Abstract: Techniques are provided for placing and routing vias that conduct signals through a connector between two electrical units. Vias that conduct a first set of signals are placed next to vias that provide return paths for the first set of signals to reduce cross-talk or impedance. Vias that conduct input or output signals can be placed next to vias that provide return paths for the input or output signals to reduce cross-talk. The vias that provide the return paths can conduct, for example, ground signals, power supply signals, or both. Vias that conduct power supply signals can be placed next to vias that provide return paths for the power supply signals to reduce impedance. The vias that provide the return paths for the power supply signals can conduct, for example, ground signals. The via configurations reduce cost and increase yield, and the via configurations are modular.

Abstract: A method of forming and a device including an interconnect structure having a unidirectional electrical conductive material is described. The unidirectional conductive material may overlie interconnect materials, and/or may surround interconnect materials, such as by lining the walls and base of a trench and via. The unidirectional conductive material may be configured to conduct electricity in a direction corresponding to a projection to or from a contact point and conductive material overlying the unidirectional conductive material, but have no substantial electrical conductivity in other directions. Moreover, the unidirectional conductive material may be electrically conductive in a direction normal to a surface over which it is formed or in directions along or across a plane, but have no substantial electrical conductivity in other directions.

Abstract: An adhesive film is formed on an electrode film, and a coating film is formed thereon. Nickel, chrome, molybdenum, tungsten, aluminum or an alloy of them is used as a constituent material of the adhesive film. Gold, silver, platinum or an alloy of them is used as a constituent material of the coating film.

Abstract: A display substrate having a fan-out and a method for manufacturing the display substrate are disclosed. The fan-out includes an insulating substrate, a first line, a second line, a resistance control pattern, and first and second detour pattern. The first line is disposed on the insulating substrate and is connected to a pad. The second line is formed from the same layer as the first line and is connected to a thin-film transistor (TFT). The resistance control pattern is formed from a different layer than the first and second lines. The first and second detour patterns are formed from a different layer than the first and second lines and the resistance control pattern, and connect the first and second lines with the resistance control pattern, respectively.

Abstract: An interconnect structure and its method for fabrication each employ an interconnect formed over and adjacent an active region of a semiconductor substrate. A gate electrode is also formed over the active region. Spacer layers are formed adjoining the interconnect and the gate electrode. A spacer layer adjoining the interconnect is removed and a bridging silicide conductor layer is formed bridging a top surface and a sidewall surface of the interconnect with a surface of the active region.

Abstract: A method for fabricating a circuit arrangement is provided. One embodiment provides a base layer, whereby the first layer is disposed on the base layer having at least one channel, whereby the first layer is fabricated from an electrically isolating material, whereby the base layer at least partially covers the channel, whereby a second layer is disposed on the first layer, the second layer comprising a recess, the second layer at least partially covering the channel and whereby the recess is at least partially arranged over the channel, whereby the channel and the recess are filled with a liquid, the liquid being cured and an electrical conductor being formed in the channel and in the recess.

Abstract: A housing having a non-detachable bond to a micromechanical component using a flexible bonding material in particular. The combination including the housing and the micromechanical component as well as the manufacturing method of this combination. At least part of the component and/or of the housing has depressions for receiving the bonding material. These depressions may be designed as grooves, for example.

Abstract: A pad section serving as an electrode for external connection of a semiconductor device includes a first pad metal (61) formed in the top layer, a second pad metal (62) formed under the first pad metal (61) via an interlayer insulating film (71), and vias (63) which penetrate the interlayer insulating film (71) and electrically connect the first pad metal (61) and the second pad metal (62). The first pad metal (61) and the second pad metal (62) have edges displaced from each other so as not to be aligned with each other along the thickness direction of each layer. Thus, it is possible to reduce stress occurring on an edge of the second pad metal (62), thereby reducing damage on the interlayer insulating film (71) and so on.

Abstract: A dual-bit memory device is provided which includes trench isolation material disposed near bit line contact areas. For example, in one implementation a semiconductor memory device is provided in which each memory cell can store two bits of information. The memory device comprises a substrate, first and second buried bit lines in the substrate, a first bit line contact on the first buried bit line, a second bit line contact on the second buried bit line, and an insulator region disposed in the substrate between the first buried bit line and the second buried bit line. The insulator region prevents a current from flowing between the first buried bit line and the second buried bit line.

Abstract: Methods of fabricating nano-gap electrode structures in array configurations, and the structures so produced. The fabrication method involves depositing first and second pluralities of electrodes comprising nanowires using processes such as lithography, deposition of metals, lift-off processes, and chemical etching that can be performed using conventional processing tools applicable to electronic materials processing. The gap spacing in the nano-gap electrode array is defined by the thickness of a sacrificial spacer layer that is deposited between the first and second pluralities of electrodes. The sacrificial spacer layer is removed by etching, thereby leaving a structure in which the distance between pairs of electrodes is substantially equal to the thickness of the sacrificial spacer layer. Electrode arrays with gaps measured in units of nanometers are produced. In one embodiment, the first and second pluralities of electrodes are aligned in mutually orthogonal orientations.

Abstract: The invention provides an electronic device configured to prevent or reduce electrostatic discharge from causing a pixel to malfunction. An electronic device manufactured according to the principles of the invention may include multiple conductive layers that cross but do not contact each other, wherein at least one of the conductive layers includes a width change part having a width that changes in a length direction of the at least one of the conductive layers, and a tab connected to at least one of the conductive layers at a region thereof that does not cross a neighboring conductive layer. Alternatively, the width change part may have a width that continuously varies along a length of the at least one conductive layer and may also have obtuse corner edges. The invention also provides a flat organic electroluminescent display (OELD) or LCD display device that includes such an electronic device.

Abstract: A semiconductor structure includes first and second conductive lines which cross each other. The second conductive lines are electrically insulated from the first conductive lines via an insulating material. The second conductive lines include first and second sections. First sections are arranged beneath crossing first conductive lines and include a semiconductor material. The second sections are disposed between adjacent first conductive lines and include a metal-semiconductor compound. A method of manufacturing a semiconductor structure involves forming initial second conductive lines, forming first conductive lines and providing a metal-semiconductor compound on an exposed surface of the initial second conductive lines, thereby obtaining second conductive lines. Forming the metal-semiconductor compound is performed after forming the first conductive lines.

Abstract: Interconnect structures that include a conformal liner repair layer bridging breaches in a liner formed on roughened dielectric material in an insulating layer and methods of forming such interconnect structures. The conformal liner repair layer is formed of a conductive material, such as a cobalt-containing material. The conformal liner repair layer may be particularly useful for repairing discontinuities in a conductive liner disposed on roughened dielectric material bordering the trenches and vias of damascene interconnect structures.

Abstract: An interconnect includes a pad and at least two vias coupled to the pad. In one embodiment, the pad has five substantially straight edges, one via directly coupled to the pad by being formed substantially beneath the pad, and one via coupled to one of the five substantially straight edges by a tapered conductive segment. In another embodiment, the pad has three vias directly coupled to the pad and formed substantially beneath the pad. A method of forming an interconnect includes forming at least two vias in a substrate and coupling a pad to each of the at least two vias.

Abstract: A semiconductor package includes a semiconductor chip, a circuit board at which a wire pattern is formed, and a metal structure including a portion inserted through an opening of the circuit board and upon which the semiconductor chip rests. With the semiconductor chip in direct contact with the metal structure, thermal characteristics improve. With the circuit board supported by the metal structure, mechanical stability improves.

Abstract: In example embodiments of the present invention, a structure of a BGA semiconductor chip package includes a substrate having first and second surfaces, a semiconductor chip having a plurality of bonding pads, and mounted on the first surface of the substrate, and plurality of in/out (I/O) solder balls and dummy solder balls provided on the second surface of the substrate, wherein the I/O solder balls are electrically connected to the semiconductor chip and the dummy solder balls are electrically isolated from the semiconductor chip, and the I/O solder balls and the dummy solder balls have the same ball size and ball pitch and are uniformly provided over the second surface of the substrate.

Abstract: In a multilayer printed wiring board having a plurality of laminated resin layers, a plurality of wiring patterns formed on the interfacial surface of the resin layers, and a plurality of lands formed on the outermost layer of the resin layers and on which the solder is provided, at least one of the wiring patterns has a plurality of openings in the form of a mesh, the size of openings of the wiring patterns in a region corresponding to the position of solder in which a stress generated in the solder provided on the lands becomes a value larger than a desired value due to thermal deformation of the semiconductor device and the multilayer printed wiring board is larger than that of openings in the other regions.

Abstract: Invertible microfeature device packages and associated methods for manufacture and use are disclosed. A package in accordance with one embodiment includes a microfeature device having a plurality of device contacts, and a conductive structure electrically connected to the contacts. The conductive structure can have first and second package contacts accessible for electrical coupling to at least one device external to the package, with the first package contacts accessible from a first direction and the second package contacts configured to receive solder balls and accessible from a second direction opposite the first. An encapsulant can be disposed adjacent to the microfeature device and the conductive structure and can have apertures aligned with the second package contacts to contain solder balls carried by the second package contacts.

Abstract: Disclosed is an electronic device utilizing interferometric modulation and a package of the device. The packaged device includes a substrate, an interferometric modulation display array formed on the substrate, and a back-plate. The back-plate is placed over the display array with a gap between the back-plate and the display array. The depth of the gap may vary across the back-plate. The back-plate can be curved or have a recess on its interior surface facing the display array. Thickness of the back-plate may vary. The device may include reinforcing structures which are integrated with the back-plate.

Abstract: Electrical interconnects with a slotting pattern are provided in the present invention. In addition, the masks for making such interconnects and semiconductor devices incorporating such interconnects are also provided in the present invention. The slotting pattern may be designed to minimize dishing effects of the interconnects as a result of planarization. Further, the slotting pattern may be designed to minimize resistance in the interconnects. For instance, the slotting pattern may include slots that are staggered, evenly aligned, or a combination of both staggered and evenly aligned. In addition, the slots may be spaced apart such that electrical paths are shorter across the interconnects. By incorporating such interconnects in semiconductor devices, better performing semiconductor devices can be realized.

Abstract: A semiconductor device having a first wiring layer including first wirings on a substrate, a contact layer on the first wiring layer and including contacts connected to the first wirings, and a second wiring layer on the contact layer and including second wirings connected to the contacts. Contact pitch is larger than the minimum wiring pitch of the first wirings or the minimum wiring pitch of the second wirings.

Abstract: A semiconductor wafer having multi-layer metallization structures that are fabricated to include embedded interconnection structures which serve as low-resistance electroplating current paths to conduct bulk electroplating current fed to portions of a metallic seed layer at peripheral surface regions of the wafer to portions of the metallic seed layer at inner/central surface regions of the semiconductor wafer to achieve uniformity in metal plating in chip regions across the wafer.

Abstract: In a semiconductor device (1), semiconductor elements (2) and (3) are mounted on a lead frame (5) having leads (4). The semiconductor elements (2) and (3) are connected with the leads (4) by metallic wires (6) and (7). The semiconductor device (1) also has a heat sink (8). The members (2) to (8) are sealed with a plastic package (10). The leads (4) are exposed outward. Each of the end leads (4a) to (4d) has a wide first lead portion, a narrow second lead portion, a third lead portion to be inserted into an external substrate, and a protruding gap-controlling portion (9) for keeping the gap between the semiconductor device (1) and the external substrate constant. Because the heat resistance from the leads (4) to the plastic package (10) increases, the temperature-rise property of the lead is improved so that the solderability is improved.

Abstract: A circuit device (15) is placed within an opening of a conductive layer (10) which is then partially encapsulated with an encapsulant (24) so that the active surface of the circuit device (15) is coplanar with the conductive layer (10). At least a portion of the conductive layer (10) may be used as a reference voltage plane (e.g. a ground plane). Additionally, a circuit device (115) may be placed on a conductive layer (100) such that an active surface of circuit device (115) is between conductive layer (100) and an opposite surface of circuit device (115). The conductive layer (100) has at least one opening (128) to expose the active surface of circuit device (115). The encapsulant (24, 126, 326) may be electrically conductive or electrically non-conductive.

Abstract: Microelectronic packages are disclosed. A microelectronic package may include a substrate having first and second sides. Passive components may be located on the first side of the substrate. Interconnects may also be located on the first side of the substrate, and may be electrically coupled with the passive components. Microelectronic components may be located on the first side of the substrate and may be electrically coupled with interconnects. The substrate may include an opening therein. The opening may lead from the second side of the substrate toward the first side of the substrate. A plurality of conductive paths may be at least partially included in the opening. Each of the conductive paths may lead from the second side of the substrate toward the first side of the substrate to communicate electrical signals to interconnects. Methods of making the packages and electronic devices including the packages are also disclosed.

Abstract: In accordance with the objectives of the invention a new method and structure is provided for the creation of multiple overlying layers of interconnect metal. A channel is reserved for the creation of via interconnects, no vias are placed on metal lines. The metal lines are stacked and parallel, whereby a space is provided between lines that is reserved for the creation of vias for layer interconnection. This structure can be repeated, the vias are placed on the therefore reserved channel, interconnections are provided to the interconnect traces.

Abstract: Various embodiments of the present invention are directed to antisymmetric nanowire-crossbar-circuit designs. Antisymmetric nanowire crossbars are composed, in certain embodiments of the present invention, of two or more microregions that receive input signals and two or more microregions that send output signals. Antisymmetric nanowire crossbars may include a nanowire-crossbar network having signal paths that carry signals between one or more of the microregions. The nanowire-crossbar network may also carry signals between external electronic devices and one or more of the microregions. Antisymmetric nanowire crossbars may additionally include two or more structures that supply voltage and ground.

Abstract: A semiconductor integrated circuit comprising a power supply wiring and a ground wiring and a decoupling capacitor formed between the power supply wiring and the ground wiring, wherein at least one electrode of the decoupling capacitor consists of a shield layer formed in a plane shape on a semiconductor substrate, and the shield layer is electrically connected directly to the semiconductor substrate and is fixed to a power supply potential or the ground potential.

Abstract: An integrated circuit package system including providing a base substrate, attaching a base integrated circuit on the base substrate, attaching a core substrate over the base integrated circuit, attaching a substrate electrical connector between the core substrate and the base substrate, and applying an encapsulant having the core substrate partially exposed over the base integrated circuit.

Abstract: A low loss on-die interconnect structure includes first and second differential signal lines on one of the metal layers of a microelectronic die. One or more traces may also be provided on another metal layer of the die that are non-parallel (e.g., orthogonal) to the differential signal lines. Because the traces are non-parallel, they provide a relatively high impedance return path for signals on the differential signal lines. Thus, a signal return path through the opposite differential line predominates for the signals on the differential lines. In one application, the low loss interconnect structure is used within an on-die salphasic clock distribution network.

Abstract: A method for manufacturing an electronic part, including: cutting a wiring substrate, which contains a base substrate, a wiring pattern provided on a first surface of the base substrate, and a reinforcing member provided on a second surface of the base substrate, along a line intersecting with an outer circumference of the reinforcing member; wherein a wire, out of a plurality of wires composing the wiring pattern, arranged closest to an intersecting point of the outer circumference of the reinforcing member and the line has a widest width.

Abstract: Integrated circuits having multi-level wiring layouts designed to inhibit the capacitive-resistance effect, and a method for fabricating such integrated circuits, is described. The integrated circuits have at least two planes of wiring adjacent to each other and extending in the same direction. One embodiment may further include a larger than normal insulator material between planes of wiring extending in one direction and at least one plane of wiring extending in a second direction transverse to the first direction. Each of the wiring channels in a wiring plane may be offset relative to a respective wiring channel in the next adjacent wiring plane which extends in the same direction.

Abstract: A system may include a microprocessor die, an integrated circuit package substrate, and a die disposed between the microprocessor die and the integrated circuit package substrate. In some embodiments, the integrated circuit package substrate defines a first cavity, and the die is disposed at least partially within the first cavity.

Abstract: The electronic device (100) comprises a semiconductor element (1) (e.g. a transistor), an encapsulation (5) and an electrically conductive layer (3) with a first and a second contact pad (11,12), used as signal pads, and a third contact pad (13) used as ground pads. Due to the shape of the contact pads (11,12,13), the spacing (200) is continuous, with a small entrance in between of the first and second contact pads (11,12). Consequently, the parasitic inductance is reduced and the device (100) is suitable for use at frequencies below and above 30 GHz, particularly up to 40 GHz.

Abstract: A semiconductor device has a semiconductor substrate having first and second surface, a first resin film formed on the first surface of the semiconductor substrate and a second resin film formed on the second surface of the semiconductor substrate. A projection electrode or an interconnection is formed on the first surface of the semiconductor substrate, the second resin film is made of low elastic resin which is capable of absorbing an impact applied to the second surface of the semiconductor substrate and the second resin film is thinner than the semiconductor substrate.

Abstract: A semiconductor device, wherein a first metallic member is bonded to a first electrode of a semiconductor element via a first metallic body containing a first precious metal, and a second metallic member is bonded to a second electrode via a second metallic body containing a second precious metal.

Abstract: Phenomena such as electromigration and stress-induced migration occurring in metal interconnects of devices such as integrated circuits are inhibited by use of underlying non-planarities. Thus the material underlying the interconnect is formed to have non-planarities typically of at least 0.02 ?m in height and advantageously within 100 ?m of another such non-planarity. Such non-planarities, it is contemplated, reduce grain boundary movement in the overlying interconnect with a concomitant reduction in void aggregation.

Abstract: A chip with a chip plane includes a functional area, a contact structure vertical with respect to the chip plane for connecting the functional area, which includes a conductive material, which has a predetermined length, and a vertical dummy-contact structure, which extends vertically into the functional area and which has an electrically conductive material and an insulation layer, the insulation layer being formed so that a current flow from an upper end of the dummy-contact structure to the functional area is prevented.

Abstract: A circuit assembly for fabricating an air bridge structure and a method of fabricating an integrated circuit package capable of supporting a circuit assembly including an air bridge structure. A circuit assembly comprises an electronic chip and a conductive structure embedded in a plurality of materials having a plurality of vaporization temperatures. The plurality of materials is formed on the electronic chip and the conductive structure is coupled to the electronic chip. To fabricate the circuit assembly, a support structure, including interstices, is formed on an electronic chip. The interstices of the support structure are filled with a material having a vaporization temperature that is less than the vaporization temperature of the support structure. Conductive structures are embedded in the support structure and the material, and a connective structure is mounted on the support structure. Finally, the material is removed from the interstices by heating the circuit assembly.

Abstract: A chip and a chip package can transmit information to each other by using a set of converters capable of communicating with each other through the emission and reception of electromagnetic signals. Both the chip and the chip package have at least one such converter physically disposed on them. Each converter is able to (1) convert received electromagnetic signals into electronic signals, which it then may relay to leads on the device on which it is disposed; and (2) receive electronic signals from leads on the device on which it is disposed and convert them into corresponding electromagnetic signals, which it may transmit to a corresponding converter on the other device. Not having a direct physical connection between the chip and the chip package decreases the inductive and capacitive effects commonly experienced with physical bonds.

Abstract: The semiconductor apparatus includes a pad; a first line layer placed immediately beneath the pad; and a lattice-shaped contact being between the pad and the first line layer.

Abstract: A system includes a first crosswire array, having first input wiring and first output wiring, and a second crosswire array, having second input wiring and second output wiring, wherein the first crosswire array and second crosswire array are provided on or above the same side of a first substrate. A second substrate is provided opposing the first substrate and including interconnection tips and circuit elements used to electrically connect the first output wiring to the second input wiring. This system may be applied for interconnection between crosswire or crossbar arrays with different functionalities such as memory storage, pattern analysis, electron beam lithography, image sensing, image generation, etc. It may also provide for interconnection between solid state electronics, fabricated on the second substrate and nanowire or nanotube based crosswire arrays fabricated on the first substrate.

Abstract: An electronic package which includes a circuitized substrate having at least two electrical components positioned thereon. The package includes patterns of contact sites, each for having one of the components coupled thereto. The patterns of contact sites in turn are electrically interconnected by a grouping of conductive lines which, to substantially prevent skew, are of substantially the same length. A method of making the package is also provided, as is a circuitized substrate and an information handling system, the latter adapted for having one or more of the electronic packages as part thereof.

Abstract: A filet F is added to a portion constituting a corner portion C equal to or smaller than 90° in a crossing portion X of wiring patterns 58b, 58c and 58d, and a wiring pattern 58 is formed. Since the filet F is added, the wiring patterns are not made thin and are not disconnected in the crossing portion X. Further, since there is no stress concentrated to the crossing portion X, disconnection is not caused in the wiring patterns and no air bubbles are left between the crossing portion X of the wiring patterns and an interlayer resin insulating layer so that reliability of a printed wiring board is improved.

Abstract: A die metallization and bump design/arrangement, and a die-package interface metallization and bump design/arrangement are described herein.

Abstract: Semiconductor devices having conductive lines with extended ends and methods of extending conductive line ends by a variable distance are disclosed. An end of a first conductive feature of an interconnect structure is extended by a first distance, and an end of a second conductive feature of the interconnect structure is extended by a second distance, the second distance being different than the first distance. Ends of conductive features that are positioned close to adjacent conductive features are preferably not extended.

Abstract: A semiconductor device includes a first interlayer insulating film formed above a semiconductor substrate, a first source line formed on the first interlayer insulating film, a second interlayer insulating film formed on the first source line, a plurality of bit lines formed on the second interlayer insulating film so as to extend in a direction, the bit lines being arranged at same width and same width, a third interlayer insulating film formed above the bit lines, a second source line formed on the third interlayer insulating film, and a source shunt line formed between the second and third interlayer insulating films, the source shunt line electrically connecting the first and second source lines to each other, the source shunt line being located between the bit lines so as to extend in the same direction as the bit lines, the source shunt line including a width same as the bit lines.

Abstract: An apparatus and method for incorporating discrete passive components into an integrated circuit package. A metal layer is formed over a surface of a substrate. A layer of photosensitive material is then formed over the metal layer. Using standard photolithographic processing, a pattern is formed with the photosensitive material to expose at least one region of the metal layer. The remaining photosensitive material protects the underlying metal during metal etching. The substrate is then subjected to a metal etching process to remove the metal that is not protected by the photosensitive material. The remaining photosensitive material is then removed from each remaining area of the metal layer. The discrete passive components can then be attached to the formed metal lands.

Abstract: Bit lines (BL0, BL0R, BL1, BL1R, . . . ) of a ROM memory array with differential detection reading are arranged within two overlaid metallization levels so as to increase the read reliability of binary values stored in the array. The ROM array is divided into matrix segments (100, 101, . . . ) aligned parallel to the bit lines. The bit lines are shifted horizontally and/or vertically within transition regions (T) located between the segments of matrix, by effecting circular permutations between the positions of the bit lines that are divided up into groups of four.

Abstract: A stack structure with semiconductor chips embedded in carriers comprises two carriers stacking together as a whole, at least two semiconductor chips having active surfaces with electrode pads and inactive surfaces corresponding thereto placed in the cavities of the carriers, at least one dielectric layer formed on the active surface of the semiconductor chip and the surface of the carrier, at least a conductive structure formed in the opening of the dielectric layer, and at least a circuit layer formed on the surface of the dielectric layer wherein the circuit layer is electrically connected to the electrode pad by the conductive structure, so as to form a three-dimensional module to increase the storage capacity dramatically and integrate the semiconductor chips in the carriers for efficiently reducing the size of the module, so that the combinations can be changed flexibly to form the required storage capacity according to the demands.