Deposition Of Conductive Or Semi-conductive Organic Layer (epo) Patents (Class 257/E21.299)
  • Patent number: 7303940
    Abstract: A semiconductor component has at least one organic semiconductor layer. The component also includes at least one protective layer for at least partially covering the at least one organic semiconductor layer to protect against environmental influences. The at least one protective layer contains a proportion of an alkane with CnH2n+1 and n greater than or equal to 15 or consists entirely of an alkane of this type, or of a mixture of alkanes of this type. In one example, the protective layer is a paraffin wax. This creates a high resistance to moisture.
    Type: Grant
    Filed: February 25, 2005
    Date of Patent: December 4, 2007
    Assignee: Infineon Technologies AG
    Inventors: Florian Eder, Marcus Halik, Hagen Klauk, Günter Schmid, Ute Zschieschang
  • Patent number: 7298013
    Abstract: Embodiments of the invention provide a semiconductor component and a method of manufacture thereof. A semiconductor component comprises: a gate electrode layer adjacent a substrate, and a gate dielectric layer adjacent the gate electrode layer. The gate dielectric layer comprises a monolayer of at least one compound, wherein the compound has an aromatic or a condensed aromatic molecular group. The molecular group is capable of ?-? interactions, which stabilize the monolayer. In an embodiment, the semiconductor component is an organic field effect transistor (OFET). In an embodiment of the invention, a method includes forming the monolayer using a liquid phase immersion process.
    Type: Grant
    Filed: December 20, 2005
    Date of Patent: November 20, 2007
    Assignee: Infineon Technologies AG
    Inventors: Guenter Schmid, Marcus Halik, Hagen Klauk, Ute Zschieschang, Franz Effenberger, Markus Schutz, Steffen Maisch, Steffen Seifritz, Frank Buckel
  • Patent number: 7282735
    Abstract: A thin film transistor composed of: (a) a semiconductor layer including a thiophene compound, wherein the thiophene compound comprises one or more substituted thiophene units, one or more unsubstituted thiophene units, and optionally one or more divalent linkages; (b) a gate dielectric; and (c) a layer contacting the gate dielectric disposed between the semiconductor layer and the gate dielectric, wherein the layer comprises a substance comprising a fluorocarbon structure.
    Type: Grant
    Filed: March 10, 2006
    Date of Patent: October 16, 2007
    Assignee: Xerox Corporation
    Inventors: Yiliang Wu, Ping Liu, Beng S Ong
  • Patent number: 7271111
    Abstract: A shadow mask deposition system includes a plurality of identical shadow masks arranged in a number of stacks to form a like number of compound shadow masks, each of which is disposed in a deposition vacuum vessel along with a material deposition source. Materials from the material deposition sources are deposited on the substrate via openings in corresponding compound shadow masks, each opening being formed by the whole or partial alignment of apertures in the shadow masks forming the compound shadow mask, to form an array of electronic elements on the substrate.
    Type: Grant
    Filed: June 8, 2005
    Date of Patent: September 18, 2007
    Assignee: Advantech Global, Ltd
    Inventor: Thomas P. Brody
  • Patent number: 7268065
    Abstract: A method of manufacturing a microelectronic device including forming an opening in a dielectric layer located over a substrate, forming a semi-conductive layer substantially conforming to the opening, and forming a conductive layer substantially conforming to the semi-conductive layer. At least a portion of the semi-conductive layer is doped by implanting through the conductive layer. The semi-conductive layer and the conductive layer may then be annealed.
    Type: Grant
    Filed: June 18, 2004
    Date of Patent: September 11, 2007
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Tung Lin, Chih-Wei Chang, Chii-Ming Wu, Mei-Yun Wang, Chiang-Ming Chuang, Shau-Lin Shue
  • Patent number: 7166859
    Abstract: The present invention provides an organic semiconductor transistor element that includes at least a source electrode, a drain electrode, an organic semiconductor formed to be electrically conductive to the source electrode and the drain electrode, and a gate electrode which is both insulated from the organic semiconductor and capable of applying an electric field. The organic semiconductor includes a polymer compound containing an aromatic tertiary amine.
    Type: Grant
    Filed: October 7, 2004
    Date of Patent: January 23, 2007
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Hidekazu Hirose, Mieko Seki, Daisuke Okuda, Tadayoshi Ozaki, Takeshi Agata, Toru Ishii, Kiyokazu Mashimo, Katsuhiro Sato, Hiroaki Moriyama, Yohei Nishino