Abstract: Disclosed are a liquid processing method, a liquid processing apparatus, and a recording medium that can prevent convex portions of a target substrate from collapsing when a rinsing liquid is dried. A base surface of a target substrate is hydrophilized and the surfaces of convex portions are water-repellentized by surface-processing the target substrate which includes a main body, a plurality of convex portions protruding from the main body, and a base surface formed between the convex portions on the substrate main body. Next, a rinsing liquid is supplied to the target substrate which has been subjected to the surface processing. Thereafter, the rinsing liquid is removed from the target substrate.

Abstract: Disclosed is a liquid processing apparatus that processes a substrate with a processing liquid. The processing apparatus includes: a substrate holder configured to hold the substrate; a processing liquid supply unit configured to supply the processing liquid to the substrate held by the substrate holder; a rinsing liquid supply unit configured to supply a rinsing liquid to the substrate; and a light emitting element configured to emit light of a wavelength range, which is absorbed only by the substrate, and irradiate the emitted light to the substrate.

Abstract: Disclosed is a liquid treatment apparatus including a nozzle positioned below the substrate retained by a substrate retaining unit. The nozzle is capable of ejecting two fluids of a mixture of a liquid and a gas. The nozzle includes a plurality of liquid-ejecting passages for ejecting a liquid and a plurality of gas-ejecting passages for ejecting a gas, and also includes a plurality of liquid-ejecting ports each corresponding to one of the liquid-ejecting passages. The liquid-ejecting ports are arrayed on a horizontal line extending inwardly from a position below a peripheral portion of the substrate. The liquid-ejecting ports are configured to eject the liquid towards the lower surface of the substrate in an ejecting direction, and the ejecting direction is inclined at an inclination angle in a rotating direction of the substrate rotated by rotational driving unit with respect to a plane including the lower surface of the substrate.

Abstract: A surface treatment apparatus of a substrate can clean a substrate surface in the air without employing a vacuum apparatus, and can remove a natural oxide film or an organic material, such as BTA, from the substrate surface without resorting to plasma cleaning. The surface treatment apparatus includes: an inert gas supply section for supplying an inert gas to the whole or part of a substrate surface to form an oxygen-blocking zone; a heating section for keeping the substrate surface at a predetermined temperature; and a cleaning gas supply section for supplying a cleaning gas to the oxygen-blocking zone to clean the substrate surface.

Abstract: A liquid treating apparatus comprising a holding device (30) for holding wafers (W) in a substantially vertical attitude and a treating vessel (10) for accommodating the wafers held by the holding device. A treating liquid is supplied into the treating vessel by means of a treating liquid supply system. A rotational drive device (20) is provided for rotating the holding device (30) around a rotational axis passing approximately through the center of the wafers (W) in a state of non-contact with the treating vessel (10).

Abstract: A dishwasher includes a liquid system having a washing solution reservoir for making available washing solution for a washing cycle of a subsequent dishwashing program. Via a hot water inlet via of an external hot water supply hot water can be introduced into the liquid system for forming the washing solution and filling the washing solution reservoir with washing solution.

Abstract: A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of a base sufficient to bring a pH of the fatty acid water solution to about a level where above about 50% of the dispersed fatty acid is ionized. A method for cleaning a substrate, a system for cleaning a substrate, and a cleaning solution prepared by a process are also provided.

Abstract: A pet waste removal device including an elongated hand held boom having an open bottom shield disposed at a bottom end of the boom for positioning over a pile of animal waste. A motor driven agitator is disposed within the shield and driven by a motor to rotate between a counterclockwise and a clockwise rotation to mechanically break up pet waste. Fluid jet nozzles are supplied water via a garden hose connection and are arranged to direct water jets into the shield to wash away the pet waste as it is broken up by the agitator. A chemical dispenser for dispensing a chemical solution can also be provided.

Abstract: A dishwasher includes a hot water inlet device for intake of hot water from an external hot water supply and a cold water inlet device for intake of cold water from an external cold water supply. A program control device controls a wash cycle of a selected dishwashing program for cleaning wash items. The program control device is constructed to operate in at least one of first and second operating modes, wherein the first operating mode includes activation of one wash program which, in at least one partial wash cycle of a wash cycle, draws hot water from the external hot water supply, and wherein the second operating mode includes activation of another wash program which, in at least one partial wash cycle of a wash cycle, exclusively draws cold water from the external cold water supply.

Abstract: A method for cleaning a spraying circuit, in particular of paint, and for treating the chemical effluents generated includes a first rinsing of the paint circuit using a predetermined first volume of treated effluent, a second rinsing of the paint circuit using a predetermined second volume of ecosolvent and a third rinsing of the paint circuit using a predetermined third volume of treated effluent, so as to save on the consumption of water from the network by recycling the treated effluent to clean and rinse the paint circuit.

Abstract: A method and apparatus for drying semiconductor wafers uses hot isopropyl alcohol in liquid form at temperatures above 60° C. and below 82° C. The use of hot IPA better avoids pattern collapse and permits reduced consumption of IPA. The wafer temperature can be maintained by applying hot deionized water to the opposite wafer side and by evaporating the hot IPA from the wafer surface using heated nitrogen gas.

Abstract: A rinsing liquid adheres to a substrate subjected to a cleaning process. The rinsing liquid on the substrate is first replaced with IPA liquid. While the substrate covered with the IPA liquid is held in a dryer chamber, liquid carbon dioxide is supplied to the surface of the substrate. Liquid nitrogen is supplied to cool down the interior of the dryer chamber. This solidifies the liquid carbon dioxide on the substrate into solid carbon dioxide. Thereafter, the pressure in the dryer chamber is returned to atmospheric pressure, and gaseous nitrogen is supplied into the dryer chamber. Thus, the temperature in the dryer chamber increases. The solid carbon dioxide on the surface of the substrate is sublimated, and is hence removed from the substrate. All of the steps are performed while carbon dioxide is not in a supercritical state but in a non-supercritical state.

Abstract: The invention relates generally to a cleansing apparatus for a substrate and a cleansing method for cleansing byproducts generated after an etching process of the substrate. The cleansing apparatus comprises: a first cleansing device including a first supply unit for providing a first cleansing fluid to an etched substrate; a second cleansing device including a second supply unit for providing a second cleansing fluid to the substrate cleansed by the first cleansing fluid; and a third cleansing device including a third supply unit for providing a third cleansing fluid to the substrate cleansed by the second cleansing fluid. The first cleansing fluid and the third cleansing fluid are pure water (DI water), and the second cleansing fluid is an alkali solution.

Abstract: Substrate treatment equipment includes a wet treatment apparatus for treating a substrate with a solution (liquid), a drying (treatment) apparatus discrete from the wet treatment apparatus and for drying the substrate using a supercritical fluid, and a transfer device. The substrate is extracted by the transfer device from the wet treatment apparatus after the substrate has been treated and the substrate is transferred by the device while wet to the dry treatment apparatus. To this end, various elements/methods may be used to keep the substrate wet or wet the substrate. In any case, the substrate is prevented from drying naturally, i.e., from air-drying, as the substrate is being transferred from the wet treatment apparatus to the drying apparatus. Thus, equipment and method prevent defects such as water spots and the leaning of fine structures on the substrate.

Abstract: Disclosed herein is a printed circuit board assembly of an electronic appliance including a plurality of boards on which electrical parts to perform functions necessary for the electronic appliance are separately arranged according to the specification of the electronic appliance. The printed circuit board assembly is divided into a plurality of boards, such that electrical parts having a common specification and electrical parts having different specifications are arranged on different boards, thereby optimizing the printed circuit board assembly and configuring the boards according to the specification of the electronic appliance without loss. Microprocessors are arranged on the boards, and the boards are connected to each other in a serial communication, thereby reducing the number of wiring harnesses (W/H) and thus configuring the printed circuit board assembly with high reliability.

Abstract: An automated process for cleaning fruit bins, and particularly grape bins, deploys a conveyer system in which bins are simultaneously rinsed on the inside and outside in an inverted position. Two rinse cycles are rapidly completed with the conveyance of the inverted bins through a wash station. The wash station deploys a pivoting U-shaped spray rod inside the bin, below the conveyor track, while the outside is rinsed by a second surrounding inverted U-shaped spray bar that moves transverse to conveyor direction will the bin is stationary inside the wash station. A pivoting L-shaped arm with an integrated conveyor track move the bins on or off the central conveyor, while flipping them 90 degrees. Two such conveyors return the bins to an upright position for use and stacking. The water from a first rinse is optionally screens to remove solids and collected water is then locally treated before using it to rinse subsequent bins.

Abstract: According to an embodiment, a supercritical drying method includes: introducing a semiconductor substrate of which a surface is wet with a supercritical displacement solvent into a chamber; supplying a first supercritical fluid being based on first carbon dioxide to the chamber; supplying a second supercritical fluid which is based on second carbon dioxide to the chamber, after the supplying of the first supercritical fluid; and lowering an inside pressure of the chamber to gasify the second supercritical fluid and to discharge the gasified second supercritical fluid from the chamber. The first carbon dioxide is generated by recovering and recycling the carbon dioxide discharged from the chamber. The second carbon dioxide contains no supercritical displacement solvent or contains the supercritical displacement solvent in a concentration lower than that in the first carbon dioxide.

Abstract: A process system includes a manufacture device, a concentration detector and a compensation device. The manufacture device is used for processing a wafer using a chemical solution. The concentration detector detects a concentration of a key component in the chemical solution. The compensation device provides a supplement solution to the manufacture device when the concentration of the key component in the chemical solution is lower than a definite value, wherein the supplement solution includes a component that is the same as the key component in the chemical solution.

Abstract: A molded plastic mixing station housing for mixing water and chemical for car wash applications comprises a generally right hexahedron having a deep top recess which visually divides the housing into parallel spaced apart towers. A cylindrical mixing reservoir is recessed into the front of the housing such that a Hyrominder can be mounted in the top recess to overlie the open top of the mixing reservoir. A stand-off welt wraps around the entire housing just below the vertical center line to provide a stand-off feature for both wall mounting as well as the mounting of a control panel on one of the side surfaces of the housing. Mounting bracket slots are provided in the four upper corners of the housing for both wall mounting and control panel mounting. A deep recess runs down the back side to provide space for an overflow tube. The housing is preferably rotocast from high density polyethylene and may be color coded to match with the supply for a particular chemical.

Abstract: A system and method for semiconductor processing chamber includes a housing that can cover an annular gap of a pedestal well of the semiconductor processing chamber. A cleaning nozzle is removably coupled to a compressed dry air (CDA) supply. The cleaning nozzle can inject the CDA into the pedestal well while the housing can contain a byproduct dust agitated by the injected CDA. The byproduct dust is evacuated by at least one vacuum port that is removably coupled to a vacuum source.

Abstract: After a rinse process on a wafer W is performed by feeding pure water to the surface of the wafer W at a predetermined flow rate while rotating the wafer W in an approximately horizontal state, a feed amount of the pure water to the wafer W is reduced, and a pure-water feed point is moved outward from the center of the wafer W. In this manner, the wafer W is subjected to a spin dry process while forming a liquid film in a substantially outer region of the pure-water feed point.

Abstract: A rinsing liquid (DIW) is discharged from a rinsing liquid discharge port formed in a blocking member to perform rinsing processing to a substrate surface while a nitrogen gas is supplied into a clearance space, and a liquid mixture (IPA+DIW) is discharged from a liquid mixture discharge port formed in the blocking member to replace the rinsing liquid adhering to the substrate surface with the liquid mixture while the nitrogen gas is supplied into the clearance space. Thus, an increase of the dissolved oxygen concentration of the liquid mixture can be suppressed upon replacing the rinsing liquid adhering to the substrate surface with the liquid mixture, which makes it possible to securely prevent from forming an oxide film or generating watermarks on the substrate surface.

Abstract: Water-soluble detergents and enzymes are used for mechanically cleaning textiles or crockery. According to the invention, enzymes with a catalytic effect on typical stains are added to the washing or cleaning process, only for as long as their catalytic effect is desired. This avoids superfluous removal of the enzymes that have been used in a washing or cleaning process.

Abstract: A resist on an electronic material is surely separated and removed in a short time. The electronic material is cleaned with a sulfuric acid solution containing persulfuric acid to separate and clean the resist, and thereafter wet cleaning is performed with gas dissolved water. By using gas dissolved water for performing wet cleaning after the resist separation with the sulfuric acid solution containing persulfuric acid, the time required for cleaning can be sharply reduced as compared with that of a former method. The sulfuric acid solution containing persulfuric acid is preferably one produced by electrolyzing a sulfuric acid solution.

Abstract: The present disclosure provides a system for in-situ spectrometry. The system includes a wafer-cleaning machine that cleans a surface of a semiconductor wafer using a cleaning solution. The system also includes a spectrometry machine that is coupled to the wafer-cleaning machine. The spectrometry machine receives a portion of the cleaning solution from the wafer-cleaning machine. The portion of the cleaning solution collects particles from the wafer during the cleaning. The spectrometry machine is operable to analyze a particle composition of a portion of the wafer based on the portion of the cleaning solution, while the wafer remains in the wafer-cleaning machine during the particle composition analysis.

Abstract: The present invention provides a lens care kit for disinfecting and cleaning contact lenses. The lens care kit of the invention allows customers to visually identify when their lenses are disinfected, clean, and ready to wear. The invention is relied on color change, due to temporally photo-bleaching of a colored lens care solution, to indicate the readiness of disinfection and cleaning of contact lenses.

Abstract: A deaeration device for bubbling dissolved air in the cleaning liquid by cavitation is connected on a cleaning-liquid circulation path so as to bubble the dissolved air in the cleaning liquid flowing through the cleaning-liquid circulation path, and the bubbled dissolved air flows back to the cleaning tank together with the cleaning liquid so that the bubbled dissolved air is ejected from the liquid surface of the cleaning tank to the outside of the tank. Moreover, a propeller-type pump is used as the circulating pump, and the dissolved air concentration of the cleaning liquid is controlled within a range of 2.5 to 3.5 mg/l.

Abstract: Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.

Abstract: An apparatus for wet treatment of an object includes a treatment bath in which an object to be treated is received and treated; a plurality of object supporting rods rotatably installed in the treatment bath and having a plurality of slots formed in surfaces thereof to support an object so that the object stands in a direction perpendicular to a bottom surface of the treatment bath; and a rotating means connected to the object supporting rods to rotate the object in a circumferential direction by rotating the object supporting rods. Treatment fluid injecting holes for injecting a treatment fluid to the object and treatment fluid channels for supplying the treatment fluid to the treatment fluid injecting holes are formed in the object supporting rods. Thus, a dead zone in the treatment bath is removed and the treatment fluid may flow uniformly and smoothly, which improves treatment efficiency and treatment uniformity.

Abstract: A process for treating the surface of a resin substrate with an ozone gas by bringing the ozone gas into contact with the surface includes the steps of: generating an ozone gas; humidifying the generated ozone gas; and exposing the surface of the resin substrate to the humidified ozone gas.

Abstract: A reaction vessel for entraining ozone gas in an aqueous ozone solution for an industrial cleaning system is described. The reaction vessel includes a conical-shaped surface having two or more edges. The conical-shaped surface defines a generally hollow interior, and the two or more edges are in contact with the generally hollow interior. An inlet port is in fluidic communication with a supply of an aqueous ozone solution to supply the aqueous ozone solution to the conical-shaped surface. Nozzles are in fluidic communication with a supply of water, and the nozzles direct the water under pressure at the conical-shaped surface, and the water mixes with the aqueous ozone solution from the inlet port. An outlet is in fluidic communication with the industrial cleaning system. The reaction vessel may receive the aqueous ozone solution from an injector.

Abstract: A substrate liquid processing apparatus of the present invention includes a process-liquid supply unit selectively supplying a plurality of types of process-liquids to the substrate held by a substrate holding table, first and second guide cups which are disposed in this order from the top and are configured to respectively guide downward the process-liquid scattering from the rotating substrate while being held by the substrate holding table; and a position adjustment mechanism adjusting a positional relationship between the first and second guide cups and the substrate holding table. A first process-liquid recovery tank is provided at a lower area of the first and second guide cups and recovers the process-liquid guided by the first guide cup. A second process-liquid recovery tank is provided at the inner peripheral side of the first process-liquid recovery tank and recovers the process-liquid guided by the second guide cup.

Abstract: A method of cleaning at least one of grime and built-up ice off a rotor blade of a wind turbine includes, in an exemplary embodiment, positioning a rotor blade in an immobile position in a downward orientation substantially parallel to the tower, positioning a tank containing a cleaning solution directly below the rotor blade, and positioning a plurality of lifting arms adjacent the tank. The plurality of lifting arms are attached to an elliptical spray head with at least one pipe connected to the elliptical spray head and to a pump operatively coupled to the tank. The method also includes raising the lifting arms to lift the elliptical spray head to a predetermined position along a longitudinal axis of the rotor blade, pumping cleaning solution from the tank to the elliptical spray head, spraying the cleaning solution onto an outer surface of the rotor blade to clean the rotor blade, and collecting the spent cleaning solution in the tank.

Abstract: A soiled surface cleaning system is described for pre spraying soiled surface areas, and for rinsing and extracting the pre sprayed soiled surface areas, wherein the pre spraying of the soiled surface areas does not have to be stopped in order to perform the rinsing and extracting of the pre sprayed soiled surface areas. The system includes a prespray unit having a proportional pump driven by water from a water service line. The pump mixes the water with prespray and feeds the diluted prespray to a spray gun. The system also includes a rinse unit having a triplex pump that receives water from the water service line, increases the water's pressure, and feeds the pressurized water to an injector. The injector mixes the water with a rinse agent and feeds the diluted rinse agent to a nozzle arrangement on an extraction wand. In use, areas of the soiled surface are first pre sprayed with the diluted prespray. The diluted prespray is allowed to dwell on the pre sprayed areas.

Abstract: A liquid treatment device having a rotatable substrate holding section (2) for horizontally holding a wafer (W), an annular-shaped rotation cup (4) which surrounds the wafer (W) which rotates with the wafer (W), a rotation mechanism (3) for integrally rotating the rotation cup (4) and the substrate holding section (2), a nozzle (5) for supplying a treatment liquid for the wafer (W) at a treatment position and a cleaning liquid for the rotation cup (4) at its external surface, a liquid supply section (85) for the nozzle (5), and a nozzle movement mechanism for moving the nozzle (5) between the wafer treatment position and the external portion of the rotation cup (4).

Abstract: A laparoscopic lens cleaner which is suitable for maintaining the lens of a laparoscope in a clean, dry condition during a laparoscopic surgical procedure is disclosed. An illustrative embodiment of the laparoscopic lens cleaner includes an elongated cleaner sheath having a sheath interior, a fluid conduit provided in the cleaner sheath, a fluid discharge nozzle provided in the sheath interior and communicating with the fluid conduit, a gas conduit provided in the cleaner sheath and a gas discharge nozzle provided in the sheath interior and communicating with the gas conduit.

Abstract: The present invention provides methods and apparatuses for controlling the transition between first and second treatment fluids during processing of microelectronic devices using spray processor tools

Abstract: A method of washing polycrystalline silicon is provided. The method includes a step of acid cleaning in which the polycrystalline silicon is cleaned with an acid solution and a step of a water cleaning in which the polycrystalline silicon is cleaned by pure water after the step of acid cleaning. In the step of water cleaning, residual acid solution on the surface of the polycrystalline silicon is removed by immersing the polycrystalline silicon in pure water held in a water cleaning bath, and replacing the pure water in the water cleaning bath at least once. The electrical conductivity (C) of the pure water in the water cleaning bath is measured. Based on the reading of the electrical conductivity (C), the timing for finishing the step of water cleaning is decided.

Abstract: An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for cleaning substrates has a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out internally-formed liquid droplets, wherein an injection port for injecting liquid droplets to the outside is formed at the front end of the lead-out passage, and wherein a cross-sectional area Sb of the injection port is formed smaller than a cross-sectional area Sa of the lead-out passage, and a cross sectional area Sc of an exit of the gas supply passage is formed smaller than the cross-sectional area Sa of the lead-out passage.

Abstract: A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto the surface of a substrate such that a region onto which the cleaning liquid is poured moves from a central part toward the circumference of the substrate. A gas is jetted radially outward at a region on the surface of the substrate behind a region onto which the cleaning liquid is poured with respect to the rotating direction of the substrate. The gas forces a liquid film of the cleaning liquid flowing on the surface of the substrate to flow in a circumferential direction and a radially outward direction.

Abstract: An apparatus for washing a substrate includes a scrub washing unit for washing both surfaces of a substrate, which are scrubbed by a rotating brush while supplying pure water to both surfaces of the substrate, a rinse unit for washing the surfaces of the substrate which have been washed by the scrub washing unit using the pure water, and a dry unit for drying the surfaces of the substrate which have been washed by the rinse unit. The scrub washing unit includes an ultrasonic application unit for applying ultrasonic waves to pure water supplied to the both surfaces of the substrate, which are scrubbed by the rotating brush while supplying the pure water to which the ultrasonic wave has been applied by the ultrasonic application unit to the both surfaces of the substrate.

Abstract: A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the center portion of a front surface of the wafer W through a fluid supply port 40 which is an end of a fluid supply path 5, and is discharged through a fluid discharge portion 44 arranged in the bottom portion of the airtight container 41 in a form of a groove running along a circle having its center located on the center axis of the wafer W. The cleaning liquid flows and spreads from the center portion of the wafer W toward the peripheral portion while removing particles adhered to the wafer W, and is discharged through the fluid discharge portion 44. This arrangement allows the particles to be uniformly and reliably removed without rotating the wafer W. The entire cleaning apparatus 4 has a small size.

Abstract: A laparoscopic lens cleaner which is suitable for maintaining the lens of a laparoscope in a clean, dry condition during a laparoscopic surgical procedure is disclosed. An illustrative embodiment of the laparoscopic lens cleaner includes an elongated cleaner sheath having a sheath interior, a fluid conduit provided in the cleaner sheath, a fluid discharge nozzle provided in the sheath interior and communicating with the fluid conduit, a gas conduit provided in the cleaner sheath and a gas discharge nozzle provided in the sheath interior and communicating with the gas conduit.

Abstract: A method of dispensing a first solid product and a second solid product with a solid product dispenser includes placing the first solid product in a product housing of the dispenser and placing the second solid product in the product housing on top of the first solid product, the first and second solid products being different products. A portion of the first solid product is dispensed during each cycle of the dispenser until the first solid product has been partially depleted to a size small enough to allow the second solid product to also be dispensed, then a portion of the first solid product and a portion of the second solid product are dispensed during each cycle of the dispenser until the first solid product has been completely depleted, and then a portion of the second solid product is dispensed during each cycle of the dispenser.

Abstract: A method for automatically washing eggs by (a) dispensing a detergent-wetting agent mixture having a detergent concentration onto the eggs; (b) determining if the detergent concentration is at least a pre-set minimum, and going to step (a) if it is; (c) activating a detergent pump pumping at a rate; (d) activating a wetting-agent pump at 1/Nth the rate of the detergent pump, to form the detergent-wetting agent mixture; (e) determining if a pre-set interval has expired, and going to step (b) if it has not; otherwise (f) stopping the detergent pump and the wetting agent pump.

Abstract: A method and composition is provided for removing protein soil and preventing redeposition of soils onto a surface. The method includes introducing a protein-removing/anti-redeposition agent during a washing step of a wash cycle, introducing a cleaning composition during the washing step of the wash cycle, washing the surface of the substrate with the protein-removing/anti-redeposition agent and the cleaning composition during the wash cycle, and subsequently rinsing the surface of the substrate with a rinse aid. The protein-removing/anti-redeposition agent includes a poly sugar and the cleaning composition includes an alkalinity source and a surfactant component. The composition is substantially free of phosphorus-containing compounds and includes less than about 0.05% by weight alkali earth metal.

Abstract: A system and method are disclosed for cleaning articles within a chamber of a warewash machine. The warewash machine has a rinse sump for collecting a rinse agent dispensed into the chamber and a wash sump for collecting a wash agent dispensed into the chamber. The method includes a wash phase during which the wash agent is dispensed into the chamber during and an auxiliary rinse phase during which the rinse agent is dispensed into the chamber. The wash machine includes a controllable deflector for directing the wash agent to the wash sump during the wash phase and the rinse agent to the rinse sump during the auxiliary rinse phase. The method also includes a final rinse phase during which water from an external source is dispensed into the chamber. The controllable deflector direct the water dispensed during the final rinse phase to the rinse sump such that the water combines with the rinse agent therein. The rinse agent is re-used during at least one subsequent auxiliary rinse phase.

Abstract: A method for removing liquid from a surface of a disc includes, rotating the disc article about an axis perpendicular to the disc's main surface, supplying liquid from a supply port, moved across the substrate towards the edge of the disc, onto the rotated disc, supplying a first gas flow through a first gas supply port onto the disc article to an area whose centre has a distance to the centre of rotational movement of not more than 20 mm, the area being covered with a liquid layer thereby opening the liquid layer at a discrete area, and supplying a second gas flow through a second gas supply port moved across the substrate towards the edge of the substrate onto the rotated disc wherein the distance of the second gas supply port to the centre is lower than the distance of the liquid supply port to the centre.

Abstract: A proximity head including a head surface. The head surface including a first flat region and a plurality of first conduits. Each one of the plurality of first conduits being defined by corresponding one of a plurality of first discrete holes. The plurality of first discrete holes residing in the head surface and extending through the first flat region. The head surface also including a second flat region and a plurality of second conduits. The plurality of second conduits being defined by a corresponding plurality of second discrete holes that reside in the head surface and extend through the second flat region. The head surface also including a third flat region disposed between and adjacent to the first flat region and the second flat region and a plurality of third conduits. The plurality of third conduits being defined by a corresponding plurality of third discrete holes that reside in the head surface and extend through the third flat region.

Abstract: Water-soluble detergents and enzymes are used for mechanically cleaning textiles or crockery. According to the invention, enzymes with a catalytic effect on typical stains are added to the washing or cleaning process, only for as long as their catalytic effect is desired. This avoids superfluous removal of the enzymes that have been used in a washing or cleaning process.