Abstract: A system to measure the internal state of a bundle of tubes by injecting a signal into each tube of the bundle, receiving reflections from the tube due to anomalies within the tube, then analyzing the reflections to determine the type or characteristics about the anomalies. The analyzed information is stored in database to be used for statistical processing. Further, the device can be used in the performance of a cleaning process by conducting an initial assessment of the tubes in a bundle of tubes, comparing the stored data and estimating the number of cleaning cycles that will be required, and re-conducting the evaluation of the state of the tubes after every cleaning cycle or after every few cleaning cycles.

Abstract: A lithographic projection apparatus includes a laser cleaning device. The laser cleaning device is constructed and arranged to clean a surface. The laser cleaning device includes a laser source constructed and arranged to generate radiation, and an optical element constructed and arranged to focus the radiation in a focal point in order to generate a cleaning plasma in a background gas above the surface. The laser cleaning device is further provided with a gas supply constructed and arranged to generate a jet of protection gas at a location near the plasma.

Abstract: Embodiments of systems and methods of etching material from the surface of a wafer are provided. In one representative embodiment, an apparatus comprises a fluid reservoir configured to receive a fluid including an etchant and one or more wafers in a cassette. The apparatus can further comprise a roller member in the fluid reservoir to frictionally engage the one or more wafers and to displace the one or more wafers with respect to a bottom portion of the cassette when the cassette is in the fluid reservoir. The apparatus can further comprise a motor outside the fluid reservoir and magnetically coupled to the roller member such that activation of the motor causes corresponding rotation of the roller member, and thereby rotation of the one or more wafers when the roller member is in frictional engagement with the one or more wafers.

Abstract: Cladding and remanufacturing a machine component includes directing cleaning and welding beams split from an incident laser beam toward the machine component, and moving the machine component relative the cleaning and welding beams such that the welding beam trails behind the cleaning beam along a common travel path. A surface of the machine component is decontaminated by the cleaning beam, while a cladding material is melted via the welding beam such that upon solidifying the cladding material forms a coating metallurgically bonded to base material and previously deposited cladding material of the machine component.

Abstract: A method of cleaning contaminants, including particulate contaminants, from a valve in a fluid system includes moving a valve flow control element of the valve from a first position to a second position in response to a change in a condition in the fluid system other than a change in superheat.

Abstract: A method and a device for replacing objective parts, especially of a projection or illumination objective for microlithography in which an objective having an objective interior and objective parts provided therein is provided. At least one objective part is replaceably accommodated in the objective. Immediately prior to installation in the objective, the replaceable objective part is cleaned outside the objective interior in at least one cleaning room sealed off from the ambient atmosphere. Immediately after cleaning, the replaceable objective is installed in the objective without contact with the normal ambient atmosphere.

Abstract: A semiconductor device manufacturing method includes: a step wherein a processing substrate to be processed is placed on a substrate mounting member that is provided in a processing chamber having a plurality of gas supply regions; a film-forming step wherein a processing gas is supplied to the processing chamber, and the substrate is processed; a step wherein the substrate is carried out from the processing chamber; and a cleaning step wherein the density of the cleaning gas is controlled, while controlling cleaning gas quantities in the gas supply regions, respectively, in a state wherein the substrate is not placed in the processing chamber.

Abstract: Embodiments of the invention include methods for in-situ chamber dry cleaning a plasma processing chamber utilized for gate structure fabrication process in semiconductor devices. In one embodiment, a method for in-situ chamber dry clean includes supplying a first cleaning gas including at least a boron containing gas into a processing chamber in absence of a substrate disposed therein, supplying a second cleaning gas including at least a halogen containing gas into the processing chamber in absence of the substrate, and supplying a third cleaning gas including at least an oxygen containing gas into the processing chamber in absence of the substrate.

Abstract: An unattended extraction cleaning machine includes a housing with a bottom portion that is adapted to rest on a surface to be cleaned, a fluid delivery system including a fluid distributor, a fluid extraction system including a suction nozzle, at least one carriage assembly mounting the suction nozzle to the housing for movement with respect thereto and with respect to the surface to be cleaned, and an ultraviolet light mounted on at least one of the housing and the carriage assembly to emit ultraviolet light onto the surface to be cleaned.

Abstract: A method for making carbon nanotube array includes providing a carbon nanotube array formed on a surface of a substrate. The carbon nanotube array is stripped from the surface of the substrate. The carbon nanotube array is suspended in an inert gas environment or a vacuum environment. A temperature of the carbon nanotube array can be in a range from about 200° C. to about 2400° C. by heating the carbon nanotube array. In a state of heating the carbon nanotube array, a plurality of carbon nanotubes of the carbon nanotube array is selected and a carbon nanotube film is pulled out by a drawing tool.

Abstract: A method and an apparatus for detaching limescale deposits within a water heater of a beverage dispensing machine, by powering an ultrasonic generator discontinuously to scan frequencies within a range of 20 kHz to 100 kHz so as to induce ultrasonic vibrations. Advantageously the step of inducing ultrasonic vibrations is implemented discontinuously at high energy levels.

Abstract: A particle removal tool having a sound field transducer, a cleaning chamber, and an open sealing face. The cleaning chamber having a cleaning fluid guiding chamber extending from the sound field transducer to the open sealing face, a cleaning fluid delivery channel in fluid communication with the cleaning fluid guiding chamber, and a cleaning fluid return channel. The open sealing face has a cleaning portal disposed contiguous with a plane formed by the open sealing face and a chamber-to-surface interface seal which forms a fluid tight seal with a cleaning surface plane. The sound field transducer is disposed within a line-of-sight of the cleaning portal and generates acoustic waves with a frequency between approximately 20 kHz and approximately 2 MHz.

Abstract: A cleaning method for a UV chamber involves providing a first cleaning gas, a second cleaning gas, and a purge gas to one or more openings in the chamber. The first cleaning gas may be an oxygen containing gas, such as ozone, to remove carbon residues. The second cleaning gas may be a remote plasma of NF3 and O2 to remove silicon residues. The UV chamber may have two UV transparent showerheads, which together with a UV window in the chamber lid, define a gas volume proximate the UV window and a distribution volume below the gas volume. A purge gas may be flowed through the gas volume while one or more of the cleaning gases is flowed into the distribution volume to prevent the cleaning gases from impinging on the UV transparent window.

Abstract: A purge apparatus for replacing a gas atmosphere in a purge object vessel by a purge gas through a port provided on a bottom face of the purge object vessel is disclosed. The purge apparatus includes a purge unit attached to a table that receives the purge object vessel, and a purge nozzle body including a port contacting portion provided on an upper side of the purge nozzle body and an attachment object portion provided on a lower side of the purge nozzle body. The purge unit has an attachment portion and the port contacting portion of the purge nozzle body is configured to contact the port of the purge object vessel. The attachment object portion of the purge nozzle body removably engages with the attachment portion of the purge unit so that the purge nozzle body is removably attached to the purge unit.

Abstract: Disclosed herein is a dishwasher using oscillatory flow generated from thermoacoustic effect. The dishwasher is configured such that thermoacoustic waves having high amplitude are generated from solar energy rather than electric energy, wherein the thermoacoustic waves make oscillating waves be directly transmitted to an air column and a water column formed in a closed end of a dishwashing pipeline. In this way, high-quality energy can be directly applied to washing water, whereby energy loss can be minimized, and the washing efficiency can be markedly increased.

Abstract: Provided are a method and apparatus for decontaminating personal protective equipment while it is being worn by a person. A booth having a plurality of internally-reflective surfaces defines an interior space with dimensions suitable for receiving a standing person wearing the personal protective equipment. A plurality of UVC light sources are arranged to emit UVC light into the booth, and are operational while the person wearing the personal protective equipment is within the interior space. A door is selectively closeable to enclose the interior space and interfere with UVC light escaping the interior of the booth into an ambient environment of the booth, and a controller is operable to selectively operate the UVC light sources while the person wearing the personal protective equipment is standing within the interior space.

Abstract: A pipe damage detection apparatus and method are disclosed. The pipe damage detection apparatus includes an ultrasonic supply unit configured to supply an ultrasonic signal to a pipe; an ultrasonic reception unit configured to receive the ultrasonic signal of the pipe; and an analysis unit configured to analyze the ultrasonic signal received by the ultrasonic reception unit, and determine whether the pipe is damaged. The pipe damage detection apparatus and method can detect whether a pipe that is difficult for an inspector to access because it is coated with an insulating material or buried in the ground is damaged.

Abstract: Systems and methods are provided for a marine seismic streamer usable underwater for marine seismic surveys. The marine seismic streamer includes: a lead-in section; at least one bird section; at least one data acquisition module; and at least one vibration module configured to vibrate the marine seismic streamer, wherein the lead-in section, the at least one bird section, the at least one data acquisition module and the at least one vibration module are connected together to form the marine seismic streamer.

Abstract: The invention relates to an arrangement for transporting radicals. An electron beam system is presented comprising a beamlet generator; a beamlet manipulator (204) comprising an array of apertures; a plasma generator comprising a chamber for forming a plasma, an inlet receiving input gas and outlets removing plasma or radicals created therein, the plasma generator further comprising outlets in flow connection with the plasma chamber outlets; and a hollow guiding body (309b) guiding radicals formed in the plasma towards the array of apertures for removing contaminant deposition. The hollow guiding body (309b) is removably connectable to an extended portion (307b) of the plasma generator outlet. A cover (400) can be placed over a connection between the hollow guiding body (309b) and the extended portion (307b). The extended portion (307b) of the plasma generator outlet and the hollow guiding body (309b) can be similarly formed as a slit.

Abstract: Embodiments of mechanisms for cleaning a wafer are provided. A method for cleaning a wafer includes cleaning a wafer by using a wafer scrubber and cleaning the wafer scrubber in a scrubber cleaning module. An agitated cleaning liquid is applied on the wafer scrubber to clean the wafer scrubber. The method also includes cleaning the wafer or a second wafer by the wafer scrubber after the wafer scrubber is cleaned by the agitated cleaning liquid.

Abstract: Disclosed are a device for automatically cleaning printed circuit board and a method using the same. The device includes: a printed circuit board (PCB) tray, a transferring unit, an elevator unit, a cleaning unit and a unloading deck; the elevator unit includes a horizontal part and a vertical part; when the elevator unit is descended to the lowest position, an upper surface of the transferring unit is at a same horizontal position with an upper surface of the horizontal part of the elevator unit; the elevator unit is located below the cleaning unit, and the unloading deck is located above the transferring unit. The invention can not only save manpower, but also achieve standardization of the cleaning process and improve working efficiency.

Abstract: An optoelectronic sensor (10) has a circumferential front screen (42) comprising a curvature both in a circumferential direction and in a transverse height, thus focusing light reflected at the inside of the front screen (42). Test light passes from a test light transmitter (50a-f) through the front screen (42) to a reflector (52a-f) and subsequently onto a test light receiver (56a-b). A decreasing light transmissivity of the front screen (42) is detected based on a decrease of a signal generated by the test light in the test light receiver (56a-b). The test light receiver (56a-b) is arranged on a same side of the front screen (42) as the reflector (52a-f) such that the test light path (54a-f) leads from the reflector (52a-f) via reflection on the inside of the front screen (42) to the test light receiver (56a-b).

Abstract: A showerhead assembly for a substrate processing system includes a back plate connected to a gas channel. A face plate is connected adjacent to a first surface of the back plate and includes a gas diffusion surface. An electrode is arranged in one of the back plate and the face plate and is connected to one or more conductors. A gas plenum is defined between the back plate and the face plate and is in fluid communication with the gas channel. The back plate and the face plate are made of a non-metallic material.

Abstract: A method of manufacturing a semiconductor device including performing a first thermal processing a silicon substrate in a first atmosphere and at a first temperature to remove an oxide film above a surface of the silicon substrate, and after the first thermal processing, performing a second thermal processing the silicon substrate in a second atmosphere containing hydrogen and at a second temperature lower than the first temperature to terminate the surface of the silicon substrate with hydrogen.

Abstract: Polysilicon fragments are purified to remove metal contaminates by contacting the fragments with a purifying liquid at a flow rate >100 mm/sec. Effective removal without abrasion is accomplished.

Abstract: [Problem] To provide a fluoride spray coating covered member adhered with a fluoride spray coating having excellent properties on quality by suppressing a thermal decomposition reaction and an oxide reaction, and to propose a method for forming a cover by firmly adhering the coating. [Solution] A method for forming a fluoride spray coating in an implantation structure onto a substrate surface by spraying particles of a fluoride spraying material onto a substrate surface or a pretreated substrate surface, if necessary through an undercoat layer or spray particle dotted parts of carbide cermet, at a flying velocity of particles of not less than 500 m/sec with an inert gas as a working gas for coating formation at an inert gas temperature of 600° C.-1300° C. as well as a fluoride spray coating covered member.

Abstract: The present invention provides a chemical-liquid mixing method and a chemical-liquid mixing apparatus capable of sufficiently generating a peroxomonosulfuric acid that is effective in removing a resist from a substrate, when a sulfuric acid and a hydrogen peroxide solution are mixed with each other. At first, an inner tank 10 is filled up with a sulfuric acid and the sulfuric acid overflowing from the inner tank 10 is allowed to flow into an outer tank 12. Then, a hydrogen peroxide solution is supplied into the inner tank 10 and the hydrogen peroxide solution is allowed to flow into the outer tank 12 whereby the two kinds of liquids of the hydrogen peroxide solution and the sulfuric acid are stored in the outer tank 12. Simultaneously when the hydrogen peroxide solution flows into the outer tank 12, a return pump 16 is activated.

Abstract: This invention relates to an apparatus and method for cleaning a photomask. This apparatus, suitable for use in removing an adhesive residue from a photomask, includes a photomask disposed such that a surface thereof on which an adhesive residue is left behind is directed downwards, a metal plate formed adjacent to the adhesive residue, and a laser generator for irradiating a laser onto the metal plate so that the adhesive residue is removed by heat generated from the metal plate.

Abstract: A method of manufacturing a semiconductor device including performing a first thermal processing a silicon substrate in a first atmosphere and at a first temperature to remove an oxide film above a surface of the silicon substrate, and after the first thermal processing, performing a second thermal processing the silicon substrate in a second atmosphere containing hydrogen and at a second temperature lower than the first temperature to terminate the surface of the silicon substrate with hydrogen.

Abstract: A method of wet cleaning an aluminum part having bare aluminum surfaces and anodized aluminum surfaces. The method includes CO2 dry ice blasting the surfaces of the aluminum part at approximately 35 to approximately 45 psi, masking the aluminum part to conceal the bare aluminum surfaces, soaking the dry ice blasted and masked aluminum part in deionized water at or above approximately 60° C., scrubbing the aluminum part with an abrasive pad and deionized water after completion of the soaking in deionized water, and repeating the soaking and scrubbing in the recited order at least three additional times.

Abstract: A wet-type developing device and a wet-type image forming apparatus each employ a developer including a carrier liquid and toner particles dispersed in the carrier liquid. A charging unit is applied with positive voltage. A neutralizing unit is applied with negative voltage. The charging unit and the neutralizing unit are made different from each other in one of a sectional configuration and a length to a developer carrier such that an absolute value of a voltage-current characteristic of the neutralizing unit becomes smaller than an absolute value of a voltage-current characteristic of the neutralizing unit including a constituent element equal to a constituent element of the charging unit.

Abstract: A megasonic cleaning method and a megasonic cleaning apparatus are provided. Microcavitation bubbles may be formed by applying an electromotive force to a cleaning solution using a megasonic energy in a separate room from an object to be cleaned. The microcavitation bubbles having a stable oscillation among the formed microcavitation bubbles may be moved to the object to be cleaned. A surface of the object to be cleaned may be cleaned using the microcavitation bubbles having the stable oscillation. Particles attached onto the surface of the object to be cleaned may be effectively removed while preventing pattern damage.

Abstract: Ultrasonic cleaning apparatuses and methods of cleaning substantially planar articles. An apparatus comprises (i) a substantially circular tank; (ii) a plurality of cleaning fluid inlets for delivering a cleaning fluid to the tank; (iii) an intermediate support for receiving an article to be cleaned; and (iv) an ultrasonic generator coupled to the tank for generating ultrasonic waves in the tank and cleaning fluid received therein. The apparatus is configured to remove particles from a substantially planar article and have them carried by flow of cleaning fluid away from the article and out of the tank. Using such an apparatus, a cleaning method comprises introducing a substantially planar article to be cleaned into the tank; introducing a cleaning fluid into the tank through the plurality of cleaning fluid inlets; and exciting the cleaning fluid with ultrasonic waves.

Abstract: In some embodiments methods of processing a substrate include: providing a substrate having a contact structure formed on the substrate, wherein the contact structure comprises a feature defined by gate structures, a silicon nitride layer disposed on a upper surface of the gate structures and on sidewalls and a bottom of the feature, and an oxide layer disposed over the silicon nitride layer and filling the feature; etching an opening through the oxide layer to the silicon nitride layer disposed on the bottom of the opening, wherein a width of the opening is less than a width of the feature; expanding the opening in the oxide layer to form a tapered profile; exposing the substrate to ammonia and nitrogen trifluoride to form an ammonium fluoride gas that forms an ammonium hexafluorosilicate film on the oxide layer; and heating the substrate to a second temperature to sublimate the ammonium hexafluorosilicate film.

Abstract: A device for cleaning a dental appliance is disclosed. The device includes a holding container including an upper portion and a lower portion, the holding container adapted to receive at least one dental appliance; an electrolytic cell for generating chlorine dioxide from a chlorine dioxide precursor; and an electrical current supply including a circuit operably connecting the electrical current supply to the electrolytic cell.

Abstract: A biometric authentication device includes: a memory configured to store an enrollment feature data; a biometric sensor that obtains a biometric image of a user; and a circuitry configured to: obtain a surface reflection degree of the biometric image; extract a comparison-use feature data from the biometric image; perform a comparing based on a similarity between the comparison-use feature data and the enrollment feature data; and reflect a correction coefficient and the surface reflection degree related to a region of the biometric image to the similarity.

Abstract: The invention relates to a method for improving the mechanical strength of a ceramic matrix composite material of the SiC/SiC type, this composite material being obtained by (a) forming a fiber preform from 3rd generation silicon carbide fibers and (b) forming a ceramic matrix around the fiber preform, this ceramic matrix comprising silicon carbide. The method comprises a chemical etching treatment of the surface of the fibers by bringing said fibers into contact with a solution comprising an oxidizer, this treatment being carried out before step (a) or between steps (a) and (b).

Abstract: A liquid immersion lithography apparatus includes a projection system, an opening from which liquid is supplied to a space under the projection system, the opening being connectable to a liquid source via a flow passage to supply the liquid to the space and the opening being connectable to a vacuum source via the flow passage, and a holding member by which a substrate is held, the holding member being movable below the projection system and the opening. The substrate held by the holding member is exposed through the liquid that is supplied from the opening and that covers only a portion of an upper surface of the substrate.

Abstract: An active electroadhesive cleaning device or system includes electrode(s) that produce electroadhesive forces from an input voltage to adhere dust or other foreign objects against an interactive surface, from which the foreign objects are removed when the forces are controllably altered. User inputs control the input voltage and/or designate the size of foreign objects to be cleaned. An active power source provides the input voltage, and the interactive surface can be a continuous track across one or more rollers to move the device across a dirty foreign surface. Electrodes can be arranged in an interdigitated pattern having differing pitches that can be actuated selectively to clean foreign objects of different sizes. Sensors can detect the amount of foreign particles adhered to the interactive surface, and reversed polarity pulses can help repel items away from the interactive surface in a timely and controlled manner.

Abstract: A method for processing flat articles with acoustical energy. The inventive system method can remove particles from both sides of a wafer more efficiently and effectively. In one aspect, the invention is a method for processing flat articles wherein a liquid is applied to both major surfaces of the flat article. A first transducer assembly is positioned adjacent to a first of the major surfaces of the flat article and a second member is positioned adjacent to a second of the major surfaces. The first transducer assembly generates and transmits acoustical energy to the first major surface of the flat article while the second member either: (1) reflects the acoustical energy generated by the first transducer assembly back to the second major surface of the flat article; and/or (2) generates and transmits acoustical energy to the second major surface of the flat article.

Abstract: An apparatus to enhance oil extraction from pores of a bowling ball includes a housing unit with an opening, a tank disposed within the opening and able to store a fluid, a rack disposed within the tank to secure the bowling ball in a stationary position and orient the ball such that at least one finger hole of the ball is positioned above an upper level of the stored fluid, a heating unit coupled to the tank to heat the stored fluid, and at least one ultrasonic transducer coupled to the tank. The at least one transducer directs sound waves through the heated fluid toward the secured bowling ball, thereby extracting oil from the bowling ball.

Abstract: A system and method for detecting a feature located on a surface, comprising: attaching a label to said feature; generating a label radiation from said label, a feature radiation from said feature, and a surface radiation from said surface; collecting said label radiation, said feature radiation, and said surface radiation; separating said label radiation from said feature radiation and said surface radiation; capturing the separated label radiation for generating an image of label, with said image of label having one or more pixels; and locating label pixels corresponding to said label radiation by searching for pixels, in said image of label, that possess substantially different pixel values when compared to other pixels in local neighborhood, whereby said feature is located by detecting said label.

Abstract: A cleaning system can include a noble gas, and one or more vessels configured to convert the noble gas into a supercritical fluid, and/or receive and clean an article of manufacture with the noble gas in the supercritical fluid state. A cleaning process can include converting a noble gas into a supercritical fluid state; and cleaning an article of manufacture with the noble gas in the supercritical fluid state so as to remove one or more contaminants from the article of manufacture. A cleaning composition can include a noble gas in a supercritical fluid state, and a textile article of manufacture having one or more contaminants located in the supercritical noble gas.

Abstract: The etching method of the present invention comprises first and second etching steps (S1, S3) having different types of films to be etched and different types of process gases. During a transition from the first etching step (S1) to the second etching step (S3), a first switching process step (S2) is performed in which the process container is filled with a cleaning gas and the cleaning gas is turned into a plasma to remove the reaction product deposited in the process container in the first etching step. During a transition from the second etching step (S3) to the first etching step (S1), a second switching process step (S4) is performed in which the process container is filled with a cleaning gas and the cleaning gas is turned into a plasma to remove the reaction product deposited in the process container in the second etching step.

Abstract: Among other things, one or more techniques and systems for cleaning a scrub brush of a scrubber utilized in semiconductor fabrication are provided. In particular, a charge modification element, such as a base pH material or ammonia, is applied to the scrub brush to modify a charge of a particle on the scrub brush to a modified charge. The modified charge of the particle is similar to a charge of the scrub brush, such that the particle and the scrub brush repel one another. The particle can be detached from the scrub brush utilizing various techniques such as a de-ionized water technique or a mechanical cleaning bar technique. In this way, one or more particles can be detached from the scrub brush to clean the scrub brush of particles so that the scrub brush can be used to clean a semiconductor wafer.

Abstract: A hydrocarbon fluid pipeline may include pipeline segments connected together in end-to-end relation between first and second spaced apart geographic locations and configured to carry hydrocarbon fluid therethrough. The hydrocarbon fluid pipeline may also include a radio frequency (RF) heating station that may include an RF source and an RF heater between adjacent pipeline segments of the plurality thereof. The RF heater may include an inner tubular dielectric coupler between the adjacent pipeline segments, and an electrically conductive outer housing surrounding the inner tubular dielectric coupler and connected to the RF source to heat the hydrocarbon fluid.

Abstract: An apparatus and method for hydrogenating a sample, such as a semiconductor wafer. The invention utilizes a top electrode comprising a UV-transparent dielectric and a metal contact to provide an electric field to the sample while the sample is irradiated with UV light and hydrogenated with a hydrogenating gas or gasses. The field may be applied to the sample at a number of different pressures, temperatures and concentrations of gas to manipulate the rate and type of hydrogenation. Further, the method of hydrogenating the sample may be used in conjunction with masking and etching techniques.

Abstract: An active electroadhesive cleaning device or system includes electrode(s) that produce electroadhesive forces from an input voltage to adhere dust or other foreign objects against an interactive surface, from which the foreign objects are removed when the forces are controllably altered. User inputs control the input voltage and/or designate the size of foreign objects to be cleaned. An active power source provides the input voltage, and the interactive surface can be a continuous track across one or more rollers to move the device across a dirty foreign surface. Electrodes can be arranged in an interdigitated pattern having differing pitches that can be actuated selectively to clean foreign objects of different sizes. Sensors can detect the amount of foreign particles adhered to the interactive surface, and reversed polarity pulses can help repel items away from the interactive surface in a timely and controlled manner.

Abstract: The present invention relates to a method of transferring a graphene film comprising the steps of (A) providing a carrier, wherein the carrier has a first surface, and a second surface, and a first graphene film is formed on the first surface; (B) disposing a patterned protection layer on the second surface of the carrier; (C) patternin carrier with the first graphene film on a target substrate; (E) removing the the carrier to expose the first graphene film; (D) disposing the patterned carrier to transfer the first graphene film on the substrate.

Abstract: A method of particle mitigation which includes obtaining a semiconductor wafer having a nonfunctional backside and a functional frontside on which semiconductor devices are formed by one or more lithography processes; coating the backside with a mitigating layer comprising silicon or amorphous carbon; patterning the mitigating layer to form indentations in the mitigating layer; placing the semiconductor wafer onto a wafer chuck such that the wafer chuck makes direct contact with the coated and patterned backside mitigating layer; and while maintaining the coated and patterned backside mitigating layer in direct contact with the wafer chuck, performing a first lithographic process on the frontside.