Radiation Sensitive Composition Comprising Ethylenically Unsaturated Compound Patents (Class 430/281.1)
-
Publication number: 20120015301Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing (a) a repeating unit represented by the following formula (AN-01), (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin that contains at least either a fluorine atom or a silicon atom and contains a repeating unit having a group capable of decomposing by the action of an alkali developer to increase the solubility in an alkali developer: wherein the variables in formula (AN-01) are defined in the description.Type: ApplicationFiled: March 31, 2010Publication date: January 19, 2012Applicant: FUJIFILM CORPORATIONInventors: Masahiro Yoshidome, Shuji Hirano, Hiroshi Saegusa, Kaoru Iwato, Yusuke Iizuka
-
Publication number: 20120015296Abstract: A photosensitive resin composition for flexographic printing having excellent resistance to an ink comprising an organic solvent and an emulsion ink used in flexographic printing, for example, a UV-curable ink or an ink using a vegetable oil or light naphtha and having excellent suitability for printing applications such as image reproducibility and print durability. The photosensitive resin composition for flexographic printing includes, at least, (a) one or more thermoplastic elastomers, (b) an acrylic-terminated liquid polybutadiene containing 1,2-bonds in an amount of 80% or more, (c) a photopolymerizable unsaturated monomer having at least one or more ethylenically unsaturated groups, and (d) a photopolymerization initiator.Type: ApplicationFiled: April 8, 2010Publication date: January 19, 2012Applicant: NIPPON SODA CO., LTD.Inventors: Masanori Maruno, Jun Yoshida, Kenya Yamashitas, Yukikazu Nobuhara
-
Publication number: 20120015302Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.Type: ApplicationFiled: March 26, 2010Publication date: January 19, 2012Applicant: FUJIFILM CORPORATIONInventors: Naohiro Tango, Michihiro Shirakawa, Mitsuhiro Fujita, Shuhei Yamaguchi, Akinori Shibuya, Shohei Kataoka
-
Patent number: 8098012Abstract: A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.Type: GrantFiled: August 27, 2009Date of Patent: January 17, 2012Assignee: Samsung SDI Co., Ltd.Inventors: Hyea-Weon Shin, Yon-Goo Park, Bong-Gi Kim, Chan-Seok Park, Sung-Mun Ryu
-
Patent number: 8097399Abstract: An optical moulding process is disclosed comprising the sequential steps of: (a)(y) forming a layer of a photocurable composition; and (bXz) irradiating selected areas of the composition in the layer with radiation from a radiation source, thereby curing the composition in said selected areas and repeating the steps a) and b) on top of an earlier cured layer to form a three dimensional structure, wherein the radiation source used in step b) is a non-coherent source of radiation and wherein the photocurable composition comprises at least two curable components: (i) 45%-95% (and preferably at least 50%, more preferably at least 60%, e.g.Type: GrantFiled: March 21, 2005Date of Patent: January 17, 2012Assignee: 3D Systems, Inc.Inventors: Ranjana Patel, Michael Rhodes, Yong Zhao
-
Publication number: 20120009522Abstract: An actinic ray-sensitive or radiation-sensitive resin composition, wherein when a film having a film thickness of 100 nm is formed from the actinic ray-sensitive or radiation-sensitive resin composition, the film has a transmittance of 55 to 80% for light at a wavelength of 193 nm, and a pattern forming method using the composition are provided.Type: ApplicationFiled: March 30, 2010Publication date: January 12, 2012Applicant: FUJIFILM CORPORATIONInventors: Takayuki Kato, Hiroshi Saegusa, Kaoru Iwato, Shuji Hirano, Yusuke Iizuka, Shuhei Yamaguchi, Akinori Shibuya
-
Publication number: 20120009521Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.Type: ApplicationFiled: September 15, 2011Publication date: January 12, 2012Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Tsuyoshi Nakamura, Naoto Motoike, Hiroaki Shimizu, Kensuke Matsuzawa, Hideo Hada
-
Patent number: 8092981Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.Type: GrantFiled: December 29, 2008Date of Patent: January 10, 2012Assignees: Samsung Electronics Co., Ltd., Techno Semichem Co., Ltd.Inventors: Hoon Kang, Jae-Sung Kim, Yang-Ho Jung, Hi-Kuk Lee, Yasuhiro Kameyama, Yuuji Mizuho, Jong-Cheol Kim, Se-Jin Choi
-
Patent number: 8092982Abstract: Photosensitive paste compositions, barrier ribs of plasma display panels (PDPs) prepared using the same, and PDPs including the barrier ribs are provided. The photosensitive paste composition includes an organic-inorganic complex sol and an inorganic material, wherein the average refractive index (N1) of the organic-inorganic complex sol and the average refractive index (N2) of the inorganic material satisfy the equation ?0.2?N1?N2?0.2. Using the photosensitive paste composition, patterned barrier ribs for PDPs having high resolution and high precision can be made by exposure to light only once. Barrier ribs having higher reflective indices than conventional barrier ribs can also be obtained.Type: GrantFiled: March 25, 2008Date of Patent: January 10, 2012Assignee: Samsung SDI Co., Ltd.Inventors: Beom-Wook Lee, Jong-Seo Choi, Kwi-Seok Choi, Dong-Hyun Kang, Seung-Han Lee, Myung-Duk Lim, Hoon-Bae Lee, Bum-Jin Chang, Min-Jae Lee
-
Patent number: 8092984Abstract: Negative lithographic printing plate having on a substrate a photosensitive layer comprising an alkaline soluble polymeric binder, an alkaline insoluble polymeric binder, a polymerizable monomer, and an initiator is described. The photosensitive layer is imagewise exposed with a radiation to cause hardening in the exposed areas, and then developed to remove the non-hardened areas. The combination of both alkaline soluble polymeric binder and alkaline insoluble polymeric binder in a photosensitive layer can give excellent combined durability, developability, and coatability.Type: GrantFiled: September 2, 2008Date of Patent: January 10, 2012Inventor: Gary Ganghui Teng
-
Publication number: 20120003583Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a guanidine compound having a logP value of 1.2 or more, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.Type: ApplicationFiled: June 29, 2011Publication date: January 5, 2012Applicant: FUJIFILM CORPORATIONInventors: Tomotaka TSUCHIMURA, Hideaki TSUBAKI, Toshiya TAKAHASHI
-
Patent number: 8088558Abstract: A method of making a lithographic printing plate includes the steps of a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer, and, optionally, an intermediate layer between the photopolymerizable layer and the support, wherein the photopolymerizable layer includes a polymerizable compound, a polymerization initiator, and a reactive binder; b) image-wise exposing the coating in a plate setter; c) optionally, heating the precursor in a pre-heating unit; d) developing the precursor off-press in a gumming unit by treating the coating of the precursor with a gum solution, thereby removing the non-exposed areas of the photopolymerizable layer from the support, wherein the reactive binder is a polymer containing a monomeric unit which includes a group having an ethylenically unsaturated bond.Type: GrantFiled: November 9, 2006Date of Patent: January 3, 2012Assignee: Agfa Graphics NVInventors: Alexander Williamson, Marc Van Damme, Willi-Kurt Gries, Hubertus Van Aert
-
Patent number: 8088559Abstract: A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer, and, optionally, an intermediate layer between the photopolymerizable layer and the support, wherein the photopolymerizable layer includes a polymerizable compound and a polymerization initiator, b) image-wise exposing the coating in a plate setter, c) optionally, heating the precursor in a pre-heating unit, d) developing the precursor off-press in a gumming unit by treating the coating of the precursor with a gum solution, thereby removing the non-exposed areas of the photopolymerizable layer from the support, wherein the photopolymerizable layer further includes a polymer containing an acid group and a basic nitrogen-containing compound capable of neutralizing the acid group, or wherein the photopolymerizable layer furtType: GrantFiled: November 17, 2006Date of Patent: January 3, 2012Assignee: Agfa Graphics NVInventors: Willi-Kurt Gries, Marc Van Damme
-
Patent number: 8088552Abstract: A thermal negative type lithographic printing original plate has a photosensitive layer featuring high sensitivity, excellent reproducibility in FM screening, and excellent print durability and chemical resistance at a minute image portion. A photosensitive composition for the photosensitive layer contains an alkali soluble resin having a monomer unit represented by the formula (I), a silane coupling agent represented by the formula (II), an infrared absorber, a radical polymerization initiator, and a polymerizable compound having an ethylenic double bond and an amount of the silane coupling agent is from 15 to 40% of the photosensitive composition by mass.Type: GrantFiled: November 4, 2008Date of Patent: January 3, 2012Assignee: Okamoto Chemical Industry Co., Ltd.Inventors: Jun Ozaki, Masaro Nakatsuka, Keiko Yonezawa, Naoya Sato
-
Patent number: 8088877Abstract: A curable composition and a process for using the curable composition within a grating-coupled waveguide (GCW) sensor are disclosed. The composition can be used for facile replication of optical components, specifically those used in a label-independent detection system where operation of the waveguide is dependent on the detailed formation of micro and nano size patterns. The photo or electron beam curable composition has low viscosity (?500 cPs) and cures to an optically clear material with high glass transition temperature (?70° C.), low shrinkage on cure, low outgassing, and low extractables.Type: GrantFiled: February 12, 2009Date of Patent: January 3, 2012Assignee: Corning IncorporatedInventors: Paul J. Shustack, Kimberly S. Wayman
-
Publication number: 20110318689Abstract: An object of the present invention is to provide a light-sensitive lithographic printing plate material having high sensitivity, generating no background stain even when development is carried out by using a neutral developing solution having a pH of less than 9, or an alkali developing solution having a pH in the range of 9 to 12, generating no background stain even when the plate is allowed to stand after developing treatment or during printing for a long period of time, and having excellent in printing endurance and ink transfer property, and it is accomplished by a light-sensitive lithographic printing plate material which comprises a support and a photo-curable light-sensitive layer formed thereon, said photo-curable light-sensitive layer contains a polymer synthesized by using at least a compound represented by the following mentioned general formula I: wherein R1, R2 and R3 each independently represent an alkyl group or an alkoxy group each having 1 to 10 carbon atoms; provided that at least twoType: ApplicationFiled: February 12, 2010Publication date: December 29, 2011Inventor: Akira Furukawa
-
Publication number: 20110316116Abstract: An object of the present invention is to provide a photosensitive resin composition which leaves a small amount of resin residues after patterning by light-exposure and development and can reduce condensation between the semiconductor wafer and the transparent substrate under a high temperature and high humidity environment, an adhesive film made of the photosensitive resin composition and a light-receiving device including the adhesive film. The photosensitive resin composition of the present invention contains an alkali soluble resin (A), a photopolymerization initiator (B) and a compound (C) having a phenolic hydroxyl group and a carboxyl group.Type: ApplicationFiled: April 8, 2010Publication date: December 29, 2011Inventors: Toshihiro Sato, Masakazu Kawata, Masahiro Yoneyama, Toyosei Takahashi, Hirohisa Dejima, Fumihiro Shiraishi
-
Publication number: 20110315034Abstract: A lithographic printing plate precursor is provided which comprises an aluminum support having a hydrophilic surface and a coating provided thereon, said coating comprising a photopolymerisable composition having a polymerisable compound, a pigment dispersed with a dispersant, a polymerization initiator and a binder, characterized in that the dispersant is a compound free of —COOH, —PO3H2 or —OPO3H2 groups, and the polymerization initiator is a trihalomethyl-aryl sulphone wherein the aryl group is substituted by at least one electron-donating group and wherein the sum of the Hammett constants (sigma) of the substituting groups on said aryl group has a negative value. The printing plate precursor exhibits an excellent daylight stability and shelf-life.Type: ApplicationFiled: October 21, 2009Publication date: December 29, 2011Applicant: AGFA GRAPHICS NVInventors: Kristof Heylen, Alexander Williamson, Johan Loccufier, Sonny Wynants
-
Patent number: 8084185Abstract: The present invention relates to planarization materials and methods of using the same for substrate planarization in photolithography. A planarization layer of a planarization composition is formed on a substrate. The planarization composition contains at least one aromatic monomer and at least one non-aromatic monomer. A substantially flat surface is brought into contact with the planarization layer. The planarization layer is cured by exposing to a first radiation or by baking. The substantially flat surface is then removed. A photoresist layer is formed on the planarization layer. The photoresist layer is exposed to a second radiation followed by development to form a relief image in the photoresist layer. The relief image is then transferred into the substrate.Type: GrantFiled: January 8, 2009Date of Patent: December 27, 2011Assignee: International Business Machines CorporationInventors: Sean D. Burns, Colin J. Brodsky, Ryan L. Burns
-
Patent number: 8084182Abstract: A negative-working imageable element has an imageable layer that includes an infrared radiation absorbing dye that upon exposure to thermal irradiation, changes from colorless to a visible color or from one visible color to another visible color, providing a ?E of at least 5 between the exposed and non-exposed regions of the imageable layer within 3 hours of its exposure to 300 mJ/cm2 at a laser power of 15 Watts. The imageable element can be imaged to provide images with improved contrast for print-out. The imageable layer includes a primary polymeric binder that has a backbone to which are attached pendant poly(alkylene oxide) side chains, cyano groups, or both, and is optionally present in the form of discrete particles.Type: GrantFiled: April 29, 2008Date of Patent: December 27, 2011Assignee: Eastman Kodak CompanyInventors: Heidi M. Munnelly, Ruizheng Wang, David A. Stegman, John Kalamen
-
Publication number: 20110311917Abstract: A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by general formula (c-1) (in formula (c-1), R1 represents an organic group which may contain a polymerizable group; X represents a divalent organic group having an acid dissociable portion; and R2 represents an organic group having a fluorine atom).Type: ApplicationFiled: August 26, 2011Publication date: December 22, 2011Inventors: Tsuyoshi KUROSAWA, Hiroaki SHIMIZU
-
Patent number: 8080348Abstract: The present invention provides a hologram recording material which is suitable for volume hologram record and can attain high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, that is, storage stability, durability, low dimensional change (low shrinkage) and high multiplicity in holographic memory record using not only a green laser but also a blue laser. A hologram recording material comprising: a metal oxide matrix; and a photopolymerizable compound which has at least one (meth)acrylamide group as a photo-reactive group, and has a polyalkylene glycol unit represented by the following formula: —(RO)n— wherein R represents a lower alkylene group, and n represents the number of repeating units of alkylene oxide.Type: GrantFiled: April 3, 2008Date of Patent: December 20, 2011Assignee: TDK CorporationInventors: Naoki Hayashida, Atsuko Kosuda, Jiro Yoshinari
-
Publication number: 20110305848Abstract: The present invention relates to a positive photosensitive resin composition and a method for forming a pattern using said composition by the slit coating process, and more particularly, to a positive photosensitive resin composition, which exhibiting excellent coating uniformity, high sensitivity, excellent developing properties and high film residual ratio and a method for forming a pattern using said composition by the slit coating process. The said composition comprises a novolac resin (A), an o-naphthaquinone diazide sulfonic acid ester (B) and a solvent (C).Type: ApplicationFiled: June 6, 2011Publication date: December 15, 2011Inventors: Chun-An Shih, Kai Min Chen
-
Patent number: 8076052Abstract: Single- and multi-layer positive-working imageable elements include a first polymeric binder that is soluble in an alkaline developer upon exposure to imaging radiation and a radiation absorbing compound. The first polymeric binder comprises a backbone to which are attached pendant groups represented by the following Structure (I): wherein R1 and R2 are independently hydrogen or alkyl groups having 1 to 8 carbon atoms or aryl groups having 6 or 10 carbon atoms in the carbocyclic ring, L is a direct bond or a linking group having at least 1 carbon atom and optionally one or more nitrogen, oxygen, and sulfur atoms in the linking chain, and X is oxy, thio, or —NR— wherein R is hydrogen or an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 or 10 carbon atoms in the carbocyclic ring.Type: GrantFiled: January 10, 2008Date of Patent: December 13, 2011Assignee: Eastman Kodak CompanyInventors: Ting Tao, Jayanti Patel, Eric E. Clark
-
Patent number: 8076054Abstract: A composition for forming an adhesive layer which results in strong adhesion force between a substrate and a photosensitive resin layer, and which does not cause transfer of the constituting components to the substrate, a relief printing plate using the same, and a method for manufacturing a relief printing plate are provided. The composition of the present invention comprises (a) a carboxyl group-containing polymer, and (b) an oxazoline group-containing polymer. Adhesive layer 20 formed using the composition of the present invention can be preferably used as an adhesive layer that adheres between substrate 10 and photosensitive resin layer 30 in a relief printing plate.Type: GrantFiled: February 19, 2007Date of Patent: December 13, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshiaki Katayose, Takaaki Hirai, Syunji Nakazato
-
Publication number: 20110300484Abstract: Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).Type: ApplicationFiled: October 8, 2009Publication date: December 8, 2011Applicant: BASF SEInventors: Hitoshi Yamato, Toshikage Asakura, Yuichi Nishimae
-
Patent number: 8071273Abstract: It is a main object of the present invention to provide a polyimide precursor and a polyimide precursor resin composition, which precursor being easy to synthesize, available at low cost, excellent in storage and capable of giving polyimide that is low in impurities after imidization, irrespective of the chemical structure of the finally-obtained polyimide.Type: GrantFiled: March 27, 2009Date of Patent: December 6, 2011Assignee: Dai Nippon Printing Co., Ltd.Inventor: Katsuya Sakayori
-
Patent number: 8071260Abstract: The present invention provides an article comprising: a binder component, a polymerizable component; and a photoinitiator component comprising at least one photoinitiator that causes the polymerizable component to form a polymer or co-polymer when a portion of the polymerizable component is exposed to a light source. The present invention also provides a method for making such an article, and a method and a system for holographically recording a spatial light distribution to such an article. The present invention also provides an article comprising: a binder component and a photoactive component, a method of making such an article, a method of recording to such an article and a system for recording to such an article.Type: GrantFiled: June 15, 2004Date of Patent: December 6, 2011Assignee: InPhase Technologies, Inc.Inventors: Michael C. Cole, Timothy J. Trentler
-
Publication number: 20110287364Abstract: A lithographic printing plate precursor comprising a coating provided on a support having a hydrophilic surface, the coating containing thermoplastic polymer particles and an IR-dye characterized in that the IR-dye contains a structural element according to Formula I wherein A represents hydrogen, halogen or a monovalent organic group; Y and Y? independently represent —CH— or —N—; R1 and R2 independently represent hydrogen, an optionally substituted alkyl or aryl group or represent the necessary atoms to form a ring; * represents the linking positions to the rest of the molecule.Type: ApplicationFiled: December 3, 2009Publication date: November 24, 2011Applicant: AGFA GRAPHICS NVInventor: Paul Callant
-
Publication number: 20110287366Abstract: A photoresist composition is provided. The photoresist composition comprises two or more kinds of photoinitiators having different activation wavelengths whose difference is at least 20 nm. The photoresist composition has high sensitivity and forms a pattern whose thickness is easy to control depending on the exposure intensity through a slit or transflective mask. Further provided are a transparent thin film formed using the photoresist composition and a liquid crystal display device comprising the thin film.Type: ApplicationFiled: June 22, 2009Publication date: November 24, 2011Applicant: LG CHEM. LTD.Inventors: Keon Woo Lee, Sung Hyun Kim, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee, Chang Ho Cho, Kyoung Hoon Min
-
Patent number: 8057979Abstract: A photosensitive paste composition for forming a black layer on top of plasma display panel (PDP) barrier ribs includes black pigment nanoparticles for contrast enhancement and a cyclic acid anhydride for fundamentally preventing the gelation of the paste composition. The photosensitive paste composition prevents electrical or optical crosstalk between adjacent discharge cells to achieve better contrast. The fundamental prevention of the gelation of the paste composition permits the paste composition to have good storage stability.Type: GrantFiled: January 4, 2006Date of Patent: November 15, 2011Assignee: Samsung SDI Co., Ltd.Inventors: Beom-Wook Lee, Dong-Hee Han, Sang-Wook Sin, Jin-Hwan Jeon
-
Patent number: 8053169Abstract: An ink composition is provided that includes (A) an N-vinyllactam, (B) a polymerization initiator, and (C) a basic compound, the content of the N-vinyllactam (A) being at least 15 wt % of the total weight of the ink composition. There is also provided an inkjet recording method that includes (a1) a step of discharging the ink composition onto a recording medium, and (b1) a step of curing the ink composition by irradiating the discharged ink composition with actinic radiation. Furthermore, a printed material obtained using the ink composition is provided. Moreover, there is provided a process for producing a lithographic printing plate that includes (a2) a step of discharging the ink composition onto a hydrophilic support, and (b2) a step of curing the ink composition by irradiating the discharged ink composition with actinic radiation so as to form a hydrophobic image on the hydrophilic support by curing the ink composition.Type: GrantFiled: July 30, 2007Date of Patent: November 8, 2011Assignee: Fujifilm CorporationInventor: Hironori Ohnishi
-
Patent number: 8053164Abstract: The present invention relates to a resist composition with a hardener and a solvent, and a method for forming a pattern using the resist composition. The hardener has a thermal-decomposable core part, and a first photosensitive bond art. The solvent has a low-molecular resin, and a second photosensitive bond part.Type: GrantFiled: January 30, 2009Date of Patent: November 8, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Bo-Sung Kim, Seung-Jun Lee, Jung-Mok Bae
-
Patent number: 8053167Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.Type: GrantFiled: November 15, 2007Date of Patent: November 8, 2011Assignee: Showa Denko K.K.Inventors: Katsumi Murofushi, Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori
-
Patent number: 8053166Abstract: Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods of forming such structures.Type: GrantFiled: September 3, 2009Date of Patent: November 8, 2011Assignees: Sumitomo Bakelite Co. Ltd., Promerus, LLC.Inventors: Koji Choki, Tetsuya Mori, Ramakrishna Ravikiran, Makoto Fujiwara, Keizo Takahama, Kei Watanabe, Hirotaka Nonaka, Yumiko Otake, Andrew Bell, Larry Rhodes, Dino Amoroso, Mutsuhiro Matsuyama
-
Patent number: 8053147Abstract: High performance media suitable for recording with a blue laser is disclosed. The blue-sensitized holographic media provides greater dynamic range and higher sensitivity than previously disclosed blue-sensitized holographic media. These media can be used for diverse applications such as data storage where the articles provide denser data storage and more rapid hologram writing times or for optical waveguides where the articles provide greater optical confinement and more rapid manufacturing times.Type: GrantFiled: April 9, 2008Date of Patent: November 8, 2011Assignees: Bayer MaterialScience AG, InPhase TechnologiesInventors: Nicolas Stöckel, Friedrich-Karl Bruder, Fredric R. Askham, Michael Cole, Lisa Dhar, Mark D. Michaels, Sam Miller, Sean Quirin, Songvit Setthachayanon, Timothy J. Trentler, Marianela T. Lemon
-
Publication number: 20110269309Abstract: Provided are a photoresist composition having superior adhesion to an etch target film, a method of forming a pattern by using the photoresist composition, and a method of manufacturing a thin-film transistor (TFT) substrate. The photoresist composition includes an alkali-soluble resin; a photosensitive compound; a solvent; and 0.01 to 0.1 parts by weight of a compound represented by Formula 1: wherein R is one of hydrogen, an alkyl having 1 to 10 carbon atoms, a cycloalkyl having 4 to 8 carbon atoms, and a phenyl group.Type: ApplicationFiled: December 29, 2010Publication date: November 3, 2011Applicants: DONGWOO FINE-CHEM CO., LTD, SAMSUNG ELECTRONICS CO., LTD.Inventors: Pil-Soon HONG, Gwui-Hyun PARK, Jin-Ho JU, Jean-Ho SONG, Sang-Tae KIM, Seong-Hyeon KIM, Won-Young CHANG, Jong-Heum YOON, Eun-Sang LEE, Min-Ju IM
-
Patent number: 8043790Abstract: The present invention provides a printing original plate for laser engraving which generates no printing deficiencies and from which a printing plate with a satisfactory resolution can be produced. A printing original plate for laser engraving which is obtained by molding a resin composition containing (A) at least one latex having a weight average degree of gelation of 75% or more, (B) a photopolymerizable compound and (C) a photopolymerization initiator into a sheet-like or tubular form, and then irradiating the molded article with light to crosslink and cure, characterized in that the depth of 10% screen dot at 150 lpi is 80 ?m or more.Type: GrantFiled: November 30, 2007Date of Patent: October 25, 2011Assignee: Toyo Boseki Kabushki KaishaInventors: Toru Wada, Kazuya Yoshimoto
-
Publication number: 20110252993Abstract: Photopolymerizable flexographic printing elements which contain cyclohexanepolycarboxylic esters as plasticizers and also their use for producing flexographic printing forms for printing with UV inks, in particular for UV narrow web printing.Type: ApplicationFiled: May 13, 2009Publication date: October 20, 2011Applicant: Flint Group Germany GmbHInventors: Stefanie Dottinger, Uwe Stebani
-
Patent number: 8034537Abstract: A positive photosensitive composition comprises: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound that generates an acid in irradiation with actinic light or radiation; (C) a resin that has: at least one of a fluorine atom and a silicon atom; and a group selected from the group consisting of groups (x) to (z); and (D) a solvent: (x) an alkali soluble group, (y) a group which decomposes by action of an alkali developer and increases a solubility of the resin (C) in an alkali developer, and (z) a group which decomposes by action of an acid, wherein, Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two of Ry1 to Ry3 may be coupled to form a ring structure, and Z represents a divalent linking group.Type: GrantFiled: March 27, 2008Date of Patent: October 11, 2011Assignee: FUJIFILM CorporationInventors: Toshiaki Fukuhara, Hiromi Kanda, Shinichi Kanna
-
Patent number: 8034538Abstract: Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a ?max in the range of from about 450 to about 750 nm and having an absorption that is lower than 10% with respect to the absorption of the radiation absorbing compound in the element at the wavelength used for exposure. The contrast dye is present in sufficient H-aggregation such that less than 40% of the entire absorption spectrum from the contrast dye is contributed by it in non-H-aggregated form.Type: GrantFiled: February 13, 2009Date of Patent: October 11, 2011Assignee: Eastman Kodak CompanyInventors: Bernd Strehmel, Harald Baumann, Daniela Lummel
-
Publication number: 20110236830Abstract: A printing plate having a substrate and a radiation sensitive, negative working, organic, polymerizable, photosensitive (PS) resin coating non-ionically adhered to the substrate such that the cohesion of the PS coating exceeds the adhesion of the PS coating to the substrate. The PS coating contains active components that participate in radiation induced polymerization, all of which active components are soluble in non-aqueous solvents and none of which active components are soluble or dispersible in any of the group of fluids consisting of water, fountain solution, ink, and press ink. The PS coating has sufficient cohesion and surface tack to adhere to and be mechanically pulled off the substrate by press ink as particulates without dissolution or dispersion into the press ink.Type: ApplicationFiled: June 3, 2011Publication date: September 29, 2011Inventors: Howard A. Fromson, William J. Ryan, William J. Rozell
-
Patent number: 8026036Abstract: The present invention relates to a photosensitive resin composition excellent in pliability, ultraviolet sensitivity for development, developability with an aqueous alkali solution, and storage stability at room temperature and a circuit substrate employing the same. The photosensitive resin composition includes a siloxane-containing polyamic acid resin having structural units respectively represented by the following formulae (1), (2), and (3) and a photopolymerization initiator incorporated therein. The circuit substrate is coated with the photosensitive resin composition.Type: GrantFiled: March 24, 2006Date of Patent: September 27, 2011Assignee: Nippon Steel Chemical Co., Ltd.Inventors: Kiwamu Tokuhisa, Kentaro Hayashi, Hironobu Kawasato
-
Patent number: 8026041Abstract: A non-ablative negative-working imageable element has first and second polymeric layers under a crosslinked silicone rubber layer. These elements can be used in a simple method to provide lithographic printing plates useful for waterless printing (no fountain solution). Processing after imaging is relatively simple using either water or an aqueous solution containing very little organic solvent to remove the imaged regions. The crosslinked silicone rubber layer is ink-repelling and only the first layer that is closest to the substrate contains an infrared radiation absorbing compound to provide thermal sensitivity.Type: GrantFiled: April 2, 2008Date of Patent: September 27, 2011Assignee: Eastman Kodak CompanyInventors: Ophira Melamed, Jianbing Huang, Efrat Konstantini, Eynat Matzner
-
Patent number: 8022111Abstract: Compounds of formula (I) [in which: A and B are terminal groups; R1 represents a group of formula (II) or (III); R2 is alkyl or aryl; Z is a group —(CHR3)n, where R3 is hydrogen, hydroxy or alkyl, and n is a number from 0 to 6; Y is carbonyl or a group —CH2—; Q represents a residue of a dihydroxy compound; and x is a number from 1 to 100] are useful sensitisers for use with Type II photoinitiators in the formulation of printing inks and other energy curable coatings.Type: GrantFiled: January 28, 2005Date of Patent: September 20, 2011Assignee: Sun Chemical CorporationInventors: Shaun Lawrence Herlihy, Brian Rowatt
-
Patent number: 8021825Abstract: Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods of forming such structures.Type: GrantFiled: September 3, 2009Date of Patent: September 20, 2011Assignees: Sumitomo Bakelite Co., Ltd., Promerus, LLC.Inventors: Koji Choki, Tetsuya Mori, Ramakrishna Ravikiran, Makoto Fujiwara, Keizo Takahama, Kei Watanabe, Hirotaka Nonaka, Yumiko Otake, Andrew Bell, Larry Rhodes, Dino Amoroso, Mutsuhiro Matsuyama
-
Patent number: 8021800Abstract: The present invention provides a hologram recording material which is suitable for volume hologram record and attains high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low shrinkage and high multiplicity in holographic memory record using not only a green laser but also a blue laser; a process for producing the same; and a hologram recording medium having the hologram recording material. A hologram recording material comprising: a metal oxide containing at least Si and Zr as metals, wherein an aromatic carboxylic acid compound is coordinated to Zr; and a photopolymerizable compound. The aromatic carboxylic acid compound is, for example, toluic acid. A hologram recording medium (11) comprising the hologram recording material layer (21).Type: GrantFiled: April 24, 2008Date of Patent: September 20, 2011Assignee: TDK CorporationInventors: Atsuko Kosuda, Naoki Hayashida, Jiro Yoshinari
-
Patent number: 8017104Abstract: The present invention relates to a diagnostic contrast agent comprising a water dispersible, near-infrared tricarbocyanine, enamine-functionalized dye having a Stoke shift of greater than 50 and represented by five general formulae. The present invention also relates to a method for making a dye-conjugate utilizing the novel dye and a method of identifying a biological compound using the novel dye conjugate.Type: GrantFiled: February 28, 2007Date of Patent: September 13, 2011Assignee: Carestream Health, Inc.Inventors: Ruizheng Wang, John W. Harder, David A. Stegman, William J. Harrison, Hans F. Schmitthenner
-
Patent number: 8017193Abstract: A monomeric formulation for creating self-propagating polymer optical waveguides and a system and a method of using the same. The monomeric formulation includes a plurality of unsaturated molecules, a molecule having a structure of R—X—H (e.g., X?O, S, N), and a photoinitiator. The monomeric formulation can further include a free radical inhibitor. The system includes a light source, a reservoir having a monomeric formulation and a patterning apparatus configured to guide a light beam from the light source into the monomeric formulation to form at least one self-propagating polymer waveguide.Type: GrantFiled: August 6, 2008Date of Patent: September 13, 2011Assignee: HRL Laboratories, LLCInventors: Chaoyin Zhou, Alan J. Jacobsen
-
Publication number: 20110217658Abstract: Laminate comprising a) a photopolymerizable relief-forming layer, at least containing an elastomeric binder, ethylenically unsaturated monomers and a photoinitiator and optionally further additives, b) an optionally photopolymerizable elastomeric substrate layer, at least containing an elastomeric binder, optionally ethylenically unsaturated monomers and a photoinitiator and optionally further additives, the relief-forming layer a) having a hardness of 30 to 70° Shore A and the elastomeric substrate layer b) having a hardness of 75° Shore A to 70° Shore D in each case in the photopolymerized state, and the layer b) having a hardness of at least 5° Shore A greater than the layer a).Type: ApplicationFiled: June 18, 2007Publication date: September 8, 2011Applicant: Flint Group Germany GmbHInventors: Armin Becker, Uwe Stebani, Jens Schadebrodt, Uwe Krauss