Abstract: A shield wiring is provided on a boundary of a target region to be shielded of macros, an inner side of the boundary, an outer side of the boundary, or an inner side and an outer side of the boundary, each being as a black box, so as to surround the target region. This shield wiring is electrically connected to a power supply terminal or a power supply wiring of the macros or the like, or to a power supply wiring on another wiring layer through a contact section, thereby fixing a potential of the shield wiring. An accurate delay value is then obtained by estimating an influence of crosstalk between a wiring in a region where the physical wiring pattern is clear and the shield wiring and also estimating a capacitance produced between the wirings.

Abstract: A semiconductor integrated circuit includes: a macro cell having a plurality of circuit elements; a first macro cell power supply line for supplying a first potential to the macro cell; and a second macro cell power supply line formed in a same wiring layer as a wiring layer of the first macro cell power supply line, for supplying a second potential to the macro cell. The first and second macro cell power supply lines are provided on the macro cell. The second macro cell power supply line extends in a first direction that is a longitudinal direction of the first macro cell power supply line.

Abstract: A semiconductor on insulator substrate and a method of fabricating the substrate. The substrate including: a first crystalline semiconductor layer and a second crystalline semiconductor layer; and an insulating layer bonding a bottom surface of the first crystalline semiconductor layer to a top surface of the second crystalline semiconductor layer, a first crystal direction of the first crystalline semiconductor layer aligned relative to a second crystal direction of the second crystalline semiconductor layer, the first crystal direction different from the second crystal direction.

Abstract: An integrated circuit according to the present invention includes first, second and third plane-like metal layers. A first transistor has a first control terminal and first and second terminals. The second terminal communicates with the first plane-like metal layer. The first terminal communicates with the second plane-like metal layer. A second transistor has a second control terminal and third and fourth terminals. The third terminal communicates with the first plane-like metal layer. The fourth terminal communicates with the third plane-like metal layer. A fourth plane-like metal layer includes first, second and third contact portions that are electrically isolated from each other and that are connected to the second plane-like metal layer, the first plane-like metal layer and the third plane-like metal layer, respectively.

Abstract: According to an aspect of the present invention, there is provided a standard cell, including a cell frame having a rectangular region, a power supply interconnection, a center line of the power supply interconnection overlapping with a side line along a first direction of the cell frame, a via contact, the center of the via contact overlapping with the center line of the power supply interconnection and a grid having a minimum interval in a layout of the via contacts, wherein a width of the cell along the first direction is an integral multiplication of the grid and the center of the via contact is at a distance of at least 1.5 multiplication of the grid from the nearest apex in the cell frame.

Abstract: The invention relates to a nitride semiconductor LED and a fabrication method thereof. In the LED, a first nitride semiconductor layer, an active region a second nitride semiconductor layer of a light emitting structure are formed in their order on a transparent substrate. A dielectric mirror layer is formed on the underside of the substrate, and has at least a pair of alternating first dielectric film of a first refractivity and a second dielectric film of a second refractivity larger than the first refractivity. A lateral insulation layer is formed on the side of the substrate and the light emitting structure. The LED of the invention effectively collimate undesirably-directed light rays, which may be otherwise extinguished, to maximize luminous efficiency, and are protected by the dielectric mirror layer formed on the side thereof to remarkably improve ESD characteristics.

Abstract: A semiconductor memory includes a plurality of active regions; a plurality of bit line contacts disposed on respective active regions; a plurality of first local lines formed in an island shape and in contact with upper surfaces of the plurality of bit line contacts; a plurality of first via contacts in contact with the upper surfaces of the plurality of first local lines and aligned in a direction parallel to the active regions; a first bit line in contact with one of the plurality of first via contacts and extending in a direction parallel to the active regions; and a plurality of second via contacts arranged above the first via contacts that are not in contact with the first bit line through respective second local lines.