Target profile for a physical vapor deposition chamber target

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a front view thereof;

FIG. 7 is a back view thereof; and,

FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2.

The dashed lines in FIGS. 1-8 represent disclaimed matter forming no part of the claimed design.

Claims

The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

Referenced Cited
U.S. Patent Documents
6659850 December 9, 2003 Korovin
D557226 December 11, 2007 Uchino
D614593 April 27, 2010 Lee
D616390 May 25, 2010 Sato
D633452 March 1, 2011 Namiki
D691974 October 22, 2013 Osada
D716742 November 4, 2014 Jang
D724553 March 17, 2015 Choi
D741823 October 27, 2015 Tateno
D769200 October 18, 2016 Fukushima
D770992 November 8, 2016 Tauchi
Other references
  • U.S. Appl. No. 29/524,109, filed Apr. 16, 2015, Riker et al.
  • U.S. Appl. No. 29/524,557, filed Apr. 21, 2015, Zhang et al.
Patent History
Patent number: D798248
Type: Grant
Filed: Jun 18, 2015
Date of Patent: Sep 26, 2017
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Ryan Hanson (Cupertino, CA), Zhenbin Ge (San Jose, CA), Vivek Gupta (Fremont, CA)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/530,683