Abstract: According to certain techniques, a system for coating a substrate includes a preparation component, a coating component, and a curing component. The preparation component includes a plasma applicator that irradiates the substrate with plasma to form a prepared substrate. The coating component coats the prepared substrate with a coating medium to form a coated substrate. The coating component includes a coating head that receives the coating medium from a reservoir and applies the coating medium to the prepared substrate to form the coated substrate. The coating component includes a vacuum that removes an excess amount of the coating medium from the coated substrate. The curing component includes at least one ultraviolet emitter and irradiates the coated substrate with ultraviolet energy to form a cured substrate.

Abstract: The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.

Abstract: Methods for coating a target surface of an article having one or more passageways include fluidly connecting a temperature controlled fluid to at least one passageway, passing the temperature controlled fluid through the at least one passageway, wherein the temperature controlled fluid at least partially controls a temperature profile of the article, and coating the target surface, wherein the temperature profile of the article at least partially controls a microstructure of the coating.

Abstract: An apparatus for deposition of a plurality of elements onto a solar cell substrate comprising: a housing; a transporting apparatus to transport said substrate in and out of said housing; a first tubing apparatus to deliver powders of a first elements to said housing wherein said first tubing apparatus is comprised of a first feeder tube located outside of said housing and joined to said housing; a first source material tube located outside of said housing and joined to said feeder tube; a valves located inside of said first source material tube sufficient to block access between said first source material tube and said first feeder tube; a first heating tube located inside of said housing and connected to said first feeder tube; a second tubing apparatus to deliver powders of a second elements to said housing wherein said second tubing apparatus is comprised of a second feeder tube located outside of said housing and joined to said housing; a second source material tube located outside of said housing and joi

Abstract: One or more techniques or systems for ion implantation are provided herein. A pressure control module is configured to maintain a substantially constant pressure within an ion implantation or process chamber. Pressure is maintained based on an attribute of an implant layer, pressure data, feedback, photo resist (PR) outgassing, a PR coating rate, a space charge effect associated with the implant layer, etc. By maintaining pressure within the process chamber, effects associated with PR outgassing are mitigated, thereby mitigating neutralization of ions. By maintaining charged ions, better control over implantation of the ions is achieved, thus allowing ions to be implanted at a desired depth.

Abstract: An open-bottomed reactor cell for wet processing of substrates can be configured to confine a process liquid to an area under the cell (processing the “internal site”), or alternatively to exclude the process liquid from most of the area under the cell (processing the “external site”) without physical contact between the cell and substrate. A slight underpressure or overpressure maintained inside the main cavity of the cell causes the liquid to form a meniscus in the narrow gap between the cell and substrate rather than flowing outside the desired process area. An area under a peripheral channel outside the main cavity of the cell is shared by both the internal site and the external side, allowing the entire substrate to be processed.

Abstract: Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ions species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (“CPC”) superconductor, or boson energy transmission system.

Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a vacuum chamber having a dome and a floor. A substrate support is disposed inside the vacuum chamber. A plurality of thermal lamps are arranged in a lamphead and positioned proximate the floor of the vacuum chamber. A reflector is disposed proximate the dome, where the reflector and the dome together define a thermal control space. The substrate processing apparatus further includes a plurality of power supplies coupled to the thermal lamps and a controller for adjusting the power supplies to control a temperature in the vacuum chamber.

Abstract: A substrate liquid processing apparatus includes a substrate holding unit configured to hold and rotate a substrate; a processing liquid nozzle configured to supply a processing liquid to the substrate; a cylindrical liquid receiving cup configured to receive and recover the processing liquid scattered from the substrate; a housing configured to accommodate the substrate holding unit and the liquid receiving cup; a cup exhaust path connected to the liquid receiving cup to exhaust atmosphere inside the liquid receiving cup; a cup exhaust path pressure sensor configured to detect pressure in the cup exhaust path; a housing pressure sensor configured to detect pressure in the housing outside the liquid receiving cup; and a control unit configured to alert when a difference between a value detected by the housing pressure sensor and a value detected by the cup exhaust path pressure sensor is a predetermined determination reference value or less.

Abstract: In some aspects, an ion implantation system is disclosed that includes an ion source for generating a ribbon ion beam and at least one corrector device for adjusting the current density of the ribbon ion beam along its longitudinal dimension to ensure that the current density profile exhibits a desired uniformity. The ion implantation system can further include other components, such as an analyzer magnet, and electrostatic bend and focusing lenses, to shape and steer the ion beam to an end station for impingement on a substrate. In some embodiments, the present teachings allows the generation of a nominally one-dimensional ribbon beam with a longitudinal size greater than the diameter of a substrate in which ions are implanted with a high degree of longitudinal profile uniformity.

Abstract: Disclosed herein is a method of forming a coating, comprising applying a first coating to a substrate having a plurality of topographical features, planarizing a top surface of the first coating, and drying the coating after planarizing the top surface of the first coating. The first coating may be applied over the plurality of topographical features, and substantially liquid during application. The first coating may optionally be a conformal coating over topographical features of the substrate. The conformal coating may be dried prior to planarizing the top surface of the first coating and a solvent applied to the conformal coating, with the top surface of the conformal coating being substantially planar after application of the solvent. The coating may have a planar surface prior to the drying the first coating and the first coating may be dried without substantial spin-drying by modifying an environment of the first coating.

Abstract: A dispensing apparatus includes a dispensing unit having a main body, a channel through the main body, and a plurality of nozzles connected to the main body, the plurality of nozzles being configured to dispense fluid flowing in the channel, a gap sensor unit configured to determine size of gaps between adjacent nozzles in the dispensing unit, and a thermal expansion adjusting unit configured to thermally expand or contract the main body of the dispensing unit to adjust the gap size between adjacent nozzles to a predetermined size, based on the gap size determined by the gap sensor unit.

Abstract: A film forming apparatus includes a substrate holding unit holding substrates at intervals; a reaction chamber accommodating the substrate holding unit; a raw material gas supply pipe supplying a raw material gas of a thin film to the substrate; a support unit supporting the reaction chamber; a heating unit being disposed outside the reaction chamber and heating the substrates; a protection pipe including one end portion fixed to the support unit, being extended along an arrangement direction of the substrates between the substrate holding unit and the reaction chamber, and including a temperature measuring unit inserted therein; and a protrusion portion being provided on at least one of an outer surface of the protection pipe and an inner surface of the reaction chamber, and providing a gap between the outer surface of the protection pipe and the inner surface of the reaction chamber.

Abstract: A processing apparatus includes a processing chamber configured to accommodate a target object to be processed, gas supply paths provided in a corresponding relationship with the kinds of process gases supplied into the processing chamber, and valves respectively arranged in the gas supply paths to open and close the gas supply paths. The processing apparatus further includes valve drive units configured to independently drive the valves, sensor units configured to independently monitor opening and closing operations of the valves, and a control unit configured to determine operation statuses of the valves based on valve opening and closing drive signals transmitted to the valve drive units and/or valve opening and closing detection signals transmitted from the sensor units.

Abstract: Embodiments of heated substrate supports are provided herein, In some embodiments, a heated substrate support includes a support plate having a top surface and an opposite bottom surface; and a first heater disposed within the support plate, wherein the first heater is disposed beneath a mid-plane of the support plate, and wherein the first heater is disposed proximate a central zone of the support plate.

Abstract: A coloring system includes an assembly for retaining articles to be colored and an actuator for moving the assembly. The assembly can be translated horizontally, raised and lowered and rotated by the actuator. The coloring system may include a fluid control system that allows gas to be removed from a container of the assembly while the container is immersed in a liquid coloring agent.

Abstract: An ion implantation apparatus according to an embodiment includes an ion implantation unit, a position detection unit, a charge supply unit, a current value detection unit, and a determination unit. The ion implantation unit scans the surface of a substrate with an ion beam containing positively charged ions and implants the ions into the substrate. The position detection unit detects the scan position of the ion beam on the substrate. The charge supply unit generates a plasma, emits electrons contained in the plasma, and supplies the electrons to the substrate. The current value detection unit detects a current value that changes in accordance with the amount of electrons emitted by the charge supply unit. The determination unit determines the charge build-up state of the substrate based on a change in the current value, the change being accompanied by a change in the scan position.

Abstract: An electrode fabricating apparatus for a rechargeable battery according to the present invention includes: a vacuum chamber having an inner space; and a lithium depositor receiving a lithium source and having an evaporation unit heating and evaporating the lithium source, and a nozzle unit positioned on the evaporation unit and controlling an aperture ratio to control a deposition amount of lithium.

Abstract: An apparatus and method of applying lubricant to steel wire ropes, wherein the apparatus comprises a plurality of nozzles directed centrally towards a rope segment, the nozzles are connected to a compressor and a lubricant reservoir for enabling the dispensing of the lubricant therefrom. The apparatus is remotely controllable allowing quality, quantity and sequence of lubricant dispensed to be activated or deactivated remotely.

Abstract: A method for applying print to at least one chewing gum surface, the method including forming a chewing gum composition into at least one chewing gum sheet having at least one printable surface, the chewing gum sheet having a desirable thickness, providing a print roller, transporting the at least one chewing gum sheet towards the print roller via a transporting surface, providing a gap between the print roller and the transporting surface, the thickness of the at least one chewing gum sheet being greater than a height of the gap, moving the at least one chewing gum sheet through the gap, printing indicia on the chewing gum sheet via the print roller during the moving of the at least one chewing gum sheet through the gap, and compressing the at least one chewing gum sheet during the moving of the at least one chewing gum sheet through the gap, the compressing occurring simultaneously with the printing.

Abstract: An aspect of the present embodiment, there is provided a method of coating resist, including providing solvent on a substrate to be processed being set to be nearly still, and rotating the substrate to be processed to provide resist solution on the substrate to be processed from a resist supply nozzle in a state that a top edge of the resist supply nozzle is inserted into the solvent.

Abstract: Apparatus and methods of determining a position of a height sensor in a dispensing system. The dispensing system includes a dispenser, height sensor, camera, and a calibration device configured to receive a signal from the height sensor. The calibration device may include an optical sensor that generates an alignment signal in response to receiving light from the height sensor and/or a fiducial that causes the height sensor to generate the alignment signal in response to a detected height change. The alignment signal is used to automatically determine the position at which the height sensor is aligned with the calibration device. The position of the height sensor relative to a camera is determined by aligning the camera with the calibration device and recording its position. The recorded coordinates of the camera are compared to the coordinates of the height sensor when the height sensor is automatically aligned with the calibration device.

Abstract: A die-type coating device includes a supply roll, a die, a rewinding roll, web widthwise end position detection devices, and layer widthwise end position detection devices. The die includes a pair of inner deckles which adjust a coating width. The inner deckle is arranged at one of two end portions of the die and configured to be easily moved in the die in a longitudinal direction of the die. The die includes a drive device which drives and moves the inner deckles. The drive device is driven on a basis of information on both widthwise end positions of the web detected by the web widthwise end position detection devices and information on both widthwise end positions of the layer of the coating liquid or the coating layer detected by the layer widthwise end position detection devices so that respective positions of the inner deckles relative to the die are changed.

Abstract: Exemplary coating devices and methods are disclosed. An exemplary coating device may include an atomizer for applying a spray jet of a coating means or material to a component, at least one directing air nozzle for outputting shaping or directing air in order to shape the spray jet, and a temperature-control device for controlling the temperature of the directing air. The coating device may further include a control unit which activates the temperature-control device as a function of at least one operating variable of the atomizer in order to set a predetermined directing air temperature.

Abstract: A plasma processing apparatus includes a plasma generating device configured to generate a plasma within a processing vessel by using a high frequency wave generated by a microwave generator 41 including a magnetron 42 configured to generate the high frequency wave; detectors 54a and 54b configured to measure a power of a traveling wave that propagates to a load side and a power of a reflected wave reflected from the load side, respectively; and a voltage control circuit 53a configured to control a voltage supplied to the magnetron 42 by a power supply 43. Further, the voltage control circuit 53a includes a load control device configured to supply, to the magnetron 42, a voltage corresponding to a power calculated by adding a power calculated based on the power of the reflected wave measured by the detector 54b to the power of the traveling wave measured by the detector 54a.

Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.

Abstract: Disclosed is a plasma evaluation method that evaluates plasma P that forms a nitride film by an atomic layer deposition method. First, light emission from the plasma P generated from a gas G that contains nitrogen atoms and hydrogen atoms is detected. Then, evaluation of the plasma P is performed by using a result of comparing an intensity ratio between a first peak caused by hydrogen atoms and a second peak different from the first peak and caused by hydrogen atoms in an intensity spectrum of the detected light emission with a reference value calculated in advance from a relationship between the intensity ratio and an indicator that indicates a film quality of the nitride film.

Abstract: Working method for a system for partial mirroring of glass tubes and said system, made up by an tube supply facility, a chain where the mirroring is carried out in different fixed stations and a tube output facility, in which the main partial mirroring steps are the following: cleaning the glass tube sensitizing the surface washing optional activation or super-sensitization step washing plating washing drying in the case of external partial mirroring, the following steps are added: depositing the copper layer washing depositing anti-corrosion paint depositing mechanical and UV protective paint curing the paint external drying of the tube

Abstract: In accordance with an embodiment, a film thickness monitoring method includes applying light to a substrate, which is a processing target, in a semiconductor manufacturing process involving rotation of the substrate, detecting reflected light from the substrate, and calculating a thickness of a film on the substrate. The thickness of the film is calculated from intensity of the reflected light detected in an identified time zone in which incident light passes a desired region on the substrate during the semiconductor manufacturing process.

Abstract: An apparatus for printing a conductive ink onto a plastic panel including an articulatable arm having an end that opposes a surface of the panel. A nozzle is mounted via a nozzle height actuator to the end of the arm, and the nozzle is coupled to a source of conductive ink. A flow regulator, coupled to the ink source, regulates the flow rate of ink out of the nozzle and is controlled by the controller. A height sensor is configured to output a height signal relative to the surface and the controller, which is coupled to the arm, the flow regulator, the nozzle height actuator and the sensor, is configured to control the arm, flow regulator, nozzle height actuator, and speed of nozzle movement such that a conductive trace of predetermined height and width is applied to the substrate.

Abstract: A raw material vaporizing and supplying apparatus including a source tank in which a raw material is stored, a raw material gas supply channel through which raw material gas is supplied from an internal space portion of the source tank to a process chamber, a pressure type flow rate control system which is installed along the way of the supply channel, and controls a flow rate of the raw material gas which is supplied to the process chamber, and a constant temperature heating unit that heats the source tank, the supply channel, and the pressure type flow rate control system to a set temperature, wherein the raw material gas generated in an internal space portion of the source tank is supplied to the process chamber while the pressure type flow rate control system performs flow rate control.

Abstract: Disclosed is a method of producing an insulated electric wire, in which a primary coating layer including at least an enamel-baking layer is formed on a metallic conductor to form a primary coated electric wire, and a secondary coating layer is extrusion-formed on the primary coating layer of the primary coated electric wire. The method includes an electric wire pre-heating process where a surface of the primary coating layer is pre-heated using an electric wire pre-heating unit, and a resin extrusion process where a secondary coating layer is extrusion-formed on the pre-heated primary coating layer using a resin extrusion unit. Further disclosed is an apparatus for producing an insulated electric wire.

Abstract: A device to apply and confirm the proper dispensation of conductive glue includes a nozzle vacuum-lifting a photoelectric element having a bonding surface, a base defining a receiving recess, a conductive glue received in the recess, a driver, and a controller controlling the driver to drive the nozzle to dip the photoelectric element into the conductive glue. A first camera module positioned on the base and aimed at the bonding surface takes images of the bonding surface. The controller is in communication with the first camera module and processes the images to determine if the amount of conductive glue and the spread area on the bonding surface are correct and, if yes, control the driver to pass on the photoelectric element, or if no, control the driver to reject the photoelectric element.

Abstract: There are provided a susceptor having a recessed wafer mounting section, in which a semiconductor wafer is mounted and which is configured to include a circular bottom portion and a side wall portion, on an upper surface, a reaction chamber in which the susceptor is provided, an imaging unit that is provided above the reaction chamber and images the semiconductor wafer and the wafer mounting section, and an image analysis unit that analyzes the deviation of the semiconductor wafer from the wafer mounting section on the basis of an image captured by the imaging unit.

Abstract: A mobile printing apparatus includes a chassis; a first wheel rotatably mounted on the chassis; a second wheel rotatably mounted on the chassis; a motor for rotating the first wheel; an encoder for monitoring an amount of rotation; a first photosensor array; and an array of marking elements disposed proximate the first photosensor array.

Abstract: An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.

Abstract: An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate through a vacuum processing region, a plasma deposition source for depositing the thin film on the substrate in the vacuum processing region, wherein the plasma deposition source comprises an electrode, and an actuator configured for adjusting the distance between the electrode and the outer surface.

Abstract: Provided is a raw material gas supply device for use in a film forming apparatus, which includes: a raw material container configured to accommodate a solid raw material; a carrier gas supply unit configured to supply a carrier gas to the container; a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material from the container to the film forming apparatus; a flow rate measurement unit configured to measure a flow rate of the vaporized raw material; a pressure control unit configured to control an internal pressure of the container; and a control unit configured to control the pressure control unit to increase the internal pressure of the container when the measured flow rate of the vaporized raw material is higher than a predetermined target value, and to decrease the internal pressure when the measured flow rate is lower than the target value.

Abstract: Provided is a raw material gas supply device which includes: a raw material container; a carrier gas supply unit configured to supply a carrier gas into the container via a carrier gas flow path; a first flow rate measurement unit configured to measure a flow rate of the carrier gas flowing therethrough and output the same as a first flow rate measurement value; a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material into a film forming apparatus; a second flow rate measurement unit configured to measure a flow rate of the raw material gas flowing therethrough and output the same as a second flow rate measurement value; and a flow rate calculation unit configured to calculate a difference between the first and second flow rate measurement values and to convert the difference into a vaporization flow rate of the raw material.

Abstract: Herein is an apparatus for overlaying a media stripe onto a media stripe previously applied to a surface (i.e., “old media strip”). The apparatus includes a mobile frame housing controls and an applicator head having a spray nozzle that applies new media. The applicator head also includes sensors and/or a camera that cast a cone of vision onto a surface. The cone of vision is positioned tangentially to a first edge of the old media stripe. If while operating the apparatus, the applicator head moves and the new media stripe is not overlaid onto the old media stripe, the sensors and/or camera will direct an actuator arm (or similar) to reposition the applicator head and spray nozzle so that the new media stripe is once again sprayed on top of the old media stripe.

Abstract: A method for fabricating an organic light emitting display device includes forming a first electrode on a substrate; forming a pixel-defining film having an opening exposing the first electrode; forming an ink non-reactive solvent portion by discharging of an ink non-reactive solvent at the opening and forming an organic light emitting layer by discharging an organic light emitting ink on the ink non-reactive solvent portion; and forming a second electrode on the organic light emitting layer.

Abstract: The invention relates to a device (1) for coating workpieces, comprising a belt conveyor (2) drivable in rotation for transporting workpieces (13) to be coated, at least one paint spraying robot (6) and at least one surface spraying machine (8), wherein the paint spraying robot (6) is set up to coat side surfaces (14) and/or top surfaces (15) of the workpiece (13) and the surface spraying machine (8) is set up to coat the top surfaces (15) and/or side surfaces (14) of the workpiece (13).

Abstract: A glue spreading system includes a spreading unit and a control unit. The spreading unit includes a primary pressing roller and a spreading roller. The spreading roller is adjacent to the primary pressing roller. A thin film transports between the primary pressing roller and the spreading roller. The spreading roller is configured for spreading a glue layer on the thin film. An actual thickness of the glue layer is decided by a pressure of the primary pressing roller applied on the spreading roller. The control unit is configured for detecting the actual thickness of the glue layer, and compares the actual thickness with a preset thickness. The control unit controls the pressure of the primary pressing roller applying on the spreading roller according to thickness differences between the actual thickness and the preset thickness.

Abstract: A wafer processing system includes at least one metrology chamber, a process chamber, and a controller. The at least one metrology chamber is configured to measure a thickness of a first layer on a back side of a wafer. The process chamber is configured to perform a treatment on a front side of the wafer. The front side is opposite the back side. The process chamber includes therein a multi-zone chuck. The multi-zone chuck is configured to support the back side of the wafer. The multi-zone chuck has a plurality of zones with controllable clamping forces for securing the wafer to the multi-zone chuck. The controller is coupled to the metrology chamber and the multi-zone chuck. The controller is configured to control the clamping forces in the corresponding zones in accordance with measured values of the thickness of the first layer in the corresponding zones.

Abstract: Techniques disclosed herein include apparatus and processes for real time process control of the Polymer Dispersion Index (PDI) during polymerization processes. By tuning this chain length distribution in real time, a resulting polymer can have predetermined physical properties such as thickness, physical yield strength, decomposition time, thermal stability, etc. Techniques herein can dynamically control chain length distribution through use of a mass density measurement device located within a processing chamber and providing real time feedback of polymer growth. Chamber parameters can be controlled or modified before and during polymerization based on mass density feedback. Such chamber parameters can include pressure, temperature, chemistry, and process gas flow rates and flow periods.

Abstract: A substrate processing method which is capable of enhancing productivity in manufacturing product substrates. In process chambers of an etching apparatus, etching is carried out on a substrate as an object to be processed, and dummy processing is carried out on at least one non-product substrate before execution of the etching. A host computer determines whether or not the dummy processing is to be executed. The host computer determines whether or not the interior of each of the process chambers and is in a stable state, and omits the execution of the dummy processing when it is determined that it is in the stable state.

Abstract: An aspect of the present invention provides an ejection volume correction method for an inkjet head, including: an arranging step of ejecting functional ink as ink droplets from nozzles of an inkjet head so as to discretely arrange the ink droplets on a front surface of a substrate; a contacting step of filling the functional ink in between a mold and the substrate by causing the mold to contact the ink droplets arranged on the front surface of the substrate; a curing step of curing the filled functional ink so as to generate a functional film ; a separating step of separating the mold from the functional film; a measuring step of measuring a thickness of the functional film; and a correcting step of correcting an ejection volume from the nozzles based on the measured thickness.

Abstract: There is provided a method for manufacturing an insulated wire, including at least: coating an outer periphery of a running wire with an insulation coating material discharged from a coating material discharging tank; baking the insulation coating material by an incinerator, the insulation coating material being used for coating the outer periphery of the running wire; and cooling the running wire by a cooling mechanism so that a temperature of the running wire before being coated with the insulation coating material, is a specific temperature, based on a temperature of the running wire detected by a temperature detector, wherein the coating, the baking, and the cooling are repeated.

Abstract: A method and apparatus for processing a semiconductor substrate is described. The apparatus is a process chamber having an optically transparent upper dome and lower dome. Vacuum is maintained in the process chamber during processing. The upper dome is thermally controlled by flowing a thermal control fluid along the upper dome outside the processing region. Thermal lamps are positioned proximate the lower dome, and thermal sensors are disposed among the lamps. The lamps are powered in zones, and a controller adjusts power to the lamp zones based on data received from the thermal sensors.

Abstract: An aligner includes a plurality of substrate rotators and a shaft member. Each substrate rotator includes a holder, a notch detector, an electromagnetic clutch and a driving belt. Each holder sucks the back surface of the substrate under vacuum and horizontally holds the substrate. Each notch detector detects a notch formed at the substrate, and supplies a detection result to the corresponding electromagnetic clutch as a detection signal. One end of the shaft member is connected to a motor. The shaft member is continuously rotated by the motor. Each electromagnetic clutch switches to a connection state in which rotational force of an inner periphery is transmitted to an outer periphery and a disconnection state in which rotational force of the inner periphery is transmitted to the outer periphery according to a detection signal supplied from the notch detector.