Abstract: An elementary device to generate electric energy including a photovoltaic converter and a thermoelectric converter. The photovoltaic converter includes a stack of layers, resting on a supporting substrate in heat-insulating material, including a first conductive layer as an upper electrode, and a second conductive layer as a lower electrode, the upper and lower electrodes sandwiching a layer in photoactive material between them. The thermoelectric converter includes a third conductive layer acting as a hot junction and a fourth conductive layer acting as a cold junction, the hot and cold junctions sandwiching between them an element in thermoelectric and electrically conductive material. The thermoelectric and electrically conductive element is included in the thickness of the supporting substrate, so that one end is in contact with the hot junction and the other end is in contact with the cold junction.

Abstract: A thermoelectric conversion module includes a laminated body including a plurality of thermoelectric components laminated therein. Each of the thermoelectric components includes an insulating layer, and a thermoelectric conversion element section in which a plurality of p-type thermoelectric conversion material layers and a plurality of n-type thermoelectric conversion material layers are arranged on the insulating layer in a series connection. A step eliminating insulating material layer is arranged to eliminate a step between the thermoelectric conversion element section and a vicinity thereof, in a region between the insulating layers adjacent to each other in a laminating direction, around the p-type thermoelectric conversion material layers and n-type thermoelectric conversion material layers constituting the thermoelectric conversion element section. The thermoelectric conversion element section has a serpentine shape.

Abstract: A semiconductor memory device comprises a heater electrode, a phase change portion, a heat insulation portion and an upper electrode. The phase change portion comprises a concave portion and a contact portion. The concave portion is in contact with the heater electrode. The contact portion is formed integrally with the concave portion. The heat insulation portion is formed in the concave portion. The upper electrode is formed on the contact portion and the heat insulation portion so that the heat insulation portion is positioned between the concave portion and the upper electrode.

Abstract: In one embodiment, an operating condition of a thermoelectric module is monitored. It is determined when the monitored operating condition exceeds a desired range. Upon determining the monitored operating condition exceeds the desired range, a thermal adjustment is applied to the thermal condition to direct the operating condition to within the desired range. The monitoring the operating condition may include measuring an operating temperature of an environment adjacent a surface of the thermoelectric module, a surface temperature of a portion of the thermoelectric module, a thermal differential between the first surface and the second surface of the thermoelectric module, and an output voltage of the thermoelectric module. The desired range includes a temperature range below a level at which the thermoelectric module will sustain thermal damage and a thermal differential capable of causing the thermoelectric module to generate a minimum desired output voltage.

Abstract: Provided are a non-volatile memory device that may be configured in a stacked structure and may be more easily highly integrated, and a method of fabricating the non-volatile memory device. At least one first electrode and at least one second electrode are provided. The at least one second electrode may cross the at least one first electrode. At least one data storage layer may be at an intersection between the at least one first electrode and the at least one second electrode. Any one of the at least one first electrode and the at least one second electrode may include at least one junction diode connected to the at least one data storage layer.

Abstract: A semiconductor device in accordance with the present invention includes a diode 7 that is formed on a semiconductor substrate and serves as a temperature detection element to detect abnormal heat generation, and a thermal conduction layer 102 that is formed between the diode 7 and the semiconductor substrate and has a thermal conductivity higher than that of the semiconductor substrate. In this way, heat generated in a heat generating portion can be swiftly and uniformly conducted over the entire temperature detection element composed of the diode 7 with efficiency. In this way, a semiconductor device capable of detecting temperature with excellent response by the temperature detection element and its manufacturing method can be provided.

Abstract: A thermoelectric conversion module is formed by bonding a P-type thermoelectric conversion material and an N-type thermoelectric conversion material together with an insulating material including spherical ceramic grains having an index of grain size dispersion, 3CV, of about 20% or less interposed therebetween. The P-type thermoelectric conversion material and the N-type thermoelectric conversion material are electrically connected to each other in a region other than a region in which the P-type thermoelectric conversion material and the N-type thermoelectric conversion material are bonded together with the insulating material interposed therebetween. The spherical ceramic grains have an average grain size of about 0.05 mm to about 0.6 mm, and the insulating material is an insulating glass material.

Abstract: A thermo-electric semiconductor device is provided. The thermo-electric semiconductor device includes: a first electrode layer; a spacer layer formed on the first electrode layer and having a plurality of pillars with a uniform height, the plurality of pillars thermally grown and protruded on a surface of the spacer layer; and a second electrode layer formed over the spacer layer in such a manner as to contact tops of the protruded pillars.

Abstract: The present invention discloses a method for fabricating a nanoscale thermoelectric device, which comprises steps: providing at least one template having a group of nanoscale pores; forming a substrate on the bottom of the template; injecting a molten semiconductor material into the nanoscale pores to form a group of semiconductor nanoscale wires; removing the substrate to obtain a semiconductor nanoscale wire array; and using metallic conductors to cascade at least two semiconductor nanoscale wire arrays to form a thermoelectric device having a higher thermoelectric conversion efficiency.

Abstract: A sensor having a monolithically integrated structure for detecting thermal radiation includes: a carrier substrate, a cavity, and at least one sensor element for detecting thermal radiation. Incident thermal radiation strikes the sensor element via the carrier substrate. The sensor element is suspended in the cavity by a suspension.

Abstract: A combined thermoelectric/photovoltaic device features a photovoltaic cell with a common electrode, an electrically insulative, thermally conductive layer applied to the common electrode, and an array of thermoelectric couples each including a p-type semiconductor element and an n-type semiconductor element. There is an electrically conductive bridge for each thermoelectric couple formed on the electrically insulative thermally conductive layer. Methods of making such a hybrid device also including a heat sink are also disclosed.

Abstract: A combined thermoelectric/photovoltaic device features a photovoltaic cell with a common electrode, an electrically insulative, thermally conductive layer applied to the common electrode, and an array of thermoelectric couples each including a p-type semiconductor element and an n-type semiconductor element. There is an electrically conductive bridge for each thermoelectric couple formed on the electrically insulative thermally conductive layer. Methods of making such a hybrid device also including a heat sink are also disclosed.

Abstract: A photosensitive optoelectronic device having an improved hybrid planar bulk heterojunction includes a plurality of photoconductive materials disposed between the anode and the cathode. The photoconductive materials include a first continuous layer of donor material and a second continuous layer of acceptor material. A first network of donor material or materials extends from the first continuous layer toward the second continuous layer, providing continuous pathways for conduction of holes to the first continuous layer. A second network of acceptor material or materials extends from the second continuous layer toward the first continuous layer, providing continuous pathways for conduction of electrons to the second continuous layer. The first network and the second network are interlaced with each other. At least one other photoconductive material is interspersed between the interlaced networks.

Abstract: A phase-change memory element is provided. The phase-change memory element includes: a first electrode formed on a substrate; a first dielectric layer, with an opening, formed on the first electrode, wherein the opening exposes a top surface of the first electrode; a pillar structure formed directly on the first electrode within the opening; an inner phase-change material layer surrounding the pillar structure, directly contacting the first electrode; a second dielectric layer surrounding the inner phase-change material layer; an outer phase-change material layer surrounding the second dielectric layer; a phase-change material collar formed between the second dielectric layer and the first electrode, connecting the inner phase-change material layer with the outer phase-change material layer; and a second electrode formed directly on the pillar structure, directly contacting the top surface of the inner phase-change material layer.

Abstract: A method for fabricating a negative thermal expanding system device includes coating a wafer with a thermally decomposable polymer, patterning the decomposable polymer into repeating disk patterns, releasing the decomposable polymer from the wafer and forming a sheet of repeating patterned disks, suspending the sheet into a first solution with seeding compounds for electroless decomposition, removing the sheet from the first solution, suspending the sheet into a second solution to electrolessly deposit a first layer material onto the sheet, removing the sheet from the second solution, suspending the sheet into a third solution to deposit a second layer of material having a lower TCE value than the first layer of material, separating the patterned disks from one another, and annealing thermally the patterned disks to decompose the decomposable polymer and creating a cavity in place of the decomposable polymer.

Abstract: A method is provided for producing a thermoelectric component having at least one pair of thermoelectric legs, including an n-leg and a p-leg, wherein both legs are welded to an electrically conductive contact material, and wherein the n-leg and the p-leg of the pair of legs are welded in separate welding steps to the contact material. A thermoelectric component produced by the method is also provided.

Abstract: Thermoelectric generator elements and associated circuit elements are simultaneously formed using a common semiconductor device fabrication process to provide an integrated circuit including a dynamically reconfigurable thermoelectric generator array on a common chip or die substrate. A switch logic circuit formed together with the thermoelectric generator elements is configured to control series and parallel connections of the thermoelectric generator elements is the array in response to changes in circuit demand or changes in the available ambient energy source. In an example implementation, the number of generators connected in series may be varied dynamically to provide a stable voltage source, and the number of generators connected in parallel may be varied dynamically to provide a stable current source.

Abstract: A method for applying at least one layer, selected from diffusion barriers, further protective layers, adhesion promoters, solders and electrical contacts, onto thermoelectric materials, is characterized by the fact that the at least one layer is rolled or pressed onto the thermoelectric material at a temperature at which the thermoelectric material is flowable.

Abstract: Monolithic IC/MEMS processes are disclosed in which high-stress silicon nitride is used as a mechanical material while amorphous silicon serves as a sacrificial layer. Electronic circuits and micro-electromechanical devices are built on separate areas of a single wafer. The sequence of IC and MEMS process steps is designed to prevent alteration of partially completed circuits and devices by subsequent high process temperatures.

Abstract: A method of preparing a thermoelectric material includes the following steps. A thermoelectric raw material can be filled into a cavity of a first mold so that the thermoelectric raw material filled in the cavity has first and second dimensions. The first dimension can be defined in a first direction. The second dimension can be defined in a second direction. The second direction can be perpendicular to the first direction. The first dimension can be equal to or greater than the second dimension. The thermoelectric raw material filled in the cavity can be cooled in a uniaxial direction that is parallel to the second direction at a cooling rate of at least 600° C./min.

Abstract: An electronic component (100, 1400) comprises a first electrode (106), a second electrode (107), a convertible structure (102) electrically coupled between the first electrode (106) and the second electrode (107), being convertible between at least two states by heating and having different electrical properties in different ones of the at least two states, and a retention enhancement structure (108, 1402) arranged between the first electrode (106) and the second electrode (107), connected to the convertible structure (102) and configured for suppressing conversion between different ones of the at least two states in the absence of heating.

Abstract: Provided are a semiconductor power module package and a method of fabricating the same. The semiconductor power module package includes a substrate, semiconductor chips arranged on a top surface of the substrate, and a temperature sensor mounted on a top surface of at least one of the semiconductor chips. The semiconductor chips and the temperature sensor are electrically connected to each other through leads. A sealing material covers the top surface of the substrate, the semiconductor chips, and the temperature sensor except for portions of the leads and a bottom surface of the substrate. The temperature sensor may include a thermistor, and the thermistor may include first and second electrode terminals connected to corresponding leads of the leads. A first wiring pattern may be in contact with the first electrode terminal, and a second wiring pattern may be in contact with the second electrode terminal.

Abstract: Carbon-containing sp3-bonded solid refractory nanocrystalline particles that are each sized no larger than about 100 nanometers have a metal of choice disposed thereabout. A variable potential junction is formed between the metallic coatings and the particles that enables carrier entropy to be efficiently transported from the variable potential junction to the coating.

Abstract: A semiconductor device that includes a phase change material for protecting the device from failure caused by overheating. The semiconductor device is adapted to detect a rapid increase in current due to heat and also adapted to break a circuit in the detected rapid increase in current by depositing a phase change material inside or outside a cell actually operated in the semiconductor device.

Abstract: In various embodiments of the present invention, a thermoelectric device is provided. The thermoelectric device includes one or more thermoelements provided for transferring heat across the ends of the thermoelectric device. A method for making the thermoelectric device includes forming a metal substrate, and depositing one or more thermoelectric films on the metal substrate. Thereafter, one or more bumps are provided on one of the one or more thermoelectric films. Deposition of the one or more thermoelectric films on the metal substrate and the provision of the one or more bumps on the thermoelectric film result in the formation of a thermoelement.

Abstract: An apparatus and method is described for measuring a local surface temperature of a semiconductor device under stress. The apparatus includes a substrate, and a reference MOSFET. The reference MOSFET may be disposed closely adjacent to the semiconductor device under stress. A local surface temperature of the semiconductor device under stress may be measured using the reference MOSFET, which is not under stress. The local surface temperature of the semiconductor device under stress may be determined as a function of drain current values of the reference MOSFET measured before applying stress to the semiconductor device and while the semiconductor device is under stress.

Abstract: A multi-layered solid-state thermal-electrical generator (“MSTEG”) system capable of generating electricity from thermal energy is disclosed. An MSTEG system includes a thermal layer, a regulating layer, and a storage layer. The thermal layer, in one embodiment, includes multiple integrated thermal-electrical generator (“ITEG”) devices configured to generate electricity in response to a certain thermal condition. The thermal condition for example can be a temperature difference between 900° C. (Celsius) to 1200° C. for a certain layer. The regulating layer includes multiple thermal regulators deposited over the thermal layer, wherein the thermal regulators regulate temperature. The storage layer includes one or more thermal storage tanks deposited over the regulating layer, wherein each thermal storage tank is capable of storing heat.

Abstract: Embodiments of a micro electro mechanical system are disclosed.

Abstract: An integrated circuit may include a region containing a thermoelectric material and be configured to be subjected to a temperature gradient resulting from a flow of an electric current in a part of the integrated circuit during its operation, and an electrically conducting output coupled to the region for delivering the electrical energy produced by thermoelectric material.

Abstract: Provided are a thermoelectric device using radiant heat as a heat source and a method of fabricating the same. In the thermoelectric device, an anti-reflection layer formed on a heat absorption layer causes as much radiant light as possible to be absorbed by the heat absorption layer without being reflected to the outside so that the radiant heat absorption efficiency can be improved. Also, in the thermoelectric device, an insulating layer formed on a heat dissipation layer and a first reflection layer formed on the insulating layer can prevent external radiant heat from being absorbed by the heat dissipation layer, and as much radiant heat transferred to the heat dissipation layer as possible can be dissipated away from the heat dissipation layer by a second reflection layer thermally connected with the heat dissipation layer so that the radiant heat emission efficiency can be improved.

Abstract: A method of forming a thermoelectric device may include forming a pattern of conductive traces, and forming an electrically insulating matrix between the conductive traces of the pattern of conductive traces. In addition, a plurality of thermoelectric elements may be electrically and mechanically coupled to the pattern of conductive traces so that each conductive trace of the pattern of conductive traces has one of the plurality of thermoelectric elements thereon. In addition, the plurality of thermoelectric elements may be free of the electrically insulating matrix. Related methods and structures are also discussed.

Abstract: A semiconductor device includes a semiconductor layer (2) having therein a cavity (4). A dielectric layer (3) is formed on the semiconductor layer. A plurality of etchant openings (24) extend through the dielectric layer for passage of etchant for etching the cavity. An SiO2 pillar (25) extends from a bottom of the cavity to engage and support a portion of the dielectric layer extending over the cavity. In one embodiment, a cap layer (34) on the dielectric layer covers the etchant openings.

Abstract: Embodiments of the invention provide methods of forming photovoltaic or thermoelectric materials, including photovoltaic or thermoelectric films. In one embodiment, the invention provides a method of forming a photovoltaic material, the method comprising: depositing an inorganic capped nanoparticle solution onto a substrate; and heating the substrate.

Abstract: Methods of forming a microelectronic structure are described. Embodiments of those methods include forming a first plurality of openings through a first surface of a substrate, forming a p-type TFTEC material within the first plurality of openings, forming a second plurality of openings substantially adjacent to the first plurality of openings through the first surface of the substrate, and then forming an n-type TFTEC material within the second plurality of openings.

Abstract: The invention relates to the thermoelectrical industry and can be used for producing thermoelectrical devices based on the Peltier and Seebeck effects. In particular, the invention relates to a crystalline plate made of thermoelectric laminated material, to a component which is used for producing n- and p-type conductivity legs. The invention is also related to a method of manufacture of crystalline plates of a thermoelectric layered material based on the AVBVI solid solutions by using a directional crystallization process.

Abstract: An infrared sensor manufacturing method according to this invention includes a step of forming a bridge structure of an insulating material on an Si substrate, a step of forming a vanadium oxide thin film on the bridge structure by a dry film forming method, a step of irradiating laser light onto the vanadium oxide thin film to thereby change material properties thereof, a step of forming the vanadium oxide thin film with the changed material properties into a bolometer resistor having a predetermined pattern, and a step of forming a protective layer of an insulating material so as to cover the bolometer resistor having the predetermined pattern and the bridge structure.

Abstract: An embodiment of the invention relates to a Seebeck temperature difference sensor that may be formed in a trench on a semiconductor device. A portion of the sensor may be substantially surrounded by an electrically conductive shield. A plurality of junctions may be included to provide a higher Seebeck sensor voltage. The shield may be electrically coupled to a local potential, or left electrically floating. A portion of the shield may be formed as a doped well in the semiconductor substrate on which the semiconductor device is formed, or as a metal layer substantially covering the sensor. The shield may be formed as a first oxide layer on a sensor trench wall with a conductive shield formed on the first oxide layer, and a second oxide layer formed on the conductive shield. An absolute temperature sensor may be coupled in series with the Seebeck temperature difference sensor.

Abstract: A solid-state imaging device, a line sensor and an optical sensor for enhancing a wide dynamic range while keeping high sensitivity with a high S/N ratio, and a method of operating a solid-state imaging device for enhancing a wide dynamic range while keeping high sensitivity with a high S/N ratio are provided. The solid-state imaging device comprises an integrated array of a plurality of pixels, each of which comprises a photodiode PD for receiving light and generating photoelectric charges, a transfer transistor Tr1 for transferring the photoelectric charges, and a storage capacitor element C connected to the photodiode PD at least through the transfer transistor Tr1 for accumulating, at least through the transfer transistor Tr1, the photoelectric charge overflowing from the photodiode PD during accumulating operation.

Abstract: Provided are a thermoelectric conversion element, a thermoelectric conversion module using the thermoelectric conversion element, and a method for manufacturing the thermoelectric conversion module. The thermoelectric conversion element has a hexahedral shape, of which the two faces opposing each other and the other four faces have different reflectances to light. The thermoelectric conversion module comprises a plurality of p-type thermoelectric conversion elements and a plurality of n-type thermoelectric conversion elements, and a plurality of electrodes connecting the end faces of each pair of the p-type thermoelectric conversion elements and the n-type thermoelectric conversion elements electrically with each other to connect the p-type thermoelectric conversion elements and the n-type thermoelectric conversion elements electrically in series alternately.

Abstract: A thermopile-based thermal detector is provided by a thermocouple, formed from a single sheet of material, which is made dissimilar with a P-doped and an N-doped junction electrically isolated via a naturally forming depletion region. The thermopile P-N sheet is uniform and planar, addressing stress and manufacturing issues. The usual non-active area of a conventional thermopile is significantly reduced or eliminated, and thus the output signal per unit diaphragm area of the detector is substantially increased, without the typical reduction in the signal-to-noise ratio. Also, a significant reduction in size of the thermal detector area is provided without a reduction in signal or signal-to-noise ratio. In an aspect, a second layer of thermocouples is axially positioned over, and connected with, a first layer of thermocouples. Additional axially stacked thermopiles can be provided within the same fabrication process. Signal processing circuitry may be electrically interconnected with the thermocouple.

Abstract: A method and apparatus for reducing cross-talk between pixels in a semiconductor based image sensor. The apparatus includes neighboring pixels separated by a homojunction barrier to reduce cross-talk, or the diffusion of electrons from one pixel to another. The homojunction barrier being deep enough in relation to the other pixel structures to ensure that cross-pixel electron diffusion is minimized.

Abstract: The present disclosure provides an image sensor semiconductor device. The semiconductor device includes a sensor element disposed in a semiconductor substrate; an inter-level dielectric (ILD) disposed on the semiconductor substrate; and a trench disposed in the ILD, overlying and enclosing the sensor element, and filled with a first dielectric material.

Abstract: A semiconductor apparatus is provided. The semiconductor apparatus includes a semiconductor substrate and a temperature sensing diode that is disposed on a surface part of the semiconductor substrate. A relation between a forward current flowing through the temperature sensing diode and a corresponding voltage drop across the temperature sensing diode varies with temperature. The semiconductor apparatus further includes a capacitor that is coupled with the temperature sensing diode, configured to reduce noise to act on the temperature sensing diode, and disposed such that the capacitor and the temperature sensing diode have a layered structure in a thickness direction of the semiconductor substrate.

Abstract: Embodiments of the invention provide methods and apparatus for managing temperature in integrated circuits. In accordance with an aspect of the invention, an integrated circuit comprises a monitored region defined by three or more edges. What is more, the integrated circuit comprises at least two temperature sensors for each of the three or more edges. The temperature sensors are arranged along the three or more edges such that each edge has substantially the same arrangement of temperature sensors. Thermal management of the integrated circuit may be accomplished by modifying functional aspects of the integrated circuit in response to measurements provided by the temperature sensors.

Abstract: Thermo-optical devices providing heater recirculation in an integrated optical device are described. The thermo-optical devices include at least one waveguide having a non-linear path length in thermal communication with a thermal device. Methods of fabrication and use are also disclosed.

Abstract: Alumina as a sublimation suppression barrier for a Zintl thermoelectric material in a thermoelectric power generation device operating at high temperature, e.g. at or above 1000K, is disclosed. The Zintl thermoelectric material may comprise Yb14MnSb11. The alumina may be applied as an adhesive paste dried and cured on a substantially oxide free surface of the Zintl thermoelectric material and polished to a final thickness. The sublimation suppression barrier may be finalized by baking out the alumina layer on the Zintl thermoelectric material until it becomes substantially clogged with ytterbia.

Abstract: A high efficiency thermo electric device and associated method of making, the device comprising a multilayer structure of alternating insulator and insulator/metal material that is irradiated across the plane of the layer structure with ionizing radiation. The ionizing radiation produces nanoclusters of the metal material in the layered structure that increase the electrical conductivity and decrease the thermal conductivity thereby increasing the thermoelectric figure of merit. Figures of merit as high as 2.5 have been achieved using layers of co-deposited gold and silicon dioxide interspersed with layers of silicon dioxide. The gold to silicon dioxide ratio was 0.04. 5 MeV silicon ions were used to irradiate the structure. Other metals and insulators may be substituted. Other ionizing radiation sources may be used. The structure tolerates a wide range of metal to insulator ratio.

Abstract: A silicon/germanium (SiGe) superlattice thermal sensor is provided with a corresponding fabrication method. The method forms an active CMOS device in a first Si substrate, and a SiGe superlattice structure on a second Si-on-insulator (SOI) substrate. The first substrate is bonded to the second substrate, forming a bonded substrate. An electrical connection is formed between the SiGe superlattice structure and the CMOS device, and a cavity is formed between the SiGe superlattice structure and the bonded substrate.

Abstract: A method for forming a phase change memory device is disclosed. A substrate with a bottom electrode thereon is provided. A heating electrode and a dielectric layer are formed on the bottom electrode, wherein the heating electrode is surrounded by the dielectric layer. The heating electrode is etched to form recess in the dielectric layer. A phase change material is deposited on the dielectric layer, filling into the recess. The phase change material is polished to remove a portion of the phase change material exceeding the surface of the dielectric layer and a phase change layer is formed confined in the recess of the dielectric layer. A top electrode is formed on the phase change layer and the dielectric layer.

Abstract: A termoelectric thermoelectric device and method for manufacturing the thermoelectric device.