Abstract: Structures for an on-chip resistor and methods of forming a structure for an on-chip resistor. The structure includes a first resistor body and a second resistor body coupled to the first resistor body. The first resistor body contains a first material having a first drift effect. The second resistor body contains a second material having a second drift effect that is different from the first drift effect.

Abstract: A low dielectric sealing glass powder for a miniature radio-frequency glass insulator is made of the following raw materials expressed in molar percentages: SiO2: 70.5-74.0%, B2O3: 20.5-23.5%, Ga2O3: 0.5-2.0%, P2O5: 0.25-2.0%, Li2O: 0.4-6.0%, K2O: 0.1-1.5%, LaB6: 0.05-1.0%, and NaCl: 0.03-0.3%. The raw material components are simple, and the preparation method is easy to implement. The dielectric constant and dielectric loss of the prepared glass powder are low, and the melting and molding temperature is low, which are convenient for large-scale industrial production. The melting and molding temperature of the low dielectric sealing glass powder ranges from 1320° C. to 1360° C., and the obtained glass has a dielectric constant ranging from 3.8 to 4.1 and a dielectric loss ranging from 4×10?4 to 10×10?4 at a frequency of 1 MHz, and a sealing temperature ranging from 900° C. to 950° C.

Abstract: Memory stacks and method of forming the same are provided. A memory stack includes a bottom electrode layer, a top electrode layer and a phase change layer between the bottom electrode layer and the top electrode layer. A width of the top electrode layer is greater than a width of the phase change layer. A first portion of the top electrode layer uncovered by the phase change layer is rougher than a second portion of the top electrode layer covered by the phase change layer.

Abstract: A semiconductor device includes a transistor structure disposed over a substrate, a first interlayer dielectric (ILD) layer disposed over the transistor structure, a second ILD layer disposed over the first ILD layer, and a first resistor wire disposed on the second ILD layer, and a second resistor wire disposed on the second ILD layer. A sheet resistance of the first resistor wire is different from a sheet resistance of the second resistor wire.

Abstract: A semiconductor device includes a dummy fin structure disposed over a substrate, a dummy gate structure disposed over a part of the dummy fin structure, a first interlayer dielectric layer in which the dummy gate structure is embedded, a second interlayer dielectric layer disposed over the first interlayer dielectric layer, and a resistor wire formed of a conductive material and embedded in the second interlayer dielectric layer. The resistor wire overlaps the dummy gate structure in plan view.

Abstract: A method for determining a sensitivity of a Hall sensor element in consideration of an interdependency between the temperature dependence of the sensitivity and the temperature dependence of the operational quantity of the Hall sensor element includes: identifying a reference sensitivity and a reference value of the operational quantity of the Hall sensor element; determining an instantaneous value of the operational quantity of the Hall sensor element on the basis of a drive signal of the Hall sensor element; and determining the sensitivity of the Hall sensor element on the basis of the reference sensitivity, the reference value of the operational quantity, the identified instantaneous value of the operational quantity, and the interdependency.

Abstract: Various embodiments of the present disclosure are directed towards a method for forming an integrated chip. The method includes depositing a resistive layer over a substrate. A conductive structure is formed over the resistive layer. A first etch process is performed on the resistive layer to define a resistor segment of the resistive layer and a peripheral region of the resistive layer. The resistor segment is laterally separated from the peripheral region of the resistive layer. The peripheral region continuously laterally wraps around an outer perimeter of the resistor segment.

Abstract: A semiconductor device (1) is manufactured which includes a SiC epitaxial layer (28), a plurality of transistor cells (18) that are formed in the SiC epitaxial layer (28) and that are subjected to ON/OFF control by a predetermined control voltage, a gate electrode (19) that faces a channel region (32) of the transistor cells (18) in which a channel is formed when the semiconductor device (1) is in an ON state, a gate metal (44) that is exposed at the topmost surface for electrical connection with the outside and that is electrically connected to the gate electrode (19) while being physically separated from the gate electrode (19), and a built-in resistor (21) that is made of polysilicon and that is disposed below the gate metal (44) so as to electrically connect the gate metal (44) and the gate electrode (19) together.

Abstract: A method of manufacturing a semiconductor device includes forming a fin structure in which first semiconductor layers and second semiconductor layers are alternatively stacked; forming a sacrificial gate structure over the fin structure; etching a source/drain (S/D) region of the fin structure, which is not covered by the sacrificial gate structure, thereby forming an S/D space; laterally etching the first semiconductor layers through the S/D space, thereby forming recesses; forming a first insulating layer, in the recesses, on the etched first semiconductor layers; after the first insulating layer is formed, forming a second insulating layer, in the recesses, on the first insulating layer, wherein a dielectric constant of the second insulating layer is less than that of the first insulating layer; and forming an S/D epitaxial layer in the S/D space, wherein the second insulating layer is in contact with the S/D epitaxial layer.

Abstract: A device including a thin film resistor (TFR) structure. The TFR structure is accessible by one or more conductive vias that extend vertically from an upper metal layer to completely penetrate a TFR layer positioned thereunder. The conductive vias are coupled to one or more sidewalls of the TFR layer at or near the sites of penetration. The TFR structure can be manufactured by a method that includes etching a via trench completely through the TFR layer and a dielectric layer above the TFR layer, and filling the via trench with a conductor coupled to a sidewall of the TFR layer.

Abstract: A core body thermometer is provided that includes a plate-shaped wiring substrate having a first region and a second region having different thermal resistances, a first temperature sensor and a second temperature sensor located in a first region and across a thickness direction of the first region and a third temperature sensor and a fourth temperature sensor located in a second region and across a thickness direction of the second region. Moreover, a processing circuit is provided that processes output signals of the first, second, third and fourth temperature sensors. The first and second regions are adjusted to have the different thermal resistances by varying occupancy and/or dispersion of the conductive patterns.

Abstract: This application discloses an integrated circuit, and relates to the field of electronic technologies, to ensure that the integrated circuit has a relatively high bandwidth and can meet an ESD standard. The integrated circuit includes a die and a transmission line coupled to the die. Electrostatic discharge ESD modules are periodically disposed on the transmission line.

Abstract: A neuromorphic multi-bit digital weight cell configured to store a series of potential weights for a neuron in an artificial neural network. The neuromorphic multi-bit digital weight cell includes a parallel cell including a series of passive resistors in parallel and a series of gating transistors. Each gating transistor of the series of gating transistors is in series with one passive resistor of the series of passive resistors. The neuromorphic cell also includes a series of programming input lines connected to the series of gating transistors, an input terminal connected to the parallel cell, and an output terminal connected to the parallel cell.

Abstract: In one example an electronic device includes a first resistor and a second resistor. The first resistor includes a first resistive layer located over a substrate, the first resistive layer having a first sheet resistance. The second resistor includes a first portion of a second resistive layer located over the substrate, the second resistive layer having a second sheet resistance different from the first sheet resistance. The first resistive layer is located between the substrate and a second noncontiguous portion of the second resistive layer.

Abstract: A semiconductor device includes: a metal thin film disposed on a semiconductor substrate; and first and second contact structures disposed on the metal thin film, wherein the first and second contact structures are laterally spaced from each other by a dummy layer that comprises at least one polishing resistance material.

Abstract: A three-dimensional semiconductor memory device, including a peripheral circuit structure including a first metal pad and a cell array structure disposed on the peripheral circuit structure and including a second metal pad. The peripheral circuit structure may include a first substrate including a first peripheral circuit region and a second peripheral circuit region, first contact plugs, second contact plugs, and a first passive device on and electrically connected to the second contact plugs. The cell array structure may include a second substrate disposed on the peripheral circuit structure, the second substrate including a cell array region and a contact region. The cell array structure may further include gate electrodes and cell contact plugs. The first passive device is vertically between the gate electrodes and the second contact plugs and includes a first contact line. The first metal pad and the second metal pad may be connected by bonding manner.

Abstract: Composites of silicon and various porous scaffold materials, such as carbon material comprising micro-, meso- and/or macropores, and methods for manufacturing the same are provided. The compositions find utility in various applications, including electrical energy storage electrodes and devices comprising the same.

Abstract: A semiconductor memory device includes a stack structure comprising a plurality of insulating layers and a plurality of interconnection layers that are alternately and repeatedly stacked. A pillar structure is disposed on a side surface of the stack structure. The pillar structure includes an insulating pillar and a variable resistance layer disposed on the insulating pillar and positioned between insulating pillar and the stack structure. A channel layer is disposed on the variable resistance layer and is positioned between the variable resistance layer and the stack structure. A gate dielectric layer is disposed on the channel layer and is positioned between the plurality of interconnection layers and the channel layer. The channel layer is disposed between the variable resistance layer and the gate dielectric layer.

Abstract: A method of fabricating an integrated circuit (IC) includes forming a dielectric layer on a substrate having a plurality of the IC. A thin-film resistor (TFR) layer is deposited on the dielectric layer, and an underlayer (UL) including carbon is formed on the TFR layer. A hard mask layer including silicon is formed on the UL. Masked etching of the hard mask layer transfers a pattern of a photoresist layer onto the hard mask layer to form a hard mask layer pattern. Masked etching of the UL transfers the hard mask layer pattern onto the UL to form a UL pattern. Masked etching of the TFR layer transfers the UL pattern onto the TFR layer to form a TFR layer pattern including a matched pair of TFRs. The matched pair of TFRs are generally included in circuitry configured together for implementing at least one function.

Abstract: A resistor includes at least one polysilicon resistor element in a semiconductor substrate with each polysilicon resistor element having a continuous U-shape with a continuous lateral bottom. The resistor may include an insulator within a valley of the U-shape of each polysilicon resistor element. A plurality of polysilicon resistor elements can be sequentially interconnected to create a serpentine polysilicon resistor. The resistor may also include a dopant-including high resistivity (HR) polysilicon layer thereunder to provide electrical isolation from, and better thermal conduction to, for example, a base semiconductor substrate. The resistor can be used in an SOI substrate. A related method is also disclosed.

Abstract: A temperature sensor is disclosed that determines whether the temperature of an integrated circuit (IC) is within a normal temperature range. A low threshold monitor circuit senses whether the temperature of the IC is above or below a minimum temperature threshold. A high threshold monitor circuit configured senses whether the temperature of an integrated circuit (IC) is above or below a maximum temperature threshold. The minimum temperature threshold is determined by an intersection of a first temperature coefficient of resistance (TCR) and a second TCR that are associated with a first pair of conductive lines. The maximum temperature threshold is determined by an intersection of a third TCR and a fourth TCR associated that are with the second pair of conductive lines.

Abstract: A semiconductor structure and a method of fabricating the same are disclosed. The semiconductor structure comprises an active region over a substrate defining a top surface and a gate structure embedded in the active region. In a cross section of the active region, the gate structure includes a conductive feature having a first width buried in the active region and reaching a first depth therein; an insulating cap having a second width arranged above the conductive feature in the active region and reaching a second depth therein; and a dielectric liner arranged between the active region and the conductive feature. The first width is smaller than the second width.

Abstract: A semiconductor device (1) is manufactured which includes a SiC epitaxial layer (28), a plurality of transistor cells (18) that are formed in the SiC epitaxial layer (28) and that are subjected to ON/OFF control by a predetermined control voltage, a gate electrode (19) that faces a channel region (32) of the transistor cells (18) in which a channel is formed when the semiconductor device (1) is in an ON state, a gate metal (44) that is exposed at the topmost surface for electrical connection with the outside and that is electrically connected to the gate electrode (19) while being physically separated from the gate electrode (19), and a built-in resistor (21) that is made of polysilicon and that is disposed below the gate metal (44) so as to electrically connect the gate metal (44) and the gate electrode (19) together.

Abstract: A method of using sacrificial structures in a mold substrate for packaging a first die and one or more second dies or stacks thereof is disclosed. The method allows testing of the first die prior to mounting the second dies, without requiring a TSV insert. In one aspect, a block of sacrificial material is embedded together with the first die in a first mold substrate and to one side of the first die. The removal of the block creates an opening. The method is configured so that contacts are exposed at the bottom of the opening, the contacts being electrically connected to corresponding contacts on the first die. This may be realized by bonding both the die and the sacrificial block to a redistribution layer, or by mounting a bridge device between the first die and the block prior to a first overmolding applied for producing the first mold substrate.

Abstract: Some embodiments include a memory device having first structures arranged in a first direction and second structures arranged in a second direction. At least one structure among the first and second structures includes a semiconductor material. The second structures contact the first structures at contact locations. A region at each of the contact locations is configured as memory element to store information based on a resistance of the region. The structures can include nanowires. Other embodiments are described.

Abstract: A device comprises an array of elevationally-extending transistors and a circuit structure adjacent and electrically coupled to the elevationally-extending transistors of the array. The circuit structure comprises a stair step structure comprising vertically-alternating tiers comprising conductive steps that are at least partially elevationally separated from one another by insulative material. Operative conductive vias individually extend elevationally through one of the conductive steps at least to a bottom of the vertically-alternating tiers and individually electrically couple to an electronic component below the vertically-alternating tiers. Dummy structures individually extend elevationally through one of the conductive steps at least to the bottom of the vertically-alternating tiers. Methods are also disclosed.

Abstract: A substrate treating method and a substrate treating apparatus which can reduce the collapse of a pattern on a substrate. The substrate treating method includes a supply step of supplying a process liquid including a sublimable substance in a molten state to a pattern-formed surface of a substrate; a solidification step of solidifying the process liquid on the pattern-formed surface so as to form a solidified body; a sublimation step of subliming the solidified body so as to remove the solidified body from the pattern-formed surface; and an organic substance removal step of removing, when the solidified body is sublimed, an organic substance precipitated on a sublimation interface, and the organic substance removal step is performed so as to overlap at least part of the sublimation step.

Abstract: A method for fabricating a semiconductor device including an ion-sensitive field-effect transistor (ISFET) with enhanced sensitivity includes forming a sawtooth microwell within a base structure formed on a semiconductor chip corresponding to an ISFET, including using a sawtooth mask to etch through the base structure to expose the semiconductor chip, removing the sawtooth mask, and forming a sawtooth macrowell from the sawtooth microwell.

Abstract: A method used in forming integrated circuitry comprises forming a stack of vertically-alternating tiers of different composition materials. A stair-step structure is formed into the stack and an upper landing is formed adjacent and above the stair-step structure. The stair-step structure is formed to comprise vertically-alternating tiers of the different composition materials. A plurality of stairs individually comprise two of the tiers of different composition materials. At least some of the stairs individually have only two tiers that are each only of a different one of the different composition materials. An upper of the stairs that is below the upper landing comprises at least four of the tiers of different composition materials. Structure independent of method is disclosed.

Abstract: An electronic component includes a lower insulating layer, an upper insulating layer formed on the lower insulating layer, a first via electrode embedded in the lower insulating layer, a second via electrode embedded in the lower insulating layer at an interval from the first via electrode, and a resistance layer that is made of a metal thin film, is interposed in a region between the lower insulating layer and the upper insulating layer, and is electrically connected to the first via electrode and the second via electrode.

Abstract: Provided is a method of fabricating a resistive memory including forming a first electrode and a second electrode opposite to each other; forming a variable resistance layer between the first electrode and the second electrode; forming an oxygen exchange layer between the variable resistance layer and the second electrode; and forming a protection layer at least covering sidewalls of the oxygen exchange layer.

Abstract: In an aspect of the disclosure, a method, a computer-readable medium, and an apparatus are provided. The apparatus may determine whether the IC temperature is less than a threshold value. The apparatus may initiate a joule heating procedure using a joule heating element of the IC upon determining that the temperature is less than the threshold value. The apparatus may delay an initiation of the one or more processors of the IC until the IC temperature meets the threshold value.

Abstract: A method of forming an integrated circuit device having a nanosheet resistor includes forming a nanosheet structure having alternating sheets of silicon and silicon germanium. An ion implantation is performed on the nanosheet structure. A thermal anneal is performed on the nanosheet structure. A dielectric oxide is placed around the nanosheet structure. A first contact and a second contact are coupled to the nanosheet structure to form a resistor between the first contact and the second contact. Other embodiments are also described herein.

Abstract: A resistive random access memory structure includes a semiconductor substrate, a transistor, a bottom electrode, a plurality of top electrodes, and a resistive-switching layer. The transistor is disposed over the semiconductor substrate. The bottom electrode is disposed over the semiconductor substrate and is electrically connected to a drain region of the transistor. The plurality of top electrodes is disposed along a sidewall of the bottom electrode. The resistance-switching layer is disposed between the bottom electrode and the plurality of top electrodes.

Abstract: A method for fabricating a semiconductor device including an ion-sensitive field-effect transistor (ISFET) with enhanced sensitivity includes forming a microwell within a stack including alternating dielectric layers formed on a semiconductor chip corresponding to an ISFET. Forming the stack includes forming a first dielectric layer including a first material and a second dielectric layer including a second material. The method further includes etching the second dielectric layer selective to at least the first dielectric layer using a wet etch process, and forming a macrowell from the microwell having a shape defined by the etching.

Abstract: Metal resistors and self-aligned gate edge (SAGE) architectures having metal resistors are described. In an example, a semiconductor structure includes a plurality of semiconductor fins protruding through a trench isolation region above a substrate. A first gate structure is over a first of the plurality of semiconductor fins. A second gate structure is over a second of the plurality of semiconductor fins. A gate edge isolation structure is laterally between and in contact with the first gate structure and the second gate structure. The gate edge isolation structure is on the trench isolation region and extends above an uppermost surface of the first gate structure and the second gate structure. A metal layer is on the gate edge isolation structure and is electrically isolated from the first gate structure and the second gate structure.

Abstract: Structures that include a passive device, such as a metal-based resistor, and methods of forming a structure that includes a passive device. The structure includes a semiconductor substrate, an interconnect structure including a passive device, and a dummy fill region arranged between the passive device and the semiconductor substrate. The dummy fill region includes a plurality of shallow trench isolation regions in the semiconductor substrate, a plurality of semiconductor fins, a plurality of source/drain regions in the plurality of semiconductor fins, and a plurality of contacts arranged over the plurality of shallow trench isolation regions.

Abstract: Methods and devices based on the use of dopant-modulated etching are described. During fabrication, a memory storage element of a memory cell may be non-uniformly doped with a dopant that affects a subsequent etching rate of the memory storage element. After etching, the memory storage element may have an asymmetric geometry or taper profile corresponding to the non-uniform doping concentration. A multi-deck memory device may also be formed using dopant-modulated etching. Memory storage elements on different memory decks may have different taper profiles and different doping gradients.

Abstract: Described examples include a semiconductor device having a resistor. The resistor includes a first terminal and a second terminal. The resistor also includes a first resistive element over an insulating layer over a substrate having a first end coupled to the first terminal of the resistor and a second end coupled to the second terminal of the resistor; and a parallel second resistive element over the insulating layer over the substrate having a first end coupled to the first terminal of the resistor and a second end coupled to the second terminal of the resistor. The resistor may also be coupled in series with another resistor.

Abstract: A semiconductor device includes as a resistance element a first polycrystalline silicon and a second polycrystalline silicon containing impurities, such as boron, of the same kind and having different widths. The first polycrystalline silicon contains the impurities at a concentration CX. The second polycrystalline silicon has a width larger than a width of the first polycrystalline silicon and contains the impurities of the same kind at a concentration CY lower than the concentration CX. A sign of a temperature coefficient of resistance (TCR) of the first polycrystalline silicon changes at the concentration CX. A sign of a TCR of the second polycrystalline silicon changes at the concentration CY.

Abstract: A resistor for dynamic random access memory includes a substrate with a memory cell region and a peripheral region defined thereon, and a resistor formed on a shallow trench isolation of the substrate, wherein the resistor is provided with a winding portion and terminal portions at two ends of the winding portion. The winding portion is electrically connected with an overlying metal layer through contacts, and the terminal portion includes a polysilicon layer and a metal multilayer from the bottom up.

Abstract: A structure includes a first dielectric over a trench silicide (TS) contact and over a gate structure, and at least one cavity in the first dielectric. A metal resistor layer is on a bottom and sidewalls of the at least one cavity and extends over the first dielectric. A first contact is on the metal resistor layer over the first dielectric; and a second contact is on the metal resistor layer over the first dielectric. The metal resistor layer is over the TS contact and over the gate structure. Where a plurality of cavities are provided in the dielectric, a resistor structure formed by the metal resistor layer may have an undulating cross-section over the plurality of cavities and the dielectric.

Abstract: A memory device is disclosed. The memory device includes a bottom contact and a memory layer connected to the bottom contact. The memory layer has a variable resistance. The memory device also includes a top electrode on the memory layer, where the top electrode and the memory layer cooperatively form a heterojunction memory structure. The memory device also includes a top contact on the top electrode; a first barrier layer, configured to substantially prevent the conduction of ions therethrough, where the first barrier layer is between the top electrode and the top contact, and where the first barrier layer has a resistivity less than 1e-4 ohm-m; and a second barrier layer, configured to substantially prevent the conduction of ions or vacancies therethrough, where the second barrier layer is between the memory layer and the bottom contact, and where the first barrier layer has a resistivity less than 1e-4 ohm-m.

Abstract: A semiconductor memory device according to an embodiment includes a substrate; a plate-like first conductivity layer provided above the substrate and extending parallel to a substrate plane to bestride first and second regions; a plate-like second conductivity layer provided above the first conductivity layer to be separated from the first conductivity layer, an end portion of the first conductivity layer has a protruding staircase shape in the first region, the second conductivity layer extending parallel to the first conductivity layer to bestride the first and second regions; a first contact connected to the first conductivity layer at a side surface or a bottom surface of the first conductivity layer and extending from the first conductivity layer toward the substrate, the first contact being connected at a position where the end portion of the first conductivity layer in the first region protrudes, and a diameter size of a portion of the first contact connected at a side surface or a bottom surface of th

Abstract: A semiconductor device structure comprises stacked tiers each comprising a conductive structure and an insulating structure longitudinally adjacent the at least one conductive structure, at least one staircase structure having steps comprising lateral ends of the stacked tiers, and an opening laterally adjacent a first side of the at least one staircase structure and extending through the stacked tiers and continuously across an entire length of the at least one staircase structure. Conductive structures of the stacked tiers laterally extend from the steps of the at least one staircase structure completely across a second side of the at least one staircase structure opposing the first side to form continuous conductive paths laterally extending completely across the stacked tiers. Additional semiconductor device structures, methods of forming semiconductor device structures, and electronic systems are also described.

Abstract: A milliohm resistor is fabricated as a Josephson junction device that contains ferromagnetic or antiferromagnetic material of sufficient thickness to render the device entirely resistive between terminals. The device can have a resistance on the order of milliohms and can be consume a much smaller chip footprint than resistors of the same resistance fabricated using conventional resistive materials. Because the device can be fabricated without modification to processes used to fabricate reciprocal quantum logic (RQL) circuitry, it can easily be incorporated in RQL circuits to mitigate flux trapping or to perform other functions where very small resistances are needed. In particular, the device can burn off circulating currents induced by trapped flux without affecting the transmission of SFQ pulses through RQL circuitry.

Abstract: A semiconductor device includes as a resistance element a first polycrystalline silicon and a second polycrystalline silicon containing impurities, such as boron, of the same kind and having different widths. The first polycrystalline silicon contains the impurities at a concentration CX. The second polycrystalline silicon has a width larger than a width of the first polycrystalline silicon and contains the impurities of the same kind at a concentration CY lower than the concentration CX. A sign of a temperature coefficient of resistance (TCR) of the first polycrystalline silicon changes at the concentration CX. A sign of a TCR of the second polycrystalline silicon changes at the concentration CY.

Abstract: A neuromorphic device includes a synapse. The synapse includes a first electrode, a second electrode spaced apart from the first electrode, an oxygen-containing layer disposed between the first electrode and the second electrode, the oxygen-containing layer including oxygen ions, and a stack structure disposed between the oxygen-containing layer and the second electrode, the stack structure including a plurality of reactive metal layers alternately arranged with a plurality of oxygen diffusion-retarding layers. The plurality of reactive metal layers are capable of reacting with oxygen ions of the oxygen-containing layer. The plurality of oxygen diffusion-retarding layers interfere with a movement of the oxygen ions from the oxygen-containing layer to the plurality of reactive metal layers.

Abstract: A method for fabricating semiconductor device includes the steps of: forming a titanium nitride (TiN) layer on a silicon layer; performing a first treatment process by reacting the TiN layer with dichlorosilane (DCS) to form a titanium silicon nitride (TiSiN) layer; forming a conductive layer on the TiSiN layer; and patterning the conductive layer, the metal silicon nitride layer, and the silicon layer to form a gate structure.

Abstract: An integrated circuit (IC) fabricated on a Silicon-On-Insulator (SOI) wafer, having a plurality of impedance elements cascoded in series, each impedance elements having a specified value. A subset of the impedance elements are arranged to bias a first tub at a specified very high voltage (VHV) multiplied by a first predetermined ratio. A further subset of the impedance elements are arranged to bias a second tub at VHV multiplied by a second predetermined ratio and each of the impedance elements are further arranged to bias a handle and a third surrounding tub at VHV multiplied by a third predetermined ratio. A method for designing an integrated circuit using fully dielectrically isolated processes which function reliably at higher operating voltages than that provided by the conventional processes.