Abstract: A method for continuously separating polymer from a high pressure fluid stream comprises subjecting the high pressure fluid stream comprising polymer particles to a filter, wherein the filter segregates the high pressure fluid stream from the polymer particles; subjecting the polymer particles to a rotating device which transports the polymer particles away from the filter, wherein the polymer particles are exposed to thermal conditions sufficient to melt the polymer particles and form a seal surrounding at least a portion of the rotating device; and separating the molten polymer from the rotating device. The method is carried out such that the separation of polymer from the high pressure fluid stream occurs under steady-state.

Abstract: A resin composition which can enhance the heat resistance and the humidity resistance of a dye possessing the maximum absorption at wavelengths in the range of 380-780 nm is provided. It is obtained by polymerizing a monomer mixture containing 5-100 wt. % of a monomer represented by the formula: CH2═CR—COOX (wherein R denotes a hydrogen atom or a methyl group and X denotes a hydrocarbon group of 4-25 carbon atoms) and/or a fluorine atom-containing unsaturated monomer and containing a dye possessing the maximum absorption at wavelengths in the range of 380-780 nm in an acryl type resin having an acid value in the range of 0-30 mgKOH/g and a hydroxyl value in the range of 0-30 mgKOH/g.

Abstract: Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer.

Abstract: The invention relates to a fluorine-containing compound containing a substituent represented by the formula 1: 1

Abstract: The present invention provides a water-soluble and shelf-stable aqueous fluorochemical polymeric treatment useful to treat porous substrates to render them repellent to water- and oil-based stains. The treatment comprises a water-soluble or dispersible fluorochemical polymer containing only carbon atoms in the backbone, with a plurality of each of the following groups pendent from the backbone: (a) fluoroaliphatic groups, (b) carboxyl-containing groups, (c) silyl groups and optionally (d) other non-hydrophilic groups. Because the water-soluble polymeric treatment, and the shelf-stable aqueous solutions thereof, can be applied to porous substrates in aqueous solution, they eliminate the need for environmentally harmful and toxic co-solvents.

Abstract: A polymer blend is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the polymer blend is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including wavelengths of 157 nm, 193 nm and 248 nm, and has improved sensitivity and resolution. Processes for preparing and using the polymer blend are also provided, as are lithographic photoresist compositions that contain the polymer blend.

Abstract: Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of esters derived from fluoroalcohol functional groups that simultaneously impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

Abstract: Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparecy, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

Abstract: A resist composition comprising a fluorinated polymer having carboxylate pendants and with a weight average molecular weight of 1,000-500,000 as a base resin is sensitive to high-energy radiation below 200 nm, has high transparency, resolution and plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: The present invention relates to preparation of fluorinated core-shell particles with water and oil repellency, and more particularly, to preparation of emulsion-type coating material with good water and oil repellency using only small amount of expensive fluorinated monomers, which comprise a shell wherein a large amount of hydrophobic fluorinated monomers are included and a core wherein no fluorinated monomers are included.

Abstract: A fluororesin powder coating composition having high light resistance and being excellent in blocking resistance and smoothness of the coating film when coated, and a fluororesin powder to be used for a powder coating material, are presented.

Abstract: A method for forming a fluoropolymer comprises providing a reaction mixture comprising carbon dioxide, at least one fluoromonomer, and an initiator; and reacting the at least one fluoromonomer in the reaction mixture to form a fluoropolymer. The fluoropolymer has a multimodal molecular weight distribution.

Abstract: A novel emulsion polymerization process for the production of fluoroelastomers is disclosed wherein a partially fluorinated anionic surfactant of the formula F—(CF2CF2)n—CH2CH2SO3M, where n is an integer from 2 to 9, or mixtures thereof, and M is a cation having a valence of 1, is used as the dispersing agent.

Abstract: Curable fluoroelastomers comprising monomeric units formed by a triazine iodinated derivative having general formula: wherein Y′ is independently H, Cl, F, CH3, or CF3, m′ and t′ are 0 or 1, and m′+t′=0 or 1, preferably m′+t′=0; p′ is an integer and is equal to 1 when t′=1, or p′=0; X′ is independently H, Cl, F, alkyl or perfluoroalkyl C1-C3, preferably F; n′ is an integer between 2 and 20, preferably between 4 and 12, more preferably between 4 and 8.

Abstract: Disclosed is a fluorine compound having perfluorostyrene introduced at a terminal thereof, as represented in the following Formula 1, and a coating solution and an optical waveguide device using the same, characterized in that the introduction of perfluorostyrene results in a facile fabrication of thin films by a UV curing or a thermal curing, high thermal stability and chemical resistance, and low optical propagation loss and birefringence: 1

Abstract: Provided is a fluoroplastic or latex comprising a nitrogen-containing cure site and units derived from a fluorinated monomer. Also provided is a curable blend comprising a fluoroplastic and a fluoroleastomer gum, wherein said fluoroplastic comprises a nitrogen-containing cure site and units derived from a fluorinated monomer. Also provided are cured, shaped articles, latex blends, and a process for preparing a fluoroplastic comprising: (a) introducing at least 60 weight percent of a first polymerizable composition comprising a fluorinated monomer into a polymerization reactor; (b) polymerizing said composition in said reactor; (c) introducing at least 70 weight percent of a second polymerizable composition comprising a nitrogen-containing cure site monomer into said reactor following addition of at least 80% by weight of said first polymerizable composition; and (d) copolymerizing said nitrogen-containing cure site monomer with said fluorinated monomer to form a fluoroplastic.

Abstract: Fluorochemical ester compositions comprising one or more compounds or oligomers having at least on fluorine-containing repeatable unit and at least one fluorine-containing terminal group are described. The compositions are useful as coatings or incorporated as melt additives. The fluorochemical compositions impart oil and water repellency to the substrate. In other aspects, this invention relates to processes for imparting oil and water repellency characteristics to substrates and articles.

Abstract: The invention relates to a method for the production of a template-textured material by synthesis of a template-textured polymer (TTP) by performing crosslinking polymerization of functional monomers on a support in the presence of a template, which method is characterized in that a support having a thin polymer layer on the surface thereof is added with a reaction mixture consisting of polymerization initiator, template, functional monomer, crosslinker, solvent and/or buffer and, following sorption of the reaction mixture in the thin polymer layer, the polymerization is initiated and continued until the absorption capacity of the thin polymer layer for the template-textured polymer (TTP) is reached, and the template is optionally removed in a final step, the support used being selected in such a way that it cannot absorb the reaction solution. The materials of the invention are remarkable for their high binding specificity and selectivity for the template.

Abstract: Fluorine-modified comb polymers based on acryloyldimethyltaurine The invention provides water-soluble or water-swellable copolymers obtainable by free-radical copolymerization of

Abstract: The invention relates to a fluorine-containing compound represented by the formula 1, 1

Abstract: A fluorochemical composition for rendering a fibrous substrate oil and/or water repellent which comprises a solution or dispersion of a fluoropolymer having a partially or fully fluorinated backbone and comprising one or more repeating units corresponding to the general formula: wherein Rf represents a perfluorinated organic group having a chain length of at least 2 atoms and having at least one carbon atom and optional auxiliary components.

Abstract: Melt-processible, thermoplastic poly(tetrafluoroethylene) (PTFE) compositions are disclosed and methods for making and processing same. Additionally, products comprising these compositions are described.

Abstract: Photoresist monomers, photoresist polymers prepared therefrom, and photoresist compositions using the polymer are disclosed. The photoresist polymers include photoresist monomers containing fluorine-substituted benzylcarboxylate group represented by Formula 1. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. As the composition has low light absorbance at 193 nm and 157 nm wavelength, it is suitable for a process using ultraviolet light source such as VUV (157 nm). In the Formula, R1, R2, R3 and m are defined in the specification.

Abstract: Polycyclic fluorine-containing polymers and photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The polycyclic fluorine-containing polymer is derived from a repeat unit comprising the polycyclic reaction product of norbomadiene and a fluorolefin. The polymer may also contain a repeat unit derived from one or more additional monomers such as a fluorolefin, specifically tetrafluoroethylene, a fluoroalcohol, or an acrylate.

Abstract: Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel. R1, R2 and R3 are independently H, F, C1-20 alkyl or fluorinated C1-20 alkyl, at least one of R1, R2 and R3 contains fluorine, and R4 is an acid labile group. Using such polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.

Abstract: Novel fluorine-containing paper sizes which impart oil and grease resistance to paper and soil-release properties to textile products are described which are the copolymerization products of (a) a perfluoroalkyl-substituted (meth)acrylate or (meth)acrylamide, (b) a secondary- or tertiary-amino or quaternary ammonium group-containing (meth)acrylate or (meth)acrylamide, (c) vinylidene chloride and, optionally, d) other copolymerizable nonfluorinated vinyl monomers.

Abstract: The present invention is a fluorine containing ethylene copolymer obtained by the copolymerization of ethylene with suitable fluorine-containing comonomer compounds, wherein the fluorine-containing comonomer compound is present at a concentration of up to 40% by weight, based on the total weight of the ethylene copolymer.

Abstract: Photoresist polymers, and photoresist compositions using the polymer are disclosed. More specifically, photoresist polymers containing maleimide represented by Formula 1. Photoresist compositions including the photoresist polymers have excellent etching resistance, heat resistance and adhesiveness, and development ability in aqueous tetramethylammonium hydroxide (TMAH) solution. As the compositions have low light absorbance at 193 nm and 157 nm wavelength, they are suitable for a process using ultraviolet light source such as VUV (157 nm). wherein, 1, R1, R2, R3, R, R′, R″, R″′, X, a and b are defined in the specification.

Abstract: A process for preparing a fluoropolymer by polymerizing one or more radically polymerizable monomers comprising at least one fluoroolefin monomer in the presence of a radical polymerization initiator and as case demands, an inactive fluorocarbon and chain transfer agent in a reaction field where at least one of components forming the reaction field is in a supercritical state. According to the preparation process, generation of unstable end groups of the polymer, a decrease in a purity and complicated post-treatment can be eliminated.

Abstract: A water and oil repellent composition which can impart an excellent water and oil repellency to an object, even if it is processed at a low temperature, and which can achieve a water and oil repellent treatment providing a soft hand. The water and oil repellent composition which has as an essential component a copolymer consisting essentially of polymerized units of the following monomer (a) and polymerized units of the following monomer (b). monomer (a): an Rf monomer wherein the melting point of fine crystals derived from the Rf groups of the homopolymer does not exist or is at most 50° C. monomer (b): a monomer having no Rf group, wherein the melting point of fine crystals derived from the side chains of the homopolymer is at least 30° C.

Abstract: A method for forming a fluoropolymer comprises providing a reaction mixture comprising carbon dioxide, at least one fluoromonomer, and an initiator; and reacting the at least one fluoromonomer in the reaction mixture to form a fluoropolymer. The fluoropolymer has a multimodal molecular weight distribution.

Abstract: A low-molecular-weight copolymer of tetrafluoroethylene with units of perfluoro alkyl vinyl ethers having a melt index of ≧30 suitable as a mixing component with a higher-molecular-weight copolymer of the same monomers for producing moldings in injection molding or by extrusion.

Abstract: A copolymer of an acrylate monomer containing fluorine at &agr;-position with a norbornene derivative is highly transparent to VUV radiation and resistant to dry etching. A resist composition using the resin as a base polymer is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.

Abstract: A polymer coating for medical devices based on a derivatized poly(ethylene-co-vinyl alcohol) is disclosed. A variety of polymers are described to make coatings for medical devices, particularly, for drug delivery stents. The polymers include poly(ethylene-co-vinyl alcohol) modified by alkylation, esterification, and introduction of fluorinated alkyl fragments, polysiloxane fragments and poly(ethylene glycol) fragments into the macromolecular chains of poly(ethylene-co-vinyl alcohol).

Abstract: To provide a method of reducing contents of metal components of a fluorine-containing elastomer through preparation thereof and a molded article obtained from the fluorine-containing elastomer having sufficiently reduced contents of metal components. The method of reducing a metal content of the fluorine-containing elastomer through preparation thereof without using a metal oxide, in which among materials excluding a gaseous monomer which are used for polymerization of a fluorine-containing monomer, coagulation and drying, at least one of them contains substantially no metal component, and the fluorine-containing elastomer which has a metal content of not more than 50 ppm and is obtained by that method.

Abstract: Poly (para-xylylene) (“PPX”) polymer films are processed under particular conditions in order to maintain their stability for use in integrated circuits. This is primarily achieved by controlling the substrate temperature, feed rate of the polymer precursors, and the environmental conditions. The resulting films are stable at high temperatures and compatible with other film layers.

Abstract: A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2 and, and an acid generator: 1

Abstract: A low-molecular-weight copolymer of tetrafluoroethylene with units of perfluoro alkyl vinyl ethers having a melt index of ≧30 suitable as a mixing component with a higher-molecular-weight copolymer of the same monomers for producing moldings in injection molding or by extrusion.

Abstract: Aqueous dispersions of fluoropolymers containing as stabilizer from 1 to 30% by weight with respect to the fluoropolymer, of a non ionic surfactant having the following structure: CH3(CH2)nO(C3H6O)p(CH2CH2O)mH   (I) wherein: n is in the range 8-20, preferably 12-15; m is in the range 5-20, preferably 7-12; p is in the range 1-8, preferably it is 1 or 2.

Abstract: There is provided the process for effectively preparing the fluorine-containing polymer without using CFC and HCFC which have a high polymerization rate and a high ozone depletion potential and a coating film having excellent mechanical properties, solvent resistance and chemical resistance can be formed using the obtained fluorine-containing polymer. In preparing the fluorine-containing polymer by polymerizing a monomer containing a fluoroolefin in a polymerization medium, the fluorine-containing solvent having an ozone depletion potential of 0 and a solubility of hydroxybutyl vinyl ether of not less than 0.5% is used as the polymerization medium.

Abstract: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: This cationic fluorocopolymer is obtained from a composition comprising, per 100 parts by weight (pw): 5 to 92 pw of at least one polyfluorinated monomer (I); 0.

Abstract: The present invention provides a water-soluble and shelf-stable aqueous fluorochemical polymeric treatment useful to treat porous substrates to render them repellent to water- and oil-based stains. The treatment comprises a water-soluble or dispersible fluorochemical polymer containing only carbon atoms in the backbone, with a plurality of each of the following groups pendant from the backbone: (a) fluoroaliphatic groups, (b) carboxyl-containing groups, (c) silyl groups and optionally (d) other non-hydrophilic groups. Because the water-soluble polymeric treatment, and the shelf-stable aqueous solutions thereof, can be applied to porous substrates in aqueous solution, they eliminate the need for environmentally harmful and toxic co-solvents.

Abstract: Ionic perfluorovinyl compounds and their uses as components of ionic conductors of the polymer type, of selective membranes or of catalysts. The compounds comprise at least one perfluorovinyl group and at least one group chosen from —O or one of the groups C≡N, —C(C≡N)2, —NSO2R or —C[SO2R]2 or a pentacyclic group comprising at least one N, C—C≡N, CR, CCOR or CSO2R group. The compounds and/or their polymers are of use in the preparation of ionically conducting materials, electrolytes and selective membranes.

Abstract: ABSTRACT A fluorinated polymer having a polydispersity index (Mw/Mn) of 1-1.20 can be prepared by subjecting an aromatic monomer having trifluoromethyl groups and acid labile groups to living anion polymerization. The fluorinated polymer is suitable for use in chemically amplified resist compositions having sensitivity to ultraviolet radiation.

Abstract: Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component.

Abstract: Photoresist monomers of following Formulas 1 and 2, photoresist polymers thereof, and photoresist compositions containing the same. The photoresist composition has excellent adhesiveness to a wafer, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. In addition, the photoresist composition has low absorbance of light having the wavelength of 157 nm, and thus is suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) and EUV (13 nm) in fabricating a minute circuit for a high integration semiconductor device. wherein, R1, R2 and R3 are as defined in the specification of the invention.

Abstract: In preparing a fluorinated thermoplastic with good flex life, high thermal conductivity and low average spherolite diameter from tetrafluoroethylene and perfluoro n-alkyl vinyl ether, perfluoro 2-propoxyalkyl vinyl ether is additionally incorporated into the fluorinated thermoplastic. A semicrystalline, thermoplastically processable copolymer is prepared, made from units of the tetrafluoroethylene, from 2 to 10% by weight of units of perfluoro n-propyl vinyl ether and from 0.1 to 6% by weight of units of perfluoro 2-propoxypropyl vinyl ether. The novel copolymer preferably contains fewer than 70 unstable end groups per 106 carbon atoms, has thermal conductivity of at least 0.19 W/mK at 23° C. and has a smooth surface with an average spherolite diameter of <5 &mgr;m. The novel terpolymer is suitable for extrusion of hose, in particular for heat exchangers, and also for ultrahigh-purity applications.

Abstract: This invention concerns olefins having a terminally disposed fluorocyclobutyl ring bearing an ionic functionality or a precursor thereto, a process for the production thereof, and polymers formed therefrom.

Abstract: A binder for a lithium-sulfur battery utilizes a fluorine-included polymer.