Abstract: A power clamp in a triple well is disclosed. A metal oxide semiconductor (MOS) varactor is used in a triggering circuit and is positioned in a first N type well. An N-channel field effect transistor is positioned in a P-type well. A P-channel field effect transistor is positioned in a second N-type well. The first N-type well is electrically isolated from the second N-type well, and electrically contacts the substrate of the power clamp.

Abstract: A method of a bulk tri-gate transistor having stained enhanced mobility and its method of fabrication. The present invention is a nonplanar transistor having a strained enhanced mobility and its method of fabrication. The transistor has a semiconductor body formed on a semiconductor substrate wherein the semiconductor body has a top surface on laterally opposite sidewalls. A semiconductor capping layer is formed on the top surface and on the sidewalls of the semiconductor body. A gate dielectric layer is formed on the semiconductor capping layer on the top surface of a semiconductor body and is formed on the capping layer on the sidewalls of the semiconductor body. A gate electrode having a pair of laterally opposite sidewalls is formed on and around the gate dielectric layer. A pair of source/drain regions are formed in the semiconductor body on opposite sides of the gate electrode.

Abstract: A first aspect of the present invention is a method of forming an isolation structure including: (a) providing a semiconductor substrate; (b) forming a buried N-doped region in the substrate; (c) forming a vertical trench in the substrate, the trench extending into the N-doped region; (d) removing the N-doped region to form a lateral trench communicating with and extending perpendicular to the vertical trench; and (e) at least partially filling the lateral trench and filling the vertical trench with one or more insulating materials.

Abstract: To an output of an NMOS having one end connected to a power source, a capacitor and a PMOS are connected. A capacitor is connected to the output of the PMOS. The NMOS and the PMOS are turned on alternately. A pulse is applied to other end of the capacitor which is connected to the output of the NMOS, to shift the output of the NMOS for boosting. Then, a back gate of the NMOS is connected, via a PMOS in an on state, to the power source. With this structure, the PMOS provides a resistor component when the output terminal short-circuits.

Abstract: A plurality of N-doped strip portions are formed alternating with a plurality of P-doped regions. When a voltage is applied to the N-doped strip portions, a capacitance is created between the N-doped strip portions and the P-doped strip portions. A capacitance is also created between the N-doped strip portions and the underlying epitaxial silicon layer. A larger interface area between N-doped and P-doped regions generally increases the capacitance. By providing the N-doped strip portions, as opposed to a continuous N-doped region, the combined interface area between the N-doped strip portions and the underlying epitaxial silicon layer is reduced. However, more interface area is provided between the N-doped strip portions and the P-doped strip portions. A circuit simulation indicates that junction capacitance per unit peripheral length is 0.41 fF/?m, while the junction capacitance per unit area is 0.19 fF/?m^2.

Abstract: A semiconductor device includes: an NMIS transistor on an NMIS region of a semiconductor substrate; a PMIS transistor on a PMIS region of the semiconductor substrate; and a stress dielectric film continuously provided on the semiconductor substrate to cover the NMIS transistor and PMIS transistor, the stress dielectric film having internal stress, wherein part of the stress dielectric film extending over the NMIS region has tensile internal stress compared to part of the stress dielectric film extending over the PMIS region.

Abstract: A flash memory cell transistor and a method for fabricating the same compensates a work function difference of a pMOS and a nMOS with a triple gate insulating film by using electron density trapped in a pMOS gate insulating film. The flash memory cell transistor comprises a p-well region and a n-well region. The nMOS region comprises a nMOS channel ion-implantation region on the p-well region, a second gate oxide film on the nMOS channel ion-implantation region and a first n+ polysilicon gate electrode on the second gate oxide film. The pMOS region comprises a pMOS channel ion-implantation region on the n-well region, a first gate oxide film, an insulating film having an electron trap and the second gate oxide film which are sequentially formed on the pMOS channel ion-implantation region, and a second n+ polysilicon gate electrode on the second gate oxide film.

Abstract: A composite transistor is disclosed for use in radiation hardening a CMOS IC formed on an SOI or bulk semiconductor substrate. The composite transistor has a circuit transistor and a blocking transistor connected in series with a common gate connection. A body terminal of the blocking transistor is connected only to a source terminal thereof, and to no other connection point. The blocking transistor acts to prevent a single-event transient (SET) occurring in the circuit transistor from being coupled outside the composite transistor. Similarly, when a SET occurs in the blocking transistor, the circuit transistor prevents the SET from being coupled outside the composite transistor. N-type and P-type composite transistors can be used for each and every transistor in the CMOS IC to radiation harden the IC, and can be used to form inverters and transmission gates which are the building blocks of CMOS ICs.

Abstract: A semiconductor device with improved soft error rate immunity and latch-up immunity and a method of forming the same. The device includes first wells of first conductivity type and second well of second conductivity type formed in the semiconductor substrate of first conductivity type. First conductivity type MOSFETs including source/drain of first conductivity type are formed in the second well, and second conductivity type MOSFETs including source/drain of second conductivity type in the first well. A third well of second conductivity type is formed at a region under the first wells and the drain of the second conductivity type MOSFETs. The first well is connected to the semiconductor substrate between the first well and the third well.

Abstract: A semiconductor structure is disclosed, including a substrate having therein a first well of a first conductivity type and a second well of a second conductivity type, a first MOS transistor of the first conductivity type and a second MOS transistor of the second conductivity type. The first MOS transistor is disposed on the second well, including a gate structure on the second well and a strained layer of the first conductivity type in an opening in the second well beside the gate structure. The difference between the lattice parameter of a portion of the strained layer near the bottom of the opening and that of the substrate is less than the difference between the lattice parameter of a portion of the strained layer apart from the bottom of the opening and that of the substrate. The second MOS transistor is disposed on the first well.

Abstract: A method and device for increasing pFET performance without degradation of nFET performance. The method includes forming a first structure on a substrate using a first plane and direction and forming a second structure on the substrate using a second plane and direction. In use, the device includes a nFET stack on a substrate using a first plane and direction, e.g., (100)<110> and a pFET stack on the substrate using a second plane and direction, e.g., (111)/<112>. An isolation region within the substrate is provided between the nFET stack and the pFET stack.

Abstract: A semiconductor product and a method for fabricating the semiconductor product provide a pair of gate electrodes formed with respect to a pair of doped wells within a semiconductor substrate. One of the gate electrodes is formed of a first gate electrode material having a first concentration of an electrically active dopant therein. A second of the gate electrodes is formed of the first gate electrode material having less than the first concentration of the electrically active dopant therein, and formed at least partially as an alloy with a second gate electrode material. The semiconductor product may be formed with enhanced efficiency.

Abstract: A semiconductor device includes a semiconductor substrate of a first conductivity type, a well of the first conductivity type formed in the semiconductor substrate, a transistor formed in the well, a diffusion region of a second conductivity type formed in the semiconductor substrate so as to cover a lateral side and a bottom edge of the well, a terminal formed on the semiconductor substrate at an outside part of the diffusion region, and a conductive region contacting with the well, the well being in ohmic contact with the terminal via the conductive region and the semiconductor substrate, the conductive region having an impurity concentration level exceeding an impurity concentration level of the semiconductor substrate.

Abstract: A process and apparatus for a semiconductor device is provided. A device comprises a first transistor having a first charge carrier type. The first transistor comprises a high-k gate dielectric and a first doped electrode. The first charge carrier type comprises one of p-type and n-type and the first doped electrode comprises the other of p-type and n-type. The device further comprises a second transistor having a charge carrier type opposite the first charge carrier type. The second transistor comprises the high-k gate dielectric, and a second doped electrode, wherein the second doped electrode comprises the other of p-type and n-type.

Abstract: An output stage structure includes first and second PMOS transistors and first and second NMOS transistors, wherein the MOS transistors are manufactured with a twin well process. The first PMOS transistor has a source coupled to a supply voltage (VDD), and a gate coupled to the first voltage. The second PMOS transistor has a source coupled to a drain of the first PMOS transistor, a gate coupled to the second voltage, and a drain coupled to an output pad. The first NMOS transistor has a drain coupled to the output pad, and a gate coupled to the third voltage. The second NMOS transistor has a drain coupled to source of the first NMOS transistor, a gate coupled to the fourth voltage, and a source coupled to ground.

Abstract: The present invention provides a strained Si directly on insulator (SSDOI) substrate having multiple crystallographic orientations and a method of forming thereof. Broadly, but in specific terms, the inventive SSDOI substrate includes a substrate; an insulating layer atop the substrate; and a semiconducting layer positioned atop and in direct contact with the insulating layer, the semiconducting layer comprising a first strained Si region and a second strained Si region; wherein the first strained Si region has a crystallographic orientation different from the second strained Si region and the first strained Si region has a crystallographic orientation the same or different from the second strained Si region. The strained level of the first strained Si region is different from that of the second strained Si region.

Abstract: A semiconductor device has a semiconductor substrate of a first conductivity type, a first well region of the first conductivity type which is formed to extend from the surface of the semiconductor substrate toward the inside thereof, a pair of second well regions of a second conductivity which are formed to extend from the surface of the semiconductor substrate toward the inside thereof in such as manner as to sandwich the first well region therebetween, and a third well region of the second conductivity type which is formed under each of the first well region and the pair of second well regions in the semiconductor substrate. The third well region electrically connects the pair of second well regions to each other. The first well region has at least a portion thereof connected to the region of the semiconductor substrate in which the third well region is not formed.

Abstract: An analog switch has a first circuit and a second circuit. The first circuit has an NMOS and PMOS connected in series, and the second circuit has a PMOS and NMOS connected in series. The first and second circuits are provided in parallel between an input terminal and output terminal of the analog switch. The gate of each NMOS is connected to a terminal to which a first clock signal is supplied, and the gate of each PMOS is connected to another terminal to which a second clock signal is supplied. The second clock signal is a reversal of the first clock signal. When the analog switch is set to the OFF state and a voltage that is above the supply potential is applied to the input terminal, the NMOSs become reverse-biased diodes. Therefore, an off leak current is not produced.

Abstract: Flash memory integrated circuit devices include an integrated circuit substrate. A cell array on the integrated circuit substrate includes a plurality of cell transistors. A bit line is coupled to ones of the plurality of cell transistors and a first pass transistor is coupled to the bit line. The first pass transistor has a first diffusion structure configured to provide a breakdown voltage higher than that of a second diffusion structure. One or more second pass transistor(s) are coupled to the first pass transistor. The second pass transistor(s) have the second diffusion structure. The second diffusion structure may have a resistance smaller than a resistance of the first diffusion structure.

Abstract: A triple-well CMOS structure having reduced latch-up susceptibility and a method of fabricating the structure. The method includes forming a buried P-type doped layer having low resistance under the P-wells and N-wells in which CMOS transistors are formed and forming a gap in a buried N-type doped layer formed in the P-wells, the is gap aligned under a contact to the P-well. The buried P-type doped layer and gap in the buried N-type doped layer allow a low resistance hole current path around parasitic bipolar transistors of the CMOS transistors.

Abstract: A semiconductor device having a contact structure is provided. The semiconductor device includes: a conductive region; a first film and a second film which are formed over the conductive region to realize a layer; and a contact electrode which extends through the layer to the conductive region, and is formed so as to replace a portion of the layer with a portion of the contact electrode, where the portion of the layer is constituted by only the first film, only the second film, or both of a portion of the first film and a portion of the second film, and the portion of the first film occupies a major part of the portion of the layer.

Abstract: Wells are formed in a substrate where standard Vt and low Vt devices of both a first and second type are to be fabricated. Wells defining the locations of first type standard Vt devices are masked, and a first voltage threshold implant adjustment is performed within wells defining the second type standard Vt devices, and each of the first and second type low Vt devices. Wells that define the locations of second type standard Vt devices are masked, and a second voltage threshold implant adjustment is performed to the wells defining the first type standard Vt devices, and each of the first and second type low Vt devices. Doped polysilicon gate stacks are then formed over the wells. Performance characteristics and control of each device Vt is controlled by regulating at least one of the first and second voltage threshold implant adjustments, and the polysilicon gate stack doping.

Abstract: An element isolation dielectric film is formed around device regions in a silicon substrate. The device regions are an n-type diffusion region, a p-type diffusion region, a p-type extension region, an n-type extension region, a p-type source/drain region, an n-type source/drain region, and a nickel silicide film. Each gate dielectric film includes a silicon oxide film and a hafnium silicate nitride film. The n-type gate electrode includes an n-type silicon film and a nickel silicide film, and the p-type gate electrode includes a nickel silicide film. The hafnium silicate nitride films are not on the sidewalls of the gate electrodes.

Abstract: In one embodiment, an integrated circuit includes a PMOS transistor having a gate stack comprising a P+ doped gate polysilicon layer and a nitrided gate oxide (NGOX) layer. The NGOX layer may be over a silicon substrate. The integrated circuit further includes an interconnect line formed over the transistor. The interconnect line includes a hydrogen getter material and may comprise a single material or stack of materials. The interconnect line advantageously getters hydrogen (e.g., H2 or H2O) that would otherwise be trapped in the NGOX layer/silicon substrate interface, thereby improving the negative bias temperature instability (NBTI) lifetime of the transistor.

Abstract: The present invention is to provide a high-quality semiconductor device allowing independent control of threshold voltage values of gate electrodes of transistors which reside in a plurality of one-conductivity-type regions and in a reverse-conductivity-type region. The semiconductor comprises a P-type Si substrate 109, a plurality of P-type wells 103a, 103b connected to each other via the bottom surface side of the P-type Si substrate 109, and an N-type well 101 provided so as to surround side portions of the plurality of P-type wells 103a, 103b. The semiconductor device also has NMOS transistors 107a, 107b provided on the P-type wells 103a, 103b, and PMOS transistors 105a, 105b, 105c provided on the N-type well 101. The semiconductor device still also has an N-type well 133 provided just under the N-type well 101 and connected therewith.

Abstract: A semiconductor memory device includes first and second source/drain regions, and first and second semiconductor regions. The first source/drain region of a first conductive type is formed in a first well region of a second conductive type for a pair of first MIS-type transistors of the first conductive type. The second source/drain region of the second conductive type is formed in a second well region of the first conductive type for a pair of second MIS-type transistors of the second conductive type. The first semiconductor region of the second conductive type is formed in the first source/drain region. The second semiconductor region of the first conductive type is formed in the second source/drain region.

Abstract: A decoupling capacitor with increased resistance to electrostatic discharge (ESD) is provided on an integrated circuit (IC). The capacitor may be single or multi-fingered. In one example, the capacitor includes first and second electrodes separated by a dielectric material, a source positioned proximate to the first electrode, and a floating drain positioned proximate to the first electrode and separated from the source by the first electrode. A parasitic element, modeled as a bipolar junction transistor (BJT), is formed by current interactions between the source, the floating drain, and a doped area. The floating drain provides a constant potential region at the base of the BJT, which minimizes ESD damage to the IC.

Abstract: An active pixel sensor circuit comprising a photodiode, a storage node, and a transfer gate between the photodiode and storage node, where the potential barrier between the photodiode and the storage region is maintained during charge accumulation, thereby preventing charge tunneling between the photodiode and the storage region. This is achieved by electrically connecting the transfer gate, which controls charge transfer between the photodiode and the storage region, to the storage region. Connecting the transfer gate to the storage region maintains the potential barrier between the photodiode and the storage region at a threshold voltage during the charge integration period which prevents charge tunneling between the photodiode and the storage node. The threshold voltage is determined by the implant levels used to form the active pixel sensor and can be optimized by using optimum implant levels. This prevention of charge tunneling between the photodiode and the storage node eliminates image lag.

Abstract: A semiconductor device includes: a first gate insulating film formed on a first nMOS transistor region in a semiconductor substrate; a second gate insulating film formed on a first pMOS transistor region in the substrate; a third gate insulating film formed on a second nMOS transistor region in the substrate; and a fourth gate insulating film formed on a second pMOS transistor region in the substrate. The first through fourth gate insulating films contain nitrogen. Each of the third and fourth gate insulating films has a thickness smaller than that of each of the first and second gate insulating films. The first gate insulating film has a nitrogen concentration peak at the interface between the first gate insulating film and the substrate. Each of the second, third and fourth gate insulating films has a nitrogen concentration peak only near an associated one of gate electrodes respectively formed thereon.

Abstract: A semiconductor structure and method of manufacturing is provided. The method of manufacturing includes forming shallow trench isolation (STI) in a substrate and providing a first material and a second material on the substrate. The first material and the second material are mixed into the substrate by a thermal anneal process to form a first island and second island at an nFET region and a pFET region, respectively. A layer of different material is formed on the first island and the second island. The STI relaxes and facilitates the relaxation of the first island and the second island. The first material may be deposited or grown Ge material and the second material may deposited or grown Si:C or C. A strained Si layer is formed on at least one of the first island and the second island.

Abstract: Embodiments relate to a SRAM, in which a well isolation method may be applied so that an N-well and a P-well are separated from each other and that well walls of opposite conductive types are formed on facing sides. Also, the active regions of NMOS and PMOS may be connected to each other and the contacts of a PMOS drain and an NMOS source may be united to one so that the contacts are moved to the active regions of wide parts. A size of the common contact may be one to two times the size of a contact defined by a design rule. The active region may have a round bent part. The common contacts are arranged to be asymmetrical with each other. Therefore, it may be possible to secure the process margins of the active regions and the contacts, to improve a leakage current characteristic, and to improve yield. Also, it may be possible to prevent the dislocation of the active region and to omit a conventional thermal treatment process so that it may be possible to simplify processes and to reduce manufacturing cost.

Abstract: A semiconductor device includes a P-type semiconductor substrate, a P-channel DMOS transistor, a CMOS transistor. The P-channel DMOS transistor is disposed on the P-type semiconductor substrate and includes a drain formed of the P-type semiconductor substrate and a source formed in the P-type semiconductor substrate on a main surface of the P-type semiconductor substrate. The CMOS transistor is disposed on the P-type semiconductor substrate and includes a P-channel MOS transistor and an N-channel MOS transistor. The P-channel MOS transistor is formed in an N-type region formed in the P-type semiconductor substrate on the main surface of the P-type semiconductor substrate. The N-channel MOS transistor is formed in a P-type region formed in the P-type semiconductor substrate on the main surface of the P-type semiconductor substrate. The P-type region is electrically isolated from the P-type semiconductor substrate by the N-type region.

Abstract: A semiconductor device is provided in which a plurality of MOSFETs including a vertical MOSFET is formed on a substrate. The device includes a silicon carbide substrate having front and back surfaces facing each other, an isolating region formed in the substrate to extend from the front surface to the back surface of the substrate, and first and second MOSFETs formed on opposite sides of the isolating region, respectively.

Abstract: A threshold control layer of a second MIS transistor is formed under the same conditions for forming a threshold control layer of a first MIS transistor. LLD regions of the second MIS transistor are formed under the same conditions for forming LDD regions of a third transistor.

Abstract: The present invention provides a semiconductor memory device with reduced soft error rate (SER) and a method for fabricating such a device. The semiconductor memory device includes a plurality of implants of impurity ions that provide for a reduced number of minority carriers having less mobility. A fabrication process for the semiconductor memory includes a “non-retrograde” implant of impurity ions that is effective to suppress the mobility and lifetime of minority carriers in the devices, and a “retrograde” implant of impurity ions that is effective to substantially increase the doping concentration at the well bottom to slow down or eliminate additional minority carriers.

Abstract: A technique for and structures for camouflaging an integrated circuit structure. The technique includes the use of a light density dopant (LDD) region of opposite type from the active regions resulting in a transistor that is always off when standard voltages are applied to the device.

Abstract: Soft-error resistance and latch up resistance are simultaneously improved for LSI involving miniaturization and reducing operating voltage. P wells and N wells are formed in a higher density substrate (P on P+ substrate), and buried N wells are formed on a layer underlying thereof. A PMOSFET is formed in the N well and a NMOSFET is formed in the P well. A P well electric potential junction for coupling P well electric potential of the P well to predetermined electric potential is provided, and a region directly under the P well electric potential junction is provided with a region where the aforementioned buried N well is not disposed. The soft-error resistance is improved by having the buried N well therein, and the latch up resistance is improved by coupling the P well to the substrate.

Abstract: Diagonal deep well region for routing the body-bias voltage for MOSFETS in surface well regions is provided and described.

Abstract: A semiconductor device capable of integrally controlling thresholds of gate electrodes of transistors present in a region of one-conductivity-type and transistors present in a region of an reverse-conductivity-type while suppressing noise propagation is provided. A digital circuit region 123 and an analog circuit region 121 are provided on a P—Si substrate 101. P-wells 103 and 193 and N-wells 105 and 195 are provided in the analog circuit region 121. P-wells 107 and 197 and N-wells 109 and 199 are provided in the digital circuit region 123. A mesh-like deep N-well 111 is provided to contact with lower surfaces of the P-well 103 and the N-well 105. A mesh-like deep N-well 113 is provided to contact with lower surfaces of the P-well 107 and the N-well 109.

Abstract: In preferred embodiments of the present invention, a method of forming CMOS devices using SOI and hybrid substrate orientations is described. In accordance with a preferred embodiment, a substrate may have multiple crystal orientations. One logic gate in the substrate may comprise at least one N-FET on one crystal orientation and at least one P-FET on another crystal orientation. Another logic gate in the substrate may comprise at least one N-FET and at least one P-FET on the same orientation. Alternative embodiments further include determining the preferred cleavage planes of the substrates and orienting the substrates relative to each other in view of their respective preferred cleavage planes. In a preferred embodiment, the cleavage planes are not parallel.

Abstract: A family of semiconductor devices is formed in a substrate that contains no epitaxial layer. In one embodiment the family includes a 5V CMOS pair, a 12V CMOS pair, a 5V NPN, a 5V PNP, several forms of a lateral trench MOSFET, and a 30V lateral N-channel DMOS. Each of the devices is extremely compact, both laterally and vertically, and can be fully isolated from all other devices in the substrate.

Abstract: The present invention provides a system for limiting degradation of a first semiconductor structure (304) caused by an electric field (314), generated from within the semiconductor substrate (302) by high voltage on a second semiconductor structure (310). A semiconductor device (300) is adapted to reduce the effective magnitude of the field—as realized at structure 304—to some fractional component (320), or to render the angle (322)—at which the field approaches the first structure through a first substrate region (306)—acute. Certain embodiments of the present invention provide for: lateral recession of the first semiconductor structure to abut an isolation structure (312), which is disposed between the second semiconductor structure and the first substrate region; lateral recession of the first semiconductor structure from the isolation structure, so as to form a moat therebetween; and a counter-doped region (316) within the first substrate region.

Abstract: An improved semiconductor device is disclosed with a NMOS transistor formed on a P-Well in a deep N-well, a PMOS transistor formed on a N-Well in the deep N-well, a first voltage coupled to a source node of the PMOS, and a second voltage higher than the first voltage coupled to the N-well, wherein the second voltage expands a depletion region associated with the PMOS and NMOS transistor for absorbing electrons and holes caused by alien particles.

Abstract: While using conventional manufacturing processes, it is intended to apply a compressive strain in the channel direction to the p-channel MOS field effect transistor and also apply a tensile strain in the channel direction to the n-channel MOS field effect transistor for increasing both MOS currents. In the MOS semiconductor device isolated by a trench device isolation regions, the p-channel MOS field effect transistor is designed so that a length of a source/drain region in the channel direction is not more than 1 micrometer, and the gate length is not more than 0.2 micrometers. The n-channel MOS field effect transistor is designed so that a face of the source/drain region in parallel to the gate width direction is adjacent to the device isolation film with the inserted silicon nitride film, and a face of the source/drain region parallel to the gate length direction is adjacent to the device isolation film including the silicon oxide film only.

Abstract: A CMOS device and manufacturing method thereof wherein a bilayer etch stop is used over a PMOS transistor, and a single etch stop layer is used for an NMOS transistor, for forming contacts to the source or drain of the CMOS device. A surface tension-reducing layer is disposed between the source or drain region of the PMOS transistor and an overlying surface tension-inducing layer. The surface tension-inducing layer may comprise a nitride material or carbon-containing material, and the surface tension-reducing layer may comprise an oxide material. Degradation of hole mobility in the PMOS transistor is prevented by the use of the surface tension-reducing layer of the bilayer etch stop.

Abstract: A semiconductor device is provided which is capable of avoiding malfunction and latchup breakdown resulting from negative variation of high-voltage-side floating offset voltage (VS). In the upper surface of an n-type impurity region (28), a p+-type impurity region (33) is formed between an NMOS (14) and a PMOS (15) and in contact with a p-type well (29). An electrode (41) resides on the p+-type impurity region (33) and the electrode (41) is connected to a high-voltage-side floating offset voltage (VS). The p+-type impurity region (33) has a higher impurity concentration than the p-type well (29) and is shallower than the p-type well (29). Between the p+-type impurity region (33) and the PMOS (15), an n+-type impurity region (32) is formed in the upper surface of the n-type impurity region (28). An electrode (40) resides on the n+-type impurity region (32) and the electrode (40) is connected to a high-voltage-side floating supply absolute voltage (VB).

Abstract: To control the uneven distribution of current density and reduce the area of an ESD protection circuit in an SCR-type ESD protection device. An N-type well 11, and P-type wells 12a and 12b disposed oppositely and adjacent to the N-type well 11, with the N-type well 11 interposed between them, are formed on the surface of a semiconductor substrate. A high concentration N-type region 15a is formed on the surface of the P-type well 12a, a high concentration N-type region 15b is formed on the surface of the P-type well 12b, and each of them is grounded. Further, a high concentration P-type region 14a is formed, oppositely to the high concentration N-type region 15a, on the surface of the N-type well 11, and a high concentration P-type region 14b is formed, oppositely to the high concentration N-type region 15b, on the surface of the N-type well 11, and each of them is connected to an I/O pad.

Abstract: An active pixel sensor which provides reduced dark current, improved sensitivity, and improved modulation transfer function. An N well, surrounded by a P well is formed in a P type epitaxial substrate. A P+ region is formed extending from within the P well into the substrate leaving a gap between the P+ region and the N well. A gate dielectric is formed covering at least the gap, part of the P+ region, and part of the N well. A gate electrode is formed on the gate dielectric over the gap, part of the P+ region, and part of the N well. The gate electrode is biased so that the region of the substrate under the gate electrode is accumulated with holes and the region of the N well under the gate electrode is depleted of electrons. This will reduce the dark current and improve the sensitivity of the active pixel sensor.

Abstract: A storage section, at least one writing section, and at least one reading section are provided on a substrate. A storage-section substrate region in which the storage section is formed, at least one writing-section substrate region in which each writing section is formed, at least one reading-section substrate region in which each reading section is formed are insulatedly isolated from each other on the substrate. Independent substrate potentials are applied to each substrate region.

Abstract: The present invention provides a semiconductor device structure and an easy-to-use method for manufacturing thereof enabling to suppress wafer contamination and to form the semiconductor device superior in control and uniformity of the film thickness in the semiconductor device including plural kinds of transistors provided with a gate insulator film with different film thickness. According to the method, plural kinds of transistors with gate insulator films having different electric film thickness are formed in the steps of forming an insulating film layer including a lamination structure of at least first insulating film 104 constituted of first high-dielectric insulating material and second insulating film 103 constituted of second high-dielectric insulating material on the same silicon substrate 101, selectively etching and removing the upper insulating film 103 on the part of region 105 by use of mask 107 and utilizing multi-oxide process while reducing leak electric current.