein. The cryogenic panel includes a cryogenic shroud region and a phase separator region. Liquid nitrogen is introduced into the cryogenic panel via an inlet line. As the liquid nitrogen warms and vaporizes, nitrogen vapor rises within the shroud. The phase separator region within the cryogenic panel provides a near atmospheric pressure vapor barrier over the liquid nitrogen so that the nitrogen vapor may escape smoothly through the outlet of the panel, without forming gas bursts. Also, the phase separator region is vacuum jacketed to prevent cryogenic shroud surface temperature changes due to variations in liquid nitrogen levels, thereby increasing the cryogenic shroud's pumping stability. In one embodiment, used in molecular beam epitaxy (MBE), the cryopanel is divided into first and second cooling chambers.
    Type: Grant
    Filed: July 30, 2002
    Date of Patent: April 13, 2004
    Assignee: Applied EPI, Inc.
    Inventors: Paul E. Colombo, Scott Wayne Priddy
  • Patent number: 6689255
    Abstract: A system and method for manufacturing thin-film structures disposed on a substrate. The thin-film structures have different respective thicknesses that vary along a radius of the substrate. A substrate rotates about an axis of rotation and a source of deposited material is directed at the rotating substrate. A mask having a stepped profile is positioned between the rotating substrate and the source. The stepped mask selectively blocks material emanating from the source from reaching the substrate. Each step of the profile of the mask corresponds to one of the respective thicknesses of the thin-film structures. The radius along which the different respective thicknesses of the film-thin structures vary is measured from the axis of rotation of the rotating substrate, and the substrate includes at least one wafer having a center that is either coincident or offset from the axis of rotation.
    Type: Grant
    Filed: June 10, 2002
    Date of Patent: February 10, 2004
    Assignee: 4 Wave, Inc.
    Inventors: David Alan Baldwin, Todd Lanier Hylton
  • Publication number: 20040011284
    Abstract: The invention relates to an adhesive robot, comprising a device for applying adhesive to a workpiece. The adhesive robot has a nozzle head (18), which has an application nozzle (24) and can be supplied with a pressurized viscous adhesive, the nozzle head (18) and the workpiece (14) being displaceable in relation to one another. The adhesive which is issued from the application nozzle (24) in a spray jet (28) is applied to a workpiece (14) along a predefined line of application (36) in the form of a strip of adhesive (40). To facilitate the adjustment and re-calibration process, the system comprises at least one camera unit (42), which is located on the nozzle head (18) and whose leans is directed towards the spray jet (28) or the adhesive strip (40). The output of said camera unit is connected to an image evaluation unit (45). The image data (40) recorded by the camera unit (42) is buffered and compared with predetermined image values (40).
    Type: Application
    Filed: June 30, 2003
    Publication date: January 22, 2004
    Inventor: Josef Schucker
  • Patent number: 6676756
    Abstract: A technique for more efficiently forming conductive elements, such as conductive layers and electrodes, using chemical vapor deposition. A conductive precursor gas, such as a platinum precursor gas, having organic compounds to improve step coverage is introduced into a chemical vapor deposition chamber. A reactant is also introduced into the chamber that reacts with residue organic compounds on the conductive element so as to remove the organic compounds from the nucleating sites to thereby permit more efficient subsequent chemical vapor deposition of conductive elements.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: January 13, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Weimin Li, Sam Yang
  • Publication number: 20040002170
    Abstract: An apparatus for manufacturing a semiconductor device, comprising a process chamber which holds a substrate to be subjected to a prescribed process, a gas inlet pipe which introduces a process gas into the process chamber, a gas outlet pipe which discharges the gas from the process chamber to outside the process chamber, component-measuring devices which measure components of the gas in the process chamber or at least two different gases, concentration-measuring devices which measure concentration of each component of the gas in the process chamber, or the concentration of each component of at least two different gases, and a control device which adjusts the components of the process gas, the concentration of each component of the process gas and an atmosphere in the process chamber, on the basis of values measured by the composition-measuring device and concentration-measuring device.
    Type: Application
    Filed: April 29, 2003
    Publication date: January 1, 2004
    Inventors: Takashi Shimizu, Akihito Yamamoto
  • Patent number: 6656280
    Abstract: A resist recycling apparatus includes a viscosity control tank supplied with wasted resist liquid; a solvent tank that supplies a solvent to the viscosity control tank; a viscometer that measures viscosity of the resist according to the viscosity measured by the viscometer and the temperature of the resist, and that determines an amount of solvent to supply to the viscosity control tank according to the difference between the calculated resin density and a predetermined resin density; and a filter that removes dust from the resist.
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: December 2, 2003
    Assignee: Oki Electric Industry Co., Ltd.
    Inventors: Yasuharu Oota, Yoshizumi Ito
  • Publication number: 20030200924
    Abstract: A system and method for real time deposition process control based on resulting product detection, where the system and method detect an amount of at least one reaction product in real time, while the deposition process is being performed, the detected amount of reaction product is compared with a reference amount, and a comparison result is fed back in real time to adjust a supply of one or more reactants. The system and method provide real time control over the deposition process and/or reduce the number of wafers produced that do not meet processing target values.
    Type: Application
    Filed: April 30, 2002
    Publication date: October 30, 2003
    Inventors: Chang-Hyun Ko, Jai-Dong Lee, Jin-Hee Lee
  • Publication number: 20030177978
    Abstract: A coating equipment managing system for controlling and monitoring a coating equipment of an automobile manufacturing line, comprising local installations which are provided in the manufacturing lines at a plurality of localities, and a central installation for receiving data from the plurality of local installations, wherein the local installation comprises a sensor installed in the coating equipment, a data acquisition unit for receiving signals from the sensor, a control unit for controlling the coating equipment, and a local communication unit; the central installation comprises a server unit and a central analysis unit; the local communication unit transmits the data from the data acquisition unit to the server unit by E-mail; the server unit transmits correction data for the coating equipment obtained from the analysis of the measured data by the central analysis unit to the local communication unit by E-mail; and the local communication unit converts the correction data into a control code and transmit
    Type: Application
    Filed: February 10, 2003
    Publication date: September 25, 2003
    Inventors: Kenichi Nobutoh, Jun Suzuno
  • Publication number: 20030170398
    Abstract: A resonant cavity frequency sensing device is used to sense the moisture content of a substrate. Data obtained by the sensing device can be used in a feedback loop in the apparatus employing the device, to help control the operation of the apparatus in order to obtain consistent results. The sensor may employ one pair of sensing plates or an array of pairs of sensing plates to obtain data from each part of the substrate. In an illustrated embodiment, the device is used to monitor and control dip uptake in a fabric adhesive dipping process.
    Type: Application
    Filed: March 17, 2003
    Publication date: September 11, 2003
    Applicant: The Goodyear Tire & Rubber Company
    Inventors: Jon Michael Madaras, Kenneth Michael Kot, Paul Michael Bujak
  • Patent number: 6610364
    Abstract: A liquid crystal dispensing apparatus and a method of controlling a liquid crystal dropping amount are provided to drop liquid crystal onto a substrate corresponding to at least one unit panel area. In one aspect, the apparatus uses a liquid crystal dispensing unit to dispense liquid crystal. The liquid crystal dispensing unit includes a nozzle having a discharging hole through which the liquid crystal is dropped onto the substrate, a needle moveable between a down position in which the needle blocks the discharging hole and an up position in which the needle is separated from the discharging hole, a spring member to bias the needle toward the down position, and a solenoid coil to provide a magnetic force to move the needle to the up position. The dropping amount liquid crystal dispensing unit may be electrically controlled by controlling the solenoid coil or by controlling a gas pressure used to drive the liquid crystal through the discharging hole.
    Type: Grant
    Filed: April 30, 2002
    Date of Patent: August 26, 2003
    Assignee: LG. Philips LCD Co., Ltd.
    Inventors: Hyug-Jin Kweon, Hae-Joon Son
  • Publication number: 20030143324
    Abstract: A system and a method for providing feedback control of the deposition of superabsorbent particles into an absorbent core at a specified rate are disclosed herein. A control system, such as a programmable logic control device, is used to receive feedback related to the operation of one or more elements of a vibratory feeder. Based on the feedback, the control system adjusts one or more elements of the vibratory feeder to synchronize the operation of the elements of the vibratory feeder. Particularly, the control system can be adapted to synchronize the deposition rate of superabsorbent particles into the absorbent core with the line speed of the absorbent core during ramp-up and ramp-down periods.
    Type: Application
    Filed: January 25, 2002
    Publication date: July 31, 2003
    Inventors: Troy Delzer, John Walter
  • Publication number: 20030143318
    Abstract: The invention relates to an apparatus and a method for producing a sprayed layer on the surface of a substrate, wherein an admixture material which may have started to melt or is molten, is guided onto the surface of the substrate to be coated using a gas or gas mixture, as well as a relevant installation for producing the sprayed layer by means of a thermal spraying method, wherein the installation comprises means for supplying the admixture material or the gas or gas mixture. According to the invention, at least one feature of the thermal spraying process which influences the quality of the sprayed layer and which is responsible for the formation of the layer and its properties, is recorded, evaluated and assessed, checked, monitored and/or regulated. Both analogue and digital spectroscopic arrangements can be used as optical emission spectroscopic arrangements.
    Type: Application
    Filed: January 31, 2003
    Publication date: July 31, 2003
    Inventor: Karsten Schutte
  • Patent number: 6589348
    Abstract: An electrostatic paint atomizer connected to a discharge station at high voltage is supplied, via an isolating conveying line, with individual divided-off quantities of paint enclosed between two pigs from a loading station at the other end of the conveying line. The paint is conveyed by a transport device supplying a thrust medium (compressed air or insulating liquid) to discharge the paint in the discharge station. A reverse transport device operating with compressed air transports the pigs back to the loading station. The length (L) of the conveying line between the loading and the discharge stations and the length (l) of a divided-off quantity of paint, are dimensioned to provide a sufficiently long isolating path (L-l) to avoid a voltage flashover. A continuous supply of paint is achieved with two parallel conveying lines, through which quantities of paint are metered with an offset from each other.
    Type: Grant
    Filed: April 26, 2001
    Date of Patent: July 8, 2003
    Assignee: LacTec GmbH Gesellschaft fuer moderne Lackiertechnik
    Inventor: Winfried Ott
  • Patent number: 6579563
    Abstract: A fluid dispensing system for monitoring a weight of a fluid dispensed by a fluid dispenser. A first monitoring device determines a first flow characteristic, for example, pressure, of the pressurized fluid flowing through the fluid dispenser; and a second monitoring device determines a second flow characteristic, for example, viscosity, of the pressurized fluid flowing through the fluid dispenser. A monitor control produces an output representing a weight of the fluid dispensed by the fluid dispenser as a function of the first and second flow characteristics. The monitor control also stores values relating to a size of an orifice through which the pressurized fluid is dispensed and a density of the pressurized fluid. The weight value is determined as a function of the orifice size and the density values. The present invention also includes a method of monitoring a weight of a fluid being dispensed by a fluid dispenser.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: June 17, 2003
    Assignee: Nordson Corporation
    Inventor: John C. Dillon
  • Publication number: 20030101933
    Abstract: An integrated paint quality control (IPQC) system for feedback control of paint process for painting vehicle bodies includes a film thickness sensor system for measuring paint film thickness of the painted bodies. The IPQC system also includes a control system communicating with the film thickness sensor system for receiving information of the paint film thickness and combining the paint film thickness information with paint automation parameters on a vehicle identification number (VIN) basis of the painted bodies to control the paint process.
    Type: Application
    Filed: January 13, 2003
    Publication date: June 5, 2003
    Inventors: Dimitar P. Filev, Steve A. Weiner, P. Tomas Larsson
  • Publication number: 20030094375
    Abstract: An object of the present invention is to provide a method of monitoring deterioration of an electrolytic gold plating solution which can always stably performing gold plating by continuously detecting a deterioration state of the gold sulfite complex plating solution, and to provide an apparatus for monitoring the deterioration of the electrolytic gold plating solution.
    Type: Application
    Filed: November 21, 2001
    Publication date: May 22, 2003
    Applicant: Hitachi Kyowa Engineering Co., Ltd.
    Inventor: Hiroyuki Kadota
  • Patent number: 6562406
    Abstract: The object of the present invention is to provide an apparatus and a method for applying a viscous fluid whereby a constant application diameter is achieved through a simple operation without a Tact loss while a surface of a member to be applied can be less damaged. An adhesive application member (2111) having a screw portion (2122) inserted therein is rotated by a rotating device (230), so that a nozzle stopper (2114) of the adhesive application member is prevented from interfering with a wiring pattern on a face of a circuit board. Moreover, the screw portion is rotated synchronously as well when the adhesive application member is rotated, thereby preventing the adhesive from being discharged out from the nozzle in consequence to the rotation of the adhesive application member. An application diameter can hence be uniformed.
    Type: Grant
    Filed: September 28, 2000
    Date of Patent: May 13, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Naoichi Chikahisa, Hiroyuki Miyake, Takashi Sasaki, Akira Iizuka, Eiichiro Terayama, Yuzuru Inaba