From Fluorine Containing Monomer Patents (Class 526/242)
  • Publication number: 20030082479
    Abstract: A copolymer of an acrylic monomer having at least one C6-20 alicyclic structure with a norbornene derivative or styrene monomer having a hexafluoroalcohol pendant is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, transparency and dry etching resistance, and is suited for lithographic microprocessing.
    Type: Application
    Filed: June 25, 2002
    Publication date: May 1, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Publication number: 20030072947
    Abstract: Methods and products of Transport co-polymerization (“TCP”) that are useful for preparations of low Dielectric Constant (“&egr;”) thin films are disclosed. Transport co-polymerization (“TCP”) of reactive intermediates that are generated from a first precursor with a general structural formula (Z)m—Ar—(CX′X″Y)n (VI) with a second reactive intermediate that is generated from a cage compound (e.g. Fullerenes, Methylsilsesquioxane, Hydrosilsesquioxane, and Adamantanyl) or a cyclic-compounds (e.g. Cyclo-Siloxanes and 2,2-Paracyclophanes) results in co-polymer films that are useful for making porous low &egr; (≦2.0) thin films. The porous thin films of this invention consist of nano-pores with uniform pore distribution thus retain high rigidity thus are suitable for manufacturing of future ICs using copper as conductor.
    Type: Application
    Filed: July 29, 2002
    Publication date: April 17, 2003
    Applicant: DIELECTRIC SYSTEMS, INC.
    Inventors: Chung J. Lee, Atul Kumar
  • Publication number: 20030073795
    Abstract: There is obtained a pellicle film for lithography which is excellent in transparency in vacuum ultraviolet light, particularly in F2 laser light (157 nm), and lowering of transmittance due to photo-degrading and a decrease in a film thickness are inhibited. Thereby excellent laser exposure resistance and transparency can be maintained for a long period of time and a clear pattern can be produced. The pellicle film for lithography comprises a solvent-soluble fluorine-containing polymer (A) and the polymer is non-crystalline and is composed of a chain structure having no ring structure on its trunk chain and an absorption coefficient at 157 nm of the polymer (A) is not more than 0.5 &mgr;m−1.
    Type: Application
    Filed: August 8, 2002
    Publication date: April 17, 2003
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Takayuki Araki, Meiten Koh, Mihoko Ohashi
  • Publication number: 20030073796
    Abstract: A polymerization process for producing a copolymer of tetrafluoroethylene and perfluorobutylethylene, prepared by an aqueous dispersion polymerization technique, and the resin produced thereby, are provided. This copolymer contains a relatively small amount, between about 0.02 weight percent and about 0.6 weight percent, of comonomer polymerization units. The copolymer is believed to be comprised of a core-shell structure wherein the polymerized comonomer units reside primarily within the core. The primary particle size of the copolymer ranges from 0.175 microns to and including 0.203 microns and the standard specific gravity is less than 2.143. This copolymer possesses a unique combination of very small particle size coupled with high molecular weight, a combination not heretofore achieved in tetra-fluoroethylene polymers of the dispersion or fine powder type.
    Type: Application
    Filed: October 15, 2001
    Publication date: April 17, 2003
    Inventor: Richard L. Baillie
  • Patent number: 6548612
    Abstract: Melt-processible, thermoplastic poly(tetrafluoroethylene) (PTFE) compositions are disclosed and methods for making and processing same. Additionally, products comprising these compositions are described.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: April 15, 2003
    Assignee: Eidgenossische Technische Hochschule Zürich
    Inventors: Paul Smith, Jeroen Visjager, Cees Bastiaansen, Theodorus Tervoort
  • Patent number: 6545111
    Abstract: A thermoprocessable copolymer of TFE essentially formed by: (a) from 4.5 to 8.5% by weight of perfluoromethylvinylether (PMVE); (b) from 0.3 to 1.6% by weight of a perfluorodioxole of formula:  wherein: Y═F, ORf, Rf wherein Rf is a perfluoroalkyl having from 1 to 5 carbon atoms; X1 and X2, equal to or diferent from each other, are —F or —CF3; (c) TFE, forming the remaining part to 100%.
    Type: Grant
    Filed: June 22, 2001
    Date of Patent: April 8, 2003
    Assignee: Ausimont S.p.A.
    Inventors: Pasqua Colaianna, Giulio Brinati, Giambattista Besana
  • Patent number: 6541589
    Abstract: A polymerization process for producing a copolymer of tetrafluoroethylene and perfluorobutylethylene, prepared by an aqueous dispersion polymerization technique, and the resin produced thereby, are provided. This copolymer contains a relatively small amount, between about 0.02 weight percent and about 0.6 weight percent, of comonomer polymerization units. The copolymer is believed to be comprised of a core-shell structure wherein the polymerized comonomer units reside primarily within the core. The primary particle size of the copolymer ranges from 0.175 microns to and including 0.203 microns and the standard specific gravity is less than 2.143. This copolymer possesses a unique combination of very small particle size coupled with high molecular weight, a combination not heretofore achieved in tetra-fluoroethylene polymers of the dispersion or fine powder type.
    Type: Grant
    Filed: October 15, 2001
    Date of Patent: April 1, 2003
    Assignee: Gore Enterprise Holdings, Inc.
    Inventor: Richard L. Baillie
  • Patent number: 6541558
    Abstract: A composition of matter formed by melt-blending certain thermoplastic polymers and from about 1.0 to about 7.5 wt. % of a fluorocarbon additive, the additive having a lower by surface energy than that of the polymer; the blending resulting in a cooled admixture having a concentration of fluorocarbon additive through a cross-section of the solid composition lower in the interior thereof and higher at the surfaces thereof.
    Type: Grant
    Filed: April 20, 2000
    Date of Patent: April 1, 2003
    Assignee: RES Development Corporation
    Inventors: Robert E. Sterling, Eugene P. Goldberg
  • Patent number: 6531559
    Abstract: Melt-processible, thermoplastic poly(tetrafluoroethylene) (PTFE) compositions are disclosed and methods for making and processing same. Additionally, products comprising these compositions are described.
    Type: Grant
    Filed: August 6, 1999
    Date of Patent: March 11, 2003
    Assignee: Eidgenössische Technische Hochschule Zürich
    Inventors: Paul Smith, Jeroen Visjager, Cees Bastiaansen, Theodorus Tervoort
  • Patent number: 6524765
    Abstract: A polymer comprising units of formula (1-1) or (1-2) and having a weight average molecular weight of 1,000 to 500,000 is provided. R1 is an acid labile group, R2 is H or straight or branched C1-4 alkyl, Z is a tetravalent C2-10 hydrocarbon group, and k=0 or 1. A resist composition comprising the polymer as a base resin has significantly improved sensitivity, resolution and etching resistance and is very useful in microfabrication.
    Type: Grant
    Filed: November 14, 2000
    Date of Patent: February 25, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tsunehiro Nishi, Takeru Watanabe, Jun Hatakeyama, Takeshi Kinsho, Koji Hasegawa, Seiichiro Tachibana
  • Publication number: 20030036617
    Abstract: Poly (para-xylylene) (“PPX”) polymer films are processed under particular conditions in order to maintain their stability for use in integrated circuits. This is primarily achieved by controlling the substrate temperature, feed rate of the polymer precursors, and the environmental conditions. The resulting films are stable at high temperatures and compatible with other film layers.
    Type: Application
    Filed: August 9, 2001
    Publication date: February 20, 2003
    Inventor: Chung J. Lee
  • Publication number: 20030036618
    Abstract: A fluorine-containing phenylmaleimide derivative having a specific structure. A polymer obtained by polymerizing monomers containing the derivative. A polymer containing a specific structural unit and having a weight-average molecular weight of 2,000 to 200,000. A chemically amplified resist composition containing the polymer and a photo acid generator, wherein the proportion of the polymer relative to the total of the polymer and the photo acid generator is 70 to 99.8% by mass. A method for pattern formation, which comprises coating the above composition on a to-be-processed substrate, exposing with a light of 180 nm or less wavelength, and conducting baking and development.
    Type: Application
    Filed: July 22, 2002
    Publication date: February 20, 2003
    Applicant: NEC CORPORATION
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Patent number: 6518381
    Abstract: A tetrafluoroethylene polymer having high stretchability, a fibrillatable character and a non-melt fabricable quality, which has a standard specific gravity of at most 2.160, and a tensile break strength of from 32.0N (3.26 kgf) to 49.0N (5.0 kgf) or an endothermic ratio of at most 0.15 as calculated from the measurement by differential thermal analysis. The tetrafluoroethylene polymer is suitable for stretching operation after paste extrusion.
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: February 11, 2003
    Assignees: Asahi Glass Company, Limited, Asahi Glass Fluoropolymers Co., Ltd.
    Inventors: Shigeki Kobayashi, Jun Hoshikawa, Kazuo Kato, Hiroki Kamiya, Hiroyuki Hirai
  • Patent number: 6515088
    Abstract: A new class of “living” free radical initiators that are based on alkylperoxydiarylborane and its derivatives and that may be represented by the general formula. R—[O—O—B—&phgr;1(—&phgr;2)]n wherein n is from 1 to 4, R is a hydrogen or a linear, branched or cyclic alkyl radical having a molecular weight from 1 to about 500, and &phgr;1 and &phgr;2, independently, are selected from aryl radicals, based on phenyl or substituted phenyl groups, with the proviso that &phgr;1 and &phgr;2 can be the chemically bridged to each other with a linking group or with a direct chemical bond between the two aryl groups to form a cyclic ring structure that includes a boron atom are disclosed.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: February 4, 2003
    Assignee: The Penn State Research Foundation
    Inventor: Tze-Chiang Chung
  • Patent number: 6515077
    Abstract: An electrostrictive graft elastomer has a backbone molecule which is a non-crystallizable, flexible macromolecular chain and a grafted polymer forming polar graft moieties with backbone molecules. The polar graft moieties have been rotated by an applied electric field, e.g., into substantial polar alignment. The rotation is sustained until the electric field is removed. In another embodiment, a process for producing strain in an elastomer includes: (a) providing a graft elastomer having a backbone molecule which is a non-crystallizable, flexible macromolecular chain and a grafted polymer forming polar graft moieties with backbone molecules; and (b) applying an electric field to the graft elastomer to rotate the polar graft moieties, e.g., into substantial polar alignment.
    Type: Grant
    Filed: October 23, 2000
    Date of Patent: February 4, 2003
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Ji Su, Joycelyn S. Harrison, Terry L. St. Clair
  • Publication number: 20030023014
    Abstract: Fluoropolymers consisting of alternating perfluorocyclobutane and aryl ether linkages possess suitable properties for optical waveguides and other devices using refractive properties of the polymers. Perfluorocyclobutane (PFCB) polymers having aryl groups alternating on an ether chain have shown useful physical properties for optical waveguide applications. Processes for micromolding such polymeric films by replicating a pattern or image directly from a silicon master, rather than from a polydimethyl siloxane (PDMS) mold, are disclosed.
    Type: Application
    Filed: August 7, 2002
    Publication date: January 30, 2003
    Inventors: Dennis W. Smith, Hiren V. Shah, John Ballato, Stephen Foulger
  • Patent number: 6511787
    Abstract: An acrylic resin containing hexafluoroisopropanol units has high transmittance to VUV radiation. A resist composition using the resin as a base polymer has high transparency, substrate adhesion, alkali developability and acid-elimination capability and is suited for lithographic microprocessing.
    Type: Grant
    Filed: September 7, 2001
    Date of Patent: January 28, 2003
    Assignees: Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd., Central Glass Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Jun Watanabe, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Patent number: 6512064
    Abstract: A fluororesin film, which has a dielectric constant of at most 5, and which has a tensile break strength of at least 40 MPa in each of MD direction and TD direction; a fluororesin film, wherein the ratio of the tensile break strength in each of MD and TD directions after stretching to the tensile break strength in each of MD and TD directions before stretching, is at least 1.5; and a fluororesin film, which has a tensile modulus of at least 3,000 MPa in each of MD and TD directions. The above-mentioned fluororesin films are obtained by using a method of biaxially stretching laminates of corresponding raw fabric films and readily stretchable films.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: January 28, 2003
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoshiaki Higuchi, Yukio Jitsugiri
  • Patent number: 6509429
    Abstract: A process for preparing a fluorine-containing polymer through emulsion polymerization method which enhances productivity while maintaining excellent physical properties of the fluorine-containing polymer and comprises (a) a first polymerization step for emulsion-polymerizing a fluorine-containing monomer or a mixture of a fluorine-containing monomer and a non-fluorine-containing monomer in an aqueous medium in the presence of a radical polymerization initiator and an emulsifying agent, (b) a dilution step for diluting the obtained aqueous emulsion of polymer particles with water to reduce the number of emulsified polymer particles per unit amount of aqueous medium in the emulsion and a concentration of emulsifying agent, and (c) a second polymerization step for emulsion-polymerizing a fluorine-containing monomer and/or a non-fluorine-containing monomer in the obtained diluted emulsified solution.
    Type: Grant
    Filed: January 5, 2001
    Date of Patent: January 21, 2003
    Assignee: Daikin Industries, Ltd.
    Inventors: Masanori Kitaichi, Hiroshi Aihara, Sadashige Irie, Mitsuru Kishine, Yutaka Ueta, Katsuhide Otani, Yoshiki Maruya, Hideya Saito, Mitsuo Tsukamoto
  • Patent number: 6509073
    Abstract: Crosslinked polymer compositions obtained by subjecting to ionizing radiations compositions comprising: I) thermoprocessable copolymers of ethylene with tetrafluoroethylene (TFE) and/or chlorotrifluoroethylene (CTFE) modified with acrylic monomers of formula: CH2═CH—CO—O—R2  (a) R2 is a hydrogenated radical from 1 to 20 carbon atoms, C1-C20, alkyl, linear and/or branched radical, or cycloalkyl, or R2 is H. The radical R2 can optionally contain: heteroatoms preferably Cl, O, N; one or more functional groups preferably selected from OH, COOH, epoxide, ester and ether; and double bonds; II) one or more cross-linking agents; III) one or more optional ingredients.
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: January 21, 2003
    Assignee: Ausimont S.p.A.
    Inventors: Vincenzo Arcella, Julio A. Abusleme
  • Publication number: 20030013817
    Abstract: A novel class of high temperature ion-containing poly(aromatic) polymers is disclosed.
    Type: Application
    Filed: June 26, 2001
    Publication date: January 16, 2003
    Inventor: Kelly Lu
  • Patent number: 6500537
    Abstract: A non-sticking composite material for office automation equipment which is produced by applying, to a substrate, a material comprising a fluorine-containing polymer having an excellent adhesive property to the substrate without necessitating complicated steps and is excellent in heat resistance, non-sticking property, stain-proofing property, water- and oil-repelling property, stain removing property, chemical resistance, rust-preventive property, antibacterial property, resistance to energy ray and abrasion resistance. The non-sticking composite material for office automation equipment is produced by applying, to the substrate, the material comprising a fluorine-containing ethylenic polymer having functional group which is prepared by copolymerizing (a) 0.05 to 30% by mole of at least one of fluorine-containing ethylenic monomers having at least one functional group selected from the group consisting of hydroxyl, carboxyl, a carboxylic salt group, a carboxylic ester group and epoxy, and (b) 70 to 99.
    Type: Grant
    Filed: January 21, 2000
    Date of Patent: December 31, 2002
    Assignee: Daikin Industries, Ltd.
    Inventors: Takayuki Araki, Yoshito Tanaka, Masahiro Kumegawa, Noritoshi Oka, Hisato Sanemasa, Tetsuo Shimizu
  • Patent number: 6497961
    Abstract: A ceramer composition is provided that comprises a plurality of colloidal inorganic oxide particles and a free-radically curable binder precursor. The free-radically curable binder precursor comprises a fluorochemical component that further comprises at least two free-radically curable moieties and at least one fluorinated moiety. By virtue of the inclusion of the fluorochemical component, the ceramer compositions of the present invention can be used to provide ceramer composites and ceramer composite structures with excellent stain, oil and/or water repellency characteristics as well as a high level of abrasion resistance and hardness.
    Type: Grant
    Filed: March 29, 2001
    Date of Patent: December 24, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Soonkun Kang, George G. I. Moore, Thomas W. Rambosek
  • Publication number: 20020192594
    Abstract: Anti-reflective coatings formed from new polymers and having high etch rates are provided. Broadly, the coatings are formed from a polymer binder and a light attenuating compound. The polymer binder has halogen atoms bonded thereto, preferably to functional groups on the polymer binder rather than to the polymer backbone. Preferred polymer binders comprise acrylic polymers while it is preferred that the halogenated functional groups of the polymer binders be dihalogenated, and more preferably trihalogenated, with chlorine, fluorine, or bromine atoms.
    Type: Application
    Filed: June 28, 2002
    Publication date: December 19, 2002
    Inventors: Tomoyuki Enomoto, Ken-Ichi Mizusawa, Shin-Ya Arase, Rama Puligadda
  • Publication number: 20020193540
    Abstract: Ionic perfluorovinyl compounds and their uses as components of ionic conductors of the polymer type, of selective membranes or of catalysts. The compounds comprise at least one perfluorovinyl group and at least one group chosen from —O or one of the groups C≡N, —C(C≡N)2, —NSO2R or —C[SO2R]2 or a pentacyclic group comprising at least one N, C—C≡N, CR, CCOR or CSO2R group. The compounds and/or their polymers are of use in the preparation of ionically conducting materials, electrolytes and selective membranes.
    Type: Application
    Filed: June 17, 2002
    Publication date: December 19, 2002
    Inventors: Michel Armand, Christophe Michot
  • Publication number: 20020193500
    Abstract: A fluoroclastomer latex is produced that is capable of forming films having excellent water resistance. In a first step, polymerization of fluorinated monomers is carried out in the presence of fluorinated surfactants at a pH of 3-8. The pH of the resultant fluoroelastomer emulsion composition is then adjusted to 5-9 and the emulsion is concentrated to yield a solids-rich latex.
    Type: Application
    Filed: August 28, 2001
    Publication date: December 19, 2002
    Inventors: Klaus Hintzer, Gernot Lohr, Albert Killich, Werner Schwertfeger
  • Patent number: 6495273
    Abstract: A light-emitting polymer and its preparation method, the polymer being excellent in electron injection and transport ability as well as hole injection and transport ability in an EL device, the EL device manufactured from the polymer being also emittable in the blue emission region, in which the EL device from an inorganic material is not mostly emittable. The light-emitting polymer of the invention is an alternated copolymer having repeated units (arylenevinylene units) excellent in hole injection and transport ability and repeated units (fluorinated tetraphenyl units) excellent in electron injection and transport ability with alternated order, as shown in formula (II). An EL device manufactured from the light-emitting polymer, a fluorinated tetraphenyl derivative of formula (I), which is used as a monomer to prepare the light-emitting polymer, and their preparation methods.
    Type: Grant
    Filed: September 15, 1999
    Date of Patent: December 17, 2002
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Do Hoon Hwang, Tae Hyoung Zyung, Lee Mi Do, Hye Yong Chu
  • Patent number: 6489417
    Abstract: A process for producing a fluorine-containing acrylic or methacrylic polymer, comprises polymerizing a fluorine-containing acrylate or methacrylate in a solution phase formed of an organic solvent and dissolved therein a monomer containing a fluorine-containing acrylate or methacrylate having a polyfluoroalkyl group having 6 to 16 carbon atoms. A non-halogen type solvent is used as the organic solvent and the fluorine-containing acrylate or methacrylate is so polymerized that a polymer-containing liquid phase comprised of the fluorine-containing acrylic or methacrylic polymer formed with progress of polymerization and the organic solvent is separated from the solution phase. This process enables production of a fluorine-containing acrylic or methacrylic polymer having a fluorine monomer in a high proportion by the use of a commonly available general-purpose solvent, without using any fluorine type solvent.
    Type: Grant
    Filed: June 4, 1998
    Date of Patent: December 3, 2002
    Assignee: Sony Chemicals Corporation
    Inventor: Hiroshi Samukawa
  • Publication number: 20020177667
    Abstract: Amorphous perfluorinated copolymers, comprising cyclic perfluorinated units deriving from at least two different perfluorinated comonomers, optionally with units deriving from a perfluorinated monomer containing at least one olefinic unsaturation (perfluoroolefin), or comprising cyclic perfluorinated units and units deriving from a perfluorinated monomer containing at least one olefinic unsaturation, said perfluorinated copolymers having the following combination of properties:
    Type: Application
    Filed: May 7, 2002
    Publication date: November 28, 2002
    Inventors: Marco Apostolo, Francesco Triulzi, Vincenzo Arcella, Vito Tortelli, Pierangelo Calini
  • Patent number: 6482882
    Abstract: Polymerization process of unsaturated pefluoromonomers, fluoro-containing monomers and optionally in the presence of hydrogen containing olefins, for obtaining polymers contaning hydrogen and fluorine, which utilizes a microemulsion comprising the following components: (a) water; (b) a fluoropolyoxyalkylene having hydrogen-containing end groups and/or hydrogen-containing repeating units; (c) a fluorine-free organic radicalic initiator for the polymerization of fluoro-containing monomers, soluble in component (B); (d) a fluoro-containing surfactant.
    Type: Grant
    Filed: May 24, 2000
    Date of Patent: November 19, 2002
    Assignee: Ausimont S.P.A.
    Inventors: Julio A. Abusleme, Alba Chittofrati
  • Patent number: 6479578
    Abstract: A resin composition which gives a molded article having both of excellent mechanical properties and abrasion resistance with maintaining excellent thermal resistance, chemical resistance, surface characteristics (non-sticking property, low friction property), electric insulating property, etc. of a fluorine-containing polymer; a molded article obtained from the resin composition; and a method for producing the molded article are provided. The resin composition comprises: (A-1) a fluorine-containing ethylenic polymer prepared by copolymerizing at least one of fluorine-containing monomers having any one of hydroxyl, carboxyl, a carboxylate salt group, a carboxylate ester group or epoxy in an amount of 0.05 to 30% by mole on the basis of the total amount of monomers, and (B-1) an inorganic filler or a non-meltable organic filler, wherein said resin composition comprises 1 to 99.5% by weight of the component (A-1) and 0.5 to 99% by weight of the component (B-1).
    Type: Grant
    Filed: March 5, 2001
    Date of Patent: November 12, 2002
    Assignee: Daikin Industries, Ltd.
    Inventors: Takayuki Araki, Masahiro Kumegawa, Tsuyoshi Miyamori, Masami Kato, Masaji Komori, Taketo Kato, Tetsuo Shimizu
  • Patent number: 6479604
    Abstract: A diarylethene compound of the following formula (1) wherein R1 is a hydrogen or a substituted or unsubstituted C1-22 alkyl group, a fluoro group, a substituted or unsubstituted phenyl group, a substituted or unsubstituted phenylalkyl group, R2 is a C1-22 alkylene group which may be unsubstituted or substituted with fluorine, R3 is a chemical bond, O, S, NR1, N(R2R1), or a C1-3 alkylene group which may be unsubstituted or substituted with one or more oxygen atoms or fluorine atoms, X and Y independently of one another O, S, nitrogen, NR1, or N(R2R1), and Z is a carbonyl group or a methylene group which may be unsubstituted or substituted with fluorine.
    Type: Grant
    Filed: January 27, 2000
    Date of Patent: November 12, 2002
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Eun-Kyoung Kim, Yun-Ki Choi
  • Patent number: 6479161
    Abstract: A fluorine-containing adhesive comprising a fluorine-containing ethylenic polymer (A) having functional group which has a crystalline melting point or glass transition temperature of not more than 270° C. and is prepared by copolymerizing (a) 0.05 to 30% by mole of at least one of fluorine-containing ethylenic monomers having at least one functional group selected from the group consisting of carboxyl and a carboxylic salt group and (b) 70 to 99.95% by mole of at least one of fluorine-containing ethylenic monomers which do not have the above-mentioned functional group and is copolymerizable with the component (a). To provide the fluorine-containing adhesive maintaining chemical resistance, solvent resistance, weather resistance and stain-proofing property and giving direct strong adhesion particularly to a substrate of metal, glass, resin, etc. and an adhesive film and laminated article which are produced from the fluorine-containing adhesive.
    Type: Grant
    Filed: December 3, 1999
    Date of Patent: November 12, 2002
    Assignee: Daikin Industries, Ltd.
    Inventors: Takayuki Araki, Shigehito Sagisaka, Yoshito Tanaka, Masahiro Kumegawa
  • Publication number: 20020164538
    Abstract: Copolymers prepared by radical polymerization of a fluorine-containing aromatic monomer and an acrylate-based comonomer that may or may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm and 248 nm radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
    Type: Application
    Filed: February 26, 2001
    Publication date: November 7, 2002
    Applicant: International Business Machines Corporation
    Inventors: Robert David Allen, Phillip Joe Brock, Hiroshi Ito, Gregory Michael Wallraff
  • Publication number: 20020161148
    Abstract: A copolymer of an acrylate monomer containing fluorine at &agr;-position with a norbornene derivative is highly transparent to VUV radiation and resistant to dry etching. A resist composition using the resin as a base polymer is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.
    Type: Application
    Filed: February 8, 2002
    Publication date: October 31, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Jun Watanabe, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Publication number: 20020161147
    Abstract: The present invention provides block copolymers with semifluorinated LC side groups (single or monodendron groups). The block copolymers can be blended with a thermoplastic elastomer block copolymer, e.g., styrene-ethylene/butylene-styrene (SEBS) to provide a surface active block copolymer (SABC).
    Type: Application
    Filed: January 7, 2002
    Publication date: October 31, 2002
    Inventors: Christopher K. Ober, Maoliang Xiang, Kenneth J. Wynne
  • Publication number: 20020151664
    Abstract: Chain transfer agents that are chlorine-free and liquid under polymerization conditions, useful for fluoromonomer polymerization, have the following structure:
    Type: Application
    Filed: April 11, 2002
    Publication date: October 17, 2002
    Inventors: William Brown Farnham, Andrew Edward Feiring, Patrick Edward Lindner
  • Patent number: 6461791
    Abstract: Polymers of a fluorinated backbone having recurring units of formula (1) are novel: R1 is H, F, C1-20 alkyl or fluorinated C1-20 alkyl, R2 is F, C1-20 alkyl or fluorinated C1-20 alkyl, and R3 is C6-20 aryl which may have attached thereto a hydroxyl group and/or a hydroxyl group substituted with an OR4 group wherein R4 is an acid labile group. Using such polymers, resist compositions featuring transparency to excimer laser light and alkali solubility are obtained.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: October 8, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Yuji Harada, Jun Watanabe, Mutsuo Nakashima
  • Publication number: 20020143103
    Abstract: A vinylidene fluoride polymer having good high-temperature coloring resistance is produced through suspension polymerization at 10-100° C. in a mixture solvent of 100 wt. parts of an aqueous medium and 10-50 wt.
    Type: Application
    Filed: January 25, 2002
    Publication date: October 3, 2002
    Inventors: Takumi Katsurao, Toshio Hosokawa, Katsuo Horie, Yoshikichi Teramoto, Aisaku Nagai
  • Patent number: 6455658
    Abstract: A fluorine-containing copolymer comprising ethylene, tetrafluoroethylene, a fluorovinyl compound of the formula: CH2═CFRf in which Rf is a fluoroalkyl group having 2 to 10 carbon atoms, and hexafluoropropylene, in which a molar ratio of tetrafluoroethylene to ethylene is from 40:60 to 90:10, the content of the above fluorovinyl compound of the formula: CH2═CFRf is from 0.1 to 10 mole % based on the whole copolymer, and the content of hexafluoropropylene is from 0.1 to 30 mole % based on the whole copolymer. This fluorine-containing copolymer can provide films having good transparency and high tear strength, and such films are useful as weather-resistant protective films, films for agricultural housings, films for constructions, and the like.
    Type: Grant
    Filed: March 9, 1999
    Date of Patent: September 24, 2002
    Assignee: Daikin Industries, Ltd.
    Inventors: Ken Okanishi, Keizo Shiotsuki, Ryoichi Fukagawa
  • Publication number: 20020120083
    Abstract: New precursors and processes to generate fluorinated poly(para-xylylenes) (“PPX”) and their chemically modified films suitable for fabrications of integrated circuits (“ICs”) of <0.15 &mgr;m are disclosed. The films so prepared have low dielectric constants (“∈”) and are able to keep the integrity of the dielectric, Cu, and the barrier metal, such as Ta. Hence, the reliability of ICs can be assured.
    Type: Application
    Filed: February 26, 2001
    Publication date: August 29, 2002
    Inventor: Chung J. Lee
  • Patent number: 6440321
    Abstract: A fluorochemical composition to impart water repellency and/or oil repellency to a substrate, the composition comprising one or more condensates of (i) a methylolated amine or a C1-C4 alkoxylated derivative thereof, (ii) a hydrocarbon compound represented by formula (II) and (iii) a fluorinated compound represented by formula (I): Rf—(X1)n—Z1  (I) wherein: Rf is a fluorinated aliphatic group; X1 is an organic divalent linking group; Z1 is selected from the group consisting of hydroxy, thiol, amide or acid groups; and n is 0 or 1; and Rh—Z2  (II)  wherein: Rh is a hydrocarbon group having at least 6 carbon atoms and optionally being substituted with 1 to 3 subsituents; Z2 is selected from the group consisting of hydroxy, thiol, amide or acid groups. The invention further provides a method of treatment of a substrate with the fluorochemical composition and a treated substrate.
    Type: Grant
    Filed: September 17, 1999
    Date of Patent: August 27, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Frans A. Audenaert, Dirk M. Coppens, Rudolf J. Dams
  • Patent number: 6429258
    Abstract: Aqueous dispersion polymerization of fluoromonomers is improved by using a combination of fluorosurfactants, one of which is a perfluoropolyether carboxylic acid or salt.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: August 6, 2002
    Assignee: E. I. du Pont de Nemours & Company
    Inventors: Richard Alan Morgan, Clay Woodward Jones, Theodore Arthur Treat, Jeffrey A. Hrivnak
  • Patent number: 6426397
    Abstract: Ionic perfluorovinyl compounds and their uses as components of ionic conductors of the polymer type, of selective membranes or of catalysts. The compounds comprise at least one perfluorovinyl group and at least one group chosen from —O or one of the groups C≡N, —C(C≡N)2, —NSO2R or —C[SO2R]2 or a pentacyclic group comprising at least one N, C—C≡N, CR, CCOR or CSO2R group. The compounds and/or their polymers are of use in the preparation of ionically conducting materials, electrolytes and selective membranes.
    Type: Grant
    Filed: July 5, 2001
    Date of Patent: July 30, 2002
    Assignees: ACEP Inc., Centre National de la Recherche Scientifique, Universite de Montreal
    Inventors: Michel Armand, Christophe Michot
  • Patent number: 6420502
    Abstract: A new class of “living” free radical initiators that are based on alkylperoxydiarylborane and its derivatives and that may be represented by the general formula. R—[O—O—B-&phgr;1(-&phgr;2)]n wherein n is from 1 to 4, R is a hydrogen or a linear, branched or cyclic alkyl radical having a molecular weight from 1 to about 500, and &phgr;1 and &phgr;2, independently, are selected from aryl radicals, based on phenyl or substituted phenyl groups, with the proviso that &phgr;1 and &phgr;2 can be the chemically bridged to each other with a linking group or with a direct chemical bond between the two aryl groups to form a cyclic ring structure that includes a boron atom are disclosed.
    Type: Grant
    Filed: June 25, 2001
    Date of Patent: July 16, 2002
    Assignee: The Penn State Research Foundation
    Inventor: Tze-Chiang Chung
  • Publication number: 20020091211
    Abstract: A new class of “living” free radical initiators that are based on alkylperoxydiarylborane and its derivatives and that may be represented by the general formula.
    Type: Application
    Filed: June 25, 2001
    Publication date: July 11, 2002
    Inventor: Tze-Chiang Chung
  • Patent number: 6417279
    Abstract: A composition comprising a polymer mixture A of polymers formed by: (a) from 10 to 70% by moles of ethylene (E), (b) from 30 to 90%, by moles of a fluorinated monomer selected from tetrafluoroethylene (TFE), chlorotrifluoroethylene (CTFE), or mixtures thereof, (c) from 0.1 to 30% by moles, with respect to the total amount of monomers (a) and (b), of one or more acrylic monomers; characterized in that the polymer mixture A comprises polymer fractions having a different content of the acrylic comonomer such that the elastic modulus at 23° C. (ASTM D1708) of said polymer mixture A is lower than at least 10% of the elastic modulus of a polymer formed by monomers a), b) and c) wherein the polymer fractions have substantially an equal content of the acrylic comonomer.
    Type: Grant
    Filed: February 13, 2001
    Date of Patent: July 9, 2002
    Assignee: Ausimont S.p.A.
    Inventors: Julio A. Abusleme, Claudia Manzoni
  • Patent number: 6416819
    Abstract: A method of preparing a composition containing a fluorocarbon thermoplastic random copolymer comprising the steps of: (A) providing a mixture having: (i) a fluorocarbon thermoplastic random copolymer having subunits of: —(CH2CF2)x—, —(CF2CF(CF3)y—, and —(CF2 CF2)z—,  wherein x is from 1 to 50 or 60 to 80 mole percent, y is from 10 to 90 mole percent, z is from 10 to 90 mole percent, x+y+z equals 100 mole percent; (ii) a filler comprising zinc oxide; (iii) a curable amino functional polydimethyl siloxane copolymer comprising aminofunctional units selected from the group consisting of (aminoethylaminopropyl) methyl, (aminopropyl) methyl and (aminopropyl) dimethyl; and (iv) antimony-doped tin oxide particles; (v) a bisphenol residue curing agent; and (B) curing the mixture for 5 to 10 hours at a temperature in the range of 25° C. to 275° C.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: July 9, 2002
    Assignee: Nex Press Solutions LLC
    Inventors: Jiann H. Chen, Joseph A. Pavlisko, Charles C. Anderson, Robert A. Lancaster
  • Publication number: 20020086962
    Abstract: A transparent coating is used on an optical information disk. The optical information disk is an injection-molded piece of clear poly-carbonate plastic and is impressed with microscopic bumps which are arranged as a single, continuous, extremely long spiral track of data. A thin, reflective aluminum layer is sputtered onto the optical information disc so that the thin, reflective aluminum layer covers the bumps. A thin acrylic layer is sprayed over the thin, reflective aluminum layer in order to protect it. The transparent coating is a composite material which is made of silica as the discontinuous phase and of a polytetrafluoro-ethylene-derived organic polymer as the continuous phase which leads to a fluorine-containing silica-based product. The transparent coating is applied by spin or dip from specific solutions at room temperature followed by a mild and short heat treatment.
    Type: Application
    Filed: December 28, 2000
    Publication date: July 4, 2002
    Inventor: Brandon L. Upper
  • Publication number: 20020082375
    Abstract: A continuous bulk polymerization and esterification process includes continuously charging into a reaction zone at least one ethylenically unsaturated acid-functional monomer and at least one linear or branched chain alkanol having greater than 11 carbon atoms. The process includes maintaining a flow rate through the reaction zone sufficient to provide an average residence time of less than 60 minutes and maintaining a temperature in the reaction zone sufficient to produce a polymeric product incorporating at least some of the alkanol as an ester of the polymerized ethylenically unsaturated acid-functional monomer. The polymeric product is used in various processes to produce water-based compositions including emulsions and dispersions such as oil emulsions, wax dispersions, pigment dispersions, surfactants and coatings which contain the polymeric product.
    Type: Application
    Filed: October 29, 2001
    Publication date: June 27, 2002
    Inventors: Kevin M. Andrist, John E. Blasko, Glenn C. Calhoun, Frederick C. Hansen, Dean R. Hellwig, Kurt A. Hessenius, Steven M. Hurley, D. Sunil Jayasuriya, Matthew G. Lee, Stephen J. Maccani, H. Thomas Mills, Gregory R. Peterson, Paul E. Sandvick, Dennis M. Wilson, John P. Wiruth