Abstract: The present invention provides a plasma generating system that includes: a microwave generator for generating microwave energy; a power supply connected to the microwave generator for providing power thereto; a microwave cavity; a waveguide operatively connected to the microwave cavity for transmitting microwave energy thereto; an isolator for dissipating microwave energy reflected from the microwave cavity; and at least one nozzle coupled to the microwave cavity. The nozzle includes: a housing having a generally cylindrical space formed therein, the space forming a gas flow passageway; a rod-shaped conductor disposed in the space and operative to transmit microwave energy along a surface thereof so that the microwave energy excites gas flowing through the space; and a biasing device for providing a bias potential between the rod-shaped conductor and a bias electrode structure wherein the bias electrode structure is offset in potential from ground.

Abstract: A plasma processing apparatus comprising at least a plasma processing chamber for plasma-processing an object; object-holding means for disposing the object in the plasma processing chamber; and plasma-generating means for generating a plasma in the plasma processing chamber. The inner wall of the plasma processing chamber is at least partially covered with an oxide film based on a pre-treating plasma. A plasma processing apparatus and a plasma processing method effectively prevent the spluttering and the etching of the inner wall of the plasma processing chamber while suppressing contamination to the object.

Abstract: A pulse voltage is applied on a process gas to generate discharge plasma. The pulse voltage has a duty ratio controlled in a range of 0.001 percent or more and 8.0 percent or less. Preferably, the discharge plasma has an electron density of 1×1010 cm?3 or larger and an electron temperature of 1.5 eV or lower at a supplied power of 1.0 W/cm2 or more per a unit area of a discharge electrode.

Abstract: A plasma apparatus is provided including a cathode module, an anode module, and at least one inter-electrode insert located between the cathode module and the anode module. The cathode module includes at least one cathode, and a pilot module may be provided adjacent to the cathode module. The pilot module may assist ignition of the plasma apparatus. The inter-electrode insert may have an upstream and a downstream transverse surface. Both the upstream transverse surface and the downstream transverse surface are angled in a downstream direction.

Abstract: A closed container with a tight and mechanically strong seal having two fastened-together metal elements including a body and a cover. The body is essentially a cylindrical or prismatic shape having a base with one or more axial walls and an open top axial end. The cover has a more or less complex shape having one or more walls to be positioned at the top axial end of the body facing the axial wall(s) of the body. The fastening of the metal elements is via a butt weld, advantageously with no filler metal. The internal structure at the weld line includes a docking guide having a groove provided with at least one degassing chimney, and a chamfered end above or below the weld line, on the wall. The body and/or the cover include(s) at least one blanked off degassing vent.

Abstract: A solid free form fabrication (SFF) system and method is used to fabricate a three-dimensional structure in a continuous manner from successive layers of feedstock material. The system includes a gas shielding structure that is configured to protect a targeted region from oxidation. The system further includes a positioning arm coupled to the deposition head and moveable to align the deposition head with a targeted region of the three-dimensional structure and a plurality of control components coupled to the positioning arm for controlling a position of the positioning arm and operation of the deposition head. The gas shielding structure is formed as either a parallelepiped structure or a half disc structure and may be conformable to at least one surface of the three-dimensional structure.

Abstract: A device, method and system for generating a plasma is disclosed wherein an electrical arc is established and the movement of the electrical arc is selectively controlled. In one example, modular units are coupled to one another to collectively define a chamber. Each modular unit may include an electrode and a cathode spaced apart and configured to generate an arc therebetween. A device, such as a magnetic or electromagnetic device, may be used to selectively control the movement of the arc about a longitudinal axis of the chamber. The arcs of individual modules may be individually controlled so as to exhibit similar or dissimilar motions about the longitudinal axis of the chamber. In another embodiment, an inlet structure may be used to selectively define the flow path of matter introduced into the chamber such that it travels in a substantially circular or helical path within the chamber.

Abstract: A casing is used for being rotatably disposed in a plasma jet system. The casing is rotated around a central axis. The casing comprises a main body and a plasma nozzle. The main body has a first cavity. The plasma nozzle is disposed under the main body and has a second cavity and a straight channel. The second cavity is connected to the first cavity. The straight channel is located at a side of the plasma nozzle opposite to the main body and connected to the second cavity. The straight channel has an extension axis which is substantially parallel with the central axis and separated from the central axis by an interval. Plasma generated by the plasma jet system jets out through the straight channel.

Abstract: A device for processing a wire having an outer surface and moving along a given path in a give direction. The device comprises a conductive contact tube surrounding said path and electrically engageable with the wire as it moves along the path and through the tue and a dielectric sleeve adjacent the contact tube and extending in the given direction from the contact tube and around the path to define an annular gas passage between the dielectric sleeve ad the wire. An inlet for processing gas is adjacent the contact tube in and a conductive electrode sleeve is around the dielectric sleeve so a high frequency, high voltage signal between said electrode sleeve ad the contact tube creates a dielectric barrier discharge plasma of the progressing gas in the annular passage.

Abstract: A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated.

Abstract: A multi-electrode system includes a fiber holder that holds at least one optical fiber, a plurality of electrodes arranged to generate a heated field to heat the at least one optical fiber, and a vibration mechanism that causes at least one of the electrodes from the plurality of electrodes to vibrate. The electrodes can be disposed in at least a partial vacuum. The system can be used for processing many types of fibers, such processing including, as examples, stripping, splicing, annealing, tapering, and so on. Corresponding fiber processing methods are also provided.

Abstract: In a plasma processing apparatus, electromagnetic waves are radiated from slots of waveguides into a processing chamber via dielectric windows that are supported on beams, thereby generating a plasma. A substrate, which is an object of processing, is processed by the generated plasma. Dielectric plates are attached to those surfaces of the beams, which are opposed to the processing chamber. The thickness of each dielectric plate is set at ½ or more of the intra-dielectric wavelength of the electromagnetic waves. Using the plasma processing apparatus, a large-area processing can uniformly be performed.

Abstract: A plasma generator, comprising a dielectric tube having a first end and a second end, wherein the first end is sealed, but for a gas inlet; at least one first dielectric disk located within the dielectric tube, wherein the first dielectric disk includes at least one first dielectric aperture formed therein; a first ring electrode that at least partially surrounds the at least one first dielectric aperture and is electrically coupled to a power supply; at least one second dielectric disk located proximate the second end of the dielectric tube, wherein the second dielectric disk includes at least one second dielectric aperture formed therein; and a second ring electrode that at least partially surrounds the at least one second dielectric aperture and is electrically coupled to the power supply. During use, the plasma generator produces at least one plasma plume that is launched into open air.

Abstract: The present invention discloses a microwave plasma generator which includes a chamber, a conductive inorganic substance, a trace gas and a microwave source. The conductive inorganic substance and the trace gas are housed in the chamber with an inner pressure about 0.001˜10 torr. By irradiating the conductive inorganic substance and exciting the trace gas, clean and uniform plasma will be generated. The plasma generator of this invention is easily operated and can be applied to semiconductor manufacturing processes, for example, material modification, etching/cleaning, roughing and ion doping/hybrid.

Abstract: Provided is an apparatus for generating remote plasma, which can improve thin-film quality by preventing an arc at a bias electrode. The apparatus includes a radio frequency (RF) electrode installed inside an upper portion of a chamber, a bias electrode installed apart from the RF electrode, and including a plurality of through holes through which plasma passes, wherein a bias power is supplied to the bias electrode, a plasma generating unit formed between the RF electrode and the bias electrode, wherein a plasma gas is supplied to the plasma generating unit, and a ground electrode installed under and spaced apart from the bias electrode, and including plasma through holes corresponding to the through holes of the bias electrode, wherein a pulsed DC bias of a second voltage level, which has a first voltage level periodically, is applied to the bias electrode.

Abstract: Methods and apparatus are described for control of friction at the nanoscale. A method of controlling frictional dynamics of a plurality of particles using non-Lipschitzian control includes determining an attribute of the plurality of particles; calculating an attribute deviation by subtracting the attribute of the plurality of particles from a target attribute; calculating a non-Lipschitzian feedback control term by raising the attribute deviation to a fractionary power ?=(2m+1)/(2n+1) where n=1, 2, 3 . . . and m=0, 1, 2, 3 . . . , with m strictly less than n and then multiplying by a control amplitude; and imposing the non-Lipschitzian feedback control term globally on each of the plurality of particles; imposing causes a subsequent magnitude of the attribute deviation to be reduced.

Abstract: A method and apparatus for producing soft x-ray laser radiation. A low pressure plasma column is created by electric discharge or by laser excitation inside a rotating containment tube. Rotation of the plasma is induced by viscous drag caused by rotation of the tube, or by magnetically driven rotation of the plasma as it is created in a plasma gun in the presence of an axial magnetic field, or both. A high power electrical discharge is then passed axially through the rotating plasma column to produce a rapidly rising axial current, resulting in z-pinch compression of the rotating plasma column, with resultant stimulated emission of soft x-ray radiation in the axial direction. A rotating containment tube used in combination with magnetically driven rotation of the plasma column results in a concave electron density profile that results in reduced wall ablation and also reduced refraction losses of the soft x-rays.

Abstract: Efficient static neutralization of an electrostatically charged object that has a varying distance from an ion generating source, a varying velocity, a large dimension or any these is achieved by using an ionizing cell or bar having a first electrode and a second electrode. The first electrode for receiving a multi-frequency voltage that has a waveform, and the second electrode separated from the first electrode by a first distance and for use as a reference electrode. The waveform is adjusted during neutralization of a moving object based on at least one attribute of the object.

Abstract: A twin plasma apparatus including an anode plasma head and a cathode plasma head. Each of the plasma heads includes an electrode and a plasma flow channel and a primary gas inlet between at least a portion of the electrode and the plasma flow channel. The anode plasma head and the cathode plasma head are oriented at an angled toward one another. At least one of the plasma flow channels includes three generally cylindrical portions. The three generally cylindrical portions of the plasma flow channels reduce the occurrence of side arcing.

Abstract: A multi-electrode system comprises a fiber support configured to hold at least one optical fiber and a set of electrodes disposed about the at least one optical fiber and configured to generate arcs between adjacent electrodes to generate a substantially uniform heated field to a circumferential outer surface of the at least one optical fiber. The electrodes can be disposed in at least a partial vacuum.

Abstract: Connection between a plasma torch wearing part and a plasma torch wearing part holder, plasma torch wearing part and plasma torch wearing part holder.

Abstract: A process for the treatment of waste, the process comprising: (i) either (a) a gasification step comprising treating the waste in a gasification unit in the presence of oxygen and steam to produce an offgas and a char, or (b) a pyrolysis step comprising treating the waste in a pyrolysis unit to produce an offgas and a char; and (ii) a plasma treatment step comprising subjecting the offgas and the char to a plasma treatment in a plasma treatment unit in the presence of oxygen and, optionally, steam.

Abstract: In general, the present invention provides a method of piercing a workpiece with a plasma arc torch of the type having a plasma gas flow path for directing a plasma gas through the torch and a secondary gas flow path for directing a secondary gas through the torch. The method comprises directing a flow of shield gas along a distal end portion of the plasma arc torch to deflect metal spatter generated from the piercing, and ramping a current provided to the plasma arc torch along a profile during piercing and controlling current ramp parameters as a function of a thickness of the workpiece and an operating current level, wherein the current ramp parameters comprise a length of time, a ramp rate, a shape factor, and a modulation.

Abstract: An apparatus is provided for producing a plasma for a work surface, for example to deposit material thereon. The apparatus comprises an enclosure which contains an ionizable gas, a plurality of plasma excitation devices each of which is arranged to enable microwaves to travel from a first end thereof to a second end and radiate therefrom into the gas, and means for generating a magnetic field in the gas. A source of microwaves feeds microwaves to the first ends of the excitation devices. In use, regions exist within the said gas where the direction of the electric vector of the microwaves is non-parallel to the lines of the magnetic field, and the magnetic field has value B, and the microwaves have a frequency f such as to substantially satisfy the relationship: B=?mf D e where m and e are the mass and charge respectively of an electron.

Abstract: The present invention provides a surface wave excitation plasma generator in which surface wave excitation plasma is efficiently generated. A surface wave excitation plasma generator including an annular waveguide and a dielectric tube is provided. The annular waveguide 2 includes an inlet 2a for introducing a microwave M, an end plate 2b for reflecting the microwave M introduced and propagating within the waveguide, and a bottom plate 2c on which slot antennas 2d are formed at a predetermined interval. When the wavelength of the microwave M in the waveguide is ?g, the length from position b through positions c, d, e to position f on the bottom plate 2c, i.e. the circumferential length (?×D1) of the annular waveguide, is set as 2 ?g, and the positions b, c, d, e, f are spaced apart at an interval of ?g/2. Since the slot antennas 2d are arranged at two positions c and e, the interval between these two slot antennas 2d is equal to the wavelength ?g in the waveguide.

Abstract: A device for generating atmospheric pressure cold plasma inside a hand-held unit discharges cold plasma with simultaneously different rf wavelengths and their harmonics. The device includes an rf tuning network that is powered by a low-voltage power supply connected to a series of high-voltage coils and capacitors. The rf energy signal is transferred to a primary containment chamber and dispersed through an electrode plate network of various sizes and thicknesses to create multiple frequencies. Helium gas is introduced into the first primary containment chamber, where electron separation is initiated. The energized gas flows into a secondary magnetic compression chamber, where a balanced frequency network grid with capacitance creates the final electron separation, which is inverted magnetically and exits through an orifice with a nozzle. The cold plasma thus generated has been shown to be capable of accelerating a healing process in flesh wounds on animal laboratory specimens.

Abstract: Methods of generating nanoparticles are described that comprises feeding nebulized droplets into a radio frequency plasma torch to generate nanoparticles, wherein the majority of the nanoparticles generated have a diameter of less than about 50 nm. These methods are useful for synthesizing nanoparticles of metals, semiconductors, ceramics or any other material class where the precursors are either in liquid form or can be dissolved or suspended in a suitable liquid. Methods of feeding nebulized droplets and central gas into a radio frequency plasma torch and apparatus for generating nanoparticles are also described.

Abstract: An ionized plasma based radiant electromagnetic energy steering or diverting apparatus wherein controlled differences in plasma density and resulting plasma electron density achieve phase shift, reflection or refraction of the controlled radiant electromagnetic energy. Plasma density determination through use of selected plasma control electrode electrical potentials and hence by the waveforms applied to plasma-adjacent electrodes is employed. Plasma controlled radiant electromagnetic energy is thereby usable for inertia free steering of a radar beam or for other applications of radiant electromagnetic energy. Radiant electromagnetic energy control by way of pass-through refraction of the energy and reflection of the energy directly from the plasma and also by reflection involving a reflector element are included. Radio frequency and optical electromagnetic energy wavelengths for the radiant electromagnetic energy are included.

Abstract: Apparatus for synergistically combining a plasma with a comminution means such as a fluid kinetic energy mill (jet mill), preferably in a single reactor and/or in a single process step is provided by the present invention. Within the apparatus of the invention potential energy is converted into kinetic energy and subsequently into angular momentum by means of wave energy, for comminuting, reacting and separation of feed materials. Methods of use of the apparatus in the practice of various processes are also provided by the present invention.

Abstract: A unit for minimizing the problem that affects a substrate to be processed at the time of turning off a plasma is provided in a plasma processing apparatus using a magnetic field. The plasma processing apparatus comprises: a plasma-generating high-frequency power supply; a bias power supply; and a coil power supply which is connected to a coil disposed outside a vacuum process chamber and generates a magnetic field inside the vacuum process chamber, and the plasma processing apparatus further comprises: a magnetic field measuring unit which measures a magnetic field strength inside the vacuum process chamber; and a control unit which turns off an output on/off signal of the plasma-generating high-frequency power supply or the bias power supply when a magnetic field strength, which is measured after an output on/off signal of the coil power supply is turned off, decays to a predetermined value.

Abstract: A plasma generating electrode capable of generating plasma with a high energy level by using a small amount of electric power is provided. The plasma generating electrode includes at least a pair of unit electrodes including a unit electrode as an anode and a unit electrode as a cathode, and can generate plasma by applying voltage, the unit electrode as an anode and the unit electrode as a cathode being disposed facing each other, and at least the unit electrode as an anode having a plate-like ceramic dielectric and a conductive film disposed in the ceramic dielectric, wherein the unit electrode as a cathode can emit secondary electrons in a number five times or greater than the number of cations (primary particles) which it receives when the cations produced in the process of plasma generation collide therewith.

Abstract: A thermal spray apparatus is provided for thermal spraying a coating onto a substrate. The apparatus include a heating module for providing a stream of heated gas. The heating module is coupled to a forming module for controlling pressure and velocity characteristics of the stream of heated gas generated by the heating module. The thermal spray apparatus further includes a barrel capable of directing the stream of heated gas from the forming module. A powder injection module may be provided for introducing powder material into the stream of heated gas.

Abstract: A device is provided for compressing a plasma stream flowing in a plasma flow direction and maintaining the plasma stream in the compressed state. The device has a plasma compression region; a plurality of first magnets positioned around the plasma compression region for compressing the plasma stream, each of the first magnets having a dominant magnetic force direction that is non-parallel to the plasma flow direction; a reaction region positioned down stream from the plasma compression region; and a plurality of second magnets positioned around the reaction region for maintaining the plasma stream in its compressed state.

Abstract: Provided is a plasma processing apparatus including a chamber, a lower electrode, an upper electrode, and a substrate sensor. The chamber is configured to provide a reaction space. The lower electrode is disposed at a lower region in the chamber to mount a substrate thereon. The upper electrode is disposed at an upper region in the chamber to be opposite to the lower electrode. The substrate sensor is provided on the chamber to sense the substrate. Herein, the upper electrode includes an electrode plate and an insulating plate attached on the bottom of the electrode plate, and at least one guide hole is formed in the upper electrode to guide light output from the substrate sensor toward the substrate.

Abstract: A plasma processing is performed by using a plasma processing apparatus which includes a first electrode and a second electrode disposed relatively movable to the first electrode between which an object to be processed is disposed, and a solid dielectric material disposed to be continuously connected to at least processing starting and final end sides of the object. A process gas is introduced between the first and second electrodes under a state in which the first electrode abuts on entire surfaces of the object and the solid dielectric material, and a voltage is applied between the first and second electrodes to thereby process the object by plasma discharge generated between the first and second electrodes while moving the second electrode relatively to the first electrode and the object.

Abstract: Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a radiation cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another radiation source.

Abstract: Reactive atom plasma processing can be used to shape, polish, planarize and clean the surfaces of difficult materials with minimal subsurface damage. The apparatus and methods use a plasma torch, such as a conventional ICP torch. The workpiece and plasma torch are moved with respect to each other, whether by translating and/or rotating the workpiece, the plasma, or both. The plasma discharge from the torch can be used to shape, planarize, polish, and/or clean the surface of the workpiece, as well as to thin the workpiece. The processing may cause minimal or no damage to the workpiece underneath the surface, and may involve removing material from the surface of the workpiece.

Abstract: A plasma generating electrode according to the invention includes at least two opposing plate-shaped unit electrodes 2, each having a rectangular surface and four end faces, and a holding member 5 which holds at least one (fixed end 6) of a pair of parallel ends (pair of ends) of four ends of the unit electrode 2 corresponding to the four end faces, at least one of the opposing unit electrodes 2 being a conductive-film-containing electrode 8 including a ceramic body 3 and a conductive film 4, and a distance “a” (mm) from an edge of the conductive film 4 to an edge of the ceramic body 3 on the other pair of parallel ends (other pair of ends 9) of the four ends of the conductive-film-containing electrode 8 adjacent to the pair of ends and a thickness “c” (mm) of the ceramic body 3 satisfying a relationship “(c/2)?a?5c”. The plasma generating electrode 1 is effectively prevented from breaking due to thermal shock.

Abstract: A vacuum plasma generator (VPG) includes an output connector for electrical connection of the VPG to at least one electrode of a plasma chamber. The VPG includes a mains connector for connection of the VPG to a mains power supply, a mains input filter coupled to the mains connector, a voltage converter coupled to the mains input filter for generating an output signal, a voltage converter control input for connection to a voltage converter control, a shield that surrounds at least the voltage converter, the mains power supply, and the mains input filter, and a connection device that provides an electrical connection between the shield and the plasma chamber.

Abstract: An apparatus for thermal conversion of one or more reactants to desired end products includes an insulated reactor chamber having a high temperature heater such as a plasma torch at its inlet end and, optionally, a restrictive convergent-divergent nozzle at its outlet end. In a thermal conversion method, reactants are injected upstream from the reactor chamber and thoroughly mixed with the plasma stream before entering the reactor chamber. The reactor chamber has a reaction zone that is maintained at a substantially uniform temperature. The resulting heated gaseous stream is then rapidly cooled by passage through the nozzle, which “freezes” the desired end product(s) in the heated equilibrium reaction stage, or is discharged through an outlet pipe without the convergent-divergent nozzle. The desired end products are then separated from the gaseous stream.

Abstract: A bonding apparatus including a capillary 40 having a high-frequency coil 50 on its tip end portion and allowing a bonding wire 2 to pass therethrough, a position changing unit for changing the position of the tip of the bonding wire, a gas supply unit for supplying gas into the capillary, and a high-frequency power supply unit for supplying high-frequency power to the high-frequency coil. When the bonding wire is outside a plasma region 52 in the capillary, a microplasma generated in the plasma region is ejected out of the capillary and removes foreign matter or contaminants on the surface of a bonding subject. When the bonding wire is inside the plasma region, the material of the bonding wire is turned into fine particles, and a microplasma 303 containing sputtered fine particles is ejected from the capillary, allowing the material the same as the bonding wire to be deposited on the bonding subject.

Abstract: A signal processing portion obtains the reciprocal of a composite impedance of gap static capacitance and a plasma impedance, obtains composite static capacitance which is the sum of the gap static capacitance and a static capacitance component included in the plasma impedance from an imaginary part of the reciprocal, and obtains a resistance component included in the plasma impedance from a real part of the reciprocal. A gap detection device obtains the static capacitance component by using a model representing the characteristics of the reciprocal of the plasma impedance and the resistance component and obtains the gap static capacitance by subtracting the static capacitance component from the composite static capacitance. The gap detection device obtains a gap from the obtained gap static capacitance. Thus provided is a technique to detect a gap between a nozzle of a laser beam machine for outputting a laser beam and an object to be machined with high accuracy.

Abstract: A cooling block for coupling a remote plasma source to a resistor is disclosed. As processed substrates become larger for solar panels, organic light emitting diodes, and flat panel displays, a greater amount of cleaning gas and hence, plasma from a remote plasma source, may be necessary. When large amounts of cleaning gas such as fluorine containing gas is ignited into a plasma, the temperature of the remote plasma source that ignites the plasma may become very hot. The hot plasma may transfer heat to adjacent components and to any components through which the plasma flows. By cooling the block connecting the remote plasma source to the resistor, the plasma may be cooled prior to reaching the resistor and hence, prior to reaching the processing chamber.

Abstract: A system is provided that includes a torch power unit. The torch power unit includes a monitor and/or control configured to determine a temperature of a component of the torch power unit based on the one or more inputs without a direct temperature measurement of the component. A method of operation is provided that includes receiving one or more inputs associated with a device, and estimating a temperature of the device based on the one or inputs without directly measuring temperature of the device. A tangible machine-readable medium is provided that includes code for determining a thermal capacity of the device, code for determining a thermal resistance of the device, and code for determining a temperature of the device based on thermal capacity and the thermal resistance method.

Abstract: Systems and methods are provided for a torch power system having a high power density. In one embodiment, a system is provided that includes a torch power unit having a compressor and power electronics that include one or more power converters, wherein the torch power unit has a power output density of at least 2 watts per cubic inch, 80 watts per pound, or a combination thereof. A power conversion assembly for a torch power unit is provided that includes a single circuit board, a torch power converter mounted on the single circuit board, and a non-torch power converter mounted on the single circuit board. An electrical torch system is also provided that includes a circuit board and a power converter coupled to the circuit board, wherein the power converter includes a planar transformer, a foil wound transformer, or a combination thereof.

Abstract: A vortex generator uses a single piece to generate the vortex and hold the electrode. The single piece may be a non-conductive material such as a ceramic. The vortex generator may use threads to hold the electrode. The threads and holes for generating the vortex may be bored into the base material of the vortex generator before the base material is hardened.

Abstract: An ablative plasma gun subassembly is disclosed. The subassembly includes a body, a first pair and a second pair of gun electrodes having distal ends disposed within an interior of the body, and ablative material disposed proximate the distal ends of at least one of the first pair of gun electrodes and the second pair of gun electrodes.

Abstract: A process and apparatus for the synthesis of metal oxide nanopowder from a metal compound vapour is presented. In particular a process and apparatus for the synthesis of TiO2 nanopowder from TiCl4 is disclosed. The metal compound vapour is reacted with an oxidizing gas in electrically induced RF frequency plasma thus forming a metal oxide vapour. The metal oxide vapour is rapidly cooled using a highly turbulent gas quench zone which quickly halts the particle growth process, yielding a substantial reduction in the size of metal oxide particles formed compared with known processes. The metal compound vapour can also react with a doping agent to create a doped metal oxide nanopowder. Additionally, a process and apparatus for the inline synthesis of a coated metal oxide is disclosed wherein the metal oxide particles are coated with a surface agent after being cooled in a highly turbulent gas quench zone.

Abstract: In one aspect, a method of improving the performance of an electronic device manufacturing facility is provided, including the step of reducing the number of electronic device manufacturing component seasoning steps which are performed using production equipment, whereby the amount of electronic device manufacturing system downtime is reduced. Several other aspects are provided.

Abstract: The technology features an apparatus and a method for sensing the length of a lead that connects to a power source to a thermal processing system such as a plasma torch system. Components disposed in the thermal processing system enable the length of the lead to be sensed. In addition, the time for contact starting a thermal processing system enables determination of the length of the lead.