Abstract: The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): wherein R1, R2 and R3 each independently represent a hydrogen atom or a C1-C4 alkyl group, A1 represents a single bond or a C1-C2 alkylene group, R4 and R5 each independently represent a hydrogen atom or a C1-C2 alkyl group, R6 and R7 each independently represent a hydrogen atom etc.

Abstract: Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent ac

Abstract: A photosensitive resin composition for a laser engravable printing substrate, comprising resin (a) having a polymerizable unsaturated group whose number average molecular weight is in the range of 1000 to 20×104, organic compound (b) having a polymerizable unsaturated group whose number average molecular weight is <1000 and organosilicon compound (c) having at least one Si—O bond in each molecule and having no polymerizable unsaturated group in molecules, wherein the content of organosilicon compound (c) is in the range of 0.1 to 10 wt. % based on the whole of photosensitive resin composition.

Abstract: Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.

Abstract: A colored curable composition including at least (A-1) a complex including a compound represented by the following formula (I) and a metal atom or a metal compound, (A-2) a phthalocyanine pigment, (B) a dispersing agent, (C) a polymerizable compound, (D) a photopolymerization initiator, and (E) an organic solvent: wherein R1 to R6 each independently represent a hydrogen atom or a substituent, but R1 and R6 do not bond to each other to form a ring structure; and R7 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group.

Abstract: A color-forming photosensitive composition contains: a cyanine dye having at least two polymerizable groups selected from an acryloyl group, a methacryloyl group and a vinyl group; a radical generator; and a monomer having an ethylenically unsaturated group.

Abstract: Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes.

Abstract: Photosensitizing dyes are often used in conjunction with a photoacid generator in holographic recording media. Conventional photosensitizing dyes typically are limited by having an appreciable absorption of light when used in a sufficient concentration, such that the intensity of light decreases significantly with penetration into a recording medium. The present invention discloses a number of new 5-alkynyl substituted napthacene photosensitizing dyes that have low extinction coefficients coupled with good sensitizing properties, such that the problems associated with the photosensitizing dyes absorbing light are significantly reduced.

Abstract: Provided are new resins that comprise multi-ring, aromatic and/or multi-cyclic ester unit which preferably are photoacid-labile. Also provided are chemically-amplified positive photoresist that comprise such resins as well as multi-ring, aromatic and/or multi-cyclic ester monomers.

Abstract: With the objective of providing a photosensitive transparent resin composition that is reduced in the exposure illuminance dependency, allows high residual film ratio and little development scum and can stably form a pattern with good resolution, a color filter ensuring little decrease in the transmittance for visible light and enabling display of a high-quality definite image, and a production method thereof, there is provided a photosensitive transparent resin composition containing at least a polymerizable monomer, an alkali-soluble resin, a photopolymerization initiator and a compound represented by the following formula (I): wherein each of R1 and R2 independently represents a hydrogen atom, an alkyl group having a carbon number of 1 to 20 or an aryl group having a carbon number of 6 to 20, R1 and R2 may be the same or different but are not a hydrogen atom at the same time, R1 and R2 may form a cyclic amino group together with the nitrogen atom, each of R3 and R4 independently represents an electro

Abstract: Disclosed is a photosensitive paste comprising a polymerizable monomer and a photopolymerization initiator, wherein the glass transition temperature of the polymerizable monomer is ?10° C. or less. The present paste may be used for creating a fine pattern and prevents residue from remaining in the area where paste should be removed.

Abstract: The present invention provides a process for producing a titanium-containing metal oxide the coloration of which is decreased; a hologram recording material suitable for holographic memory recording using a blue laser, wherein a titanium-containing metal oxide the coloration of which is decreased is used as a metal oxide matrix; a process for producing the same; and a hologram recording medium. A process for producing a metal oxide comprising at least Ti as a metal element, the process comprising: providing an alkoxide compound of Ti to which a glycol other than any geminal diol and any vicinal diol is coordinated; hydrolyzing the alkoxide compound of Ti to which the glycol is coordinated, thereby yielding a precursor of a metal oxide; and advancing polycondensation reaction of the metal oxide precursor, thereby forming the metal oxide.

Abstract: A photosensitive planographic printing plate comprising a substrate and a photosensitive layer including a photopolymerizable compound, wherein the photosensitive layer and the substrate are provided between them with an undercoat layer including a (co)polymer having structural units having ethylenically unsaturated groups bonded with silicon atoms and phosphonic acid groups.

Abstract: The present invention provides a planographic printing plate precursor including on a support a photosensitive layer that contains a polymerizable composition containing a specific binder polymer having a repeating unit of formula (I), an infrared absorbent, a polymerization initiator and a polymerizable compound, wherein R1 represents a hydrogen atom or a methyl group; R2 represents a linking group which includes two or more atoms selected from a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom and a sulfur atom and has a number of atoms of 2 to 82; A represents an oxygen atom or —NR3— in which R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; and n represents an integer of 1 to 5. The invention also provides a planographic printing plate precursor provided with a specific photosensitive layer with respect to an alkaline developer.

Abstract: A radiation-sensitive composition and negative-working imagable element includes a polymeric binder that has a hydrophobic backbone and pendant salt groups that comprise a cation covalently attached to the hydrophobic backbone and a boron-containing anion forming a salt with the cation. The use of these particular polymers provides fast digital speed (high imaging sensitivity) and good printability (good shelf-life) even when the preheat step normally used between exposure and development, is omitted.

Abstract: Disclosed is a polymerizable composition characterized by containing at least (A) a photopolymerization initiator represented by the following general formula (1); (B) a coloring agent; (C) a polymerizable monomer; (D) a binder polymer; and (E) a solvent. wherein, in formula (1), R1 represents an aromatic group; R2 represents a group represented by any one of the above Formulae (2-1) to (2-3); R3 represents an alkyl group or the like; and A represents a single bond or —C(?O)—; X1, X2, and Y each independently represent a hydrogen atom, an alkyl group or the like and Z represents an atomic group which may form an arbitrary ring structure containing a carbon-carbon double bond.

Abstract: A photoresist composition contains a polyol compound and a vinyl ether compound, which polyol compound having an aliphatic group and an aromatic group bound alternately, and which aromatic group has an aromatic ring and two or more hydroxyl groups on the aromatic ring. The polyol compound can be prepared, for example, through an acid-catalyzed reaction, such as a Friedel-Crafts reaction, between an aliphatic polyol and an aromatic polyol. The aliphatic polyol is preferably an alicyclic polyol, whereas the aromatic polyol is preferably hydroquinone. The photoresist composition gives a resist film showing excellent alkali solubility and high etching resistance and thereby gives a resist pattern with less LER and less pattern collapse.

Abstract: A colored curable composition including: a resin obtained by reacting a polymer of an alkylene imine having 2 to 4 carbon atoms, a number average molecular weight of the polymer being 300 to 1,500, with a polyester having a carboxyl group at least one terminal, a number average molecular weight of the polyester being 1,000 to 1,000,000; a pigment; a photopolymerization initiator; a compound containing an ethylenically unsaturated double bond; and a solvent.

Abstract: A fully curable jettable composition having a viscosity less than 30 cps at a temperature within the range of 15° C.-180° C. comprising (i) at least one low viscosity reactive resin; (ii) at least one higher viscosity resin having a viscosity greater than twice that of the low viscosity resin and a functionality of greater than or equal to 2; (iii) at least one curable toughener, (iv) at least one initiator for the polymerization of the resins, and (v) at least one stabilizer for delaying the curing of the resins of the composition. The composition can be jetted from piezo electric printing heads under the control of a computer program to form a multi-layered article, for example, a three dimensional article, in which the adjacent droplets merge and are cured homogeneously together.

Abstract: An image forming medium includes a substrate; an imaging layer including an imaging material coated on said substrate, wherein the imaging material exhibits a reversible transition between a colorless state and a colored state; and a protective layer over the imaging layer, the protection layer including dipolar molecules that can be reversibly switch between a UV light transmission state and a UV light absorption state, wherein the dipolar molecules in their random orientation absorb in substantially the same spectral region as the imaging material in its un-imaged state, and wherein the imaging layer is imageable by ultraviolet light when the dipolar molecules are in the UV light transmission state, but the imaging layer is substantially not imageable by ultraviolet light when the dipolar molecules are in the UV light absorption state.

Abstract: A resin including (i) a main chain portion containing a nitrogen atom, (ii) a group X that has a functional group having a pKa of 14 or less and is bonded to a nitrogen atom present in the main chain portion, and (iii) an oligomer chain or polymer chain Y having a number average molecular weight of from 500 to 1,000,000 in a side chain.

Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.

Abstract: A method for generating spontaneously aligned surface wrinkles utilizes control of local moduli-mismatch and osmotic pressure. The method includes modifying the surface of an elastomeric layer to form a superlayer that is stiffer and/or less absorbent than the elastomeric layer. The elastomeric layer is then swollen with a polymerizable monomer, which causes buckling of the superlayer. The monomer is then polymerized, dimensionally stabilizing the surface buckling. The budded surfaces generated by the method are useful in a wide variety of end-use applications, including microlenses, microlens arrays, compound microlenses, diffraction gratings, photonic crystals, smart adhesives, mechanical strain sensors, microfluidic devices, and cell culture surfaces.

Abstract: Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.

Abstract: The photocurable composition for a sealant of the present invention includes a compound represented by general formula (1): A1-Y1—B1—Y2-A2??(1) (wherein A1 and A2 each represents, independently, a monovalent group having a cyclic ?-electron conjugated structure; Y1 and Y2 each represents, independently, a divalent group represented by general formula (4); and B1 represents (i) a divalent alicyclic hydrocarbon group, (ii) a divalent aromatic hydrocarbon group, (iii) a divalent heterocyclic group, (iv) a divalent aliphatic hydrocarbon group of 1 to 6 carbon atoms, or (v) a divalent group in which two or more group selected from the group consisting of a divalent alicyclic hydrocarbon group, a divalent aromatic hydrocarbon group, a divalent heterocyclic group, a divalent aliphatic hydrocarbon group of 1 to 6 carbon atoms, a carbonyl group, an ether group, a thioether group, and a SO2 group are linked).

Abstract: There is provided a photosensitive colored composition including a pigment, a polymerizable monomer, a photopolymerization initiator, and a compound represented by a general formula (I) [Each of R1 and R2 independently represents a hydrogen atom, an alkyl group with 1 to 20 carbon atoms, or an aryl group with 6 to 20 carbon atoms, where although R1 and R2 may be the same or different from each other, R1 and R2 do not represent a hydrogen atom at the same time. R1 and R2 may form a cyclic amino group with a nitrogen atom; and each of R3 and R4 independently represents an electron withdrawing group.

Abstract: A polymer comprising a high proportion of aromatic ring structure-containing units and containing an aromatic sulfonic acid sulfonium salt on a side chain is used to form a chemically amplified positive photoresist composition which is effective in forming a resist pattern having high etch resistance. The polymer overcomes the problems of dissolution in solvents for polymerization and purification and in resist solvents.

Abstract: A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting group from the acid group, is employed to form layers of a semiconductor device.

Abstract: A lithographic printing plate precursor, which comprises: a support; an image-recording layer; and a protective layer, in this order, wherein at least one of the image-recording layer and the protective layer comprises a phosphonium salt having a specific structure, and a lithographic printing process, which comprises: exposing a lithographic printing plate precursor; supplying an oil-based ink and a fountain solution comprising a phosphonium salt having a specific structure to the exposed lithographic printing plate precursor on a printing machine to remove an unexposed area of an image-recording layer; and conducting printing.

Abstract: A photosensitive adhesive composition comprising: (A) a polyimide having a carboxyl group as a side chain, whereof the acid value is 80 to 180 mg/KOH; (B) a photo-polymerizable compound; and (C) a photopolymerization initiator.

Abstract: A negative-working photopolymerization type photosensitive lithographic printing plate precursor for exposing with laser, includes: a hydrophilic support; at least one photopolymerizable photosensitive layer; and a protective layer, provided in this order, wherein the photopolymerizable photosensitive layer contains a sensitizing dye, a dye or pigment capable of absorbing light having a wavelength of a laser emission wavelength ±50 nm, which is different from the sensitizing dye; and a photopolymerization initiator.

Abstract: A lithographic printing process which comprises the steps of: imagewise scanning with a laser a presensitized lithographic plate which comprises a hydrophilic support and an image-recording layer containing a polymerization initiator, an ethylenically unsaturated polymerizable compound having no adherence to the hydrophilic support, and an ethylenically unsaturated polymerizable compound having adherence to the hydrophilic support and a molecular structure comprising a polyoxyalkylene group to polymerize the ethylenically unsaturated polymerizable compounds within the exposed area; removing the image-recording layer within the unexposed area from the lithographic plate mounted on a cylinder of a printing press; and then printing an image with the lithographic plate mounted on the cylinder of the printing press. A presensitized lithographic plate is also disclosed.

Abstract: A photo-sensitive adhesive for a flexible liquid crystal display is provided, comprising the following components: an urethane oligomer; a reactive monomer with phenyl group; and a photo-initiator. In an embodiment, the phenyl group of the reactive monomer has a weight ratio of 40 wt %, base on the total weight of the reactive monomer.

Abstract: A composition for forming a film for protecting wiring which in one aspect includes a polyimide precursor, a compound having at least two photopolymerizable groups, and a photopolymerization initiator, wherein the polyimide precursor includes a polyimide precursor obtained from a diamine component comprising a defined diamine compound. In other aspects, a dry film for forming a wiring-protecting film using the composition and a substrate having wiring protected by means of the dry film are provided.

Abstract: A soft mold resist for soft-lithography, a method for fabricating a soft mold, and a method for fabricating a liquid crystal display (LCD) device using the same where the soft mold includes a hydrophilic liquid prepolymer, a photoinitiator; and a surface active agent. A soft mold is formed by applying the soft mold resist to a back plate or a master plate and transferring a predefined pattern from the master plate to the soft mold resist. A display is formed by applying the soft mold to an etch resist layer overlying a thin film and transferring the predefined pattern to the etch resist, then etching the thin film using the etch resist as a mask. Additional processing step are carried out to form the LCD device.

Abstract: Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs<5, wherein the acidic functional group can be present as a free acid group or in the form of a salt; (c) drying.

Abstract: Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II wherein R1 inter alia is C4-C9cycloalkanoyl, C3-C12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar1 is either C6-C20aryl or C6-C20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a.

Abstract: The volume hologram recording photosensitive composition provided by the present invention contains at least a fluorine-contained photoreactive compound represented by the following formula (1): R1—R3—(CF2)n-R4—R2 wherein R1 and R2 are photoreactive groups which can be bonded to each other by photoreaction, and each of R3 and R4 is independently a single bond or a bivalent hydrocarbon group having 1 to 5 carbon atoms, and n is an integer of 1 or more. This volume hologram recording photosensitive composition is used to form a recording section of a recording medium, and then the section is exposed to light, whereby a bright volume hologram can be obtained.

Abstract: A lithographic printing plate precursor includes: a support; and a photosensitive layer containing (A) an initiator compound, (B) a polymerizable compound and (C) a binder, wherein the photosensitive layer or other layer in contact with the support contains as (D) a component different from the component (C), a copolymer containing (a1) a repeating unit having at least one ethylenically unsaturated bond introduced through an ion pair and (a2) a repeating unit having at least one functional group capable of interacting with a surface of the support.

Abstract: Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods of forming such structures.

Abstract: There is provided a polymerizable composition comprising (A) a binder polymer, (B) a polymerizable compound having an unsaturated group, and (C) a diaryl iodonium salt having at least two electron-donating groups. The iodonium salt (C) preferably has three or more electron-donating groups. This polymerizable composition is useful as a recording layer of a negative type planographic printing plate precursor.

Abstract: A novel coating for lithographic printing plates can be imagewise exposed to radiation and then directly processed with only water to remove the non-exposed regions of the coating. The coating comprises a polymer, a monomer and/or oligomer, polymerization or cross link initiator, stabilizer, and dye or pigment, such that after imaging, the non-imaged resin areas are removable from the planar surface by penetration of water through the non-imaged coating without dissolution of the resin components of the coating, to form a lithographic printing plate with clearly defined image and non-image areas. The stabilizer is a solvent soluble, partially water soluble, non-polymerizable organic component that enables the coating to be removable by water in the non-cross linked areas.

Abstract: A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a pigment. A color filter formed from the photoresist composition has a relatively greater light-transmittance. Thus, a contrast of a display apparatus having the color filter may be improved.

Abstract: A method for preparing a lithographic printing plate comprising: exposing a lithographic printing plate precursor comprising a hydrophilic support, a photosensitive layer containing (A) a sensitizing dye having an absorption maximum in a wavelength range of from 350 to 450 nm represented by the formula (I) or (II) as defined herein, (B) a polymerization initiator, (C) a polymerizable compound and (D) a hydrophobic binder polymer having an acid value of 0.3 meq/g or less and a protective layer provided in this order with a laser beam of from 350 to 450 nm; and rubbing a surface of the exposed lithographic printing plate precursor with a rubbing member in a presence of a developer having pH of from 2 to 10 in an automatic processor equipped with the rubbing member to remove the protective layer and an unexposed area of the photosensitive layer.

Abstract: A lithographic printing plate precursor includes: a support; and a photosensitive layer containing a binder polymer containing a positively charged nitrogen atom in at least one of a main chain and a side chain of the binder polymer, a compound containing an ethylenically unsubstituted bond; and a radical polymerization initiator.

Abstract: To provide a development system for lithographic printing plate precursors using a neutral developer, capable of preventing the non-image area of the resulting printing plates from being stained. In developing a lithographic printing plate precursor with a neutral developer having a pH of from 5.8 to 8.6, ultrasonic waves and/or an electric current are imparted to the neutral developer.

Abstract: The photosensitive resin composition of the invention is characterized by comprising (A) a binder polymer, (B) a photopolymerizing compound with at least one polymerizable ethylenic unsaturated bond in the molecule, (C) a photopolymerization initiator and (D) a compound represented by the following general formula (1). In formula (1), R1, R2, R3 and R4 are each independently hydrogen or a compound of the following general formula (2). In general formula (2), R5 represents a C4-30 hydrocarbon group.

Abstract: The positive resist composition including a base material component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid generator component (B) which generates acid upon exposure, the positive resist composition characterized in that in those cases where a resist film is formed on a substrate using the positive resist composition and is then subjected to a selective exposure and developing to form a hole pattern, followed by a bake treatment, a bake treatment temperature (Tf), at which the size of the hole is reduced by 10%, as compared to the size of the hole before the bake treatment, is at least 100° C.

Abstract: A lithographic printing plate precursor includes, in the following order: a support; an image-recording layer which is capable of being removed with at least one of printing ink and dampening water and contains a polymerizable compound represented by the formula (1) as defined herein, a polymer particle containing a structural unit represented by the formula (2) as defined herein and a structural unit represented by the formula (3) as defined herein, an infrared absorbing agent and a polymerization initiator; and an overcoat layer.

Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.