Abstract: Suspended microelectromechanical systems (MEMS) devices including a stack of one or more materials over a cavity in a substrate are described. The suspended MEMS device may be formed by forming the stack, which may include one or more electrode layers and an active layer, over the substrate and removing part of the substrate underneath the stack to form the cavity. The resulting suspended MEMS device may include one or more channels that extend from a surface of the device to the cavity and the one or more channels have sidewalls with a spacer material. The cavity may have rounded corners and may extend beyond the one or more channels to form one or more undercut regions. The manner of fabrication may allow for forming the stack layers with a high degree of planarity.

Abstract: Devices and methods are provided for fabricating metallic interlayer via contacts within source/drain regions of field-effect transistor devices of a monolithic three-dimensional semiconductor integrated circuit device. For example, a semiconductor integrated circuit device includes a first device layer and a second device layer disposed on the first device layer. The first device layer includes a metallic interconnect structure formed in an insulating layer. The second device layer includes first and second field-effect transistor devices having respective first and second gate structures. A metallic interlayer via contact is disposed between the first and second gate structures in contact with the metallic interconnect structure of the first device layer, wherein a width of the metallic interlayer via contact is defined by a spacing between adjacent sidewalls of the first and second gate structures.

Abstract: The application relates to an integrated circuit with SRAM memory and provided with several superimposed levels of transistors, the integrated circuit including SRAM cells provided with a first transistor and a second transistor belonging to an upper level of transistors and each having a double gate composed of an upper electrode and a lower electrode laid out on either side of a semiconductor layer, a lower gate electrode of the first transistor being connected to a lower gate electrode of the second transistor.

Abstract: A crossbar array, comprises a plurality of row lines, a plurality of column lines intersecting the plurality of row lines at a plurality of intersections, a plurality of junctions coupled between the plurality of row lines and the plurality of column lines at a portion of the plurality of intersections, and a plurality of diagonal control lines coupled to the plurality of junctions. Each junction comprises a resistive memory element and a transistor, and the junctions are positioned to calculate a matrix multiplication of a first matrix and a second matrix.

Abstract: A head mounted virtual reality display system and method is provided. The invention includes a head mounted apparatus worn by a user and a display element having an array of display regions wherein said display region contains a smaller active region having an output aperture with at least one pixel of variable color and luminosity and larger non-active region adjacent to the active region. The invention further includes means for scanning the apparent position of the active region onto the user's eye in both horizontal and/or vertical directions between a plurality of sub-frames within the display region in a pre-determined fill pattern, wherein said sub-frames cover an area including the original position of the larger non-active region and active region on the display region.

Abstract: Disclosed is a three-dimensional TPC decoding apparatus. A three-dimensional TPC decoding apparatus includes an X decoder which decodes an X axis of an m-th upper half layer based on decoding results of a Y axis and a Z axis of an m?1-th upper half layer; a Y decoder which decodes a Y axis of an m-th lower half layer based on decoding results of an X axis and a Z axis of an m?1-th lower half layer; and a Z decoder which decodes a Z axis based on a decoding result of the Y axis of an m-th upper half layer and a decoding result of the X axis of an m-th lower half layer.

Abstract: A stacked structure, includes: a wiring; an insulating layer; a substrate; and a protective layer, wherein the wiring, the insulating layer, and the substrate are stacked from a bottom side, and an end portion of the wiring is projected from a side face of the stacked structure, and the protective layer is provided between the insulating layer and at least a part of the wiring and is configured of a material different from a material configuring the insulating layer.

Abstract: The invention relates to methods and systems for augmented reality. The invention more particularly provides head-mounted devices for the display and visualization of computer-generated information content by a wearer. The invention further provides related methods and uses.

Abstract: Systems and methods are provided for fabricating a semiconductor device structure. An example semiconductor device structure includes a first device layer, a second device layer and an inter-level connection structure. The first device layer includes a first conductive layer and a first dielectric layer formed on the first conductive layer, the first device layer being formed on a substrate. The second device layer includes a second conductive layer, the second device layer being formed on the first device layer. The inter-level connection structure includes one or more conductive materials and configured to electrically connect to the first conductive layer and the second conductive layer, the inter-level connection structure penetrating at least part of the first dielectric layer. The first conductive layer is configured to electrically connect to a first electrode structure of a first semiconductor device within the first device layer.

Abstract: The invention relates to lubricant analysis, and to apparatus and methods for carrying out real-time in situ lubricant analysis. The invention extends to apparatus and methods which can measure tribological wear in machinery and, in particular, to the in situ measurement of the elemental composition of lubricant and/or debris caught in a filter within a lubricant-wetted machine.

Abstract: Integrating magnetic random access memory with logic is disclosed. The magnetic tunnel junction stack of a magnetic memory cell is disposed within a dielectric layer which serves as a via level of an interlevel dielectric layer with a metal level above the via level. An integration scheme for forming dual damascene structures for interconnects can be formed to logic and memory cells easily.

Abstract: A semiconductor device and a method of forming the same, the semiconductor device includes a first transistor and a second transistor. The first transistor is disposed on a substrate and comprises a gate electrode, a gate dielectric layer and a first source/drain. The second transistor includes the gate electrode and a channel layer disposed on the gate electrode.

Abstract: A semiconductor circuit comprises a Front End of Line (FEOL) comprising a plurality of transistors, each of which having a source region, a drain region and a gate region arranged between the source region and the drain region and comprising a gate electrode. The semiconductor circuit also comprises a buried interconnect that is arranged in the FEOL and electrically connected to the gate region from below through a bottom contact portion of the gate electrode. By using a buried interconnect the routing of the circuit may be facilitated.

Abstract: The present disclosure provides a method and device for removing an integrated circuit. The device is used to remove the integrated circuit from a display panel. The device includes a heating unit configured to contact and heat the display panel, and a retractable clamping-taking component configured to clamp and take the integrated circuit on the display panel which has been heated. According to embodiments of the present disclosure, the method and device may remove the integrated circuit from the display panel without destroying the display panel and increase efficiency of removing the integrated circuit.

Abstract: A liquid crystal display according to an exemplary embodiment of the present invention includes: a first substrate; a gate line formed on the first substrate; an insulating layer formed on the gate line; and a first subpixel electrode and a second subpixel electrode that are formed on the insulating layer. Each of the first subpixel electrode and the second, subpixel electrode includes a first subregion and a second subregion. At least one of the first subregion and the second subregion includes a vertical stem, a horizontal stem extending from a middle of the vertical stem, and a plurality of minute branches laterally extending in a diagonal direction from the horizontal stem. The plurality of minute branches laterally extending from the horizontal stem are alternately branched with reference to the horizontal stem.

Abstract: Systems are provided for a three dimension static random access memory (SRAM) structure. The SRAM structure comprises a plurality of memory array layers, layer decoder circuitry on each memory array layer, a word line driver circuit disposed on each memory array layer, and a plurality of complementary bit line pairs extending vertically from a memory cell in a first memory array layer to a memory cell in a second memory array layer. The layer decoder circuitry on each memory array layer is configured to decode a portion of an SRAM address to determine if the SRAM address corresponds to memory cells on its memory array layer. The word line driver circuit disposed on each memory array layer is configured to operate cooperatively with a partial SRAM address decoder to select and drive one of the plurality of word lines disposed on its memory array layer, wherein a selected word line is connected to a predetermined number of memory cells in a specific memory array layer.

Abstract: A semiconductor device with a novel structure in which stored data can be held even when power is not supplied and there is no limitation on the number of times of writing. In the semiconductor device, a plurality of memory cells each including a first transistor, a second transistor, and a capacitor is provided in matrix and a wiring (also called a bit line) for connecting one memory cell to another memory cell and a source or drain electrode of the first transistor are electrically connected to each other through a source or drain electrode of the second transistor. Accordingly, the number of wirings can be smaller than that in the case where the source or drain electrode of the first transistor and the source or drain electrode of the second transistor are connected to different wirings. Thus, the degree of integration of the semiconductor device can be increased.

Abstract: An object is to provide a semiconductor device with a novel structure in which stored data can be held even when power is not supplied and there is no limit on the number of write operations. The semiconductor device includes a first memory cell including a first transistor and a second transistor, a second memory cell including a third transistor and a fourth transistor, and a driver circuit. The first transistor and the second transistor overlap at least partly with each other. The third transistor and the fourth transistor overlap at least partly with each other. The second memory cell is provided over the first memory cell. The first transistor includes a first semiconductor material. The second transistor, the third transistor, and the fourth transistor include a second semiconductor material.

Abstract: A display driving circuit in accordance with the inventive concepts may include a source amplifier. The source amplifier may include an output transistor configured to amplify an input signal to generate an output signal, and charge a source line of a display panel using the output signal. The source amplifier may include an output transistor switch configured to control the output transistor, and a switch control block configured to receive configuration bits including on/off time information of the output transistor switch to generate a switch control signal. The on/off time information includes information for turning on the output transistor switch in synchronization with a horizontal synchronous signal associated with the display panel, and information for turning off the output transistor switch at a time when the source line of the display panel is charged to a desired charge level.

Abstract: One aspect relates to a memory circuit that has a programmable non-volatile memory (NVM) cell configured to generate an NVM output signal indicative of a program state of the NVM cell and to configure a volatile output based on the program state of the NVM cell. The NVM cell comprises a first anti-fuse device, a first select device connected in series with the first anti-fuse device at a first node, and a first pass device. The memory circuit also may have a programmable (independently of the NVM cell) volatile memory (VM) cell configured to receive the NVM output signal at a VM input node and to generate a VM output signal indicative of the program state of the VM cell. The NVM cell may have two NV elements that are separately programmable and are separately selectable via separate access transistors to drive the VM input node.

Abstract: A method for testing a display panel includes: applying a first level signal to a first sub-pixel and a third sub-pixel of a first pixel unit and applying a second level signal to a second sub-pixel of the first pixel unit; applying the second level signal to a first sub-pixel and a third sub-pixel of a second pixel unit and applying the first level signal to a second sub-pixel of the second pixel unit; and detecting a short circuit between adjacent sub-pixels. The first level signal has a voltage polarity opposite to a voltage polarity of the second level signal. Therefore, it is ensured that any two adjacent sub-pixels have opposite voltage polarities when the short circuit between adjacent sub-pixels of the display panel is detected. The method also provides improved testing abilities to detect an open circuit in a sub-pixel.

Abstract: A semiconductor device and method of formation are provided herein. A semiconductor device includes a first active region adjacent a first side of a shallow trench isolation (STI) region. The first active region including a first proximal fin having a first proximal fin height adjacent the STI region, and a first distal fin having a first distal fin height adjacent the first proximal fin, the first proximal fin height less than the first distal fin height. The STI region includes oxide, the oxide having an oxide volume, where the oxide volume is inversely proportional to the first proximal fin height. A method of formation includes forming a first proximal fin with a first proximal fin height less than a first distal fin height of a first distal fin, such that the first proximal fin is situated between the first distal fin and an STI region.

Abstract: An analog integrated circuit is disclosed in which short channel transistors are stacked on top of long channel transistors, vertically separated by an insulating layer. With such a design, it is possible to produce a high density, high power, and high performance analog integrated circuit chip including both short and long channel devices that are spaced far enough apart from one another to avoid crosstalk. In one embodiment, the transistors are FinFETs and the long channel devices are multi-gate FinFETs. In one embodiment, single and dual damascene devices are combined in a multi-layer integrated circuit cell. The cell may contain various combinations and configurations of the short and long-channel devices. A high density cell can be made by simply shrinking the dimensions of the cells and replicating two or more cells in the same size footprint as the original cell.

Abstract: An apparatus including: a stacked structure including a first substrate having a flat surface; a flat first graphene layer adjacent the flat surface of the first substrate; a flat second graphene layer adjacent the flat first graphene layer; and a second substrate having a flat surface adjacent the flat second graphene layer. An apparatus including: a stacked structure including a substrate having a flat upper surface; a flat lower patterned layer overlying the flat upper surface of the substrate and including at least one patterned electrode; a flat lower graphene layer overlying the flat lower patterned layer; a flat upper graphene layer overlying the flat lower graphene layer; and a flat upper patterned layer overlying the flat upper graphene layer and including at least one patterned electrode.

Abstract: A resistive memory device and a fabrication method thereof are provided. The resistive memory device includes a bottom structure including a heating electrode, data storage materials, each of the data storage materials formed on the bottom structure in a confined structure perpendicular to the bottom structure, and having a lower diameter smaller than an upper diameter, an upper electrode formed on each of the data storage materials, and an insulation unit formed between adjacent data storage materials.

Abstract: A method for processing a semiconductor device, the method including; providing a first semiconductor layer including first transistors; forming interconnection layers overlying the transistors, where the interconnection layers include copper or aluminum; forming a shielding heat conducting layer overlaying the interconnection layers; forming an isolation layer overlaying the shielding heat conducting layer; forming a second semiconductor layer overlying the isolation layer, and processing the second semiconductor layer at a temperature greater than about 400° C., where the interconnection layers are kept at a temperature below about 400° C.

Abstract: A semiconductor chip in which a power MOSFET is placed above a semiconductor chip in which another power MOSFET is formed and they are sealed with an encapsulation resin. The semiconductor chips are so arranged that the upper semiconductor chip does not overlap with a gate pad electrode of the lower semiconductor chip in a plan view. The semiconductor chips are identical in size and the respective source pad electrodes and gate pad electrodes of the lower semiconductor chip and the upper semiconductor chip are identical in shape and arrangement. The lower semiconductor chip and the upper semiconductor chip are arranged with their respective centers displaced from each other. Accordingly, the size of a semiconductor device can be reduced.

Abstract: Methods for forming semiconductor structures are disclosed, including a method that involves forming sets of conductive material and insulating material, forming a first mask over the sets, forming a first number of contact regions, forming a second mask over a first region of the sets, and removing material from of the sets in a second, exposed region laterally adjacent the first region to form a second number of contact regions. Another method includes forming first and second contact regions on portions of sets of conductive materials and insulating materials, each of the second contact regions more proximal to an underlying substrate than each of the first contact regions. Apparatuses such as memory devices including laterally adjacent first and second regions each of which including contact regions of a different portion of a plurality of conductive materials and related methods of forming such devices are also disclosed.

Abstract: A semiconductor package including a plurality of stacked semiconductor die, and methods of forming the semiconductor package, are disclosed. In order to ease wirebonding requirements on the controller die, the controller die may be mounted directly to the substrate in a flip chip arrangement requiring no wire bonds or footprint outside of the controller die. Thereafter, a spacer layer may be affixed to the substrate around the controller die to provide a level surface on which to mount one or more flash memory die. The spacer layer may be provided in a variety of different configurations.

Abstract: A method includes providing a semiconductor chip having a first main surface and a second main surface. A semiconductor chip is placed on a carrier with the first main surface of the semiconductor chip facing the carrier. A first layer of solder material is provided between the first main surface and the carrier. A contact clip including a first contact area is placed on the semiconductor chip with the first contact area facing the second main surface of the semiconductor chip. A second layer of solder material is provided between the first contact area and the second main surface. Thereafter, heat is applied to the first and second layers of solder material to form diffusion solder bonds between the carrier, the semiconductor chip and the contact clip.

Abstract: An embodiment of the disclosure provides a chip package which includes: a semiconductor substrate having a first surface and a second surface; a first recess extending from the first surface towards the second surface; a second recess extending from a bottom of the first recess towards the second surface, wherein a sidewall and the bottom of the first recess and a second sidewall and a second bottom of the second recess together form an exterior side surface of the semiconductor substrate; a wire layer disposed on the first surface and extending into the first recess and/or the second recess; an insulating layer located between the wire layer and the semiconductor substrate; a chip disposed on the first surface; and a conducting structure disposed between the chip and the first surface.

Abstract: A method of testing a device includes setting a potential of a cap terminal of the device to a first voltage, setting a potential of a self test plate of the device to a testing voltage, and detecting a first displacement of a proof mass of the device when the cap terminal is set to the first voltage and the self test plate is set to the testing voltage. The method includes setting a potential of the cap terminal of the device to a second voltage, detecting a second displacement of the proof mass of the device when the cap terminal is set to the second voltage and the self test plate is set to the testing voltage, and comparing the first displacement and the second displacement to evaluate an electrical connection between the cap terminal and a cap of the device.

Abstract: An apparatus and method are provided for integrating TSVs into devices prior to device contacts processing. The apparatus includes a semiconducting layer; one or more CMOS devices mounted on a top surface of the semiconducting layer; one or more TSVs integrated into the semiconducting layer of the device wafer; at least one metal layer applied over the TSVs; and one or more bond pads mounted onto a top layer of the at least one metal layer, wherein the at least one metal layer is arranged to enable placement of the one or more bond pads at a specified location for bonding to a second device wafer. The method includes obtaining a wafer of semiconducting material, performing front end of line processing on the wafer; providing one or more TSVs in the wafer; performing middle of line processing on the wafer; and performing back end of line processing on the wafer.

Abstract: A method of manufacturing a semiconductor wafer, the method including: providing a first monocrystalline layer including semiconductor regions defined by a first lithography step; then overlaying the first monocrystalline layer with an isolation layer; preparing a second monocrystalline layer, after the first monocrystalline layer has been formed; transferring the second monocrystalline layer overlying the isolation layer; and then performing a second lithography step patterning portions of the first monocrystalline layer as part of forming at least one transistor in the first monocrystalline layer.

Abstract: A metal plate covers an opening on the upper surface of a core substrate and exposes an outer edge of the upper surface of the core substrate. A conductive layer covers the lower surface of the core substrate. A semiconductor chip bonded to a first surface of the metal plate is exposed through the opening. A first insulating layer covers the upper and side surface of the metal plate and the outer edge of the upper surface of the core substrate. A second insulating layer fills the openings of the metal plate and the conductive layer and covers the outer edge of the lower surface of the core substrate, the conductive layer, and the semiconductor chip. The metal plate is thinner than the semiconductor chip. Total thickness of the conductive layer and the core substrate is equal to or larger than the thickness of the semiconductor chip.

Abstract: A three-dimensional nonvolatile memory array includes a select layer that selectively connects vertical bit lines to horizontal bit lines. Individual select switches of the select layer include two separately controllable transistors that are connected in series between a horizontal bit line and a vertical bit line. Each transistor in a select switch is connected to a different control circuit by a different select line.

Abstract: Semiconductor device packages comprise a first semiconductor device comprising a heat-generating region located on at least one end thereof. A second semiconductor device is attached to the first semiconductor device. At least a portion of the heat-generating region extends laterally beyond at least one corresponding end of the second semiconductor device. A thermally insulating material at least partially covers the end of the second semiconductor device. Methods of forming a semiconductor device packages comprise attaching a second semiconductor device to a first semiconductor device. The first semiconductor device comprises a heat-generating region at an end thereof. At least a portion of the heat-generating region extends laterally beyond an end of the second semiconductor device. The end of the second semiconductor device is at least partially covered with a thermally insulating material.

Abstract: In a chip package, semiconductor dies in a vertical stack of semiconductor dies or chips (which is referred to as a ‘plank stack’) are aligned by positive features that are mechanically coupled to negative features recessed below the surfaces of adjacent semiconductor dies. Moreover, the chip package includes an interposer plate at approximately a right angle to the plank stack, which is electrically coupled to the semiconductor dies along an edge of the plank stack. In particular, electrical pads proximate to a surface of the interposer plate (which are along a stacking direction of the plank stack) are electrically coupled to pads that are proximate to edges of the semiconductor dies by an intervening conductive material, such as solder balls or spring connectors. Note that the chip package may facilitate high-bandwidth communication of signals between the semiconductor dies and the interposer plate.

Abstract: Capacitive micromachined ultrasonic transducer (“CMUT”) devices and fabrication methods are provided. The CMUT devices can include integrated circuit devices utilizing direct connections to various CMOS electronic components. The use of integrated connections can reduce overall package size and improve functionality for use in ultrasonic imaging applications. CMUT devices can also be manufactured on multiple silicon chip layers with each layer connected utilizing through silicon vias (TSVs). External power connections can be provided if high biasing voltages are required. Forward and side looking CMUT arrays can be manufactured for use in a variety of ultrasound technologies.

Abstract: A memory and a manufacturing method thereof are provided. A plurality of stacked structures extending along a first direction is formed on a substrate. Each of the stacked structures includes a plurality of first insulating layers and a plurality of second insulating layers. The first insulating layers are stacked on the substrate and the second insulating layers are respectively disposed between the adjacent first insulating layers. A plurality of trenches extending along the first direction is formed in each of the stacked structures. The trenches are respectively located at two opposite sides of each of the second insulating layers. A first conductive layer is filled in the trenches. A plurality of charge storage structures extending along a second direction is formed on the stacked structures and a second conductive layer is formed on each of the charge storage structures.

Abstract: A first bonding material layer is formed on a first substrate and a second bonding material layer is formed on a second substrate. The first and second bonding material layers include a metal. Ions are implanted into the first and second bonding material layers to induce structural damages in the in the first and second bonding material layers. The first and second substrates are bonded by forming a physical contact between the first and second bonding material layers. The structural damages in the first and second bonding material layers enhance diffusion of materials across the interface between the first and second bonding material layers to form a bonded material layer in which metal grains are present across the bonding interface, thereby providing a high adhesion strength across the first and second substrates.

Abstract: A nonvolatile semiconductor memory device includes: a semiconductor substrate; a stacked body provided on the semiconductor substrate, the stacked body having electrode films and insulating films being alternately stacked; a first and second semiconductor pillars; and a first and second charge storage layers. The first and second semiconductor pillars are provided inside a through hole penetrating through the stacked body in a stacking direction of the stacked body. The through hole has a cross section of an oblate circle, when cutting in a direction perpendicular to the stacking direction. The first and second semiconductor pillars face each other in a major axis direction of the first oblate circle. The first and second semiconductor pillars extend in the stacking direction. The first and second charge storage layers are provided between the electrode film and the first and second semiconductor pillars, respectively.

Abstract: A semiconductor device including: a first single crystal layer including first transistors, first alignment mark, and at least one metal layer, the at least one metal layer overlying the first single crystal layer and includes copper or aluminum; and a second layer overlying the metal layer; the second layer includes second transistors which include mono-crystal and are aligned to the first alignment mark with less than 40 nm alignment error, the mono-crystal includes a first region and second region which are horizontally oriented with respect to each other, the first region has substantially different dopant concentration than the second region.

Abstract: Memories and their formation are disclosed. One such memory has a first array of first memory cells extending in a first direction from a first surface of a semiconductor. A second array of second memory cells extends in a second direction, opposite to the first direction, from a second surface of the semiconductor. Both arrays may be non-volatile memory arrays. For example, one of the memory arrays may be a NAND flash memory array, while the other may be a one-time-programmable memory array.

Abstract: Systems and methods for stacking a memory chip with respect to an integrated circuit (IC) chip are described. In the systems and methods, a plurality of like memory chips are stacked above one or more IC chip members of a family. The use of a plurality of like memory chips for the family may save costs and complications involved in designing, fabricating, and assembling memory chips of different sizes. The use of a plurality of the memory chips on a single IC chip can enable higher data transfer rates due to parallel data transmission.

Abstract: A memory device includes a planar substrate, a plurality of horizontal conductive planes above the planar substrate, and a plurality of horizontal insulating layers interleaved with the plurality of horizontal conductive planes. An array of vertical conductive columns, perpendicular to the pluralities of conductive planes and insulating layers, passes through apertures in the pluralities of conductive planes and insulating layers. The memory device includes a plurality of programmable memory elements, each of which couples one of the horizontal conductive planes to a respective vertical conductive column.

Abstract: A method of three-dimensionally integrating elements such as singulated die or wafers and an integrated structure having connected elements such as singulated dies or wafers. Either or both of the die and wafer may have semiconductor devices formed therein. A first element having a first contact structure is bonded to a second element having a second contact structure. First and second contact structures can be exposed at bonding and electrically interconnected as a result of the bonding. A via may be etched and filled after bonding to expose and form an electrical interconnect to interconnected first and second contact structures and provide electrical access to this interconnect from a surface. Alternatively, first and/or second contact structures are not exposed at bonding, and a via is etched and filled after bonding to electrically interconnect first and second contact structures and provide electrical access to interconnected first and second contact structure to a surface.

Abstract: A method for fabricating a device, the method including: providing a first layer including first transistors, where the first transistors include a mono-crystalline semiconductor; overlaying a second semiconductor layer over the first layer; fabricating a plurality of memory cell control lines where the control lines include a portion of the second layer; where the second layer includes second transistors, where the second transistors include a mono-crystalline semiconductor, and where the second transistors are configured to be memory cells.

Abstract: One aspect relates to a memory circuit that has a programmable non-volatile memory (NVM) cell configured to generate an NVM output signal indicative of a program state of the NVM cell and to configure a volatile output based on the program state of the NVM cell. The NVM cell comprises a first anti-fuse device, a first select device connected in series with the first anti-fuse device at a first node, and a first pass device. The memory circuit also may have a programmable (independently of the NVM cell) volatile memory (VM) cell configured to receive the NVM output signal at a VM input node and to generate a VM output signal indicative of the program state of the VM cell. The NVM cell may have two NV elements that are separately programmable and are separately selectable via separate access transistors to drive the VM input node.

Abstract: One aspect relates to a memory circuit that has a programmable non-volatile memory (NVM) cell configured to generate an NVM output signal indicative of a program state of the NVM cell and to configure a volatile output based on the program state of the NVM cell. The NVM cell comprises a first anti-fuse device, a first select device connected in series with the first anti-fuse device at a first node, and a first pass device. The memory circuit also may have a programmable (independently of the NVM cell) volatile memory (VM) cell configured to receive the NVM output signal at a VM input node and to generate a VM output signal indicative of the program state of the VM cell. The NVM cell may have two NV elements that are separately programmable and are separately selectable via separate access transistors to drive the VM input node.