Abstract: A plasma processing device comprising a gas injection system is described, wherein the gas injection system comprises a gas injection assembly body, a consumable gas inject plate coupled to the gas injection assembly body, and a pressure sensor coupled to a gas injection plenum formed by the gas injection system body and the consumable gas inject plate. The gas injection system is configured to receive a process gas from at least one mass flow controller and distribute the process gas to the processing region within the plasma processing device, and the pressure sensor is configured to measure a gas injection pressure within the gas injection plenum. A controller, coupled to the pressure sensor, is configured to receive a signal from the pressure sensor and to determine a state of the consumable gas inject plate based upon the signal.

Abstract: In an ink jet apparatus for manufacturing a color filter 1, ink jet heads 22 having a plurality of nozzle 27 are disposed in a linear manner. Filter element member is ejected to a motherboard 12 from a plurality of nozzles 27 four times so as to form the filter element 3 in a predetermined thickness. By doing this, it is possible to prevent difference in the thickness in a plurality of the filter elements 3 and to equalize light transparency in planar manner. Thus, in an ejecting apparatus, a color filter can be formed in more common way at low cost and more efficiently. Also, it is possible to provide an ejecting apparatus which can equalize factors such as electrooptical characteristics of the electrooptical members, color displaying characteristics by the liquid crystal apparatuses, and illuminating characteristics by an EL surface.

Abstract: The invention provides an apparatus for coating a device comprising a coating chamber and a device rotator having at least one device mount wherein the apparatus allows insertion and retraction of the device on the device mount into and out of the coating chamber. In another aspect, the invention provides a method of applying a substantially uniform coating on a device comprising the steps of providing an apparatus for coating a device, mounting the device onto the device mount, purging the coating chamber to reduce humidity in the coating chamber, maintaining a reduced humidity content in the coating chamber, inserting the device into the coating chamber, disposing a coating material on the device and rotating the device mounts about the device axis.

Abstract: Embodiments of the present invention are directed to a rotary sauce dispensing apparatus for applying a sauce on a receiving surface such as a pizza dough. In one embodiment, an apparatus for dispensing a sauce on a receiving surface comprises a rotating table configured to support and rotate the receiving surface thereon around an axis generally perpendicular to the receiving surface for receiving the sauce. A sauce dispensing member has a dispensing outlet disposed above the rotating table to dispense the sauce on the receiving surface disposed on the rotating table. The sauce dispensing member is movable between an edge position above an outer edge of the receiving surface and a center position above a center of the receiving surface. A controller is coupled with the sauce dispensing member and configured to control a speed of movement of the sauce dispensing member between the edge position and the center position to form a layer of sauce on the receiving surface.

Abstract: A controller for a moisture adjusting device of the present invention reads out a target moisture content set in advance in a data table in accordance with a type of a planographic printing plate; determines, every predetermined control period, a moisture content of an overcoat layer (measured moisture content) based on a measured signal SW; and calculates a difference (deviation) between the measured moisture content and the target moisture content. For example, if the measured moisture content of the overcoat layer is lower than the target moisture content, the controller sets an adjusted moisture content which is higher than the measured moisture content and controls the humidity and the temperature within a humidity conditioning zone so that an interposing paper web (protective sheet material) attains the adjusted moisture content within the humidity conditioning zone.

Abstract: In the fabrication of semiconductor integrated circuits, a ventilation system is disclosed which includes a sleeve device, a ventilator and a sensor. The sleeve device has at least one aperture thereon for gas transfer. The ventilator is coupled to the sleeve device. The sensor is coupled to the sleeve device. A method of ventilation is also disclosed, which includes a step of sensing a relative movement between a sleeve having at least aperture for gas transfer and a gas outlet connected to a pipeline, and a step of generating a signal to control a ventilator when the relative movement between the sleeve and the gas outlet is sensed.

Abstract: Two axially parallel rolls are pressed against each other in a device for producing and/or treating a moving material web. Sensor elements are arranged in the force transmission path running from the force-producing elements via the rolls, outside roll bodies of the two rolls. As a result of displacing the sensor elements out of the roll bodies of the rolls, the production of the rolls is less complicated and less expensive. No sensors have to be embedded in the roll bodies, which opens up the possibility of using standard rolls. In addition, the occasional grinding of the rolls can in this way be performed without any regard to the sensor elements. Nevertheless, the pressure prevailing between the rolls can continue to be measured directly, since the sensor elements are arranged in the transmission path of the pressing force.

Abstract: A substrate processing system that includes a deposition chamber having a reaction zone, a substrate holder that positions a substrate in the reaction zone, a gas distribution system that includes a gas inlet manifold for supplying one or more process gases to said reaction zone, a plasma power source for forming a plasma from a process gas introduced into the reaction zone of the deposition chamber and an impedance monitor that is electrically coupled to the deposition chamber to measure an impedance level of the plasma. In a preferred embodiment, the substrate holder is a first electrode and the gas inlet manifold is a second electrode and RF power is supplied by the plasma power source to either the first or second electrodes to form the plasma.

Abstract: A mold manufacturing system includes confining environmentally controlled applying operations to but a few area or a single area. The process airflow generated therefrom includes a substantially constant low flow with a high concentration of HAPs which maintains an auto-fired oxidizer system to provide more efficient and less expensive operation thereof.

Abstract: An apparatus and method for simultaneously coating and measuring a part. The apparatus includes a part support, a sprayer and a part measurer positioned adjacent to the part support and a display device positioned adjacent to the part support. The sprayer applies a coating to a section of the part while the part measurer continuously measures a dimension of the section of the part being coated. In one embodiment, an initial amount of coating and a final amount of coating are applied to the section of the part based on the dimension measurements and desired dimension of the part. In another embodiment, the amount of coating applied to the part is based on the desired coating thickness. As a result, the apparatus and method of the present invention significantly reduces the margin of error related to the application of coatings to parts.

Abstract: In drying a coating liquid such as a resist applied to a substrate under reduced pressure, a coating film in a peripheral portion tends to lose good shape regardless of duration of a drying period, and it is difficult to set an appropriate exhaust flow rate. After the substrate is loaded in an airtight container, a pressure is reduced from atmospheric pressure to a pressure slightly higher than the vapor pressure of a solvent, for example. Then, the solvent actively evaporates from the coating liquid. Here, evacuation is performed initially based on a first flow rate set value Q1, and thereafter, it is performed based on a second flow rate set value larger than Q1. Rounding of the surface in the peripheral portion is corrected by evacuation based on Q1, and more active evaporation of a solvent component is attained by switching to Q2.

Abstract: In a method of monitoring the formation of a coating on a single particle (P), an apparatus is used which comprises means (2,5,6,9) for arranging said particle (P) at a given spatial location, and a fluid supply unit (3) adapted to apply a coating fluid to the particle (P) such that the coating is formed. Further, the apparatus has a measurement unit (4) which is adapted to perform a spectrometric measurement on the coating during formation thereof, and to derive a measurement value of at least one principle parameter related to the coating. This, such principle parameters, for example the thickness, thickness growth rate and physical and/or chemical properties related to the quality of the coating, as well as heat, mass and momentum transfer, can be continuously and non-invasively monitored during the coating process on the single particle (P).

Abstract: An X-ray fluorescence spectrometric system includes a sample pre-treatment apparatus 10 for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, an X-ray fluorescence spectrometer 40, and a transport apparatus 50 for transporting the substrate from the sample pre-treatment apparatus towards the X-ray fluorescence spectrometer, which system as a whole is easy to operate. This spectrometric system also includes a control apparatus 50 for controlling the sample pre-treatment apparatus 10, the X-ray fluorescence spectrometer 40 and the transport apparatus 50 in a totalized fashion.

Abstract: Coating an insulating film on a substrate, heating the substrate at a pressure higher than an atmospheric pressure in a chamber, followed by the curing process performed at a pressure lower than the atmospheric pressure in a separate chamber. With this process, the desorption of the porogen from the insulating film during heating can be restrained therefore an insulating film of high quality can be formed.

Abstract: A dual-port endpoint detection window for a process chamber for substrates. The dual-port endpoint detection window of the present invention comprises a primary port and a secondary port each of which may be individually removably fitted with a light sensor for the endpoint detection system. A cover is provided for removably covering the secondary port. After the window of the primary port has become covered with material deposition as a result of prolonged use of the process chamber, the secondary port is uncovered for use and the light sensor is attached to the secondary port for continued use of the endpoint detection system through the secondary port.

Abstract: The invention relates to a device for the regulation of a plasma impedance in a vacuum chamber, wherein at least one electrode is connected to an AC generator. This AC generator is a free-running [oscillator], whose frequency adjusts to the resonance frequency of the load upon which it acts. This load comprises fixed circuit elements and a variable plasma impedance. If the plasma impedance is changed, with it the resonance frequency is also changed. The plasma impedance can thus be varied by acquisition of the resonance frequency and by presetting of a reference frequency value, for example thereby that the voltage, the current, the power or the gas inflow is varied as a function of the difference between resonance frequency and reference frequency value.

Abstract: A controller for a moisture adjusting device of the present invention reads out a target moisture content set in advance in a data table in accordance with a type of a planographic printing plate; determines, every predetermined control period, a moisture content of an overcoat layer (measured moisture content) based on a measured signal SW; and calculates a difference (deviation) between the measured moisture content and the target moisture content. For example, if the measured moisture content of the overcoat layer is lower than the target moisture content, the controller sets an adjusted moisture content which is higher than the measured moisture content and controls the humidity and the temperature within a humidity conditioning zone so that an interposing paper web (protective sheet material) attains the adjusted moisture content within the humidity conditioning zone.

Abstract: Real-time analysis and control of a semiconductor silicidation process. The architecture includes system and methods for monitor and control of a silicidation process during rapid thermal anneal. An FTIR system analyzes selected and/or random regions where silicidation is occurring, and signals the process control system to control the process according to the status of the analyzed silicide formations.

Abstract: An apparatus and method of color tuning a light emitting display are provided. The apparatus includes a source of a mixture of a compressed fluid solvent and an organic material. A discharge device is positioned in fluid communication with the source of the mixture of the compressed fluid and the organic material. A condition controlling device is positioned in fluid communication between the source and the discharge device. The method includes providing a substrate, providing a first addressing electrode on the substrate, controllably depositing an organic nanomorphic material over the first addressing electrode, and providing a second addressing electrode over the organic nanomorphic material.

Abstract: A liquid delivery system having safe unit includes: an injection valve connected to a chamber; a mass flow controller connected to the injection valve; an auxiliary valve connected between the injection valve and the mass flow controller; an auxiliary pump connected to the auxiliary valve; and a relay electrically connected to the auxiliary valve.

Abstract: A process solution applying apparatus comprising a substrate holding mechanism for holding a substrate, a process solution supplying system for applying process solution in a prescribed amount to the substrate held by the substrate holding mechanism, the process solution supplying system having a supplying mechanism for changing a rate at which the process solution is supplied, and a substrate rotating mechanism for rotating the substrate holding mechanism, thus rotating the substrate at a predetermined speed to spread the process solution by virtue of centrifugal force and to coat the substrate with the process solution.

Abstract: A liquid coating device and method for coating a coatable composition on a workpiece to form a coating, wherein a parameter indicative of barometric pressure is measured and at least one thickness-affecting process parameter is adjusted in order to compensate for the effects of variations in barometric pressure on coating thickness uniformity.

Abstract: A resin coating method for applying resin to a predetermined region of a wiring board includes the steps of imaging an external appearance of the resin extruded from a resin application device; and automatically adjusting an amount of the resin extruded from the resin application device based on the external appearance of the resin obtained in the imaging step.

Abstract: A semiconductor processing apparatus detecting sticking of a wafer includes a stage on which a wafer is mounted, a wafer lift pin for separating the wafer from the stage, a control device controlling a vibrator power supply and control unit to vibrate a vibrator, controlling a detector to detect a state of vibration, and detecting presence/absence of sticking between the wafer and the stage based on the state of vibration prior to raising of the wafer with the wafer lift pin, and an alarm device outputting an alarm when the sticking occurs.

Abstract: A machine for automatically applying lane dressing travels up and down the lane to apply dressing according to a certain predetermined and preselected pattern. A single dispensing head travels back and forth across the lane as the machine moves linearly along the lane so that dressing is transferred to a buffer brush that engages the lane surface and applies the dressing thereto. The oil pattern is determined by actuation and deactuation of the dispensing head as it traverses the lane, such control of the head being provided by a special pattern control device in the nature of a cylindrical pattern tube that extends alongside the path of travel of the dispensing head. A sensor on the dispensing head detects pattern structure on the control device to responsively actuate and deactuate the head. In a preferred form, such structure takes the form of a series of metallic strips extending parallel to the path of travel of the dispensing head and spaced circumferentially around the periphery of the pattern tube.

Abstract: A method of controlling a dissolution rate of a bioactive agent includes applying a first drop of solution carrying the bioactive agent at a first selected location on a delivery substrate, and positioning a second drop of solution carrying the bioactive agent at a second selected location on the delivery substrate, wherein the location of the first drop and the location of the second drop are selected based on a target dissolution rate.

Abstract: A laser processing apparatus comprises a laser oscillator for producing a laser beam to selectively remove part of a substrate to be processed, a scanning system for applying the laser beam to an arbitrary position of the substrate and incident means for applying the laser beam to the substrate substantially at right angle.

Abstract: The disclosed methods and systems for inspecting and repairing vessels include a laser used to project a laser beam into a hot furnace or vessel, a laser reader to measure a point cloud formed when the laser light reflects from the wall of the furnace, means for selecting those points in the cloud that are more relevant, and using the points to produce a 3D image that corresponds to the geometry of the interior of the furnace or vessel. The disclosed systems and methods further include means for comparing the 3D geometric data corresponding to the interior of the vessel with 3D geometric data provided as a reference, generating a 3D repair trace based on the comparison, and controlling a spray gun for applying refractory material according to the trace by taking into account a set of physical variables related to the vessel and the refractory material.

Abstract: Method for determining the position of an edge surface of e.g., boardlike objects (11) arranged in a pile (12) and for marking the objects by means of a print head, in which method the height of the edge surface and/or its position in space is measured by means of a measuring element, in which the actual deviation of the edge surface (13) from a theoretical basic plane is determined by measuring the spatial coordinates of the edge surface and the movements of the print head are controlled using the information thus determined so that its distance from the marking point remains at a desired or a substantially constant value.

Abstract: A coating apparatus and method are disclosed in which even if poor coating occurs in a lower-layer, no poor coating occurs in an upper-layer formed on the lower-layer. A pre-wet liquid coating device is disposed between a first coating device at the upstream side of a support web conveying direction, and a second coating device disposed at the downstream side. When an uncoated portion is formed by the first coating device, a pre-wet liquid is coated by a pre-wet liquid coating device, and the coating liquid can be reliably coated by the second coating device. When the pre-wet liquid coating device is removed from the support web, first, the pre-wet liquid coating device is brought into liquid-running out state, and thereafter, removed from the support web. Accordingly, the pool of pre-wet liquid is eliminated and occurrence of a thickly coated portion on the support web can be prevented.

Abstract: The present invention provides a solder plating system with automatic monitoring of wash fluid pressure. The system automatically activates an alarm and/or initiates shutdown of a solder plating machine when the pressure reading indicates a failure of the wash fluid supply. The system thereby reduces the number of parts that are affected by failures in the wash fluid supply system. In some cases, problems with the wash fluid supply are detected before any parts are affected.

Abstract: An applicator including a liquid discharge head for discharging a treatment liquid in droplet form, and a discharge control device for controlling the discharge of droplets from the liquid discharge head. The discharge control device divides a surface of a member into a plurality of regions according to the shape of the surface, and controls the application quantity for each region.

Abstract: An atmospheric pressure wafer processing system for delivering at least one gas is provided, having an exhaust control feedback system that utilizes sensors to measure the pressure within the system and adjusts control units to maintain the desired set pressures within the system. In particular the sensors measure the small differential pressures inside a muffle, and specifically the load, bypass center and unload sections of the muffle, relative to the chase ambient pressure. Controlling the muffle pressures directly within the atmospheric system yields a more stable pressure balance for processing wafers less subject to changes in the external environment and allows for compensation of varying input gas flows as occurs when the supply pressure to the system may vary. This system and method of pressure control is particularly advantageous for chemical vapor deposition application yielding improved process repeatability over an extended period of runtime.

Abstract: In an adhesive applicator apparatus comprising an adhesive applicator roll and a nip roll, a web of corrugated board is led through the nip that is formed between the rolls. In the nip, the web of corrugated board is pressed against the adhesive applicator roll by a given constant force.

Abstract: A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor includes a timing circuit which is activated only if certain levels of specific materials are detected. Furthermore, the timer is set to run a predetermined time interval after activation so as to discriminate between known transient processing conditions and the presence of impurities which can greatly influence the manufacturing process. When the timer exceeds the predetermined time duration, an output signal can alert the process operator or automatically shutdown the manufacturing tool.

Abstract: An apparatus and a method for manufacturing semiconductor devices is disclosed for selectively disconnecting a fuse element out of plural fuse elements formed on a semiconductor wafer substrate which is provided with the plural fuse elements and a dielectric layer having at least one opening corresponding to the location for the plural fuse elements.

Abstract: Method and system for encapsulating a coil are provided. In one exemplary embodiment, the method allows providing a chamber for performing at least one manufacturing operation in connection with at least one coil to be encapsulated. The method further allows providing a pallet for supporting the at least one coil to be encapsulated. The pallet may be mounted on a conveyor configured to move the pallet in the chamber proximate to a nozzle configured to dispense encapsulant to the at least one coil. A vibration generator may be mechanically coupled to the conveyor. The vibration generator is electrically responsive to command signals from a controller.

Abstract: A highly-viscous-fluid applying apparatus including a fluid supply device operable to supply a highly viscous fluid, a delivery nozzle from which the highly viscous fluid is delivered, a pump disposed between the fluid supply device and the delivery nozzle and operable to feed the highly viscous fluid received from the fluid supply device, to the delivery nozzle, and a pump control device operable to control the pump, for controlling an amount of delivery of the highly viscous fluid to be delivered from the delivery nozzle.

Abstract: Using a scan coating method, a liquid film is formed on a substrate having a temperature distribution for correcting a temperature distribution of a liquid film caused by the heat of evaporation due to the volatilization of a solvent contained in the liquid film, and then the solvent is removed from the liquid film to form a coating film.

Abstract: A photoresist ashing system includes two processing chambers configured for alternate operation in processing substrates. The system includes a single pump that performs both pump-down and process pumping of both of the chambers. In operation, one of the chambers is pumped down and processed while the other chamber is vented, unloaded and re-loaded.

Abstract: A system for spraying an at least substantially fluid material has a source providing a controllable flow of the material to be sprayed; a dosing unit that receives the flow of material from the source, that holds a quantity of the material in a reservoir, and that outputs the material to a dispensing device; and a control arrangement that has as an input signal an indication of a fill level of the reservoir and that outputs a flow control signal to the source such that the fill level in the reservoir is maintained less than a maximum level and greater than a minimum level when the dispensing device is active. The dosing unit thereby forms an active accumulator able to both receive material from the source and deliver material to the dispensing device at the same time.

Abstract: A method for patterning a recording medium selectively thermally couples a recording medium and a heat source to alter a chemical composition of the recording medium. An apparatus for patterning a recording medium has a heat source for generating and directing an incident thermal wave to a recording medium so as to alter a chemical composition of the recording medium, and a controller for coordinating a mutual position of the incident thermal wave and the recording medium for inducing a direct thermal coupling between the recording medium and the heat source.

Abstract: A gas supplying apparatus for a semiconductor manufacturing device has an interlock apparatus that includes at least one solenoid valve that controls the gas supply from a gas source to the semiconductor manufacturing device, a main controller configured to ouput a control signal for the semiconductor manufacturing device and a driver signal, a driver configured to apply a driving voltage to the at least one solenoid valve in response to the driver signal, and an interlocker configured to sense the open/shut state of the solenoid valves and configured to transmit an interlock signal to the main controller.

Abstract: A sample preprocessing system for a fluorescent X-ray analysis includes a sample preprocessing apparatus for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, a transport apparatus for transporting the substrate, and a control apparatus for controlling the sample preprocessing apparatus and the transport apparatus. The control apparatus 60 after having confirmed that the pressure difference between inside and outside of the apparatus 10 (20, 30) and the concentration of the reactive gas within the apparatus are within a predetermined range causes automatically opening and closing shutters 21a, 27 and 31a to thereby avoid a possible corrosion of the apparatuses positioned outside the sample preprocessing apparatus while increasing the service lifetime thereof.

Abstract: A metal oxide layer can be deposited onto metallic or ceramic surfaces of a structure in situ, by exposing the surfaces to a precursor solution at an elevated temperature. The precursor solution contains: an organometallic, an oxidant, a surfactant, a chelating agent and water. The precursor solution is injected into the structure and maintained at a specific temperature, pH level and pressure for a predetermined period of time. The resulting in situ metal oxide layer is permanently bonded to the surface structure and does require post deposition heat treatment.

Abstract: An apparatus for atomic layer deposition preventing mixing of a precursor gas and an input gas. From the apparatus a flow of the input gas is provided over a surface of the workpiece wherein a beam of the electromagnetic radiation is directed into the input gas in close proximity to the surface of the workpiece, but spaced a finite distance therefrom. The input gas is dissociated by the beam producing a high flux point of use generated reactive gas species that reacts with a surface reactant formed on the surface of the workpiece by a direct flow of the precursor gas flown from the dispensing unit. The surface reactant and reactive gas species react to form a desired monolayer of a material on the surface of the workpiece.

Abstract: A spraycoating device comprising at least one coating liquid spray gun (2) which contains a measuring valve device (40) opening or closing a compressed gas measuring valve flow path (42) depending in the positions of a liquid feed valve (4). The measurement of the compressed gas flow allows automatically determining whether the liquid feed valve (4) is situated in a fully close or a fully open position or in an arbitrary intermediate position thereto.

Abstract: In manufacturing a display panel of a PDP, a CRT, or the like, for example, a screen stripe is formed on a panel surface in a production cycle time equivalent to or faster than that of the screen printing system. By using a dispenser of a variable flow rate type for a display panel that has an effective display area in which a paste layer is formed and a non-effective display area in which no paste layer is formed outside this effective display area, paste discharge is promptly interrupted when a discharge nozzle runs through the non-effective display area of the display panel.

Abstract: The present invention is generally relates to the field of research for the discovery of films with desirable properties, and to a process for making such films. More particularly, the present invention is directed to a system or an apparatus and a method for the rapid formation of a library of liquid samples and a library of thin films therefrom, as well as to the rapid screening of these films to identify those having desirable properties, all of which may be achieved using combinatorial techniques.

Abstract: An apparatus for controlling a speed of a motor of a metering pump providing pressurized fluid at a dispensing gun. The dispensing gun is opened and closed to dispense fluid onto a substrate being carried by a conveyor past the dispensing gun. The apparatus has a pressure control producing first motor speed signals as a function of changing speeds of the conveyor and changing fluid pressures in the dispensing gun when the dispensing gun is open. A flow control produces second motor speed signals as a function of the changing speeds of the conveyor. During changes in conveyor velocity, a motor speed control provides the first motor speed signal to the pump motor which operates the motor at speeds causing the pump to provide fluid to the dispensing gun at pressures changing at a rate tracking a rate of change of the speed of the conveyor.