Abstract: The present invention relates to in situ polymerization of fluoropolymer into porous substrates, to improve resistance to wear, tear and creep, decay, and degradation by wetting, staining and warping, and to improve durability while maintaining the appearance of the substrate.

Abstract: To provide the thermosetting powder coating composition which comprises a fluorine-containing copolymer having crosslinkable functional group and a curing agent, in which the fluorine-containing copolymer has a fluoroolefin unit, has a fluorine content of not less than 10% by weight and is not dissolved in tetrahydrofuran substantially. A coating line can be shared with other powder coating composition because even when the composition mixes to other powder coating composition, it causes no coating defects, and yet a coated article having a coating film excellent in physical properties can be provided.

Abstract: There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): 1

Abstract: A staged method of forming vinyl (e.g.

Abstract: The present invention relates to a fluorine-containing polymerizable monomer having a structure of the general formula (1), 1

Abstract: The present invention discloses a class of random glassy polymer materials, namely nanoporous polymer materials, which contain pores with dimensions ranging from about 1 nm to about 1000 nm. The present invention also discloses a method of making a nanoporous polymer material by controlling the size, shape, volume fraction, and topological features of the pores, which comprises annealing the polymer material at a temperature above its glass transition temperature. The present invention further discloses the use of the resulting nanoporous polymer material to make devices, such as optical devices. For example, the resulting nanoporous polymer can be used to make a planar waveguide that can exhibit an optical loss of less than 0.5 dB/cm.

Abstract: A polymer having fluorinated vinyl phenol units copolymerized with acrylonitrile units has high transmittance to VUV radiation. A resist composition using the polymer as a base resin has high sensitivity and resolution to high-energy radiation and good plasma etching resistance and is suited for lithographic microprocessing.

Abstract: A copolymer containing repeat units formed from the monomers (I) and (II), wherein each R1, if present, is independently hydrogen or hydrocarbyl; r is 0, 1 or 2; s is either 2 or 3; R2-R4 are each independently hydrogen or hydrocarbyl; R5 and R6 are each independently hydrogen, halo or hydrocarbyl; Pd− is the anion formed by loss of a proton from a proton donating group Pd-H; Z is either a bond or hydrocarbyl; R7 and R8 are each independently hydrogen, halo or hydrocarbyl; and either (a) A is an electron accepting group and W is either hydrogen or hydrocarbyl, (b) W is an electron accepting group and A is either a bond or hydrocarbyl or (c) both A and W are electron accepting groups. The invention also provides a method for preparing the copolymer by polymerising a mixture of (I) and (II) or their non-ionised precursors, preferably by exposure to ultraviolet radiation. The invention also relates to the uses of the copolymer in adhesive, coating, sealant and stereolithographic compositions.

Abstract: The present invention provides a fluorochemical composition comprising: (a) one or more fluorochemical oligomers derivable from a free radical polymerization of one or more fluorinated monomers and optionally one or more non-fluorinated monomers in the presence of a chain transfer agent, said fluorochemical oligomer being free of acid groups and comprising one or more groups of the formula:

Abstract: A method for producing partially fluorinated epoxides and corresponding polyether homopolymers of these polyfluorinated epoxides is described. Also described is a method for incorporating a fluoroalcohol functional group into a polymer as a pendant group. Certain perfluorinated olefins are also described. These polyfluorinated epoxides and the associated polymers and methods relating to them are useful components in photoresists, particulary in lithographic photoresists for use at low ultraviolet wavelengths (e.g., 157 nm).

Abstract: A chemical amplification type resist composition uses as the base resin a polymer having a molecular weight dispersity of 1.0 to 1.5 which is a polymer comprising recurring units of formula (1) and recurring units of formula (2) or a polymer comprising recurring units of formula (2) wherein R1 is alkyl, alkoxyalkyl, acetyl or carbonylalkoxy, 0<p/(p+q)≦1, R2 is hydrogen or methyl, and R3 is a tertiary hydrocarbon group of 4 to 30 carbon atoms. By virtue of the narrow dispersity effect of the polymer, the resist composition is improved in resolution as compared with prior art base resins having a wide dispersity. Advantages including a high resolution, good pattern profile and storage stability are obtained.

Abstract: A photoactive polymer of the general formula I: in which: P is a photoactive group which can photoisomerise and/or photodimerise; B represents an aromatic or alicyclic group, or B further represents a nitrogen atom or —CR2—; A, C, D each independently of the other represents an aromatic or alicyclic group; M represents a repeating monomer unit in a homo- or copolymer; S1, S2, S3, S4, S5 represent a single covalent bond or a spacer unit; n1, n2 are each independently a positive integer up to 2 with the proviso that n1+n2≦2; R1 is a hydrogen atom, or a straight-chain or branched alkyl residue wherein R2 represents a hydrogen atom or lower alkyl. The photoactive polymers may be used as orientation layers for liquid crystals and in the construction of unstructured and structured optical elements and multi-layer systems.

Abstract: Olefins containing selected functional groups such as silyl, ether and alkenyl, and often containing a blocking group, may be copolymerized with unsubstituted olefins such as ethylene and propylene in the presence of certain coordination compounds of nickel or palladium. The resulting polymers are useful as molding resins, elastomers, in adhesives and for films.

Abstract: Disclosed are internally blocked borates useful for polymerizable compositions, and polymerizable adhesives made therewith. The internally blocked borates have general structures: wherein X represents —CHR6—, oxygen or sulfur; n is an integer; R1, R2, R3, R4, R5, and R6 are independently selected, for example, from unsubstituted and substituted C1-C10 alkyl, alkylene groups, or aryl groups, including other embodiments further defined, and M is a counter ion with positive charge m.

Abstract: Monofunctional polyfluorooxetane oligomers, polymers, and copolymers are prepared by the cationic polymerization of fluorooxetane monomers with a monoalcohol. In addition to serving as an initiator, the monoalcohol can also serve as a solvent for the fluorooxetane or other monomers to produce oligomers, polymers, or copolymers having low cyclic content. Suitable comonomers generally include various cyclic ethers. The polyfluorooxetane oligomer, polymer, or copolymer having a single hydroxyl end group can be functionalized with a variety of compounds so as to yield a functional end group such as an acrylate, a methacrylate, an allylic, an amine, etc., with the functionalized oligomer or polymer being suitable for use in radiation curable or thermal curable coating compositions. These functionalized polymers can be copolymerized and cured to provide improvements in wetting and surface properties.

Abstract: Pressure sensitive adhesive (PSA) polymers, especially low Tg, high tack, nonpolar and polar polymers useful in formulating PSA can be solubilized or dispersed in a supercritical fluid (SCF), such as liquid CO2 or supercritical CO2, using an organic cosolvent such as toluene. PSA polymers can be polymerized in SCF fluids to make unique adhesive products. Inclusion of a fluorinated reactant in the SCF polymerization process yields a PSA with improved resistance to mineral oil.

Abstract: Perfluoroelastomers, curable by peroxidic route, obtainable by polymerizing the following monomers: a) tetrafluoroethylene (TFE); b) fluorovinylethers of general formula: CFX═CXOCF2OR  (I) c) bis-olefins having general formula: RI1RI2C═CRI3—Z—CRI4═CRI5RI6  (IA) d) optionally, one or more fluorinated olefinic comonomers selected from C2-C8 perfluoroolefins, perfluoroalkylvinylethers (PAVE) CF2═CFOR2f, perfluoro-oxyalkylvinylethers CF2═CFOXa, said perfluoroelastomers comprising iodine and/or bromine atoms in the chain and/or in end position, said halogen atoms deriving from “cure site” comonomers and/or from chain transfer agents used in polymerization.

Abstract: Disclosed are internally blocked borates useful for polymerizable compositions, and polymerizable adhesives made therewith.

Abstract: Preparation methods and stabilization processes for low k polymers that consist of sp2C—X and HC-sp3C&agr;—X bonds. A preparation method is achieved by controlling the substrate temperature and feed rate of the polymer precursors. One stabilization process includes a post annealing of as-deposited polymer films under the presence of hydrogen under high temperatures. The reductive annealing of these films is conducted at temperatures from −20° C. to −50° C. to +20° C. to +50° C. of their Reversible Crystal Transformation (“CRT”) temperatures, then quenching the resulting films to −20° C. to −50° C. below their “CRT” temperatures. The reductive annealing is conducted before the as-deposited film was removed from a deposition system and still under the vacuum.

Abstract: This invention relates to a process for controlling the architecture of copolymers of at least two unsaturated monomers, made by free-radical polymerization in the presence of a cobalt-containing chain transfer agent, including the control of molecular weight, degree of branching and vinyl end group termination, by varying at least one of the variables of molar ratio of monomers, their relative chain transfer constants, polymerization temperature and degree of conversion and amount of cobalt chain transfer agent, and polymers made thereby.

Abstract: Use of vinylidenfluoride (VDF) copolymers for preparing electrolyte polymers, wherein the VDF copolymers have the following polymeric structure (I): (CH2—CF2)m—(CXY—C(ORf)Z)n—(CF2—CF(CF3))p) wherein: Rf is a perfluoroalkyl group having from 1 to 3 carbon atoms; X, Y, and Z equal to or different from each other are selected from F, Cl or H; m,n and p are integers, n or p can be 0 but not simultaneously; said VDF copolymers being obtainable by emulsion polymerization at 75-120° C., preferably 95°-120° C., in the presence of organic initiators.

Abstract: Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions using the same. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. In addition, the photoresist composition has low light absorbance at the wavelength of 193 nm, 157 nm and 13 nm, and thus is suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) and EUV (13 nm) in fabricating a minute circuit for a high integration semiconductor device. wherein, R1, R2, R3, Y, W, m and n are as defined in the specification.

Abstract: A photosensitive polymer is provided which includes: (a) perfluoro-2,2-dimethy-1,3-dioxol derivatives having the following repeating unit: and (b) vinyl derivatives having the following repeating unit: wherein R1 is H, Cl, or F; each of R2 and R3 is H or F; R4 is H, F, CF3, OCF3, OCF2CF3, OCF2CF2CF3, CH2C(CF3)2OH, fluorinated alkyloxy group having an acid-labile group, n-perfluoroalkyl group having 1 to 8 carbon atoms, ORF, wherein RF is n-perfluoroalkyl group having 1 to 3 carbon atoms, or OQZ, wherein Q is perfluorinated alkylene group having 0 to 5 oxygen atoms, the sum of carbon atom and oxygen atom in the Q is 2 to 10, and Z is COOR, SO2F, CN, COF, or OCH3, wherein R is alkyl group having 1 to 4 carbon. A photoresist composition includes the photosensitive polymer and a photoacid generator(PAG).

Abstract: The use of perfluorinated polymers and/or fluorinated ionomers as surfactant emulsifiers in emulsion polymerization of fluorinated monomers.

Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.

Abstract: Semicrystalline sulphonic fluorinated ionomers having an equivalent weight higher than 700 g/eq, up to 1,700, comprising:

Abstract: A polymer electrolyte fuel cell comprising a membrane-form polymer electrolyte, a cathode disposed on one side of the polymer electrolyte, and an anode disposed on the other side of the polymer electrolyte, wherein the cathode comprises a catalyst and an ion exchange resin, and the ion exchange resin is made of a polymer comprising the following segments A and segments B: Segments A: segments made of a polymer having sulfonic acid groups; and Segments B: segments made of a fluoropolymer having substantially no ion exchange groups.

Abstract: Functional optical materials for optical systems that are typically useful in optical waveguides, optical switching systems, optical modulators, optical computing systems and the like. Included are polymer systems and electrooptical chromophores. Polymers are thermoplastic and/or thermosetting polymers and are blended or co-polymerized with the electrooptic chromophore. The thermoplastic or thermosetting polymer selected from an acrylic/methacrylic, polyester, polyurethane, polyimide, polyamide, epoxy resin, or hybrid (organic-inorganic) or nanocomposite polyester polymer. The electrooptic chromophore is selected from a substituted aniline, substituted azobenzene, substituted stilbene, or substituted imine. Methods for improving adhesion promotion for the various novel materials are also provided.

Abstract: The present invention is to provide a multilayer molding comprising a polyamide-based resin as an outer layer and having excellent interlayer adhesion, in particular, the multilayer molding comprising a fluorine-containing resin as an inner layer, as well as a resin laminate which can form the multilayer molding.

Abstract: An amino group-containing metal compound such as a coupling agent having an amino group is dispersed in a fluoroelastomer coating composition comprising a fluoroelastomer and a polyol curing agent which are dissolved or dispersed in a liquid medium. The resulting fluoroelastomer coating composition can form an elastomer coating layer directly on ametal surface using no primer, and improve antifreeze resistance and deterioration of the coating film after compression at high temperatures for a long time.

Abstract: There is described a novel process for preparing interpolymers comprising ethylene, at least one monomer unit selected from heteroatom substituted olefin monomer units derived from a compound of the formula XV wherein E and G represent the same or different heteroatoms selected from oxygen, nitrogen, and sulfur, which are bound to a hydrogen atom, a hydrocarbyl group, or a substituted hydrocarbyl group, or are joined by a linking group; and n is 0 or an integer from 1-20; or 2,3-dihydrofuran, and optionally carbon monoxide, and interpolymers prepared thereby, including novel interpolymers having melting peak temperatures (Tm) equal to or greater than 50° C.

Abstract: There is described a novel process for preparing interpolymers comprising ethylene, at least one monomer unit selected from heteroatom substituted olefin monomer units derived from a compound of the formula XV wherein E and G represent the same or different heteroatoms selected from oxygen, nitrogen, and sulfur, which are bound to a hydrogen atom, a hydrocarbyl group, or a substituted hydrocarbyl group, or are joined by a linking group; and n is 0 or an integer from 1-20; or 2,3-dihydrofuran, and optionally carbon monoxide, and interpolymers prepared thereby, including novel interpolymers having melting peak temperatures (Tm) equal to or greater than 50° C.

Abstract: There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom.

Abstract: A fluorine-containing adhesive comprising a fluorine-containing ethylenic polymer (A) having functional group which has a crystalline melting point or glass transition temperature of not more than 270° C. and is prepared by copolymerizing (a) 0.05 to 30% by mole of at least one of fluorine-containing ethylenic monomers having at least one functional group selected from the group consisting of carboxyl and a carboxylic salt group and (b) 70 to 99.95% by mole of at least one of fluorine-containing ethylenic monomers which do not have the above-mentioned functional group and is copolymerizable with the component (a). To provide the fluorine-containing adhesive maintaining chemical resistance, solvent resistance, weather resistance and stain-proofing property and giving direct strong adhesion particularly to a substrate of metal, glass, resin, etc. and an adhesive film and laminated article which are produced from the fluorine-containing adhesive.

Abstract: A polymerization process for producing a copolymer of tetrafluoroethylene and perfluorobutylethylene, prepared by an aqueous dispersion polymerization technique, and the resin produced thereby, are provided. This copolymer contains a relatively small amount, between about 0.02 weight percent and about 0.6 weight percent, of comonomer polymerization units. The copolymer is believed to be comprised of a core-shell structure wherein the polymerized comonomer units reside primarily within the core. The primary particle size of the copolymer ranges from 0.175 microns to and including 0.203 microns and the standard specific gravity is less than 2.143. This copolymer possesses a unique combination of very small particle size coupled with high molecular weight, a combination not heretofore achieved in tetra-fluoroethylene polymers of the dispersion or fine powder type.

Abstract: This invention relates to a solventless liquid FKM compound. The compound includes a liquid FKM rubber. The compound also includes a nonsulfur curing agent. The curing agent is present in an amount of at least about 5% by weight of the compound. The compound contains substantially no solvent.

Abstract: Curable fluoroelastomer compositions having improved compression set after curing are provided, as well as compositions that are of relatively high purity. These compositions include a hydrogen-containing fluoroelastomer having interpolymerized units derived from a cure-site monomer, a curative (optionally with a co-agent), and an organo-onium. When the fluoroelastomer contains units derived from vinylidene fluoride, the composition is essentially free from an inorganic acid acceptor. Methods of improving the compression of cured fluoroelastomer and cured fluoroelastomers having improved compression set are also provided.

Abstract: Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component.

Abstract: Vinyl group-containing diarylethene monomers and photochromic polymers made there from. The diarylethene monomers may be suitable for controlled polyermerization. Polymers formed from the diarylethene monomers may have optical properties such as, for example, optical signal control properties, photochromic properties, and/or optical reflectivity properties.

Abstract: A water and oil repellent composition which can impart an excellent water and oil repellency to an object, even if it is processed at a low temperature, and which can achieve a water and oil repellent treatment providing a soft hand. The water and oil repellent composition which has as an essential component a copolymer consisting essentially of polymerized units of the following monomer (a) and polymerized units of the following monomer (b).

Abstract: The invention relates to a method for the production of a template-textured material by synthesis of a template-textured polymer (TTP) by performing crosslinking polymerization of functional monomers on a support in the presence of a template, which method is characterized in that a support having a thin polymer layer on the surface thereof is added with a reaction mixture consisting of polymerization initiator, template, functional monomer, crosslinker, solvent and/or buffer and, following sorption of the reaction mixture in the thin polymer layer, the polymerization is initiated and continued until the absorption capacity of the thin polymer layer for the template-textured polymer (TTP) is reached, and the template is optionally removed in a final step, the support used being selected in such a way that it cannot absorb the reaction solution. The materials of the invention are remarkable for their high binding specificity and selectivity for the template.

Abstract: Pressure sensitive adhesive (PSA) polymers, especially low Tg, high tack, nonpolar and polar polymers useful in formulating PSA can be solubilized or dispersed in a supercritical fluid (SCF), such as liquid CO2 or supercritical CO2, using an organic cosolvent such as toluene. PSA polymers can be polymerized in SCF fluids to make unique adhesive products. Inclusion of a fluorinated reactant in the SCF polymerization process yields a PSA with improved resistance to mineral oil.

Abstract: An ETFE powder having a viscosity factor &phgr; of at most 1×104 Pa·sec, an anelasticity factor &egr; of at most 5×10−4 Pa−1, an average particle diameter of from 5 to 1,000 &mgr;m and an apparent density of at least 0.5 g/cc, is deposited on a substrate surface, followed by heat melting and cooling for solidification to form a film.

Abstract: New precursors and processes are disclosed for making fluorinated, low dielectric constant &egr; thin films that have higher dimensional stability and are more rigid than fluorinated poly (para-xylylenes). The fluorinated, low dielectric constant thin films can be prepared from reactions of an ethylenic-containing precursor with benzocyclobutane-, biphenyl- and/or dieneone-containing precursors. The fluorinated, low dielectric constant thin films are useful for fabrications of future <0.13 &mgr;m integrated circuits (ICs). Using fluorinated, low-dielectric constant thin films prepared according to this invention, the integrity of the dielectric, copper (Cu) and barrier metals, such as Ta, can be kept intact; therefore improving the reliability of the IC.

Abstract: An acrylate resin containing fluorinated alkyl groups in ester side chains has high transmittance to VUV radiation. A resist composition using the resin as a base polymer is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for lithographic microprocessing.

Abstract: The present invention provides an optical polyacrylate polymer wherein at least 20% w/w of the total monomer repeating units are of the general formula (I): —(—CH2—C(R1) (COOR2)—)— wherein R1 is H or a C1 to C12 aliphatic and/or aromatic group, and R2 is an aliphatic and/or aromatic moiety containing at least one S atom. In further aspects, the present invention provides methods of making the above polymers, as well as planar lightwave circuits formed from such polymers.

Abstract: Process for the preparation of a dispersion based on homopolymers/copolymers of tetrafluoroethylene (TFE), said dispersion having a bimodal or multimodal distribution of the particle diameters, wherein the fraction of small particles is in the range 1.5-35% by weight calculated on the dry product; the ratio between the average diameter of the small particles with respect to the average diameter of the dispersion obtained from the polymerization being in the range 0.02-0.6; said process comprising the following essential steps: (a) preparation of an aqueous microemulsion comprising fluorinated surfactants and (per)fluoropolyether oils (PFPE); (b) feeding of the microemulsion into the polymerization reactor; (c) feeding of at least one fluorinated surfactant.

Abstract: The present invention is directed to polymeric treatment preparations for textiles and other fibrous substrates that impart water and oil repellency to fibers, yarns, textiles, or other fibrous substrates. More particularly, this invention comprises an aqueous solution, emulsion or suspension of (a) a fluorinated polymer that contains reactive groups that can complex with metal atoms that have a formal charge of 2 or greater, and (b) one or more metal atoms that have a formal charge of 2 or greater. The invention is further directed to the process for treating fibrous substrates with textile preparations in one step that provide water/soil repellency that is durable to repeated cleanings and to abrasion. This invention is further directed to the yarns, fibers, fabrics, textiles, webs, finished goods, or nonwovens (encompassed herein under the terms “textiles” and “fibrous substrates”) treated with the textile-reactive water- and soil-resistant preparation of the invention.

Abstract: The present invention pertains to a processing method to produce a porous polymer film that consists of sp2C—X and HC-sp3C&agr;—X bonds (wherein, X═H or F), and exhibits at least a crystal melting temperature, (“Tm”). The porous polymer films produced by this invention are useful for fabricating future integrated circuits (“IC's”). The method described herein is useful for preparing the porous polymer films by polymerizing reactive intermediates, formed from a first-precursor, with a low feed rate and at temperatures equal to or below a melting temperature of intermediate (T1m). Second-precursors that do not become reactive intermediates or have an incomplete conversion to reactive intermediates are also transported to a deposition chamber and become an inclusion of the deposited film. By utilizing a subsequent in-situ, post treatment process the inclusions in the deposited film can be removed to leave micro-pores in the resultant film.

Abstract: The present invention provides a water-soluble and shelf-stable aqueous fluorochemical polymeric treatment useful to treat porous substrates to render them repellent to water- and oil-based stains. The treatment comprises a water-soluble or dispersible fluorochemical polymer containing only carbon atoms in the backbone, with a plurality of each of the following groups pendent from the backbone: (a) fluoroaliphatic groups, (b) carboxyl-containing groups, (c) silyl groups and optionally (d) other non-hydrophilic groups.