Chemical Vapor Deposition (e.g., Electron Beam Or Heating Using Ir, Inductance, Resistance, Etc.) Patents (Class 427/585)
  • Patent number: 8088641
    Abstract: A process for producing a photovoltaic device, wherein when providing an n-type amorphous silicon layer on an i-type amorphous silicon layer, a desired crystallization ratio can be achieved without reducing the deposition rate.
    Type: Grant
    Filed: October 30, 2008
    Date of Patent: January 3, 2012
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Hiroshi Mashima, Koichi Asakusa, Akemi Takano, Nobuki Yamashita, Yoshiaki Takeuchi
  • Publication number: 20110311737
    Abstract: A vapor deposition apparatus for a minute-structure includes a surface acoustic wave device 10 that has at least a pair of electrodes 12 and 13 arranged at an interval on a surface of a piezoelectric body 11, a vacuum vapor deposition device 20 that vacuum-deposits at least two substances A and B on a surface of the surface acoustic wave device, and a high-frequency application device 30 that applies a high-frequency voltage between the electrodes of the surface acoustic wave device. In the state where a standing wave of surface acoustic waves is generated on the surface of the surface acoustic wave device by applying the high-frequency voltage, a plurality of thin film layers are formed, and a minute-structure is vapor-deposited at a specific position of the standing wave.
    Type: Application
    Filed: February 4, 2010
    Publication date: December 22, 2011
    Applicant: IHI CORPORATION
    Inventors: Yukichi Shigeta, Kunihiko Aoyagi, Hiroyuki Nose
  • Publication number: 20110311427
    Abstract: The present disclosure describes carbon nanotube arrays having carbon nanotubes grown directly on a substrate and methods for making such carbon nanotube arrays. In various embodiments, the carbon nanotubes may be covalently bonded to the substrate by nanotube carbon-substrate covalent bonds. The present carbon nanotube arrays may be grown on substrates that are not typically conducive to carbon nanotube growth by conventional carbon nanotube growth methods. For example, the carbon nanotube arrays of the present disclosure may be grown on carbon substrates including carbon foil, carbon fibers and diamond. Methods for growing carbon nanotubes include a) providing a substrate, b) depositing a catalyst layer on the substrate, c) depositing an insulating layer on the catalyst layer, and d) growing carbon nanotubes on the substrate. Various uses for the carbon nanotube arrays are contemplated herein including, for example, electronic device and polymer composite applications.
    Type: Application
    Filed: December 11, 2009
    Publication date: December 22, 2011
    Applicant: WILLIAM MARSH RICE UNIVERSITY
    Inventors: Robert H. Hauge, Cary L. Pint, Noe Alvarez, W. Carter Kittrell
  • Patent number: 8080284
    Abstract: A method for manufacturing a housing (100) out of a transparent housing including an inner surface (10) and an outer surface (20), is described. Ink is printed on the inner surface (10) to form a ink area (50) defining a window area (40). The window area (40) and the ink area (50) are shielded and a painting process carried out on non-shielded portions of the inner surface (10). Finally, non-conductive vacuum metallization is carried out on the outer surface (20) to form the manufactured housing (100).
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: December 20, 2011
    Assignees: Shenzhen Futaihong Precision Industry Co., Ltd., FIH (Hong Kong) Limited
    Inventors: Zheng Shi, Chih-Chiang Chang
  • Publication number: 20110287223
    Abstract: Articles containing fine-grained and/or amorphous metallic coatings/layers on at least part of their exposed surfaces are imprinted with surface structures to raise the contact angle for water in the imprinted areas at room temperature by equal to or greater than 10°, when compared to the flat and smooth metallic material surface of the same composition.
    Type: Application
    Filed: May 24, 2010
    Publication date: November 24, 2011
    Applicant: INTEGRAN TECHNOLOGIES INC.
    Inventors: Jared J. Victor, Uwe Erb, Klaus Tomantschger, Nandakumar Nagarajan, Diana Facchini
  • Publication number: 20110287194
    Abstract: The invention relates to a device for coating a substrate using CVD, in particular for coating with diamond or silicon, wherein a neat conductor array composed of a plurality of elongated heat conductors (2) is provided in a housing (9), said heat conductors extending between a first (1) and a second electrode (6), wherein the heat conductors are held individually tensioned by a weight (4) attached to one end thereof. To increase the life of the neat conductors (2), the invention proposes that the weight (4) or the heat conductor (2) be guided at the second electrode (6), forming an electrical loop contact, in such a way that a vector of the weight force (G) produced by the weight (4) makes an angle (?) of no more than 45° with a direction of the longitudinal extension of the heat conductor (2).
    Type: Application
    Filed: November 13, 2009
    Publication date: November 24, 2011
    Applicants: CEMECON AG, DIACCON GMBH
    Inventors: Martin Rueffer, Stefan Rosiwal, Christian Bareiss, Walter Reichert, Oliver Lemmer, Marc Perle
  • Patent number: 8053037
    Abstract: A device for patterning structures on a substrate includes an imaging device having a scanning tip, a light emitting device, and a space around the scanning tip. The space comprises a vapor of a material which is suitable for Chemical Vapor Deposition onto the substrate when decomposed. The light emitting device is adapted to emit a light beam, which has an intensity not capable to decompose the vapor, onto the scanning tip in such a way that an electromagnetic field induced by the light beam near the scanning tip is high enough to decompose the vapor.
    Type: Grant
    Filed: November 9, 2004
    Date of Patent: November 8, 2011
    Assignee: International Business Machines Corporation
    Inventors: Siegfried F. Karg, Roland Germann, Heike E. Riel, Walter Heinrich Riess, Reto Schlittler
  • Publication number: 20110267618
    Abstract: A passive reflective tracking media includes a plurality of multi-layer particles including at least one layer of a high refractive index material and at least one layer of a low refractive index material. The particles are configured to reflect ambient electromagnetic radiation at one or more signature wavelengths. Methods of applying the tracking media to a target object, detecting the tracking media, and fabrication the tracking media are also described.
    Type: Application
    Filed: April 28, 2010
    Publication date: November 3, 2011
    Applicant: RAYTHEON COMPANY
    Inventor: Arturo L. CAIGOY
  • Publication number: 20110256347
    Abstract: The invention relates to a method for depositing a diamond coating onto a substrate, said method resulting in the production of a coating characterised by a novel morphology of the diamond in the form of pyramids containing submicronic grains. The method is carried out by chemical vapour deposition by controlling the applied electric field.
    Type: Application
    Filed: December 17, 2009
    Publication date: October 20, 2011
    Inventors: Jean-Pierre Manuad, Angéline Poulon, Lionel Teule-Gay, Cyril Faure
  • Patent number: 8039062
    Abstract: Methods of forming a metal-containing film by atomic layer deposition is provided. The methods comprise delivering at least one precursor to a substrate, wherein the at least one precursor corresponds in structure to Formula II: wherein: M is Hf or Zr; R is C1-C6-alkyl; n is zero, 1, 2, 3, 4 or 5; L is C1-C6-alkoxy. Further methods are provided of forming a metal-containing film by liquid injection atomic layer deposition. The methods comprise delivering at least one precursor to a substrate, wherein the at least one precursor corresponds in structure to Formula III: wherein: M is Hf or Zr; R is C1-C6-alkyl; n is zero, 1, 2, 3, 4 or 5; L is amino, wherein the amino is optionally independently substituted 1 or 2 times with C1-C6-alkyl.
    Type: Grant
    Filed: September 10, 2008
    Date of Patent: October 18, 2011
    Assignee: Sigma-Aldrich Co. LLC
    Inventors: Peter Nicholas Heys, Andrew Kingsley, Fuquan Song, Paul Williams, Thomas Leese, Hywel Owen Davies, Rajesh Odedra
  • Patent number: 8029914
    Abstract: High performance coated metal compositions resistant to metal dusting corrosion and methods of providing such compositions are provided by the present invention. The coated metal compositions are represented by the structure (PQR), wherein P is an oxide layer at the surface of (PQR), Q is a coating metal layer interposed between P and R, and R is a base metal. P includes alumina, chromia, silica, mullite or mixtures thereof. Q includes Ni and Al, and at least one element selected from the group consisting of Cr, Si, Mn, Fe, Co, B, C, N, P, Ga, Ge, As, In, Sn, Sb, Pb, Sc, La, Y, Ce, Ti, Zr, Hf, V, Nb, Ta, Mo, W, Ru, Rh, Ir, Pd, Pt, Cu, Ag, Au and mixtures thereof. R is selected from the group consisting of carbon steels, low chromium steels, ferritic stainless steels, austenetic stainless steels, duplex stainless steels, Inconel alloys, Incoloy alloys, Fe—Ni based alloys, Ni-based alloys and Co-based alloys.
    Type: Grant
    Filed: July 10, 2007
    Date of Patent: October 4, 2011
    Assignee: ExxonMobile Research and Engineering Company
    Inventors: Kenneth E. Bagnoli, G. Phillip Anderson, Trikur A. Ramanarayanan, ChangMin Chun
  • Patent number: 8022012
    Abstract: A device for fabricating thin films on a substrate includes a vacuum chamber, a rotatable platen configured to hold one or more substrates within the vacuum chamber, and a housing disposed within the vacuum chamber. The housing contains a heating element and is configured to enclose an upper surface of the platen and a lower portion configured to partially enclose an underside surface of the platen which forms a reaction zone. A heated evaporation cell is operatively coupled to the lower portion of the housing and configured to deliver a pressurized metallic reactant to the reaction zone. The device includes a deposition zone disposed in the vacuum chamber and isolated from the reaction zone and is configured to deposit a deposition species to the exposed underside of the substrates when the substrates are not contained in the reaction zone.
    Type: Grant
    Filed: September 11, 2008
    Date of Patent: September 20, 2011
    Assignee: Superconductor Technologies, Inc.
    Inventors: Brian H. Moeckly, Ward S. Ruby
  • Publication number: 20110223519
    Abstract: A solid oxide fuel cell includes a membrane electrode assembly including an anode, a cathode, and a solid oxide electrolyte membrane disposed between the anode and the cathode; and a porous conductive support disposed at one surface or both surfaces of the membrane electrode assembly. Both the membrane electrode assembly and the porous conductive support have an uneven structure, and are coupled to each other in a male and female coupling manner.
    Type: Application
    Filed: August 17, 2010
    Publication date: September 15, 2011
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sang-kyun KANG, Tae-young Kim, Pil-won Heo, Jin-su Ha
  • Publication number: 20110206865
    Abstract: A high temperature evaporator is made using an electrically insulating crucible and a heating element made of woven graphite fibers. The crucible is manufactured out of an electrically insulating block to the required shape, and channels are machined on the walls of the crucible. The woven graphite cord is threaded through the channels and is used as heating elements. Since the heating cords are made of woven graphite, they are very flexible and do not embrittle. They can be manufactured to various resistivity as needed, allowing for relatively inexpensive power supplies and low current power delivery. The cords are not fragile and do not break due to thermal shock or vibration.
    Type: Application
    Filed: February 24, 2010
    Publication date: August 25, 2011
    Inventors: Arthur C. WALL, Terry Bluck
  • Patent number: 7997125
    Abstract: A miniaturized spring element is intended to be particularly suitable for use as a beam probe or cantilever for detecting atomic or molecular forces, in particular in an atomic force microscope, and, to this end, is intended to make it possible to detect its deflection in a particularly reliable manner and with high resolution. For this purpose, the spring element contains a basic body which is formed from a matrix containing embedded nanoparticles or defects. The spring element is produced using the principle of local deposition with focused energetic particles or electromagnetic waves or by pyrolytically induced deposition.
    Type: Grant
    Filed: August 1, 2008
    Date of Patent: August 16, 2011
    Assignees: Nanoscale Systems, Nanoss GmbH, Johann Wolfgang Goethe-Universitaet
    Inventors: Alexander Kaya, Michael Huth
  • Patent number: 7998538
    Abstract: The present disclosure relates to methods and systems that provide heat, via at least Photon-Electron resonance, also known as excitation, of at least a particle utilized, at least in part, to initiate and/or drive at least one catalytic chemical reaction. In some implementations, the particles are structures or metallic structures, such as nanostructures. The one or more metallic structures are heated at least as a result of interaction of incident electromagnetic radiation, having particular frequencies and/or frequency ranges, with delocalized surface electrons of the one or more particles. This provides a control of catalytic chemical reactions, via spatial and temporal control of generated heat, on the scale of nanometers as well as a method by which catalytic chemical reaction temperatures are provided.
    Type: Grant
    Filed: December 14, 2004
    Date of Patent: August 16, 2011
    Assignee: California Institute of Technology
    Inventors: Leslie Frederick Greengard, Mark Brongersma, David A. Boyd
  • Publication number: 20110192997
    Abstract: A method of manufacturing a grid (1) for selective transmission of electromagnetic radiation, particularly X-ray radiation, is proposed. The method comprises: providing a support element (3) having self-supporting stability, wherein the support element (3) is made with a material which essentially absorbs no electromagnetic radiation to be selectively transmitted through the grid; applying a metal layer (5) at a surface of the support element (3); and building a selective transmission structure (7) at a surface of the metal layer (5) with a material which absorbs electromagnetic radiation to be selectively transmitted through the grid, wherein the transmission structure is build using selective laser sintering.
    Type: Application
    Filed: October 7, 2009
    Publication date: August 11, 2011
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventor: Geroen Vogtmeier
  • Patent number: 7993538
    Abstract: The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions. The structure can then be processed, with at least a portion of the patterned solid condensate layer on the structure surface, and then the solid condensate layer removed. Further there can be stimulated localized reaction between the solid condensate layer and the structure by directing a beam of energy at at least one selected region of the condensate layer.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: August 9, 2011
    Assignee: President and Fellows of Harvard College
    Inventors: Jene A. Golovchenko, Gavin M. King, Gregor M. Schurmann, Daniel Branton
  • Publication number: 20110175487
    Abstract: The invention relates to a method for producing a dielectric layer (3) in an electroacoustic component (1), in particular a component operating with acoustic surface waves or bulk acoustic waves, comprising a substrate and an associated electrode structure, in which the dielectric layer (3) is formed at least in part by depositing by a thermal vapour deposition process at least one evaporation material selected from the following group of layer vaporising materials: vapour deposition glass material such as borosilicate glass, silicon nitride and aluminium oxide. The invention further relates to an electroacoustic component.
    Type: Application
    Filed: July 23, 2009
    Publication date: July 21, 2011
    Inventors: Ulli Hansen, Jürgen Leib, Simon Maus
  • Patent number: 7976893
    Abstract: A heavily boron-doped diamond thin film having superconductivity is deposited by chemical vapor deposition using gas mixture of at least carbon compound and boron compound, including hydrogen. An advantage of the diamond thin film deposited by the chemical vapor deposition is that it can contain boron at high concentration, especially in (111) oriented films. The boron-doped diamond thin film deposited by the chemical vapor deposition shows the characteristics of typical type II superconductor.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: July 12, 2011
    Assignee: National Institute for Materials Science
    Inventors: Yoshihiko Takano, Masanori Nagao, Minoru Tachiki, Hiroshi Kawarada, Hitoshi Umezawa, Kensaku Kobayashi
  • Patent number: 7975367
    Abstract: A method of manufacturing a magnetic head that includes a reproducing head, a recording head, and an isolation film for magnetically isolating the reproducing head and the recording head from each other. The method includes the steps of: forming the reproducing head; forming the recording head; and forming the isolation film. The isolation film is formed by stacking a plurality of insulating films formed by chemical vapor deposition.
    Type: Grant
    Filed: November 16, 2009
    Date of Patent: July 12, 2011
    Assignee: TDK Corporation
    Inventors: Yoshitaka Sasaki, Tohru Inoue
  • Patent number: 7955581
    Abstract: A method for producing a silicon oxide including the steps of supplying silicon atoms onto a substrate through an oxygen atmosphere to form a silicon oxide layer on the substrate, and separating the silicon oxide layer from the substrate and pulverizing the separated silicon oxide layer to obtain silicon oxide containing silicon and oxygen in predetermined proportions, and a negative electrode active material obtained by the production method.
    Type: Grant
    Filed: October 13, 2006
    Date of Patent: June 7, 2011
    Assignee: Panasonic Corporation
    Inventors: Yasutaka Kogetsu, Sumihito Ishida
  • Patent number: 7955687
    Abstract: The subject of the invention is the use of a material composed of a substrate equipped with a coating based on titanium oxide surmounted by a thin hydrophilic layer forming at least one part of the outer surface of said material and that is not composed of titanium oxide, as a material that prevents the deposition of mineral soiling on said outer surface in the absence of water runoff.
    Type: Grant
    Filed: October 20, 2006
    Date of Patent: June 7, 2011
    Assignee: Saint-Gobain Glass France
    Inventors: Bernard Nghiem, Georges Zagdoun, Elin Sondergard, Ronan Garrec, Eddy Royer, Andriy Kharchenko, Anne Lelarge, Etienne Barthel
  • Publication number: 20110129621
    Abstract: Systems and methods for the production of polysilicon or another material via chemical vapor deposition in a reactor are provided in which gas is distributed using a silicon standpipe. The silicon standpipe can be attached to the reactor system using a nozzle coupler such that precursor gases may be injected to various portions of the reaction chamber. As a result, gas flow can be improved throughout the reactor chamber, which can increase the yield of polysilicon, improve the quality of polysilicon, and reduce the consumption of energy.
    Type: Application
    Filed: March 26, 2009
    Publication date: June 2, 2011
    Applicant: GT SOLAR, INCORPORATED
    Inventor: Wenjun Qin
  • Patent number: 7951438
    Abstract: A metallized laminate film exhibiting improved moisture barrier property as well as maintaining a high bio-polymer content and degradability property is disclosed. The laminate film includes a first core layer of polylactic acid polymer and a second skin layer comprising a polyolefin metal receiving layer. The metal receiving layer or the core layer, or both, may be blended with an amount of polar-modified tie-resin to improve bonding. Alternatively, a discrete tie-resin layer may be interposed between the polyolefin metal receiving layer and the crystalline polylactic acid polymer core layer. The polyolefin metal receiving layer may be discharge-treated on the side opposite the core layer and metallized.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: May 31, 2011
    Assignee: Toray Plastics (America), Inc.
    Inventors: Mark S. Lee, Keunsuk P. Chang
  • Publication number: 20110123727
    Abstract: A method for making an article comprising a multilayered structure comprising a series of magnetic layers is provided. The method includes providing a substrate and depositing a series of magnetic layers on the substrate and disposing insulating layers between successive magnetic layers. Each magnetic layer has a thickness of at least about 2 micrometers and magnetic material has an average grain size less than 200 nm.
    Type: Application
    Filed: January 31, 2011
    Publication date: May 26, 2011
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Luana Emiliana Iorio, Pazhayannur Ramanathan Subramanian
  • Publication number: 20110081504
    Abstract: The invention relates to a method for depositing one or more thin layers. In said method, a process gas forming a polymer streams into a deposition chamber (8) along with a carrier gas by means of a gas inlet element (3) in order to deposit a thin layer, in particular in the form of a polymer, on the surface (7?) of a substrate (7) which lies on a supporting surface (4?) of a susceptor, said supporting surface (4?) lying opposite the gas inlet element (3), at a distance therefrom. In order to allow the coating process to be carried out at substrate temperatures that only slightly exceed the temperature of the supporting surface of the susceptor, the gas inlet element (3) and/or the supporting surface (4?) are/is temperature-controlled in such a way that the temperature (TS) of the supporting surface (4?) is lower than the temperature (TG) of the gas inlet element (3).
    Type: Application
    Filed: May 14, 2009
    Publication date: April 7, 2011
    Applicant: AIXTRON AG
    Inventor: Markus Gersdorff
  • Patent number: 7914858
    Abstract: A method and apparatus for sealing disk drive housing castings and the resulting housings. A housing component of a data storage device is placed in an environment of decreased pressure where a first tank that is an autoclave is pressurized at a selected pressure and the environment is a first tank that encloses the housing component. A second tank that is an autoclave is pressurized at substantially the same pressure as the first tank while the second tank is fluidically coupled to the first tank and encloses a sealant. The sealant is applied to a surface of the component when it is under decreased pressure by transferring the sealant from the first tank to the second tank. A pressure of at least one atmosphere is further applied so that a portion of the sealant contactingly permeates voids in the housing component before the sealant is subsequently cured.
    Type: Grant
    Filed: May 4, 2004
    Date of Patent: March 29, 2011
    Assignee: Maxtor Corporation
    Inventors: Charles deJesus, Thomas G. Andrikowich, Michael C. Strzepa
  • Publication number: 20110070381
    Abstract: A system for beam-induced deposition or etching, in which a charged particle or laser beam can be directed to a work piece within a single vacuum chamber, either normally incident or at an angle. Simultaneously with beam illumination of the work piece, a deposition or etch precursor gas is co-injected or premixed with a purification compound and (optionally) a carrier gas prior to injection into the process chamber. The beam decomposes the deposition precursor gas to deposit a film only in areas illuminated by the beam, or decomposes the etch precursor gas to etch a film only in areas illuminated by the beam. Undesired impurities such as carbon in the deposited film are removed during film growth by interaction with adsorbed species on the work piece surface that are generated by interaction of the beam with adsorbed molecules of the film purification compound. Alternatively, the film purification compound can be used to inhibit oxidation of the material etched by the etch precursor gas.
    Type: Application
    Filed: September 23, 2009
    Publication date: March 24, 2011
    Applicant: FEI COMPANY
    Inventors: Milos Toth, Charlene Lobo, Steven Randolph, Clive Chandler
  • Patent number: 7910177
    Abstract: A method for growing films on substrates using sequentially pulsed precursors and reactants, system and devices for performing the method, semiconductor devices so produced, and machine readable media containing the method.
    Type: Grant
    Filed: July 31, 2006
    Date of Patent: March 22, 2011
    Assignee: Mosaid Technologies Incorporated
    Inventor: Weimin Li
  • Patent number: 7910173
    Abstract: A thermal barrier coating and deposition process for a component intended for use in a hostile thermal environment, such as the turbine, combustor and augmentor components of a gas turbine engine. The TBC has a first coating portion on at least a first surface portion of the component. The first coating portion is formed of a ceramic material to have at least an inner region, at least an outer region overlying the inner region, and a columnar microstructure whereby the inner and outer regions comprise columns of the ceramic material. The columns of the inner region are more closely spaced than the columns of the outer region so that the inner region of the first coating portion is denser than the outer region of the first coating portion, wherein the higher density of the inner region promotes the impact resistance of the first coating portion.
    Type: Grant
    Filed: July 31, 2008
    Date of Patent: March 22, 2011
    Assignee: General Electric Company
    Inventors: Irene Spitsberg, Brett Allen Rohrer Boutwell, Robert William Bruce, Curtis Alan Johnson, Bangalore Aswatha Nagaraj, William Scott Walston, Rudolfo Viguie, Joshua Leigh Miller, Roger Dale Wustman
  • Patent number: 7887871
    Abstract: A method and system for modifying a drug delivery polymeric substrate for an implantable device, such as a stent, is disclosed.
    Type: Grant
    Filed: August 28, 2008
    Date of Patent: February 15, 2011
    Assignee: Advanced Cardiovascular Systems, Inc.
    Inventor: Houdin Dehnad
  • Publication number: 20110033639
    Abstract: An apparatus is provided for growing high aspect ratio emitters (26) on a substrate (13). The apparatus comprises a housing (10) defining a chamber and includes a substrate holder (12) attached to the housing and positioned within the chamber for holding a substrate having a surface for growing the high aspect ratio emitters (26) thereon. A heating element (17) is positioned near the substrate and being at least one material selected from the group consisting of carbon, conductive cermets, and conductive ceramics. The housing defines an opening (15) into the chamber for receiving a gas into the chamber for forming the high aspect ratio emitters (26).
    Type: Application
    Filed: February 4, 2008
    Publication date: February 10, 2011
    Applicant: MOTOROLA, INC.
    Inventors: Bernard F. Coll, Scott V. Johnson
  • Patent number: 7879400
    Abstract: There is provided a substrate processing apparatus equipped with a metallic component, with at least a part of its metallic surface exposed to an inside of a processing chamber and subjected to baking treatment at a pressure less than atmospheric pressure. As a result of this baking treatment, a film which does not react with various types of reactive gases, and which can block the out diffusion of metals, is formed on the surface of the above-mentioned metallic component.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: February 1, 2011
    Assignee: Hitachi Kokusal Electric Inc.
    Inventors: Takahiro Maeda, Kiyohiko Maeda, Takashi Ozaki
  • Publication number: 20100314353
    Abstract: In one preferred aspects, methods are provided to produce a three-dimensional feature, comprising: (a) providing a nano-manipulator device; (b) positioning an article with the nano-manipulator device; and (c) manipulating the article to produce the three-dimensional feature. The invention relates to production of nanoscale systems that can be tailored with specific physical and/or electrical characteristics or need to have these characteristics modified. Methods and apparatus are presented that can construct three-dimensional nanostructures and can also modify existing nanostructures in three dimensions.
    Type: Application
    Filed: April 21, 2010
    Publication date: December 16, 2010
    Applicant: Nicholas Antoniou
    Inventor: Nicholas Antoniou
  • Publication number: 20100307553
    Abstract: The present disclosure concerns a means to use light manipulation in engineered or structured coatings for thermal or photothermal effects and/or refractive and reflective index management. Such metallic, nonmetallic, organic or inorganic metamaterials or nanostructures could be used to manipulate light or energy for thermal or photothermal effects and/or refractive and reflective index management on or in any material or substrate on or in any material or substrate. The light scattering properties of metallic particles and film can be used to tune such coatings, structures or films over a broad spectrum.
    Type: Application
    Filed: August 24, 2009
    Publication date: December 9, 2010
    Inventors: ANTHONY DEFRIES, MARK BRONGERSMA
  • Publication number: 20100304063
    Abstract: Metal-coated polymer articles containing structural substantially porosity-free, fine-grained and/or amorphous metallic coatings/layers optionally containing solid particulates dispersed therein on polymer substrates, are disclosed. The substantially porosity-free metallic coatings/layers/patches are applied to polymer or polymer composite substrates to provide, enhance or restore vacuum/pressure integrity and fluid sealing functions. Due to the excellent adhesion between the metallic coating and the polymer article satisfactory thermal cycling performance is achieved. The invention can also be employed as a repair/refurbishment technique. The fine-grained and/or amorphous metallic coatings are particularly suited for strong and lightweight articles, precision molds, sporting goods, aerospace and automotive parts and other components exposed to thermal cycling and stress created by erosion and impact damage.
    Type: Application
    Filed: June 2, 2009
    Publication date: December 2, 2010
    Applicant: INTEGRAN TECHNOLOGIES, INC.
    Inventors: Jonathan McCrea, Fracisco Gonzalez, Gino Palumbo, Klaus Tomantschger, Rich Emrich, Konstantinos Panagiotopoulos, Mary Pasquantonio, John Kratochwil, Herath Katugaha
  • Publication number: 20100304011
    Abstract: The invention relates to a method for depositing nanometric filamentary structures. The method comprises passing a gaseous phase comprising the nanometric filamentary structures through a space defined between at least two electrodes generating an electric field, for depositing the nanometric filamentary structures on at least one of the electrodes; and at least substantially preventing the deposited nanometric filamentary structures from bridging the electrodes during the deposition. The invention also relates to an apparatus for depositing nanometric filamentary structures as well as to methods and apparatuses for monitoring the production of nanometric filamentary structures.
    Type: Application
    Filed: June 28, 2010
    Publication date: December 2, 2010
    Inventors: Frédéric Larouche, Olivier Smiljanic, Barry L. Stansfield
  • Publication number: 20100297362
    Abstract: A method for processing an object with miniaturized structures is provided. The method includes feeding a reaction gas onto a surface of the object. The method also includes processing the object by directing an energetic beam onto a processing site in a region, which is to be processed, on the surface of the object, in order to deposit material on the object or to remove material from the object. The method further includes detecting interaction products of the beam with the object, and deciding whether the processing of the object is to be continued or can be terminated with the aid of information which is obtained from the detected interaction products of the beam with the object. The region to be processed is subdivided into a number of surface segments, and the interaction products detected upon the beam striking regions of the same surface segment are integrated to form a total signal in order to determine whether processing of the object must be continued or can be terminated.
    Type: Application
    Filed: August 2, 2010
    Publication date: November 25, 2010
    Applicant: CARL ZEISS SMS GMBH
    Inventors: Michael Budach, Tristan Bret, Klaus Edinger, Thorsten Hofmann
  • Patent number: 7838061
    Abstract: Disclosed herein is a method of fabricating a high temperature superconducting film in a vacuum chamber through auxiliary cluster beam spraying using an evaporation method, wherein a high temperature superconducting material is deposited on a substrate in a vapor state by evaporating the high temperature superconducting material, and at the same time, a cluster beam material is formed into gas atoms by heating the cluster beam material charged in a housing, and the formed gas atoms pass through a nozzle of an inlet of the housing and then are sprayed and grown on the substrate in the form of the cluster beam, thereby forming pinning centers in the high temperature superconducting film.
    Type: Grant
    Filed: January 12, 2007
    Date of Patent: November 23, 2010
    Assignee: Korea Electrotechnology Research Institute
    Inventors: Sang Soo Oh, Ho Seop Kim, Kyu Jung Song, Do Jun Youm, Sun Mi Lim, Yong Hwan Jung, Sang Moo Lee, Ye Hyun Jung, Jae Eun Yoo
  • Publication number: 20100285238
    Abstract: Disclosed is a deposition process for forming a glass film. An embodiment comprising the steps of disposing a substrate in a chemical vapor deposition chamber and exposing the substrate surface to a SiO2 precursor gas, a carrier gas, and optionally a dopant gas in the presence of ozone and exposing the reaction volume of the gases above the substrate surface to a high intensity light source.
    Type: Application
    Filed: July 26, 2010
    Publication date: November 11, 2010
    Inventors: Gurtej S. Sandhu, Ravi Iyer
  • Publication number: 20100285332
    Abstract: An aluminum-scandium (Al—Sc) alloy film applied to vehicle lamps and a manufacturing method thereof are revealed. The Al—Sc alloy film contains a trace of scandium so that both temperature for grain refinement and temperature for recrystallization of the film are increased. This results in a fine and smooth surface of the Al—Sc alloy film and the Al—Sc alloy film has better optical reflectivity. Moreover, the Al—Sc alloy film has high recrystallization temperature and high adhesion strength. After high temperature annealing treatment, the Al—Sc alloy film still has higher corrosion resistance.
    Type: Application
    Filed: December 8, 2009
    Publication date: November 11, 2010
    Inventors: Jing-Chie Lin, Hsueh-Lung Liao, Jian-Jhong Shen, Sheng-Long Lee
  • Publication number: 20100279513
    Abstract: The present invention is directed to compositions of matter, systems, and methods to manufacture nanowires. In an embodiment, a buffer layer is placed on a nanowire growth substrate and catalytic nanoparticles are added to form a catalytic-coated nanowire growth substrate. Methods to develop and use this catalytic-coated nanowire growth substrate are disclosed. In a further aspect of the invention, in an embodiment a nanowire growth system using a foil roller to manufacture nanowires is provided.
    Type: Application
    Filed: September 23, 2008
    Publication date: November 4, 2010
    Applicant: NANOSYS, INC.
    Inventors: Chunming Niu, Jay L. Goldman, Xiangfeng Duan, Vijendra Sahi
  • Publication number: 20100276607
    Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.
    Type: Application
    Filed: February 5, 2010
    Publication date: November 4, 2010
    Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
  • Patent number: 7820244
    Abstract: In a method of forming a layer, a titanium layer and a titanium nitride layer may be successively formed on a first wafer. By-products adhered to the inside of a chamber during the formation of the titanium nitride layer may be removed from the chamber. Processes of forming the titanium layer, forming the titanium nitride layer, and removing the by-products may be repeated relative to a second wafer.
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: October 26, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Hun Seo, Jin-Gi Hong, Yun-Ho Choi, Hyun-Chul Kwun, Eun-Taeck Lee, Jin-Ho Kim
  • Patent number: 7811669
    Abstract: There are provided a gas barrier laminated film, which is transparent while possessing excellent gas barrier properties and, at the same time, has excellent impact resistance, and a process for producing the same. The gas barrier laminated film comprises a base material, a vapor deposited film of an inorganic oxide provided on the base material, and a gas barrier coating film provided on the vapor deposited film. The gas barrier laminated film is characterized in that the base material on its side where the vapor deposited film is provided, has been subjected to pretreatment or primer coating treatment, and the gas barrier coating film has been formed by coating a gas barrier coating liquid onto the inorganic oxide film and then heating the coating.
    Type: Grant
    Filed: August 15, 2005
    Date of Patent: October 12, 2010
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hitoshi Fujii, Norio Akita, Ayumi Shibata, Daidou Chiba, Koichi Mikami, Hisashi Sakamoto
  • Publication number: 20100247807
    Abstract: An electron gun evaporation apparatus capable of efficiently using an evaporation source includes an electron beam position controller which determines, as an applicable range, a range within which the distribution of the film thickness growth rate is almost constant in each scanning direction of an electron beam to be applied to an evaporation source in a crucible for the irradiation position of the electron beam, on the basis of information pertaining to the electron beam irradiation position and the film thickness growth rate in the electron beam irradiation position.
    Type: Application
    Filed: January 29, 2008
    Publication date: September 30, 2010
    Applicant: CANON ANELVA CORPORATION
    Inventor: Masato Nakayama
  • Publication number: 20100239464
    Abstract: A method for manufacturing a substrate of an analytical sensor and the substrate thus prepared are disclosed.
    Type: Application
    Filed: October 23, 2008
    Publication date: September 23, 2010
    Inventors: Yong Jin Cho, Chul Jin Kim, Chong Tai Kim, Sung Wook Choi, Jae Ho Kim, Hyo Sop Kim, Jin Ho Kim
  • Publication number: 20100221453
    Abstract: Diamonds are used to nucleate diamond and diamond-like carbon films in a chemical vapor deposition process using bias enhancement. A negative bias is applied to the substrate, such that a cationic form of the diamond is accelerated toward the substrate during the nucleation phase of the deposition. In this manner, the diamondoid may be embedded or partially embedded in the substrate and/or growing film, increasing the adhesion of the film to the substrate. According to the present embodiments, it is not necessary to mechanically pre-seed the substrate for nucleation purposes.
    Type: Application
    Filed: May 20, 2010
    Publication date: September 2, 2010
    Applicant: Chevron U.S.A. Inc.
    Inventors: Jeremy E. Dahl, Robert M. Carlson, Shenggao Liu, Waqar R. Queshi, Wasiq Bokhari
  • Publication number: 20100220305
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: February 25, 2010
    Publication date: September 2, 2010
    Applicant: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami