Abstract: The present invention provides methods of forming a phase-change material layer including providing a substrate and a chalcogenide target including germanium (Ge), antimony (Sb) and tellurium (Te) at a temperature wherein tellurium is volatilized and antimony is not volatilized, and performing a sputtering process to form the phase-change material layer including a chalcogenide material on the substrate. Methods of manufacturing a phase-change memory device using the same are also provided.

Abstract: A sputtering apparatus of a continuous system that a first target 17a and a second target 17b are arranged to obliquely face a substrate 6 and other targets to form a film while conveying the substrate 6 along a conveying path 15, wherein shields 19a, 19b facing the conveying direction of at least the substrate 6 are provided between the conveying path 15 and the first and second targets 17a, 17b to have therebetween an extended region toward the conveying path 15 in the space between the first target 17a and the second target 17b to enable to obtain a high quality film and to enable to prevent particles from diffusing in a chamber 3.

Abstract: A low emissivity glazing on a pane of glass, includes a set of thin layers formed by vacuum deposition assisted by magnetron, the set of thin layers including at least one metal layer reflecting infra-red rays between one or more dielectric layers located between the metal layer and the glass sheet, the metal layer being provided with a protective barrier coating, including a layer of titanium oxide or sub-oxide, deposited in a weakly oxidizing atmosphere at reduced pressure via a conducting titanium oxide cathode.

Abstract: A coated article is provided with a low-emissivity (low-E) layer stack for use in a window unit or the like. The layer stack, or coating, may permit the coated article to achieve one or more of a low solar factor (SF) value, a high selectivity (Tvis/SF) value, substantially neutral color at normal and/or off-axis viewing angles, and/or low emissivity. When high selectivity values are achieved, there is provided a high ratio of visible transmission to SF, which is a desirable feature in certain example instances. In certain example embodiments, a sub-oxide layer (e.g., NiCrOx) may be used as a contact layer under an infrared (IR) reflecting layer in order to permit low SF values, high selectivity, and good coloration to be achieved.

Abstract: A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and further containing xenon and a front-surface antireflection layer formed on the light-shielding layer and made of a material mainly containing tantalum oxide and further containing argon.

Abstract: A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and further containing xenon and a front-surface antireflection layer formed on the light-shielding layer and made of a material mainly containing tantalum oxide and further containing argon.

Abstract: The present invention relates to low emissivity glass and to a method for manufacturing the same. The low emissivity glass comprises: a low emissivity layer; and a dielectric layer formed on the low emissivity layer, wherein the glass has an emissivity of 0.01 to 0.3 and a visible transmittance of 70% or more. According to the present invention, low emissivity glass having good emissive performance while also exhibiting high visible transmittance can be provided. Further, according to the present invention, the manufacturing process for the above-described low emissivity glass can be simplified, and initial investment amount can be reduced.

Abstract: An article includes a substrate and a color layer deposited on the substrate. The color layer has an L* value between about 36 to about 48, an a* value between about 4 to about 5, and a b* value between about 2 to about 4 in the CIE L*a*b* color space.

Abstract: The apparatus (1) for coating a substrate (14) by reactive sputtering comprises an axis (8), at least two targets (11,12) in an arrangement symmetrically to said axis (8) and a power supply connected to the targets (11,12), wherein the targets are alternatively operable as cathode and anode. The method is a method for manufacturing a coated substrate (14) by coating a substrate (14) by reactive sputtering in an apparatus (1) comprising an axis (8). The method comprises a) providing a substrate (14) to be coated; b) providing at least two targets (11,12) in an arrangement symmetrically to said axis (8); c) alternatively operating said targets (11,12) as cathode and anode during coating. Preferably, the targets (11,12) are rotated during sputtering and/or the targets are arranged concentrically, with an innermost circular target surrounded by at least one ring-shaped outer target.

Abstract: Apparatus and processes for sequential sputtering deposition of a target source material as a thin film on a photovoltaic module substrate are provided. The apparatus includes a first sputtering deposition chamber and a second sputtering deposition chamber that are integrally connected such that the substrates being transported through the apparatus are kept at a system pressure that is less than about 760 Torr. The load vacuum chamber is connected to a load vacuum pump configured to reduce the pressure within the load vacuum chamber to an initial load pressure. The first sputtering deposition chamber includes a first target, and the second sputtering deposition chamber includes a second target. A conveyor system is operably disposed within the apparatus and configured for transporting substrates in a serial arrangement into and through load vacuum chamber, into and through the first sputtering deposition chamber, and into and through the second sputtering deposition chamber at a controlled speed.

Abstract: A biased pulse DC reactor for sputtering of oxide films is presented. The biased pulse DC reactor couples pulsed DC at a particular frequency to the target through a filter which filters out the effects of a bias power applied to the substrate, protecting the pulsed DC power supply. Films deposited utilizing the reactor have controllable material properties such as the index of refraction. Optical components such as waveguide amplifiers and multiplexers can be fabricated using processes performed on a reactor according to the present invention.

Abstract: A method for large scale manufacture of photovoltaic devices includes loading a substrate into a load lock station and transferring the substrate in a controlled ambient to a first process station. The method includes using a first physical deposition process in the first process station to cause formation of a first conductor layer overlying the surface region of the substrate. The method includes transferring the substrate to a second process station, and using a second physical deposition process in the second process station to cause formation of a second layer overlying the surface region of the substrate. The method further includes repeating the transferring and processing until all thin film materials of the photovoltaic devices are formed. In an embodiment, the invention also provides a method for large scale manufacture of photovoltaic devices including feed forward control. That is, the method includes in-situ monitoring of the physical, electrical, and optical properties of the thin films.

Abstract: This invention relates to an optical article having antistatic and antireflection or reflective properties, comprising a substrate having at least one main surface coated with an antireflection or reflective coating, said coating comprising at least one electrically conductive layer comprising at least 30% tin oxide (SnO2) by weight relative to the total weight of the electrically conductive layer, said electrically conductive layer having been deposited by ion-assisted deposition, and said substrate having a water uptake rate equal to or greater than 0.6% by weight relative to the total weight of said substrate, the water uptake rate being measured after predrying said substrate and then storing it for 800 hours in a chamber at 50° C. under 100% relative humidity and at atmospheric pressure.

Abstract: The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.

Abstract: In accordance with an example embodiment of the present invention, an apparatus is provided, including a plurality of photon sensing layers arranged on top of each other, and an intermediate layer between each two adjacent sensing layers, the sensing layers being of graphene, and each intermediate layer being configured to prevent a respective color component of light from proceeding into the photon sensing layer next to it.

Abstract: An organic light-emitting device including: a substrate; a first electrode disposed on the substrate; a second electrode disposed on the substrate and comprising silver (Ag); an emission layer between the first electrode and the second electrode; an electron injection layer between the emission layer and the second electrode and comprising a mixture of an alkali metal-containing compound and a first metal; and a capping layer disposed on the second electrode.

Abstract: Provided is a method for preparing a one-dimensional spin photonic crystal device and a one-dimensional spin photonic crystal device prepared by the same. The method comprises forming magnetic and nonmagnetic regions by the interference of laser beams generated from a femtosecond laser light source. The method of the present invention enables production of one-dimensional spin photonic crystals having excellent properties by a rapid and simple process, and is therefore suitable for high integration and large-scale production of desired devices. Further, the prepared photonic crystals exhibit excellent magneto-optical effects and are therefore applicable to development of novel optical devices, and the like.

Abstract: A method of forming an inorganic alignment film made substantially of an inorganic material on a base substrate is provided comprising a milling process of irradiating ion beams onto the surface of the base substrate, on which the inorganic alignment film is to be formed, from a direction inclined at a predetermined angle ?b with respect to a direction vertical to the surface, and a film-forming process of forming the inorganic alignment film on the base substrate onto which the ion beams are irradiated. In the milling process, the predetermined angle ?b is preferably 2° or more. In the milling process, an acceleration voltage of the ion beams during the irradiation of the ion beams is preferably 400 to 1400 V.

Abstract: Disclosed is a separator comprising inorganic particle or aggregates thereof having a unique spectrum or color pattern according to a predetermined rule. Also, disclosed are an electrochemical device comprising the above separator and a method for identifying the origin or kind of the separator itself or the electrochemical device comprising the same by using the above separator. Further, disclosed is a method for manufacturing the aforementioned separator, the method comprising a step of forming a specific pattern by coating inorganic particles having a unique spectrum or color pattern on at least one area selected from the group consisting of a surface of a porous substrate and a porous part of the substrate.

Abstract: A photovoltaic solar cell having a multi-layer antireflective coating on an outer surface. The coating may include alternating layers of silicon dioxide and tantalum pentoxide and may have average front surface reflectance of less than five percent over the wavelength range from 300 nm to 1850 nm with the silicon dioxide having a refractive index less than 1.4 at a wavelength of 550 nm.

Abstract: Provided are a method of forming a carbon film which has a reduced number of steps and improved productivity without needing a high-temperature process, and a method of forming an electrode which does not need a binder. A fluororesin film is formed on a surface of a collector, and a surface of the fluororesin film is contacted with an alkali metal such as lithium to perform defluorination and then washed with acid. By this processing, lithium (Li) chemically reacts with fluorine (F) in the fluororesin film, and lithium fluoride (LiF) is generated. Consequently, the fluororesin film is defluorinated, whereby an electrode having a carbon film is formed.

Abstract: Two types of layers are simultaneously formed on a substrate and another substrate under the same layer forming condition, the heights of which are equal to a half height of an intended retardation compensation layer. Physical properties of the respective two types of layers formed on the substrates are identical to each other, and if deviations are produced in retardation distribution characteristics for azimuth angles of incident light, these deviations are commonly provided in the respective two types of layers. When one substrate is superposed with the other substrate and these superposed substrates are integrated with each other in order to make a single sheet of retardation compensation element, after one of these substrates is rotated by an angle of 90 degrees with respect to the other substrate, these substrates are stuck to each other by an adhesive agent.

Abstract: This invention relates to a photovoltaic device including an electrode such as a front electrode/contact. In certain example embodiments, the front electrode of the photovoltaic device includes a multi-layered transparent conductive coating which is sputter-deposited on a textured surface of a patterned glass substrate. In certain example embodiments, a maximum transmission area of the substantially transparent conductive front electrode is located under a peak area of a quantum efficiency (QE) curve of the photovoltaic device and a light source spectrum used to power the photovoltaic device.

Abstract: A coated article that can be used in applications such as insulating glass (IG) units, so that resulting IG units can achieve high visible transmission of at least 70% (e.g., when using clear glass substrates from 1.0 to 3.5 mm thick), combined with at least one of: (a) SHGC no greater than about 0.45, more preferably no greater than about 0.40; (b) SC no greater than about 0.49, more preferably no greater than about 0.46; (c) chemical and/or mechanical durability; (d) neutral transmissive color such that transmissive a* is from ?5.0 to 0 (more preferably from ?3.5 to ?1.5), and transmissive b* is from ?2.0 to 4.0 (more preferably from 1.0 to 3.0); and (e) neutral reflective color from the exterior of the IG unit (i.e., Rg/Rout) such that reflective a* is from ?3.0 to 2.0 (more preferably from ?2.0 to 0.5), and reflective b* is from ?5.0 to 1.0 (more preferably from ?4.0 to ?1.0).

Abstract: A film forming method for an antireflection film that has a first indium oxide-based thin film and a second indium oxide-based thin film that is laminated on the first indium oxide-based thin film, including a first film forming step that forms the first indium oxide-based thin film by performing sputtering using a first indium oxide-based target in a first reactive gas that contains one, two, or three types selected from a group consisting of oxygen gas, hydrogen gas, and water vapor; and a second film forming step that forms on the first indium oxide-based thin film the second indium oxide-based thin film by performing sputtering using a second indium oxide-based target in a second reactive gas that contains one, two, or three types selected from a group consisting of oxygen gas, hydrogen gas, and water vapor, and that has a different composition from the first reactive gas.

Abstract: The present disclosure relates to a method for producing an indium-tin-oxide layer, comprising: providing a substrate to be coated in a sputtering chamber; providing a rotatable non-bonded target around a backing tube for coating the substrate in the sputtering chamber; and sputtering the material from the target in an atmosphere containing an O2/H2 mixture. Further the present disclosure relates to a sputtering system comprising a sputtering chamber having at least one gas inlet and being adapted for at least one backing tube for a non-bonded rotatable target, a control device adapted to control the flow through the gas inlet, wherein the control device is adapted to control the at least one gas inlet such that a coating on a substrate using a sputtering process is performed in an atmosphere containing an O2 /H2 mixture in the sputtering chamber for forming an indium-tin-oxide layer.

Abstract: Electrowetting display devices and fabrication methods thereof are presented. The electrowetting display device includes a first substrate and a second substrate with a polar fluid layer and a non-polar fluid layer insolvable to each other and interposed between the first and second substrates. A first transparent electrode is disposed on the first substrate. A second electrode is disposed on the second substrate. A dielectric layer is disposed on the second electrode. A hydrophilic partition wall structure is directly disposed on the dielectric layer defining a plurality of pixel regions. A layer of low surface energy material is disposed on the dielectric layer within each of the pixel region.

Abstract: A method of making a coated article (e.g., window unit), and corresponding coated article are provided. A layer of or including diamond-like carbon (DLC) is formed on a glass substrate. Then, a protective layer is formed on the substrate over the DLC inclusive layer. During heat treatment (HT), the protective layer prevents the DLC inclusive layer from significantly burning off. Thereafter, the resulting coated glass substrate may be used as desired, it having been HT and including the protective DLC inclusive layer.

Abstract: A colored device casing includes a base, a color layer and a bonding layer. The base has at least one smooth region. The bonding layer is positioned between the base and the color layer and bonds the base and color layer together. The color layer includes at least one metal layer. A portion of the color layer corresponding to and located over the smooth region has a value of L* in a range from about 50.77 to about 52.77, a value of a* in a range from about ?0.93 to about 0.07 and a value of b* in a range from about ?1.26 to about ?0.26 according to the Commission Internationale del'Eclairage LAB system. A surface-treating method for fabricating the colored casing is also provided.

Abstract: A colored device casing includes a base, a color layer and a bonding layer. The base has at least one smooth region, and the color layer is located over the smooth region of the base. The color layer includes titanium, and has a value for L* in the range from 51.55 to 52.55, a value for a* in the range from 13.12 to 14.12 and a value for b* in the range from 6.27 to 7.27 according to the Commission Internationale del'Eclairage, (CIE, International Commission on Illumination) LAB system. The bonding layer is located between the substrate and the color layer, providing adhesion therebetween. A surface-treating method for fabricating the colored casing is also provided.

Abstract: A colored device casing includes a base, a color layer and a bonding layer. The base has at least one smooth region. The bonding layer is positioned between the base and the color layer and bonds the base and color layer together. The color layer includes at least one metal layer. A portion of the color layer corresponding to and located over the smooth region has a value of L* in a range from about 32.51 to about 34.51, a value of a* in a range from about ?8.74 to about ?7.74 and a value of b* in a range from about ?12.39 to about ?11.39 according to the Commission Internationale del'Eclairage LAB system. A surface-treating method for fabricating the colored casing is also provided.

Abstract: A method for fabricating a lens module includes forming an IR-cut filter, forming a shading block on part of a surface of the IR-cut filter, forming a blocking layer on the IR-cut filter and the shading block, forming an electromagnetic shielding layer on the blocking layer, polishing the electromagnetic shielding layer and the blocking layer to expose the shading block, removing the shading block from the IR-cut filter to form an optical component, mounting a lens in the barrel portion adjacent to the IR-cut filter portion, and packaging the holding portion of the optical component to a printed circuit board to form the lens module.

Abstract: A pixel unit having a display area is provided. The pixel unit includes a first substrate, a second substrate, a liquid crystal layer, and at least one ultraviolet light (UV) absorption pattern. The second substrate is disposed in parallel to the first substrate, and the liquid crystal layer is disposed between the first substrate and the second substrate. The UV absorption pattern is disposed between the first substrate and the second substrate. A part of the display area overlaps the UV absorption pattern to define at least one first alignment area, while the part of the display area which does not overlap the UV absorption pattern defines at least one second alignment area. The liquid crystal molecules of the liquid crystal layer present different pre-tilt angles in the first alignment area and the second alignment area.

Abstract: A shell for an electronic device is provided. The shell includes a transparent shell body, a pattern layer formed on an inner surface of the shell body, and a metal coating formed on an outer surface of the shell body which is light transmitting.

Abstract: A method of manufacturing an electrophoretic display sheet, comprising: forming a wall material on a first substrate, the wall material defining a disposing region; disposing a plurality of microcapsules to the disposing region, each of the plurality of microcapsules including an electrophoretic dispersion liquid in a shell; and arranging at least a part of the plurality of microcapsules on the disposing region by rubbing the wall material with a plate to sweep the plurality of microcapsules.

Abstract: In an information recording medium that has an information layer which includes a recording layer capable of undergoing phase transition, the recording layer is formed from a material that contains Sb and S, and has composition represented by the formula (1): SbxS100-x (atomic %) where suffix x represents the proportion in atomic % that satisfies a relationship of 50?x?98.

Abstract: An anti-reflection coating has an average total reflectance of less than 10%, for example less than 5.9% such as from 4.9% to 5.9%, over a spectrum of wavelengths of 400-1100 nm and a range of angles of incidence of 0-90 degrees with respect to a surface normal of the anti-reflection coating. An anti-reflection coating has a total reflectance of less than 10%, for example less than 6% such as less than 4%, over an entire spectrum of wavelengths of 400-1600 nm and an entire range of angles of incidence of 0-70 degrees with respect to a surface normal of the anti-reflection coating.

Abstract: An optical plate includes a first optical sheet, a reflective layer, and a second optical sheet. The first optical sheet includes first patterns protruding from a front surface. At least a portion of the first patterns includes a top surface parallel to the front surface. The reflective layer is provided on the top surface. A second optical sheet includes a rear surface making contact with the reflective layer. The optical plate is manufactured by forming the first optical sheet including the first patterns protruding from the front surface, forming the second optical sheet including the reflective layer and an adhesion layer, and bonding the first optical sheet with the second optical sheet such that at least the portion of the first patterns makes contact with the reflective layer.

Abstract: A method of fabricating an organic electro-luminescence device comprising the steps of providing a substrate, an organic chamber, and a sputtering chamber, forming a hole injection layer on the substrate, forming a hole transport layer on the hole injection layer in the organic chamber, forming a light-emitting layer on the hole transport layer in the organic chamber, disposing a metal chelate material on the light-emitting layer and partially doping a CsF compound into the metal chelate material to forming an electron transporting layer in the organic chamber, forming a buffer layer on the electron transporting layer in the organic chamber, transferring the substrate, the hole injection layer, the hole transport layer, light-emitting layer, the electron transporting layer, and the buffer layer form the organic chamber to the sputtering chamber, and forming an electron injection layer on the buffer layer in the sputtering chamber.

Abstract: Certain example embodiments of this invention relate to a front transparent conductive electrode for solar cell devices (e.g., amorphous silicon or a-Si solar cell devices), and/or methods of making the same. Advantageously, certain example embodiments enable high haze to be realized in the top layer of the thin film stack. In certain example embodiments, an insertion layer comprising ITO or AZO is provided between a layer of AZO and a layer of ITO. The AZO may be deposited at room temperature. The insertion layer is provided with an oxygen content selected so that the insertion layer sufficient to alter the crystalline growth of the layer of AZO compared to a situation where no insertion layer is provided. In certain example embodiments, the layer of ITO may be ion-beam treated so as to roughen a surface thereof. The ion beam treating may be performed a voltage sufficient to alter the crystalline growth of the layer of AZO compared to a situation where no insertion layer is provided.

Abstract: Certain example embodiments relate to a layer of or including Ti1-xSixOy and/or a method of making the same. In certain example embodiments, the Ti1-xSixOy-based layer may be substoichiometric with respect to oxygen. In certain example embodiments of this invention, the layer may include Ti1-xSixOy where x is from about 0.05 to 0.95 (more preferably from about 0.1 to 0.9, and even more preferably from about 0.2 to 0.8, and possibly from about 0.5 to 0.8) and y is from about 0.2 to 2 (more preferably from about 1 to 2, and even more preferably from about 1.5 to 2, and possibly from about 1.9 to 2). The layer may have an index of refraction of from about 1.6 to 1.9. The layer may also be used with a transparent conductive oxide in a transparent conductive coating.

Abstract: The disclosed subject matter relates to a metal multi-layered film structure that includes two types of metal films including first metal films and second metal films alternately formed on a resin substrate. The first metal films can be composed of an aluminum-based material having a film thickness between 0.7 nm and 20 nm. The second metal films can be composed of a metal selected from the group consisting of stainless steel-based materials, nickel-based materials, cobalt-based materials, titanium-based materials and chromium-based materials, having a film thickness ranging from 1 nm to 20 nm. This metal multi-layered film structure can be manufactured through a method of sputtering. The metal multi-layered film structure is suitable for an extension reflector for vehicular lamps.

Abstract: A production method for an optical recording medium including a substrate, an information recording layer, and a light transmission layer, includes: molding the substrate; forming on the substrate the information recording layer so as to have a multilayer structure including a layer that has been sputtered under a first deposition condition and a layer that has been sputtered under a second deposition condition with use of targets of the same composition; and forming the light transmission layer on the information recording layer.

Abstract: There is provided a method of manufacturing an optical recording medium capable of reducing a manufacturing cost of an optical recording medium. When manufacturing an optical recording medium 10 including a recording layer 2 formed on a substrate 1, and a light transmitting layer 3 formed on the recording layer 2, the method of manufacturing the optical recording medium includes a step of forming the recording layer 2 containing In and/or Sn, Pd, and oxygen through a use of sputtering method by using an In2O3 target and/or a SnO2 target, and a Pd target while allowing an oxygen gas and a nitrogen gas to flow.

Abstract: A method of manufacturing a solar cell includes providing a substrate, depositing a first electrode comprising an alkali-containing transition metal layer over the substrate, depositing at least one p-type semiconductor absorber layer over the first electrode, wherein the p-type semiconductor absorber layer includes a copper indium selenide (CIS) based alloy material, depositing an n-type semiconductor layer over the p-type semiconductor absorber layer, and depositing a second electrode over the n-type semiconductor layer. The step of depositing the alkali-containing transition metal layer includes sputtering from a first target comprising the transition metal and a second target comprising the alkali metal, where a composition of the first target is different from a composition of the second target.

Abstract: A scratch resistant coated article is provided which is also resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, an anti-etch layer(s) is provided on a glass substrate in order to protect the glass substrate from attacks by fluoride-based etchant(s). In certain example embodiments, the anti-etch layer(s) is substantially transparent to visible light. In certain embodiments, a DLC layer(s) may be provided over the anti-etch layer. An underlayer may be provided under the anti-etch layer(s) in certain example embodiments. In certain example embodiments, the anti-etch layer(s) may be of or include a carbide and/or oxycarbide of Zr, Sn or the like.

Abstract: A method involves depositing on a surface of an optical substrate an optical layer made of a substance that has an index of refraction approximately equal to an index of refraction of the optical substrate, the optical substrate and the layer collectively defining a multi-section substrate in which the optical substrate and the optical layer serve as respective sections. According to a different aspect, an apparatus includes a multi-section substrate having a first section that is an optical substrate with a surface, and having a second section that is an optical layer provided on the surface and made of a substance having an index of refraction approximately equal to an index of refraction of the optical substrate.

Abstract: An information recording medium ensuring high recording and erase function and excellent archival characteristic at a high linear velocity and over a wide range of linear velocities is provided. Such a medium is obtained by constructing a recording layer which has a composition that can generate phase change as a whole, of a first through an M-th constituent layers (wherein M is an integer of 2 or greater) which are stacked in a thickness direction, such that elemental compositions of contiguous an m-th constituent layer and a (m+1)th constituent layer are different from each other (wherein m is an integer and satisfies 1?m?M) assuming that the constituent layer located at an m-th position from a laser light incident side is the m-th constituent layer. In this information recording medium, at least one m-th constituent layer constituting the recording layer preferably includes at least one element selected from Te, Bi, Sb, Ge, In, Ga, Al, Sn, Pb, Se and Si.

Abstract: Polymeric based lens having a hardening layer, an interferential multi-layer and a hard layer sandwiched between both, and corresponding manufacturing method. The hardening layer is over 500 nm thick. The interferential multi-layer is made up of a plurality of sub layers each of which is less than 250 nm thick. The hard layer is over 300 nm thick. The lens can also have a flexible layer, obtained by polymerizing organometallic monomers by means of PECVD and/or sputtering, arranged between the hardening layer and the hard layer. The manufacturing method includes a high vacuum activation phase of the hardening layer surface, before the hard layer formation stage.

Abstract: A method for fabricating a chalcopyrite-type thin film solar cell includes a first step of forming onto a Mo electrode layer 2 a precursor including an In metal layer and a Cu—Ga alloy layer by sputtering, a second step of attaching an alkali-metal solution onto the precursor, a selenization step of subjecting the substrate 1 which has undergone both the first and the second steps to a selenization treatment, and a transparent electrode forming step of depositing an optically transparent conductive layer. As the alkali-metal solution, an aqueous solution of an alkali metal compound, such as sodium tetraborate, sodium sulfide, and sodium aluminum sulfate, can be used.