Abstract: An image senor may include an array of pixels controlled by row control circuitry. Each pixel may include a photodiode for generating image signals and a charge storage structure coupled to a floating diffusion region and configured to generate and store parasitic light noise level signals. The image signals and the parasitic light noise level signals may be read out in the same readout cycle using shared or separate readout circuitry. Processing circuitry may selectively process the image signals based on the parasitic light noise level signals to generate image signals with reduced noise.

Abstract: A photodetector structure includes a substrate including a semiconductor film, a light absorption layer which is in contact with the semiconductor film and includes germanium (Ge), on the substrate, a first coating layer which wraps at least a part of a side surface of the light absorption layer, on the substrate, and an optical waveguide which is in contact with the light absorption layer and includes silicon nitride (SiN), on the first coating layer, wherein a lower surface of the optical waveguide is higher than a lower surface of the light absorption layer.

Abstract: Various embodiments of the present technology may comprise a method and apparatus for a polarizing filter. The polarizing filter may be formed such that the filter has varying polarization axes for blocking reflected light emitted from various directions. The method and apparatus may utilize metal wires or molecular chains to form curved lines across the filter, where the curved lines define the polarization axes.

Abstract: A method of measuring an image sensor is disclosed. The method includes connecting a measurement unit to an image sensor, producing an electric current, which sequentially flows through a second connection line, second lower electrodes, an upper electrode, first lower electrodes, and a first connection line of the image sensor, using the measurement unit, and measuring an alignment state of the lower electrodes, the photoelectric conversion layer, and the upper electrode.

Abstract: A semiconductor image sensor device includes a semiconductor substrate, a radiation-sensing region, and a first isolation structure. The radiation-sensing region is in the semiconductor substrate. The first isolation structure is in the semiconductor substrate and adjacent to the radiation-sensing region. The first isolation structure includes a bottom isolation portion in the semiconductor substrate, an upper isolation portion in the semiconductor substrate, and a diffusion barrier layer surrounding a sidewall of the upper isolation portion.

Abstract: Embodiments of the invention relate to a method for producing a color sensor with a sensor characteristic adjusted by three sensor elements that each comprise an element characteristic, and a color filter cooperating with the sensor elements and consisting of color filter elements that each comprise a filter element characteristic, and to a color sensor. Embodiments include a method with which a color sensor with a precisely adjustable sensor characteristic can be produced from several photosensitive elements and from simple filter elements is solved in that the particular filter element characteristics are adjusted in such a manner that they have in cooperation with the respective element characteristic an interim characteristic of the sensor which deviates from the sensor characteristic on the whole, wherein the sensor characteristic is generated from the interim characteristic by a transformation algorithm using transformation parameters.

Abstract: According to one aspect of the invention, provided is a solid state imaging device having a pixel including a photoelectric conversion portion provided in a semiconductor substrate. The photoelectric conversion portion includes first and second charge accumulation region of a first conductivity type provided at a first depth of the semiconductor substrate and spaced apart from each other by a first gap, and first and second semiconductor region of a second conductivity type provided at a second depth located under the first depth of the semiconductor substrate and extend over the first charge accumulation region, the first gap, and the second charge accumulation region in a planar view. At the second depth, an impurity concentration of the second conductivity type in a region under the first gap is higher than an impurity concentration of the second conductivity type in a region under the first and second charge accumulation regions.

Abstract: A sensing module including a sensing array, a first shielding layer, a second shielding layer, and a reflective layer is provided. The sensing array includes a plurality of light passing regions and a light receiving surface facing away from an object, and the sensing array is located between the first shielding layer having a plurality of first openings and the second shielding layer having a plurality of second openings. The second shielding layer is located between the sensing array and the reflective layer. The light beams reflected by the object sequentially pass through the first openings, the light passing regions, the second openings, and are then transmitted to the reflective layer. The light beams are reflected by the reflective layer and then pass through the second openings again to be transmitted to the light receiving surface of the sensing array. An image capturing apparatus is also provided.

Abstract: A solid-state imaging device including a semiconductor substrate on which a plurality of photoelectric conversion devices are arranged in an imaging device region in a two-dimensional array and a stacked body formed by stacking a plurality of layers on the semiconductor substrate. The stacked body includes an in-layer lens layer that has in-layer lenses each provided at a position corresponding to each of the photoelectric conversion devices. The solid-state imaging device further includes a planarization layer that is stacked on the in-layer lens layer and an on-chip lens layer that is an upper layer than the planarization layer and that has on-chip lenses each provided at a position corresponding to each of the photoelectric conversion devices. The in-layer lens layer has a plurality of structures at a height equal to a height of the in-layer lenses, the plurality of structures being provided on an outside of the imaging device region.

Abstract: Provided is a solid-state imaging device including: an effective pixel region of a substrate, effective pixels being arranged in the effective pixel region; an interconnection region around the effective pixel region, electrodes or interconnects being provided in the interconnection region; a peripheral region outside the interconnection region; and a film formed on the substrate. A cross-sectional height of the film in the effective pixel region is smaller than a cross-sectional height of the film in the interconnection region, and a cross-sectional height of the film in the peripheral region and a cross-sectional height of the film in at least a portion of a middle region between the effective pixel region and the interconnection region, the portion being closer to the interconnection region, are between the cross-sectional height of the film in the effective pixel region and the cross-sectional height of the film in the interconnection region.

Abstract: An illumination marker includes a light source and an optical attenuation cover coupled to the light source. The optical attenuation cover is configured to attenuate an intensity of light that passes through the optical attenuation cover based on a length of an optical path of the light through the optical attenuation cover. In some embodiments, the optical attenuation cover may be embodied as a physical barrier cover and include light-blocking structures. Additionally, in some embodiments, the illumination maker may include a diffusive or retro-reflective core rather than the light source.

Abstract: A sensor includes a first substrate including at least a first pixel. The first pixel includes an avalanche photodiode to convert incident light into electric charge and includes an anode and a cathode. The cathode is in a well region of the first substrate. The first pixel includes an isolation region that isolates the well region from at least a second pixel that is adjacent to the first pixel. The first pixel includes a hole accumulation region between the isolation region and the well region. The hole accumulation region is electrically connected to the anode.

Abstract: An image sensor includes a substrate including a plurality of pixel regions and having a trench between the pixel regions, a photoelectric conversion part in the substrate of each of the pixel regions, and a device isolation pattern in the trench. The device isolation pattern defines an air gap. The device isolation pattern has an intermediate portion and an upper portion narrower than the intermediate portion.

Abstract: A BSI image sensor includes a substrate including a front side and a back side opposite to the front side, a plurality of pixel sensors arranged in an array, an isolation grid disposed in the substrate and separating the plurality of pixel sensors from each other, a reflective grid disposed over the isolation grid on the back side of the substrate, an a low-n grid disposed over the back side of the substrate and overlapping the reflective grid from a top view. A depth of the reflective grid is less than a depth of the isolation grid. A width of the low-n grid is greater than a width of the reflective grid.

Abstract: The present disclosure relates to a CMOS image sensor having a pixel device on a deep trench isolation (DTI) structure, and an associated method of formation. In some embodiments, a deep trench isolation (DTI) structure is disposed at a peripheral of a pixel region, extending from a back-side of the substrate to a position within the substrate. A pixel device is disposed at the front-side of the substrate directly overlying the DTI structure. The pixel device comprises a pair of source/drain (S/D) regions disposed within the substrate and reaching on a top surface of the DTI structure. By forming the disclosed pixel device directly overlying the DTI structure to form a SOI device structure, short channel effect is reduced because of the room for pixel device and also because the insulation layer underneath the pixel device. Thus higher device performance can be realized.

Abstract: The present disclosure relates to an imaging element, an electronic device, and an information processing device capable of more easily providing a wider variety of photoelectric conversion outputs. An imaging element of the present disclosure includes: a photoelectric conversion element layer containing a photoelectric conversion element that photoelectrically converts incident light; a wiring layer formed in the photoelectric conversion element layer on the side opposite to a light entering plane of the incident light, and containing a wire for reading charges from the photoelectric conversion element; and a support substrate laminated on the photoelectric conversion element layer and the wiring layer, and containing another photoelectric conversion element. The present disclosure is applicable to an imaging element, an electronic device, and an information processing device.

Abstract: To prevent a leakage current in a semiconductor integrated circuit in which a plurality of semiconductor substrates is laminated with a through-silicon via. Into a silicon substrate, one of P-type impurities and N-type impurities is implanted at a predetermined concentration. Into a plurality of channels, the other of the P-type impurities and the N-type impurities is implanted at a higher concentration than the predetermined concentration on one surface of the silicon substrate. An electrode is formed in each of the plurality of channels. Into a well layer, the same impurities as in the silicon substrate are implanted at a higher concentration than the predetermined concentration between the other surface of the silicon substrate and the plurality of channels.

Abstract: The disclosed apparatus, systems and methods relate to devices, systems and methods for intra-operative imaging.

Abstract: A global shutter CMOS image sensor includes a photodiode, a floating diffusion region, and a storage diode disposed in the upper portion of the substrate. The storage diode is disposed between the photodiode and the floating diffusion region. A first transfer gate is disposed on the substrate between the photodiode and the storage node. A second transfer gate is disposed on the substrate between the storage diode and the floating diffusion region. A first dielectric layer is disposed on the substrate and covers the first transfer gate and the second transfer gate. A light-shielding layer is disposed on the first dielectric layer. A light pipe is disposed through the light-shielding layer and a portion of the first dielectric layer, and is correspondingly disposed above the photodiode. The light pipe has a higher refractive index than the first dielectric layer.

Abstract: A semiconductor image sensor includes a substrate having a first side and a second side that is opposite the first side. An interconnect structure is disposed over the first side of the substrate. A plurality of radiation-sensing regions is located in the substrate. The radiation-sensing regions are configured to sense radiation that enters the substrate from the second side. A plurality of isolation structures are each disposed between two respective radiation-sensing regions. The isolation structures protrude out of the second side of the substrate.

Abstract: The present invention relates to an optical article and an optical filter comprising the same. The optical filter comprises an optical article containing one or more near-infrared absorbing dyes and having two or more absorption peaks comprising a first absorption peak and a second absorption peak in a wavelength range of 380 nm to 1,200 nm whereby the optical filter has advantages in that transmissivity is high with respect to light having the wavelength of a visible light region and transmissivity is suppressed to 0.6% or less with respect to light having a wavelength in the range of 800 nm to 1,000 nm so that ghost image problems can be prevented, and a yield and productivity can be improved through the reduction of poor assembly caused by the bending of the optical filter in an image device assembling process.

Abstract: A disclosed embodiment includes: semiconductor substrate including a pixel region in which a plurality of pixels are arranged, each of the pixels including a photoelectric conversion unit configured to accumulate charges generated from an incident light, a charge holding portion configured to hold the charges transferred from the photoelectric conversion unit, and an amplification unit including an input node configured to receive the charges transferred from the charge holding portion; a light-shielding portion arranged so as to cover at least the charge holding portion and extending over at least two or more of the plurality of pixels; a contact plug connected to the light-shielding portion; and a wiring connected to the contact plug to supply a fixed potential to the light-shielding portion via the contact plug.

Abstract: A wire grid polarizer (WGP) can have a conformal-coating to protect the WGP from at least one of the following: corrosion, dust, and damage due to tensile forces in a liquid on the WGP. The conformal-coating can include a silane conformal-coating with chemical formula (1), chemical formula (2), or combinations thereof: A method of applying a conformal-coating over a WGP can include exposing the WGP to Si(R1)d(R2)e(R3)g. In the above WGP and method, X can be a bond to the ribs; each R1 can be a hydrophobic group; each R3, if any, can be any chemical element or group; d can be 1, 2, or 3, e can be 1, 2, or 3, g can be 0, 1, or 2, and d+e+g=4; R2 can be a silane-reactive-group; and each R6 can be an alkyl group, an aryl group, or combinations thereof.

Abstract: An encapsulated integrated photodetector waveguide structures with alignment tolerance and methods of manufacture are disclosed. The method includes forming a waveguide structure bounded by one or more shallow trench isolation (STI) structure(s). The method further includes forming a photodetector fully landed on the waveguide structure.

Abstract: The present disclosure is directed to a method for forming a light blocking material layer on a back side illuminated image sensor device. The light blocking material layer can block or absorb light rays incoming to the back side illuminated image sensor device at grazing incident angles. The light blocking material layer can be formed using a self-aligned process that does not require the use of a photolithography mask or photolithography operations. For example, the light blocking material layer can be formed over an image sensor device and subsequently etched so that the light blocking material layer remains in areas where light rays incoming at grazing incident angles enter the back side illuminated image sensor device.

Abstract: The present disclosure relates to a monolithic externally modulated laser (EML), which includes a substrate, a laser element, and an electro-absorption modulator (EAM). Both the laser element and the EAM reside over the substrate. The laser element includes a laser bottom electrode over the substrate, a laser core component over the laser bottom electrode, and a laser top electrode over the laser core component. The EAM includes a modulator bottom electrode over the substrate, a modulator core component over the modulator bottom electrode, and a modulator top electrode over the modulator core component. Herein, at least portions of the substrate, which are directly under the laser bottom electrode and directly under the modulator bottom electrode, are electrically non-conductive. The laser top electrode is isolated from the modulator top electrode, and the laser bottom electrode is isolated from the modulator bottom electrode.

Abstract: An image sensing device and a method for forming the same are disclosed. The image sensing device includes a substrate including one or more photoelectric conversion elements, and a grid structure disposed over the substrate. The grid structure includes an air layer, a support film formed over the air layer, and a capping film formed at side surfaces of the air layer and the support film and at a top surface of the support film.

Abstract: A component with an geometrically adapted contact structure and a method for producing such a component are disclosed. In an embodiment a component includes a contact structure including a contiguous contact layer having a plurality of openings and being assigned to a first electrical polarity of the component and a plurality of individual contacts at least in part having different vertical heights, wherein the contacts extend in the openings throughout the contiguous contact layer, wherein the contacts are laterally spaced from each other and assigned to a second electrical polarity of the component, and wherein the contacts are arranged with respect to their different heights and their positions such that a height distribution of the contacts is adapted to a predetermined geometrically non-planar contour profile.

Abstract: A method of manufacturing an image sensing apparatus includes: forming a first substrate structure including a first region of a pixel region, the first substrate structure having a first surface and a second surface; forming a second substrate structure including a circuit region for driving the pixel region, the second substrate structure having a third surface and a fourth surface; bonding the first substrate structure to the second substrate structure, such that the first surface is connected to the third surface; forming a second region of the pixel region on the second surface; forming a first connection via, the first connection via extending from the second surface to pass through the first substrate structure; mounting semiconductor chips on the fourth surface, using a conductive bump; and separating a stack structure of the first substrate structure, the second substrate structure, and the semiconductor chips into unit image sensing apparatuses.

Abstract: A solid state imaging device has a global shutter structure and includes: a photodetector; a wiring layer; a first transparent insulating film disposed immediately above the photodetector and penetrating the wiring layer; a transparent protective film covering the wiring layer and the first transparent insulating film, and having a higher refractive index than the first transparent insulating film; a first projection provided on the transparent protective film and having a quadrilateral shape in top view; and a second transparent insulating film having a lower refractive index than the first projection.

Abstract: A semiconductor device is disclosed including a stack of wafers having a densely configured 3D array of memory die. The memory die on each wafer may be arranged in clusters, with each cluster including an optical module providing an optical interconnection for the transfer of data to and from each cluster.

Abstract: Color separation devices, and image sensors including the color separation devices and color filters, include at least two transparent bars that face each other with a gap therebetween. Mutually-facing surfaces of the at least two transparent bars are separated from each other by the gap such that the at least two transparent bars allow diffraction of visible light passing therebetween. The at least two transparent bars have a refractive index greater than a refractive index of a surrounding medium.

Abstract: A method of encapsulating a sensor device includes providing at least one sensor device that has a sensor portion on a substrate. An exclusionary zone is formed above an upper surface of the sensor portion. An outer boundary is formed on or about the sensor device with the outer boundary encircling the exclusionary zone. A mold material is deposited into a volume defined in part by the sensor device, the exclusionary zone, and the outer boundary to encapsulate portions of the sensor device. The exclusionary zone in one embodiment is an inner boundary that is formed on the sensor portion. The inner boundary encircles a portion of the upper surface of the sensor portion. The exclusionary zone in another embodiment is a selectively removable material deposited on the upper surface of the sensor portion. The selectively removable material occupies a space above a portion of the upper surface.

Abstract: It is possible to obtain a thin film that can form a minute pattern and that has a high index of refraction by using a polymer containing a triazine ring and containing a repeating unit structure represented for example by formula (22) or (26).

Abstract: The present technology relates to an imaging element package and a camera module capable of improving reliability. An imaging element package includes a flexible substrate, an imaging element connected to a first surface of the flexible substrate, and a member, bonded to a second surface of the flexible substrate opposite to the first surface with an adhesive, having a linear expansion coefficient different from the flexible substrate, in which in a portion of the adhesive, a slit is formed which intersects with a direction from the imaging element toward an end of the flexible substrate as viewed from a direction perpendicular to the flexible substrate. The present technology is applied to a camera module.

Abstract: An optical isolation structure and a method for fabricating the same are provided. The optical isolation structure includes a first dielectric layer, a second dielectric layer, a third dielectric layer and a dielectric post. The first dielectric layer includes a trench portion located in a trench of the semiconductor substrate. The second dielectric layer includes a trench portion covering the trench portion of the first dielectric layer and located in the trench of the semiconductor substrate. The third dielectric layer includes a trench portion covering the trench portion of the second dielectric layer and located in the trench of the semiconductor substrate. The dielectric post is disposed in the trench of the semiconductor substrate and covering the trench portion of the third dielectric layer.

Abstract: An image sensor includes a semiconductor substrate having first and second surfaces facing each other and a first device isolation layer provided in the semiconductor substrate. The first device isolation layer defines pixel regions of the semiconductor substrate and includes first and second portions crossing each other. The first and second portions are provided to surround one of the pixel regions, and the first portion is provided to extend from the first surface of the semiconductor substrate toward the second surface and to have a structure inclined relative to the first surface.

Abstract: The thickness of an embedding film in a pixel region is adjusted without adding a step. A method of manufacturing a solid-state image sensor (100) according to an embodiment of the present invention includes a development step of removing a photosensitive material (M) in a peripheral circuit region (30) and reducing and adjusting the thickness of the photosensitive material (M) that is in a pixel region (20) and on a multilayered wiring layer (5) to a desired film thickness.

Abstract: The present disclosure relates to a camera module and a photosensitive assembly thereof. The photosensitive assembly includes a circuit board, a photosensitive chip and a packaging body. The photosensitive chip is connected to the circuit board, and includes a photosensitive region and a non-photosensitive region surrounding the photosensitive region. The packaging body is formed on the circuit board and a portion of the non-photosensitive region of the photosensitive chip. The packaging body includes a top surface away from the photosensitive chip and an inner side surface connecting the top surface to the non-photosensitive region. A portion of the inner side surface adjacent to the top surface is a cambered surface, and the cambered surface has a larger surface area than an inclined plane, thus the cambered surface can carry more adhesive. In this way, it is possible to effectively prevent the adhesive from flowing to the photosensitive region of the photosensitive chip.

Abstract: A silicon carbide single crystal substrate includes a first main surface and an orientation flat. The orientation flat extends in a <11-20> direction. The first main surface includes an end region extending by at most 5 mm from an outer periphery of the first main surface. In a direction perpendicular to the first main surface, an amount of warpage of the end region continuous to the orientation flat is not greater than 3 ?m.

Abstract: A CMOS image sensor encapsulation structure and its manufacturing method, including: forming a blind hole in a combined layer formed by a first insulating layer and a wafer, a surface of the first insulating layer facing away from the wafer having a micro convex lens; forming a second insulating layer on a hole wall of the blind hole, then filling an electrically conductive material in the blind hole having the second insulating layer, and making a conductor in the combined layer in signal connection with the micro convex lens and an IC extend to a surface of the first insulating layer and electrically connecting the conductor to the electrically conductive material; fixing the transparent substrate material on a surface of the first insulating layer having the micro convex lens, forming a dummy wafer on a surface of the transparent substrate material, and then thinning the wafer by grinding.

Abstract: A method for producing an infrared emitter arrangement is provided. The method includes providing a carrier. The carrier includes at least one infrared emitter structure at a first side of the carrier and at least one cutout at a second side of the carrier, said second side being situated opposite the first side of the carrier, wherein the at least one cutout extends from the second side of the carrier in the direction of the at least one infrared emitter structure. The method further includes securing an infrared filter layer structure at the second side of the carrier in such a way that the at least one cutout separates the at least one infrared emitter structure from the infrared filter layer structure.

Abstract: Disclosed are a CMOS image sensor encapsulation structure and a method for manufacturing the same, including the steps of: firstly, a transparent substrate material is fixed to a surface of a first insulating layer having a micro convex lens, a dummy wafer is fixed on a surface of the transparent substrate material, and then a wafer is thinned by grinding, and in this process, the transparent substrate material provides more mechanical support force for the wafer, therefore, the wafer can become thinner by grinding, thus the CMOS image sensor encapsulation structure is characterized by being formed in a thin shape. Besides, a second installation area has a protection glue layer which can prevent oxygen and moisture from entering internal elements and absorb scattered light.

Abstract: A semiconductor structure includes a semiconductive substrate including a first side and a second side opposite to the first side, a radiation sensing device disposed in the semiconductive substrate, and an ILD disposed over the first side of the semiconductive substrate, and a conductive pad disposed within the semiconductive substrate and the ILD, and electrically connected to an interconnect structure. A top surface of the conductive pad is between the first side of the semiconductive substrate and the second side of the semiconductor substrate.

Abstract: The invention aims for an avalanche photodiode comprising an absorption zone (2), a multiplication zone (3), a first electrode and a second electrode. The photodiode further comprises a waveguide (10) forming a curved closed circuit capable of guiding a luminous flux over several turns of said circuit. The absorption zone extends over a portion at least of said waveguide, and the multiplication zone, the first and second electrodes extend along one part at least of the curved closed circuit. The waveguide is preferably an edge waveguide forming a ring and comprising an absorption zone made of germanium of width less than 200 nm. The photodiode according to the invention has an improved compacity and an improved bandwidth while limiting the multiplication noise.

Abstract: Some embodiments of the invention provide a three-dimensional (3D) circuit that is formed by vertically stacking two or more integrated circuit (IC) dies to at least partially overlap. In this arrangement, several circuit blocks defined on each die (1) overlap with other circuit blocks defined on one or more other dies, and (2) electrically connect to these other circuit blocks through connections that cross one or more bonding layers that bond one or more pairs of dies. In some embodiments, the overlapping, connected circuit block pairs include pairs of computation blocks and pairs of computation and memory blocks. The connections that cross bonding layers to electrically connect circuit blocks on different dies are referred to below as z-axis wiring or connections. This is because these connections traverse completely or mostly in the z-axis of the 3D circuit, with the x-y axes of the 3D circuit defining the planar surface of the IC die substrate or interconnect layers.

Abstract: The present disclosure relates to a solid-state imaging apparatus that is configured by laminating a first structure body, at which a pixel array unit in which pixels for performing photoelectric conversion are two-dimensionally aligned is formed, and a second structure body, at which an output circuit unit for outputting a pixel signal outputted from the pixels to the outside of the apparatus is formed. The output circuit unit, a through via which penetrates a semiconductor substrate constituting a part of the second structure body, and a signal output external terminal connected to the outside of the apparatus are arranged under the pixel array unit of the first structure body, the output circuit unit is connected to the signal output external terminal via the through via, and the outermost surface of the apparatus is a resin layer formed on an upper layer of an on-chip lens of the pixel array unit.

Abstract: An image sensing device for minimizing light reflected from a light shielding layer is disclosed. The image sensing device includes a semiconductor layer formed to include an active pixel region and an optical black pixel region, a light shielding layer located at the optical black pixel region formed over the semiconductor layer, a first color filter layer located at the active pixel region formed over the semiconductor layer, and a second color filter layer located over the light shielding layer. Each of the first and second color filter layers includes at least one first color filter, at least one second color filter, and at least one third color filter. In the first color filter layer, the first color filter, the second color filter, and the third color filter are arranged in the same layer.

Abstract: An image-sensor device is provided. The image-sensor device includes a substrate having a front side and a back side. The image-sensor device also includes a radiation-sensing region operable to detect incident radiation that enters the substrate through the back side. The image-sensor device further includes a deep-trench isolation structure extending from the back side towards the front side. The deep-trench isolation structure includes a dielectric layer, and the dielectric layer contains hafnium or aluminum.

Abstract: A micro-fabricated atomic clock structure is thermally insulated so that the atomic clock structure can operate with very little power in an environment where the external temperature can drop to ?40° C., while at the same time maintaining the temperature required for the proper operation of the VCSEL and the gas within the vapor cell.