Inorganic Carbon Containing Coating Material, Not As Steel (e.g., Carbide, Etc.) Patents (Class 427/577)
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Publication number: 20090291323Abstract: A method of forming a thermal barrier coating on a turbine component is disclosed. The method comprises first depositing a bond coat on the turbine component. A dispersion strengthened ceramic layer containing boride particles as dispersoids is formed on the bond coat layer by plasma deposition. Ceramic coated boride particles comprise the plasma deposition feedstock in order to disperse the boride particles in the ceramic layer. The dispersion strengthened ceramic layer includes at least one of yttria-stabilized zirconia, rare earth stabilized zirconia, rare earth stabilized hafnia, and rare earth stabilized titanate.Type: ApplicationFiled: May 23, 2008Publication date: November 26, 2009Applicant: UNITED TECHNOLOGIES CORPORATIONInventors: Kevin W. Schlichting, Paul H. Zajchowski
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Publication number: 20090283716Abstract: The invention relates to a method for producing carbon electrodes by deposition on a substrate, to produce a fuel cell. The method comprises the steps of alternately and/or simultaneously depositing porous carbon and a catalyst onto the substrate by plasma spaying in a vacuum chamber. The catalyst is used to accelerate at least one of the chemical reactions that takes place in the fuel cell. The thickness of each layer of porous carbon is chosen so that the catalyst deposited on this carbon layer is distributed essentially throughout this layer, thereby by providing a layer of catalyzed carbon. The total thickness of catalyzed carbon in the electrode is less than 2 micrometers, and preferably equal to no more than 1 micrometer.Type: ApplicationFiled: November 28, 2006Publication date: November 19, 2009Inventors: Pascal Brault, Amael Caillard, Alain Leclerc
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Publication number: 20090286012Abstract: A method of performing plasma immersion ion processing (PIIP), particularly suited for processing three-dimensional objects. One or more such objects are placed in a conductive cage having solid or mesh walls. The cage completely encloses the objects. A voltage is applied to the cage, and the plasma is generated, resulting in the plasma being contained within the cage.Type: ApplicationFiled: May 15, 2008Publication date: November 19, 2009Applicant: Southwest Research InstituteInventors: Ronghua Wei, Chris Rincon, Edward Langa
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Publication number: 20090278114Abstract: The diameter of carbon nanotubes grown by chemical vapor deposition is controlled independent of the catalyst size by controlling the residence time of reactive gases in the reactor.Type: ApplicationFiled: June 12, 2009Publication date: November 12, 2009Applicant: International Business Machines CorporationInventors: Alfred Grill, Deborah Neumayer, Dinkar Singh
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Patent number: 7615203Abstract: A single crystal diamond grown by vapor phase synthesis, wherein when one main surface is irradiated with a linearly polarized light considered to be the synthesis of two mutually perpendicular linearly polarized light beams, the phase difference between the two mutually perpendicular linearly polarized light beams exiting another main surface on the opposite side is, at a maximum, not more than 50 nm per 100 ?m of crystal thickness over the entire crystal. This single crystal diamond is of a large size and high quality unattainable up to now, and has characteristics that are extremely desirable in semiconductor device substrates and are applied to optical components of which low strain is required.Type: GrantFiled: May 26, 2005Date of Patent: November 10, 2009Assignee: Sumitomo Electric Industries, Ltd.Inventors: Yoshiyuki Yamamoto, Kiichi Meguro, Takahiro Imai
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Publication number: 20090263592Abstract: A magnetic recording medium including a solid lubricant film containing a plasma-enhanced chemical vapor deposited perfluoropolyether is disclosed. Preferably, the solid lubricant is formed in the presence of oxygen and longer fluorocarbon chain to form perfluoropolyether, thereby enhancing the chain flexibility perfluoropolyether and in the presence of a hydrocarbon to stabilize the process, thereby allowing process control.Type: ApplicationFiled: March 30, 2009Publication date: October 22, 2009Applicant: Seagate Technology LLCInventors: Jianwei Liu, Michael Joseph Stirniman, Jing Gui, Lei Li, Yiao-Tee Hsia
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Publication number: 20090263593Abstract: The present invention provides a method for manufacturing a hard carbon film having a high sp3 bond ratio and excellent film quality. In one embodiment of the present invention, CH3 ions and CH3 radicals in plasma are irradiated to a substrate at an energy of 10 to 50 eV, thereby forming a carbon film having a ratio of sp3 bonds of 40% or higher.Type: ApplicationFiled: April 14, 2009Publication date: October 22, 2009Applicants: OSAKA UNIVERSITY, CANON ANELVA CORPORATIONInventors: Satoshi Hamaguchi, Yasuo Murakami
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Patent number: 7604834Abstract: The present invention discloses a method including: providing a substrate; and sequentially stacking layers of two or more diamond-like carbon (DLC) films over the substrate to form a composite dielectric film, the composite dielectric film having a k value of about 1.5 or lower, the composite dielectric film having a Young's modulus of elasticity of about 25 GigaPascals or higher.Type: GrantFiled: April 8, 2008Date of Patent: October 20, 2009Assignee: Intel CorporationInventor: Kramadhati V. Ravi
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Patent number: 7603962Abstract: A rotary type CVD film forming apparatus for mass production, wherein a film forming chamber is formed by providing one columnar body having a plurality of housing spaces for housing one plastic container each in one said housing space, a plurality of said film forming chambers is arranged on a rotation support body at equal intervals in a circular state, source gas introduction means serving as an external electrode which introduce a source gas that is converted to plasma inside the plastic containers housed in each of said film forming chambers is provided, and high frequency supply means which supply a high frequency to the external electrode of each of said film forming chambers is provided to form a CVD (chemical vapor growing) film on the internal surfaces of said plastic containers.Type: GrantFiled: June 19, 2003Date of Patent: October 20, 2009Assignees: Mitsubishi Shoji Plastics Corporation, Youtec Co., Ltd.Inventors: Kenichi Hama, Tsuyoshi Kage, Takumi Kobayashi, Takeharu Kawabe
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Publication number: 20090258164Abstract: This invention relates to a carbon structure manufacturing device, which forms carbon structures on a substrate. This manufacturing device comprises a first chamber, which forms a first space accommodating the substrate; a raw material gas supply device, which supplies raw material gas for formation of the carbon structures to the first space; a second chamber, which forms a second space separate from the first space; a gas supply device, which supplies gas for generation of plasma to the second space; a plasma generation device, which generates plasma in the second space; an aperture, connecting the first space and the second space; and, a plasma introduction device, which introduces plasma generated in the second space into the first space via the aperture; the raw material gas is used to form the carbon structures on the substrate.Type: ApplicationFiled: August 31, 2007Publication date: October 15, 2009Inventors: Hiroshi Nakai, Masaru Tachibana
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Patent number: 7601402Abstract: A method for forming a porous insulating film includes an insulating film forming step and a hole forming step. During the insulating film forming step, plasma processing of an organic siloxane group compound and an organic compound having a polar group forms an insulating film having a siloxane structure. Molecules of the organic compound having a polar group are contained within this siloxane structure. During the hole forming step, excitation gas removes molecules of the organic compound having a polar group to provide holes in the insulating film. According to this method, an insulating film with a predetermined thickness and holes formed uniformly in the thickness direction can be obtained.Type: GrantFiled: November 7, 2003Date of Patent: October 13, 2009Assignee: Tokyo Electron LimitedInventors: Yusaku Kashiwagi, Yoshihisa Kagawa, Kohei Kawamura, Gishi Chung
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Patent number: 7601405Abstract: A process and an arrangement by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding properties or the like, which has an adhesive layer for the arrangement on a substrate, a transition layer for the arrangement on the adhesive layer and a cover layer of an adamantine carbon, the adhesive layer including at least one element from the Group which contains the elements of the 4th, 5th and 6th Subgroup and silicon, the transition layer comprising carbon and at least one element from the above-mentioned Group, and the cover layer consisting essentially adamantine carbon, the layer system having a hardness of at least 15 GPa, preferably at least 20 GPa, and an adhesion of at least 3 HF.Type: GrantFiled: January 11, 2008Date of Patent: October 13, 2009Assignee: Oerlikon Trading AG, TruebbachInventors: Orlaw Massler, Mauro Pedrazzini, Christian Wohlrab, Hubert Eberle, Martin Grischke, Thorsten Michler
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Publication number: 20090246409Abstract: A DLC film mass-producing apparatus 10 includes a chamber 12 connected to ground. In the chamber 12, a plurality of plate-shaped substrates 60 are disposed in parallel at regular intervals, without disposing a counter electrode that faces each of the plate-shaped substrates 60. Sputtering cleaning is then conducted by plasma discharge and an underlying contact layer is formed on each of the plate-shaped substrates 60. Subsequently, a DLC film is produced on each of the plate-shaped substrates 60 by injecting a carbon source gas into the chamber 12 such that the internal pressure of the chamber 12 reaches 0.1 to 10 Pa and applying a negative DC pulse voltage having a pulse half width of 0.1 to 3 ?sec to each of the plate-shaped substrates 60 to generate plasma.Type: ApplicationFiled: March 30, 2009Publication date: October 1, 2009Applicant: NGK INSULATORS, LTD.Inventors: Takao Saito, Masashi Hayakawa
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Publication number: 20090246408Abstract: A method of aligning nanotubes is described, where a plurality of channels is provided on a substrate (100), a suspension of nanotubes is placed on or adjacent an open surface of the channels (102) and the suspension is allowed to flow into the channels to align the nanotubes substantially parallel to the longitudinal axis of the channels (104).Type: ApplicationFiled: July 27, 2007Publication date: October 1, 2009Applicant: Nanyang Technological UniversityInventors: Bee Eng Mary Chan, Qing Zhang, Yehai Yan, Sai Li, Longqing Chen
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Publication number: 20090214800Abstract: A vacuum chamber includes a radical beam irradiation part and a nanoparticle beam irradiation part. A substrate is held by a substrate holding part. The nanoparticle beam irradiation part irradiates the substrate with a beam of metal nanoparticles serving as a catalyst to form the catalyst on the substrate. Thereafter, the radical beam irradiation part generates a plasma from a source gas to irradiate the substrate with a beam of generated neutral radical species to grow a carbon nanotube on the substrate. The provision of an aperture in the radical beam irradiation part allows a relatively high degree of vacuum of 10?5 Torr to 10?3 Torr to be maintained in the vacuum chamber if the generation of the plasma involves a high pressure.Type: ApplicationFiled: January 19, 2009Publication date: August 27, 2009Inventor: Kimitsugu Saito
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Publication number: 20090214799Abstract: An integrated method and apparatus to continuously produce purified Single Wall Carbon Nanotubes (SWNT) from a continuous supply of solid carbon powder fed to an induction plasma torch. The apparatus includes a reactor body disposed to maintain laminar flow of gases with the torch body and coupled to a quenching body where temperature and residence time is controlled. Conveniently, functionalization may take place in the quenching body. The torch is operated with an argon carrier gas, an argon stabilizing gas and a helium sheath gas. Solid carbon reactants are preferably mixed with at least two metal catalysts containing nickel and cobalt with additional metal oxides of yttrium and cerium being desirable.Type: ApplicationFiled: March 14, 2006Publication date: August 27, 2009Inventors: Benoit Simard, Thomas Kingston, Stephane Denommoo, Gervais Soucy, German Cota Sanchez
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Patent number: 7578889Abstract: Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications and manufacturing yields are enhanced. Pre-cleaning of tools used in the cleaning process helps prevent contamination of the electrode being cleaned.Type: GrantFiled: March 30, 2007Date of Patent: August 25, 2009Assignee: Lam Research CorporationInventors: Hong Shih, Yaobo Yin, Shun Jackson Wu, Armen Avoyan, John E. Daugherty, Linda Jiang
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Patent number: 7563346Abstract: A mold having a multilayer diamond-like carbon film is provided. The mold includes: a molding surface; an adhesive layer formed on the molding surface; a densified layer formed on the adhesive layer, the adhesive layer being configured for enhancing bonding strength between the densified layer and the molding surface, and the densified layer being configured for enhancing a density of the multilayer diamond-like carbon film; an amorphous nitrogen-doped diamond-like carbon layer on the densified layer; an amorphous nitrogen-hydrogen-doped diamond-like carbon layer formed on the amorphous nitrogen-doped diamond-like carbon layer; and an amorphous hydrogen-doped diamond-like carbon layer formed on the nitrogen-hydrogen-doped diamond-like carbon layer.Type: GrantFiled: October 3, 2006Date of Patent: July 21, 2009Assignee: Hon Hai Precision Industry Co., Ltd.Inventor: Ga-Lane Chen
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Publication number: 20090176120Abstract: A method is described that can be used in electrodes for electrochemical devices and includes disposing a precious metal on a top surface of a corrosion-resistant metal substrate. The precious metal can be thermally sprayed onto the surface of the corrosion-resistant metal substrate to produce multiple metal splats. The thermal spraying can be based on a salt solution or on a metal particle suspension. A separate bonding process can be used after the metal splats are deposited to enhance the adhesion of the metal splats to the corrosion-resistant metal substrate. The surface area associated with the splats of the precious metal is less than the surface area associated with the top surface of the corrosion-resistant metal substrate. The thermal spraying rate can be controlled to achieve a desired ratio of the surface area of the metal splats to the surface area of the corrosion-resistant metal substrate.Type: ApplicationFiled: January 8, 2009Publication date: July 9, 2009Applicant: TREADSTONE TECHNOLOGIES, INC.Inventor: Conghua Wang
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Publication number: 20090169770Abstract: A barrier assembly having a flexible or rigid substrate overcoated with an all polymer multilayer stack. A multilayer on the substrate includes alternating diamond-like glass or carbon layers with polymer layers. Another multilayer includes alternating polymer layers using different types of polymers.Type: ApplicationFiled: March 9, 2009Publication date: July 2, 2009Inventors: Raghunath Padiyath, Moses M. David
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Publication number: 20090162572Abstract: The invention provides systems and methods for the deposition of an improved diamond-like carbon material, particularly for the production of magnetic recording media. The diamond-like carbon material of the present invention is highly tetrahedral, that is, it features a large number of the sp3 carbon-carbon bonds which are found within a diamond crystal lattice. The material is also amorphous, providing a combination of short-range order with long-range disorder, and can be deposited as films which are ultrasmooth and continuous at thicknesses substantially lower than known amorphous carbon coating materials. The carbon protective coatings of the present invention will often be hydrogenated. In a preferred method for depositing of these materials, capacitive coupling forms a highly uniform, selectively energized stream of ions from a dense, inductively ionized plasma.Type: ApplicationFiled: December 12, 2008Publication date: June 25, 2009Inventors: Vijayen Veerasamy, Manfred Weiler, Eric Li
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Publication number: 20090155490Abstract: The invention relates to a method for the plasma treatment of workpieces, particularly workpieces in the form of hollow bodies, in which a treatment zone in a reactor chamber is at least partially evacuated, a process gas is introduced into the treatment zone, particularly into the cavity of the workpiece, and a plasma is ignited by means of injected electromagnetic energy in the process gas introduced into the treatment zone, wherein the process gas flows through the treatment zone between opposite ends of the zone during the plasma treatment.Type: ApplicationFiled: August 24, 2006Publication date: June 18, 2009Applicant: SCHOTT AGInventors: Matthias Bicker, Robert Hormes, Manfred Lohmeyer
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Publication number: 20090148626Abstract: A filament post used in plasma-enhanced chemical vapor deposition has an outer shell and an inner post. An electrical potential is applied only to the inner post to ensure that there is no impact on the plasma density and the carbon film properties. The inner post and the outer shell are electrically insulated by ceramic insulators, such that no electrical potential is applied to outer shell. The stress generated in the carbon film is directly related to the electrical potential of the surface to which the film is deposited. The carbon film deposited on the outer shell of the post is not highly stressed, which significantly reduces film delamination from the filament post surfaces.Type: ApplicationFiled: December 6, 2007Publication date: June 11, 2009Applicant: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS BVInventors: Eric Hwang, Jinliu Wang, Richard Longstreth White
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Patent number: 7544397Abstract: The invention provides systems and methods for the deposition of an improved diamond-like carbon material, particularly for the production of magnetic recording media. The diamond-like carbon material of the present invention is highly tetrahedral, that is, it features a large number of the sp3 carbon-carbon bonds which are found within a diamond crystal lattice. The material is also amorphous, providing a combination of short-range order with long-range disorder, and can be deposited as films which are ultrasmooth and continuous at thicknesses substantially lower than known amorphous carbon coating materials. The carbon protective coatings of the present invention will often be hydrogenated. In a preferred method for depositing of these materials, capacitive coupling forms a highly uniform, selectively energized stream of ions from a dense, inductively ionized plasma.Type: GrantFiled: February 6, 2004Date of Patent: June 9, 2009Assignee: Stormedia Texas, LLCInventors: Vijayen Veerasamy, Manfred Weiler, Eric Li
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Publication number: 20090135521Abstract: To provide a high-quality protection target by forming a protective film that is thin and excellent in corrosion resistance. Provided is a protective film forming method for forming a protective film at least on a surface of a protection target. The method comprises: a base film forming step for forming a base film on the surface of the protection target; and a DLC film forming step for forming a diamond-like carbon film on the base film. The base film forming step forms the base film on the surface of the protection target for a plurality of times by repeating a process of depositing the base film in a prescribed thickness and eliminating a part of or a whole part of the base film. Further, the method comprises, before the DLC film forming step, an insulating layer forming step for forming an insulating layer on the surface of the base film on which the diamond-like carbon film is to be formed.Type: ApplicationFiled: September 10, 2008Publication date: May 28, 2009Applicants: SAE Magnetics (H.K.) Ltd, SIMADZU CORPORATIONInventors: Kunihiro Ueda, Hong Xin Fang, Dong Wang, Yoshiyuki Konishi, Satoko Ueno, Shigenobu Okada
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Patent number: 7534296Abstract: An electrically conductive diamond electrode and process for preparation thereof is described. The electrode comprises diamond particles coated with electrically conductive doped diamond preferably by chemical vapor deposition which are held together with a binder. The electrodes are useful for oxidation reduction in gas, such as hydrogen generation by electrolysis.Type: GrantFiled: March 17, 2006Date of Patent: May 19, 2009Assignee: Board of Trustees of Michigan State UniversityInventors: Greg Swain, Anne Fischer, Jason Bennett, Michael Lowe
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Publication number: 20090116367Abstract: The present invention relates to a data record carrier of the type with ferroelectric memory layer, its method of manufacture and a micro-tip recording system incorporating same. The invention applies in particular to computer-based or multimedia applications requiring high memory capacities. A record carrier according to the invention comprises a substrate, a counter-electrode deposited on the substrate and intended to cooperate with an electrode of a data reading and/or writing device, and at least one ferroelectric memory layer which is able to store these data and which exhibits a first face in close contact with said counter-electrode. According to the invention, the counter-electrode is made of a substance comprising a carbonaceous material chosen from the group consisting of carbon in the form of graphite or amorphous diamond, the carbides of a metallic or non-metallic element with the exclusion of ionic carbides, and their mixtures.Type: ApplicationFiled: October 31, 2008Publication date: May 7, 2009Inventor: Serge Gidon
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Patent number: 7517588Abstract: An apparatus and method of forming a composite body. The invention includes the steps of heating diamond crystals to a temperature about 1900° C. and simultaneously subjecting the diamond crystals to a pressure above about 40 k-bar, forming a diamond material layer having a first surface from the diamond crystals, providing a substrate, and bonding the first surface of the diamond material layer and the substrate under high pressure and high temperature. The composite body has a diamond material layer formed from diamond crystals. The diamond material layer has a first surface and a substrate. The first surface of the diamond material layer and the substrate are bonded together under high pressure and high temperature.Type: GrantFiled: September 14, 2004Date of Patent: April 14, 2009Inventor: Robert H. Frushour
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Patent number: 7514125Abstract: Methods of making an article having a protective coating for use in semiconductor applications are provided. In certain embodiments, a method of coating an aluminum surface of an article utilized in a semiconductor processing chamber is provided. The method comprises providing a processing chamber; placing the article into the processing chamber; flowing a first gas comprising a carbon source into the processing chamber; flowing a second gas comprising a nitrogen source into the processing chamber; forming a plasma in the chamber; and depositing a coating material on the aluminum surface. In certain embodiments, the coating material comprises an amorphous carbon nitrogen containing layer. In certain embodiments, the article comprises a showerhead configured to deliver a gas to the processing chamber.Type: GrantFiled: February 28, 2007Date of Patent: April 7, 2009Assignee: Applied Materials, Inc.Inventors: Deenesh Padhi, Chiu Chan, Sudha Rathi, Ganesh Balasubramanian, Jianhua Zhou, Karthik Janakiraman, Martin J. Seamons, Visweswaren Sivaramakrishnan, Derek R. Witty, Hichem M'Saad
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Patent number: 7514146Abstract: There is provided a multilayer substrate comprising, at least, a single crystal MgO substrate, an iridium (Ir) film heteroepitaxially grown on the MgO substrate, a diamond film vapor-deposited on the Ir film, wherein crystallinity of the Ir film is that a full width at half maximum (FWHM) of a diffracted intensity peak in 2 ?=46.5° or 2?=47.3° attributed to Ir (200) analyzed by X-ray diffraction method with a wavelength of ?=1.54 ? is 0.40° or less. Thereby, there is provided a multilayer substrate that is delamination-proof at the respective interfaces between the MgO substrate and the Ir film and between the Ir film and the diamond film, and, particularly, that has a single crystal diamond film of a large area as a continuous film.Type: GrantFiled: March 7, 2006Date of Patent: April 7, 2009Assignees: Shin-Etsu Chemical Co., Ltd.Inventors: Hitoshi Noguchi, Atsuhito Sawabe
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Publication number: 20090081383Abstract: A continuous, plasma-based process for the production of carbon-nanotube-infused fibers is disclosed.Type: ApplicationFiled: September 22, 2008Publication date: March 26, 2009Applicant: Lockheed Martin CorporationInventors: Mark R. Alberding, Tushar K. Shah, James A. Waicukauski, Jordan T. Ledford, Harry C. Malecki, Jack Braine, John A. LaRue
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Publication number: 20090075121Abstract: An apparatus and method for forming a carbon protective layer on a substrate using a plasma CVD method allows a more uniform in-plane distribution of the carbon protective layer thickness. The apparatus includes an annular anode that generates a plasma beam and a disk-shaped shield disposed between the anode and the substrate. The anode, the shield, and the substrate are concentrically arranged so that a straight line connecting the centers of the anode and the substrate is perpendicular to the deposition surface of the substrate where the carbon protective layer is to be formed. The center of the shield is also on the straight line.Type: ApplicationFiled: September 7, 2008Publication date: March 19, 2009Applicant: FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.Inventor: Naruhisa NAGATA
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Publication number: 20090075157Abstract: Provided are aligned carbon nanotubes for a fuel cell having a large surface area, a nanocomposite that includes the aligned carbon nanotubes loaded with highly dispersed nanoparticles of a metallic catalyst, methods of producing the carbon nanotubes and the nanocomposite, and a fuel cell including the nanocomposite. In the nanocomposite, nanoparticles of the metallic catalyst are uniformly distributed on external walls of the nanotubes. A fuel cell including the nanocomposite exhibits better performance.Type: ApplicationFiled: October 6, 2005Publication date: March 19, 2009Inventors: Chan-Ho Pak, Hyuk Chang, Sung-Ho Jin, Xiang-Rong Ye, Li-Han Chen
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Publication number: 20090061217Abstract: The present invention relates to a method of forming nanostructures or nanomaterials. The method comprises providing a thermal control barrier on a substrate and forming the nanostructures or nanomaterials. The method may, for example, be used to form carbon nanotubes by plasma enhanced chemical vapour deposition using a carbon containing gas plasma: The temperature of the substrate may be maintained at less than 350° C. while the carbon nanotubes are formed.Type: ApplicationFiled: May 11, 2006Publication date: March 5, 2009Applicant: SURREY NANOSYSTEMS LIMITEDInventors: Sembukutiarachilage Ravi Silva, Ben Paul Jensen, Guan Yow Chen
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Publication number: 20090029068Abstract: A carbon thin film manufacturing method includes depositing an intermediate layer on a surface of a substrate, and forming a diamond-like carbon coating on a surface of the intermediate layer. In the carbon thin film manufacturing method, a bias voltage within a range of 0 V to ?30 V is applied to the substrate during the deposition of the intermediate layer.Type: ApplicationFiled: July 25, 2008Publication date: January 29, 2009Inventors: Takaaki KANAZAWA, Kenji Shimoda, Masaki Nanahara, Hodo Suzuki, Naoyuki Omori
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Publication number: 20090029067Abstract: The invention relates to a method for forming high sp3 content amorphous carbon coatings deposited by plasma enhanced chemical vapor deposition on external surfaces. This method allows adjustment of tribological properties, such as hardness, Young's modulus, wear resistance and coefficient of friction as well as optical properties, such as refractive index. In addition the resulting coatings are uniform and have high corrosion resistance. By controlling pressure, type of diamondoid precursor and bias voltage, the new method prevents the diamondoid precursor from fully breaking upon impact with the substrate. The diamondoid retains sp3 bonds which yields a high sp3 content film at higher pressure. This enables a faster deposition rate than would be possible without the use of a diamondoid precursor.Type: ApplicationFiled: May 1, 2008Publication date: January 29, 2009Inventors: Steven F. Sciamanna, Andrew W. Tudhope, Robert M. Carlson, William J. Boardman, Thomas B. Casserly, Pankaj Jyoti Hazarika, Deepak Upadhyaya
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Publication number: 20090022907Abstract: A barrier coating of organic-inorganic composition, the barrier coating having optical properties that are substantially uniform along an axis of light transmission, said axis oriented substantially perpendicular to the surface of the coating.Type: ApplicationFiled: May 21, 2008Publication date: January 22, 2009Applicant: General Electric CompanyInventors: Tae Won KIM, Christian Maria Anton Heller, Marc Schaepkens, Ahmet Gun Erlat, Min Yan
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Publication number: 20090017230Abstract: Enhanced corrosion resistance is achieved in a coating by using a germanium-containing precursor and hollow cathode techniques to form a first layer directly on the surface of a workpiece, prior to forming an outer layer, such as a layer of diamond-like carbon (DLC). The use of a germanium or germanium-carbide precursor reduces film stress and enables an increase in the thickness of the subsequently formed DLC. Germanium incorporation also reduces the porosity of the layer. In one embodiment, a cap layer containing germanium is added after the DLC in order to further reduce the susceptibility of the coating to chemical penetration from the top.Type: ApplicationFiled: July 11, 2008Publication date: January 15, 2009Inventors: Andrew W. Tudhope, Thomas B. Casserly, Karthik Boinapally, Deepak Upadhyaya, William J. Boardman
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Publication number: 20090017222Abstract: Plasma Enhanced Bonding (PEB) during a coating process is used to improve both adhesion and corrosion resistance of the resulting coating. New interfacial compounds may be formed, offering the increased resistance to corrosion, as well as enhanced bonding to the workpiece being coated and any subsequently formed layer, such as diamond-like carbon. In one embodiment, the PEB processing is employed during coating of at least one interior surface of the workpiece, which may be a pipe. In a first step, a thin film is deposited. Then, the film is exposed to a high energy etch-back plasma. This two-step cycle of depositing a film and then providing bombardment of the film may be repeated a number of times. Typically, the deposition step of the cycle is much shorter than the bombardment step.Type: ApplicationFiled: December 31, 2007Publication date: January 15, 2009Inventors: Charles N. Dornfest, Deepak Upadhyaya, William John Boardman, Karthik Boinapally
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Publication number: 20090011232Abstract: A nanocomposite dry adhesive. The nanocomposite dry adhesive includes a substrate; and an array of vertically aligned single-walled carbon nanotubes or vertically aligned multi-walled carbon nanotubes on the substrate, wherein the nanocomposite dry adhesive utilizes the array of single-walled carbon nanotubes or multi-walled carbon nanotubes as synthesized, the as synthesized single-walled carbon nanotubes being substantially free of randomly entangled nanotube segments on top of the vertically aligned single-walled carbon nanotubes, the as synthesized multi-walled carbon nanotubes having randomly entangled nanotube segments on top of the vertically aligned multi-walled carbon nanotubes; wherein the dry adhesive has a normal adhesion strength of at least about 5 N·cm?2, and a shear adhesion strength of at least about 13 N·cm?2. Methods of making a nanocomposite dry adhesive are also described.Type: ApplicationFiled: July 5, 2007Publication date: January 8, 2009Applicant: UNIVERSITY OF DAYTONInventors: Liming Dai, Liangti Qu, Morley O. Stone
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Publication number: 20090011204Abstract: Carbon nanoflakes, methods of making the nanoflakes, and applications of the carbon nanoflakes are provided. In some embodiments, the carbon nanoflakes are carbon nanosheets, which are less than 2 nm thick. The carbon nanoflakes may be made using RF-PECVD. Carbon nanoflakes may be useful as field emitters, for hydrogen storage applications, for sensors, and as catalyst supports.Type: ApplicationFiled: October 4, 2004Publication date: January 8, 2009Inventors: Jianjun Wang, Mingyao Zhu, Brian C. Holloway, Ronald A. Outlaw, Dennis M. Manos, Xin Zhao
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Publication number: 20090011148Abstract: Adhesion between a copper metallization layer and a dielectric barrier film may be promoted by stabilizing a flow of a silicon-containing precursor in a divert line leading to the chamber exhaust. The stabilized gas flow is then introduced to the processing chamber to precisely form a silicide layer over the copper. This silicidation step creates a network of strong Cu—Si bonds that prevent delamination of the barrier layer, while not substantially altering the sheet resistance and other electrical properties of the resulting metallization structure.Type: ApplicationFiled: June 17, 2008Publication date: January 8, 2009Applicant: Applied Materials, Inc.Inventors: Nagarajan Rajagopalan, Bok Heon Kim, Lester A. D'Cruz, Zhenjiang Cui, Girish A. Dixit, Visweswaren Sivaramakrishnan, Hichem M'Saad, Meiyee Shek, Li-Qun Xia
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Publication number: 20090000663Abstract: Provided are to a dye-sensitized solar cell and method of manufacturing the same. The dye-sensitized solar cell includes a lower electrode having a carbon nanorod layer, and a dye layer provided between an upper electrode and the lower electrode and which includes a carbon nanotube.Type: ApplicationFiled: February 8, 2008Publication date: January 1, 2009Applicant: SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATIONInventors: Byungyou HONG, Jin Hyo Boo, Won Seok Choi, Yong Seob Park, Sung Uk Lee, Eun Chang Choi, Seong Hun Jeong
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Publication number: 20080318023Abstract: A hollow diamond shell with a size of a few micrometer to hundreds of micrometer and having a geometrical shape and its fabrication method are disclosed. A diamond film is deposited by a CVD method and porous grits are used as a victim substrate to be etched later, so that the substrate can be easily removed by a capillary phenomenon that an etching solution can be intensively absorbed in a substrate etching process. Thus, a perfect diamond shell with only a plurality of fine pores with a nano size without any conspicuous opening can be obtained. Also, a diamond shell with a small opening of below 10 percent of the surface area of grits can be fabricated by controlling a nuclear generation of diamond particles.Type: ApplicationFiled: April 13, 2006Publication date: December 25, 2008Inventors: Jae-Kap Lee, Phillip John
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Publication number: 20080317976Abstract: An amorphous carbon film forming apparatus according to the present invention is characterized by being provided with a film forming furnace 11; plural workpiece fixtures 23 for supporting plural plate-like workpieces 22 in a state that the same are piled up vertically in parallel with the interval between facing surfaces of two vertically adjoining of the plate-like workpieces 22 being in a range of 2 to 30 millimeters, the plural workpiece fixtures 23 being arranged within the film forming furnace 11 at a regular angular interval on a circle and being connected to a negative electrode; nozzles 31, 32 provided for supplying a processing gas and including at least one nozzle arranged at a center of the circle on which the plural workpiece fixtures 23 are arranged and plural nozzles arranged at a regular angular interval on another circle which surrounds the workpieces fixtures 23 radially outside thereof; and a plasma power supply connected to at least the workpiece fixtures 23.Type: ApplicationFiled: February 12, 2004Publication date: December 25, 2008Applicant: TOYODA KOKI KABUSHIKI KAISHAInventors: Junji Ando, Naoyuki Sakai, Toshiyuki Saito, Kazuyuki Nakanishi, Hiroyuki Mori, Hideo Tachikawa, Kyouji Itou, Mikio Fujioka, Yoshiyuki Funaki
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Publication number: 20080318085Abstract: A method of forming a carbon protective film is disclosed that improves electromagnetic conversion characteristics through reduction of the film thickness without any damage on a magnetic layer. Also disclosed is a magnetic recording medium that exhibits good electromagnetic conversion characteristics and corrosion resistance. The method of forming the carbon protective film uses a high frequency plasma CVD method on a disk including at least a magnetic film on a nonmagnetic substrate. A bias voltage in a range of ?200 V to zero V is applied at the beginning of discharge in a process of forming the carbon protective film, and a bias voltage in a range of ?500 V to ?200 V is applied at the end of discharge. Also disclosed is a magnetic recording medium having at least a magnetic film and a protective film on a nonmagnetic substrate, wherein the protective film is formed by the method of forming a protective film stated above according to the invention.Type: ApplicationFiled: June 11, 2008Publication date: December 25, 2008Applicant: FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.Inventors: Tuqiang LI, Masaki MIYAZATO, Tsuyoshi ONITSUKA, Makoto ISOZAKI, Hajime KURIHARA
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Publication number: 20080311313Abstract: For a substrate (W) placed in an airtight processing vessel (1), plasma is generated by introducing a microwave to a radial line slot antenna (4). Conditions are set such that the pressure in the processing vessel is in the range of from 7.32 Pa to 8.65 Pa, the microwave power is in the range of from 2000W to 2300W, the distance (L1) between the surface of the substrate and an opposed face of a raw-material supply member (3) is in the range of from 70 mm to 105 mm, and the distance (L2) between the surface of the substrate and an opposed face of a discharge gas supply member (2) is in the range of from 100 mm to 140 mm. Under these conditions, a raw-material gas consisting of a cyclic C5F8 gas is activated based on energy of the microwave. Consequently, film-forming species containing C4F6 ions and/or C4F6 radicals in a greater content can be obtained. Thus, a fluorine-added carbon film excellent in the leak properties and heat stability can be securely formed.Type: ApplicationFiled: October 4, 2005Publication date: December 18, 2008Applicant: TOKYO ELECTRON LIMITEDInventors: Yasuo Kobayashi, Tomohiro Ohta, Songyun Kang, Ikuo Sawada
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Publication number: 20080305277Abstract: Ion-assisted plasma enhanced deposition of diamond-like carbon (DLC) films on the surface of photovoltaic solar cells is accomplished with a method and apparatus for controlling ion energy. The quality of DLC layers is fine-tuned by a properly biased system of special electrodes and by exact control of the feed gas mixture compositions. Uniform (with degree of non-uniformity of optical parameters less than 5%) large area (more than 110 cm2) DLC films with optical parameters varied within the given range and with stability against harmful effects of the environment are achieved.Type: ApplicationFiled: August 7, 2008Publication date: December 11, 2008Inventors: FU-JANN PERN, KENELL J. TOURYAN, Zh. R. PANOSYAN, ALEKSEY ALEKSEYEVICH GIPPIUS
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Patent number: 7458585Abstract: There is provided a sliding member including a base body and a hard carbon coating formed on the base body to define a sliding surface for sliding contact with an opposing member under lubrication according to one embodiment of the present invention. The hard carbon coating has an outermost surface portion lower in hydrogen content than a remaining portion thereof, or an outermost coating layer lower in hydrogen content than at least one other coating layer.Type: GrantFiled: August 6, 2004Date of Patent: December 2, 2008Assignee: Nissan Motor Co., Ltd.Inventors: Takahiro Hamada, Makoto Kano, Yutaka Mabuchi
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Publication number: 20080293248Abstract: The present invention relates to a method of forming an amorphous carbon film and a method of manufacturing a semiconductor device using the method. An amorphous carbon film is formed on a substrate by vaporizing a liquid hydrocarbon compound, which has chain structure and one double bond, and supplying the compound to a chamber, and ionizing the compound. The amorphous carbon film is used as a hard mask film. It is possible to easily control characteristics of the amorphous carbon film, such as a deposition rate, an etching selectivity, a refractive index (n), a light absorption coefficient (k) and stress, so as to satisfy user's requirements. In particular, it is possible to lower the refractive index (n) and the light absorption coefficient (k). As a result, it is possible to perform a photolithography process without an antireflection film that prevents the diffuse reflection of a lower material layer.Type: ApplicationFiled: August 15, 2007Publication date: November 27, 2008Applicant: TES CO., LTD.Inventors: Keun Oh Park, Byoung Dae An, Seung Jun Lee