Abstract: A correction function is calculated based on a reference image formed of reflected light reflected upon the irradiation of a predetermined living tissue, for which a diseased state is known, with a reference light. This correction function is employed to administer distance correction on calculated standardized values based on fluorescence images to which an offset has been added, to correct the fluctuations of the calculated standardized values caused by the distance between living tissue and the distal end of a fluorescence endoscope, thereby generating a corrected standardized fluorescence image.

Abstract: In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair comprises carbon or scandium and the other comprises a metal oxide or a metal nitride and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.

Abstract: A portable measurement apparatus is presented for inducing and measuring fluorescent X-ray radiation. It comprises an X-ray source (303, 902, 1005, 1105) adapted to controllably irradiate a sample (301, 803) with X-rays, and a detector (305, 406, 1006, 1106) adapted to detect fluorescent radiation emitted by said sample (301, 803). The X-ray source (303, 902, 1005, 1105) is an X-ray tube, an anode of which comprises at least one of silver, rhodium and molybdenium. Consequently said X-ray tube is adapted to controllably emit L-line radiation of at least one of silver, rhodium and molybdenium.

Abstract: Measurement technique and apparatus for examining a region of a patterned surface such as an integrated circuit (IC). Excitation x-ray, neutron, particle-beam or gamma ray radiation is directed toward a two-dimensional sample area of the IC. Emissions (e.g., x-ray fluorescence—XRF) from the sample area are detected. A mask is placed in a planar radiation path formed by the source, detector and the sample area, and in one embodiment moveable relative to the sample area. The mask includes an elongate aperture to substantially confine the excitation radiation directed to the sample area, and the emissions from the sample area, to the planar radiation path when arranged parallel to a first axis of the two-dimensional sample area. The invention allows predictive measurement of feature characteristics in active circuit regions of the IC, using sample areas outside of these regions.

Abstract: Method for the determination of the thickness of the insulation of a flat ribbon cable in the region of the metallic conductor paths, wherein one side of the flat ribbon cable is irradiated by means of an x-ray beam, and a detector on the same or on the opposing side of the flat ribbon cable measures the intensity of the x-ray luminescence radiation emitted by the respective conductor paths, the detector being shielded against the x-ray radiation.

Abstract: The measurement head (101) of an X-ray fluorescence analyzer device is protected against heat from a hot target by using an adapter (201). It comprises a sheet of material having low thermal conductivity and has a three-dimensional shape that follows the form of a front part of the measurement head (101). Said sheet of material is attached to said measurement head (101) and has a central part (401) which defines an opening (202) coincident with a radiation window (109) in said measurement head (101). Said attachment means (204, 205, 301, 302, 311, 312) are located at a part of said sheet of material that is distant from said central part (401).

Abstract: The present invention relates to calibration apparatuses, methods or tools used in microscopy. A calibration tool for fluorescent microscopy includes a support, a solid surface layer including a fluorescent material, and a thin opaque mask of non-fluorescent material defining reference feature openings having selected dimensions exposing portions of the surface layer. A first type of the calibration tool may include an adhesion promoter facilitating contact between the surface of the support and the solid surface layer including the fluorescent material, which is in contact with the thin opaque mask. A second type of the calibration tool may include the thin opaque mask fabricated (with or without an adhesion promoter) onto the support, and the solid surface layer including the fluorescent material located on the thin opaque mask.

Abstract: This invention provides an X-ray analysis apparatus and method capable of simply and accurately determining the position of analysis in a sample from an optical image of it without lowering the sensitivity and/or the spatial resolution in light element analysis. The X-ray analysis apparatus of the present invention irradiates a sample with X-rays narrowed down by means of an X-ray guide member from above the sample in which said sample is directly irradiated with X-rays from said X-ray guide member and an optical image of said sample is obtained in the direction coaxial with said X-ray guide member.

Abstract: In analyzing radiation from a sample, single-quanta counting can be used to advantage especially at low levels of radiation energy, e.g. in the detection of fluorescent radiation. Preferred detection techniques include methods in which (i) fluorescence-stimulating radiation is intensity-modulated in accordance with a preselected code, (ii) wherein it is the fluorescent radiation which is intensity-modulated with the preselected code, and (iii) wherein modulation with a preselected code is applied to a sample to influence a property which functionally affects emitted fluorescent radiation. For registration of the signals from a sensing element of a single-photon detector, time of arrival is recorded, optionally in conjunction with registration of time intervals. Advantageously, in the interest of minimizing the number of pulses missed due to close temporal spacing of pulses, D-triggers can be included in counting circuitry.

Abstract: A device is proposed for the precision rotation of samples on a diffractometer, especially for X-ray or synchrotron radiation diffraction experiments, comprising: a centering element (26) which is held at one end of a motor-driven rotating shaft (22) and can be displaced in a plane orthogonal to the axis of rotation of the rotating shaft (22), a sample holder (30) which is fixed to the centering element (26) or integral with the latter for holding a sample (32) substantially centrally with respect to the axis of rotation in an X-ray or synchrotron radiation beam (S), at least one micrometer finger (36) which is arranged in the region of the centering element (26) and can be positioned orthogonally with respect to the axis of rotation of the rotating shaft (22) by means of a micrometer finger drive device.

Abstract: Apparatus and methods in which one or more elemental taggants that are intrinsically located in an object are detected by x-ray fluorescence analysis under vacuum conditions to identify or verify the object's elemental content for elements with lower atomic numbers. By using x-ray fluorescence analysis, the apparatus and methods of the invention are simple and easy to use, as well as provide detection by a non line-of-sight method to establish the origin of objects, as well as their point of manufacture, authenticity, verification, security, and the presence of impurities. The invention is extremely advantageous because it provides the capability to measure lower atomic number elements in the field with a portable instrument.

Abstract: A system and process for classifying a piece of material of unknown composition at high speeds, where the system connected to a power supply. The piece is irradiated with first x-rays from an x-ray source, causing the piece to fluoresce x-rays. The fluoresced x-rays are detected with an x-ray detector, and the piece of material is classified from the detected fluoresced x-rays. Detecting and classifying may be cumulatively performed in less than one second. An x-ray fluorescence spectrum of the piece of material may be determined from the detected fluoresced x-rays, and the detection of the fluoresced x-rays may be conditioned such that accurate determination of the x-ray fluorescence spectrum is not significantly compromised, slowed or complicated by extraneous x-rays. The piece of material may be classified by recognizing the spectral pattern of the determined x-ray fluorescence spectrum. The piece of material may be flattened prior to irradiation and detection.

Abstract: An optical inspection unit inspects a surface of an object under inspection optically. A processing unit detects defects on the surface of the object under inspection and their features according to inspection results from the optical inspection unit, detects positions of the detected defects on the surface of the object under inspection, and classifies the detected defects according to their features. The processing unit selects the defects, on which a X-ray analysis should be performed, according to predetermined conditions about the features or the classification results of the defects. Alternatively, the processing unit displays the positions and the classification results of the defects, and an operator picks the defects, on which the X-ray analysis should be performed. A X-ray inspection unit performs the X-ray analyses on the selected or picked defects.

Abstract: A fluorescent X-ray analysis apparatus includes: an X-ray generation source for radiating a beam of primary X-rays; spectroscopic elements circularly arranged so that their inner surfaces describe a circle centered on an optical axis of the beam of primary X-rays for monochromatizing the beam of primary X-rays and condensing the beam on a surface of an irradiation object; a spectroscopic element position adjuster for adjusting the positions of the spectroscopic elements; secondary X-rays detector for detecting secondary X-rays radiated from the surface of the irradiation object irradiated with the monochromatized beam of primary X-rays; a secondary X-ray detector position adjuster adjusting the position of the secondary X-ray detector; an irradiation object surface position detector detecting the position of the surface of the irradiation object; and a controller adjusting the positions of the spectroscopic elements through the spectroscopic element position adjuster to condense the monochromatized beam of pr

Abstract: The invention provides a system and method for microscopic X-ray fluorescence. An X-ray source, X-ray focusing element and a tapered X-ray opaque focusing aperture provide a focused X-ray spot on a sample. The system translates a sample between an imaging position and a testing position. In the imaging position, the sample is aligned in three dimensions and after alignment, the system automatically translates the sample between the imaging position and the testing position. To avoid collision between the sample and other elements of the system, a position detecting device terminates the sample translation if the sample trips the position detecting device. The focusing aperture of the system has a tapered through opening to block unfocused X-rays and reduce or eliminate a halo effect. To detect low atomic number elements, a detector aperture is vacuum sealed to an X-ray detector and X-ray elements of the system are vacuum evacuated.

Abstract: Disclosed are an X-ray fluorescence (SRF) spectrometer and method for on-site and in-line determination of contaminant elements in lubricating oils and in fuel oils on board a marine vessel. An XRF source block 13 contains two radionuclide sources 16, 17 (e.g. Cd 109 and Fe 55), each oriented 180 degrees from the other to excite separate targets. The Cd 109 source 16 excites sample lube oil flowing through a low molecular weight sample line 18. The Fe 55 source 17 excites fuel oil manually presented to the source beam inside a low molecular weight vial 26 or other container. Two separate detectors A and B are arranged to detect the fluorescent x-rays from the targets, photons from the analyte atoms in the lube oil for example, and sulfur identifying x-rays from bunker fuel oil for example. The system allows both automated in-line and manual on-site analysis using one set of signal processing and multi-channel analyzer electronics 34, 37 as well as one computer 39 and user interface 43.

Abstract: A system for surgical imaging and display of tissue structures of a patient, including a display and an image processor for displaying such images in coordination with a tool image to facilitate manipulation of the tool during the surgical procedure. The system is configured for use with a fluoroscope such that at least one image in the display is derived from the fluoroscope at the time of surgery. A fixture is affixed to an imaging side of the fluoroscope for providing patterns of an of array markers that are imaged in each fluoroscope image. A tracking assembly having a plurality of tracking elements is operative to determine positions of said fixture and the patient. One of the tracking elements is secured against motion with respect to the fixture so that determining a position of the tracking element determines a position of all the markers in a single measurement.

Abstract: A method for surgical imaging and display including (i.) positioning a defined set of markers disposed in a pattern so as to be imaged in each pose or view of an imaging assembly, the set of markers being fixed in pre-determined positions in a rigid carrier, (ii.) securing a first tracking element against motion with respect to the rigid carrier so that determining a position of the first tracking element in a single measurement determines positions of all the markers of the set, and (iii.) identifying images of at least a subset of the markers in a first view.

Abstract: In a fluorescent X-ray analysis apparatus, a diffraction X-ray is removable from a sample even if it is formed of a mixture of fine crystals. A movable collimator mechanism capable of detecting only a collimate component of an X-ray optical flux is provided in a secondary X-ray path extending between a sample and an X-ray detector. Spectrum measurement is conducted on the same sample when the collimator mechanism is inserted and removed from the secondary X-ray path.

Abstract: There is provided a multilayered spectroscopic device effective to achieve in a short length of time the highly accurate fluorescent X-ray analysis of boron wherein the influence that may be brought about by the interfering X-rays and the background is sufficiently reduced and the strength of reflection of B-K&agr; line is sufficient. In this multilayered spectroscopic device 3, lanthanum (La), an alloy containing lanthanum as a principal component or lanthanum oxide (La2O3) is used for the reflecting layers 31 and boron is used for the spacer layers 32 and the periodic length d is chosen to be within the range of 7 to 14 nm and the film thickness ratio of the reflecting layers 31 to the spacer layers 32 is chosen to be within the range of 2/3 to 3/2. It has a total laminated film thickness t of a value sufficient to allow the strength of reflection of B-K&agr; line to be equal to or higher than 98% of a saturation value.

Abstract: An improved total-reflection x-ray fluorescence (TXRF) apparatus using a doubly-curved optic is presented for use in detecting foreign matter on surfaces, for example, semiconductor wafers. The apparatus includes an x-ray source, a doubly-curved x-ray optic for diffracting and focusing the x-rays, a surface onto which at least some of the diffracted x-rays are directed, and an x-ray detector for detecting resultant x-ray fluorescence emitted by any foreign matter present on the surface One or more apertures may be provided for limiting the dispersion angle of the x-rays. The crystal or multi-layer doubly-curved optic typically adheres to Bragg's law of x-ray diffraction may be curved to a toroidal, ellipsoidal, spherical, parabolic, hyperbolic, or other doubly-curved shape. An apparatus for diffracting x-rays is also presented.

Abstract: A method for making a quantitative analysis of nickel that includes the steps of providing an amorphous silicon layer, forming an insulating film on the amorphous silicon layer, depositing nickel on the insulating film, etching a defined portion of the nickel with an etchant to create a specimen, drying the specimen on an AP1 film and subjecting the dried specimen to energy dispersive X-ray fluorescence analysis.

Abstract: An X-ray analysis apparatus for investigating material samples, comprising a device for automatic exchange of the samples (1), which comprises a sample table (2) with depositing positions (3) disposed in m lines, wherein the lines extend parallel to an x direction and m≧2, and comprising a gripping device (4) for precise removal of any desired sample (1) from a depositing position (3) and for transfer into a transfer and/or measuring position (5) and back to a depositing position (3), wherein the gripping device (4) can be displaced linearly parallel to the x direction, is characterized in that the sample table (2) can be moved linearly parallel to a y direction, extending at an angle &agr; to the x direction, and independently of the gripping device (4) for gripping samples (1) from different lines, wherein the sample table (2) is disposed parallel to the x-y plane.

Abstract: An X-ray analysis apparatus for investigating material samples, comprising a device for automatic exchange of the samples (1), which comprises a gripping device (4) for precise removal of any desired sample (1) from a depositing position (3) and for transfer into a transfer and/or measuring position and back to a depositing position (3), wherein at least some of the samples are surrounded by a sample holder (13;13′) in the peripheral direction, is characterized in that the samples or containers containing the samples project past the sample holder in the vertical z direction perpendicular to the horizontal x-y plane and that the gripping device is disposed and structured on a side of the sample to surround parts of a sample or of a sample container which project past the sample holder in an operating position in the z direction and to grasp the sample holder.

Abstract: The present invention includes a system for efficient and effective detection and characterization of dishing and/or erosion. An x-ray emission inducer is used to scan a target on a sample. The target can be scanned at an acute incident angle to allow characterization of the dishing and/or erosion and analysis of the metallization or thin film layer topology.

Abstract: An X-ray fluorescence film thickness measuring device has an X-ray generating system generating and irradiating primary X-rays. A focusing system focuses primary X-rays irradiated from the X-ray generating system onto microscopic measurement regions in a sample. A sample observation optical system is used to observe the sample during focusing of the primary X-rays for use in positioning of the microscopic measurement regions relative to the primary X-rays. A first sensor with low counting efficiency but high energy resolution detects X-ray fluorescence generated from a sample having the microscopic measurement regions. A second sensor has low energy resolution but high counting efficiency compared to the first sensor. Each of a pair of pre-amplifiers receives a signal from a respective one of the first and second sensors.

Abstract: The invention relates to an optical system in the ray path of a confocal fluorescence microscope, comprising at least one laser light source (1, 2), a device positioned in the illuminating/detecting beam (3, 4, 5) for separating the exciting light (8) from the fluorescent light (9), an objective (10) arranged between the device and the object (7), and a detector (11) positioned downstream of the device situated in the detecting beam (5). The aim of the invention is to increase the fluorescence yield of the system while retaining its compact structure.

Abstract: A method of analyzing a composition depth profile of a solid surface layer, wherein actually-measured intensity of photoelectrons emitted from the solid surface layer by irradiating the solid surface layer containing at least two or more species of element with X rays and photoelectron calculated intensity obtained by making a calculation assuming an elemental composition ratio for each of a plurality of sub-layers into which the solid surface layer has been temporarily divided are utilized to determine a composition depth profile of the solid surface layer, the method including a step of at least repeating an approximate calculation including: distinguishing a specified sub-layer such that the calculated intensity best converges to the actually-measured intensity in the sub-layers; and correcting an elemental composition ratio at least for the specified sub-layer so that the calculated intensity converges to the actually-measured intensity, thereby determining the composition depth profile of the solid surfa

Abstract: Disclosed are apparatus and methods for characterizing a potential defect of a semiconductor structure. A charged particle beam is scanned over a structure which has a potential defect. X-rays are detected from the scanned structure. The X-rays are in response to the charged particle beam being scanned over the structure. The potential defect of the scanned structure is characterized based on the detected X-rays. For example, it may be determined whether a potentially defective via has a SiO2 plug defect by comparing an X-ray count ratio of oxygen over silicon of the defective via with an X-ray count ratio of a known defect-free reference via. If the defective via has a relatively high ratio (more oxygen than silicon) as compared to the reference via, then it may be determined that a SiO2 plug defect is present within the defective via. Otherwise, the via may be defmed as having a different type of defect (e.g., not a SiO2 plug defect) or defined resulting in a “false” defect.

Abstract: An electron microscope including an apparatus for x-ray analysis, is capable of performing elemental analysis with X-rays emitted from a specimen by electron beam irradiation, that is, inspection of foreign particles, for enhancement of yields in manufacturing, at high speed and with high precision and high space resolving power. The current quantity of the electron beam is automatically controlled such that an X-ray count rate falls within a range of 1000 to 2000 counts per second, a plurality of X-ray energy regions are set up when checking an X-ray spectrum against reference spectra stored in a database for analysis of the X-ray spectrum, matching is performed for each of the X-ray energy regions, and the distribution of the elements observed is analyzed on the basis of an intensity ratio between X-ray sample spectra obtained by electron beam irradiation at not less than two varied acceleration voltages.

Abstract: In analyzing radiation from a sample, single-quanta counting can be used to advantage especially at low levels of radiation energy, e.g. in the detection of fluorescent radiation. Preferred detection techniques include methods in which (i). fluorescence-stimulating radiation is intensity-modulated in accordance with a preselected code, (ii) wherein it is the fluorescent radiation which is intensity-modulated with the preselected code, and (iii) wherein modulation with a preselected code is applied to a sample to influence a property which functionally affects emitted fluorescent radiation. For registration of the signals from a sensing element of a single-photon detector, time of arrival is recorded, optionally in conjunction with registration of time intervals. Advantageously, in the interest of minimizing the number of pulses missed due to close temporal spacing of pulses, D-triggers can be included in counting circuitry.

Abstract: To provide an X-ray fluorescence spectrometer of a simplified structure of a type in which a sample can be transported to an irradiating position where the sample is irradiated with primary X-rays and analysis can be achieved by positioning a target area to be measured of the sample. When an r drive means 37 drives an r drive shaft 43, a transporting function of transporting the sample 3 and a positioning function of positioning the target area in an r direction are performed. Also, a&thgr; drive shaft 53 of a &thgr; drive means 38 for performing the positioning function for positioning the target area in a &thgr; direction and the r drive shaft 43 of the r drive means 37 form a dual coaxial shaft assembly.

Abstract: A technique for measuring the chemical composition of surface particles or other small features which may be present on semiconductor wafers or other substrates. A particle is irradiated with a variable energy, focused incident electron beam. X-ray or electron emissions from the particle are monitored to detect an increase in output indicating the ionization threshold of the materials in the particle. The incident beam energy is correlated with the thresholds detected to determine the species present in the particle.

Abstract: There is provided a multilayered spectroscopic device effective to achieve in a short length of time the highly accurate fluorescent X-ray analysis of boron wherein the influence that may be brought about by the interfering X-rays and the background is sufficiently reduced and the strength of reflection of B—K&agr; line is sufficient. In this multilayered spectroscopic device 3, lanthanum (La), an alloy containing lanthanum as a principal component or lanthanum oxide (La2O3) is used for the reflecting layers 31 and boron is used for the spacer layers 32 and the periodic length d is chosen to be within the range of 7 to 14 nm and the film thickness ratio of the reflecting layers 31 to the spacer layers 32 is chosen to be within the range of 2/3 to 3/2. It has a total laminated film thickness t of a value sufficient to allow the strength of reflection of B—K&agr; line to be equal to or higher than 98% of a saturation value.

Abstract: The image quantifying method and apparatus perform quantification from two-dimensional digital image information. The method and apparatus set a background region which is not including a region of interest around the region of interest to be quantified in a two-dimensional image based on the two-dimensional digital image information, determine a statistical distribution of pixel-based intensity for all pixels in the background region, determine an average intensity of the region of interest which serves as a reference for finding the region of interest significant from a statistical quantity obtained from the statistical distribution and test the region of interest for its significance based on the determined reference average intensity. By the method and apparatus, even a region of interest having low intensity can be tested for its significance in a sufficiently rational and correct manner to realize correct quantitative treatment and analysis of the image in that region of interest.

Abstract: In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair comprises carbon or scandium and the other comprises a metal oxide or a metal nitride and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.

Abstract: Methods and apparatus are disclosed for detecting a thickness of a surficial layer (e.g., metal or insulating layer) on a workpiece (e.g., semiconductor wafer) during a process for planarizing the layer, so as to stop the process when a suitable process endpoint is reached. Layer thickness is detected based on a spectral-characteristic signal of reflected or transmitted signal light, obtained by directing a probe light onto the surface of the workpiece. Example spectral characteristics are local maxima and minima of signal-light waveform, differences or quotients of the same, a dispersion of the signal-light waveform, a component of a Fourier transform of the signal waveform, a cross-correlation function of the signal waveform. Alternatively, the zeroth order of signal light is selected for measurement, or a spatial coherence length of the probe light is compared with the degree of fineness of the pattern on the surface illuminated with the probe light.

Abstract: An X-ray fluorescence device and method are disclosed. The device includes a source block containing an X-ray source, a substantially X-ray transparent fluid flow path through the source block and proximate the X-ray source, and an X-ray detector separated from the X-ray source by the source block. First and second openings are provided in the source block between the X-ray source and the flow path and between the flow path and the detector respectively. In operation, source X-rays pass through the first opening and through the flow path. A portion of the source X-rays interact with a fluid in the flow path to create a fluid fluorescence response. The remainder of the source X-rays pass into a noise reduction cavity of the source block. The detector receives the portion of the fluid fluorescence response passing through the second opening and produces an output indicative of the presence and amount of selected components in the fluid.

Abstract: Where an object to be analyzed in an X-ray fluorescence analysis is a thin film sample, the X-ray fluorescence spectrometer facilitates selection of proper secondary X-ray lines to be measured to thereby facilitate an accurate analysis. The spectrometer includes a measuring line evaluating means 23 operable to calculate for each specified secondary X-ray line to be measured, a first theoretical intensity at a specified thickness and a composition of each of layers in the thin film and a second theoretical intensity at the thickness and the composition thereof when the thickness or a concentration has been changed by a predetermined quantity, to calculate a precision of a thickness or a precision of the concentration based on the first and second theoretical intensities, and to determine applicability or inapplicability of an analysis using the specified secondary X-ray line to be measured.

Abstract: A method of maintaining measurement accuracy of specific constituents in prompt gamma neutron activation analyzers in a flow of bulk material having a known range of flow rates. The method comprises the steps of providing a plurality of samples of the bulk material for insertion into the analyzer in geometries and quantities referred to as loading profiles. Each of the loading profiles is inserted into the analyzer and measured long enough to yield a measurement uncertainty that is small compared to the observed differences in analysis results from one loading to another. The results are recorded and differences computed as measured errors for subsequent mathematical generation of the expected error at any loading value.

Abstract: To provide an X-ray fluorescence spectrometer capable of providing a stable fluorescent X-ray intensity regardless of the presence of irregularities or the like on a surface of a sample to be analyzed, the X-ray fluorescence spectrometer includes an X-ray source 1 including a primary X-ray limiting diaphragm 3. An aperture 3a of the primary X-ray limiting diaphragm 3 is of a shape effective to allow change in intensity of fluorescent X-rays 7 measured by a detector 8 to be not higher than 1% in the event that a height of the sample surface 5a relative to the X-ray source 1 and the detector 8 changes 1 mm at maximum.

Abstract: In a device and a method for the analysis of atomic and molecular elements by way of wavelength dispersive x-ray spectrometric structures including at least one mirror or focussing device having a multi-layer structure onto which fluorescent radiation generated by primary x-ray or electrons beams from a sample to be examined is directed and the reflected fluorescence radiation is supplied to a measuring device for determining the nature of impurities contained in the sample, the multi-layer structure consists of at least a lanthanum layer and a boron carbide layer.

Abstract: The X-ray fluorescence holography apparatus includes the X-ray converging element that can irradiate monochrome X-rays onto a sample O set on the rotation table, by which a predetermined count number of the X-ray fluorescence to be collected for the X-ray detector can be achieved in a short period of time.

Abstract: A radiation imaging apparatus, including

Abstract: To provide an X-ray fluorescence spectrometer capable of analyzing a semiconductor sample at inexpensive costs non-invasively without incurring damage to the patterned circuits on the semiconductor sample, the X-ray fluorescence spectrometer includes a point source of primary X-rays 3a for emitting primary X-rays B1 used to irradiate a semiconductor sample 1 having circuit patterned areas 1a and scribe line 1b so as to separate the neighboring circuit patterned areas 1a, and a detecting unit 5 for detecting fluorescent X-rays emitted from the semiconductor sample 1.

Abstract: An X-ray fluorescence spectrometer includes an X-ray tube, a collimator or capillary lens for irradiating a primary X-ray from the X-ray tube on a sample, and a detector for detecting an X-ray fluorescence from the sample. The detector is enclosed in a sealed chamber for preventing the X-ray fluorescence from being attenuated by the air. In addition, both ends of the collimator or capillary lens are sealed by thin films having high X-ray permeability for preventing the primary X-ray from being attenuated by the air.

Abstract: A system and method for detecting a substance using x-ray fluorescence is disclosed. The detected substances may be explosives or controlled substances that have a specific chemical fluorescent signature. An energy source transmits an x-ray beam at a target. The target may be in a container or under a surface. The beam interacts with the target to produce fluorescent energy. An x-ray detector is at an angle relative to the energy source and gathers the fluorescent energy. The angle differs according to the physical configuration of the system. A portable embodiment will have a different angle than a stationary embodiment. A cooling mechanism cools the x-ray detector. The fluorescent energy is analyzed and processed by a multichannel analyzer and a computer. The computer determines whether the fluorescent energy from the target matches known fluorescent energies of specific substances. If the substance is detected, appropriate indications are made to prevent damage or acceptance of the substance.

Abstract: An X-ray fluorescence device and method are disclosed. The device includes a source block containing an X-ray source, a substantially X-ray transparent fluid flow path through the source block and proximate the X-ray source, and an X-ray detector separated from the X-ray source by the source block. First and second openings are provided in the source block between the X-ray source and the flow path and between the flow path and the detector respectively. In operation, source X-rays pass through the first opening and through the flow path. A portion of the source X-rays interact with a fluid in the flow path to create a fluid fluorescence response. The remainder of the source X-rays pass into a noise reduction cavity of the source block. The detector receives the portion of the fluid fluorescence response passing through the second opening and produces an output indicative of the presence and amount of selected components in the fluid.

Abstract: An open chamber-type X-ray fluorescence analysis apparatus is provided to analyze a large-sized sample located outside the open chamber. The apparatus has a helium inlet provided in the open chamber for injecting helium gas into the chamber to replace gas within the chamber with helium, a film attaching/removing mechanism for covering the opening in the chamber with a film having high transmittance with respect to X-rays, and a gas outlet provided in the chamber for allowing gas to exit the chamber.

Abstract: A method for making a quantitative analysis of nickel that includes the steps of providing an amorphous silicon layer, forming an insulating film on the amorphous silicon layer, depositing nickel on the insulating film, etching a defined portion of the nickel with an etchant to create a specimen, drying the specimen on an AP1 film and subjecting the dried specimen to energy dispersive X-ray fluorescence analysis.