Abstract: The present invention provides an electrostatic painting device with a transmission frequency adjustment device for automatically adjusting a transmission frequency in such a manner that a consumed current flowing in a high voltage booster circuit does not exceed a prescribed value.

Abstract: An installation for processing wafers with a plurality of fabrication units and a plurality of measurement units as well as a transport system for transporting the wafers, is described. A transport control unit, which detects a capacity utilization of the installation and saves a processing sequence of the wafers, is allocated to the transport system. As a function of these parameters, control instructions are generated in the transport control unit, and can be output to the transport system for controlling the wafer transport procedure.

Abstract: A semiconductor system includes a body defining a processing chamber, a holder disposed within the processing chamber to support the substrate, and a fluid injection assembly to facilitate sequential deposition of films. In one embodiment, the fluid injection assembly is coupled to the body and includes high-flow-velocity valves, a baffle plate, and a support. The support is connected between the valves and the baffle plate. In one embodiment the valves are coupled to the support through a W-seal to direct a flow of fluid into the processing chamber, with the flow of fluid having an original direction and a velocity associated therewith. The baffle plate is disposed in the flow path to disperse the flow of fluids in a plane extending transversely to the original direction. In this manner, the baffle plate varies the velocity of the flow of fluids.

Abstract: A coater for applying foamed coating material to a traveling textile substrate including a frame, a flush pan, an applicator having an open slot, a pivot shaft journaled in a pair of support arms that are pivotally mounted to the frame and piston-cylinder mechanisms to move the applicator between an operating position wherein the open slot is adjacent the traveling substrate and a flush position wherein the open slot is adjacent the flush pan by pivoting the support arms and rotating the pivot shaft. Foamed coating material is applied by supporting the traveling substrate between two spaced support elements, contacting the traveling substrate with a foam applicator, and forcing a metered amount of foamed material at least partially into the interstices of the textile substrate before the foamed coating material collapses. A metered amount of foamed coating material is applied onto or into a textile substrate regardless of textile substrate structure and regardless of the viscosity of the coating material.

Abstract: A method and system for producing a film (preferably a thin film with highly uniform or highly accurate custom graded thickness) on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source operated with time-varying flux distribution. In preferred embodiments, the source is operated with time-varying power applied thereto during each sweep of the substrate to achieve the time-varying flux distribution as a function of time. A user selects a source flux modulation recipe for achieving a predetermined desired thickness profile of the deposited film. The method relies on precise modulation of the deposition flux to which a substrate is exposed to provide a desired coating thickness distribution.

Abstract: A solid imaging printer for generating colorized three-dimensional models is disclosed. The solid imaging printer comprises a printerhead assembly having a plurality of compartments, wherein at least one of the compartments receives a model building material from an attached conduit, and each of at least three of the compartments retains a differently colored model building material for applying substantially to a surface of a model generated by the solid imaging printer. A controller for directing an application of the model building material and the differently colored model building materials for generating the model by a successive layering of the model building material and the differently colored model building materials.

Abstract: The present invention relates to methods and apparatus for the controlled placement of a shear-thinnable polymer composition into a moving web. The controlled placement is preferably performed by applying the polymer composition onto a surface of a moving web, shear thinning the composition and placing it into the web, and curing the polymer composition. A preferred apparatus includes one or more process heads that has mounted thereto a rigid knife blade for engagement with the moving web. The knife blade is movable vertically and rotationally. The process head is also movable horizontally along the path of the moving web. A plurality of macro and micro tension zones are established and are monitored for controlling the apparatus and process.

Abstract: A method for controlling spacer width in a semiconductor device is provided. A substrate having a gate formed thereon is provided. An insulative layer is formed over at least a portion of the substrate. The insulative layer covers the gate. The thickness of the insulative layer is measured. A portion of the insulative layer to be removed is determined based on the measured thickness of the insulative layer. The portion of the insulative layer is removed to define a spacer on the gate. A processing line for forming a spacer on a gate disposed on a substrate includes a deposition tool, a thickness metrology tool, and automatic process controller, and a spacer etch tool. The deposition tool is adapted to form an insulative layer over at least a portion of the substrate. The insulative layer covers the gate. The thickness metrology tool is adapted to measure the thickness of the insulative layer.

Abstract: Process gas supply/stop operations are intermittently performed. As the hydrophobic process progresses, the temperature of a gas contract portion of a wafer lowers. While the hydrophobic process stops, the temperature of the gas contact portion of the wafer rises to the original temperature. Thereafter, the hydrophobic process resumes. Thus, while the temperature of the gas contact portion of wafer is suppressed from largely lowering, the hydrophobic process can be performed. Thus, non-uniformity of the hydrophobic process on the front surface of the wafer is reduced.

Abstract: An adhesive applying apparatus having an adhesive applying nozzle (1), an elevation drive unit (B) for vertically moving the adhesive applying nozzle, a purging station (6) provided with a purging tape (5), a unit (10) for supporting a circuit board (4) and an X-Y direction drive unit (30) which moves the adhesive applying nozzle so as to position the adhesive applying nozzle in a specified position in a horizontal direction of the circuit board and the purging tape. The elevation drive unit is constructed so as to be able to selectively set the lowermost end position of the adhesive applying nozzle. Also, a control means (D) is provided for controlling the elevation drive unit with a command in order to set the lowermost end position of the adhesive applying nozzle, located in a position above the purging station, to a specified position.

Abstract: At least one control parameter such as power supplied to a plasma, process pressure, gas flow rate, and radio frequency bias power to a wafer is changed for an extremely short time as compared with an entire plasma processing time, to the extent that such a change does not affect the result of plasma processing on the wafer, to monitor a temporal change of a plasma state which occurs at the time of changing. A signal resulting from the monitoring method is used to control or diagnose the plasma processing, thereby making it possible to accomplish miniature etching works, high quality deposition, surface processing.

Abstract: The application of (for example, elongated strip-shaped) spots of adhesive paste to successive objects (such as paper or cardboard blanks which are to be converted into soft or hinged-lid packs for arrays of cigarettes) which are advanced stepwise below the nozzle or nozzles of one or more pasters at an adhesive-applying station is regulated by a control unit which receives signals denoting the speed of the conveyor for the objects and the position of the object at the adhesive-applying station. The control unit regulates the operation of the valve for each nozzle of the paster by taking into consideration the inertia of electrical and mechanical constituents of the paster. This ensures the application of spots having an optimum shape and an optimum position relative to the respective objects and containing predetermined quantities of adhesive.

Abstract: A system and method for detecting and preventing arcing in plasma processing systems. Arcing is detected and characterized by measuring and analyzing electrical signals from a circuit coupled to the plasma. After characterization, the electrical signals can then be correlated with arcing events occurring during a processing run. Information can be obtained regarding location, severity, and frequency of arcing events. The system and method better diagnose the causes of arcing and provide improved protection against undesirable arcing, which can cause damage to the system and the workpiece.

Abstract: A method, apparatus and system for controlling a rate of pressure change in a vacuum process chamber during pump down and vent up cycles of a vacuum process are provided. The method includes sensing the pressure in the process chamber, and then controlling the rate of pressure change to achieve a desired rate for a particular vacuum process. For a pump down cycle, the apparatus can include a control valve in flow communication with the process chamber and with an evacuation pump. For a vent up cycle, the apparatus can include a control valve in flow communication with the process chamber and with an inert gas supply. With either embodiment controllers can be programmed to adjust positions of the control valves based upon feedback from pressure sensors. The system can include multiple chambers each having an associated pump down and vent up control apparatus configured to match the rates of pressure change between chambers.

Abstract: In the invention, the atmosphere in a process chamber is conditioned using a primary pump, a secondary pump, speed control means for controlling the speed of the primary pump, and at least first gas analyzer means adapted for analyzing the extracted gases upstream from the primary pump and for producing first analysis signals. First signal processing means control the pumping speed as a function of the first analysis signals, so as to determine the variation in the pressure inside the process chamber during the transient stages of the treatment. In this way, deposits and turbulence are avoided in the process chamber, as are deposits in the pumping line, so that the secondary pump can be placed in the immediate vicinity of the process chamber.

Abstract: The present invention relates to methods and apparatus for the controlled placement of a shear-thinnable polymer composition into a moving web. The controlled placement is preferably performed by applying the polymer composition onto a surface of a moving web, shear thinning the composition and placing it into the web, and curing the polymer composition. A preferred apparatus includes one or more process heads that has mounted thereto a rigid knife blade for engagement with the moving web. The knife blade is movable vertically and rotationally. The process head is also movable horizontally along the path of the moving web. A plurality of macro and micro tension zones are established and are monitored for controlling the apparatus and process.

Abstract: A coating system selecting kinds of coating heads and operation sequences with no errors even when two or more kinds of coating heads are used in exchange in a single coating line. The coating system uses an automatic discriminating device which automatically discriminates at least kinds of a plurality of coating heads used in exchange in a single coating line, thereby discriminating the kind of the coating head which is set in the coating line.

Abstract: A photoresist coater has a rotatable chuck to support a substrate, a source of photoresist, a pivotable dispensing arm extendable over the chuck, and a nozzle at the end of the dispensing arm. The nozzle has an aperture with a dimension sufficiently small that photoresist directed therethrough forms an aerosol which is directed onto the substrate.

Abstract: A resist solution applying apparatus and a method of using the resist solution applying apparatus. The apparatus comprises a hold and rotate member that holds and rotates a member to be processed, a resist solution discharge nozzle that discharges a resist solution almost at a center of rotation of the member to be processed, a resist solution supply mechanism that supplies the resist solution to the resist solution discharge nozzle, and a discharge controller connected to the rest solution supply mechanism that controls a predetermined amount of the resist solution discharged from the resist solution discharge nozzle to be reduced gradually or in stages after discharge is started, and increased again before the discharge is stopped.

Abstract: Apparatuses and methods for use in vacuum vapor deposition coating provide for simpler, economical and continuous operation. A system and method for continuously melting and evaporating a solid material for forming a coating vapor includes the use of a separate melting crucible and evaporating crucible. A system and method for energizing the evaporative solids to form a plasma which includes first and second electrodes and a device for selectively switching polarity between the first and second electrodes to avoid coating vapor deposition on the electrodes. Another a system and method for energizing the evaporative solids to form a plasma which includes an electric arc discharge apparatus with a cathodic and an anodic part. A continuously fed electrode is disclosed for continuous vaporization of electrode members in an electric arc discharge. An apparatus and method provides for measurement of the rate of evaporation from an evaporator and the degree of ionization in a vapor deposition coating system.

Abstract: A method is provided for treating wafers on a low mass support. The method includes mounting a temperature sensor in proximity to the wafer, which is supported on the low mass support, such that the sensor is only loosely thermally coupled to the wafer. A temperature controller is programmed to critically tune the wafer temperature in a temperature ramp, though the controller directly controls the sensor temperature. A wafer treatment, such as epitaxial silicon deposition, is started before the sensor temperature has stabilized. Accordingly, significant time is saved for the treatment process, and wafer throughput improved.

Abstract: A semiconductor device is fabricated by the steps of coating an underlayer formed on a semiconductor substrate with chemically amplified resist, exposing the resist to light, bringing the resist into contact with an alkaline developing solution with applying a magnetic field to the alkaline developing solution for conducting development to form a resist pattern, and etching the underlayer on the semiconductor substrate using the resist pattern as a mask.

Abstract: A system and method is provided that facilitates the application of a uniform layer of developer material on a photoresist material layer. The system includes a multiple tip nozzle and a movement system that moves the nozzle to an operating position above a central region of a photoresist material layer located on a substrate, and applies a volume of developer as the nozzle scan moves across a predetermined path. The movement system moves the nozzle in two dimensions by providing an arm that has a first arm member that is pivotable about a first rotational axis and a second arm member that is pivotable about a second rotational axis or is movable along a translational axis. The system also provides a measurement system that measures the thickness uniformity of the developed photoresist material layer disposed on a test wafer. The thickness uniformity data is used to reconfigure the predetermined path of the nozzle as the developer is applied.

Abstract: An apparatus for preparing an organic EL device includes a substrate (1) and an evaporation source (2) in an evaporation chamber. The evaporation source (2) has a container (2) made of an insulator with a thermal conductivity of at least 50 W/m·k and receiving a source material therein and a surrounding resistance heater (3). When the source material is heated and evaporated from the source onto the substrate, a detector (5) detects the rate of evaporation of the source material on the substrate and delivers a detection signal to a control unit (6), which controls the heater (3) in accordance with the signal.

Abstract: The present invention discloses an apparatus for regulating chamber pressure in a process chamber by a closed-loop control method utilizing a pressure sensor, a pressure controller and an inverter for regulating the rotational speed of an exhaust blower such that the exhaust pressure in a factory exhaust conduit can be substantially controlled at a constant value. The present invention novel method and apparatus allows a more stable chamber pressure to be maintained in an APCVD or LPCVD chamber, while substantially reduces the possibility of particulate contamination on a throttle valve that is mounted juxtaposed to the process chamber and thus minimizing any back-fill contamination problems.

Abstract: A liquid dispensing system has a number of cartridges, preferably two or four, selectively coupled to a single motor with a respective clutch for dispensing dots of liquid at high speed. The motor drives a spur gear that meshes with individual spur gears associated with each of the clutches. Multiple cartridges are thus activated with a single motor and are housed together in one housing. Each cartridge is movable relative to the housing and is biased downward to a dispensing position with a spring. Air is selectively provided between the dispensers and the housing to drive the cartridges upward to a non-dispensing position. When the air is not provided, the spring returns the cartridge to its downward position. By moving the cartridge relative to the housing, the assembly can dispense at different locations without it being necessary to move the entire pump assembly every time a dot is dispensed.

Abstract: A module of a host computer of a semiconductor fabrication management system receives from an operator a plurality of IDs assigned by the operator to each of the wafers, respectively, received in the slots of a wafer cassette. The module searches a database of the host computer to correlate each received wafer ID with a process step ID, and the process step ID with a process program ID (PPID). Process condition data is formulated from the correlated process step IDs and PPIDs. At this point, the semiconductor fabrication management system is used to determine whether the operator has inputted a track-in signal to the system. If the track-in signal has been inputted, the processing condition data is downloaded to a server of the semiconductor processing equipment. The downloaded process condition data is used to change, if necessary, an equipment control message stored in the server.

Abstract: A paint spray apparatus includes a plurality of paint sprayers installed in a paint spray booth. Each paint sprayer includes a paint spray head pivotably mounted on the end of a movable paint spray arm. The paint spray arm and paint spray head are movable on multiple axes by servo motors, which are controlled by servo drives mounted on or beside the paint sprayer. The spray of the paint spray head is controlled by a plurality of proportional solenoid valves mounted on the paint sprayer. The movement and spray of the paint sprayers are controlled by a computer having an interface to an optical fiber. The optical fiber connects the computer to the servo drives in series in a token ring network.

Abstract: Apparatus for coating a surface of a semiconductor wafer includes at least one treatment module, a handling device that may access each of the treatment modules, and a host controller connected to the handling device and to each of the treatment modules. The treatment modules may include a coating assembly for coating the semiconductor wafer surface and may also include at least one thermal conditioning module. The host controller may control the handling device to move a semiconductor wafer relative to the treatment modules. The treatment modules may be disposed within opposing assemblies and may be removed from the assemblies without disabling the treatment modules remaining within the opposing assemblies.

Abstract: A thin-film depositing apparatus of the present invention deposits a sputtered film on a substrate in a sputtering chamber, and removes the substrate having the sputtered film deposited thereon from the sputtering chamber via a load-lock chamber by a robot arm. As a system for controlling the sheet resistance of the sputtered film deposited on the substrate, a measuring device using an eddy current method is mounted in the proximity of a substrate outlet of the load-lock chamber and measures the sheet resistance of the sputtered film of the substrate removed from the substrate outlet. With this structure, it is possible to provide a thin-film depositing apparatus which stably measures the sheet resistance of a thin film deposited on a substrate and performs feedback of the measurement result to control the film deposition conditions so that a thin film to be deposited on a subsequent substrate has a desired thickness.

Abstract: A battery tester device that may be integrated into a label of battery. The battery tester device includes first dielectric layer, a conductive layer adjacent the first dielectric layer, a temperature sensitive indicator layer in thermal contact with the conductive layer, and thermal insulation adjacent the conductive layer. The thermal insulation includes a second dielectric layer and thermally insulative material combined with the second dielectric layer for enhancing the structural strength of the second dielectric layer.

Abstract: A liquid dispensing system has a number of cartridges, preferably two or four, selectively coupled to a single motor with a respective clutch for dispensing dots of liquid at high speed. The motor drives a spur gear that meshes with individual spur gears associated with each of the clutches. Multiple cartridges are thus activated with a single motor and are housed together in one housing. Each cartridge is movable relative to the housing and is biased downward to a dispensing position with a spring. Air is selectively provided between the dispensers and the housing to drive the cartridges upward to a non-dispensing position. When the air is not provided, the spring returns the cartridge to its downward position. By moving the cartridge relative to the housing, the assembly can dispense at different locations without it being necessary to move the entire pump assembly every time a dot is dispensed.

Abstract: An apparatus and method for controlling the opening of a solenoid actuated valve in a sealant dispensing gun are disclosed. A proximity sensor is provided adjacent a portion of the needle valve stem in order to sense when the needle valve has reached its open position. A dispense timer is initiated when the proximity sensor indicates that the needle valve has reached its open position. In this manner, the needle valve may be maintained in its open position for the desired dispense time only without regard to the response time of the solenoid device. Also disclosed is an apparatus and method for adjusting the valve open limit of a sealant dispensing device which incorporates a solenoid or motor actuated valve open limit device. A flow sensor is located in-line with the sealant supply path of a dispensing gun in order to monitor the dispense weight during each valve open cycle. A moving average of the dispense rates may then be calculated and compared to predetermined limits.

Abstract: A bitumen-based waterproofing membrane is provided with an improved edge for sealing with a contiguous membrane to provide a membrane system with improved waterproofing characteristics. A bitumen-based reinforced membrane sheet is coated with granular material to protect the membrane sheet from ultraviolet rays. However, a section of the membrane sheet is first covered with a piece of protective tape which prevents any granular material from being deposited on the lateral section of exposed bitumen beneath the tape. The membrane sheets are then cut immediately prior to the tape or at the edge of the granular coating and then rolled up. Accordingly, the lateral section of bitumen which is covered by the protective tape is on the innermost part of the rolled-up membrane sheet. During installation, the tape is removed and the exposed bitumen or selvage section is disposed below an adjacent or contiguous membrane. Heat is then applied for an easy and effective seal between two adjacent membrane sheets.

Abstract: The present invention relates to methods and apparatus for the controlled placement of a shear-thinnable polymer composition into a moving web. The controlled placement is preferably performed by applying the polymer composition onto a surface of a moving web, shear thinning the composition and placing it into the web, and curing the polymer composition. A preferred apparatus includes one or more process heads that has mounted thereto a rigid knife blade for engagement with the moving web. The knife blade is movable vertically and rotationally. The process head is also movable horizontally along the path of the moving web. A plurality of macro and micro tension zones are established and are monitored for controlling the apparatus and process.

Abstract: A vacuum processing apparatus includes a process chamber capable of being evacuated and a gas quantity detector for outputting a gas quantity signal corresponding to a partial pressure of each kind of gas contained in the process chamber. The gas quantity detector has a detection sensitivity set in response to a sensitivity calibration signal externally supplied and generates the gas quantity signal at the set detection sensitivity. A controller receives the gas quantity signal output from the gas quantity detector and outputs the sensitivity calibration signal to the gas quantity detector so that a magnitude of the gas quantity signal for one reference gas selected from gasses contained in the process gas becomes near a target value. Vacuum processing techniques are provided for stably detecting the content of impurity gas by calibrating the sensitivity of the gas quantity detector.

Abstract: A plant for preparing and feeding a coating composition to a coating head for paper or the like includes a plurality of hoppers, each hopper being intended to receive and deliver one ingredient of the composition. The plant further includes a premixer tank which is fed by the hoppers and mixes and homogenizes the formed composition and a homogenizing tank, fed by the premixer tank, having a high-speed stirrer for shearing the composition. A buffer capacity is directly and continuously fed by the homogenizing tank and connected to the coating head, wherein the buffer capacity preferably has a volume and an attached level detector for determining when the composition in the buffer capacity is below a predetermined level. A set of controllers attached to the level detector control the delivery of components from the plurality of hoppers.

Abstract: The present invention provides an electrostatic spraying device which includes a primary charge return path between the device and the target to be sprayed and circuitry for warning the operator of potentially hazardous spraying conditions. More particularly, the present invention includes circuitry for warning the operator of conditions wherein the primary charge path is inadequate and other conditions in which the return of spray current via the primary charge path is affected.

Abstract: The detrimental effects of fluctuating humidity are neutralized by adjusting the viscosity of a waterborne coating as it is being conducted to the spraying device. A predetermined amount of water or other viscosity modifying additive is mixed continuously with the coating in the coating supply line immediately upstream from the spray device. The amount of water or other additive to be added may be determined by monitoring the humidity in the spray zone. Preferably, an automated feedback control system is employed to adjust the amount of water or other viscosity altering additive being mixed into the coating stream.

Abstract: In the present invention, a waste solution and a exhaust gas are guided together from a drain cup DC into a storing means through common discharge means. Naturally, the gas-liquid separation is performed within the storing means in place of performing the gas-liquid separation within the drain cup DC. Therefore, the waste solution is not solidified within the drain cup so as to plug the common discharge means. Also, a predetermined waste solution is kept stored in the storing means included in the coating apparatus of the present invention, making it possible to permit the surface of the stored waste solution to absorb the mist, and the waste solution is prevented from being solidified within the storing means. Further, since a minimum amount of the exhaust gas is kept discharged even during non-operation of the coating apparatus by using an exhaust gas damper whose degree of opening can be controlled, the waste solution stored in the storing means is prevented from being solidified.

Abstract: The invention provides an apparatus for treating a substrate with resist, comprising a spin chuck for horizontally holding a substrate, a first motor for variably rotating the spin chuck, a nozzle for applying resist solution onto the upper surface of the substrate held on the spin chuck, a cup having an upper opening through which the substrate is put in or taken out of the cup and a lower opening through which extends the driving shaft of the spin chuck, the cup positioned to surround the substrate held on the spin chuck to receive liquid centrifugally separated from the substrate which is rotated about its axis, a lid to close the upper opening of the cup to define a space around the substrate, a second motor for variably rotating the cup independently of the spin chuck rotation, a liftable cylinder for relatively moving at least one of the spin chuck and cup, which are positioned apart from each other, toward each other to achieve mutual contact, and an O-ring for hermetically sealing the mutual contact p

Abstract: A semiconductor fabrication apparatus having a process chamber and a handler which is provided for loading wafers into the process chamber or unloading wafers therefrom, comprising a plurality of switches for detecting positions of the handler and for generating detection signals in accordance with the positions; and an indicator for indicating normal operations of the switches. The indicator has relays operated in accordance with a voltage level of each of the detection signals; and LEDs associated with each of the relays, for identifying a normal operation of the handler. By confirming the conductive/nonconductive state of the LED, the operator can easily determine if the switches are accurately detecting the position of a load fork and/or an aligning plate.

Abstract: The present invention pertains to a treating device 1, especially a rotating transverse gluing mechanism for high-speed, register mark-related paper or film webs 2. The movements of the transverse gluing mechanism 1 are synchronized with the web 2, and the transverse gluing mechanism has an independent synchronous drive 6 with a drive motor 7 and a regulating unit for this purpose. The electronic regulating unit compensates variations in the synchronism of the running web 2.

Abstract: A paint spray apparatus includes a plurality of paint sprayers installed in a paint spray booth. Each paint sprayer includes a paint spray head pivotably mounted on the end of a movable paint spray arm. The paint spray arm and paint spray head are movable on multiple axes by servo motors, which are controlled by servo drives mounted on or beside the paint sprayer. The spray of the paint spray head is controlled by a plurality of proportional solenoid valves mounted on the paint sprayer. The movement and spray of the paint sprayers are controlled by a computer having an interface to an optical fiber. The optical fiber connects the computer to the servo drives in series in a token ring network.

Abstract: A device and the related process for the continuous, warm smearing of a thin, hotmelt adhesive layer onto a plastic film (8) to be coupled with a paper support, comprising a blade (1) dosing device for the hotmelt adhesive, with means for adjusting the width of the adhesive strip to be applied as well as the thickness of the same; also comprising a further device for applying the adhesive onto said plastic film, mainly consisting of coupled dispensing roller means (2) and pushing roller means (3); sensor means (5) for bearing and adjusting the detachment position from the dispensing roller means (2) of the smeared film (8), and a device for further spreading and leveling of the film (8) consisting of the coupling of the spreading roller means (4) with pushing roller means (3), wherein the spreading roller means (4) may be possibly artificially cooled down.

Abstract: A liquid dispensing system has a number of cartridges, preferably two or four, selectively coupled to a single motor with a respective clutch for dispensing dots of liquid at high speed. The motor drives a spur gear that meshes with individual spur gears associated with each of the clutches. Multiple cartridges are thus activated with a single motor and are housed together in one housing. Each cartridge is movable relative to the housing and is biased downward to a dispensing position with a spring. Air is selectively provided between the dispensers and the housing to drive the cartridges upward to a non-dispensing position. When the air is not provided, the spring returns the cartridge to its downward position. By moving the cartridge relative to the housing, the assembly can dispense at different locations without it being necessary to move the entire pump assembly every time a dot is dispensed.

Abstract: An apparatus is provided for coating a surface of a plate-like material, or substrate, specifically a semiconductor wafer, with a coating material. The apparatus includes a plurality of self-controlled removable modules including a coating assembly, at least one thermal conditioning module, and a substrate handling device, and a host controller. The coating assembly is used to dispense coating material from a coating source onto the surface of the substrate material positioned in the coating assembly. The material handling device is positioned to access and move substrates between the coating assembly, the at least one thermal conditioning module and other modules included in the apparatus. The host controller provides substrate thermal conditioning, coating and handling information to the corresponding modules and tracks the location of each substrate in the apparatus.

Abstract: A powder spray coating device which includes an injector air flow controller having two alternate air flow paths for delivering feed air to an injector which delivers powder to a spray device. Optionally, the air flow controller also may have two alternate air flow paths for delivering supplemental air to the injector or downstream from the injector. In a first setting of a mode selector, feed air is delivered through a manually adjusted air valve and in a second setting of the mode selector the feed air is delivered through an automatically adjusted air valve. When supplemental air is provided, the supplemental air passes through a manually adjusted air valve in the first mode selector setting and through an automatically adjusted air valve in the second mode selector setting. A controller may detect articles to be coated and set the automatically adjusted feed air and supplemental air valves.

Abstract: In a duplex type coating apparatus, a left-right pair of dies and are disposed on opposite sides of a carrying path of a web, the dies and are each made up of an upper member and a lower member, a tip part of the lower member projects further toward the carrying path than a tip part of the upper member, and coating liquid discharge passages are inclined in the direction of the carrying path of the web. As a result, because the same amount of coating liquid is discharged from each of the dies and coated onto each side of the web, it is possible to carry out coating at the same coating thickness and in the same position on both sides of the web.

Abstract: A cup with a top opening is disposed in an open-air space, and an atmospheric pressure sensor is disposed externally to the cup. A CPU calculates a control value which compensates for a variation in the thickness of a coating film which is formed on a surface of a substrate, based on an atmospheric pressure value which is measured by the atmospheric pressure sensor. An air-conditioner is controlled in accordance with the control value, whereby the temperature and the humidity of clean air which is supplied around the cup are adjusted and the variation in the thickness of the coating film is prevented without laborious work.