Abstract: If an inspection method for inspecting a patterned medium is intended for the nanoimprint process control, it is necessary to measure a correct shape of each pattern element. On the other hand, if the inspection method is intended for the quality control of products, it is necessary to inspect the products on a I00 percent basis. However, the conventional method which uses SEM or AFM could not satisfy these requirements. According to the present invention, IO0-percent inspection of products becomes possible by a method including the steps of: irradiating a surface of a hard disk medium, on which a magnetic material pattern is formed, with a light beam including a plurality of wavelengths; detecting the intensity of a reflected light beam from the hard disk medium on a wavelength basis; calculating a spectral reflectance from the detected intensity of the reflected light beam; and detecting a shape of each pattern element formed on the hard disk medium on the basis of the calculated spectral reflectance.

Abstract: A garment and system includes a monitoring fabric that exhibits a light reflection property and substantially no light transmission property when the fabric is illuminated with light having wavelength(s) in the range of 400 to 2200 nanometers. The amount of useful light reflected by the fabric into an aperture of acceptance defined with respect to an imaginary axis extending from the fabric relative to the amount of light lost to the aperture of acceptance detectably changes when the fabric stretches in response to motion, as the motion induced by physiological activity (e.g., heart rate). The system includes at least one radiation source and at least one radiation detector, with the detector disposed in the aperture of acceptance.

Abstract: A detection system for detecting luminescence sites on a substrate and including an irradiation unit for generating at least one excitation irradiation beam for exciting luminescence sites on the substrate; a first optical element, e.g. refractive element adapted for receiving at least two irradiation beams of different wavelengths or wavelength ranges, the at least two irradiation beams being excitation irradiation beam(s) to be focused on a substrate and/or luminescence irradiation beam(s) to be collected from the excited luminescence sites on the substrate; and an optical compensator for adjusting at least one of the at least two irradiation beams of different wavelengths or wavelength ranges so as to reduce or compensate for optical aberrations.

Abstract: Provided is a device for determining the surface topology and associated color of a structure, such as a teeth segment, including a scanner for providing depth data for points along a two-dimensional array substantially orthogonal to the depth direction, and an image acquisition means for providing color data for each of the points of the array, while the spatial disposition of the device with respect to the structure is maintained substantially unchanged. A processor combines the color data and depth data for each point in the array, thereby providing a three-dimensional color virtual model of the surface of the structure. A corresponding method for determining the surface topology and associated color of a structure is also provided.

Abstract: Reflected light caused by the state of the surface of a wafer, a foreign material or a defect is superimposed on a haze frequency component caused by the type and thickness of a film or a surface irregularity. It has therefore been difficult to accurately measure the haze frequency component by use of a fixed threshold value. In order to detect a haze frequency component caused by a haze present on the surface of an object to be inspected, light propagating from the object to be inspected is detected and converted into an electric signal. The electric signal is sampled at a predetermined sampling time interval and converted into digital data. A frequency component caused by a foreign material, a defect or the like is separated from the digital data to ensure that a haze frequency component is selected. The haze frequency component is caused by a stain attached to the surface of the wafer, hazy tarnish, a surface irregularity or the like.

Abstract: A passenger detecting apparatus including a sensor unit of a small size heightwise which can be manufactured inexpensively includes a light emitting means (21a, . . . , 21h) for emitting light rays in a substantially horizontal direction, a beam forming means (22a, 22b) for transforming light rays emitted from the light emitting means into a collimated or converged light beam in a substantially horizontal direction, a downward reflecting means (23a, 23b) for reflecting the light beam in a direction toward a lower seat disposed in the compartment, and a light receiving means (24a, 24b) for receiving the light beams scattered upon striking on the passenger for thereby detecting the state of the passenger.

Abstract: A method and a system for establishing a wafer testing recipe are disclosed. The method may include acquiring images of a number of dice from a produced wafer; using at least part of the images to compose a reference-image; defining on the reference-image multiple “zones of interest; determining the Detection-Policy for each kind of zone of interest and determining the algorithm that will be used by each of the Detection-Policy; determining the parameters of each of the Detection-Policy's algorithms; determining the Reporting-policy; determining the Inspection-policy; and creating a “wafer testing recipe” by integrating of the testing reference of a typical die image, the zones of interest, the Detection-Policies, the parameters of the Detection-Policies' algorithms, the Reporting-Policies and the Inspection-Policies.

Abstract: A picking cart and a picking system capable of improving sorting precision and operating efficiency. The picking cart comprises a plurality of storage shelves at least one of which has a container placed thereon in a drawable manner, a display unit for displaying at least an article to be picked and one of the storage shelves to which the article is to be delivered, a sensor unit for detecting whether or not the container placed thereon has been drawn from each of the storage shelves, and a determination unit for determining whether or not one of the storage shelves from which the container placed thereon has been drawn is identical to the storage shelf displayed on the display unit, based on the detection result of the sensor unit. Before an article is placed in a container, that is, when a container is drawn, it is possible to know whether or not sorting has been carried out just as displayed.

Abstract: An inspection device includes a movable portion, and a substantially fixed portion. The movable portion includes a plurality of bins as well as beam directors positioned between the bins. The fixed portion includes light detectors and light emitters. The light detectors are arranged to allow multiplexing of the light detectors.

Abstract: A particle inspection apparatus includes an irradiation unit configured to apply a light beam onto front and back surfaces of an object to be inspected, first and second detection units configured to detect scattering light from the surfaces, a calculation unit configured to conduct a particle inspection on the surfaces on the basis of outputs from the detection units, and a control unit configured to control the irradiation unit, the detection units, and the calculation unit. The irradiation unit can selectively apply the beam onto the front or back surface. The control unit causes the calculation unit to conduct the particle inspection on the inspection surface on which the light beam is selectively applied, on the basis of outputs made by the detection unit corresponding to simultaneous application and selective application of the light beam.

Abstract: A machine for inspecting glass containers which are being rotated at an inspection station. A light source illuminates a selected area on a rotating glass container while the container rotates through a selected angle and a camera is triggered to capture an image while the bottle rotates through that angle. A plurality of sequential images are recorded and a critical addition is made to be inspected.

Abstract: A printing system includes a movable tray for holding recording media. The movable tray includes spaced-apart reference marks for determining distance traveled by the tray. A reference-mark optical detector is positioned to provide a field of view through which the reference marks pass. An identifying-mark optical detector provides a field of view through which media-type identifying marks on a piece of recording medium pass. A signal processor provides an output relative to: a) amount of reference marks passing through the field of view of the reference-mark optical detector, and b) signal variation in a signal provided by the identifying-mark optical detector. A look-up table includes media identification signal patterns that are correlated to corresponding media types. Finally, a comparator compares the output of the signal processor to the media identification signal patterns in the look-up table in order to identify type of recording medium.

Abstract: A paper carrying device includes a carrying path, a light sensor, a contact sensor, and a judgment section. Both of the light sensor and the contact sensor output a presence-signal indicating that paper exists at a predetermined position in the carrying path or an absence-signal indicating that paper does not exist at the predetermined position. The judgment section judges that a signal output from the light sensor is an error when the light sensor outputs the presence-signal while the contact sensor outputs the absence-signal.

Abstract: A method that may be applied to imaging and identifying defects and contamination on the surface of an integrated circuit is described. An energetic beam, such as an electron beam, may be directed at a selected IC location having a layer of a solid, fluid, or gaseous reactive material formed over the surface. The energetic beam disassociates the reactive material in the region into chemical radicals that either chemically etch the surface preferentially, or deposit a thin layer of a conductive material over the local area around the energetic beam. The surface may be examined as various layers are selectively etched to decorate defects and/or as various layers are locally deposited in the area around the energetic beam. SEM imaging and other analytic methods may be used to identify the problem more easily.

Abstract: A fluorometer comprising an excitation system including an excitation source for producing excitation light capable of causing fluorescence in fluorescent material; and a detection system for detecting said fluorescence. The excitation source comprises one or more light emitting diodes (LEDs) associated with means for causing said excitation light to form a beam that projects, during use, from the fluorometer. In one embodiment, the excitation system and the detection system are located in respective separate housings, the angular disposition between the housings being adjustable. In other embodiments, the excitation system and the detection system are located in the same housing. The fluorometer is particularly suited for use in detecting leaks in aqueous environments, especially when mounted on an underwater vehicle.

Abstract: A size and position detecting system includes a laser sensor and a controller. The laser sensor includes an emitter emitting a laser beam to a receiver. The controller is configured to compute a first time of how long the emitter emits the laser beam and a second time of how long the receiver receives the laser beam when a cutting tool moves along a first direction perpendicular to and coplanar with a straight line connecting the emitter and the receiver. The controller is configured to record a first position of the cutting tool at a moment when the second time is less than the first time, and a second position of the cutting tool when the second time remains changeless for a predetermined amount of time, to determine whether the cutting tool is off-centered according coordinates difference between the first and second positions along the first direction.

Abstract: A wafer edge defect inspection method and apparatus for use in an integrated circuit fabrication system includes an image capturing device for capturing images of the edges of wafers, a database in which the images are stored and accessible for analysis and a computer for analyzing the images of one or more wafer edges to locate edge defects and for evaluating the performance of the fabrication system. The inspection and data storage are performed automatically. The database storage enables detailed analysis of many wafers and fabrication process steps.

Abstract: A device that is usable to inspect the surface of a material uses an inspection system which includes an optical unit. That optical unit can register the light which is reflected by the surface to be inspected. An illumination system, that uses at least two light sources, provides the light. The optical unit and the illumination system are connected to a control unit. The at least two light sources are arranged spaced at a distance from each other and both emit light directed to a recording region of the optical unit. The optical unit is oriented toward the surface to be inspected and at least one of the illumination light sources can be subdivided into several individual light sources. The control unit controls at least two of the illumination system light sources that are arranged at a distance from each other or the respective individual light sources of at least one of the illumination sources both selectively and independently of each other.

Abstract: The disclosure relates to a system and device for evaluating imperfections in a lens for a display for an electronic device. The evaluation device comprises: a substrate; and a pattern imposed on the substrate. The pattern comprises a series of lines in a grid imposed on the substrate wherein when the pattern is viewed through the lens, the series of lines having thickness of between approximately 10 and approximately 150 microns, spaced in intervals between approximately 20 microns and approximately 300 microns from center to center, the pattern is distorted around an area where a defect is present in the lens. With the device, the lens is identifiable as being defective if the pattern appears as a moiré distortion in the area when viewed through the lens.

Abstract: Software, methods, and systems for calibrating photometric devices are provided. These involve using a non-uniform test illumination field to approximate a photon transfer curve by calculating stable pixel values and statistical dispersions on a pixel-by-pixel basis.

Abstract: A system for determining the concentration of an analyte in a liquid sample comprising a detection unit for detecting light intensities which are radiated from subareas of a detection area of a test element as well as an evaluation unit which determines a frequency distribution for the detected light intensities wherein the frequency distribution has at least one first maximum caused by unwetted subareas or at least one reference area and a second maximum caused by wetted subareas and selects at least one light intensity on the basis of the frequency distribution and determines the concentration of the analyte from the at least one selected light intensity.

Abstract: A method includes simultaneously illuminating a material using multiple first radiances and measuring multiple second radiances from the material. Each second radiance includes at least a portion of two or more first radiances that have interacted with the material. The method also includes determining a structure of the material based on the measurements. The first radiances may be directed at the material from different directions, and the second radiances may be measured at different positions around the material. The structure of the material could be determined by determining at least one of a scattering profile and an absorption profile. If the material includes a sheet of paper, a boundary between two layers in the sheet of paper could be identified by a discontinuity in the scattering profile, and a non-uniform distribution of a filler in the sheet of paper could be identified by a smooth variation in the scattering profile.

Abstract: According to the present invention, during identification of recording medium type, positioning of a recording medium at a measurement position for measuring the recording medium is facilitated, and the number of sensors for measuring the recording medium is reduced. In addition to identifying recording medium type, the top/reverse of the inserted recording medium can also be identified by way of a simple construction. A recording medium identification device, which identifies the type of a recording medium inserted through an insertion slot, comprises a plurality of sensors arranged in a band-like region having a predetermined width, in a depth direction, and a plurality of sensors arranged in a band-like region having a predetermined width, in a width direction.

Abstract: The condition of a glazing panel (2) is investigated using a viewing device (1) to view an illuminating electromagnetic radiation profile at a target zone. Data relating to the viewed radiation profile is compared to datum data, to produce an output related to the condition of the glazing panel at the target zone.

Abstract: A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The system features a variable scan speed beam scanning subsystem, preferably using an acousto-optic deflector, with beam compensation, so that variable scanning speeds can be achieved. Also included are methods and systems for improving the signal to noise ratio by use of scatter reducing complements, and a system and method for selectively and repeatedly scanning a region of interest on the surface in order to provide additional observations of the region of interest.

Abstract: A system and method for measuring the physical characteristics of a component where the system includes an electromagnetic radiation source defining a source optical path, the electromagnetic radiation source being operable to cause electromagnetic radiation to propagate along the source optical path, a sensing device defining a sensor optical path, a system support structure, a base structure, an electromagnetic radiation source mounting structure and a sensing device mounting structure, a positioning device including a positioning device stage, wherein the positioning device stage is movably disposed and a retention mount disposed on the positioning device stage, the retention mount being disposed within the sensor optical path such that when a component is retained within the retention mount, the component blocks at least a portion of the electromagnetic radiation to generate a silhouette, wherein the sensing device generates data responsive to the silhouette.

Abstract: A machine for inspecting glass containers which are being rotated at an inspection station. A light source illuminates a selected area on a rotating glass container while the container rotates through a selected angle and a camera is triggered to capture an image while the bottle rotates through that angle. A plurality of sequential images are recorded and a critical addition is made to be inspected.

Abstract: A method for using optical media for identification purpose including the steps of exposing a portion of the optical media to a source of radiation; detecting an imperfection in the portion of the optical media; and, quantifying the imperfection to create a unique identifier. An apparatus for using an optical media for identification purposes, including a light source for exposing a portion of the optical media to a radiation; and, a receptor for receiving the radiation through the portion of the optical media, wherein the receptor measures a change in radiation that is received once the radiation has passed through the portion of the optical media.

Abstract: Apparatus and methods for verification of the dimensions of a semiconductor manufacturing peripheral are disclosed, in which the peripheral, e.g., a wafer cassette, is positioned between, and is enveloped by, an emitter housing and an opposing receiver housing adapted for emitting and receiving, respectively, light from a selected portion of the electromagnetic spectrum, preferably infrared. The measured light is used to verify the dimensions of the target peripheral in comparison with a pre-selected standard.

Abstract: A method of imaging and identifying defects and contamination on the surface of an integrated circuit is described. The method may be used on areas smaller than one micron in diameter. An energetic beam, such as an electron beam, is directed at a selected IC location having a layer of a solid, fluid or gaseous reactive material formed over the surface. The energetic beam disassociates the reactive material in the region into chemical radicals that either chemically etch the surface preferentially, or deposit a thin layer of a conductive material over the local area around the energetic beam. The surface may be examined as various layers are selectively etched to decorate defects and/or as various layers are locally deposited in the area around the energetic beam. SEM imaging and other analytic methods may be used to identify the problem more easily.

Abstract: A system and method for manipulating real-time video playback time-synchronized with millimeter wave imagery is disclosed. In a particular embodiment, millimeter wave imagery and visible spectrum video images are combined to form composite images in real-time to detect concealed objects on a person. A graphical user interface (GUI) manipulates the displayed millimeter wave imagery, video images and composite images and controls displaying user selected portions of the synchronized recorded images. The composite images are automatically encoded with event data when a concealed object is detected and an alert is generated, or that information is accessed from a datafile or database structure. The GUI controls the playback and viewing of those composite images having encoded event data.

Abstract: A system for detecting the presence of a substantially transparent object includes a radiation source producing radiation at a predetermined bandwidth, and a radiation receiver is positioned to receive radiation from the radiation source. An opening is formed between the radiation receiver and the radiation source sized to allow a substantially transparent object such as a sample or reagent tip to slide between the radiation receiver and the radiation source. At least one polarizing filter is positioned between the radiation receiver and the opening, whereby a change in intensity of radiation received by the radiation receiver due to the presence or absence of the transparent object can be detected.

Abstract: An RF controlled lighting system that activates lights in adjacent spaces when a person walks into a first space and then traverses the spaces in sequence. A detection device senses the entry of a person into a first space controlled by the system. A micro-controller activates the lights in that space for immediate light and in the adjacent spaces in preparation for the person to traverse the spaces in either direction from the origin space. As the person traverses the contiguous spaces, controllers in each space sense the person's presence and communicate by RF signals to activate lights along the person's path. The controllers extinguish their lights a predetermined time after the person passes or no one enters a space.

Abstract: Methods and systems for evaluating and controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the lithography process. A critical metric of a lithography process may include, but may not be limited to, a critical dimension of a feature formed during the lithography process. The method may also include altering at least one parameter of a process module configured to perform a step of the lithography process to reduce within wafer variation of the critical metric. The parameter of the process module may be altered in response to at least the one measured property of the resist.

Abstract: A method and system for inspecting a semiconductor wafer. The method includes providing an illumination flux through a pattern plate and a lens to a surface of a specimen to project a pattern onto the surface of the specimen. The pattern is associated with the pattern plate. Additionally, the method includes detecting the illumination flux reflected from the surface of the specimen with a detector, processing information associated with the detected illumination flux, and generating a first image based on at least information associated with the detected illumination flux. The first image includes a first image part for the pattern and a second image part for the specimen. Moreover, the method includes adjusting the lens to a state in order to achieve a first predetermined quality for the first image part, and moving the specimen to a first position.

Abstract: A system is provided for measuring gloss and spatial dependence of gloss. In a first embodiment, the system comprises: a first illuminator configured to emit a first light beam at a point on a target, thereby producing a generally specular reflectance in a first direction; a second illuminator configured to emit a second light beam at the point on the target, thereby producing generally diffuse reflectance in the first direction; a linear array sensor configured to detect the generally specular reflectance and the generally diffuse reflectance in the first direction; and a processor configured to process the generally specular reflectance and the generally diffuse reflectance detected by the linear array sensor.

Abstract: The invention relates to imaging systems that include a coded aperture detection system and an optical detection system. The coded aperture detection system is configured to detect radiation emitted by a radionuclide present within an object and to provide a first detector signal from the detected radiation. The optical detection system is configured to detect optical radiation from the object and to provide a second detector signal from the detected optical radiation. The system also includes a processor configured to prepare first image data from the first detector signal, second image data from the second detector signal, and registered data indicative of a spatial relationship in at least one dimension between the first and second image data. The invention also includes methods of using the new systems, e.g., for sentinel lymph node mapping and tissue resection.

Abstract: A particle inspection apparatus includes an irradiation unit configured to apply a light beam onto front and back surfaces of an object to be inspected, first and second detection units configured to detect scattering light from the surfaces, a calculation unit configured to conduct a particle inspection on the surfaces on the basis of outputs from the detection units, and a control unit configured to control the irradiation unit, the detection units, and the calculation unit. The irradiation unit can selectively apply the beam onto the front or back surface. The control unit causes the calculation unit to conduct the particle inspection on the inspection surface on which the light beam is selectively applied, on the basis of outputs made by the detection unit corresponding to simultaneous application and selective application of the light beam.

Abstract: When detecting light scattered by an object to be inspected by using a pulse laser as a light source, noise increases unless a sampling repletion period of an A/D converter is determined so as to be related to a pulse oscillation repetition period of the light source. (1) The sampling repletion period of the A/D converter is set equal to the pulse oscillation repetition period of the light source or an integer times thereof, and the sampling is synchronized with oscillation of the light source. Or (2) the sampling repletion period of the A/D converter is set equal to a half-integer times the pulse oscillation repetition period of the light source. Even if a ripple component resulting from emission pulses of the light source remains in the scattered light signal supplied to the A/D converter remains, therefore, its influence can be eliminated or reduced.

Abstract: Minute materials which can be undesirably left on the backside of a semiconductor wafer are detected by scanning the semiconductor wafer with an infra-red (IR) light following the completion of a process step that forms and then selectively removes a material from the top surface of the wafer. Any detected material can then be removed from the backside of the wafer to ensure that that backside of the wafer is clean and flat.

Abstract: An identification device operable to identify a type of a recording medium includes an irradiation unit configured to irradiate the recording medium with light, a reading unit configured to read the light that is irradiated from the irradiation unit and that is reflected from the recording medium to obtain an image, a processing unit configured to process the image obtained by the reading unit to output a plurality of pixel data items each having a light intensity value, a calculation unit configured to calculate a value representing amounts of change by which the light intensity values of the plurality of pixel data items continuously increase and decrease, and an identification unit configured to identify the type of the recording medium on the basis of the value representing the amounts of change calculated by the calculation unit.

Abstract: Disclosed are apparatuses, methods, and lithographic systems for EUV mask inspection. An EUV mask inspection system can include an EUV illumination source, an optical system, and an image sensor. The EUV illumination source can be a standalone illumination system or integrated into the lithographic system, where the EUV illumination source can be configured to illuminate an EUV radiation beam onto a target portion of a mask. The optical system can be configured to receive at least a portion of a reflected EUV radiation beam from the target portion of the mask. Further, the image sensor can be configured to detect an aerial image corresponding to the portion of the reflected EUV radiation beam. The EUV mask inspection system can also include a data analysis device configured to analyze the aerial image for mask defects.

Abstract: A device and method for detecting the presence or absence of an object which has repetitive motion are disclosed comprising, a receiver for receiving a signal from the object, and circuitry for determining the presence or absence of the object to be detected, wherein the circuitry records the signal from the receiver as a pattern of data during at least part of the repetitive motion of the object, compares the data with a previously recorded data pattern and, produces an output signal based on the comparison. The signal may be received during discrete time intervals, and may be light which can be transmitted with varying intensity. The circuitry may determine the value of signal received at a receiver and produce a binary value. The signal received at the receiver can be reflected from the object to be detected.

Abstract: An extended range focus sensor is provided. In various embodiments, the focus sensor may include a relay lens assembly to image a plane between an objective lens and the relay lens arrangement to a plane near an entrance pupil of a focus detector arrangement of the focus sensor. In some embodiments, the objective lens pupil is imaged onto the focus detector entrance pupil. In some embodiments, an illumination beam passes through the relay lens arrangement and is magnified on its way to be output by the objective lens, and the reflected focus detection beam passes back through the objective lens and the relay lens arrangement and is reduced prior to being input to the focus detector arrangement. In some embodiments, the focus detector arrangement may comprising a broad range focus detector combined with a high resolution Shack-Hartmann focus detector, and in others a single extended range Shack-Hartmann focus detector is used.

Abstract: A device for determining the surface topology and associated color of a structure, such as a teeth segment, includes a scanner for providing depth data for points along a two-dimensional array substantially orthogonal to the depth direction, and an image acquisition means for providing color data for each of the points of the array, while the spatial disposition of the device with respect to the structure is maintained substantially unchanged. A processor combines the color data and depth data for each point in the array, thereby providing a three-dimensional color virtual model of the surface of the structure. A corresponding method for determining the surface topology and associated color of a structure is also provided.

Abstract: A garment and system includes a monitoring fabric comprising a first plurality of reflective yarns knitted or woven with a second plurality of stretchable yarns. The fabric exhibits both a light transmission property and a light reflection property. The amount of light transmitted through the fabric relative to the amount of light reflected by the fabric changes when the fabric stretches in response to motion, such as the motion induced by physiological activity (e.g., heart rate). The system includes at least one source of radiation having wavelength(s) in the range of 400 to 2200 nanometers and at least one detector responsive to such incident radiation. The source and detector are associated with the fabric such that the reception of incident radiation by the detector is directly affected by a change in the amount of light transmitted through the fabric relative to the amount of light reflected by the fabric when the fabric stretches.

Abstract: A light sensing element having two functions is provided for a high-speed image scanning system to scan a document, including a set of matrix light-sensing cells for detecting a scanning location for the scanned document, thereby feeding the sensed signals to control the scanning location and scanning speed, and at least one set of trilinear light-sensing cells for sensing an document, thereby acquiring image signals.

Abstract: A garment and system includes a monitoring fabric that exhibits a light reflection property and substantially no light transmission property when the fabric is illuminated with light having wavelength(s) in the range of 400 to 2200 nanometers. The amount of useful light reflected by the fabric into an aperture of acceptance defined with respect to an axis extending from the fabric relative to the amount of light lost to the aperture of acceptance detectably changes when the fabric stretches in response to motion, as the motion induced by physiological activity (e.g., heart rate). The system includes at least one radiation source and at least one radiation detector, with the detector disposed in the aperture of acceptance.

Abstract: A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.

Abstract: A system and method for inspecting machine readable marks on one side of a wafer without requiring transmission of radiant energy from another side of the wafer and through the wafer. The wafer has articles which may include die, chip scale packages, circuit patterns and the like. The marking occurs in a wafer marking system and within a designated region relative to an article position. The articles have a pattern on a first side. The method includes the steps of imaging a first side of the wafer, imaging a second side of the wafer, establishing correspondence between a portion of first side image and a portion of a second side image, and superimposing image data from the first and second sides to determine at least the position of a mark relative to an article.