Abstract: The power semiconductor package includes a semiconductor mounting substrate, a mother case having an opening and containing the semiconductor mounting substrate therein, a securing member having a plurality of securing positions formed along a rim constituting the opening, and a screw terminal and a pin terminal secured at the rim and electrically connected to the semiconductor mounting substrate. The screw terminal and the pin terminal are each secured by the securing member at one of the plurality of securing positions thereof. Thus, the package can adapt to variation in shape and arrangement of terminals due to differences in circuit configuration and the like of the semiconductor apparatuses, and can reduce restriction on the layout within the enclosure.

Abstract: A first insulating film is formed on a semiconductor substrate. A first interconnection is formed in a trench formed in the first insulating film. A first barrier film is formed between the first interconnection and first insulating film. A second insulating film is formed on the upper surface of the first interconnection, and in a first hollow portion between the side surface of the first barrier film and the first insulating film. The second insulating film is formed from the upper surface of the first interconnection to a depth higher than the bottom surface of the first interconnection. The first hollow portion is formed below the bottom surface of the second insulating film.

Abstract: A semiconductor device includes a semiconductor chip, electrodes pads, first and second insulating layers, first and second conductive patterns and external terminals. The electrode pads are formed on a first area of a main surface of the semiconductor chip. The first insulating layer is formed on the first and second areas of the semiconductor chip and exposes the electrode pads. The first conductive pattern transfers a signal and is formed on the first insulating layer. A second insulating layer is formed on the first conductive pattern and the first insulating layer. The second conductive pattern is formed on the second insulating layer and provides a ground potential. The external terminals are formed on the first and second patterns at the second area.

Abstract: In the peripheral part of a semiconductor chip, third electrode pads for wire bonding and plate wiring and first electrode pads dedicated to wire bonding are provided. On the other hand, second electrode pads dedicated to plate wiring are provided on an inner part away from the edge of the semiconductor chip. Further, the first and second electrode pads are connected via metal bypass layers, respectively. In the case of wire bonding, the first and third electrode pads are used and the third electrode pads are encapsulated with an insulating layer. Further, in the case of plate wiring, the second and third electrode pads are used and the first electrode pads are covered with an insulating layer. This realizes a semiconductor chip which has great versatility and which can be used in semiconductor packages of various types.

Abstract: The present invention relates to a substrate structure comprising at least two substrate layers extending in substantially parallel planes, which substrate layers are (Z-)interconnected in a direction substantially perpendicular to said planes. It comprises at least one adhesive film layer for interconnecting said at least two substrate layers, said adhesive film layer(s) comprising non-conductive portions and conductive portions. The position(s) of conductive portions is controllable such as to admit positioning of conductive portions at locations in the substrate layers where electrical conductivity is needed in a direction substantially perpendicular to the planar extension of, and between, two interconnected substrate layers.

Abstract: A method for manufacturing an electronic component includes: cutting a wiring substrate along a line intersecting with an outline of a reinforcing member, the wiring substrate including a base substrate, a wiring pattern provided to a first surface of the base substrate, and the reinforcing member provided to a second surface of the base substrate; and attaching a reinforcing sticker to the base substrate after cutting the wiring substrate so as to cover at least a part of a crack produced in the base substrate in cutting the wiring substrate.

Abstract: Interlayer connections, i.e., vertical connections, may be formed on the basis of a hard mask material, which may be positioned below, within or above an interlayer dielectric material, wherein one lateral dimension is defined by a trench mask, thereby obtaining a desired interlayer connection in a common patterning process. Furthermore, the thickness of at least certain portions of the metal lines may be adjusted with a high degree of flexibility, thereby providing the possibility of significantly reducing the overall resistivity of metal lines in metal levels, in which device performance may significantly depend on resistivity rather than parasitic capacitance.

Abstract: A method of manufacturing a substrate joint body by mounting a TFT on a wiring substrate includes a step of arranging an electrode pad of the wiring substrate and an electrode pad of the TFT at a predetermined interval and mechanically coupling the wiring substrate and the TFT with a adhesive and a step of electrically coupling the wiring substrate and the TFT by growing a bump from the electrode pad of the wiring substrate and/or the electrode pad of the TFT.

Abstract: In a semiconductor integrated circuit including a plurality of cells, a supplementary power-supply wire is disposed between a lattice-shaped upper power-supply wire and a lower cell power-supply wire for cases in which power is supplied from the upper power-supply wire to the lower cell power-supply wire. The supplementary power-supply wire and the lower cell power-supply wire are connected by two vias. The supplementary power-supply wire and the upper power-supply wire are connected by a single via. Current from the supplementary power-supply wire is divided by the two vias and then supplied to the lower cell power-supply wire. Therefore, when power is supplied from the upper power-supply wire to the lower cell power-supply wire, current concentration at the connection points of the lower cell power-supply wire to the vias is decreased, thereby reducing wire breaks caused by EM (electro migration).

Abstract: A power semiconductor arrangement is provided that includes a power semiconductor chip being electrically connected to a set of plug-like elements with at least two plug-like elements and further including a sheet metal strip line including a set of openings receiving the first set of plug-like elements, where the set of openings in the sheet metal strip line and the set of plug-like elements establish a press fit connection.

Abstract: A symmetrical circuit layout structure includes a number of signal wires, a ground wire and a dielectric layer. The signal wires include a first portion placed on a first plane and a second portion placed on a second plane. The ground wire includes a first portion placed above the first portion of the signal wires and adjacent to the second portion of the signal wires, and a second portion placed below the second portion of the signal wires and adjacent to the first portion of the signal wires. The dielectric layer is placed between the first plane and the second plane.

Abstract: In a method of manufacturing a circuit substrate of the present invention, a first through hole is formed in a semiconductor substrate and a first insulating layer is formed on the entire surface of the semiconductor substrate, and then first wiring layers connected to each other via an outer through conducting portion provided on the inner surface of the first through hole are formed on both sides of the semiconductor substrate, and then a second insulating layer is formed which covers the first wiring layers on both sides of the semiconductor substrate and the outer through conducting portion on the inner surface of the first through hole, the second insulating layer has a structure in which a second through hole is provided in a central portion of the first through hole, and then second wiring layers connected to each other via an inner through conducting portion provided in the second through hole are formed on the second insulating layer on both sides of the semiconductor substrate.

Abstract: One or more embodiments are related to a semiconductor structure, comprising: a semiconductor chip; a conductive layer comprising at least a first conductive pathway and a second conductive pathway spacedly disposed from the first conductive pathway, the first conductive pathway electrically coupled to the chip, at least a portion of the first conductive pathway disposed outside the lateral boundary of the chip, at least a portion of the second conductive pathway disposed outside the lateral boundary of the chip; and a conductive interconnect disposed outside the lateral boundary of the chip, the conductive interconnect electrically coupling the first conductive pathway to the second conductive pathway.

Abstract: A rewiring substrate strip (100) has a plurality of semiconductor component positions (2) for semiconductor components (3). The semiconductor component positions are arranged in rows and columns. A plurality of semiconductor component positions (2) can be combined to form a component group (5). The semiconductor components (3) of a component group (5) can be arranged with respect to one another in such a way that a single characteristic component edge (22) of a single semiconductor component is oriented with respect to one of the sawing tracks (12).

Abstract: A semiconductor module has a coupling substrate which is used for the internal electrical coupling of an integrated circuit on adjacent semiconductor chips. The semiconductor chips have integrated circuits and are arranged on a mount structure. The semiconductor chips are externally connected to external contacts. The coupling substrate overlaps edge areas of the adjacent semiconductor chips.

Abstract: An integrated circuit and method of fabricating the same are provided. Included are an active circuit, and a metal layer disposed, at least partially, above the active circuit. Further provided is a bond pad disposed, at least partially, above the metal layer. To prevent damage incurred during a bonding process, the aforementioned metal layer may define a frame with an outer periphery and an inner periphery.

Abstract: A method of forming a protective structure on a top metal line on an interconnect structure is disclosed. The method includes providing a plate opening in the passivation layer on the top metal line and forming a protective plate in the plate opening on the top metal line.

Abstract: An efficient chip stacking structure is described that includes a leadframe having two surfaces to each of which can be attached stacks of chips. A chip stack can be formed by placing a chip active surface on a back surface of another chip. Electrical connections between chips and leads on the leadframe are facilitated by bonding pads on chip active surfaces and by via that extend from the bonding pads through the chips to the back surfaces.

Abstract: An electronic device may include first, second, and third substrates wherein the second electronic substrate is between the first and second electronic substrates. A first electrical and mechanical connection may be provided between the first and third electronic substrates, and a second electrical and mechanical connection may be provided between the second and third electronic substrates. In addition or in an alternative, an electronic device may include a printed circuit board, a first electronic substrate on the printed circuit board, a second electronic substrate on the first electronic substrate, and a third electronic substrate on the second electronic substrate. More particularly, the first electronic substrate may be between the printed circuit board and the second electronic substrate, and the second electronic substrate may be between the first and third electronic substrates.

Abstract: A metal layer structure of a semiconductor memory device is disclosed. The metal layer structure includes: a first metal layer to be connected to a contact plug; and a plurality of a second metal layers that are formed in parallel at a second spaced distance around the first metal layer, wherein a spaced distance of the second metal layers nearest the first metal layer maintains the second spaced distance which is wider than a first spaced distance of the second metal layers around the contact plug, and the spaced distance of the second metal layer next to the first metal layer maintains a third spaced distance, which is narrower than the second spaced distance, and the spaced distance between adjacent second metal layers gradually decreases to eventually be equal to the first spaced distance, for the second metal layers farthest from the first metal layer.

Abstract: Systems and arrangements to interconnect cells and structures within cells of an integrated circuit to enhance cell density. Embodiments comprise an adjusted polysilicon gate pitch to metal wire pitch relationship to improve area scalars while increasing ACLV tolerance with a fixed polysilicon gate pitch. In some embodiments, the wire pitch for at least one metallization layer is adjusted to match the pitch for the polysilicon gate. In one embodiment, the next to the lowest metallization layer running in the same orientation as the polysilicon gate, utilized to access the input or output of the interconnected cell structures is relaxed to match the minimum contacted gate pitch and the metal is aligned above each polysilicon gate. In another embodiment, the polysilicon gate pitch may be relaxed to attain a smaller lowest common multiple with the wire pitch for an integrated circuit to reduce the minimum step off.

Abstract: A semiconductor device having a plurality of layers and a plurality of circuit elements arranged in tiles. At least one of the plurality of layers in the semiconductor device may be a via layer configured to determine the connections of the plurality of circuit elements. The semiconductor device may include an interconnection quilt having a plurality of metal layers disposed to interconnect the plurality of circuit elements. The plurality of circuit elements may be analog circuit element and/or digital circuit elements. The tiles may be analog tiles and digital tiles that form a mixed signal structured array.

Abstract: A semiconductor chip is provided to include one or more distinct but functionally interfaced dynamic array sections. Each dynamic array section follows a dynamic array architecture that requires conductive features to be linearly defined along a virtual grate in each of a plurality of levels of the semiconductor chip. Each virtual grate is perpendicular to another virtual grate that is either a level above or a level below. Each virtual grate is defined by a framework of parallel lines spaced at a constant pitch. Some of the lines in the virtual grate are occupied by multiple conductive features. A substantially uniform gap can be maintained between proximate ends of adjacent conductive features that occupy a common line in the virtual grate. The substantially uniform gap between the proximate ends of adjacent conductive features can be maintained within each line in the virtual grate that is occupied by multiple conductive features.

Abstract: Provided is a carrier assembly for an integrated circuit. The assembly includes a carrier having a matrix of island contacts interconnected by respective serpentine members to allow resilient deflection between such contacts, said matrix surrounding a passage defined through the carrier. The assembly also includes a retainer for operatively locating the integrated circuit within said passage so that the integrated circuit is electrically connected to the carrier.

Abstract: The present invention relates to an electronic device incorporating a heat distributor. It applies more particularly to devices of the plastic package type, with one or more levels of components. According to the invention, the electronic device, for example of the package type, is provided for its external connection with pads distributed over a connection surface. It includes a thermally conducting plate lying parallel to said connection surface and having a nonuniform structure making it possible, when the device is exposed to a given external temperature, to supply a controlled amount of heat to each external connection pad according to its position on the connection surface. If the device is a package comprising a support of the printed circuit type, the conducting plate will advantageously form an internal layer of said support.

Abstract: In the semiconductor device having a structure in which a plurality of layers are built-up by layers made of different materials or layers including various formed patterns, it is an object to provide a method which smoothing surface can be achieved without a polishing treatment by CMP method or a smoothing process by depositing a SOG film, a substrate material is not chosen, and the smoothing is simple and easy. In the semiconductor device in which a plurality of different layers are formed, smoothing surface can be achieved without the polishing treatment by the CMP method or the smoothing process by depositing the SOG film to a dielectric film formed on a dielectric film and a wring (electrode) or a semiconductor layer in a manner that an aperture portion is formed in the dielectric film, the wring (electrode) or the semiconductor layer is formed in the aperture portion.

Abstract: The present invention provides for a via and staggered routing level structure. Vertically overlapping vias connect to two or more routing levels formed at different heights. The routing levels are either both formed above or both formed below the vias, and all are formed above a semiconductor substrate wafer. In this way vias can be formed having a pitch smaller than the pitch of either the first routing level or the second routing level, saving space.

Abstract: Interconnections are formed over an interlayer insulating film which covers MISFETQ1 formed on the principal surface of a semiconductor substrate, while dummy interconnections are disposed in a region spaced from such interconnections. Dummy interconnections are disposed also in a scribing area. Dummy interconnections are not formed at the peripheries of a bonding pad and a marker. In addition, a gate electrode of a MISFET and a dummy gate interconnection formed of the same layer are disposed. Furthermore, dummy regions are disposed in a shallow trench element-isolation region. After such dummy members are disposed, an insulating film is planarized by the CMP method.

Abstract: A conductive line structure is defined with an OPC photomask and is suitably applied to a semiconductor device. The conductive line structure includes a first conductive line and a second conductive line. The first conductive line includes a first line body oriented in the X-direction of a plane coordinate system, a first end portion at one end of the first line body slanting toward the Y-direction of the plane coordinate system, and a second end portion at the other end of the first line body also slanting toward the Y-direction. The second conductive line arranged in an end-to-end manner with the first conductive line includes a second line body oriented in the X-direction, a third end portion at one end of the second line body slanting toward the Y-direction, and a fourth end portion at the other end of the second line body also slanting toward the Y-direction.

Abstract: There is a need for providing a technology capable of decreasing on-resistance of a power transistor in a semiconductor device that integrates the power transistor and a control integrated circuit into a single semiconductor chip. There is another need for providing a technology capable of reducing a chip size of a semiconductor device. A semiconductor chip includes a power transistor formation region to form a power transistor, a logic circuit formation region to form a logic circuit, and an analog circuit formation region to form an analog circuit. A pad is formed in the power transistor formation region. The pad and a lead are connected through a clip whose cross-section is larger than that of a wire. On the other hand, a bonding pad is connected through the wire 29.

Abstract: An integrated circuit and method of fabricating the same are provided. Included are an active circuit, and a metal layer disposed, at least partially, above the active circuit. Further provided is a bond pad disposed, at least partially, above the metal layer. To prevent damage incurred during a bonding process, the aforementioned metal layer is meshed.

Abstract: A semiconductor structure and methods for forming the same. The semiconductor structure includes (a) a substrate; (b) a first semiconductor device on the substrate; (c) N ILD (Inter-Level Dielectric) layers on the first semiconductor device, wherein N is an integer greater than one; and (d) an electrically conductive line electrically coupled to the first semiconductor device. The electrically conductive line is adapted to carry a lateral electric current in a lateral direction parallel to an interfacing surface between two consecutive ILD layers of the N ILD layers. The electrically conductive line is present in at least two ILD layers of the N ILD layers. The electrically conductive line does not comprise an electrically conductive via that is adapted to carry a vertical electric current in a vertical direction perpendicular to the interfacing surface.

Abstract: A passivated metal structure and a method of forming the metal structure is disclosed. According to one embodiment, the patterned metal structure, such as conductive lines, are formed on a substrate. The copper lines are passivated by a polymer liner between the copper lines and a low k dielectric filling the spaces between the conductive lines. The polymer liner is preferably deposited on the sidewalls of the conductive lines by electro-grafting. The polymer liner may also be used in a damascene process according to a second embodiment.

Abstract: A semiconductor device includes a first wiring layer, a second wiring layer and a third wiring layer. The first wiring layer is formed on a semiconductor substrate. The second and the third wiring layer wiring layers are arranged in a direction intersecting with the first wiring layer on respective sides of the wiring layer. An air bridge wiring intersects the second and third wiring layers sandwiching an air layer above the first wiring layer therewith. The overall shape of the air bridge wiring has an upward convex curvature in an arch shape and the transverse sectional shape of the air bridge wiring is in the form of a downward concave curvature.

Abstract: A first insulating film is provided between a lower interconnect and an upper interconnect. The lower interconnect and the upper interconnect are connected to each other by way of a via formed in the first insulating film. A dummy via or an insulating slit is formed on/in the upper interconnect near the via.

Abstract: A circuit board (A1) includes an insulative substrate (1), a conductive pad (4a) formed on the substrate, and a metal (3) bonded to the pad via a solder layer (6). The metal piece (3) has a welding portion (3a) to which an external-connection terminal (5) is welded. A gap (7) is provided between the welding portion (3a) and the substrate (1). The welding portion (3a) and the solder layer (6) are separated by the gap (7).

Abstract: A semiconductor device has a semiconductor chip including first and second surfaces opposed to each other in a thickness direction of the semiconductor chip, wherein the first and second surfaces include first and second electrode surfaces respectively, and first and second electrically conductive members covering the first and second electrode surfaces respectively as seen in the thickness direction to be electrically connected to the first and second electrode surfaces respectively.

Abstract: Various embodiments of the present invention are directed to three-dimensional crossbar arrays. In one aspect of the present invention, a three-dimensional crossbar array includes a plurality of crossbar arrays, a first demultiplexer, a second demultiplexer, and a third demultiplexer. Each crossbar array includes a first layer of nanowires, a second layer of nanowires overlaying the first layer of nanowires, and a third layer of nanowires overlaying the second layer of nanowires. The first demultiplexer is configured to address nanowires in the first layer of nanowires of each crossbar array, the second demultiplexer is configured to address nanowires in the second layer of nanowires of each crossbar array, and the third demultiplexer is configured to supply a signal to the nanowires in the third layer of nanowires of each crossbar array.

Abstract: Consistent with an example embodiment, an electronic device comprises a semiconductor device, particularly an integrated circuit, and a carrier substrate with conductive layers on the first side and the second side, and voltage supply and ground connections mutually arranged according to a chessboard pattern. These connections extend in a direct path through vertical interconnects and bumps to bond pads at the integrated circuit, which bond pads are arranged in a corresponding chessboard pattern. As a result, an array of direct paths is provided, wherein the voltage supply connections form as much as possible the coaxial center conductors of a coaxial structure.

Abstract: A package-in-package system is provided including forming a top substrate having a first integrated circuit electrically connected thereto and mounting a second integrated circuit over the first integrated circuit. The system includes forming first electrical connectors on the second integrated circuit and encapsulating the second integrated circuit in a first encapsulant with the first electrical connectors exposed. The system includes mounting the second integrated circuit over a bottom substrate with the first electrical connectors electrically connected thereto and encapsulating the top substrate and the first encapsulant in a second encapsulant.

Abstract: A memory device. An array of memory elements is formed on a semiconductor chip. A parallel array of word lines extends in a first direction, connecting each memory element to a data source, and a parallel array of bit lines extends in a second direction, connecting each memory element to a data source, the second direction forming an acute angle to the first direction. The connection between each bit line and each memory element is a phase change element composed of memory material having at least two solid phases.

Abstract: For simplifying the dual-damascene formation steps of a multilevel Cu interconnect, a formation step of an antireflective film below a photoresist film is omitted. Described specifically, an interlayer insulating film is dry etched with a photoresist film formed thereover as a mask, and interconnect trenches are formed by terminating etching at the surface of a stopper film formed in the interlayer insulating film. The stopper film is made of an SiCN film having a low optical reflectance, thereby causing it to serve as an antireflective film when the photoresist film is exposed.

Abstract: A semiconductor chip assembly includes a semiconductor chip that includes a conductive pad, a conductive trace that includes a routing line, a metal containment wall and a solder terminal, and a connection joint that electrically connects the routing line and the pad. The metal containment wall includes a cavity, and the solder terminal contacts the metal containment wall in the cavity and is spaced from the routing line.

Abstract: The present invention provides a printed circuit board having an area of non-resist portion, where each non-resist portion expands gradually toward the back end of a land array in the dipping direction A. Thus the area of solder deposition also expands in the region of the land array, thereby excessive solder does not remain up to the back end of the land array, and resultantly the amount of solder buildup at the backside in the dipping direction A can be reduced. Further, the present invention makes it unnecessary to dispose a dummy land for the prevention of solder buildup at the backmost portion of the land array, and thus the space used for a dummy land can be utilized effectively.

Abstract: A structure for improving the electrostatic discharge robustness of an integrated circuit having an electrostatic discharge (ESD) device and a receiver network connected to a pad by interconnects. The interconnect between the pad and the ESD device has a high-k material placed adjacent to at least one surface of the interconnect and extending over the thermal diffusion distance of the interconnect. The high-k material improves the critical current density of the interconnect by increasing the heat capacity and thermal conductivity of the interconnect. The high-k material can be placed on the sides, top and/or bottom of the interconnect. In multiple wire interconnects, the high-k material is placed between the wires of the interconnect. A low-k material is placed beyond the high-k material to reduce the capacitance of the interconnect. The combination of low-k and high-k materials provides an interconnect structure with improved ESD robustness and low capacitance that is well suited for an ESD device.

Abstract: A display device includes a display panel, and the circuit substrate is separately formed and positioned different from the array substrate of the display panel and connected to the display panel. The circuit substrate includes an insulating substrate, a conductive layer, an insulating layer to cover a part of the conductive layer, a plating layer applied to a portion of the conductive layer which is exposed from the insulating layer due to misalignment between the conductive layer and the insulating layer, and a misalignment detection pattern for detecting the misalignment between the conductive layer and the insulating layer. The misalignment detection pattern has a pattern covered by the insulating layer in a manner to prevent adherence of a plating material to the conductive layer, if the misalignment between the conductive layer and the insulating layer is smaller than a predetermined misalignment tolerance.

Abstract: A microelectronic assembly includes a microelectronic element such as a semiconductor chip or wafer having a first surface and contacts accessible at the first surface, a compliant layer overlying the first surface of the microelectronic element, and conductive protrusions overlying the compliant layer and projecting away from the first surface of the microelectronic element, wherein the conductive protrusions are electrically interconnected with the contacts of the microelectronic element. The conductive protrusions are movable relative to said microelectronic element.

Abstract: In one embodiment, a device is packaged using a low-cost thermally enhanced ball grid array (LCTE-BGA) package. The device may include a die with its backside mounted to the bottom side of a multi-layer packaging substrate. Thermal vias may be formed through the substrate to allow heat to be conducted away from the backside of the die to a top most metal layer of the substrate. Thermal balls may be attached to the bottom side of the substrate on the same plane as the die.

Abstract: A line layout structure of semiconductor memory device comprises first metal wire lines forming a bit line coupled to a memory cell, second metal wire lines disposed substantially orthogonal to the first metal wire lines and over the first metal wire lines, the second metal wire lines forming a section word line electrically coupled to the memory cell, and third metal wire lines disposed substantially parallel to the second metal wire lines and over the second metal wire lines, the third metal wire lines forming a first power line or signal line.

Abstract: A semiconductor device provided with a first semiconductor chip having a first functional surface formed with a first functional element and a first rear surface, a second semiconductor chip having a second functional surface which is formed with a second functional element, the second functional surface having a region opposed to the first functional surface of the first semiconductor chip and a non-opposed region defined outside the opposed region, a connection member electrically connecting the first functional element and the second functional element, an insulation film continuously covering the non-opposed region of the second semiconductor chip and the first rear surface of the first semiconductor chip, a rewiring layer provided on a surface of the insulation film, a protective resin layer covering the rewiring layer, and an external connection terminal projecting from the rewiring layer through the protective resin layer.