From Fluorine Containing Monomer Patents (Class 526/242)
  • Patent number: 7202011
    Abstract: Disclosed is a photosensitive polymer comprising pentafluoromethylvinyl ether derivative monomer having the formula: wherein R may be an alkoxy carbonyl, alkylsilane, a fluorine-substituted or unsubstituted C3–C20 alkyl carbonyl, a fluorine-substituted or unsubstituted C3–C20 cycloalkylcarbonyl or a fluorine-substituted or unsubstituted benzoyl substituent group. The photosensitive polymer is the polymerization product of the pentafluoromethylvinyl ether derivative monomer and at least one additional monomer selected from the group consisting of (meth)acrylic acid, (meth)acrylate, styrene, norbornene, tetrafluoroethylene and maleic anhydride monomers. The photosensitive polymer may be used in photoresist compositions for exposure light sources having a predominant wavelength of less than 157 nm.
    Type: Grant
    Filed: April 28, 2003
    Date of Patent: April 10, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kwang-Sub Yoon, Sang-Gyun Woo, Ki-Yong Song, Sang-jun Choi
  • Patent number: 7202318
    Abstract: Polymerizable fluorinated ester compounds having formula (1) or (2) are novel wherein R1 is H, methyl or trifluoromethyl, R2 is a divalent hydrocarbon group, R3 is H or a monovalent hydrocarbon group, or R2 and R3, taken together, may form a ring, R4 is H, OH or a monovalent hydrocarbon group, and R5 is an acid labile group.
    Type: Grant
    Filed: July 7, 2005
    Date of Patent: April 10, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeshi Kinsho, Takeru Watanabe, Seiichiro Tachibana, Jun Hatakeyama
  • Patent number: 7199197
    Abstract: Fluoroacrylates comprise the reaction product of: (a) at least one fluorochemical alcohol represented by the formula: CnF2n+1—X—OH wherein: R=hydrogen or an alkyl group of 1 to 4 carbon atoms, m=2 to 8, Rf=CnF2n+1, y=0 to 6, and q=1 to 8; (b) at least one unbranched symmetric diisocyanate; and (c) at least one hydroxy-terminated alkyl (meth)acrylate or 2-fluoro acrylate monomer having 2 to about 30 carbon atoms in its alkylene portion.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: April 3, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Gregg A. Caldwell, John C. Clark, David J. Kinning, Alan R. Kirk, Thomas P. Klun, Ramesh C. Kumar, Roger A. Mader, George G. I. Moore, Zai-Ming Qiu, Richard B. Ross
  • Patent number: 7199196
    Abstract: The present invention provides a method of preparing an aqueous dispersion of poly(perfluorovinyl ether) homopolymers. The present invention further relates to a method of making an aqueous fluoropolymer dispersion comprising bicomponent particles of poly(perfluorovinyl ether) homopolymers and a second fluoropolymer. The dispersions of the present invention may be used for rendering fibrous substrates oil repellent, water repellent and/or stain repellent.
    Type: Grant
    Filed: December 6, 2004
    Date of Patent: April 3, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Lian S. Tan, Richard S. Buckanin, E. Steven McAlister
  • Patent number: 7196133
    Abstract: A surface tension control agent for coating materials includes a fluorine-containing (meth)acrylate copolymer obtained by copolymerizing a fluorine-substituted alkyl (meth)acrylate monomer (A), an alkyl (meth)acrylate monomer (B), and a hydroxyl group- or ether group-containing alkyl (meth)acrylate monomer (C), such that the ratio of (A) to {(B)+(C)} is 3–60 parts by weight to 40–97 parts by weight.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: March 27, 2007
    Assignee: Kyoeisha Chemical Co., Ltd.
    Inventors: Motoe Hosoda, Kazuhiro Miyake, Hidehiro Ushio
  • Patent number: 7193023
    Abstract: Polymers containing an acetal or ketal linkage and their use in lithographic photoresist compositions, particularly in chemical amplification photoresists, are provided. The polymer is prepared from at least one first olefinic monomer containing an acetal or ketal linkage, the acid-catalyzed cleavage of which renders the polymer soluble in aqueous base; and at least one second olefinic monomer selected from (i) an olefinic monomer containing a pendant fluorinated hydroxyalkyl group RH, (ii) an olefinic monomer containing a pendant fluorinated alkylsulfonamide group RS, and (iii) combinations thereof. The acetal or ketal linkage may be contained within an acid-cleavable substituent RCL in the first olefinic monomer. A method for using the photoresist compositions containing these polymers in preparing a patterned substrate is also provided in which the polymer is rendered soluble in aqueous base at a temperature of less than about 100° C.
    Type: Grant
    Filed: December 4, 2003
    Date of Patent: March 20, 2007
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Gregory Breyta, Phillip Joe Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong, Gregory Michael Wallraff
  • Patent number: 7183365
    Abstract: The present invention is generally directed to perfluoroalkylated fluorene polymers. It further relates to a process for preparing the polymers and devices that are made with the polymers.
    Type: Grant
    Filed: April 1, 2004
    Date of Patent: February 27, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Frank P. Uckert, Andrew Edward Feiring
  • Patent number: 7176265
    Abstract: A process for producing low molecular weight, granular polytetrafluoroethylene or modified polytetrafluoroethylene by suspension polymerization of pressurized tetrafluoroethylene in an agitated reaction vessel. The polymerization is conducted in aqueous medium in the presence of a free radical initiator, and a telogen. The reaction vessel is agitated during polymerization sufficiently to coagulate the polytetrafluoroethylene or modified polytetrafluoroethylene. Low molecular weight granular polytetrafluoroethylene or modified polytetrafluoroethylene having a melt viscosity of less than about 1×106 Pa·S powder is isolated directly from the reaction vessel.
    Type: Grant
    Filed: October 15, 2003
    Date of Patent: February 13, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Richard A. Morgan
  • Patent number: 7166685
    Abstract: Solid and liquid compositions containing particles of highly fluorinated ion-exchange polymer having sulfonate functional groups with an ion exchange ratio of less than about 33. The compositions contain at least about 25% by weight of polymer particles having a particle size of about 2 nm to about 30 nm.
    Type: Grant
    Filed: January 11, 2005
    Date of Patent: January 23, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Dennis Edward Curtin, Edward George Howard
  • Patent number: 7160623
    Abstract: Melt-processible, thermoplastic poly(tetrafluoroethylene) (PTFE) compositions are disclosed and methods for making and processing same. Additionally, products comprising these compositions are described.
    Type: Grant
    Filed: December 19, 2002
    Date of Patent: January 9, 2007
    Assignee: Eidgenossische Technische Hochschule Zurich
    Inventors: Paul Smith, Jeroen Visjager, Cees Bastiaansen, Theodorus Tervoort
  • Patent number: 7160967
    Abstract: Fluorovinyl ethers having the formula CFX?CXOCF2OR, wherein R is a C2–C6 linear, branched or C5–C6 cyclic (per)fluoroalkyl group, or a C2–C6 linear, branched (per)fluoro oxyalkyl group containing from one to three oxygen atoms; when R is fluoroalkyl or fluorooxyalkyl group as above defined, it can contain from 1 to 2 atoms, equal or different, selected from the following: H, Cl, Br, I; X?F, H; and homopolymers or polymers obtainable polymerizing said Fluorovinyl ethers with at least another polymerizable monomer.
    Type: Grant
    Filed: April 27, 2005
    Date of Patent: January 9, 2007
    Assignee: Solvey Solexis S.p.A.
    Inventor: Walter Navarrini
  • Patent number: 7153630
    Abstract: Novel photoresists containing at least about 0.2 molar ratio of a base with respect to the concentration of a photoacid generator present and their preparation are described. It has been discovered that inclusion of a sufficient amount of base counteracts the detrimental effects of photoacid generators, thus providing resists having submicron linewidth resolution.
    Type: Grant
    Filed: June 7, 2005
    Date of Patent: December 26, 2006
    Assignee: Massachusetts Institute of Technology
    Inventor: Theodore H. Fedynyshyn
  • Patent number: 7150957
    Abstract: Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I) wherein at least one of X and Y is a fluorine atom, and L, R1, R2, R3, R4 are as defined herein. Also provided are copolymers prepared by radical polymerization of (I) and a second monomer that may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
    Type: Grant
    Filed: April 25, 2003
    Date of Patent: December 19, 2006
    Assignee: International Business Machines Corporation
    Inventors: Richard A. DiPietro, Hiroshi Ito
  • Patent number: 7148301
    Abstract: The invention relates to high purity fluoropolymers and processes for making such materials. These polymers are particularly suited for applications in the semiconductor industry. The process comprises removal of unstable polymer end groups by fluorination and removal of heavy metal impurities by extraction with an aqueous acid medium.
    Type: Grant
    Filed: December 22, 2003
    Date of Patent: December 12, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Thomas J. Blong, Denis Duchesne, Gernot Loehr, Albert Killich, Tilman Zipplies, Ralph Kaulbach, Herbert Strasser
  • Patent number: 7144960
    Abstract: A crosslinkable second-order nonlinear optical polymer having one or more polarizable chromophore moieties, one or more diene moieties, and one or more dienophile or dienophile precursor moieties, wherein the diene and dienophile moieties are reactive to form 4+2 cycloaddition products; a crosslinked second-order nonlinear optical polymer having aligned, polarizable chromophore moieties and one or more 4+2 cycloaddition moieties, wherein the 4+2 cycloaddition moieties are reversibly, thermally reactive to provide diene moieties and dienophile moieties; lattices and devices that include the crosslinkable second-order nonlinear optical polymer; lattices and devices that include the crosslinked second-order nonlinear optical polymer; and methods for making the crosslinked second-order nonlinear optical polymer.
    Type: Grant
    Filed: January 15, 2004
    Date of Patent: December 5, 2006
    Assignee: University of Washington
    Inventors: Kwan-Yue Jen, Larry R. Dalton, Jingdong Luo, Marnie A. Haller
  • Patent number: 7129014
    Abstract: The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator, and multifunctional epoxy compound, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.
    Type: Grant
    Filed: April 2, 2003
    Date of Patent: October 31, 2006
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kouji Toishi, Yoshiko Miya, Yasunori Uetani
  • Patent number: 7126056
    Abstract: The present invention relates to a partially-crystalline copolymer comprising tetrafluoroethylene, hexafluoropropylene in an amount corresponding to HFPI of from about 2.8 to 5.3, and preferably from about 0.2% to 3% by weight of perfluoro(alkyl vinyl ether), said copolymer being polymerized and isolated in the absence of added alkali metal salts, having a melt flow rate of within the range of about 30±3 g/10 min, and having no more than about 50 unstable endgroups/106 carbon atoms can be extruded at high speed onto conductor over a broad polymer melt temperature range to give insulated wire of high quality.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: October 24, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Thomas Robert Earnest, Jr., Daniel A. Favereau, Niall D. McKee, Patricia A. Tooley
  • Patent number: 7125945
    Abstract: Halogenated polymers of vinyl aromatic monomers comprising styrene and divinylbenzene are provided for use in a chromatographic separation method of analytes, wherein said polymer further comprises a hydrocarbyl or halocarbyl substituent comprising from 1 to 1,000,000 carbon atoms, or combinations thereof. Methods of using the halogenated polymers are also provided. The polymers and methods are particularly useful in the separation of nucleic acids labeled with hydrophobic labels such as protecting groups, fluorophores, and the like.
    Type: Grant
    Filed: September 19, 2003
    Date of Patent: October 24, 2006
    Assignee: Varian, Inc.
    Inventor: Vipul J. Shah
  • Patent number: 7125941
    Abstract: The present invention provides a method of making a fluoropolymer through emulsion polymerization of one or more fluorinated monomers in an aqueous phase in the presence of a fluorinated surfactant. At least part of the fluorinated surfactant is added to the aqueous phase as an aqueous mixture with at least one organic liquid that is not miscible with water and that is selected from halogenated and non-halogenated organic liquids, the mixture having droplets having an average droplet diameter of not more than 1000 nm and the mixture being added to the aqueous phase in such an amount that the total amount of the fluorinated surfactant is not more than 1% by weight based on the weight of the aqueous phase and the total amount of said organic liquid is not more than 1% by weight based on the weight of said aqueous phase. The invention allows for an improvement of the efficiency of an aqueous emulsion polymerization process.
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: October 24, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Ralph Kaulbach, Ludwig Mayer
  • Patent number: 7125943
    Abstract: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1–25 or (b) an aromatic hydrocarbon group, each of the hydrogen group and the aromatic hydrocarbon group independently optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1–5 to satisfy an expression of m+n?6, and when at least one of R1, R2 and R3 is present in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
    Type: Grant
    Filed: August 6, 2003
    Date of Patent: October 24, 2006
    Assignee: Central Glass Company, Limited
    Inventors: Shinichi Sumida, Haruhiko Komoriya, Kazuhiko Maeda
  • Patent number: 7122609
    Abstract: The present invention relates to a partially-crystalline copolymer comprising tetrafluoroethylene, hexafluoropropylene in an amount corresponding to a hexafluoropropylene index (HFPI) of from about 2.8 to 5.3, and preferably from about 0.2% to 3% by weight of perfluoro(alkyl vinyl ether), said copolymer being polymerized and isolated in the absence of added alkali metal salts, having a melt flow rate of within the range of about 30±3 g/10 min, and having no more than about 50 unstable endgroups/106 carbon atoms can be extruded at high speed onto conductor over a broad polymer melt temperature range to give insulated wire of high quality.
    Type: Grant
    Filed: June 21, 2004
    Date of Patent: October 17, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Thomas Robert Earnest, Jr., Daniel A. Favereau, Niall D. McKee, Patricia A. Tooley
  • Patent number: 7122610
    Abstract: Nonfluorinated surfactants selected from C7–C20 linear 1-alkanesulfonates, 2-alkanesulfones, and 1,2-alkanedisulfones are particularly effective for stabilizing emulsions in preparing non-elastomeric fluoropolymers containing at least 71 wt % vinylidene fluoride and having at least a 2% crystalline polyvinylidene fluoride content. Processes for making such fluoropolymers using these surfactants, particularly in combination with one or both of a nonionic polymerization initiator and the use of mechanical coagulation to isolate the product, are also provided, as are fluoropolymers made thereby.
    Type: Grant
    Filed: April 27, 2004
    Date of Patent: October 17, 2006
    Assignee: Arkema Inc.
    Inventors: Roice Andrus Wille, Mehdi Durali, Lotfi Hedhli, Ramin Amin-Sanayei, John Schmidhauser
  • Patent number: 7115690
    Abstract: There is provided a fluorine-containing copolymer having an aliphatic monocyclic structure in the polymer trunk chain which has a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (Ma): -(M1)-(M2a)-(N)—??(Ma) in which the structural unit M1 is a structural unit derived from an ethylenic monomer having 2 or 3 carbon atoms and at least one fluorine atom, the structural unit M2a is at least one structural unit which introduces an aliphatic monocyclic structure in the polymer trunk chain and is represented by the formula (a): wherein R1 is at least one hydrocarbon group selected from the group consisting of a divalent hydrocarbon group having 1 to 8 carbon atoms and constituting a ring which may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group and a divalent hydrocarbon group having ether bond which has the sum of carbon atoms and oxygen atoms of 2 to 8, constitutes a ring and may be further substituted with a hydrocarbon group o
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: October 3, 2006
    Assignee: Daikin Industries, Ltd.
    Inventors: Takayuki Araki, Takuji Ishikawa, Meiten Koh
  • Patent number: 7105618
    Abstract: The present invention relates to a fluorine-containing polymerizable monomer having a structure of the general formula (1), where each of R1 and R2 is independently a methyl group or trifluoromethyl group, and each of R3 and R4 is independently a hydrogen atom, an alkyl group, a fluorinated alkyl group, a ring structure having an aromatic ring, or an acid-labile protecting group, each of the alkyl group and the fluorinated alkyl group independently having a straight-chain, branched or ring form and having a carbon atom number of 1–25, each of R3 and R4 optionally and independently containing at least one of an oxygen atom and a carbonyl bond.
    Type: Grant
    Filed: December 11, 2002
    Date of Patent: September 12, 2006
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Michitaka Otani, Kazuhiko Maeda
  • Patent number: 7101925
    Abstract: A process to substantially remove the fluorinated anionic surfactants comprising the following steps: a) addition to a fluoropolymer dispersion of a nonionic surfactant, in an amount in the range 1.5%–25% by weight, referred to the fluoropolymer weight; b) addition to the dispersion of a salt, soluble in water and not giving precipitates in the dispersion under the use conditions; c) contact of the dispersion with a basic anionic exchanger; d) separation of the dispersion from the basic anionic exchanger; before step d) the dispersion being filterable on a 180 micrometer net and successively on a 10 micrometer net.
    Type: Grant
    Filed: January 12, 2005
    Date of Patent: September 5, 2006
    Assignee: Solvay Solexis, S.p.A.
    Inventors: Marco Malvasi, Valeri Kapeliouchko
  • Patent number: 7094469
    Abstract: A porous or non-porous polymeric substrate having its surface modified with an immobilized fluorocarbon such as perfluorocarbon, polymeric composition is provided. The immobilized fluorocarbon is formed from a monomer having formula: [T—SO2Y—SO2T?]?M+ in which —T and T? are identical or different and comprise an organic radical bearing at least one active polymerization function such as an unsaturation or a ring that can be opened; —M+ comprises an inorganic cation.
    Type: Grant
    Filed: August 28, 2001
    Date of Patent: August 22, 2006
    Assignee: Mykrolis Corporation
    Inventor: Wilson Moya
  • Patent number: 7094851
    Abstract: An ionomer and a process for forming the ionomer such that the ionomer has (1) low equivalent weight (below 950, preferably between 625 and 850, and most preferably between 675 and 800) and (2) high conductivity (greater than 0.13 S/cm). In another embodiment, the invention is an ionomer having (1) low equivalent weight (below 950, preferably between 625 and 850, and most preferably between 675 and 800) and (2) acceptably low hydration (less than about 120 weight percent). These ionomers are capable of being processed into thin film and are extremely well-suited for low humidity or high temperature fuel cell applications.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: August 22, 2006
    Assignee: Gore Enterprise Holdings, Inc.
    Inventors: Huey Shen Wu, Charles W. Martin, Xin Kang Chen
  • Patent number: 7094839
    Abstract: Aqueous microemulsions obtained from a perfluorinated alkane sulphonic or carboxylic acid or salt thereof, a liquid fluorinated monomer comprising a cure-site and optionally an inert liquid and highly fluorinated hydrocarbon compound. The aqueous microemulsion may be formed by mixing together water, a perfluorinated alkane sulphonic or carboxylic acid or salt thereof, optionally an inert liquid and highly fluorinated hydrocarbon compound and a liquid fluorinated monomer having a cure-site.
    Type: Grant
    Filed: July 25, 2003
    Date of Patent: August 22, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Werner M. A. Grootaert, Klaus Hintzer, Bernhard Hirsch, Harald Kaspar, Robert E. Kolb, Gernot Löhr, Werner Schwertfeger
  • Patent number: 7091288
    Abstract: Polymerization of fluoroolefin monomers proceeds in a supercritical carbon dioxide solvent at high monomer loading levels to provide a high molecular weight polymer with low polydispersity and/or a unimodal molecular weight distribution.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: August 15, 2006
    Assignee: Arkema Inc.
    Inventors: Sunggyu Lee, H. Bryan Lanterman, Abhay Sardesai, Jonathan Wenzel, Benjamin Marshall, Jeffrey Hsing-Gan Yen, Ramin Amin-Sanayei, Maria Moucharik
  • Patent number: 7084225
    Abstract: A polymerization process for producing a copolymer of tetrafluoroethylene and (perfluorobutyl)ethylene, prepared by an aqueous dispersion polymerization technique, and the resin produced thereby, are provided. This copolymer contains a relatively small amount, between about 0.02 weight percent and about 0.6 weight percent, of comonomer polymerization units. The copolymer is believed to be comprised of a core-shell structure wherein the polymerized comonomer units reside primarily within the core. The primary particle size of the copolymer ranges from 0.175 microns to and including 0.203 microns and the standard specific gravity is less than 2.143. This copolymer possesses a unique combination of very small particle size coupled with high molecular weight, a combination not heretofore achieved in tetra-fluoroethylene polymers of the dispersion or fine powder type.
    Type: Grant
    Filed: February 7, 2005
    Date of Patent: August 1, 2006
    Assignee: Gore Enterprise Holdings, Inc.
    Inventor: Richard L. Baillie
  • Patent number: 7083893
    Abstract: Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an developing solution, thereby improving LER (line edge roughness). wherein X1, X2, R1, R2, m, n, a, b and c are as defined in the description.
    Type: Grant
    Filed: November 21, 2003
    Date of Patent: August 1, 2006
    Assignee: Hynix Semiconductor Inc.
    Inventor: Geun Su Lee
  • Patent number: 7078470
    Abstract: A fluorocopolymer which comprises (a) polymerized units based on tetrafluoroethylene and/or chlorotrifluoroethylene, (b) polymerized units based on a fluorinated monomer (excluding tetrafluoroethylene and chlorotrifluoroethylene) and (c) polymerized units based on at least one member selected from the group consisting of itaconic acid, itaconic anhydride, citraconic acid and citraconic anhydride, wherein (a) is from 50 to 99.8 mol %, (b) is from 0.1 to 49.99 mol %, and (c) is from 0.01 to 5 mol %, based on ((a)+(b)+(c)), and which has a volume flow rate of from 0.1 to 1000 mm3/sec.
    Type: Grant
    Filed: June 24, 2003
    Date of Patent: July 18, 2006
    Assignee: Asahi Glass Company, Limited
    Inventors: Atsushi Funaki, Naoko Sumi, Eiichi Nishi
  • Patent number: 7074472
    Abstract: The present invention provides a hard coat agent composition that is useful for forming a hard coat layer with excellent anti-staining properties and lubricity, as well as superior scratch resistance and abrasion resistance, on the surfaces of various articles. The present invention also provides an optical information medium using the above hard coat agent composition. A hard coat agent composition comprising a fluorine-containing polyether compound (A) comprising an active energy ray-reactive group, and a curable compound (B) comprising two, or three or more active energy ray-polymerizable groups within each molecule. An optical information medium comprising a film element composed of one or more layers including at least a recording layer (4) or a reflective layer, on a supporting substrate (20), wherein at least one of the supporting substrate (20)-side surface and the film element-side surface is formed of a hard coat layer (8) comprising a cured product of the hard coat agent composition.
    Type: Grant
    Filed: September 27, 2004
    Date of Patent: July 11, 2006
    Assignee: TDK Corporation
    Inventors: Hidetake Itoh, Kazushi Tanaka, Naoki Hayashida
  • Patent number: 7071272
    Abstract: The present invention provides a method for preparing a compound of CF3CF2CF2OCF?CF2 by pyrolyzing a compound expressed by CF3CF2CF2OCF(CF3)COOCF2CF(CF3)OCF2CF2CF3 in a gas phase at a temperature of from 200° C. to 500° C.
    Type: Grant
    Filed: December 2, 2002
    Date of Patent: July 4, 2006
    Assignee: Asahi Glass Company, Limited
    Inventors: Takashi Okazoe, Kunio Watanabe, Shin Tatematsu, Masakuni Sato, Hidenobu Murofushi, Koichi Yanase, Yasuhiro Suzuki
  • Patent number: 7071271
    Abstract: A method is provided for aqueous emulsion co-polymerization of two or more fluoromonomers comprising the steps of: 1) forming an aqueous pre-emulsion by mixing a fluoromonomer according to formula I: F2C?CF—R1—SO2X??(I) wherein R1 is a branched or unbranched perfluoroalkyl, perfluoroalkoxy or perfluoroether group comprising 1–15 carbon atoms and 0–4 oxygen atoms and wherein X is F, Cl or Br, together with 0.001–0.9 molar equivalents of a base, in the absence of added emulsifier; and 2) reacting the pre-emulsion with one or more perfluorinated comonomers in the absence of added emulsifier so as to form a fluoropolymer latex comprising a fluoropolymer wherein more than 1 mol % of monomer units are derived from the fluoromonomer according to formula I. In another aspect, the present invention provides a fluoropolymer derived from the fluoropolymer latex made according to the method of the present invention which is free of added emulsifier.
    Type: Grant
    Filed: October 30, 2003
    Date of Patent: July 4, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Arne Thaler, Klaus Hintzer, Kai H. Lochhaas, Franz Maerz, Steven J. Hamrock
  • Patent number: 7064170
    Abstract: Provided is a process for making a copolymer of fluorinated olefin and hydrocarbon olefin selected from ethylene, propylene and mixtures thereof, the process comprising a substantially emulsifier free aqueous emulsion polymerization of said fluorinated olefin and said hydrocarbon olefin, optionally in the presence of fluoropolymer particles and/or fluorinated liquid in a form suitable to improve the copolymerization of fluorinated olefin and hydrocarbon olefin.
    Type: Grant
    Filed: October 21, 2003
    Date of Patent: June 20, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Harald Kaspar, Peter J. Scott, Klaus Hintzer, Gernot Löhr
  • Patent number: 7063839
    Abstract: A method for continuously separating polymer from a high pressure fluid stream comprises subjecting the high pressure fluid stream comprising polymer particles to a filter, wherein the filter segregates the high pressure fluid stream from the polymer particles; subjecting the polymer particles to a rotating device which transports the polymer particles away from the filter, wherein the polymer particles are exposed to thermal conditions sufficient to melt the polymer particles and form a seal surrounding at least a portion of the rotating device; and separating the molten polymer from the rotating device. The method is carried out such that the separation of polymer from the high pressure fluid stream occurs under steady-state.
    Type: Grant
    Filed: October 18, 2004
    Date of Patent: June 20, 2006
    Assignee: North Carolina State University
    Inventors: Joseph R. Royer, George W. Roberts
  • Patent number: 7060775
    Abstract: The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 5 and a second unit represented by a general formula of the following Chemical Formula 6: wherein R1, R2, R3, R7, R8 and R9 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5, R6 and R11 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; R12 is a fluorine atom, or a straight-chain fluoridated alkyl group or a branched or cyclic fluoridated alkyl group with a
    Type: Grant
    Filed: October 1, 2004
    Date of Patent: June 13, 2006
    Assignee: Matsushita Electronic Industrial Co., Ltd.
    Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara
  • Patent number: 7049365
    Abstract: A heat sealable tape of a copolymer of tetrafluoroethylene and at least about 15% by weight of a highly fluorinated monomer. The copolymer has a melt viscosity of no greater than about 1000 Pa·S at 372° C. and an application temperature of no greater than about 250° C. The invention further provides for a seam formed from two sections of sheet material, especially fabric, wherein each sheet has at least one fluoropolymer surface. The sections are sealed one to the other by application of heat sealable composition over one fluoropolymer surface of each section. The heat sealable composition comprises a copolymer of tetrafluoroethylene and at least about 15% by weight of a highly fluorinated monomer, the copolymer having a melt viscosity of no greater than about 1000 Pa·S at 372° C. and an application temperature of no greater than about 250° C.
    Type: Grant
    Filed: December 5, 2003
    Date of Patent: May 23, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Ronald Earl Uschold, Sina Ebnesajjad
  • Patent number: 7045584
    Abstract: The present invention relates to a process for the manufacture of PVDF homopolymer or copolymer by radical polymerization of vinylidene fluoride (VDF), and optionally of a comonomer, in aqueous dispersion and in the presence of a transfer agent, of a persulphate as radical initiator, optionally of a surface-active additive and optionally of a paraffin wax, in which: a) an aqueous PVDF dispersion is obtained, b) the dispersion from stage a) is washed, optionally after having been coagulated, to lower the proportion of possible surfactant in the PVDF to below 300 ppm, this proportion being expressed with respect to the dried PVDF, c) sodium acetate and optionally a potassium alkylsulphonate are added to the dispersion washed in b), d) the dispersion from stage c) is dried by any means to recover the PVDF powder comprising sodium acetate and optionally a potassium alkylsulphonate.
    Type: Grant
    Filed: March 2, 2004
    Date of Patent: May 16, 2006
    Assignee: Arkema
    Inventors: Patrick Kappler, Véronique Gauthe
  • Patent number: 7045571
    Abstract: The use of perfluorinated polymers and/or fluorinated ionomers as surfactant emulsifiers in emulsion polymerization of fluorinated monomers.
    Type: Grant
    Filed: January 24, 2003
    Date of Patent: May 16, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Lian S. Tan, Richard S. Buckanin
  • Patent number: 7041409
    Abstract: An ionomer and a process for forming the ionomer such that the ionomer has (1) low equivalent weight; below 950, preferably between 625 and 850, and most preferably between about 700 and about 800; and (2) high conductivity, (greater than 0.15 S/cm). In an alternative embodiment, the ionomer has (1) low equivalent weight; below 950, preferably between 625 and 850, and most preferably between about 700 and about 800; and (2) acceptably low hydration, (less than about 75 weight percent). These ionomers are adapted to be processed into thin films that have acceptable physical stability. They are thus extremely well-suited for low humidity or high temperature fuel cell applications.
    Type: Grant
    Filed: January 20, 2005
    Date of Patent: May 9, 2006
    Assignee: Gore Enterprise Holdings, Inc.
    Inventors: Huey Shen Wu, Charles W. Martin, Xin Kang Chen
  • Patent number: 7041728
    Abstract: The present invention provides a method of making an aqueous dispersion of non-melt processible polytetrafluoroethylene, the method comprising: (a) an aqueous emulsion polymerization of an amount of tetrafluoroethylene to produce a final amount of polytetrafluoroethylene solids and optionally up to 1% by weight based on the amount of tetrafluoroethylene of a perfluorinated comonomer, wherein said aqueous emulsion polymerization is initiated with a free radical initiator and the polymerization is carried out in the presence of a fluorinated surfactant, and wherein before completing the feeding of said amount of tetrafluoroethylene but after feeding at least 80% by weight of said amount of tetrafluoroethylene, free radicals capable of introducing ionic end groups or precursors thereof in the polytetrafluoroethylene polymer are caused to be formed at a rate that without counter measures would cause an increase in the polymerization rate of at least 20%; (b) reducing the amount of fluorinated surfactant in the th
    Type: Grant
    Filed: October 12, 2004
    Date of Patent: May 9, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Tilman Zipplies, Klaus Hintzer, Michael C. Dadalas, Gernot Loehr
  • Patent number: 7034094
    Abstract: There is provided the process for effectively preparing the fluorine-containing polymer without using CFC and HCFC which have a high polymerization rate and a high ozone depletion potential and a coating film having excellent mechanical properties, solvent resistance and chemical resistance can be formed using the obtained fluorine-containing polymer. In preparing the fluorine-containing polymer by polymerizing a monomer containing a fluoroolefin in a polymerization medium, the fluorine-containing solvent having an ozone depletion potential of 0 and a solubility of hydroxybutyl vinyl ether of not less than 0.5% is used as the polymerization medium.
    Type: Grant
    Filed: December 11, 2001
    Date of Patent: April 25, 2006
    Assignee: Daikin Industries, Ltd.
    Inventors: Nobuhiko Tsuda, Ryoichi Fukagawa, Keisuke Tano, Daisuke Tanizawa
  • Patent number: 7029750
    Abstract: The present invention provides a thermoplastic resin composition comprising a thermoplastic resin (A), an acrylic polymer (B), a polytetrafluoroethylene-containing powder mixture (C) and a filler (D), the amount of the acrylic polymer (B) being from 0.1 to 400 parts by weight, the amount of the filler (D) being from 1 to 2000 parts by weight, based on 100 parts by weight of the thermoplastic resin (A), and the amount of a polytetrafluoroethylene component in the polytetrafluoroethylene-containing powder mixture (C) is from 0.01 to 400 parts by weight based on 100 parts by weight of the thermoplastic resin (A).
    Type: Grant
    Filed: July 14, 2003
    Date of Patent: April 18, 2006
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Seiji Takei, Masahiro Osuka, Hideo Aoki, Mari Sekita, Masaaki Mouri
  • Patent number: 7022458
    Abstract: Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an developing solution, thereby improving LER (line edge roughness). wherein X1, X2, X3, R1, R2, R3, R4, R5, m, n, o, a, b, c, d and e are as defined in the description.
    Type: Grant
    Filed: November 21, 2003
    Date of Patent: April 4, 2006
    Assignees: Hynix Semiconductor Inc., Dongjin Semichem Co., Ltd.
    Inventors: Geun Su Lee, Cheol Kyu Bok, Seung Chan Moon, Ki Soo Shin, Jae Hyun Kim, Jung Woo Kim, Sang Hyang Lee, Jae Hyun Kang
  • Patent number: 7022401
    Abstract: An anti-reflection film, which has a low-refractive-index layer composed of a cured coating of a copolymer that has a main chain consisting of carbon atoms and has a fluorine-containing vinyl monomer polymerizing unit and a polymerizing unit having in its side chain a (meth)acryloyl group.
    Type: Grant
    Filed: July 2, 2003
    Date of Patent: April 4, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tatsuhiko Obayashi, Takafumi Hosokawa
  • Patent number: 7022428
    Abstract: An ionomer and a process for forming the ionomer such that the ionomer has (1) low equivalent weight; below 950, preferably between 625 and 850, and most preferably between about 700 and about 800; and (2) high conductivity, (greater than 0.15 S/cm). In an alternative embodiment, the ionomer has (1) low equivalent weight; below 950, preferably between 625 and 850, and most preferably between about 700 and about 800; and (2) acceptably low hydration, (less than about 75 weight percent). These ionomers are adapted to be processed into thin films that have acceptable physical stability. They are thus extremely well-suited for low humidity or high temperature fuel cell applications.
    Type: Grant
    Filed: January 20, 2005
    Date of Patent: April 4, 2006
    Assignee: Gore Enterprise Holdings, Inc.
    Inventors: Huey Shen Wu, Charles W. Martin, Xin Kang Chen
  • Patent number: 7022457
    Abstract: The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.
    Type: Grant
    Filed: September 24, 2003
    Date of Patent: April 4, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: William Brown Farnham, Andrew Edward Feiring, Frank Leonard Schadt, III, Weiming Qiu
  • Patent number: 7019092
    Abstract: Fluorinated copolymers useful in photoresist compositions and associated processes for microlithography are described. These copolymers are comprised of a fluoroalcohol or protected fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials and a repeat unit derived from an acrylate monomer containing a fluoroalkyl group or a hydroxyl substituted alkyl group. The materials of this invention have high UV transparency, particularly at 193 and 157 nm, which makes them highly useful for lithography at these short wavelengths.
    Type: Grant
    Filed: February 26, 2003
    Date of Patent: March 28, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Andrew Edward Feiring, Frank L. Schadt, III, Gary Newton Taylor