Abstract: A mounting apparatus including: a holding portion capable of holding and releasing an electronic component including a plurality of electrodes; a movement mechanism configured to move the holding portion; a coating portion in which a coating object to be applied onto the plurality of electrodes is set; and a controller configured to control the holding portion to hold the electronic component, control the movement mechanism to move the holding portion to a position above the coating portion, control the holding portion to release the electronic component above the coating portion so that the coating object is applied onto the electrodes, control the holding portion to hold the released electronic component again, control the movement mechanism to move the holding portion to a position above one of a substrate and another electronic component, and control the electronic component to be mounted on one of the substrate and the another electronic component.

Abstract: Methods and apparatus for controlling power distribution in a substrate processing system are provided. In some embodiments, a substrate processing system including a process chamber having a substrate support and a processing region disposed above the substrate support; a first conduit disposed above the processing region to provide a portion of a first toroidal path that extends through the first conduit and across the processing region; a second conduit disposed above the processing region to provide a portion of a second toroidal path that extends through the second conduit and across the processing region; an RF generator coupled to the first and second conduits to provide RF energy having a first frequency to each of the first and second conduits; an impedance matching network disposed between the RF generator and the first and second conduits; and a power divider to control the amount of RF energy provided to the first and second conduits from the RF generator.

Abstract: There are preliminarily prepared element characteristic information 12 that is obtained by individually, previously measuring emission characteristics of a plurality of LED elements and resin coating information 14 that makes a coating quantity of resin appropriate for obtaining an LED package exhibiting a specified emission characteristic correlated with the element characteristic information. A map preparation processing section 74 prepares, for each substrate, map data 18 that correlate mounting position information 71a showing positions of LED elements mounted on the substrate by a component mounting device M1 with the element characteristic information 12. An emission characteristic inspection device M7 inspects finished products coated with a resin, and inspection results are fed back to the resin coating device M4. Resin coating information M14 is updated according to the inspection results.

Abstract: According to one embodiment, there is provided a coaxial cable that transmits radio frequency power. The coaxial cable includes an inner tube, an outer tube, and an insulating support member. The inner tube is made of a conductor. The outer tube is disposed outside the inner tube coaxially with the inner tube and is made of a conductor. The insulating support member is disposed between the inner tube and the outer tube. Cooling gas flows into at least one of a first space inside the inner tube and a second space between the inner tube and the outer tube.

Abstract: This invention provides processes and apparatus for enhancing the appearance of food products. The browning agents are applied or dispensed onto food products (52) during their manufacture by food-grade controlled-droplet dispensing heads (62a, 62b) (or head). In preferred embodiments, the dispensing heads (62a, 62b) are controlled by a controller, such as a programmed PC-type computer, in dependence on sensor data, such as electromechanical, optical, or image sensor (54) data. The controller and sensors operate so that different food items have selected browning agents properly applied or dispensed without waste or overspray. The invention also provides food products (53) which have been enhanced according to the provided processes and apparatus with browning agents.

Abstract: A chemical bath deposition method and a system are presented to prepare different thin films on plane substrates. In particular, they are useful to deposit CdS or ZnS buffer layers in manufacture of thin film solar cells. This method and the deposition system deposit thin films onto vertically travelling plane workpieces delivered by a conveyor belt. The thin films are deposited with continuously spraying the reaction solutions from their freshly mixed styles to gradually aged forms until the designed thickness is obtained. The substrates and the solutions are heated to a reaction temperature. During the deposition processes, the front surfaces of the substrates are totally covered with the sprayed solutions but the substrate backsides are remained dry. The reaction ambience inside the reactor can be isolated from the outside atmosphere. The apparatus is designed to generate a minimum amount of waste solutions for chemical treatments.

Abstract: The disclosure provides a device and method used to produce bulk single crystals. In particular, the disclosure provides a device and method used to produce bulk single crystals of a metal compound by an elemental reaction of a metal vapor and a reactant gas by an elemental reaction of a metal vapor and a reactant gas.

Abstract: The invention includes inserting an object to be processed into a processing vessel, which can be maintained vacuum, and making the processing vessel vacuum; performing a sequence of forming a ZrO2 film on a substrate by alternately supplying zirconium source and an oxidizer into the processing vessel for a plurality of times and a sequence of forming SiO2 film on the substrate by alternately supplying silicon source and an oxidizer into the processing vessel for one or more times, wherein the number of times of performing each of the sequences is adjusted such that Si concentration of the films is from about 1 atm % to about 4 atm %; and forming a zirconia-based film having a predetermined thickness by performing the film forming sequences for one or more cycles, wherein one cycle indicates that each of the ZrO2 film forming sequences and the SiO2 film forming sequences are repeated for the adjusted number of times of performances.

Abstract: A powder spraycoating control system and its combination with a powder pump or with a powder spraycoating unit. The control system contains an controller programmed to alternatingly operate a powder spraycoating unit in turn containing an injector serving as the powder pump or a powder spraycoating unit containing a dense phase powder pump serving as the powder pump.

Abstract: A film forming apparatus for forming a film on an object includes: a processing container; gas supply means, having gas jet ports, respectively; a holding means for holding the object; a drive mechanism for moving the holding means relative to the gas jet ports; and a control means which, when repeating P times a cycle, consisting of a supply period for supplying a gas and a supply stop period during which the supply of the gas is stopped, performs control so that as viewed from the center of the object, a gas supply starting position is sequentially shifted in the circumferential direction of the object for every cycle in such a manner that the entire circumference of the object to be processed is divided into K segments (K=P), K being an arbitrary division number, and the gas supply starting position is shifted by one segment for every cycle.

Abstract: A system comprises a slot die including an applicator slot extending about a width of the slot die, wherein the applicator slot is in fluid communication with a fluid flow path through the slot die, and a plurality of actuators spaced about the width of the slot die, wherein each actuator in the plurality of actuators is operable to adjust a cross-directional thickness of the fluid flow path at its respective location to provide a local adjustment of fluid flow through the applicator slot. The system further comprises a controller configured to set the position of each actuator according to one of a plurality of discrete settings for operation of the slot die. The controller is further configured to, using fluid dynamics and a digital model of the die, predict a set of discrete settings from the plurality of discrete settings corresponding to a preselected cross-web profile for the extrudate.

Abstract: An apparatus includes a carrier rotatable about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer and a surface characterization tool which is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation. The surface characterization tool is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation and is further adapted to produce characterization signals over the plurality of positions on at least a portion of the carrier and/or on at least a portion of said major surface of the wafer as the carrier rotates.

Abstract: A wafer-processing apparatus includes: eight or ten reactors with identical capacity for processing wafers on the same plane, constituting four or five discrete units, each unit having two reactors arranged side by side with their fronts aligned in a line; a wafer-handling chamber including two wafer-handling robot arms each having at least two end-effectors; a load lock chamber; and a sequencer for performing, using the two wafer-handling robot arms, steps of unloading/loading processed/unprocessed wafers from/to any one of the units, and steps of unloading/loading processed/unprocessed wafers from/to all the other respective units in sequence while the wafers are in the one of the units.

Abstract: Technologies are generally described for a component, a method to form a component and/or a system configured to form a component. In an example, the method to form a component may include placing a first layer including a conductive material on a support. The method may include placing a second layer, including the conductive material and oxygen, on the first layer. The method may include placing a third layer, including tellurium and oxygen, on the second layer. The method may include placing a fourth layer, including tin and tellurium, on the third layer. In an example, placing of the fourth layer on the third layer may include placing a fifth layer including tellurium on the fourth layer, placing a sixth layer including tin on the fifth layer, placing an seventh layer including tellurium on the sixth layer and annealing the fifth, sixth, and seventh layers to form the fourth layer.

Abstract: A system for dispensing fluid comprises a first pumping device in communication with, and for supplying a first fluid to, a first pump outlet, a first fluid communication dispensing line for communicating the first fluid from the first pump outlet to a dispensing device, a second pumping device in communication with, and for supplying a second fluid to, a second pump outlet, and a second fluid communication dispensing line for communicating the second fluid from the second outlet to a second dispensing device. A supply sub-system causes the first pumping device to supply the first fluid to the first pump outlet and the second pumping device to supply the second fluid to the second pump outlet. The first and second pumping devices are mechanically coupled such that, when one of the pumping device supplies fluid to a pump outlet, fluid is drawn into the other pumping device through an inlet.

Abstract: A single-wafer, chemical vapor deposition reactor is provided with hydrogen and silicon source gas suitable for epitaxial silicon deposition, as well as a safe mixture of oxygen in a non-reactive gas. Methods are provided for forming oxide and silicon layers within the same chamber. In particular, a sacrificial oxidation is performed, followed by a hydrogen bake to sublime the oxide and leave a clean substrate. Epitaxial deposition can follow in situ. A protective oxide can also be formed over the epitaxial layer within the same chamber, preventing contamination of the critical epitaxial layer. Alternatively, the oxide layer can serve as the gate dielectric, and a polysilicon gate layer can be formed in situ over the oxide.

Abstract: The present invention concerns a system and device for self-tanning of the type comprising a booth (2) in which two lateral walls (5) have one or more lamps (52) protected by gratings (51) arranged to warm the area inside the booth and to radiate the skin of a person in the booth. The booth is provided with a spraying device (11) for nebulizing a tanning substance. The device comprises a Second control panel (6) connected to a means of management envisaged for activating and governing the diverse functions of the device under the control of an operator or of a user. The system comprises a series of operative phases which envisage, for a person who undergoes a self-tanning session: entering the booth; pressing start on the control panel; the lamps switching on for a preset time and switching off; a tanning solution being sprayed, followed by the lamps being switched on a second time to dry the tanning solution; the lamps being switched off; the person leaving the booth.

Abstract: Techniques related to nanocomposite dielectric materials are generally described herein. These techniques may be embodied in apparatuses, systems, methods and/or processes for making and using such material. An example process may include: providing a film having a plurality of nanoparticles and an organic medium; comminuting the film to form a particulate; and applying the particulate to a substrate. The example process may also include providing a nanoparticle film having nanoparticles and voids located between the nanoparticles; contacting the film with a vapor containing an organic material; and curing the organic material to form the nanocomposite dielectric film. Various described techniques may provide nanocomposite dielectric materials with superior nanoparticle dispersion which may result in improved dielectric properties.

Abstract: A manufacturing method of an electrode of a solar cell is provided. The manufacturing method of the electrode of the solar cell includes following steps. A laser doping process is performed to form a selective emitter on a substrate. A laser marking process is performed to form alignment markers on the substrate. The laser doping process and the laser marking process are performed in a same process chamber. An electrode screen printing process is performed to form an electrode on the selective emitter according to the alignment markers. Relative displacement between the alignment markers and the laser doping area (the selective emitter) is avoided so as to reduce the error of the subsequent screen printing process.

Abstract: A system having a print head for depositing material on a piezoelectric array, where the print head and array are moveable with respect to each other, and a computer for controlling movement of the print head and array with respect to each other to locations along the array, and controlling the print head to dispense the material onto the array at such locations. The print head deposits a pre-determined amount of material in one of dots, or in a line with movement of the print head and array with respect to each other. The system enables deposit of conductive material for electrical connections to array elements. Non-conductive polymer material may be deposited on the array before depositing conductive material to create barriers avoiding unintended connection of array elements by the conductive material. The system may also be used for fabricating a piezoelectric array by depositing electro-ceramic material.

Abstract: Systems and methods for determining one or more characteristics of a specimen using radiation in the terahertz range are provided. One system includes an illumination subsystem configured to illuminate the specimen with radiation. The system also includes a detection subsystem configured to detect radiation propagating from the specimen in response to illumination of the specimen and to generate output responsive to the detected radiation. The detected radiation includes radiation in the terahertz range. In addition, the system includes a processor configured to determine the one or more characteristics of the specimen using the output.

Abstract: Hardmask films having high hardness and low stress are provided. In some embodiments a film has a stress of between about ?600 MPa and 600 MPa and hardness of at least about 12 GPa. In some embodiments, a hardmask film is prepared by depositing multiple sub-layers of doped or undoped silicon carbide using multiple densifying plasma post-treatments in a PECVD process chamber. In some embodiments, a hardmask film includes a high-hardness boron-containing film selected from the group consisting of SixByCz, SixByNz, SixByCzNw, BxCy, and BxNy. In some embodiments, a hardmask film includes a germanium-rich GeNx material comprising at least about 60 atomic % of germanium. These hardmasks can be used in a number of back-end and front-end processing schemes in integrated circuit fabrication.

Abstract: A coating system for coating an Insertable Medical Device (IMD) with one or more drugs is disclosed. The coating system includes a spray nozzle unit for coating the IMD with one or more drugs. The IMD includes a guiding member, a coating member and a supporting member. The IMD is passed through a protection tube such that the guiding member is located within the protection tube and an end of the supporting member is connected to a holder to expose the coating member of the IMD to the spray nozzle unit. The protection tube is received by a mandrel fixture which includes a circular disc for holding and rotating the protection tube and the IMD within the protection tube. When the protection tube along with the IMD is rotated, the spray nozzle unit coats the coating member of the IMD with the one or more drugs.

Abstract: A method of dispensing a flowable conductive paste onto a greensheet from a dispensing apparatus comprising an orifice member having first and second surfaces and a bore therethrough between the surfaces, a pressurized chamber adjacent the orifice member first surface containing the paste, and a punch having a face movable through the orifice member bore. The method comprises positioning the punch outside the orifice member bore such that the punch face is spaced from the orifice member first surface, flowing a desired amount of paste onto the punch face, moving the paste on the punch face through the orifice member bore until the punch face extends beyond the orifice member second surface, and contacting the workpiece with the paste while still on the punch face to deposit the paste on the greensheet.

Abstract: Powder spreaders suitable for use with layered manufacturing processes are disclosed in which a strip of flexible material of a width which spans the powder bed is used to spread, level, and, optionally, compact deposited powder to form a layer of the powder bed. The strip surface moves relative to the deposited powder it is spreading as the working portion of the strip, i.e., the portion of the strip that is in contact with the powder, traverses across the powder bed so that it can provide lift to the powder in front of it and, optionally, compaction to the powder below it. The working portion of the strip can be configured to have its leading and trailing surface contours to be different from one another, and, optionally, to have these contours and its bottom edge contour be independently adjustable. Layered manufacturing systems comprising such powder spreaders are also disclosed.

Abstract: There are provided a substrate processing apparatus and a reaction tube for processing a substrate. The substrate processing apparatus comprises a process chamber configured to accommodate a substrate and process the substrate, a heater configured to heat the substrate, a gas supply part configured to supply a gas to an inside of the process chamber, a quartz reaction tube installed in the alloy reaction tube and a purge gas supply part configured to supply a purge gas to a gap formed between the alloy reaction tube and the quartz reaction tube. The process chamber comprises an alloy reaction tube made of a material comprising at least molybdenum (Mo) and cobalt (Co) and excluding aluminum (Al).

Abstract: A depositing apparatus for forming a thin film includes a source container in which a source material to be deposited on a substrate is accommodated in a solid or liquid state; an evaporation chamber which couples and communicates with the source container above the source container, and through which an evaporated source material from the source container passes; a spraying hole which is formed on a top of the evaporation chamber, and sprays upward the evaporated source material passed through the evaporation chamber; a first heater which is provided above the source material inside the evaporation chamber or the source container, and supplies heat to the source material to evaporate the source material accommodated in the source container; and a block plate is provided above the first heater inside the evaporation chamber.

Abstract: A move mechanism for horizontally moving a target object in an accelerating manner, includes a moving unit configured to be horizontally moved in an accelerating manner, a plate part arranged on the moving unit and supported by the moving unit at a substantially center-of-gravity height position, and a mirror part configured to reflect a laser beam for measuring a position, the mirror part being connected to the plate part such that a center-of-gravity height position of the mirror part is arranged at the substantially center-of-gravity height position of the plate part.

Abstract: A coating end effector may be carried by a robot. A plasma spray head is mounted by a joint to the end effector. A plurality of actuators couple the end effector and plasma spray head to provide articulation of the joint. The apparatus may be used to coat an airfoil cluster of a gas turbine engine. The coating may include passing the head between the airfoils.

Abstract: A semiconductor manufacturing apparatus includes: a plurality of reaction chambers into which wafers are introduced and deposition process is performed; a material gas supply mechanism that includes a plurality of material gas supply lines that respectively supply a material gas to the plurality of reaction chambers and a flow rate control mechanism that controls a flow rate of the marital gas in the material gas supply lines; a carrier gas supply mechanism that includes a plurality of carrier gas supply lines that respectively supplies a carrier gas into the plurality of reaction chambers; and a material gas switching mechanism that intermittently opens and closes the plurality of material gas supply lines respectively so that at least one of the plurality of material gas supply lines comes to be in an opened state at a same time, and sequentially switches the reaction chamber to which the material gas is supplied.

Abstract: The invention relates to a cathode for electrolytic processes provided with a catalytic coating based on ruthenium crystallites with highly controlled size falling in a range of 1-10 nm. The coating can be produced by physical vapour deposition of a ruthenium or ruthenium oxide layer.

Abstract: To provide a substrate processing system which can cause different display portions to output different displays, and cause different operations to be carried out from different operation screens. A substrate processing system, on login information of a user being input from a main display device, refers to the login information, a user group parameter, with which is set a group to which the user belongs, and an authority parameter, which sets an authority of the group, and causes the main display device to display a main operation screen corresponding to the user, while it, on login information of a user being input from an external operating apparatus, causes an external display device to display an external parameter setting screen for setting an authority parameter of a group to which the user belongs, or to display an external operation screen corresponding to the group to which the user belongs.

Abstract: A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.

Abstract: Provided are atomic layer deposition apparatus and methods including multiple gas distribution plates including stages for moving substrates between the gas distribution plates.

Abstract: A substrate treatment method of performing treatment on a substrate on which a pattern mask has been formed by exposure and developing treatment to improve roughness of the pattern mask includes the processes of: mounting the substrate on a stage in a treatment container; and repeating a plurality of times steps of supplying a solvent gas to a center portion of the substrate while exhausting the solvent gas from a periphery of the substrate to swell the pattern mask, and then supplying a drying gas for drying the solvent supplied to the substrate to the center portion of the substrate while exhausting the drying gas from the periphery of the substrate.

Abstract: The temperature of a substrate is elevated rapidly while improving the temperature uniformity of the substrate. The substrate is loaded into a process chamber, the loaded substrate is supported on a first substrate support unit, a gas is supplied to the process chamber, the temperature of the substrate supported on the first substrate support unit is elevated in a state of increasing the pressure in the process chamber to higher than the pressure during loading of the substrate or in a state of increasing the pressure in the process chamber to higher than the pressure during processing for the surface of the substrate, the substrate supported on the first substrate support unit is transferred to the second substrate support unit and supported thereon after lapse of a predetermined time, and the surface of substrate is processed while heating the substrate supported on the second substrate support unit.

Abstract: A film formation method, in a vertical batch CVD apparatus, is preset to repeat a cycle a plurality of times to laminate thin films formed by respective times. The cycle alternately includes an adsorption step of adsorbing a source gas onto a surface of the target substrates and a reaction step of causing a reactive gas to react with the adsorbed source gas. The adsorption step is arranged to make a plurality of times a supply sub-step of performing supply of the source gas to the process field with an intermediate sub-step of stopping supply of the source gas to the process field interposed therebetween, while maintaining a shut-off state of supply of the reactive gas. The reaction step is arranged to continuously perform supply of the reactive gas to the process field, while maintaining a shut-off state of supply of the source gas.

Abstract: The invention provides systems and methods for manufacture of a non-homogeneous article using a 3D voxel-based model of the article and a rapid prototyping device. Use of a voxel-based model provides processing advantages and offers improved realism of the manufactured object with regard to non-homogeneous (i) color, (ii) translucency, and/or (iii) hardness, for example.

Abstract: An apparatus (1) and method for inscribing a cable (2) moving along its axis (y) are described. The apparatus (1) comprises a jet/beam generator (3) for generating at least one jet/beam (A) which produces the inscription. Furthermore, the apparatus (1) comprises a movement unit which is prepared for moving the at least one jet/beam (A) during the inscription process in the direction (a) transverse to the cable axis (y). The movement unit may adjust the direction of movement (a) continuously in such a way that the speed component (VSy) of the jet/beam movement in the region of the cable (2) in the direction of the cable axis (y) corresponds to the speed (VL) of the cable (2).

Abstract: There are preliminarily prepared element characteristic information 12 that is obtained by individually, previously measuring emission characteristics of a plurality of LED elements and resin coating information 14 that makes a coating quantity of resin appropriate for obtaining an LED package exhibiting a specified emission characteristic correlated with the element characteristic information. A map preparation processing section 74 prepares, for each substrate, map data 18 that correlate populating position information 71 a showing a position of an LED element populated on the substrate by a component populating machine Ml with the element characteristic information 12. According to the map data 18 and the resin coating information 14, a resin coating machine M4 coats the respective LED elements populated on the substrate with an appropriate coating quantity of resin.

Abstract: The invention is directed to enzyme immobilization compositions comprising: one or more enzymes, a humectant, an acrylic-based monomer, a water-soluble organic photo-initiator and a water-soluble acrylic-based cross-linker in a substantially homogeneous aqueous mixture. The invention is also directed to methods for forming sensors comprising such compositions and to apparati for forming arrays of immobilized layers on an array of sensors by dispensing such compositions onto a substrate.

Abstract: A system for in-line substrate processing includes a horizontal rail structure at a first height. A substrate transfer module next to the rail structure receives substrates ready for processing and delivers substrates after processing. Process modules disposed along the rail structure enable process operations on the substrates. A substrate loader moves along the rail structure and transfers substrates to and from the substrate transfer module and to and from the process modules. A controller manages operation of the system.

Abstract: A substrate processing apparatus and a method for manufacturing a semiconductor device whereby foreign matter can be prevented from being adsorbed on the substrate, by suppressing agitation of foreign matter present in the processing chamber. The substrate processing apparatus comprises a processing chamber for processing a substrate; a processing gas feeding line for feeding a processing gas into the processing chamber; an inert gas feeding line for feeding an inert gas into the processing chamber; an inert gas vent line provided in the inert gas feeding line, for exhausting the inert gas fed into the inert gas feeding line without feeding the inert gas into the processing chamber; a first valve provided in the inert gas feeding line, on a downstream side of a part where the inert gas vent line is provided in the inert gas feeding line; a second valve provided in the inert gas vent line; and an exhaust line that exhausts an inside of the processing chamber.

Abstract: A paint line includes a plurality of modular manufacturing stations positioned in series and defining a forward transport direction. Each modular manufacturing station includes an article transportation device for moving at least one carrier through the modular manufacturing station. At least one of the modular manufacturing stations includes a piece of paint application equipment. A control system is in communication with each article transportation device and configured to independently move the carrier of each modular manufacturing station according to a unique operation pattern. The control system is also configured to index the carrier of each modular manufacturing station as the carrier traverses to a contiguous modular manufacturing station.

Abstract: A method for forming a conductive trace on a panel can comprise: determining a height between a sensor and a surface of the panel, adjusting the height if the height does not equal a desired height by creating relative motion between the nozzle and the panel, creating relative motion between the nozzle and the panel in the y direction, and dispensing a conductive ink from the nozzle onto the surface of the panel from a piston dispenser at a rate controlled by a flow regulator to form the conductive trace. The sensor can be in operable communication with a controller and be located a distance of less than or equal to 5 mm from a point where a nozzle dispenses the conductive ink onto the panel. The conductive trace has a uniform width.

Abstract: A deposition apparatus includes a deposition chamber and a deposition material source. An electron beam source is positioned to direct a first electron beam to vaporize a portion of the deposition material. A first electrode is provided for generating a primary plasma from the deposition material source. A second electrode is provided for generating a secondary plasma and further accelerating ions from the primary plasma. A bias electric potential is applied to the workpiece to draw ions from the secondary plasma to the workpiece. A control system may be coupled to the electron beam source, the bias voltage source, and power supplies for the first and second electrodes.

Abstract: Disclosed are a method and system of rendering clear texturing on a media substrate. According to one exemplary method, one or more parameters are provided by a user, via a UI (User Interface), to control the clear texturing process, wherein the parameters are associated with, but are not limited to, media sheet area coverage, object type the clear texturing process is to be performed on and maximum/minimum percentage of clear material to be used for rendering the clear texturing.

Abstract: A coating treatment apparatus includes: a rotating and holding part; a nozzle supplying a coating solution; a moving mechanism moving the nozzle; and a control unit that controls the rotating and holding part, the nozzle, and the moving mechanism to supply the coating solution onto a central portion of the substrate and rotate the substrate at a first rotation speed, then move a supply position of the coating solution from a central position toward an eccentric position of the substrate with the substrate being rotated at a second rotation speed lower than the first rotation speed while continuing supply of the coating solution, then stop the supply of the coating solution with the rotation speed of the substrate decreased to a third rotation speed lower than the second rotation speed, and then increase the rotation speed of the substrate to be higher than the third rotation speed.

Abstract: A seed treatment system having a central computerized data store, a user interface, and network connections from the data store to a plurality of retail facilities and a plurality of agricultural produce suppliers. Each retail facility having a seed treatment system configured to uniformly treat batches of seeds with any of a variety of precisely measured chemical formulations. The seed treatment apparatus having a treatment applicator coupled to a plurality of dispensing stations. Each dispensing stations having a pump in fluid communication with a container disposed on a scale. The pump and scale of each dispensing station coupled to a system controller. The system controller is coupled to the data store, configured to provide on-demand agricultural seed treatments to the applicator and chemical usage data from each station to the data store. The data store configured to provide centralized remote monitoring inventory control, supply chain monitoring, and container recycling compliance.

Abstract: System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse.