Retainer ring for chemical mechanical polishing device
Description
The broken lines in the figures depict portions of the retainer ring for chemical mechanical polishing device which form no part of the claimed design.
Claims
I claim the ornamental design for a retainer ring for chemical mechanical polishing device, as shown and described.
Referenced Cited
U.S. Patent Documents
Other references
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Patent History
Patent number: D940670
Type: Grant
Filed: Mar 23, 2020
Date of Patent: Jan 11, 2022
Assignee: WILLBE S&T CO., LTD. (Hwaseong-si)
Inventor: Jinwoo Kim (Seongnam-si)
Primary Examiner: Jack Reickel
Assistant Examiner: Michael A Kervin
Application Number: 29/728,917
Type: Grant
Filed: Mar 23, 2020
Date of Patent: Jan 11, 2022
Assignee: WILLBE S&T CO., LTD. (Hwaseong-si)
Inventor: Jinwoo Kim (Seongnam-si)
Primary Examiner: Jack Reickel
Assistant Examiner: Michael A Kervin
Application Number: 29/728,917
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)