Elastic membrane for semiconductor wafer polishing apparatus
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The broken lines shown in the drawings represent portions of the elastic membrane for semiconductor wafer polishing apparatus that form no part of the claimed design. The dashed-dot-dashed lines represent the boundary lines of the claimed design.
All surfaces not shown form no part of the claimed design.
Claims
The ornamental design for an elastic membrane for semiconductor wafer polishing apparatus, as shown and described.
6659850 | December 9, 2003 | Korovin |
7357699 | April 15, 2008 | Togawa |
7402098 | July 22, 2008 | Severson |
D616390 | May 25, 2010 | Sato |
D633452 | March 1, 2011 | Namiki et al. |
D634719 | March 22, 2011 | Yasuda et al. |
D649126 | November 22, 2011 | Takahashi |
D684551 | June 18, 2013 | Nguyen |
8469776 | June 25, 2013 | Zuniga |
D686175 | July 16, 2013 | Gurary |
D686582 | July 23, 2013 | Krishnan |
D687790 | August 13, 2013 | Krishnan |
D687791 | August 13, 2013 | Krishnan |
D711330 | August 19, 2014 | Fukushima et al. |
8859070 | October 14, 2014 | Yasuda |
D729753 | May 19, 2015 | Fukushima et al. |
20010029158 | October 11, 2001 | Sasaki |
20040175951 | September 9, 2004 | Chen |
20080070479 | March 20, 2008 | Nabeya |
20090068934 | March 12, 2009 | Hong |
20090068935 | March 12, 2009 | Torii |
20090111362 | April 30, 2009 | Nabeya |
20090247057 | October 1, 2009 | Kobayashi |
20130316628 | November 28, 2013 | Jang |
301348233 | September 2010 | CN |
301445758 | January 2011 | CN |
D 138225 | December 2010 | TW |
D 139857 | April 2011 | TW |
D 146491 | April 2012 | TW |
Type: Grant
Filed: Apr 30, 2014
Date of Patent: Nov 8, 2016
Assignee: EBARA CORPORATION (Tokyo)
Inventors: Makoto Fukushima (Tokyo), Hozumi Yasuda (Tokyo), Keisuke Namiki (Tokyo), Osamu Nabeya (Tokyo), Shingo Togashi (Tokyo), Satoru Yamaki (Tokyo)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/489,477