Abstract: A post-W CMP cleaning solution consists of carboxylic acid and deionized water. The carboxylic acid may be selected from the group consisting of (1) monocarboxylic acids; (2) dicarboxylic acids; (3) tricarboxylic acids; (4) polycarboxylic acids; (5) hydroxycarboxylic acids; (6) salts of the above-described carboxylic acids; and (7) any combination thereof. The post-W CMP cleaning solution can work well without adding any other chemical additives such as surfactants, corrosion inhibitors, pH adjusting agents or chelating agents.

Abstract: The aim of the invention is to provide a method for the treatment of a transport support (1) for the conveyance and storage of semiconductor substrates, with said support (1) possibly having first undergone a cleaning operation using a liquid. The method includes a treatment stage in which the transport support (1) is placed in a sealed chamber (4) connected to a vacuum pump (5) and said transport support (1) is subjected to the combined action of a subatmospheric pressure and infrared radiation to favor the removal of foreign bodies on the walls of the transport support (1). The invention also concerns a treatment station for a transport support (1) for implementation of the method.

Abstract: A method for cleaning the U-tube of the measurement cell of a densimeter, the measurement cell including an isothermic enclosure defining a measurement chamber closed by a stopper surrounded by a resilient seal, a U-tube extending inside the measurement chamber for containing a sample, the U-tube secured to the stopper at a base of the U-tube which includes free ends projecting outwardly from the measurement chamber to permit injection of the sample via an injection opening and evacuation of the sample via an evacuation opening, and means for causing the U-tube to vibrate. The method comprises, following a step of analyzing a sample, injecting a rinsing solvent into the injection opening of the U-tube, and subjecting the stopper to ultrasonic waves.

Abstract: Methods, systems and apparatus for cleaning phonograph records are disclosed. In some embodiments, a phonograph record can be cleaned in a liquid basin using ultrasonic transducers, wherein the liquid basin has a dampening structure. Also, the ultrasonic transducers are disposed on a flexible wall for reducing vibrations of the cleaner.

Abstract: A washing device includes a top compartment capable of receiving a manifold dispenser. The manifold dispenser is coupled to a rack and comprises at least one liquid input and a plurality of liquid outputs that operably direct fluid to contact a plurality of laboratory consumables held by the rack. A middle compartment is attached to the top compartment and comprises a washing chamber capable of receiving fluid output by the plurality of liquid outputs of the manifold dispenser. The washing chamber has a floor comprising a material transparent to ultraviolet (UV) light. A bottom compartment is attached to the washing chamber. The cottom compartment includes a light source mounted thereto. The light source is capable of outputting UV light in the direction of the washing chamber and through the floor of the washing chamber. A method of washing laboratory consumables is also disclosed.

Abstract: A method of processing a substrate having a transparent conductive oxide disposed thereon, including: exposing the substrate to a first cleaning solution comprising hydrogen peroxide and ammonium citrate; exposing the substrate to a second cleaning solution having a pH within a range from about 6 to about 7, the second cleaning solution different than the first cleaning solution; agitating the second cleaning solution; and depositing a silicon-containing film on the transparent conductive oxide.

Abstract: Several methods and devices are provided herein to generate shock waves that are used in the oil industry for well drilling, hydrocarbon or gas exploitation, fracking process or improved oil recovery (IOR), enhanced oil recovery (EOR), cleaning of process waters, oil spills byproducts and oil pipes, which can be used as independent systems or as auxiliary systems concomitantly with other existing technologies. The different devices consist of generating shock waves utilizing either one or more laser sources, or a self-generated combustible gas supply, or a micro-explosive pellet, or piezocrystals, or a piezofiber composite structure.

Abstract: The present disclosure relates to methods of preparing a material for welding. The material is prepared by utilizing a laser to obliterate contaminants from the material surface.

Abstract: An automated method of cleaning the pipes of a plate washing system is provided. The plate washing system includes at least one manifold having a plurality of pipes configured to be provided within wells of a plate in order to wash the wells, an ultrasonic transducer mounted to a tank, and a control system. The plate washing system also includes sensors to sense the position of the pipes relative to plate and the tank, and the fluid level within the wells of the plate. The method includes dispensing fluid to the tank, submerging the tips of the pipes within the fluid, activating the ultrasonic transducer in order to vibrate the fluid, and aspirating the fluid from the tank. The control system may initiate a cleaning operation at the request of the user, at a scheduled interval, or when the level sensing system detects a decrease in instrument function.

Abstract: The present invention concerns a device comprising (i) a composite material comprising (1) a plurality of conductive or semiconductive nanotubes, and (2) a matrix arranged between these nanotubes and (ii) means allowing said composite material to be subjected to an electric field. The present invention also concerns the uses of said device in particular to defoul or to modify a composite material and to electroporate at least one cell.

Abstract: Methods and apparatus are provided for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing a composition of magnetic particles dispersed within a base fluid to remove contaminants from a surface of the substrate.

Abstract: The invention includes a dust mitigation device that utilizes electromagnetic waves to protect devices from dust deposition. The device includes a nonconducting (dielectric) material separating at least one electrode, and in some embodiments a plurality of electrodes, from a grounded layer. The electrodes are connected to a single phase AC signal or a transient voltage signal. In some embodiments the grounded layer is created using a continuous conductor or a conductive grid. In some embodiments, the dielectric, the electrodes, and/or the grounded layer are transparent. The electromagnetic fields produced by the electrodes lift dust particles away from the shield and repel charged particles. Deposited dust particles are removed from the dust mitigation device when the electrodes are activated, regardless of the resistivity of the dust. The invention further includes a method of mitigating dust using such components.

Abstract: Methods of removing or softening calcium material from a substrate (e.g., a catalytic converter) and regenerating a catalytic converter are provided. A substrate (e.g., a catalyst support material) having a calcium containing material (e.g., calcium-containing fly ash) embedded or deposited thereon can be treated with a composition including one or more organosulfur oxoacids or salts thereof.

Abstract: Methods and liquid sonification systems configured to clean at least one hole of an article. The methods comprise establishing at least one pressure gradient within the at least one hole to move particles proximate to a node of a standing wave toward an antinode of the standing wave, the standing wave having an axis of propagation parallel to the central axis of the at least one hole. The methods may, in some embodiments, comprise establishing one or more sites of cavitation within the at least one hole.

Abstract: A laser cleaning device, and a laser cleaning method using the same, for removing an electrolyte solution stuck to an electrolyte tab during a process of injecting the electrolyte solution are disclosed. The laser cleaning device for an electrode tab of a battery includes: a cleaning housing, in which a battery case for receiving an electrode group, an electrolyte solution and an electrode tab exposed to the outside are embedded; a laser generator which includes a laser source for generating a laser beam and an output controller for controlling output of the laser beam; a laser transmitter which transmits the laser beam generated by the laser generator; and a laser emitting unit which is installed inside the cleaning housing, and which irradiates the laser beam transmitted by the laser transmitter onto the electrode tab so as to remove liquid pollutants stuck to the electrode tab. The laser cleaning method comprises steps generally corresponding to the latter functions of the laser cleaning device.

Abstract: The present invention relates to a new degreasing composition comprising at least one levulinic acid ester according to general formula (I) CH3CO(CH2)2COOR1 (I) in which R1 is a linear or branched, saturated or unsaturated, aliphatic or aromatic, hydrocarbon radical having 2 to 56 carbon atoms, wherein said hydrocarbon radical is optionally hydroxysubstituted. The present invention also relates to a process for degreasing a metal surface comprising the step of contacting said metal surface with the composition of the present invention.

Abstract: A method of cleaning at least one collecting electrode of an electrostatic precipitator includes applying, in a first mode of operation, a first average current between at least one discharge electrode and at least one collecting electrode, and switching from the first mode of operation to a second mode of operation in which a second average current is applied between the at least one discharge electrode and the at least one collecting electrode, the second average current being a factor of at least 3 higher than the first average current, to achieve a forced cleaning of the at least one collecting electrode.

Abstract: An ultrasonic generator is provided, in which the control system can easily be changed in accordance with a cleaning application and a cleaning process. The ultrasonic generator according to the present invention, which causes an ultrasonic transducer to oscillate a signal for ultrasonic vibration, includes a programmable multiple control circuit having a signal generation circuit for generating a signal, and an output adjustment circuit for adjusting the output of the signal from the programmable multiple control circuit, wherein the programmable multiple control circuit has a power control circuit electrically connected to the output adjustment circuit, a phase comparison circuit electrically connected to the output adjustment circuit, a frequency control circuit electrically connected to the phase comparison circuit, and a signal modulation circuit electrically connected to the frequency control circuit via the signal generation circuit.

Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.

Abstract: Lithography mask repair methods are disclosed. In one embodiment, a method of repairing a lithography mask includes providing a lithography mask, exposing a back side of the lithography mask to vacuum ultraviolet (VUV) energy, and cleaning the lithography mask.

Abstract: A method of cleaning a chamber used for annealing doped wafer substrates. In one embodiment the method provides removing dopants deposited in an annealing chamber after an annealing process of a doped substrate by flowing one or more volatilizing gases into the annealing chamber, applying heat to volatilize the deposited dopants in the annealing chamber, and exhausting the chamber to remove volatilized dopants from the annealing chamber.

Abstract: An object of the invention is to effectively remove particles on the glass substrate surfaces, even in the case wherein abrasive particles having a small particle size is used in the polishing step of the glass substrate and a supersonic treatment is performed at a high frequency at the supersonic cleaning step after the polishing step. In a manufacturing method of a glass substrate for a magnetic disk comprising a polishing step for performing polishing of the glass substrate and a supersonic cleaning step for performing supersonic cleaning of the glass substrate after the polishing step, the polishing step uses abrasive particles having a particle size of 10 nm to 30 nm and a first supersonic cleaning is performed at a frequency of 300 kHz to 1,000 kHz to form secondary particles and then a second supersonic cleaning is performed at a frequency of 30 kHz to 100 kHz in the supersonic cleaning step.

Abstract: The present invention comprises a method and system for the in-situ cleaning of a heat exchanger tube bundle of carbonaceous deposits. Using the method and system, an organic solvent is brought into fluid communication with one or more heat exchanger tube bundles in a closed system. The closed system is formed at the site of operation of the heat exchanger tube bundles and without having to remove the heat exchanger tube bundles from their shells or other associated equipment. Once the closed system is formed, the organic solvent is brought to a temperature at which it is effective to remove carbonaceous deposits from the heat exchanger tube bundle and flowed through the equipment associated with the heat exchanger tube bundles so as to contact the heat exchanger tube bundles and remove carbonaceous deposits that have formed therein.

Abstract: System and method for treating particulate solids comprises a processor for providing contaminated particulate solids at a predetermined apparent density and a screw feeder for transporting a water-based slurry of the contaminated particulate solids through an ultrasound signal of sufficient size, strength and duration to cause the contaminants to separate from the particulate solids. One or more stacks of ultrasonic transducers arranged around the screw feeder may be employed in which the diameter of each transducer preferably is substantially the same as the pitch of the screw feeder.

Abstract: The invention relates to a method for the dynamic cleaning of supply ducts for drinking water in a vehicle (A), said method being noteworthy in that it consists in creating a shockwave (O) in the duct (210) to be cleaned. The invention also relates to a device for implementing said method. Applications: cleaning of water supply ducts in vehicles including aircraft.

Abstract: An apparatus for cleaning industrial components which has a liquid container defining a liquid enclosure for containing a cleaning liquid and ultrasonic transducers having an operating frequency and a wavelength in the cleaning liquid and secured to at least a portion of the liquid container at a spacing of between 2 and 10 wavelengths. During operation, the transducers generate a larger power density in the component-receiving area of the liquid container than an average power density of the liquid container.

Abstract: A method for removing polishing byproducts and a polishing device are provided. The method includes mounting a positive electrode on the center of a polishing platen and a negative electrode on an edge of the polishing platen, applying a voltage between the positive electrode and the negative electrode after a polishing process for metal is finished, and rotating the polishing platen and rinsing a polishing pad with deionized water or a chemical cleaning solution to remove polishing byproducts that are formed in the polishing process. The combination of the centrifugal force and the electromotive force increases the removal rate of the polishing byproducts.

Abstract: A system and method for securing tokens to be cleaned includes a tray with a curved surface defining a channel extending along a first direction and spacers projecting from the curved surface into the channel. The spacers are disposed at regular intervals along the first direction. The curved surface also has at least one opening. The tokens may be inserted into the channel between adjacent spacers and the tray holding the tokens can be submerged into a cleaning liquid. Identical trays containing tokens can also be stacked and together submerged into the cleaning liquid. The tray holding the tokens can be placed on a drying surface that has a drainage hole, and wetness remaining on the tokens can be sucked through the hole in the channel and the drainage hole by a vacuum or blown through the hole in the channel and drainage hole by an air blower.

Abstract: Provided is a mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate. The thin film is made of a material that can be etched by ion-based dry etching. The concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less.

Abstract: A wet chemical processing method and apparatus for use in semiconductor manufacturing and in other applications, is provided. The method and apparatus provide for energizing a processing liquid such as a cleaning or etching liquid using ultrasonic, megasonic or other energy waves or by combining the liquid with a pressurized gas to form a pressurized spray, or using both. The energized, pressurized fluid is directed to a substrate surface using a fluid delivery system and overcomes any surface tensions associated with liquids, solids, or air and enables the processing liquid to completely fill any holes such as contact holes, via holes or trenches, formed on the semiconductor substrate.

Abstract: A system includes a UV light source and an optical medium coupled to receive UV light from the UV light source. The optical medium is configured to emit UV light proximate to a surface from which biofouling is to be removed once the biofouling has adhered to the protected surface. A method corresponds to the system.

Abstract: A method for cleaning a brush surface having a contamination is provided. The method includes steps of: providing a mechanical wave; and stripping off the contamination from the brush surface by the mechanical wave.

Abstract: An ultrasonic cleaning apparatus according to the present invention comprises a plurality of cleaning tanks configured to store a cleaning liquid, an object-to-be-processed holder capable of being inserted into each cleaning tank, the object-to-be-processed holder being configured to hold an object to be processed and to immerse the object to be processed into the cleaning liquid, a vibrator disposed on each cleaning tank, a single ultrasonic oscillator configured to make each vibrator ultrasonically vibrate, an output switch interposed between the ultrasonic oscillator and the vibrator of each respective cleaning tank, the output switch being configured to switch the vibrator that is connected to the ultrasonic oscillator, and a control device configured to control the ultrasonic oscillator and the output switch, wherein the control device controls the ultrasonic oscillator and the output switch such that a timing at which the vibrator of one of the cleaning tanks is made to ultrasonically vibrate, and a tim

Abstract: A dissolved nitrogen concentration monitoring method is used for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped. The method includes measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by ultrasonic wave irradiation. A dissolved nitrogen concentration of the cleaning liquid is calculated from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between a dissolved nitrogen concentration and an amount of increase of dissolved oxygen concentration.

Abstract: A dust remover which comprises a power supply and an electrode applied with voltage by said power supply. The dust attached to the object of dust removal is removed therefrom by bringing the electrode into contact with the object of dust removal or approaching toward the object of dust removal. The object of dust removal is a conductor and/or an insulator. The voltage applied to said electrode is a pulsed voltage of plus and minus or an AC voltage of plus and minus. Or the voltage is a DC voltage having the same polarity with that of electricity with which the dust is charged, or the voltage is a DC voltage having an opposite polarity to that of electricity with which the dust is charged. The object of dust removal includes at least a ball for “Pachinko”, a car body, a printed board, a metal box or a part thereof, a frame for glasses, a plastic lens, a plastic box or a part thereof, a fiber, a wood, a paper box or a part thereof.

Abstract: A brake control device for a brake system, wherein the brake system has at least one electromagnetic track brake device, which can be supplied with current at variable amperage according to the brake control device to create a braking force, and wherein the brake control device is designed to actuate the at least one electromagnetic track brake device at a cleaning amperage during travel in order to clean a rail. Also disclosed is a brake system having such a brake control device, a rail vehicle, and a method for cleaning a rail by means of an electromagnetic track brake device.

Abstract: A method for manufacturing integrated circuit devices. In one aspect, the invention may be a method of manufacturing integrated circuit devices comprising: supporting a semiconductor wafer in a substantially horizontal orientation; providing a transducer assembly comprising a probe having a forward portion, a rear portion and no more than one piezoelectric transducer element coupled to the rear portion; supporting the transducer assembly so that the forward portion is adjacent but spaced from a first surface of the semiconductor wafer; rotating the semiconductor wafer; applying a fluid to the first surface of the semiconductor wafer to form a film of the fluid between a portion of the forward portion and the first surface of the semiconductor wafer; and transmitting acoustical energy generated by the piezoelectric transducer element into the film of the fluid via the forward portion, the acoustical energy loosening particles from the first surface of the semiconductor wafer.

Abstract: An ultrasonic wave generating apparatus includes: a generator including an electric power supply, a controller that generates a control signal, a liquid crystal display indicator, and a transducer drive circuit; and transducer portions. The generator includes: the controller having an internal memory or a port to which an external memory is inserted, and formed of a microcomputer to control the generator and the transducer portions; thyristor portions that are arranged respectively in the front and rear ends of the transducer portions, in which two thyristors are connected in series in the respective thyristor portions; snubber circuit portions that are connected in parallel with the respective thyristor portions; at least one transducer that is connected with the controller and is included in the transducer portions; and choke coils that are connected with one end of the respective transducers in the transducer portions.

Abstract: Methods are provided for producing a pristine hydrogen-terminated silicon wafer surface with high stability against oxidation. The silicon wafer is treated with high purity, heated dilute hydrofluoric acid with anionic surfactant, rinsed in-situ with ultrapure water at room temperature, and dried. Alternatively, the silicon wafer is treated with dilute hydrofluoric acid, rinsed with hydrogen gasified water, and dried. The silicon wafer produced by the method is stable in a normal clean room environment for greater than 3 days and has been demonstrated to last without significant oxide regrowth for greater than 8 days.

Abstract: Various embodiments herein include at least one of systems, methods, and software to facilitate automatic solar power surface-cleaning. Such embodiments include at least one automatic solar power surface-cleaning robot that uses no water or external power, continuously cleans the solar power surfaces and requires no maintenance or external power. The solar power surface-cleaning robot is easy to retrofit in an existing solar power generation plant. An automatic solar power surface-cleaner uses high-voltage AC electric fields to sweep particulates and debris as the robot traverses the surface to be cleaned. Photovoltaic solar cells supply the power for the robot. No external power is required. The robot clamps to the surface to be cleaned at the edges using motor driven rollers. Electronics inside the device generate high-voltage AC that is applied to conductors close to the surface to be cleaned.

Abstract: A pool cleaning robot can include a main housing configured to be submerged in a pool. A propulsion unit within the main housing can be configured to move the pool cleaning robot along a pool surface. One or more germicidal light sources, configured to disinfect at least a portion of a pool surface, can be positioned on a bottom of the main housing. A power unit can be configured to power the propulsion unit and the one or more germicidal light sources of the pool cleaning robot.

Abstract: A system and method for prevention and removal of snowpack from solar panels increases the collection efficiency of solar panels by using one or more techniques, alone or in combination including: vibrating a vibrationally isolated surface of the solar panel; flexing a flexible sheet attached to the solar panel; inducing vibrations via extenial circulation piping for detaching the snowpack from at least one solar thermal collector of a solar array; activating a heat-pipe to transfer heat from an absorber plate to the surface of the collection panel; and using a PZT to generate vibrations for detaching the snowpack from the solar panel.

Abstract: Embodiments of the invention provide methods for curing an ultra low-k dielectric film within a UV processing chamber. In one embodiment, the method includes depositing an ultra low-k dielectric layer on a substrate in a deposition chamber, and subjecting the deposited ultra low-k dielectric layer to a UV curing processes in a UV processing chamber. The method includes stabilizing the UV processing chamber by flowing an oxygen gas and a purge gas into the UV processing chamber at a flow ratio of about 1:50000 to about 1:100. While flowing the oxygen-doped purge gas, the substrate is exposed to UV radiation to cure the deposited ultra low-k dielectric layer. The inventive oxygen-doped purge curing process provides an alternate pathway to build silicon-oxygen network of the ultra low-k dielectric material, thereby accelerating cross-linking efficiency without significantly affecting the film properties of the deposited ultra low-k dielectric material.

Abstract: Ultrasonic cleaning apparatuses and methods of cleaning substantially planar articles. An apparatus comprises (i) a substantially circular tank; (ii) a plurality of cleaning fluid inlets for delivering a cleaning fluid to the tank; (iii) an intermediate support for receiving an article to be cleaned; and (iv) an ultrasonic generator coupled to the tank for generating ultrasonic waves in the tank and cleaning fluid received therein. The apparatus is configured to remove particles from a substantially planar article and have them carried by flow of cleaning fluid away from the article and out of the tank. Using such an apparatus, a cleaning method comprises introducing a substantially planar article to be cleaned into the tank; introducing a cleaning fluid into the tank through the plurality of cleaning fluid inlets; and exciting the cleaning fluid with ultrasonic waves.

Abstract: An apparatus and method for adaptive materials arranged in a variety of orientations and with a wide range of attachment configurations to induce structural vibrations at extremely high frequencies. These mechanical vibrations cause fouling agents to become detached and accordingly “clean” an otherwise dirty element or wire of a hot-wire anemometer, planar or curvilinear sensor surface, or display surfaces. They also can be made to vibrate at such frequencies with such intensities that local droplets of water are either shaken off or instantaneously cavitate, thereby allowing the elements to be used in all weather conditions.

Abstract: Reversibly switchable (transformable) surface layer changeable from (super)hydrophobic to (super)hydrophilic surface states are described. Methods of decontamination of surfaces exposed to contaminate are provided. The reversibly switchable properties of the surface layer can be controlled by an external stimulus.

Abstract: Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a pellicle disposed across the photomask, and cleaning the photomask. The cleaning the photomask includes directing a laser beam through the pellicle toward the photomask, the laser beam having a wavelength that is substantially equal to a local maximum of an absorption spectrum of the photomask, heating the photomask with the laser beam, and transferring heat from the photomask to a contaminant disposed on the photomask, thereby thermally decomposing the contaminant.

Abstract: A detection device detecting a state of a toner image, an image forming apparatus including a detection device and method of detection are provided. The detection device includes a detector having a light window where light passes through and detecting a state of a toner image formed on an image bearing member via the light window, and a cleaner removing a pollutant attached to a surface of the light window. The cleaner includes an adsorption unit formed of a conductive material and reciprocating while being in contact with the surface of the light window and a voltage applying unit applying a voltage for adsorbing the pollutant to the adsorption unit.

Abstract: A method for manufacturing a semiconductor device includes forming a patterned photoresist layer over a substrate, performing a plasma ashing process to the patterned photoresist layer, thereby removing a portion of the patterned photoresist layer, exposing the patterned photoresist layer to broadband ultraviolet radiation and ozone, thereby removing other portions of the patterned photoresist layer, and performing a cleaning of the patterned photoresist layer after exposing the patterned photoresist layer to broadband ultraviolet radiation and ozone.

Abstract: An apparatus and a method of sterilizing inner walls of containers, wherein the apparatus has at least one electron beam emitter with at least one electron beam accelerator and an outlet window for the electron beams, a conveying device for conveying the containers to be sterilized and a reciprocating device for permitting a relative movement between the containers and the outlet window in a longitudinal direction of the containers. A reflector apparatus is connected to the electron beam emitter in a positively locking and/or friction locking manner at least locally in a region of the outlet window and is capable of being introduced at least locally during a defined period of time into an interior space of the container to be sterilized, in order to apply the electron beams to the inner walls of the container.