Abstract: A method for descaling a metal strip, in which the metal strip is guided in a direction of conveyance through at least two plasma descaling units, in which it is subjected to a plasma descaling, where the plasma descaling is followed directly or indirectly by an operation in which the metal strip is coated with a coating metal by hot dip galvanizing of the metal strip. The metal strip is coated with the coating metal by a vertical passage process. The coating metal is retained as a coating bath in a coating tank by an electromagnetic seal. The metal strip preheated by the plasma descaling is guided, without exposure to air, from the plasma descaling into a protective gas atmosphere of a continuous furnace necessary for the coating.

Abstract: Embodiments of the present invention generally include an apparatus for plasma cleaning and a method for plasma cleaning. The apparatus can include a lid body having a first surface for facing a pedestal during cleaning and a second surface opposite the first surface and substantially parallel to the first surface, the second surface having a first indentation sized to receive a magnet assembly, one or more handles coupled to the second surface of the lid body, and the magnet assembly resting in the first indentation. The method can include removing a sputtering target from the processing chamber, sealing the processing chamber, introducing a gas into the processing chamber, applying an RF bias to a pedestal within the processing chamber, maintaining the pedestal at a substantially constant temperature, and removing material from the pedestal to clean the pedestal.

Abstract: The present invention relates to a new degreasing composition comprising at least one levulinic acid ester according to general formula (I) CH3CO(CH2)2COOR1 (I) in which R1 is a linear or branched, saturated or unsaturated, aliphatic or aromatic, hydrocarbon radical having 2 to 56 carbon atoms, wherein said hydrocarbon radical is optionally hydroxysubstituted. The present invention also relates to a process for degreasing a metal surface comprising the step of contacting said metal surface with the composition of the present invention.

Abstract: An apparatus, system, and method for a Gigasonic Brush for cleaning surfaces is presented. One embodiment of the system includes an array of acoustic transducers coupled to a substrate where the individual acoustic transducers have sizes in the range of 9 um2 to 250,000 um2. The system may include a positioning mechanism coupled to at least one of a target surface or the array of acoustic transducers, and configured to position the array of acoustic transducers within 1 millimeter of a target surface. The system may also include a cleaning liquid supply arranged to provide cleaning liquid for coupling the array of acoustic transducers to the target surface. The system may further include a controller coupled to the array of acoustic transducers and configured to activate the array of acoustic transducers.

Abstract: A method of cleaning a low dielectric constant film in a lithographic process includes providing a dielectric film having thereover a resist composition, the dielectric film having a dielectric constant no greater than about 4.0, and stripping the resist composition to leave a substantially silicon-containing ash residue on the dielectric film. The method then includes contacting the ash residue with plasma comprising an ionized, essentially pure noble gas such as helium to remove the resist residue without substantially affecting the underlying dielectric film.

Abstract: Provided is a method of descaling a mask that quickly and effectively removes a material attached to the mask. The method includes: directing a laser beam onto a material attached to the mask; and removing the material attached to the mask.

Abstract: The present invention relates to a method of cleaning a surface by applying highly propagating ultrasonic energy to said surface, the method comprises immersing at least a portion of the surface into a fluid, wherein said fluid is in contact with an highly propagating ultrasonic energy emitting assembly; and emitting highly propagating ultrasonic energy from the assembly into the fluid to generate cavitation at the surface thereby cleaning said surface.

Abstract: In the coating treatment apparatus, in a first treatment chamber, the front and rear surfaces of the substrate held by a transfer arm are inverted by a turning mechanism, and a coating solution is applied from a coating nozzle to the rear surface of the substrate. The substrate is transferred into a second treatment chamber, in which the coating solution on the rear surface is heated by a heating unit to cure, thereby forming a coating film on the rear surface of the substrate. The formation of the coating film by the coating treatment apparatus is performed before exposure processing, whereby the rear surface of the substrate can be flat for the exposure processing.

Abstract: A method for cleaning a substrate processing chamber, including processing a batch of substrates within a processing chamber defining one or more processing regions. Processing the batch of substrates may be executed in a sub-routine having various sub-steps including processing a substrate from the batch within the processing chamber, removing the substrate from the processing chamber, introducing ozone into the processing chamber, and exposing the chamber to ultraviolet light for less than one minute. The substrate batch processing sub-steps may be repeated until the last substrate in the batch is processed. After processing the last substrate in the batch, the method includes removing the last substrate from the processing chamber, introducing ozone into the processing chamber; and exposing the processing chamber to ultraviolet light for three to fifteen minutes.

Abstract: The present invention includes a composition for enhancing the antimicrobial efficacy of photodynamic disinfection against Gram-negative organism that is receptive to paraben potentiation using a composition comprising a photosensitizer and at least one paraben. The present invention also includes a method for photodynamic disinfection comprising applying the composition to a desired treatment area and applying light to the desired treatment area at a wavelength absorbed by the photosensitizer so as to inhibit Gram-negative organism located within the treatment area wherein the Gram-negative organism is receptive to paraben potentiation.

Abstract: A method for preventing the build-up of ice on overhead power lines using induced vibrations and hydrophobic chemical treatment. In one embodiment, audio frequency transducers are used to send low frequency vibrations down a transmission line, while a hydrophobic coating is applied before inclement weather. These vibrations add just enough energy to prevent ice nucleation, and create constructive interference patterns to assist in shaking off water before it freezes.

Abstract: The wet treatment of wafer-shaped articles is improved by utilizing a droplet generator designed to produce a spray of monodisperse droplets. The droplet generator is mounted above a spin chuck, and is moved across a major surface of the wafer-shaped article in a linear or arcuate path. The droplet generator includes a transducer acoustically coupled to its body such that sonic energy reaches a region of the body surrounding the discharge orifices. Each orifice has a width w of at least 1 ?m and at most 200 ?m and a height h such that a ratio of h to w is not greater than 1.

Abstract: The present invention provides a method for removing micro-debris generated in a laser machining process operated on machined object and device of the same. The machined object is placed on a movable machining platform within a machining range and machined at a particular machining location. By disposing an acoustic wave generator and a reflector part, or by disposing a plurality of acoustic wave generators, at least two standing waves extending across the machining range and two standing wave nodes are generated. The micro-debris generated from the laser machining process is moved away by the standing waves to concentrate at the standing wave nodes, and subsequently removed from the standing wave nodes.

Abstract: The present invention relates to entrance mat and carpet, designated to be placed ahead of the entrance of houses for example, for the convenience of the user, before entering to the house for example, enabling the user to scrubs his shoes on the entrance mat, to avoid from dirtying the house. Wherein, the present invention entrance mat is an interactive mat, enabling by electricity power to operates the mat mechanism, which operating a circular motion on part of the entrance mat, enabling the user to stand on the nun-moving parts of the entrance mat, and to point each time one of his shoe on the moving part of the mat.

Abstract: Various methods and apparatuses for facilitating cleaning of submerged geophysical equipment using sound waves transmitted at ultrasonic frequencies are disclosed. In some embodiments, one or more transducers may be configured to transmit sound at one or more ultrasonic frequencies. The sound at ultrasonic frequencies may be transmitted in the vicinity of submerged geophysical equipment, such as a sensor streamer towed behind a survey vessel. Obstructions (e.g., barnacle larvae) adhering to surfaces of the geophysical equipment may be loosened or removed altogether when ultrasonic transmissions occur within its vicinity. The transducers used to transmit the ultrasonic frequencies may be implemented in various ways, such as being attached to a remote operated vehicle, a cleaning unit, or as being an integral component of the geophysical equipment.

Abstract: Methods for conditioning interior surfaces of a process chamber are provided herein. In one embodiment a method of conditioning interior surfaces of a process chamber is provided. The method comprises maintaining a process chamber at a first pressure and at a first temperature of less than about 800 degrees Celsius, providing a process gas to the process chamber at the first pressure and the first temperature, wherein the process gas comprises chlorine (Cl2) and high IR absorption gas, and exposing the process gas to radiant energy to remove residue disposed on interior surfaces of the process chamber.

Abstract: In one embodiment, a method for removing a resist includes irradiating, with an UV light having a wavelength of less than about 240 nm, a structure having a resist on a pattern surface in an atmosphere having oxygen. The resist is used as a mask as it remains above the pattern after the pattern has been transferred to a magnetic recording medium surface having a magnetic film thereon, and the irradiating is performed during production of the magnetic recording medium. In another embodiment, a method for forming a magnetic recording medium includes applying a resist to a surface of a magnetic film above a substrate, curing the resist by irradiating the resist with first UV light to form a pattern, transferring the pattern to the magnetic film using the pattern, and removing the resist by irradiating using second UV light having a shorter wavelength in an atmosphere including oxygen.

Abstract: Photoelectric systems combining a semiconductor and a phosphorescent compound with an emission spectrum of photons with energy levels equal to or greater than the activation energy of the semiconductor, wherein the phosphorescent compound is characterized by the emission spec-tram being produced by excitation of the phosphorescent compound with lower energy photons and the separation distance between the semiconductor and the phosphorescent compound is less than the distance at or above which scattering losses predominate. Methods are that embody technological applications of the photoelectric systems are also disclosed, as well as articles that embody technological applications of the photoelectric systems.

Abstract: A showerhead cleaning rack is disclosed. The showerhead cleaning rack includes a frame and a support body, wherein the support body is located and connected with the frame. The support body has a plurality of positioning parts. The positioning parts are used for holding the showerhead. The showerhead cleaning rack is used in an ultrasonic cleaning trough. By utilizing the oscillation of the ultrasonic wave generated in the ultrasonic cleaning trough, the pollutants on the showerhead is cleaned. An ultrasonic cleaning method with the showerhead cleaning rack is also provided.

Abstract: Methods for removing and preventing the buildup of unwanted deposits and varnishes on combustion chamber surfaces, particularly injector-igniter components that are exposed to combustion events. A method of removing deposits from an injector-igniter comprises monitoring the current across a pair of electrodes in the injector-igniter, comparing the current with a predetermined threshold level, and performing a cleaning cycle if the current exceeds the threshold level. The cleaning cycle may comprise injecting oxidant through the injector-igniter and into the combustion chamber. The cleaning cycle may further comprise ionizing the oxidant with an electrical discharge having a first polarity and ionizing the oxidant a second time with an electrical discharge having a second polarity. In other cases the cleaning cycle comprises injecting hydrogen through the injector-igniter and into the combustion chamber. In still other cases the cleaning cycle may comprise injecting coolant onto the electrodes.

Abstract: Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a pellicle disposed across the photomask, and cleaning the photomask. The cleaning the photomask includes directing a laser beam through the pellicle toward the photomask, the laser beam having a wavelength that is substantially equal to a local maximum of an absorption spectrum of the photomask, heating the photomask with the laser beam, and transferring heat from the photomask to a contaminant disposed on the photomask, thereby thermally decomposing the contaminant.

Abstract: A method for removing organic materials includes providing a target object having the organic materials adsorbed thereon, and an adsorbent, into a space including a non-liquid medium therein; and separating the organic materials from the target object by applying ultrasound waves to the target object having the organic materials adsorbed thereon and the adsorbent in the space, and disposing the organic materials to the adsorbent.

Abstract: Processes associated apparatus and compositions useful for removing organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. Processes are presented that apply a minimum volume of a composition as a coating to the inorganic substrate whereby sufficient heat is added and the organic substances are completely removed by rinsing. The compositions and processes may be suitable for removing and, in some instances, completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.

Abstract: A method of and an apparatus for measuring the strength of ultrasonic waves are provided. They are capable of measuring the strength of ultrasonic waves easily and at low cost without using a sound pressure meter. The ultrasonic wave strength measuring apparatus has a particle source soaked in a cleaning liquid, an oscillator to generate the ultrasonic waves whose strength is going to be measured to vibrate the particle source so that particles are eluted from the particle source into the cleaning liquid, a counter to count the number of particles in the cleaning liquid, and an operation unit to find the strength of the applied ultrasonic waves based on the counted number of particles.

Abstract: According to one embodiment, a method for cleaning and requalifying a component of an exhaust aftertreatment system includes inspecting the component using an x-ray processing technique. The method further includes associating the plurality of cleaning techniques with a plurality of compositions of material, and cleaning the component according to at least one of the plurality of cleaning techniques associated with the composition of material.

Abstract: This present application relates to a system for delivering megasonic energy to a liquid, involving one or more megasonic transducers, each transducer having a single operating frequency within an ultrasound bandwidth and comprising two or more groups of piezoelectric elements arranged in one or more rows, and a megasonic generator means for driving the one or more transducers at frequencies within the bandwidth, the generator means being adapted for changing the voltage applied to each group of piezoelectric elements so as to achieve substantially the same maximum acoustic pressure for each group of piezoelectric elements. The generator means and transducers being constructed and arranged so as to produce ultrasound within the liquid. Such a system may be part of an apparatus for cleaning a surface of an article such as a semiconductor wafer or a medical implant.

Abstract: Embodiments of the invention generally provide methods for cleaning a UV processing chamber. In one embodiment, the method includes flowing an oxygen-containing gas through a plurality of passages formed in a UV transparent gas distribution showerhead and into a processing region located between the UV transparent gas distribution showerhead and a substrate support disposed within the thermal processing chamber, exposing the oxygen-containing gas to UV radiation under a pressure scheme comprising a low pressure stage and a high pressure stage to generate reactive oxygen radicals, and removing unwanted residues or deposition build-up from exposed surfaces of chamber components presented in the thermal processing chamber using the reactive oxygen radicals.

Abstract: Methods of treating a device such as an endoprostheses or a batch thereof include first soaking the device in nitric acid for greater than 1 hour; after first soaking the device, first sonicating the device in deionized water for between about 5 minutes and about 20 minutes; and after first sonicating the device, repeating, at least once, soaking the device in nitric acid for greater than 1 hour, and, after soaking the device in the nitric acid, sonicating the device in deionized water between about 5 minutes and about 20 minutes. Methods may further include soaking in a mild acid for between about 30 minutes and about 45 minutes. The methods may form a protective oxide having a thickness between about 30 ? and about 100 ?.

Abstract: An active electroadhesive cleaning device or system includes electrode(s) that produce electroadhesive forces from an input voltage to adhere dust or other foreign objects against an interactive surface, from which the foreign objects are removed when the forces are controllably altered. User inputs control the input voltage and/or designate the size of foreign objects to be cleaned. An active power source provides the input voltage, and the interactive surface can be a continuous track across one or more rollers to move the device across a dirty foreign surface. Electrodes can be arranged in an interdigitated pattern having differing pitches that can be actuated selectively to clean foreign objects of different sizes. Sensors can detect the amount of foreign particles adhered to the interactive surface, and reversed polarity pulses can help repel items away from the interactive surface in a timely and controlled manner.

Abstract: An ultrasonic cleaning method of using ultrasonic vibrations to clean an object that is immersed in a cleaning liquid in a cleaning tank is provided. The method includes generating a frequency modulated signal including at least two frequency modulated portions having modulation widths different from each other with a single frequency as a center frequency, such that among the at least two frequency modulated portions a frequency modulated portion having a smaller modulation width is generated at a timing when a frequency modulated portion having a larger modulation width reaches the center frequency. The method further includes generating the ultrasonic vibrations based on the frequency modulated signal and transferring the ultrasonic vibrations to the cleaning tank to clean the object.

Abstract: A system for cleaning a fiber cap including a first fixture configured to hold the fiber cap, the fiber cap having an internal cavity with an opening therein. The fiber cap also includes a first axis generally aligned with the central axis of the fiber cap and internal cavity, a second axis orthogonal to the first axis, and a third axis orthogonal to the first and second axes. The system further includes a second fixture configured to hold a particulate collecting member (1) to receive and hold an electrical charge and (2) for insertion into the opening of the fiber cap.

Abstract: A method for cleaning a microwave processing apparatus including a processing chamber for accommodating therein an object to be processed, a microwave introducing unit for introducing microwaves into the chamber, and a gas introducing unit for introducing a gas into the processing chamber is provided. The method includes loading an object for cleaning into the processing chamber, introducing a gas into the processing chamber, introducing microwaves into the processing chamber, and unloading the object from the processing chamber.

Abstract: A microbubble cleaning system includes a tank in which a solution into which a product is immersed to clean the product is stored; supplying means for putting microbubbles into the solution and supplying the solution that includes the microbubbles into the tank; oil separating apparatus that collects bubbles that have risen to a surface of the solution stored in the tank as a result of cleaning the product, as well as a portion of the solution that is near the surface of the solution, in order to separate oil from the solution; generating means for generating a surface flow of the solution near the surface of the solution in order to remove the bubbles that have risen to the surface of the solution in the tank; and removing means for removing carbon dioxide from air that is used to generate the microbubbles by the supplying means.

Abstract: The invention a piezoelectric self-cleaning apparatus, such as a chemical injection pump. The chemical injection pump is self-cleaning by employing either as an integral part or as an added part, a piezoelectric component that implosively cleans the pump head. This invention involves a liquid delivery system made of a liquid processing path and a piezoelectric actuator connected to or integral with said liquid processing path to enhance removal of unwanted solids from the liquid processing path or to maintain a blend, mix and/or integrity of a liquid chemical, wherein the liquid chemical does not precipitate particles, crystallize, separate or come out of solution.

Abstract: A plasma processing apparatus is disclosed for minimizing the non-uniformity of potential distribution around wafer circumference. The apparatus includes a focus ring formed of a dielectric, and a conductor or a semiconductor having RF applied thereto. A surface voltage of the focus ring is determined to be not less than a minimum voltage for preventing reaction products caused by wafer processing from depositing thereon. The surface height, surface voltage, material, and structure of the focus ring are optimized so that the height of an ion sheath formed on the focus ring surface is either equal or has a height difference within an appropriate tolerance range to the height of the ion sheath formed on the wafer surface.

Abstract: The present invention relates to inactivation of bacteriophages in a liquid, such as bacterial growth medium, milk and whey.

Abstract: A method and system for removing substances from a surface, in which the surface is irradiated by high-energy laser radiation, characterized in that the laser parameters are chosen to selectively remove one or more predetermined substances from the surface without removing other substances from the surface.

Abstract: The present invention provides a liquid composition for removing dental cement from the surface of non-living objects, comprising i) an inorganic base; ii) a complexing agent; iii) optionally a surfactant; and iv) an aqueous solvent. In a preferred embodiment, the composition comprises a surfactant, and an aqueous solvent comprising water mixed with a polar solvent miscible with water, preferably alcohol. Said objects to be cleaned comprise workpieces and instruments used in restoration work. Said workpieces may comprise crowns, bridges, inlays, and other prostheses. Said instruments may, comprise, for example, tools used during the dental operation which contacted the cement.

Abstract: The invention disclosed herein is a system and method for cleaning and sanitizing mattresses infested with insects and bacteria. Specifically, mattresses infested with bed bugs and/or dust mites may be cleaned and sanitized through a series of steps beginning with UV irradiation of the mattress. Next, the mattresses are subject to dry steam of a temperature of approximately 356° F. The mattress is then vacuumed to remove debris and waste. Next the mattress is heated with infrared heaters which produce a temperature of up to 265° F. Finally, the mattress is again vacuumed to remove any remaining debris. The system is mounted on an enclosed trailer so that the system may be transported to a home, hospital, hotel or dormitory to clean and sanitize the mattresses.

Abstract: The portable, compact, silverware washing apparatus is disclosed. The apparatus is manufactured so as to easily mount on top of a kitchen countertop or to be easily portable to other locales. The appliance is designed so as to not be connected to a water supply within a home or apartment, but rather rely upon the user to pour in an independent supply of water. The device includes a motor and pump assembly to fill a washing chamber with water and detergent, while a sonic transducer bombards the silverware loaded therein with sonic vibrations. The pump assembly automatically drains the water and waste after completion of the washing cycle. The appliance is configured with a specialized basket for holding the silverware in individualized compartments.

Abstract: Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, the surface of a substrate having a contaminating particulate disposed thereon is cleaned by directing a laser towards the substrate, generating a temperature increase in the substrate and transferring thermal energy from the substrate to the particulate to decompose the particulate. The laser has a wavelength that is substantially the same as a local maximum of the substrate absorption spectrum.

Abstract: A method for processing flat articles with acoustical energy. The inventive system method can remove particles from both sides of a wafer more efficiently and effectively. In one aspect, the invention is a method for processing flat articles wherein a liquid is applied to both major surfaces of the flat article. A first transducer assembly is positioned adjacent to a first of the major surfaces of the flat article and a second member is positioned adjacent to a second of the major surfaces. The first transducer assembly generates and transmits acoustical energy to the first major surface of the flat article while the second member either: (1) reflects the acoustical energy generated by the first transducer assembly back to the second major surface of the flat article; and/or (2) generates and transmits acoustical energy to the second major surface of the flat article.

Abstract: A method for wetting a nanopore device includes filling a first cavity of the nanopore device with a first buffer solution having a first potential hydrogen (pH) value, filling a second cavity of the nanopore device with a second buffer solution having a second pH value, wherein the nanopore device includes a transistor portion having a first surface, an opposing second surface, and an orifice communicative with the first surface and the second surface, the first surface partially defining the first cavity, the second surface partially defining the second cavity, applying a voltage in the nanopore device, and measuring a current in the nanopore device, the current having a current path partially defined by the first cavity, the second cavity, and the orifice.

Abstract: A substrate processing apparatus includes a substrate holding unit holding a substrate, a cleaning liquid supplying unit supplying, to the substrate held by the substrate holding unit, a cleaning liquid containing a foaming agent that foams due to application of foaming energy, and a foaming energy supplying unit applying the foaming energy to the cleaning liquid in contact with the substrate held by the substrate holding unit.

Abstract: A cleaning system comprising a liquid source configured to provide a feed liquid at a first temperature, and an electrolysis cell configured to receive the feed liquid and to electrochemically activate the feed liquid to provide an electrochemically-activated liquid, wherein the electrochemical activation also heats the feed liquid such that the electrochemically-activated liquid is at an elevated temperature that is greater than the first temperature. The cleaning system also includes a dispenser configured to dispense the electrochemically-activated liquid.

Abstract: An acoustic cleaning assembly that includes a horn assembly and a generator body that is coupled to the horn assembly. The generator body includes an inner surface that at least partially defines an outlet plenum, and an opening that extends in flow communication between the horn assembly and the outlet plenum. An end cap is coupled to the generator body and includes an inner surface that at least partially defines an inlet plenum. A diaphragm is coupled between the generator body and the end cap. The diaphragm channels air from the inlet plenum to the outlet plenum to facilitate generating sound waves within the outlet plenum.

Abstract: Provided are an apparatus and a method of cleaning a substrate. The apparatus includes a substrate supporting unit supporting a substrate, a container surrounding the substrate supporting unit and collecting an organic solvent scattered from the substrate, and a fluid supplying unit provided on one side of the container and spraying a liquid organic solvent with bubbles to the substrate. The fluid supplying unit includes a nozzle head ejecting the organic solvent to the substrate, an organic solvent supplying line supplying the organic solvent from an organic solvent storage tank to the nozzle head, and a bubble providing element provided on the organic solvent supplying line and providing bubbles to the liquid organic solvent.

Abstract: A dishwasher including a washing chamber to wash dishes, a sump concavely formed at a lower portion of the washing chamber to collect water used in washing, a microfilter disposed at the sump to filter out dirt produced when the dishes are washed, and an ultrasonic generator to radiate ultrasonic waves toward the microfilter. Since the microfilter is automatically cleaned by the ultrasonic generator, a user may not need to manually clean the microfilter.

Abstract: A template washing method and a photowashing apparatus which ensure removal of resist residual remaining on a pattern surface of a template, a pattern forming method and a nanoimprint apparatus which ensure formation of patterns with fewer defects are provided. The template washing method of the invention for photowashing the pattern surface of the template used in nanoimprint includes a vacuum-ultraviolet light irradiation process for irradiating the pattern surface of the template with vacuum ultraviolet light under an atmosphere of dry air.

Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.