Electrode cover for a plasma processing device

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Description

FIG. 1 is a front, bottom and right side perspective view of an electrode cover for a plasma processing device according to the design;

FIG. 2 is a rear, bottom and right side perspective view thereof;

FIG. 3 is a front view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a rear view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 3;

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 9;

FIG. 11 is an enlarged front, bottom and right side perspective view of a cross-sectional view taken along line 9-9 of FIG. 3; and,

FIG. 12 is an enlarged rear, bottom and right side perspective view of a cross-sectional view taken along line 9-9 of FIG. 3.

The broken lines show the boundary of enlarged portions and form no part of the claimed design.

Claims

The ornamental design for an electrode cover for a plasma processing device, as shown and described.

Referenced Cited
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Foreign Patent Documents
D1598998 May 2018 JP
Other references
  • 4″ Storz Pressure Gasket. Online, published date unknown. Retrieved on Feb. 20, 2022 from URL: https://www.firehosedirect.com/4-storz-pressure-gasket.
Patent History
Patent number: D954986
Type: Grant
Filed: Apr 16, 2020
Date of Patent: Jun 14, 2022
Assignee: Hitachi High-Tech Corporation (Tokyo)
Inventor: Shintarou Nakatani (Tokyo)
Primary Examiner: Omeed Agilee
Application Number: 29/731,604