Substrate for spectroscopic analysis

- HAMAMATSU PHOTONICS K.K.

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Description

FIG. 1 is a perspective view of a substrate for spectroscopic analysis of the present invention.

FIG. 2 is a front view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 3 is a back view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 4 is a top view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 5 is a bottom view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 6 is a left view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 7 is a right view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 8 is a sectional view taken along the line 8-8 of the substrate for spectroscopic analysis of FIG. 2.

FIG. 9 is a sectional view taken along the line 9-9 of the substrate for spectroscopic analysis of FIG. 2; and,

FIG. 10 is a perspective view without the cover part of the substrate for spectroscopic analysis of FIG. 1.

The broken line showing of the substrate for spectroscopic analysis is for the purpose of illustrating environmental structure and forms no part of the claimed design.

The dot-dash broken lines define the bounds of the claimed design and form no part thereof.

Claims

The ornamental design for a substrate for spectroscopic analysis, as shown and described.

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Patent History
Patent number: D888275
Type: Grant
Filed: May 7, 2018
Date of Patent: Jun 23, 2020
Assignee: HAMAMATSU PHOTONICS K.K. (Hamamatsu-shi, Shizuoka)
Inventors: Masashi Ito (Hamamatsu), Katsumi Shibayama (Hamamatsu), Kazuto Ofuji (Hamamatsu), Yoshihiro Maruyama (Hamamatsu), Mitsuhiro Ito (Hamamatsu)
Primary Examiner: Richard E Chilcot
Application Number: 29/646,727
Classifications