Holding pad for transferring a wafer
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The features shown only in broken lines depict environmental subject matter only and form no part of the claimed design.
Claims
The ornamental design for a holding pad for transferring a wafer, as shown and described.
| D320361 | October 1, 1991 | Karasawa |
| 5310339 | May 10, 1994 | Ushikawa |
| D361752 | August 29, 1995 | Yamaga |
| 6095806 | August 1, 2000 | Suzuki et al. |
| 6099302 | August 8, 2000 | Hong et al. |
| 7100954 | September 5, 2006 | Klein et al. |
| D570308 | June 3, 2008 | Sato |
| D589474 | March 31, 2009 | Ogasawara et al. |
| D589912 | April 7, 2009 | Ogasawara et al. |
| 7644968 | January 12, 2010 | Hirooka et al. |
| D616394 | May 25, 2010 | Sato |
| D616395 | May 25, 2010 | Sato |
| D639755 | June 14, 2011 | Root et al. |
| D639757 | June 14, 2011 | Root et al. |
| D674366 | January 15, 2013 | Kajiwara |
| D674761 | January 22, 2013 | Iida et al. |
| 20020092815 | July 18, 2002 | Kim et al. |
Type: Grant
Filed: Jun 21, 2012
Date of Patent: Oct 22, 2013
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Hideyuki Osada (Miyagi)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/425,315