Abstract: Process and system for removing printing in metallic packages used in drinks, food and other applications in general, comprising the removal of ink before the cure thereof, by means of spray with ink remover liquid and non abrasive friction. Preferably, said liquid is an alkaline aqueous solution, which is sprayed onto the package surface simultaneously with the friction thereof with a soft and non abrasive element. In a preferred embodiment, said friction results in the rotation of the package around the longitudinal axis thereof, which is mounted on a rotative support, and the soft non abrasive element in contact with the surface thereof keeps motionless.

Abstract: The substrate cleaning apparatus includes a first process chamber in which a liquid treating process is performed on a substrate by supplying a treating solution, a second process chamber in which a drying process is performed on the substrate, and a carrying unit carrying the substrate between the first process chamber and the second process chamber. The first process chamber includes a liquid treating housing providing a space in which the liquid treating process is performed on the substrate, a spin chuck supporting the substrate within the liquid treating housing, and a liquid supply member supplying the treating solution onto the substrate supported by the spin chuck. The second process chamber includes a drying housing providing a space in which the substrate is dried, a substrate support member supporting the substrate within the drying housing, and a heater heating the substrate.

Abstract: An ultrasonic cleaning apparatus including: a cleaning tank for storing a cleaning liquid; an object-to-be-processed holder for insertion into the cleaning tank, the holder holding an object to be processed and immersing the object into the cleaning liquid; a vibrator disposed on a bottom part of the cleaning tank; and an ultrasonic oscillator configured to make the vibrator ultrasonically vibrate. In the cleaning tank, a lateral holding member configured to hold the object is disposed. The holder is configured to be laterally moved by a driving apparatus. The control device is configured to control the driving apparatus such that the holder is laterally moved after the object has been held by the lateral holding member, and the control device is configured to control the ultrasonic oscillator such that the vibrator is made to ultrasonically vibrate so that the ultrasonic vibration from the vibrator is propagated to the object.

Abstract: A washing machine includes a valve with a housing base and a rotor, the housing base defining a central liquid line, nozzles in the housing base and in a circle that is concentric to an axis of the rotor, the nozzles being connectable to the central liquid line by a connection line in the rotor and having a seal that seals a connection with the connection line, a motor for driving the rotor, a storage container connected to each of the nozzles, a liquid line connected to the central liquid line, a pump connecting the liquid line to a dispensing device for a laundry treatment room, and a water feed without a seal in a transition to the connection line. The rotor axially presses the seals toward the housing base until contact areas of the rotor and the housing base oppose each other and are close to each other.

Abstract: A substrate processing apparatus is composed of an indexer block, a first processing block and a second processing block that are provided in parallel with one another. The indexer block is provided with an indexer robot. The first processing block is provided with a plurality of back surface cleaning units and a first main robot. The second processing block is provided with a plurality of end surface cleaning units, a plurality of top surface cleaning units and a second main robot.

Abstract: A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; an annular rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup configured to receive the process liquid discharged from the rotary cup, and provided with a drain port; and a circular flow generation element configured to generate a circular flow within the drain cup when the rotary cup and the substrate holding member are rotated, such that the circular flow serves to lead the process liquid within the drain cup to the drain port.

Abstract: A treatment system for the surface treatment of workpieces, particularly vehicle bodies, includes a plurality of transport devices, on which at least one workpiece to be treated can be attached in a releasable manner. A conveying device moves the transport devices through the treatment system. At least one treatment bath is disposed in a first conveying plane of the treatment system and the transport devices with the workpieces arranged thereon are introduced into the treatment bath. At least one cleaning device, which is suitable and designed for cleaning the transport devices after the surface treatment of the workpieces, is disposed in a second conveying plane of the treatment system. The second conveying plane is offset in the vertical direction relative to the first conveying plane.

Abstract: A multi-chamber heat treatment device (S1) includes a plurality of treatment chambers having a heat treatment chamber, the device including: a cooling chamber (3) serving as the heat treatment chamber configured to cool a treatment target by latent heat of liquid particles; treatment chambers (1, 2) different from the cooling chamber (3); and drying devices (11, 19) configured to dry the cooling chamber (3).

Abstract: An exemplary apparatus for wet processing a substantially rectangular substrate includes a conveyor, a supporting mechanism, an adjusting mechanism, a processing module and a dosing system. The conveyor is configured for conveying the substrate to a wet process work station. The supporting mechanism is configured for supporting the substrate away from the conveyor. The adjusting mechanism is configured for adjusting the orientation of the substrate. The processing module is configured for obtaining an area of a surface of the substrate. The dosing system communicates with the processing unit, and is configured for dispensing a corresponding amount of wet processing liquid to the substrate to wet process the substrate according to the area of the surface of the substrate from the processing module.

Abstract: This description relates to a wafer debonding and cleaning apparatus including an automatic wafer handling module. The automatic wafer handling module loads a semiconductor wafer into a wafer debonding module for a debonding process. The automatic wafer handling module removes the semiconductor wafer from the debonding module and loads the semiconductor wafer into a wafer cleaning module for a cleaning process.

Abstract: A surface treatment apparatus, disposed around a conveying device conveying a substrate in a predetermined conveying direction, includes: first and second liquid nozzles, disposed at an adjustable angle above the conveying device, each having an axial direction perpendicular to an axial direction of the conveying device, in which the second liquid nozzle is spaced apart from the first liquid nozzle by a first predetermined distance in the predetermined conveying direction, and the first and second liquid nozzles incline at a first angle facing each other; and first and second liquid level baffles, disposed on two sides of the conveying device respectively and spaced apart from the conveying device by a gap, in which the first and second liquid level baffles are located within the first predetermined distance spaced apart between the first and second liquid nozzles.

Abstract: An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

Abstract: In a coating and developing treatment system including a treatment station and an interface station, the interface station has: a cleaning unit cleaning a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting whether the cleaned wafer is in an exposable state; and a wafer transfer mechanism including an arm transferring the wafer between the cleaning unit and the inspection unit. Each of the cleaning unit and the inspection unit is provided at multiple tiers in an up and down direction on the front side in the interface station, and the wafer transfer mechanism is provided in a region adjacent to the cleaning units and the inspection units.

Abstract: A system and method of monitoring compliance with a hygiene protocol is disclosed. The movement of person within or otherwise associated with a facility may be tracked and hygiene requirements may be imposed based on the movement. In monitoring hygiene compliance, a number of hygiene levels may be defined that are associated with difference hygiene requirements. A hygiene level may be associated with an individual and that level may be raised or lowered based on hygiene related activity associated with the individual. An individual's hygiene level and/or his compliance with multi-level hygiene requirements may be tracked through the use of monitored hygiene stations and/or location tracking stations.

Abstract: An apparatus for level control in a fluid tank is provided, wherein the fluid tank is designed to accommodate a supply of a fluid. The apparatus includes at least one conveying line through which the fluid can flow and which has at least one control opening which is hydraulically connected to the fluid tank. The control opening is designed to at least largely prevent fluid flowing out of the conveying line and into the fluid tank when at least one minimum level in the fluid tank is exceeded, and the control opening is further designed to allow fluid to flow out of the conveying line and into the fluid tank when the at least one minimum level in the fluid tank is undershot.

Abstract: In an embodiment, the present invention discloses cleaned storage processes and systems for high level cleanliness articles, such as extreme ultraviolet (EUV) reticle carriers. A decontamination chamber can be used to clean the stored workpieces. A purge gas system can be used to prevent contamination of the articles stored within the workpieces. A robot can be used to detect the condition of the storage compartment before delivering the workpiece. A monitor device can be used to monitor the conditions of the stocker.

Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.

Abstract: An apparatus for cleaning a substrate is disclosed. The apparatus includes a first chamber through which a substrate is conveyed, a second chamber where an oxide film formed on the substrate conveyed from the first chamber is removed; and a third chamber that discharges the substrate conveyed from the second chamber to the outside after rinsing the substrate, wherein the first chamber and the third chamber are disposed on top and on bottom.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes an index part including a port on which a container containing a substrate is placed and an index robot, a processing part for processing the substrate, and a buffer unit disposed between the processing part and the index part to allow the substrate transferred between the processing part and the index part to be temporarily stayed therein. The processing part includes a glue removal processing module, a substrate cooling processing module, a heat processing module, and a functional water processing module which are disposed along a transfer passage for transferring the substrate.

Abstract: An apparatus for treating objects with a treatment gas comprises a treatment chamber, a chamber input through which objects enter the treatment chamber, and a chamber output (which may be the same as the chamber input) through which the objects leave the treatment chamber. The treatment chamber encloses the treatment gas, which can be steam. The chamber output and/or the chamber input include an intermediate medium, such as a liquid, through which the objects pass. The intermediate medium prevents escape of the treatment gas from the treatment chamber and the ingress of external gases into the treatment chamber, while facilitating input of the objects to the chamber, and output of the objects from the chamber.

Abstract: A method is used for removing a metal contaminant deposited on a quartz member selected from the group consisting of a reaction tube, wafer boat, and heat-insulating cylinder of a vertical heat processing apparatus for a semiconductor process. The method includes obtaining the quartz member unattached to the vertical heat processing apparatus; then, performing diluted hydrofluoric acid cleaning of cleaning the quartz member by use of diluted hydrofluoric acid; then, performing first purified water cleaning of cleaning the quartz member by use of purified water; then, performing hydrochloric acid cleaning of cleaning the quartz member by use of hydrochloric acid; and then, performing second purified water cleaning of cleaning the quartz member by use of purified water.

Abstract: A complete hand hygiene station and method of monitoring a complete hand hygiene station are provided. The complete hand hygiene station may include at least an automated wash cylinder or chamber, a sanitizer dispenser and a lotion dispenser. The wash chamber and/or the sanitizer dispenser may be used to provide a user with a hand washing. The lotion dispenser may be used to moisturize a user's hands after the usage of the sanitizer dispenser. The complete hand hygiene station may be monitored to ensure compliance with one or more hygiene protocols. A particular hygiene protocol may specify hygiene requirements such as daily hygiene station usage, lotion usage subsequent to sanitizer usage, and/or mandatory wash chamber use subsequent to a predetermined number of lotion usages.

Abstract: An apparatus for processing semiconductor wafers includes at least a wet bench and an automatic handling system of a wafer carrier removably connected thereto. The wet bench includes a first processing tank, a second processing tank and a third processing tank, separated from one another, each processing tank being dedicated to a different chemical, as well as a special cleaning and drying tank for processing the automatic handling system when the wafer carrier has been removed.

Abstract: A method and an associated apparatus for washing rock samples, which is particularly suited to the washing and preparation of rock samples obtained from oil and gas wells. In one embodiment there is provided a method of washing rock samples involving a plurality of discrete rock samples; providing a plurality of sequentially arranged discrete washers each of which is spaced from a respective washing position and configured to direct a washing flow of water towards said washing position; and automatically conveying said samples relative to said washers so that each sample moves in succession through said washing positions for sequential washing by each said washer.

Abstract: An apparatus (1) to process used materials for input into a manufacturing process. The apparatus includes a housing (10) having a top surface (15) and providing a plurality of chambers arranged in descending order. A series of locations (20) are positioned under said top surface and through which used materials are to pass. Each said location being provided for receipt of a predetermined used material. A descending path (25) extends from each said location and provides for the transfer of used material from the respective location successively through the chambers. The chambers include a sensing chamber (30) downstream of said locations and having sensing means (35) operable to sense the composition of used material located within said sensing chamber. The sensing means being operable to activate an alarm if the used material has been placed by a user in an opening for receipt of a different material.

Abstract: Provided are a substrate processing apparatus and a substrate processing method capable of processing of a substrate using a supercritical fluid without exposing the pattern formed on the substrate to an atmospheric environment. The substrate processing apparatus includes a cleaning bath configured to accommodate a substrate and clean the substrate by flowing a cleaning solution, and a processing vessel configured to accommodate the cleaning bath and process the substrate with a supercritical fluid.

Abstract: The Furniture Pad Folding Machine is a dry cleaning machine that is multi-faceted; it can clean and disinfect furniture pads and the machine has the ability to fold furniture pads. The machine is portable and can function on the moving truck and at the warehouse.

Abstract: A substrate processing apparatus of a simplified structure, which is capable of decreasing an amount of a process liquid to be used, and of restraining change in temperature of the process liquid is provided. The substrate processing apparatus includes: a processing unit that holds one substrate and processes the substrate held by the processing unit; a processing bath capable of simultaneously accommodating a plurality of substrates, the processing bath storing a process liquid into which a substrate is immersed so as to be processed, the process liquid being circulatingly supplied to the processing bath; and a transfer unit that simultaneously transfers substrates whose number is less than the number of substrate that can be accommodated in the processing bath. The transfer unit transfers, at least, to the processing bath in which the process liquid is stored. A substrate is processed with the use of at least one of the processing unit and the processing bath.

Abstract: A conveyor warewasher for washing wares includes a first tank including a drain system having a drain outlet and a drain stop movable between a drain outlet closed position and a drain outlet open position. A second tank includes a drain system having a drain outlet, an associated drain path that leads to the first tank and an associated drain path stop moveable between a drain path open position and a drain path closed position. A drain control assembly includes a common drain actuator operatively connected to cause both (i) movement of the drain stop from the drain outlet closed position to the drain outlet open position and (ii) movement of the drain path stop from the drain path closed position to the drain path open position.

Abstract: In the case of a method and an apparatus for treating substrates, resist layers are removed from the substrates by spraying with process solution. The substrates are sprayed with the process solution first in a main stripping module and then in a post-stripping module and the said process solution collects in containers under the modules. At least one container is respectively provided for each module. The process solution is collected in the main stripping module in two containers and first fed directly into a second container, which is largely separated from the first container by a wall, which is liquid-permeable in a region significantly below the surface level of the process solution. Process solution is taken from the first container without froth and returned once again into the cycle of the process for wetting the substrates.

Abstract: The invention relates to a device and a method for filling or packing contents, particularly beverages, food, medications, or the like, into containers. As the containers pass through the device from an inlet to an outlet side, the containers passing through the working chamber have a sterile fluid, particularly sterile air, applied thereto for preventing germ growth. In order to reduce the cleaning effort for lines for the sterile fluid, the invention proposes that a cleaning medium having an internal line is inserted into the line for applying the sterile fluid. The line no longer needs to be disassembled in order to load the sterile fluid. In order to distribute the sterile fluid uniformly throughout the containers in a working chamber, the sterile fluid is distributed in two stages, first by means of the pipe extending into the working chamber, as described above and then through a profile extending over the containers and below the pipe, having openings for passing the sterile fluid.

Abstract: A conveyor belt washer/dryer includes a housing that encloses a washing station separated by one or more spray barriers from a drying station. The housing has a passage that is sized and configured to allow the conveyor belt to successively pass through washing station and the drying station. The washing station includes one or more washing heads, a splash plate and a reservoir. The washing heads discharge a wash liquid onto the top surface of the conveyor belt the splash plate redirects the wash liquid onto the bottom surface. The reservoir collects the spent wash liquid. The drying station includes one or more air knife/knives that discharge(s) pressurized air onto the conveyor belt to dry the belt.

Abstract: A reusable container for the sterile transfer of pharmaceutical recipients, in particular of syringe bodies. The container comprises an outer case and a sterilizable interior, wherein the interior is microbially isolated from the environment of the container. The interior has at least one holder for accommodating at least one nest for storing a plurality of pharmaceutical recipients. The nest can be removably accommodated in the holder. The container further has at least one container door for removing or introducing the nest into the interior and at least one lock for coupling the container to a sterile space. The lock is configured in such a way that, after coupling to the sterile space, it is possible to open the container door without substantially suspending sterility.

Abstract: The invention relates to the continuous cleaning of objects, in particular of semiconductor elements, using ultrasound, wherein the objects to be cleaned are arranged within a liquid. Furthermore, the present invention relates to an apparatus for carrying out the method according to the invention. A basic idea of the invention is that the surface of an object to be cleaned (2) in a tank (5) filled with liquid passes through at least one oscillation maximum that is emitted by at least one sound source (8a) being present in the tank (5). According to one embodiment, the sound source fields (8) that are positioned within the tank (5) are arranged inclined with respect to the transport direction (4).

Abstract: There is provided a substrate processing method including cleaning a substrate by immersing the substrate in a cleaning solution in a longitudinal direction while the cleaning solution is supplied to a cleaning tank; transferring the substrate picked up from the cleaning tank to a drying chamber while holding the substrate in a longitudinal direction; and drying the substrate in the drying chamber communicating with an upper area of the cleaning tank by alternately supplying a first drying gas containing vapor of a solvent for removing a liquid and a second drying gas without containing the vapor of the solvent for removing the liquid to an area where the substrate is exposed between the upper area of the cleaning tank and the drying chamber after an upper end of the cleaned substrate is picked up from a liquid surface of the cleaning solution.

Abstract: The invention relates to a dishwashing system (100) comprising at least one conveyor system (101) for feeding washware to one conveyor dishwasher (2, 2?) and a conveyor system (101) for feeding dishware to the at least one conveyor dishwasher (2, 2?) In order to further reduce the consumption of fresh water, chemicals and energy during operation, the invention provides a washware detector apparatus (51) which is designed to detect the number of units of washware, which are fed to the at least one conveyor dishwasher (2, 2?) with the aid of the conveyor system (101) per unit time, in a prespecified or prespecifiable region of the conveyor system (101). Furthermore, a control device (50) is provided which is designed to select a predefined or predefinable treatment program.

Abstract: Discs roll along an inclined track through a chamber to expose opposite disc sides for cleaning. Energized fluid directed against the opposite sides removes particles from the discs, the fluid and particles exiting the chamber. Stop pins control a time period for cleaning and transporting the discs by selectively blocking or releasing the discs. The discs are stopped at many sections of a transducer, the sections being tailored to provide various cleaning characteristics. Within the chamber, the chamber is configured to minimize particles that originate other than by being adhered to the disc at a time when the disc is introduced into the chamber. Internal chamber configuration also minimizes retention of particles so that particles removed from one disc do not linger in the chamber for possible transfer to a disc that is cleaned in the same chamber at a later time.

Abstract: An apparatus for supporting a work piece is provided. The apparatus includes outer support rails having support slots for supporting the work piece, the outer support rails disposed on opposing sides of the apparatus between opposing end members of the apparatus. Inner support rails extend between the opposing end members of the apparatus. An inner surface of each of the inner support rails has vertically disposed extensions extending therefrom. The vertically disposed extensions are aligned in pairs along a length of the inner support rails. A moveable device is disposed between the pairs of vertically disposed extensions. The moveable device is buoyantly moveable so that as the work piece is lifted, the moveable device follows. A method for cleaning a work piece is also included.

Abstract: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluidnozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.

Abstract: A method and apparatus for cleaning printed circuit boards are provided. The method includes providing a cleaning apparatus with a housing having a conveyance mechanism for carrying printed circuit boards through the housing. The cleaning apparatus has at least a prewash station, a wash station and a final rinse station therein. The printed circuit boards are carried on the conveyance mechanism to the prewash station. A plurality of fluidic oscillator nozzles of the prewash station are utilized to direct liquid onto the printed circuit boards. Each fluidic oscillator nozzle outputs a stream of liquid with an instantaneous direction that oscillates back and forth relative to a nozzle axis over time.

Abstract: Embodiments of the invention generally relate to apparatus and methods for washing substrates. In particular, apparatus and methods for washing solar cell substrates are described, the apparatus including a detergent mixing circuit to control detergent concentration during washing.

Abstract: A facility for cleaning substrates such as semiconductor wafers includes a loading/unloading part, an aligning part where wafers are repositioned from a horizontal state to a vertical state, a cleaning part performing etchant-treating, rinsing, and drying processes for wafers and having a plurality of process chamber stacked, and an interface part where a transfer bath is disposed to transfer wafers between the process chambers. When the wafers are transferred between the process chamber, the transfer bath is filled with deionized water (DI water) to prevent their exposure to the air. Wafers drawn out of the loading/unlading part are repositioned from a horizontal state to a vertical state and are transferred to a first process chamber being one of the process chambers to be subjected to a part of processes.

Abstract: An end effector for a transport robot arm for a wafer wet cleaning system has an arm with a chuck at an end of the arm to support a wafer. The chuck also includes a cavity to spray a bottom surface of the wafer with a cleaning fluid. At least two branches extend from the chuck away from the arm with a roller at the end of each branch to hold the wafer. A spray bar is coupled to the arm. The spray bar is configured to hold and spray a top surface of the wafer with the cleaning fluid.

Abstract: A system for washing-out concrete pouring equipment includes a bin for receiving waste materials washed with water from the concrete pouring equipment. The bin includes openings allowing liquid to drain into a base unit that includes sidewalls defining a receptacle for receiving the bin and a sloped bottom for conveying liquid drained from the bin to a sump. A filtering system filters particulate matter from liquid provided from the sump to recover the water.

Abstract: A method of cleaning a semiconductor substrate includes cleaning a semiconductor substrate with a cleaning liquid, rinsing the semiconductor substrate with rinse water after the semiconductor substrate has been cleaned, and drying the semiconductor substrate after the semiconductor substrate has been rinsed. A temperature of the rinse water is set to 70° C. or above in the rinsing, and the rinse water is set so as to be acidic.

Abstract: A method for cleaning containers, in particular bottles of glass or plastics, and a cleaning machine with at least one cleaning medium, with the containers cleaned at least in one station preferential for the cleaning result and/or in a procedure step with at least essentially chemical-free cleaning media. The cleaning medium is advantageously a granular material, in particular granular ice, carried under pressure with compressed air or compressed water. The cleaning machine suited for carrying out the method includes downstream of an unpacking and presoaking station, a pre-cleaning station with a high pressure water blasting pre-cleaning section, and subsequently an intensive cleaning station with at least one intensive cleaning section to which a pressure blasting system for chemical-free, granular material and a carrier medium are associated, and a disinfection station following the intensive cleaning station.

Abstract: The invention relates to a conveyor dishwasher having at least one washing zone (6, 7), at least one rinsing zone (8, 9) and a heat-recovery device (13) with a suction-extraction means. The dishwasher also comprises a drying zone (11). Openings (17, 18, 19, 20, 21) are provided for the suction extraction of air from the dishwasher. The overall quantity of the exhaust-airstream (24) can be varied by means of closing elements (25, 26, 27, 28), in dependence on the operating state of the dishwasher, by virtue of the openings (17, 18, 19, 20, 21) being completely or partially closed or released.

Abstract: A pickle line assembly is provided having a roll tank, a pickle tank, and an expansion seal. The roll tank includes a front and rear face that are angled towards one another at the upper end. The pickle tank includes front and rear openings, which can be brought into registration with an opening in the front face and rear face of the roll tank. Expansion seals are configured to surround a perimeter of the pickle tank substantially near the front and rear openings, and are angled at approximately the same angle as the front and rear face of the roll tank. The expansion seal encloses the path between the pickle tank and roll tank, and the tilt angle of the front and rear face of the roll tank allow the pickle tank to be vertically raised and lowered into position without interference.

Abstract: A combination automotive floor mat cleaning and fragrance applying system comprising an elongate conveyor, an infeed station made up of opposed rollers, a wet scrubber station, a hot air drying station downstream of the wet scrubber station and a fragrance applying station for applying one of several selectable fragrances to the floor mats after they are cleaned and dried.

Abstract: A substrate having a liquid film formed by pre-processing unit is transported by a substrate transport robot from the pre-processing unit to a freeze processing unit disposed away from the pre-processing unit. In the freeze-processing unit, the liquid film is frozen. This causes the adhesion power of contaminants adhering to the surface of the substrate reduce, and therefore the contaminants is detached from the surface of the substrate. Subsequently, the substrate which was subjected to the freezing process, is transported from the freeze processing unit to a post-processing unit which is disposed away from the pre-processing unit and the freeze processing. In the post-processing unit, a cleaning liquid is supplied to the frozen film on the rotating substrate, thereby easily removing the contaminants adhering to the substrate together with the frozen film.