Using Plasma Patents (Class 219/121.36)
  • Publication number: 20130001204
    Abstract: Material treatment is effected in a treatment region by at least two energy sources, such as (i) an atmospheric pressure plasma and (ii) an ultraviolet laser directed into the plasma and optionally onto the material being treated. Precursor materials may be dispensed before, and finishing material may be dispensed after treatment. Electrodes for generating the plasma may comprise two spaced-apart rollers. Nip rollers adjacent the electrode rollers define a semi-airtight cavity, and may have a metallic outer layer.
    Type: Application
    Filed: June 28, 2012
    Publication date: January 3, 2013
    Applicant: MTIX LTD
    Inventors: Pravin Mistry, Jahr Turchan
  • Patent number: 8324523
    Abstract: An apparatus for synergistically combining a plasma with a comminution means such as a fluid kinetic energy mill (jet mill), preferably in a single reactor and/or in a single process step is provided by the present invention. Within the apparatus of the invention potential energy is converted into kinetic energy and subsequently into angular momentum by means of wave energy, for comminuting, reacting and separation of feed materials. Methods of use of the apparatus in the practice of various processes are also provided by the present invention.
    Type: Grant
    Filed: October 9, 2009
    Date of Patent: December 4, 2012
    Assignee: Foret Plasma Labs, LLC
    Inventor: Todd Foret
  • Publication number: 20120285934
    Abstract: A device for generating a plasma, comprises an alternating voltage source, a travelling wave resonator and coupling means that are designed to couple the alternating voltage generated by the alternating voltage source into the travelling wave resonator in such a manner that travelling electromagnetic waves are produced, wherein the travelling wave resonator is designed to increase the electric field strength of the travelling electromagnetic waves in such a manner that a plasma is ignited in a gas. The invention further relates to a method for generating a plasma, comprising the steps of: generating an alternating voltage; generating travelling electromagnetic waves in a travelling wave resonator by coupling said alternating voltage into the travelling wave resonator; and increasing the electric field strength of the travelling electromagnetic waves in the travelling wave resonator in order to ignite a plasma in a gas.
    Type: Application
    Filed: November 19, 2010
    Publication date: November 15, 2012
    Applicant: FORSCHUNGSVERBUND BERLIN E.V.
    Inventors: Horia-Eugen Porteanu, Roland Gesche, Silvio Kuehn
  • Publication number: 20120285935
    Abstract: Provided is a heat treatment apparatus in which a heat treatment apparatus in which the thermal efficiency is high, the maintenance expense is low, the throughput is high, the surface roughness of a sample can be reduced, and the discharge uniformity is excellent, although the heat treatment is performed at 1200° C. or more. A heat treatment apparatus includes: parallel planar electrodes; a radio-frequency power supply generating plasma by applying radio-frequency power between the parallel planar electrodes; a temperature measuring section measuring the temperature of a heated sample; and a control unit controlling an output of the radio-frequency power supply, wherein at least one of the parallel planar electrodes has a space where the heated sample is installed, therein, and heats the sample in the electrode by the plasma generated between the parallel planar electrodes.
    Type: Application
    Filed: July 19, 2011
    Publication date: November 15, 2012
    Inventors: Masatoshi MIYAKE, Ken'etsu YOKOGAWA
  • Patent number: 8309878
    Abstract: A universal power supply for use in a plasma arc system is disclosed. The power supply can include a plurality of power modules for providing a DC output from an AC input. Each of the power modules can include a rectifier, a converter, an inverter, an isolation transformer and an output rectifier. The power modules can include a power module controller configured to control at least one of the rectifier, the converter, or the inverter such that a DC output can be obtained from a wide variety of AC inputs. The power modules can be connected in parallel to provide a wide range of DC output currents for the power supply. The universal power supply can include a master controller coupled to each of the individual power module controllers to regulate the DC output current of the power supply by controlling the individual power module controllers.
    Type: Grant
    Filed: December 30, 2009
    Date of Patent: November 13, 2012
    Assignee: ITT Manufacturing Enterprises, Inc.
    Inventor: Jackie Winn
  • Publication number: 20120282134
    Abstract: Various embodiments include a method of producing chemically pure and stably dispersed metal and metal-alloy nanoparticle colloids with ultrafast pulsed laser ablation. A method comprises irradiating a metal or metal alloy target submerged in a liquid with ultrashort laser pulses at a high repetition rate, cooling a portion of the liquid that includes an irradiated region, and collecting nanoparticles produced with the laser irradiation and liquid cooling. The method may be implemented with a high repetition rate ultrafast pulsed laser source, an optical system for focusing and moving the pulsed laser beams, a metal or metal alloy target submerged in a liquid, and a liquid circulating system to cool the laser focal volume and collect the nanoparticle products. By controlling various laser parameters, and with optional liquid flow movement, the method provides stable colloids of dispersed metal and metal-alloy nanoparticles. In various embodiments additional stabilizing chemical agents are not required.
    Type: Application
    Filed: July 17, 2012
    Publication date: November 8, 2012
    Applicant: IMRA AMERICA, INC.
    Inventors: Bing LIU, Zhendong HU, Makoto MURAKAMI, Yong CHE
  • Patent number: 8304684
    Abstract: A plasma torch rotation assembly for relieving stress on a lead. The rotation assembly can include an outer housing, which can have a mounting surface adapted to be fixedly coupled to a torch mount. The rotation assembly can include an inner component disposed at least partially within the outer housing, and a bearing structure disposed between the outer housing and the inner component. The bearing structure can facilitate rotational movement of the outer housing relative to the inner component, about a longitudinal axis of the rotation assembly. The rotation assembly can include a torch adapter disposed near a first end of the inner component. The torch adapter can be adapted to mate with a plasma arc torch. The rotation assembly can include a receiving portion disposed at a second end of the inner component, the receiving portion adapted to receive at least a portion a lead.
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: November 6, 2012
    Assignee: Hypertherm, Inc.
    Inventors: Brian J. Currier, Ross A. Smith, Jeremy Beliveau, Jon W. Lindsay
  • Publication number: 20120261390
    Abstract: An induction plasma torch comprises a tubular torch body, a plasma confinement tube disposed in the tubular torch body coaxial therewith, a gas distributor head disposed at one end of the plasma confinement tube and structured to supply at least one gaseous substance into the plasma confinement tube; an inductive coupling member for applying energy to the gaseous substance to produce and sustain plasma in the plasma confinement tube, and a capacitive shield including a film of conductive material applied to the outer surface of the plasma confinement tube or the inner surface of the tubular torch body. The film of conductive material is segmented into axial strips interconnected at one end. The film of conductive material has a thickness smaller than a skin-depth calculated for a frequency of a current supplied to the inductive coupling member and an electrical conductivity of the conductive material of the film.
    Type: Application
    Filed: February 2, 2012
    Publication date: October 18, 2012
    Inventors: Maher I. Boulos, Nicolas Dignard, Alexandre Auger, Jerzy Jurewicz, Sébastien Thellend
  • Patent number: 8288677
    Abstract: The invention relates to a coupling device (24) used for producing a flow path between the tank (6) of a water vapor cutting device (1) and a liquid-filled cartridge (25), wherein said coupling device (24) comprises a housing (29) provided with a receiving area (30) which is formed therein, used for mounting the cartridge (25) on said housing (29) and which comprises a channel (39) provided with an input orifice (40) fluidically connectable to the cartridge (25) and to an output opening (41) which is also fluidically connectable to an external surrounding area, for example to the tank (6).
    Type: Grant
    Filed: September 6, 2006
    Date of Patent: October 16, 2012
    Assignee: Fronius International GmbH
    Inventors: Ernst Aunitzky, Wolfgang Haberler, Roland Ortner, Heribert Pauser, Max Stöger, Martin Trausner, Andreas Wiesinger
  • Patent number: 8263896
    Abstract: A system for automatically controlling an operating mode of a plasma torch includes a plasma torch that is connected to a power source and a controller. The controller is configured to automatically determine a desired operating mode of the plasma torch and deliver a power signal to the plasma torch based on the desired operating mode.
    Type: Grant
    Filed: January 3, 2005
    Date of Patent: September 11, 2012
    Assignee: Illinois Tool Works Inc.
    Inventor: Joseph C. Schneider
  • Patent number: 8253057
    Abstract: A system and method for generating a plasma. An embodiment of the system for generating a plasma may include a first electrode; a second electrode disposed adjacent the first electrode; a first power supply for supplying power at the second electrode; a second power supply for generating a magnetic field; and a sequencer for coordinating a discharge of power from the first power supply and a discharge of power from the second power supply. The first power supply may be configured such that the discharge of power from the first power supply generates a plasma between the first electrode and the second electrode. The second power supply may be configured such that the magnetic field generated by the discharge of power from the second power supply rotates the plasma.
    Type: Grant
    Filed: January 11, 2006
    Date of Patent: August 28, 2012
    Inventor: Jack Hunt
  • Patent number: 8242404
    Abstract: A plasma jet system includes a housing with a single opening. A plasma generator is coupled to ionize a fluid in the housing. An electromagnetic accelerator is coupled to generate an electric field that accelerates ionized fluid in the housing toward the opening. A controller can modulate the frequency of the electric field to cause the ionized fluid to form a plasma vortex flow through the opening. A magnetic field is applied normal to the direction of the plasma vortex flow to mitigate the momentum of the electrons. The electrons slowed by the magnetic field can be collected and conducted to a location where they are re-inserted into the plasma vortex flow to maintain charge neutrality.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: August 14, 2012
    Assignee: Lockheed Martin Corporation
    Inventors: Daniel N. Miller, Paul D. McClure, Charles J. Chase, Robert R. Boyd
  • Patent number: 8236237
    Abstract: A device and method for inactivating infectious biological or chemical agents using microwave-activated diazoluminomelanin (DALM). The agents are typically vacuumed into a load cavity, which is at least partially filled with DALM. The load is irradiated with microwaves via a cylindrical waveguide disposed under the load cavity, thereby inactivating or destroying the agents. The system is preferably temperature controlled and operation is preferably automated.
    Type: Grant
    Filed: July 25, 2007
    Date of Patent: August 7, 2012
    Assignee: Fiore Industries, Inc.
    Inventors: John Todd Elson, David E. Lane
  • Patent number: 8232500
    Abstract: This application relates to a plasma torch assembly comprising a plurality of tubes; a collar integral with at least one tube comprising a first abutment surface; a base for holding the tubes during operation of the torch comprising a portion for receiving the collar and a second abutment; and co-operating interlocking portions for removably urging the first and second abutment surfaces together by relative rotation of the interlocking portions wherein the first and second abutment surfaces comprise a complimentary taper for aligning the collar in concentric formation with at least one other tube on the base by co-operation of the interlocking portions.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: July 31, 2012
    Assignee: Glass Expansion Pty Ltd.
    Inventors: Danny Brezni, Jost Eberhard Kaiser, Bobby Brezni, David Sultana
  • Publication number: 20120181257
    Abstract: A component for a contact start plasma arc torch is provided. The component includes a hollow body defining a channel with a longitudinal axis. The channel is capable of slideably receiving an electrode body along the longitudinal axis. The component includes a contact element disposed in the hollow body and includes a first surface and a second surface. The first surface is adapted to facilitate electrical communication with a power supply and the second surface is adapted to physically contact a surface of the electrode body when the plasma arc torch is operated in a transferred arc mode. In addition, the second surface is characterized by the absence of physical contact with the surface of the electrode body when the torch is operated in a pilot arc mode.
    Type: Application
    Filed: January 6, 2012
    Publication date: July 19, 2012
    Applicant: Hypertherm, Inc.
    Inventors: Jonathan P. Mather, Nicholas A. Sanders, Jon W. Lindsay, Peter Twarog, E. Michael Shipulski, Zheng Duan, David Jonathan Cook
  • Patent number: 8217299
    Abstract: A system and method for over-voltage protection is described. In one embodiment of the invention, an apparatus includes an output port configured to deliver power to a plasma chamber to ignite a plasma. The apparatus also includes a shunt switch in parallel with the output port and a processor configured to receive an indicator of an arc in the plasma. The processor is configured to close the shunt switch for a period of time to divert current away from the arc. The processor is also configured to trigger a pulse of the shunt switch to limit a voltage of an increasing voltage condition associated with the arc.
    Type: Grant
    Filed: February 22, 2007
    Date of Patent: July 10, 2012
    Assignee: Advanced Energy Industries, Inc.
    Inventors: Milan Ilic, Vladislav V. Shilo, Robert Brian Huff
  • Patent number: 8207470
    Abstract: Provided is an apparatus for generating remote plasma, which can improve thin-film quality by preventing an arc at a bias electrode. The apparatus includes a radio frequency (RF) electrode installed inside an upper portion of a chamber, a bias electrode installed apart from the RF electrode, and including a plurality of through holes through which plasma passes, wherein a bias power is supplied to the bias electrode, a plasma generating unit formed between the RF electrode and the bias electrode, wherein a plasma gas is supplied to the plasma generating unit, and a ground electrode installed under and spaced apart from the bias electrode, and including plasma through holes corresponding to the through holes of the bias electrode, wherein a pulsed DC bias of a second voltage level, which has a first voltage level periodically, is applied to the bias electrode.
    Type: Grant
    Filed: August 25, 2009
    Date of Patent: June 26, 2012
    Assignee: Industry-University Cooperation Foundation Hanyang University
    Inventors: Hyeong-Tag Jeon, Sang-Hyun Woo, Hyung-Chul Kim, Chin-Wook Chung
  • Patent number: 8199790
    Abstract: Disclosed herein is a reactor vessel for plasma gasification reactors employing a DC graphite electrode, AC graphite electrodes, AC plasma torches or DC plasma torches to create a high-energy plasma arc for the pyrolytic decomposition of feed materials. The vessel is configured with an upper portion and a lower portion, where the lower portion is for the containment of a layer of molten metal (iron) and a second layer of slag and having a substantially uniform width, while the upper portion being for the containment of gas and having a varying width. The reactor vessel comprises a steel shell housing a multi-layered wall that defines a chamber where the multi-layered wall includes a first layer high-density refractory material, a second intermediate layer of a insulating material, and a third outer layer of high-density refractory materials.
    Type: Grant
    Filed: November 2, 2007
    Date of Patent: June 12, 2012
    Assignee: Plasma Waste Recycling, Inc.
    Inventor: Rodrigo B. Vera
  • Patent number: 8197765
    Abstract: A waste gas purification apparatus comprises: a heater, which heats waste gas mixed with reaction air to separate it into a solid reactant and a vapor purification gas; a water reserve tank unit, which has a water reserve tank communicated with the heater; a dust collector unit, which comprises a dust collector collecting the purification gas inflowed from the first process unit, and a water reserve tank communicated with lower portion of the dust collector; a scrubber unit, which comprises a scrubber inhaling the purification gas inflowed from the dust collector unit, and a reserve tank communicated with lower portion of the scrubber; and a collector, which has an adsorber and a remover filtering the purification gas inflowed from the scrubber unit, a water distributor being installed in upper portion of the remover and lower portion of the adsorber.
    Type: Grant
    Filed: December 1, 2006
    Date of Patent: June 12, 2012
    Inventor: Young Bae Park
  • Publication number: 20120132626
    Abstract: A cooling tube for an arc plasma torch, comprising an elongate body with an end which can be arranged in the open end of an electrode, and a coolant duct extending therethrough, characterised in that at said end there is a bead-like thickening of the wall of the cooling tube pointing inwards and/or outwards, and an arrangement of a cooling tube for an arc plasma torch, comprising an elongate body with a rear end which can be releasably connected to an electrode holder of an arc plasma torch, and a coolant duct extending therethrough, and an electrode holder for an arc plasma torch, comprising an elongate body with an end for receiving an electrode and a hollow interior, and characterised in that on the outer surface of the cooling tube at least one projection is provided for centring the cooling tube in the electrode holder.
    Type: Application
    Filed: March 24, 2010
    Publication date: May 31, 2012
    Inventors: Frank Laurisch, Volker Krink, Ralf-Peter Reinke
  • Publication number: 20120118862
    Abstract: A method and apparatus for oxidizing a combustible material. The method includes introducing a volume of the combustible material into a plasma zone of a gliding electric arc oxidation system. The method also includes introducing a volume of oxidizer into the plasma zone of the gliding electric arc oxidation system. The volume of oxidizer includes a stoichiometrically excessive amount of oxygen. The method also includes generating an electrical discharge between electrodes within the plasma zone of the gliding electric arc oxidation system to oxidize the combustible material.
    Type: Application
    Filed: July 12, 2007
    Publication date: May 17, 2012
    Inventors: Joseph J. Hartvigsen, S. Elangovan
  • Patent number: 8159233
    Abstract: An arrangement for detecting in-situ arcing events within a processing chamber of a plasma processing system during substrate processing is provided. The arrangement includes a probe arrangement, which is disposed on a surface of the processing chamber and is configured to measure at least one plasma processing parameter. The probe arrangement includes a plasma-facing sensor and a measuring capacitor, wherein the plasma-facing sensor is coupled to a first plate of the measuring capacitor. The probe arrangement also includes a detection arrangement that is coupled to a second plate of the measuring capacitor, wherein the detection arrangement is configured for converting an induced current flowing through the measuring capacitor into a set of digital signals, which is processed to detect the in-situ arcing events.
    Type: Grant
    Filed: July 7, 2009
    Date of Patent: April 17, 2012
    Assignee: Lam Research Corporation
    Inventors: Jean-Paul Booth, Douglas Keil
  • Patent number: 8153924
    Abstract: A system is provided that includes a torch power unit. The torch power unit includes a monitor and/or control configured to determine a temperature of a component of the torch power unit based on the one or more inputs without a direct temperature measurement of the component. A method of operation is provided that includes receiving one or more inputs associated with a device, and estimating a temperature of the device based on the one or inputs without directly measuring temperature of the device. A tangible machine-readable medium is provided that includes code for determining a thermal capacity of the device, code for determining a thermal resistance of the device, and code for determining a temperature of the device based on thermal capacity and the thermal resistance method.
    Type: Grant
    Filed: December 19, 2007
    Date of Patent: April 10, 2012
    Assignee: Illinois Tool Works Inc.
    Inventors: Anthony Van Bergen Salsich, Edward Gerard Beistle
  • Patent number: 8148661
    Abstract: A DC plasma torch which includes a long lasting thermionic cathode and has a high thermal efficiency. The DC plasma torch employs a solid cathode made of graphite with highly ordered structure such as Pyrolitic Graphite or Carbon-Carbon composites. Furthermore, carbon containing gases will be used as plasma gas. The cathode will allow for theoretically an unlimited lifetime of the cathode.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: April 3, 2012
    Inventors: Valerian Pershin, Javad Mostaghimi, Liming Chen
  • Patent number: 8137341
    Abstract: A method with apparatus for performing surgery using plasma is described. In one exemplary embodiment, the apparatus includes a radiofrequency signal generator, a conditioning network coupled to the radiofrequency signal generator, and a catheter coupled to the conditioning network, the catheter including at least one electrode, such that the conditioning network conditions radiofrequency energy produced by the radiofrequency signal generator to create plasma at the at least one electrode of the catheter. Such novel plasma ablation system provides the capability to create high precision ablation with minimal damage to adjacent structures in numerous types of matter while employing multiple operation platforms including catheter based plasma application.
    Type: Grant
    Filed: October 19, 2011
    Date of Patent: March 20, 2012
    Inventor: Richard J Fugo
  • Patent number: 8138444
    Abstract: Provided is a plasma processing apparatus including a chamber, a lower electrode, an upper electrode, and a substrate sensor. The chamber is configured to provide a reaction space. The lower electrode is disposed at a lower region in the chamber to mount a substrate thereon. The upper electrode is disposed at an upper region in the chamber to be opposite to the lower electrode. The substrate sensor is provided on the chamber to sense the substrate. Herein, the upper electrode includes an electrode plate and an insulating plate attached on the bottom of the electrode plate, and at least one guide hole is formed in the upper electrode to guide light output from the substrate sensor toward the substrate.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: March 20, 2012
    Assignee: Tes Co., Ltd.
    Inventor: Sung Ryul Kim
  • Patent number: 8129653
    Abstract: A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately.
    Type: Grant
    Filed: July 2, 2008
    Date of Patent: March 6, 2012
    Assignee: HUETTINGER Elektronik GmbH + Co. KG
    Inventors: Thomas Kirchmeier, Hans-Juergen Windisch, Hanns-Joachim Knaus, Michael Glueck, Gerd Hintz
  • Patent number: 8129654
    Abstract: The present invention relates to a plasmatron structure for heating working gas in a DC arc discharge at the atmospheric or lowered pressures and can be used for different electronic, engineering, or vehicle-building industries and for medicine. An object of the invention is to provide improved effectiveness of process gas activation and increased completeness of plasma-chemical reactions. These objects are achieved in a DC arc plasmatron comprising a rod cathode, a nozzle anode having a body member and a through axial orifice, a power supply unit connected to both electrodes, and a gas system for feeding plasma-forming gas into inter-electrode space and supplying suitably selected technologic gas or gas mixture into the anode orifice through an internal opening communicating with said orifice and positioned between its inlet and outlet parts.
    Type: Grant
    Filed: December 26, 2006
    Date of Patent: March 6, 2012
    Assignee: Cheju National University Industry Academic Cooperation Foundation
    Inventors: Heon-Ju Lee, Yong-Son Mok, Valentin Anatolievich Riaby, Valdim Yu Plaksin
  • Patent number: 8129656
    Abstract: The invention relates to a method for producing thermal energy, wherein, by means of a plasma arc which is located between a cathode and an anode, light initial material that is suitable for fusion processes is put into the plasma state by supplying electric energy. Use is made of a cathode made of a metal that is suitable for allowing the particles which are produced in the plasma to be diffused and for allowing a fusion process to take place in the metal grid. The invention has a high degree of efficiency in corresponding systems such that said methods can be used anywhere where fossil and/or renewable and/or chemical fuels are used, in order to use the thermal energy directly or by conversion.
    Type: Grant
    Filed: August 9, 2006
    Date of Patent: March 6, 2012
    Assignee: Purratio AG
    Inventors: Richard Reichmann, Karl-Ludwig Barth
  • Patent number: 8109218
    Abstract: A process for the treatment of waste, the process comprising either a gasification step or a pyrolysis step to produce an offgas and a non-airborne, solid char material; followed by a plasma treatment step. An associated apparatus having a plasma treatment unit which is separate from the gasification unit or pyrolysis unit.
    Type: Grant
    Filed: January 19, 2010
    Date of Patent: February 7, 2012
    Assignee: Advanced Plasma Power Limited
    Inventors: Chris Chapman, David Ovens, David Deegan, Saeed Ismail
  • Patent number: 8084080
    Abstract: A plasma processing is performed by providing a first and a second electrodes to be relatively parallelly movable, disposing an object to be processed on the second electrode so as to face the first electrode and providing a blocking member to both end portions of the second electrode, so that a plasma processing space is blocked by the blocking member when the first and second electrodes are moved relatively with each other. A voltage is applied to both the first and the second electrodes and a process gas is introduced into the plasma processing space formed between the first and second electrodes, and the plasma is irradiated to the object. The blocking member is provided so as to extend from the second electrode to the first electrode, and an upper surface of the blocking member is raised higher than a surface level of the object to be processed.
    Type: Grant
    Filed: March 1, 2007
    Date of Patent: December 27, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Yusuke Uno, Norikatsu Nakamura, Hiroki Sakata
  • Patent number: 8080759
    Abstract: A plasma apparatus is provided including a cathode module, an anode module, and at least one inter-electrode insert located between the cathode module and the anode module. The cathode module includes at least one cathode, and a pilot module may be provided adjacent to the cathode module. The pilot module may assist ignition of the plasma apparatus. The inter-electrode insert may have an upstream and a downstream transverse surface. Both the upstream transverse surface and the downstream transverse surface are angled in a downstream direction.
    Type: Grant
    Filed: July 6, 2010
    Date of Patent: December 20, 2011
    Inventor: Vladimir E. Belaschenko
  • Publication number: 20110284506
    Abstract: The present invention relates to a heat treatment apparatus that performs activation annealing or defect repair annealing and surface oxidization which succeed impurity doping intended to control the conductive property of a semiconductor substrate. In the present invention, a sample to be heated is placed on a lower electrode in a plasma treatment chamber. A gap between an upper electrode and the lower electrode is filled with a gap whose main raw material is a rare gas (helium, argon, krypton, xenon, or the like) having a pressure close to the atmospheric pressure. A power fed from a high-frequency power supply is applied to the upper electrode in order to induce an atmospheric-pressure glow discharge. Gas heating in the gap between the electrodes, which depends on the glow discharge, is used to heat-treat the sample to be heated.
    Type: Application
    Filed: May 12, 2011
    Publication date: November 24, 2011
    Inventors: Ken'etsu YOKOGAWA, Masatoshi Miyake
  • Patent number: 8063336
    Abstract: Static neutralization of a charged object is provided by applying an alternating voltage having a complex waveform, hereinafter referred to as a “multi-frequency voltage”, to an ionizing electrode in an ionizing cell. When the multi-frequency voltage, measured between the ionizing electrode and a reference electrode available from the ionizing cell, equals or exceeds the corona onset voltage threshold of the ionizing cell, the multi-frequency voltage generates a mix of positively and negatively charged ions, sometimes collectively referred to as a “bipolar ion cloud”. The bipolar ion cloud oscillates between the ionizing electrode and the reference electrode. The multi-frequency voltage also redistributes these ions into separate regions according to their negative or positive ion potential when the multi-frequency voltage creates a polarizing electrical field of sufficient strength.
    Type: Grant
    Filed: April 5, 2006
    Date of Patent: November 22, 2011
    Assignee: Ion Systems, Inc.
    Inventors: Peter Gefter, Scott Gehlke
  • Patent number: 8058585
    Abstract: A plasma processing method includes the steps of: loading a substrate on a lower electrode, the substrate having a resist mask formed on a transcription film; supplying a processing gas into a processing chamber; forming a magnetic field, which is oriented toward one direction and perpendicular to a line connecting an upper and the lower electrode; supplying a high frequency power to the lower electrode in the processing chamber to thereby form an electric field; converting the processing gas into a plasma by a magnetron discharge caused by a presence of an orthogonal electromagnetic field; and forming lenses on the transcription film by using the plasma. The high frequency power is supplied to the lower electrode while controlling the magnitude of the electric power divided by a surface area of the substrate to be in a range from about 1200 W/31415.9 mm2 to 2000 W/31415.9 mm2.
    Type: Grant
    Filed: March 12, 2007
    Date of Patent: November 15, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Hiroki Amemiya, Akihito Toda, Hiroshi Nagahata
  • Publication number: 20110248002
    Abstract: Provided is an apparatus, such as an arc mitigating device, that includes an annular body that defines a lumen and a longitudinal axis, the annular body having a body length along the longitudinal axis. An electrode can be disposed coaxially within the lumen. The electrode may extend into the body by an electrode length that is at least about 50% of the body length, and may have diameter less than or equal to about 50% of an inner diameter of the annular body. An ablative material portion can be disposed between the annular body and the electrode. The annular body and the electrode may be configured such that when an arc exists between the annular body and the electrode, the ablative material portion undergoes ablation and thereby generates a plasma.
    Type: Application
    Filed: April 13, 2010
    Publication date: October 13, 2011
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Adnan Kutubuddin Bohori, Thangavelu Asokan, Govardhan Ganireddy
  • Patent number: 8013994
    Abstract: A method of measuring parameters of a particle includes providing a particle, wherein the particle has a first portion and a second portion. The process includes providing a column of photo-detectors including a first photo-detector and a second photo-detector, wherein the first photo-detector and the second photo-detector are sensitive to the same range of light frequencies. Light is projected from the particle onto the column of photo-detectors wherein the column of photo-detectors is oriented so the light from the first portion is projected onto the first photo-detector and light from the second portion is projected onto the second photo-detector. Light measured by the first photo-detector differs from light measured by the second photo-detector. The process further includes using the different first and the second photo-detector measurements to determine at least one from the group consisting of particle temperature and particle diameter.
    Type: Grant
    Filed: January 14, 2008
    Date of Patent: September 6, 2011
    Assignee: Cyber Materials LLC
    Inventors: Brian Louis Vattiat, Donald Edward Wroblewsky, Michael Alan Gevelber
  • Patent number: 7973262
    Abstract: A powerplant and method for production and use of synthesis gas from a hydrocarbon fuel is disclosed in a combination of a triple helical flow vortex reactor (100) and a power producer (510). The triple helical flow vortex reactor (100) steam-reforms a hydrocarbon fuel in a rich combustion environment and produces a gas stream with synthesis gas. The triple helical flow vortex reactor (100) has a plasma torch to introduce a central vortex and two swirlers to introduce counterposing vortexes, or circumferential flows, at the periphery of a reaction chamber in the triple helical flow vortex reactor. The synthesis gas fuels the power producer (510).
    Type: Grant
    Filed: April 5, 2007
    Date of Patent: July 5, 2011
    Inventor: Igor Matveev
  • Publication number: 20110150653
    Abstract: Plasma generators (48, 49, 70, 71) in an endwall (25) of an airfoil (22) induce aerodynamic flows in directions (50) that modify streamlines (47) of the endwall boundary layer toward a streamline geometry (46) of a midspan region of the airfoil. This reduces vortices (42) generated by the momentum deficit of the boundary layer, increasing aerodynamic efficiency. The plasma generators may be arrayed around the leading edge as well as between two airfoils (22) in a gas turbine nozzle structure, and may be positioned at correction points (68) in streamlines caused by surface contouring (66) of the endwall. The plasma generators may be oriented to generate flow vectors (74) that combine with boundary layer flow vectors (72) to produce resultant flow vectors (76) in directions that reduce turbulence.
    Type: Application
    Filed: December 17, 2009
    Publication date: June 23, 2011
    Inventors: Matthew D. Montgomery, Ching-Pang Lee, Chander Prakash
  • Patent number: 7952048
    Abstract: A plasma source with discharge inducing bridges and a plasma processing system using the same. The plasma source may be constructed with a number of discharge inducing bridges, each discharge inducing bridge containing a magnetic core with a primary winding of a transformer. The discharge inducing bridges are positioned so as to face a susceptor. Each discharge inducing bridge is a hollow tube. When the electrical current of the primary winding of the transformer is driven, magnetic flux is induced to the magnetic core, so that inductive coupled plasma is formed around the discharge inducing bridges, and a plasma discharge is evenly induced horizontally/vertically along the discharge inducing bridges, so that uniform large-area high-density plasma is generated.
    Type: Grant
    Filed: May 23, 2006
    Date of Patent: May 31, 2011
    Assignee: New Power Plasma Co., Ltd.
    Inventors: Dae-Kyu Choi, Soon-Im Wi
  • Publication number: 20110120980
    Abstract: A vortex generator system comprises one or more plasma streamwise vortex generators (PSVGs) or plasma wedge vortex generators (PWVGs). The PSVGs and PWVGs each comprises a first electrode and a second electrode separated by a dielectric layer. The first electrode extends in a longitudinal direction. The PSVGs and PWVGs can be installed on a surface arranged to receive airflow in a certain flow direction. The PSVGs have a rectangular first electrode is exposed and extends at least somewhat parallel to the expected flow direction, whereas the first electrode of the PWVGs is more triangular in shape. When an AC voltage is applied to the first and second electrodes, a plasma forms along edges of the first electrode. The plasma imposes a body force in a cross-flow direction, which induces a cross-flow velocity that, in combination with the mean flow, produces streamwise-oriented counter-rotating vortices.
    Type: Application
    Filed: July 31, 2009
    Publication date: May 26, 2011
    Inventors: Thomas Corke, Flint Thomas, David Shatzman, Tommie Wood
  • Patent number: 7921804
    Abstract: The present invention provides a plasma generating system that includes: a microwave generator for generating microwave energy; a power supply connected to the microwave generator for providing power thereto; a microwave cavity; a waveguide operatively connected to the microwave cavity for transmitting microwave energy thereto; an isolator for dissipating microwave energy reflected from the microwave cavity; and at least one nozzle coupled to the microwave cavity. The nozzle includes: a housing having a generally cylindrical space formed therein, the space forming a gas flow passageway; a rod-shaped conductor disposed in the space and operative to transmit microwave energy along a surface thereof so that the microwave energy excites gas flowing through the space; and an impedance controlling structure which adjusts the impedance of the nozzle.
    Type: Grant
    Filed: December 8, 2008
    Date of Patent: April 12, 2011
    Assignees: Amarante Technologies, Inc., Saian Corporation
    Inventor: Sang Hun Lee
  • Patent number: 7878185
    Abstract: A cooking apparatus includes a case in which a cooking chamber for cooking food is provided, a heating source provided in the case, a fan configured to circulate air in the cooking chamber; and a plasma discharger provided in the case and configured to generate plasma in order to remove residue from a surface of the case.
    Type: Grant
    Filed: December 23, 2008
    Date of Patent: February 1, 2011
    Assignee: LG Electronics Inc.
    Inventors: Chan Bo Shim, Young Woo Lee, Yang Kyeong Kim, Yong Seog Jeon, Dae Kyung Kim
  • Patent number: 7880113
    Abstract: A method and structure use characteristics of a plasma discharge for verifying a hermetic seal. The plasma discharge is created in a hermetically sealed cavity by a pair of spaced electrodes that extend from tips inside the hermetically sealed cavity to contacts outside the sealed cavity. An electrical bias is applied to the contacts that is sufficient to create a plasma discharge in a properly hermetically sealed cavity but not in an unsealed cavity.
    Type: Grant
    Filed: November 17, 2006
    Date of Patent: February 1, 2011
    Assignee: Delphi Technologies, Inc.
    Inventors: Brian E. Dewes, Denise R. Dewes, Richard D. Harlan
  • Patent number: 7863540
    Abstract: The present invention provides a plasma reactor which can suppress deactivation of components (active components) activated by plasma when causing exhaust gas to flow through a plasma generating space to ensure efficient reaction between the active components and particulate matter, whereby the particulate matter can be efficiently purified via reaction. The plasma reactor includes a plasma reactor main body 1, a positive electrode 11 disposed on an inlet side 2 of the plasma reactor main body 1, a conductive honeycomb filter 21 disposed so that a filter inlet side 22 faces an outlet side 3 of the plasma reactor main body 1, and a pulse power supply 31 which is connected with the positive electrode 11 and the honeycomb filter 21 and is capable of applying a pulse voltage between the positive electrode 11 and the honeycomb filter 21 as plasma generating electrodes to generate plasma.
    Type: Grant
    Filed: March 21, 2007
    Date of Patent: January 4, 2011
    Assignee: NGK Insulators, Ltd.
    Inventors: Masaaki Masuda, Michio Takahashi, Takeshi Sakuma
  • Publication number: 20100308022
    Abstract: The invention relates to a method and a device for the plasma treatment of metal substrates or insulating substrates (3) running substantially continuously through a vacuum chamber having a treatment zone (2), the plasma being sustained by radiofrequency inductive coupling in the treatment zone (2) by means of an inductor (4) connected to a radiofrequency generator, in which the inductor (4) is protected from any contamination by the material emitted by the surface of the substrates (3) by means of a Faraday cage (7), which is positioned between the plasma and the inductor (4), and in which the Faraday cage (7) is on average electrically biassed positively with respect to the substrates (3) or with respect to a counter-electrode present in the plasma.
    Type: Application
    Filed: October 6, 2008
    Publication date: December 9, 2010
    Inventor: Pierre Vandenbrande
  • Patent number: 7847210
    Abstract: This application relates to a plasma torch assembly comprising a plurality of tubes; a collar integral with at least one tube comprising a first abutment surface; a base for holding the tubes during operation of the torch comprising a portion for receiving the collar and a second abutment; and co-operating interlocking portions for removably urging the first and second abutment surfaces together by relative rotation of the interlocking portions wherein the first and second abutment surfaces comprise a complimentary taper for aligning the collar in concentric formation with at least one other tube on the base by co-operation of the interlocking portions.
    Type: Grant
    Filed: January 29, 2007
    Date of Patent: December 7, 2010
    Assignee: Glass Expansion Pty Ltd
    Inventors: Danny Brezni, Jost Eberhard Kaiser, Bobby Brezni, David Sultana
  • Patent number: 7838792
    Abstract: A plasma processing apparatus is provided which processes a sample held on a sample table arranged in a process chamber in a vacuum container by using a plasma formed in the process chamber. The plasma processing apparatus comprises: paths arranged in the sample table in which a coolant is supplied and vaporized as it flows; a refrigeration cycle having the sample table, a compressor, a condenser and an expansion valve connected in that order and having the coolant circulate therein; coolant passages to cause the coolant that has passed through the expansion valve to branch and then merge with a coolant returning from the paths in the sample table toward the compressor; and a regulator to adjust an amount of coolant passing through the paths in the sample table and circulating in the refrigeration cycle and an amount of coolant branching and flowing through the coolant passages.
    Type: Grant
    Filed: August 30, 2006
    Date of Patent: November 23, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takumi Tandou, Ken'etsu Yokogawa, Seiichiro Kanno, Masaru Izawa
  • Patent number: 7807049
    Abstract: The present invention relates to a method and apparatus for extracting kerogen oil from oil shale without adverse environmental impacts. A first plasma reactor is employed for creating a syngas from a carbon-based fuel. A turbine uses the syngas to produce electricity after the syngas' sensible heat passes through a heat exchanger to heat recycling gases used to pyrolyze the oil shale. A kiln receives the oil shale and heats the oil shale to a temperature at which hydrocarbons from the oil shale are released and captured. The hydrocarbons are sent to a distillation tower to produce a usable fuel. A second plasma reactor vitrifies the spent shale to produce an environmentally inert byproduct. The second plasma reactor is powered by electricity produced by the syngas turbine. Carbon dioxide generated by the process is captured and stored to prevent its release into the environment.
    Type: Grant
    Filed: December 10, 2007
    Date of Patent: October 5, 2010
    Inventor: Raymond L. Ridge
  • Patent number: 7781695
    Abstract: Inductively coupled plasma (ICP) reforming converts carbonaceous compounds into a fuel for use in generating electrical power. Energy rich hydrocarbon fuels, such as coal, marine diesel, oils, and hydrocarbon wastes are employed as a feedstock for the ICP, which transforms the feedstock into a fuel that can be used by fuel cells and gas turbines for the production of electricity. The overall efficiency of an ICP-based electrical power system can be increased by providing partial oxidation within the reaction vessel. The partial oxidation conditions consume a small amount of the reformed fuel gas, thereby liberating sufficient thermal energy to reduce the electrical power requirements of the ICP to maintain desired reactor temperatures, and providing an increase in the overall net electrical power production. The integrated power production system can also adjust to meet an increased requirement for process heat and steam by balancing the effect of partial oxidation.
    Type: Grant
    Filed: September 14, 2007
    Date of Patent: August 24, 2010
    Assignee: Plasmet Corporation
    Inventors: Andreas Blutke, John Vavruska, John Mark Henderson, Robert L. Ferguson