Radiation Sensitive Composition Comprising Ethylenically Unsaturated Compound Patents (Class 430/281.1)
  • Patent number: 8168691
    Abstract: Coating compositions suitable for UV imprint lithographic applications are disclosed that include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; and at least one photoacid generator soluble in a selected one or both of the at least one monofunctional ether compound and the at least one vinyl ether compound, wherein the at least one monofunctional ether compound and the at least one vinyl ether compound are free from fluorine and silicon substituents. Also disclosed are imprint processes.
    Type: Grant
    Filed: February 9, 2009
    Date of Patent: May 1, 2012
    Assignees: International Business Machines Corporation, JSR Corporation
    Inventors: Frances A. Houle, Taiichi Furukawa
  • Patent number: 8168109
    Abstract: Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes.
    Type: Grant
    Filed: August 21, 2009
    Date of Patent: May 1, 2012
    Assignees: International Business Machines Corporation, JSR Corporation
    Inventors: Frances A. Houle, Sally A. Swanson, Taiichi Furukawa
  • Patent number: 8168369
    Abstract: The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: May 1, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Chang Ho Cho, Sung Hyun Kim, Raisa Kharbash, Keon Woo Lee, Dong Kung Oh, Won Jin Chung, Sang Kyu Kwak, Chang Soon Lee
  • Patent number: 8168689
    Abstract: A high optical contrast pigment and colorful photosensitive composition employing the same are disclosed. The composition comprises a solvent, an alkali-soluble resin, reactive monomer, and a modified pigment which has low crystallization. The low crystallization degree means that the grain size variation R is not more 80%, wherein the grain size variation R is represented by a formula R=G1/G0×100%, G0 is the original grain size, and G1 is the grain size after modification.
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: May 1, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Chin-Cheng Weng, Kuo-Tung Huang, I-Jein Cheng, Ming-Tzung Wu, Yu-Ying Hsu, Chiang-Yun Li
  • Patent number: 8168371
    Abstract: It is an object of the present invention to provide a positive photosensitive resin composition capable of easily forming an image having high water repellency and high oil repellency on a surface of a cured film thereof even after a treatment with oxygen plasma or the like, and also having an insulating property with high precision and high throughput; and a cured film suitable for a film material of various displays obtained using the positive photosensitive resin composition.
    Type: Grant
    Filed: January 18, 2008
    Date of Patent: May 1, 2012
    Assignee: Nissan Chemical Industries, Ltd.
    Inventor: Tadashi Hatanaka
  • Publication number: 20120100481
    Abstract: An actinic ray-sensitive or radiation-sensitive composition, including: (1) a low molecular compound having a molecular weight of 500 to 5,000 and containing (G) an acid-decomposable group; and (2) a compound capable of generating an acid of 305 ?3 or more in volume upon irradiation with an actinic ray or radiation, an actinic ray-sensitive or radiation-sensitive composition, including: a solvent; and (1A) a compound which is a low molecular compound having a molecular weight of 500 to 5,000 and containing (Z) one or more groups capable of decomposing upon irradiation with an actinic ray or radiation to produce an acid, (G) one or more acid-decomposable groups and (S) one or more dissolution auxiliary groups, wherein assuming that the number of the functional groups in one molecule of (Z), (G) and (S) is z, q and s, respectively, q/z?2 and s/z?2, and a pattern forming method using the composition are provided.
    Type: Application
    Filed: July 28, 2010
    Publication date: April 26, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Takayuki Ito, Tomotaka Tsuchimura, Takeshi Kawabata
  • Publication number: 20120099214
    Abstract: Disclosed is a colored photosensitive resin composition for a color filter of a solid state imaging device using an ultra-short wavelength exposing device of 300 nm or less, a color filter and a solid state imaging device including the same. The colored photosensitive resin composition can fabricate a color filter having a micro-patterned colored pattern. The color filter can be advantageously applied to a solid state imaging device.
    Type: Application
    Filed: July 1, 2010
    Publication date: April 26, 2012
    Applicant: DONGWOO FINE-CHEM CO., LTD
    Inventors: Sang Haeng Lee, Seung No Lee, Jeung Hoon On, Ji Min Chun
  • Publication number: 20120094233
    Abstract: On-press developable, negative-working, infrared radiation-sensitive lithographic printing plate precursors have an imageable layer on a substrate. The imageable layer includes a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to infrared radiation, a polymeric binder, a first infrared radiation absorbing compound that has a tetraaryl pentadiene chromophore, and a second infrared radiation absorbing compound that is different than the first infrared radiation absorbing compound. The first IR absorbing compound absorbs in both the IR and visible regions of the electromagnetic spectrum and provides coloration for visual inspection of the lithographic printing plates.
    Type: Application
    Filed: October 18, 2010
    Publication date: April 19, 2012
    Inventors: Celin Savariar-Hauck, Gerhard Hauck
  • Publication number: 20120094237
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.
    Type: Application
    Filed: June 30, 2010
    Publication date: April 19, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Kana Fujii, Toru Fujimori
  • Publication number: 20120092632
    Abstract: Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern at a first wavelength of light. The first wavelength of light alters a solubility of the photoresponsive organic material. The photoresponsive material is also illuminated with a second optical pattern at a second wavelength of light. The second wavelength of light hinders the ability of the first wavelength of light to alter the solubility of the photoresponsive organic material where the second optical pattern overlaps the first optical pattern. The photoresponsive organic material is then developed.
    Type: Application
    Filed: April 1, 2011
    Publication date: April 19, 2012
    Applicant: The Regents of the University of Colorado, a body corporate
    Inventors: Robert R. McLeod, Christopher N. Bowman, Timothy F. Scott, Amy C. Sullivan
  • Patent number: 8158981
    Abstract: The present invention provides a photosensitive resin composition comprising a component (a): a siloxane resin obtained by hydrolyzing and condensing a silane compound comprising a compound represented by the general formula (1) shown below, a component (b): a solvent dissolving the component (a) therein, and a component (c): a quinonediazide sulfonic acid ester. wherein R1 represents an organic group; A represents a divalent organic group; and X represents a hydrolyzable group, wherein plural X groups in one molecule may be the same or different.
    Type: Grant
    Filed: September 19, 2007
    Date of Patent: April 17, 2012
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Kouichi Abe, Kei Kasuya, Tetsushi Maruyama, Yousuke Aoki, Kyouko Kojima, Daisuke Ryuzaki
  • Patent number: 8158212
    Abstract: An ink composition is provided that includes (A) an N-vinyllactam, (B) another polymerizable compound, (C) a polymerization initiator, and (D) a basic compound, the content of the N-vinyllactam (A) being less than 15 wt % of the total weight of the ink composition. There is also provided an inkjet recording method that includes (a1) a step of discharging the ink composition onto a recording medium and (b1) a step of curing the ink composition by irradiating the discharged ink composition with actinic radiation. There is also provided a printed material recorded by the inkjet recording method.
    Type: Grant
    Filed: February 15, 2008
    Date of Patent: April 17, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Kaoru Tojo, Hironori Ohnishi
  • Publication number: 20120088191
    Abstract: A positive-working lithographic printing plate precursor is disclosed which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer a heat and/or light-sensitive coating including an infrared absorbing agent and a compound including a benzoxazine group.
    Type: Application
    Filed: June 3, 2010
    Publication date: April 12, 2012
    Applicant: AGFA GRAPHICS NV
    Inventors: Xavier André, Philippe Moriamé, Hubertus Van Aert
  • Publication number: 20120088190
    Abstract: The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W represents a C3-C36 aliphatic ring in which one or more —CH2— can be replaced by —O—, —S—, —CO— or —SO2— and in which one or more hydrogen atoms can be replaced by a hydroxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C3-C12 alicyclic hydrocarbon group or a C6-C10 aromatic hydrocarbon group, Rf is independently in each occurrence a fluorine atom or a C1-C6 fluorinated alkyl group, n represents an integer of 1 to 10, and Z+ represents an organic counter ion.
    Type: Application
    Filed: October 3, 2011
    Publication date: April 12, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji ICHIKAWA, Mitsuyoshi OCHIAI, Takashi HIRAOKA
  • Patent number: 8151705
    Abstract: A method for preparing a lithographic printing plate includes treating a lithographic printing plate precursor including a hydrophilic support and an image-forming layer containing the following (i) to (iii) with an aqueous solution having a buffering ability: (i) a binder polymer comprising a repeating unit having a structure represented by the following formula (1); (ii) an ethylenically unsaturated compound; and (iii) a polymerization initiator, P-L-(CO2H)n??(1) wherein P represents a part constituting a main chain skeleton of the polymer, L represents an (n+1) valent connecting group, and n represents an integer of 1 or more.
    Type: Grant
    Filed: September 24, 2009
    Date of Patent: April 10, 2012
    Assignee: Fujifilm Corporation
    Inventors: Yoshinori Taguchi, Koji Wariishi, Atsushi Sugasaki
  • Patent number: 8148047
    Abstract: A carboxyl resin according to the present invention is obtained by a process including following steps: epoxy groups on a resin (a) having two or more epoxy groups in one molecule is made to react with 0.3-0.85 mol of a monocarboxylic acid (b) per one epoxy-group equivalent weight to obtain a reaction product (c); the epoxy group or groups on the reaction product (c) are made to react with 0.15-0.95 mol of a polybasic acid (d) per one epoxy-group equivalent weight to obtain a reaction product (e); and the epoxy group or groups on the reaction product (e) are further made to react with 1.0-5.0 mol of a monocarboxylic acid (f) per one epoxy-group equivalent weight. The carboxyl resin thus obtained has an acid value within a range from 20 to 200 mgKOH/g and is soluble in an organic solvent.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: April 3, 2012
    Assignee: Goo Chemical Company, Ltd.
    Inventors: Koichi Ikegami, Noboru Kohiyama, Teppei Nishikawa, Michiya Higuchi, Nobuhito Hamada, Hiroko Daido, Chieko Inui, Tatsuya Kubo
  • Patent number: 8148048
    Abstract: A method of processing an on-press developable lithographic printing plate involving the removal of the overcoat after laser imaging and before on-press development is described. The plate comprises a substrate, an on-press ink and/or fountain solution developable photosensitive layer, and an overcoat. The laser imaged plate is mechanically stripped off the overcoat, and then developed with ink and/or fountain solution on a lithographic press. Such a process allows the use of overcoat to achieve faster photospeed and improved durability of the plate without having various issues as related to overcoat such as contamination to the fountain solution, difficulty to remove of certain overcoat, and limited white light stability.
    Type: Grant
    Filed: February 14, 2008
    Date of Patent: April 3, 2012
    Inventor: Gary Ganghui Teng
  • Patent number: 8148045
    Abstract: A novel compound is a highly-sensitive photopolymerization initiator with excellent stability, low sublimability, excellent developability, and high transmittance in the visible region. It efficiently absorbs, and is activated by, near-ultraviolet rays such as at 365 nm. Also provided are a photopolymerization initiator and a photosensitive composition using such compound. An oxime ester compound is represented by the following general formula (I), a photopolymerization initiator containing the same, and a photosensitive composition containing the photopolymerization initiator and a polymerizable compound having an ethylenically unsaturated bond: R1 and R2 each represent R11, COR11, CONR12R13, CN, etc.; R11, R12, and R13 each represent a C1-20 alkyl group, etc.; R3 and R4 each represent R11, OR11, COR11, CONR12R13, OCOR11, CN, a halogen atom, etc.; a and b each represent an integer 0-4; X represents an oxygen atom, a sulfur atom, etc.
    Type: Grant
    Filed: November 19, 2010
    Date of Patent: April 3, 2012
    Assignee: Adeka Corporation
    Inventors: Kiyoshi Murata, Takeo Oishi, Koichi Kimijima
  • Publication number: 20120076996
    Abstract: Provided is a resist composition, including (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, the compound being any of those of general formulae (I) and (II) below, (C) a resin containing at least either a fluorine atom or a silicon atom, and (D) a mixed solvent containing a first solvent and a second solvent, at least either the first solvent or the second solvent exhibiting a normal boiling point of 200° C. or higher.
    Type: Application
    Filed: September 27, 2011
    Publication date: March 29, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Kei YAMAMOTO, Yusuke IIZUKA, Akinori SHIBUYA, Shuhei YAMAGUCHI
  • Publication number: 20120077125
    Abstract: A resist composition for immersion exposure, including a base component that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component that generates acid upon exposure, and a fluorine-containing compound represented by a general formula (c-1) that is decomposable in an alkali developing solution: wherein R1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(?O)— group in general formula (c-1); and R2 represents an organic group having a fluorine atom.
    Type: Application
    Filed: December 2, 2011
    Publication date: March 29, 2012
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Daiju Shiono, Takahiro Dazai, Sanae Furuya, Tomoyuki Hirano, Takayoshi Mori
  • Patent number: 8142982
    Abstract: A lithographic printing plate precursor capable of being subjected to on-press development by supplying at least one of printing ink and dampening water and including a support, an image-recording layer and optionally an undercoat layer between the support and the image-recording layer, wherein at least one of the undercoat layer and the image-recording layer contains at least one of a compound represented by the formula (1A) as defined herein and a compound including a structure represented by the formula (1B) as defined herein.
    Type: Grant
    Filed: October 28, 2008
    Date of Patent: March 27, 2012
    Assignee: Fujifilm Corporation
    Inventors: Toyohisa Oya, Ryuki Kakino, Tomoya Sasaki, Yu Iwai
  • Patent number: 8142978
    Abstract: The invention provides a planographic printing plate precursor having at least: a support; and an image recording layer that is provided on the support, the image recording layer comprising: an infrared ray absorbing agent (A); a polymerization initiator (B); a polymerizable compound (C); and a compound (D) represented by the following Formula (I). In Formula (I), at least one of R1 to R3 represents —(CH2CH2O)n—R4, while the remainder of R1 to R3 respectively independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or R5—COOH; R4 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; n represents an integer of 1 to 20; and R5 represents an alkylene group having 1 to 6 carbon atoms. The invention further provides a printing method using the planographic printing plate precursor and performing on-press development.
    Type: Grant
    Filed: May 12, 2008
    Date of Patent: March 27, 2012
    Assignee: Fujifilm Corporation
    Inventor: Norio Aoshima
  • Patent number: 8142983
    Abstract: A lithographic printing plate precursor is provided that, using laser exposure, exhibits an excellent capacity for plate inspection, an excellent on-press development performance or gum development performance, and an excellent scumming behavior, while maintaining a satisfactory printing durability. There is also provided a method of lithographic printing that uses this lithographic printing plate precursor. The lithographic printing plate precursor comprises an image recording layer having (A) a nonionic polymerization initiator that contains at least two cyclic imide structures, and (B) a compound that has at least one addition-polymerizable ethylenically unsaturated bond.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: March 27, 2012
    Assignee: Fujifilm Corporation
    Inventor: Shota Suzuki
  • Publication number: 20120070780
    Abstract: The present invention relates to a photosensitive resin composition including an acid modified oligomer, a photopolymerizable monomer, a thermosetting binder resin, a photoinitiator, and a thioxanthone compound, a dry film solder resist obtained from the resin composition, and a circuit board including the dry film solder resist.
    Type: Application
    Filed: September 16, 2011
    Publication date: March 22, 2012
    Applicant: LG CHEM, LTD.
    Inventors: Bo-Yun CHOI, Byung-Ju CHOI, Woo-Jae JEONG, Kwang-Joo LEE, Min-Su JEONG
  • Publication number: 20120070781
    Abstract: An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.
    Type: Application
    Filed: March 26, 2010
    Publication date: March 22, 2012
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Mami Katayama, Shunji Fukuda, Katsuya Sakayori, Kouji Kawaguchi
  • Publication number: 20120070782
    Abstract: A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
    Type: Application
    Filed: November 22, 2011
    Publication date: March 22, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Wu-Song Huang, Irene Popova, Pushkara Rao Varanasi, Libor Vyklicky
  • Patent number: 8137896
    Abstract: A negative-working lithographic printing plate precursor can be imaged with infrared radiation and processed in a single step using a single processing solution having a pH of from about 3 to 11. The precursor has a primary polymeric binder that comprises recurring units derived from one or more N-alkoxymethyl(meth)acrylamides, provided that such recurring units are present in the primary polymeric binder in an amount of at least 10% based on the total dry primary polymeric binder weight. In addition, the primary polymeric binder is present in an amount of from about 12 to about 70% based on total imageable layer dry weight. The imaged precursor can be processed off-press or on-press.
    Type: Grant
    Filed: July 29, 2008
    Date of Patent: March 20, 2012
    Assignee: Eastman Kodak Company
    Inventors: Jayanti Patel, Paul R. West, Shashikant Saraiya, Nicki R. Miller, Frederic E. Mikell
  • Patent number: 8137892
    Abstract: Disclosed is a photobase generator comprising a compound having a nitrogen atom and a conjugated multiple bond.
    Type: Grant
    Filed: December 12, 2007
    Date of Patent: March 20, 2012
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Katsuya Shimizu, Fumio Matsushita
  • Patent number: 8137890
    Abstract: The invention provides a colored photosensitive composition including: a coloring agent with a content of from 50% by weight to 80% by weight with respect to the total solid content of the composition; an oxime-based initiator with a content of from 5% by weight to 20% by weight with respect to the total solid content of the composition; and a resin containing at least one first structural unit represented by any one of the following formulae (1) to (3) containing an unsaturated double bond, and at least one second structural unit represented by the following formula (4) containing an acid group, wherein a ratio of the first structural unit to the second structural unit is 1.5 or more (molar ratio).
    Type: Grant
    Filed: August 15, 2008
    Date of Patent: March 20, 2012
    Assignee: Fujifilm Corporation
    Inventors: Hideki Takakuwa, Kazuto Shimada
  • Patent number: 8133651
    Abstract: Negative lithographic printing plate having on a substrate a photosensitive layer comprising an alkaline soluble polymeric binder, an alkaline insoluble polymeric binder, a polymerizable monomer, and an initiator is described. The photosensitive layer is imagewise exposed with a radiation to cause hardening in the exposed areas, and then developed to remove the non-hardened areas. The combination of both alkaline soluble polymeric binder and alkaline insoluble polymeric binder in a photosensitive layer can give excellent combined durability, developability, and coatability.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: March 13, 2012
    Inventor: Gary Ganghui Teng
  • Patent number: 8133639
    Abstract: The present invention relates to a system, as well as articles and holographic recording medium comprising the system, where the system comprises: a polymerizable component comprising at least one photoactive polymerizable material; and a photoinitiator component comprising at least one photoinitiator for causing the polymerizable component to polymerize to thereby form a plurality of holographic gratings when activated by exposure to a photoinitiating light source; wherein when a portion of the polymerizable component has been polymerized to form at least one holographic grating, the unpolymerized portion of the polymerizable component is resistant to further polymerization when not exposed to the photoinitiating light source. The present invention also provides methods for forming at least one holographic grating in a holographic recording medium having such a photopolymerizable system.
    Type: Grant
    Filed: November 25, 2009
    Date of Patent: March 13, 2012
    Assignee: Inphase Technologies, Inc.
    Inventors: Michael C. Cole, Fredric R. Askham, William L. Wilson
  • Patent number: 8133656
    Abstract: An oxime ester compound represented by general formula (I): wherein R1 and R2 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R3 and R4 each independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom, or a hydroxyl group; a and b each independently represent 0 to 4; X represents an oxygen atom, a sulfur atom, a selenium atom, CR31R32, CO, NR33, or PR34; R31, R32, R33, and R34 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: March 13, 2012
    Assignee: Adeka Corporation
    Inventors: Daisuke Sawamoto, Koichi Kimijima
  • Patent number: 8129088
    Abstract: A low-resistance, fine electrode is formed by baking in air a photosensitive paste which has an inorganic component containing copper powder, boron powder, and glass frit, and an organic component containing a photopolymerization initiator, monomer, and organic vehicle, and in which the average particle size of the copper powder is 2.5 ?m or less, and the content of boron powder based on the total amount of copper powder and boron powder is 8 to 25 wt %.
    Type: Grant
    Filed: July 2, 2009
    Date of Patent: March 6, 2012
    Assignee: E.I. du Pont de Nemours and Company
    Inventor: Masakatsu Kuroki
  • Patent number: 8129091
    Abstract: The invention pertains to a method for preparing a composite printing form from a photosensitive element and a carrier using a template. The photosensitive element is located on the carrier by positioning the element through cutout portions in the template. The method is particularly suited for preparing composite printing forms for relief printing, and in particular for preparing composite printing forms for flexographic printing of corrugated substrates.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: March 6, 2012
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Robert W. Hannum, Thomas Klein
  • Publication number: 20120052443
    Abstract: A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator. wherein R1 represents a hydrogen atom or a methyl group; R2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; A1 represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-g1); wherein s represents 0 or 1; A10 and A12 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group; A11 represents a single bond or an optionally substituted C1 to C5 aliphatic hydrocarbon group; X10 and X11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group; provided that a total number of the carbon atom of A10, A11, A12, X10 and X11 is 6 or less.
    Type: Application
    Filed: August 30, 2011
    Publication date: March 1, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro MASUYAMA, Satoshi YAMAMOTO, Koji ICHIKAWA
  • Patent number: 8124317
    Abstract: A planographic printing plate precursor having an intermediate layer containing a copolymer containing structural units represented by Formulae (1), (2) and (3) below, and a image forming layer, in this order on a support, wherein R1, R2 and R3 each represent a hydrogen atom, a substituent having from 1 to 30 carbon atoms, or a halogen atom, L1 represents a single bond or a (n+1)-valent connecting group, n represents an integer of from 0 to 10, L2 represents a single bond or a (m+1)-valent connecting group, X represents a carboxylate ion, M represents a counter cation necessary for neutralization of charge, m represents an integer of from 1 to 10, and Y represents a substituent having from 0 to 30 carbon atoms, provided that Y does not represent a carboxy group and does not represent the same constituent as (XM).
    Type: Grant
    Filed: September 19, 2008
    Date of Patent: February 28, 2012
    Assignee: Fujifilm Corporation
    Inventors: Toyohisa Oya, Shigefumi Kanchiku, Keisuke Arimura
  • Publication number: 20120045616
    Abstract: A positive photosensitive resin composition including: a resin comprising a structural unit having an acid dissociative group and a structural unit having a functional group capable of forming a covalent bond by reacting with a carboxyl group or a phenolic hydroxyl group; and an acid generator represented by the following formula (I): wherein in formula (I), R1 represents a hydrogen atom, an alkyl group, an alkenyl group, a cyano group, an aryl group or the like; R2 represents an alkyl group or an aryl group; each of R3 and R4 independently represents a hydrogen atom, an alkyl group an aryl group or the like; and X represents —O—, —S—, —NH— or the like.
    Type: Application
    Filed: July 12, 2011
    Publication date: February 23, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Youhei ISHIJI, Masanori HIKITA
  • Patent number: 8119327
    Abstract: The present invention relates to functionalized acrylate polymers, a process for their preparation, photopolymerizable compositions comprising these polymers and the use of the compositions, especially in the production of electronic components. The functionalized acrylate polymers are reaction products comprising at least a) acrylic acid or methacrylic acid or a mixture of acrylic and methacrylic acid and b) a (meth)acrylic ester of substituted or unsubstituted phenol, C1-C8 hydroxyalkylbenzene or C1-C8 hydroxyalkoxybenzene and methyl(meth)acrylate in a molar ratio of from 5:95 to 100:0. 5-90% of the acrylic or methacrylic acid units having reacted with a glycidylvinyl compound.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: February 21, 2012
    Assignee: Huntsman Advanced Materials Americas LLC
    Inventors: Martin Roth, Bernhard Sailer, Catherine Schoenenberger, Ottilie Zelenko
  • Patent number: 8119041
    Abstract: The present invention provides a two-photon light-emitting compound represented by formula (1), an optical data recording medium comprising a compound represented by formula (1), a two-photon polymerizable composition comprising a polymerizable monomer or polymerizable oligomer and at least compound represented by formula (1), and a photopolymerization process: X2—(—CR4?CR3—)m—C(?O)—(—CR1?CR2—)n—X1??(1) wherein X1 and X2 may be the same or different and each represent a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic group; R1, R2, R3 and R4 each independently represent a hydrogen atom or substituent; some of R1, R2, R3 and R4 may be connected to each other to form at least one ring; and n and m each independently represent an integer of from 1 to 4, with the proviso that when n and m are 2 or more, the plurality of R1's, R2's, R3's, and R4's each may be the same or different.
    Type: Grant
    Filed: September 4, 2002
    Date of Patent: February 21, 2012
    Assignee: Fujifilm Corporation
    Inventors: Masaharu Akiba, Jun Kawamata
  • Publication number: 20120040290
    Abstract: The present invention relates to a photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond and (C) a photopolymerization initiator, wherein the (C) photopolymerization initiator comprises a compound represented by the following general formula (1). In formula (1), R1 represents a halogen atom, an amino group, a carboxyl group, a C1-6 alkyl group, a C1-6 alkoxy group or a C1-6 alkylamino group and m represents an integer of 1 to 5.
    Type: Application
    Filed: February 23, 2010
    Publication date: February 16, 2012
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Yoshiki Ajioka, Mitsuru Ishi, Junichi Iso, Manami Usuba
  • Publication number: 20120038996
    Abstract: The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking.
    Type: Application
    Filed: March 17, 2010
    Publication date: February 16, 2012
    Applicant: BASF SE
    Inventors: Hisatoshi Kura, Kaori Sameshima, Kazuhiko Kunimoto, Peter Nesvadba, Masaki Ohwa
  • Patent number: 8114566
    Abstract: There is provided a photosensitive resin composition for a solvent-developing or thermally-developing flexographic printing plate, the photosensitive resin composition comprising: (a) a block copolymer containing a polymer block having conjugated diene as a main component and a polymer block having a vinyl aromatic hydrocarbon as a main component; (b) a photopolymerizable monomer; (c) a photopolymerization initiator; and (d) an organosilicon compound. A photosensitive resin composition for printing in which the organosilicon compound is a silicone oil containing a specific group is preferable, and a photosensitive resin composition for printing in which the organosilicon compound is a silicone oil containing an amino group or an aryl group is most preferable.
    Type: Grant
    Filed: April 5, 2007
    Date of Patent: February 14, 2012
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Yoshifumi Araki, Kazuyoshi Yamazawa
  • Publication number: 20120034564
    Abstract: A positive photosensitive composition includes: (A) a resin that has an acid decomposable repeating unit of formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound that generates an acid upon irradiation; (C) a resin that has: a fluorine atom and/or a silicon atom; and a group selected from groups (x) to (z); and (D) a solvent: (x) an alkali soluble group, (y) a group which decomposes by action of an alkali developer and increases a solubility of the resin (C) in an alkali developer, and (z) a group which decomposes by action of an acid, wherein, Xa1 represents hydrogen, alkyl, cyano or halogen, Ry1 to Ry3 each independently represents alkyl or cycloalkyl, and at least two of Ry1 to Ry3 may be coupled to form a ring, and Z represents a divalent linking group.
    Type: Application
    Filed: September 9, 2011
    Publication date: February 9, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Toshiaki FUKUHARA, Hiromi KANDA, Shinichi KANNA
  • Patent number: 8110337
    Abstract: A polymerizable composition containing: (A) a binder polymer; (B) a compound having a polymerizable unsaturated group; and (C) a compound which has a triarylsulfonium salt structure and in which a sum of Hammett's a constants of all substituents bonded to the aryl skeleton is larger than 0.46.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: February 7, 2012
    Assignee: Fujifilm Corporation
    Inventor: Kazuto Shimada
  • Publication number: 20120028188
    Abstract: The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein R1 and R2 are independently in each occurrence a C1-C12 hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom, and m and n independently each represent an integer of 0 to 4.
    Type: Application
    Filed: July 25, 2011
    Publication date: February 2, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji ICHIKAWA, Mitsuhiro HATA, Takahiro YASUE
  • Patent number: 8105759
    Abstract: A photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizing compound with a polymerizable ethylenic unsaturated bond, (C) a photoradical polymerization initiator containing a 2,4,5-triarylimidazole dimer or its derivative, and (D) a compound represented by the following general formula (1) (wherein R1 and R2 each independently represent C1-20 alkyl, etc., and R3, R4, R5, R6, R7, R8, R9 and R10 each independently represent hydrogen, etc.).
    Type: Grant
    Filed: January 3, 2006
    Date of Patent: January 31, 2012
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Masahiro Miyasaka, Takashi Kumaki
  • Patent number: 8105751
    Abstract: The invention has a support, a recording layer provided on the support, and a protective layer containing a hydrophilic polymer and silica-coated organic resin fine particles provided as the uppermost layer. The organic resin fine particles are preferably composed of at least one resin selected from the group consisting of polyacrylic acid resins, polyurethane resins, polystyrene resins, polyester resins, epoxy resins, phenolic resins, and melamine resins, and the protective layer preferably contains a mica compound.
    Type: Grant
    Filed: June 8, 2007
    Date of Patent: January 31, 2012
    Assignee: Fujifilm Corporation
    Inventor: Akihiro Endo
  • Patent number: 8101336
    Abstract: The present invention provides a photocurable and thermosetting resin composition having excellent surface curability and deep curability, allowing pattern formation with a laser beam having a wavelength of 350 to 410 nm, and being useful as a solder resist for laser direct imaging, the composition including a carboxylic resin (A), an oxime ester-based photopolymerization initiator (B) such as 2-(acetyloxyiminomethyl)thioxanthene-9-one, and another photopolymerization initiator than (B) such as 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, and a sulfur compound (E) such as 2-mercaptobenzothiazole.
    Type: Grant
    Filed: August 21, 2008
    Date of Patent: January 24, 2012
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Nobuhito Itoh, Yoko Shibasaki, Kenji Kato, Masao Arima
  • Publication number: 20120015297
    Abstract: A compound represented by general formula (b1); an acid generator including the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1), wherein R1 represents a hydrogen atom, a linear, branched or cyclic alkyl group of 1 to 10 carbon atoms or a heterocyclic group of 1 to 10 carbon atoms; R2 represents a linear or branched alkyl group of 1 to 10 carbon atoms; x represents an integer of 0 to 6; n represents an integer of 0 to 3; and X? represents an anion.
    Type: Application
    Filed: July 7, 2011
    Publication date: January 19, 2012
    Applicant: TOKYO OHKA KOGYO.CO., LTD.
    Inventors: Yoshitaka KOMURO, Yoshiyuki Utsumi
  • Publication number: 20120015295
    Abstract: A lithographic printing plate precursor has a substrate and an infrared radiation-sensitive composition comprising a polymeric binder, a free radical polymerizable system consisting of at least one polymerizable component, a compound capable of absorbing infrared radiation, and an initiator system comprising an iodonium salt that is capable of producing free radicals; and at least 1% and up to and including 10% by weight, based on the infrared-sensitive composition, of at least one mono- or polycarboxylic acid having an aromatic moiety.
    Type: Application
    Filed: September 26, 2011
    Publication date: January 19, 2012
    Inventors: Heidi M. Munnelly, Paul Richard West, Hans-Joachim Timpe, Ursula Muller, Jianbing Huang