Abstract: A measurement apparatus that measures a signal under measurement, including a strobe timing generator that sequentially generates strobes arranged at substantially even time intervals, a level comparing section that detects a signal level of the signal under measurement at a timing of each sequentially provided strobe, a capture memory that stores therein a data sequence of the signal levels sequentially detected by the level comparing section, a frequency domain converting section that converts the data sequence into a spectrum in the frequency domain, and a jitter calculating section that calculates jitter of the signal under measurement based on a value obtained by integrating levels of frequency components in a predetermined frequency range of the spectrum.

Abstract: Provided is system and method for controlling a fabrication cluster using at least one parameter of a structure measured with an optical metrology system designed and configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for standalone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a signal measured using the optical metrology system is transmitted to a fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.

Abstract: A method for making a sample for evaluation of laser irradiation position and evaluating the sample, and an apparatus which is switchable between a first mode of modification of semiconductor and a second mode of making and evaluating the sample. Specifically, a sample is made by irradiating a semiconductor substrate for evaluation with a pulse laser beam while the semiconductor substrate is moved for evaluation at an evaluation speed higher than a modifying treatment speed, each relative positional information between pulse-irradiated regions in the sample is extracted, and stability of the each relative positional information between pulse-irradiated regions is evaluated. The evaluation speed is such a speed that separates the pulse-irradiated regions on the sample from each other in a moving direction.

Abstract: A charged particle beam writing apparatus includes a first area density calculation unit configured to calculate a first area density occupied by a pattern of a first dimension in a predetermined region, a first dimension error calculation unit configured to calculate a first dimension error caused by a loading effect, using the first area density, a first dimension calculation unit configured to calculate a second dimension of a pattern obtained by correcting the first dimension error of the first dimension, a second area density calculation unit configured to calculate a second area density occupied by the pattern of the second dimension in the predetermined region, a second dimension error calculation unit configured to calculate a second dimension error caused by the loading effect, using the second area density, a second dimension calculation unit configured to calculate a third dimension by adding the second dimension error to the second dimension, a judgment unit configured to judge whether a differenc

Abstract: A method for assembly inspection is disclosed. The system may include obtaining a digital image of an assembled product, extracting images of one or more objects from the digital image of the assembled product, and recognizing each of the one or more objects as a component based on its extracted image and a library of standard components. The method may further include identifying one or more features of each recognized component, comparing each of the one or more identified features with a corresponding standard feature of the corresponding standard component, and determining an assembly fault if at least one of the one or more identified features does not match the corresponding standard feature.

Abstract: A method for controlling a plurality of manipulators, such as multiaxial or multiaxle industrial robots. At least one manipulator functions as the reference manipulator and is moved in a plurality of preset poses within its working area at which internal position values are determined as first desired poses. For each desired pose, subsequently a first actual pose of the reference manipulator is determined by an external measuring system. Subsequently at least one further manipulator moves up to specific poses of the reference manipulator as second desired poses and for each of these poses an actual pose of the further manipulator is determined by an external measuring system. On the basis of actual-desired deviations between the thus determined desired and actual poses of the two manipulators, subsequently a parameter model for the further manipulator is established and with it it is possible to compensate simultaneously both its own errors and those of the reference manipulator.

Abstract: A method, apparatus and computer program product for authenticating a pharmaceutical product is provided. The method includes receiving an identifier and a quantity for the pharmaceutical product and receiving a photonic signal from the pharmaceutical product, wherein the photonic signal includes a frequency and amplitude. The method can further include searching for the identifier and quantity that was received in a predefined list comprising identifier-quantity pairs, wherein a frequency and amplitude corresponds to each identifier-quantity pair. The method can further include matching the identifier and quantity that was received to a first identifier-quantity pair in the list. The method can further include storing a record indicating that the pharmaceutical product is counterfeit if the frequency and amplitude of the photonic signal does not match the frequency and amplitude corresponding to the first identifier-quantity pair.

Abstract: A software architecture, design and implementation that enables efficient transistor performance analysis across multiple levels of parameter granularity with interactive drill-down, drill-across capability, for use during semiconductor technology development. The software may include several features, such as highly modular, robust architecture to enable analysis across the multiple granularity of transistor performance data, i.e., per die, material group, and aggregate, GUI-based template configuration to specify the analysis across the multiple levels in a uniform set of operations, subsystems to execute the template specified with the GUI, integration of pass-fail analysis analytics, interactive drill-down on particular data points of user interest in automatically generated charts, and drill-across capability allowing linking of data points highlighted on a single chart to those that are correlated in all other charts. Other embodiments are described.

Abstract: The present invention is applicable to various sensor outputs including pulse signals and reduces cost for detecting malfunction. The malfunction detection system detects a malfunction in a sensor, and the malfunction detection system includes a sensor including a first terminal, and which outputs a sensor output current that varies a voltage level of the first terminal, a current output unit which varies the voltage level of the first terminal by outputting a constant current for judging to the sensor via the first terminal, and a judging unit which judges that the sensor is malfunctioning when the current for judging causes the voltage level of the first terminal to be equal to or higher than a threshold in a period different from a first period where the sensor output current causes the voltage level of the first terminal to be equal to or higher than the threshold.

Abstract: Various method embodiments comprise testing a plurality of RFID tags forming at least a portion of a first web to identify defective RFID tags and verified RFID tags, cutting the first web between a rotary die and an anvil to remove at least the verified RFID tags from the first web, rotating the anvil to transfer the verified RFID tags cut from the first web away from the first web, placing the verified RFID tags from the anvil onto a second web to form a third web having a first major surface, preventing the defective RFID tags from being placed from the anvil on the second web, and re-testing the RFID tags forming at least a portion of the third web. Other aspects and embodiments are provided herein.

Abstract: An electrode material for a lithium secondary battery which includes particles each having a central portion and a surface portion covering the surface of the central portion. The central portion occupies 80 to 99% of a distance from a center to an outermost surface of the particle and the surface portion occupies 20 to 1% of the distance. The central portion includes LiM1-aDaO2 (M represents Co or Ni, D represents a transition metal element or Al replacing a part of Co or Ni as M, and M is not the same as D) having an ?-NaFeO2 structure. The surface portion includes LiM1-bEbO2 (M represents Co or Ni, E represents a metal element replacing a part of Co or Ni as M, and M is not the same as E) having an ?-NaFeO2 structure. The content of element E in the central portion satisfies the relation of E/(M+D+E)<0.05 in terms of an atomic ratio, and the content of element D in the surface portion satisfies the relation of D/(M+D+E)<0.05 in terms of an atomic ratio.

Abstract: A recycling method of wastes of an electrical appliance containing an article having a circuit soldered with parts soldered with a lead free solder. The method includes discriminating a first article having a circuit soldered with lead free parts from a second article having a circuit soldered with lead containing parts; recovering, grinding and melting each of the first and second articles to separate materials of the first article and materials of the second article; recycling reusable valuables contained in the materials of the first article and second article; and shredding a portion of the first and second article not containing the reusable valuables and burying/treating the portion at a stabilizing dumping ground or a controlled dumping ground for disposal.

Abstract: A device for enabling the user of a clinical analyzer, such as, for example, an automated clinical analyzer, e.g., an automated hematology analyzer, to identify samples that require additional processing subsequent to an initial run through the clinical analyzer. The device can also indicate the location of sample containers to assist the user in finding a sample from a sample retention area. The device comprises a rack comprising a plurality of receptacles, each receptacle having a recessed area for holding a sample container, e.g., a sample tube. Each receptacle is associated with an indicator for signaling when a sample container in a given receptacle area requires additional processing.

Abstract: A response content determination section determines a response content in response to a request from a user which is received by an input section, and an output section outputs the response content. A biological signal detection section measures a biological signal of the user from an output timing of the output section as a starting point, and a disappointment judgment section judges, based on the biological signal, whether or not the response content matches the request of the user.

Abstract: An improved quality assurance system and method for point-of-care testing are disclosed. The present invention provides quality assurance for laboratory quality tests performed by a blood analysis system or the like at the point of patient care without the need for running liquid-based quality control materials on the analysis system. Quality assurance of a quantitative physiological sample test system is performed without using a quality control sample by monitoring the thermal and temporal stress of a component used with the test system. Alert information is generated that indicates that the component has failed quality assurance when the thermal and temporal stress exceeds a predetermined thermal-temporal stress threshold. Alternatively, the present invention provides quality assurance for laboratory quality tests performed by a blood analysis system or the like at the point of patient care by minimizing the need for running liquid-based quality control materials on the analysis system.

Abstract: A method of inspecting defect of a mask is provided. In this method, a database for storing a plurality of virtual simulation models is created. The virtual simulation models are determined by a plurality of factors including an optical effect and a chemical effect during the transferring the pattern of a mask to the photoresist layer on a wafer. A mask defect image is acquired. A simulation contour of the mask defect image is generated from at least one virtual simulation model in the database. Next, the acceptability of the mask is determined.

Abstract: A data logger analyzes temperature data associated with a product passing through a conveyor oven and provides a visual pass or fail indication indicating whether the product's temperature profile is within acceptable limits. Thus, an operator need not download captured temperature data to a computer in order to determine whether the oven settings produce a product profile that is within acceptable limits. In one embodiment, the data logger stores criteria for an acceptable product profile. The data logger then collects the temperature data and analyzes whether the temperature profile data is within the acceptable limits of the criteria. In another embodiment, a button and a pass/fail indicator are located on the exterior housing of the data logger. An operator depresses the button in order to request whether the product profile passed or failed the criteria for an acceptable product profile.

Abstract: A defect detection system includes a data acquiring section that acquires time series data of device parameter of each manufacturing device including an exposure device, and information on defect distribution in an area with a size smaller than a chip area size, a pattern classifying section that assembles the information on the defect distribution in units of shot or chip areas, and classifies the distributions to a defect pattern, a feature quantity calculating section that processes the time series data and calculates a feature quantity, a significant difference test section that calculates occurrence frequency distributions of the shot or chip area wherein the defect pattern to the feature quantity exists and does not exist, respectively, and determines the presence/absence of significant difference between the frequency distributions, and a defect detecting section that detects the device parameter corresponding to the feature quantity as the cause of defect of the defect pattern.

Abstract: Management of countermeasure of pollution particles deposited on an object to be processed is optimized based on a cause of the pollution. Data processing and management equipment 1 comprises a functional approximation part 2 to make a mathematical model of a relation between measured numbers of particles deposited on a substrate during processing in a surface structuring device or a film forming device and accumulated amount processed after cleaning up of the device by a functional equation based on a cause of the deposit of the particles. A judging part 3 specifies the cause of the deposit of particles by comparing the functional equation with the measured numbers of particles.

Abstract: An exemplary method for performing fabrication sequence analysis, the method comprising, defining a process group, wherein a process group includes fabrication processes in a fabrication sequence, determining fabrication process paths in the process group to define independent variables, wherein a process path is a plurality of fabrication equipment used to fabricate a particular semiconductor device in the fabrication sequence, receiving a dependent variable for the fabrication sequence, performing analysis of variance to calculate a p-value for the process group, determining whether the p-value is lower than a threshold value, identifying a poor process path responsive to determining that the p-value is lower than a threshold value, and outputting the identified poor process path.

Abstract: Provided is a method of controlling a fabrication cluster using a machine learning system, the machine learning system trained developed using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signal is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A first machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A library of simulated fine diffraction signals and profile parameters is generated using the trained first machine learning system and using ranges and corresponding resolutions of the profile parameters.

Abstract: Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A measured diffraction signal adjusted by the simulated approximation diffraction signal is input into the trained machine learning system and generates the corresponding profile parameters.

Abstract: Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters and used to generate a library of difference diffraction signals. A measured diffraction signal adjusted by the simulated approximation diffraction signal is matched against the library to determine at least one profile parameter of the structure.

Abstract: An environmental sensor including an inlet and an outlet such that a flow of fluid moves from the inlet to the outlet, a particle detection portion to detect particles in the fluid, and a controller connected to the particle detection portion. The environmental sensor can be in communication with a data acquisition system (e.g., via a wireless access point) to form a particle counting system. Also disclosed are methods of operating the environmental sensor and methods of operating the particle detection system.

Abstract: A method for inspecting appearance of pellet type medicines and a system employing thereof are provided, in which after the pellet type medicines are arranged into a row, they are sequentially slid down via an oriented sliding channel and then collected after dropping, wherein when the pellet type medicines move on the oriented sliding channel, an image processing device classifies the pellet type medicines according to records of detecting signals and gathered images, and controls the operation of a classification controlling device related to the appearance defective pellet type medicines, so as to depart the appearance defective pellet type medicines from the dropping pathway.

Abstract: When measurement data collected with a specific sampling cycle by MCs from measuring instrument units are stored into a data storage apparatus, a sampling controller adjusts the sampling cycle to a longer setting if the apparatus state is other than a substrate processing execution state (e.g., an idling state) compared to the sampling cycle set in the substrate processing execution state, so as to minimize the volume of data stored into the data storage apparatus.

Abstract: Provided is a component bonding method with higher bonding precision in a process of bonding an electrode of a component to an electrode formed on a flat panel. A preliminary press bonding device includes: a control unit which includes a position displacement amount correction unit to which a position displacement amount after the press bonding process is fed back and which corrects the position displacement on the next component to be preliminarily bonded; and a component position determining unit which determines a position of the component using the fed back correction amount. On the other hand, a press bonding device includes a bonding recognition device for use in the recognition of positions of the electrodes on the flat panel and the component. The bonding recognition device includes a position displacement amount calculating unit which calculates the position displacement amount based on the recognized position information.

Abstract: An optical receiving apparatus that receives an optical signal and outputs a data value of digital data transmitted by the optical signal is provided, including a light receiving element that receives the optical signal and outputs a photocurrent according to a strength of the optical signal, a present cycle integrator that integrates the photocurrent corresponding to a present cycle of the digital data over a prescribed period within the cycle, a previous cycle integrator that integrates the photocurrent corresponding to a cycle prior to the present cycle over a period that is substantially equal to the prescribed period in the cycle, and a data value identifying circuit that outputs a data value of the present cycle of the digital data based on a difference between a charge amount obtained through integration by the present cycle integrator and a charge amount obtained through integration by the previous cycle integrator.

Abstract: In the case where measurement/inspection of a wafer is performed in a measurement/inspection instrument before and after exposure is performed in an exposure apparatus, various kinds of conditions of the exposure apparatus and the measurement/inspection instrument such as environment in the apparatus/instrument, a measurement condition of an alignment system a measurement condition of an AF measurement device, a wafer grid, and image distortion are made to be matched. In particular, in accordance with a processing state of the exposure apparatus and a coater developer, a measurement result of a film, and the like, exclusion of a mark for overlay error measurement, adjustment of the measurement condition and correction of the measurement result, adjustment of the environment, correction of the measurement result according to the environment, and adjustment of pattern defect inspection are performed.

Abstract: A quality management system is provided, having a first workstation including a first graphical user interface configured to display information regarding at least one process and a second workstation located remote from the first workstation and including a second graphical user interface configured to display information regarding the at least one process. The system may also include a computer-readable medium having stored thereon instructions for collecting and storing data from the at least one process. The computer-readable medium may also include instructions for displaying, on the first graphical user interface, information derived from the collected data in real-time with respect to the collection of the data. Further, computer-readable medium may include instructions for transferring the collected data, or the information derived from the collected data, to the second workstation and displaying, on the second graphical user interface, the information derived from the collected data.

Abstract: Methods and systems for evaluating a permanent magnet motor are provided. The method includes the steps of spinning a rotor of the permanent magnet motor; determining a total harmonic distortion of the permanent magnet motor; and comparing the determined total harmonic distortion of the permanent magnet motor with a baseline total harmonic distortion.

Abstract: Disclosed are a method and a device for inspection of drugs concealed in liquid articles without opening the outer packages. The method comprises the steps of: emitting radiation beams to transmit through the liquid article; receiving the radiation beams transmitted through the liquid article to get multi-angle projection data; inversely operating the multi-angle projection data based on the uniformity of the liquid article to obtain an attribute value of the inspected liquid article; retrieving a reference attribute value in a pre-created database by using the identification information of the liquid article as an index, and calculating a difference between the calculated attribute value and the reference attribute value; and determining whether the difference is larger than a predefined threshold value; wherein it is concluded that there are drugs concealed in the liquid article when the difference is determined to be larger than the predefined threshold value.

Abstract: A judgment section (200) judges the presence or absence of a specific event-related potential in an event-related potential of user's (50) electroencephalogram measured by a biological signal detection section (101). A judgment standard storage section (203) stores a plurality of judgment standards according to the number of occurrences of the specific event-related potential. A user's state judging section (201) obtains the number of occurrences of the specific event-related potential by referring to a judgment result storage section (20) and selects any of the judgment standards in the judgment standard storage section (203) according to the obtained number of occurrences thereof for judgment.

Abstract: A method of predicting the lifetime reliability of an integrated circuit device with respect to one or more failure mechanisms includes breaking down the integrated circuit device into structures; breaking down each structure into elements and devices; evaluating each device to determine whether the device is vulnerable to the failure mechanisms and eliminating devices determined not to be vulnerable; estimating, for each determined vulnerable device, the impact of a failure of the device on the functionality of the specific element associated therewith, and classifying the failure into a fatal failure or a non-fatal failure, wherein a fatal failure causes the element employing the given device to fail; determining, for those devices whose failures are fatal, an effective stress degree and/or time; determining one or more of a failure rate and a probability of fatal failure for the devices, and aggregating the same across the structures and the failure mechanisms.

Abstract: Operations in a livestock facility can be automated and made more efficient by utilizing an interrogator system that reads and writes data to tags associated with livestock. For instance, gates can be automated to sort livestock based on data read by interrogators from tags and livestock can be identified for examination when data suggest that their behavior deviates from expected or normal behavior. The tag associated with a livestock can carry and accumulate information across multiple facilities throughout the livestock production and processing cycle. Gathering information across facilities allows for more informed decision making and a more cooperative approach to improving the livestock production and processing cycle.

Abstract: Disclosed is a method and system for wafer/probe testing of integrated circuit devices after manufacture. The invention begins by testing an initial group of devices (e.g., integrated circuit chips) to produce an initial failing group of devices that failed the testing. The devices in the initial failing group are identified by type of failure. Then, the invention retests the devices in the initial failing group to identify a retested passing group of devices that passed the retesting. Next, the invention analyzes the devices in the retested passing group which allows the invention to produce statistics regarding the likelihood that a failing device that failed the initial testing will pass the retesting according to the type of failure. Then, the invention evaluates these statistics to determine which types of failures have retest passing rates above a predetermined threshold.

Abstract: A method includes receiving a first set of parameters associated with a particular die. A health metric for a particular die is determined using a multivariate analysis of the first set of parameters. The health metric incorporates at least one performance metric. At least one of a market segment designator or a testing plan associated with the particular die is determined based on the health metric.

Abstract: A method of fault detection and classification in semiconductor manufacturing is provided. In the method, delicate variations of actual data of parameters for which normal values of a manufacturing condition change according to time are detected very precisely and sensitively, and accordingly major variation components for a step which has a high occurrence occupancy are acquired to achieve a very precise and effective fault detection and classification (FDC). In the method, continuous steps in a process are regarded as separate processes which are not related to each other and covariance and covariance inverse matrixes acquired for each step are set as references to decrease values of variance or covariance compared with those for a case where references are calculated based on total steps. Accordingly, Hotelling's T-square values for a small variation are increased, so that a delicate variation can be sensitively detected.

Abstract: Apparatuses and method capable of reliably tracking processes through which products have passed without calling for expensive setup are necessary in production and distribution processes of the products. A process management apparatus including a data transmission/reception unit to and from an RFID tag of an information recording medium and a data generation unit comprises a process data generation unit for representing a process, a process pass certificate data generation unit for generating process data pass certificate data and a transmission/reception unit for the process data with the information recording medium and the process pass certificate data can track the processes through which the object products have passed.

Abstract: Methods of characterizing a mechanical stress level in a stressed layer of a transistor and a mechanical stress characterizing test structure are disclosed. In one embodiment, the test structure includes a first test transistor including a first stress level; and at least one second test transistor having a substantially different second stress level. A testing circuit can then be used to characterize the mechanical stress level by comparing performance of the first test transistor and the at least one second test transistor. The type of test structure depends on the integration scheme used. In one embodiment, at least one second test transistor is provided with a substantially neutral stress level and/or an opposite stress level from the first stress level. The substantially neutral stress level may be provided by either rotating the transistor, removing the stressed layer causing the stress level or de-stressing the stressed layer causing the stress layer.

Abstract: The invention relates to a method for detecting defects on the back side of a semiconductor wafer. The brightness distribution of the color values is essentially a normal distribution. An average value and surroundings can be defined using the determined normal distribution, which are criteria for the occurrence of a defect.

Abstract: An apparatus for illuminating a light valve (34) comprises at least one laser array (10) capable of emitting a plurality of radiation beams (40a, 40b, 40c), each radiation beam propagating along a first axis. A light pipe (20) comprises at least two reflecting surfaces being spaced apart and opposing each other to reflect light along the first axis. An input end (24) separation between the two planar reflecting surfaces (22) is positioned to receive the plurality of radiation beams. An output end (26) separation between the two reflecting surfaces is positioned to emit an output radiation (42b). At least one optical element is located downstream of the output end separation and is operable for illuminating the light valve by imaging a portion of the output radiation onto the light valve. A random phase mask (150) is operable for creating a substantially uniform illumination profile in the output radiation.

Abstract: In a defect inspection apparatus, a first lighting part applies polarized light to an inspection region on a substrate, reflected light reflected on the inspection region is received by a first spectrometer in a first light receiving part, and a phase difference spectrum representing a reflection property of the reflected light is transmitted to an inspection part of a control part. In the control part, an inspection wavelength and a threshold value determined based on theoretical calculation according to a type of defects to be detected are stored in a memory in advance, and a group of defects in a plurality of recessed portions formed in the inspection region are detected based on the threshold value and a phase difference in an inspection wavelength obtained from the phase difference spectrum. Thus, it is possible to detect a defect in a small recessed portion on the substrate with high accuracy.

Abstract: The invention relates to a method and a device for monitoring the optical transmissibility of an observation window (2) for the spectroscopic analysis of the homogeneity of a mixture material in a mixing container. According to the method, a product-specific limit value for the spectroscopic data is stored in the analysis unit, which limit value must be undershot within a prespecified time. If the data does not fall below the limit value within that time, the analysis unit emits a signal which contains information to the effect that the observation window (3) is soiled to an unacceptable degree. The device comprises an analysis unit in which product-specific limit value for the spectroscopic data can be stored, a cleaning device for cleaning the observation window and a switching unit for activating the cleaning device. The analysis unit is suitable for emitting a signal if the limit value is not undershot during the mixing process within a prespecified time.

Abstract: There is provided a test apparatus for testing a device under test. The test apparatus includes a gradient adjusting section that separately adjusts a gradient of a rising edge of a signal under measurement which is output from the device under test and a gradient of a falling edge of the signal under measurement, a sampling section that samples the signal under measurement whose edge gradients are adjusted by the gradient adjusting section, and a judging section that judges whether the device under test passes or fails the test based on a result of the sampling performed by the sampling section.

Abstract: Apparatus for and a method of marking a web 10 advancing along a path includes a monitoring station 11 at which the web 10 is observed and including a signal generator arranged to produce an appropriate mark signal on detecting a location to be marked as well as the nature of the required mark. A tab applicator 20 is disposed downstream of the monitoring station for applying an adhesive tab 34 to the web in a timed relationship to the advancement of the web so as to adhere the tab 34 to the required location on the web. The tab applicator includes an online printer receiving a signal from the signal generator, whereby an applied tab may carry appropriate indicia for the location being marked.

Abstract: A changing point detection circuit is provided that detects timing of changing points at which a logic value of a signal under measurement changes and includes a multi-strobe circuit generating a logic value data string obtained by detecting a logic value of the signal under measurement according to a plurality of strobes, each strobe having a different phase; a changing point detecting section detecting in which strobe the logic value changes based on the logic value data string; an edge designation storage section storing in advance information concerning whether an edge-type of the changing point to be detected is a rising edge or a falling edge of the signal under measurement; a selecting section selecting the changing point corresponding to the edge-type stored by the edge designation storage section from among the changing points detected by the changing point detecting section; and a strobe place storage section storing information concerning which strobe the changing point selected by the selecting se

Abstract: A charged particle beam writing apparatus includes an input unit configured to input writing data for writing a plurality of cell patterns including at least one cell pattern in which an identifier is added to each of data defining the at least one cell pattern extending over at least two small regions in a plurality of small regions obtained by virtually dividing a writing region, an extraction unit configured to extract the at least one cell pattern to which the identifier is added from the plurality of cell patterns, an output unit configured to output an error result when only one cell pattern is extracted, and a writing unit configured to write the plurality of cell patterns by irradiating a target workpiece with a charged particle beam, based on the writing data for which the error result is not output.

Abstract: A method and apparatus for determining pore size distribution and/or the presence of at least one killer pore in at least a portion of a porous film deposited upon a substrate are disclosed herein. In one embodiment, there is provided a method for determining pore size distribution comprising: providing the substrate having the film deposited thereupon wherein the film comprises pores and wherein the pores have a first volume; exposing the film to an adsorbate at a temperature and a pressure sufficient to provide condensation of the adsorbate in pores and wherein the pores after the exposing step have a second volume; and measuring the difference between the first and the second volume using a volumetric technique; and calculating the pore size and pore volume using the change in the first and the second volume, the pressure, and a model that relates pressure to pore diameter.

Abstract: The invention concerns a method comprising an identification and an authentication phase including a theoretical identification of an object, a spectrophotometric analysis of the object, determining a marker used as standard, comparing data concerning said standard marker obtained during the spectrophotometric analysis with said specific data previously stored, calculating the correction to be brought to the analysis, detecting the presence, absence, intensity of the markers, determining the code authenticating the object and emitting a validation or alarm signal as the case may be.