Abstract: A method of transferring organic material from a donor element to a substrate includes providing a radiation source; and selecting the power of the radiation applied to the donor element by the radiation source to cause the transfer of organic material to the substrate wherein the time that one or more positions of the donor element receives radiation is greater than 1 millisecond.

Abstract: This invention relates to a method of forming a precursor for chemical vapour deposition including the steps of: (a) forming metal ions at a source, (b) introducing the ions into a reaction chamber; and (c) exposing the ions to a gas or gasses within the chamber to react with the ions to form the precursor.

Abstract: A nanostructure is fabricated using charged particle deposition to deposit a catalyst on a substrate. A charged particle beam is directed to location on the substrate where the catalyst is to be deposited, with a beam-activated precursor gas also being directed to the location. For example, a nickel dot can be selectively deposited onto a substrate by using a charged particle beam to decompose a nickel-containing precursor gas, and then a carbon nanotube can be grown on the nickel dot, with the diameter of the nanotube conforming to the size of the nickel dot.

Abstract: The invention concerns a process for replacing an initial outermost coating layer of a coated optical lens with a layer of a new final coating having surface properties different from those of said initial outermost coating which comprises: (a) providing a coated optical lens having an initial outermost coating layer having a surface contact angle with water of at least 65°; (b) subjecting the initial outermost coating layer to a treatment with activated chemical species at about atmospheric pressure, and for less than one minute, in order there is obtained a treated surface having a contact angle with water of 10° or less; and (c) depositing on said treated surface a layer of a final coating having surface properties different from those of said initial outermost coating.

Abstract: A method for surface treatment includes: a first step in which a surface treatment apparatus 1 and a substrate 10 in a state where a front surface 102 of the substrate 10 faces the surface treatment apparatus 1 are conveyed to the inside of a decompression chamber to decompress a plurality of concave portions 32 (enclosed spaces); a second step in which the surface treatment apparatus 1 and the substrate 10 are brought out from the inside of the decompression chamber to environment under atmospheric pressure in a state where the substrate 10 is being attracted to the surface treatment apparatus 1 with the use of a difference between negative pressure inside the concave portions 32 and atmospheric pressure; and a third step in which the surface treatment is carried out to a back surface 101 of the substrate 10 with the substrate 10 being attracted by the surface treatment apparatus 1.

Abstract: A film forming and film modifying method utilizing a film forming apparatus which has an alcohol supply unit to form a metal oxide film on a semiconductor wafer in a vacuum atmosphere in which a vaporized metal oxide film material and a vaporized alcohol exist. The film modifying method irradiates a UV ray on ozone to generate active oxygen atoms, thus modifying the metal oxide film by exposing the metal oxide film to the active oxygen atoms in a vacuum atmosphere.

Abstract: An atomic lithography apparatus for depositing atoms included in an atomic beam on a substrate to manufacture an periodic atomic structure, comprising an atomic oven having a pin hole, a collimator for collimating an atom gas effused from the atomic oven to generate an atomic beam, four lasers for irradiating laser beams on the atomic beam to control the spreading angle of the atomic beam, two lasers for forming an optical standing wave at a part of a space in which the atomic beam is propagated, an electro-optic element for controlling the phases of the optical standing wave for controlling the propagation direction of the atomic beam, an electro-optic element drive device for controlling a voltage applied to the electro-optic element to control a refraction index of the electro-optic element, and a control device for controlling the electro-optic element drive device.

Abstract: A method of adhesion inhibiting generation of bubbles is provided. Heating, evacuation and centrifugal degassing are performed on an adhesive 37 disposed in an adhesive container 30 to semi-harden the adhesive 37, then a semi-hardened adhesive is discharged as disposed in the adhesive container 30 to mount a chip. Removal of bubbles is efficiently performed since semi-hardening and degassing are simultaneously performed. Further, no defective product is produced even if a working process is stopped since no process for semi-hardening a discharged adhesive exists.

Abstract: This invention pertains to transfer of a solid target material onto a substrate by vaporizing the material by irradiating it with intense light of a resonant vibrational mode of the material and depositing the vaporized material on a substrate in a solid form.

Abstract: This invention relates to antisoiling compositions for antireflective substrates. More particularly, this invention relates to methods for depositing antisoiling compositions onto antireflective substrates. In particular, this invention relates to a method of depositing an antisoiling composition on an antireflective substrate comprising vaporizing an antisoiling composition and depositing the antisoiling composition onto an antireflective substrate. In another aspect, this invention relates to method of preparing an antireflective film stack comprising depositing an antireflective layer onto the surface of a transparent substrate and vapor depositing an antisoiling layer onto the surface of the antireflective layer. In yet another aspect, this invention relates to a method of depositing an antisoiling composition on an antireflective coated ophthalmic lens comprising vaporizing an antisoiling composition and depositing the antisoiling composition onto an antireflective coated ophthalmic lens.

Abstract: A method includes forming an as-grown film of a superconductor composed of a MgB2 compound which is made by simultaneous evaporation of magnesium and boron. The as-grown film is superconductive without an annealing process to make the film superconductive. The method can be applied to fabricate an integrated circuit of the superconductor film, because a high temperature annealing process to make the as-grown film superconductive is not needed.

Abstract: A particle beam deposition apparatus includes a particle source for generating a plurality of particles in suspended form, an expansion chamber, and a deposition chamber connected to the expansion chamber by an aerodynamic focusing stage, and containing a substrate. The aerodynamic focusing stage may be comprised of a plurality of aerodynamic focusing elements, or lenses. Particles, including nanoparticles, may be deposited on the substrate by generating an aerosol cloud of particles, accelerating the particles into the expansion chamber, creating a collimated beam out of the particles by passing them through the aerodynamic focusing lenses and into a deposition chamber, and impacting the particles into the substrate.

Abstract: A method of making a tetrahedral amorphous carbon (ta-C) film comprises depositing carbon atoms over the surface of an object. The surface of the object is kept exposed to fluorine atoms during the deposition of the carbon atoms. The method allows the fluorine atoms to scatter within the deposited carbon atoms in the tetrahedral amorphous carbon film. The hardness of the tetrahedral amorphous carbon film can be improved in response to an increased content of sp3 carbon bonds included within the tetrahedral amorphous carbon film. In addition, the tetrahedral amorphous carbon film still provides a sufficient repellent performance to water due to the fluorine atoms existing near the exposed surface of the tetrahedral amorphous carbon film.

Abstract: Particles have an ultrathin, conformal coating are made using atomic layer deposition methods. The base particles include ceramic and metallic materials. The coatings can also be ceramic or metal materials that can be deposited in a binary reaction sequence. The coated particles are useful as fillers for electronic packaging applications, for making ceramic or cermet parts, as supported catalysts, as well as other applications.

Abstract: A solid structure includes a substrate and a layer located on a surface of the substrate. The layer includes crystalline or polycrystalline MgB2.

Abstract: A process for the preparation of organic material comprising an organic substrate and at least one dielectric layer consisting of one or more oxides of a metal selected from groups 3 to 15 of the periodic table, which comprises the steps of:

Abstract: Pulse-position synchronized deposition of a material in miniature structure manufacturing processes is carried out in a fabrication tool including a material carrier element, a source of energy generating pulses of energy, a substrate, and a control unit operatively coupled to the source of energy, substrate, and the material carrier element. The control unit exposes a first area of the material carrier element to a first pulse of energy, pauses the exposure while initiating relative motion between the source of energy and the substrate at a predetermined first speed and relative motion between the material carrier element and the energy source at a predetermined second speed which is a function of the first speed, and slowing (or stopping) relative motion between the energy source, material carrier element, and the substrate, while exposing the unablated area of the material carrier element adjacent to previously ablated area to a second pulse of energy.

Abstract: A dry cleaning process for removing native oxide at improved efficiency is disclosed. The dry cleaning process minimizes the amount of fluorine atoms absorbed on the surface of a processed substrate. Fluorine radicals are provided to the substrate together with hydrogen radicals. The substrate is processed by the reaction of the fluorine radicals and the hydrogen radicals.

Abstract: Porous organic articles having no surface functionality may be treated by remote plasma discharge to thereby introduce functionality to the surface of the article. The functionality is introduced throughout the article's surface, including the exterior surface and the surfaces of the pores. Little or no degradation of the porous organic article occurs as a result of the functionalization. Amino, hydroxyl, carbonyl and carboxyl groups may be introduced to the article. In this way, an essentially inert hydrophobic porous article, made from, for example, polyethylene, can have its surface modified so that the surface becomes hydrophilic. The remote plasma discharge process causes essentially no change in the bulk properties of the organic article. The remote plasma discharge process is preferably conducted so that no photons, and particularly no ultraviolet radiation, is transmitted from the plasma glow to the porous article.

Abstract: The invention provide a method for applying a coating to an ophthalmic lens or a mold for making the ophthalmic lens or a medical device other than ophthalmic lens. The method comprises spraying at least one layer of a coating liquid onto an ophthalmic lens using a spraying process selected from the group consisting of an air-assisted atomization and dispensing process, an ultrasonic-assisted atomization and dispensing process, a piezoelectric assisted atomization and dispensing process, an electro-mechanical jet printing process, a piezo-electric jet printing process, a piezo-electric with hydrostatic pressure jet printing process, and a thermal jet printing process. The coating can comprise a property/functionality pattern or a color image or combination of both.

Abstract: The invention relates to a process for producing a surface layer with embedded inter-metallic phases, which is distinguished by the fact that a layer comprising a metal and a ceramic is applied to a substrate element, that a reaction takes place between the metal and the ceramic of the layer as a result of energy being introduced during the application of the layer or as a result of a subsequent introduction of energy, and as a result the surface layer is produced, with inter-metallic phases being formed.

Abstract: A process for forming a thin metal oxide film is disclosed that comprises molding an amorphous powder of organic metal chelate complexes to obtain a target. The process also includes subjecting the target to a PVD process that forms the thin metal oxide.

Abstract: A method and apparatus for delivering precursors to a chemical vapor deposition or atomic layer deposition chamber is provided. The apparatus includes a temperature-controlled vessel containing a precursor. An energy source is used to vaporize the precursor at its surface such that substantially no thermal decomposition of the remaining precursor occurs. The energy source may include a carrier gas, a radio frequency coupling device, or an infrared irradiation source. After the precursor is exposed to the energy source, the vaporized portion of the precursor is transported via a temperature-controlled conduit to a chemical vapor deposition or atomic deposition chamber for further processing.

Abstract: The present invention is a method and apparatus for the synthesis of multi-component substances, comprising entities of at least two elements, molecules, grains, crystals, structural units, or phases of matter, in which the scale of the distribution of the elements, molecules, or phases of matter may range from on the order of nanometers or less, to about one millimeter, depending upon the specific materials and process conditions that are chosen. The method and apparatus of the present invention further provides processes for preparing these compositions of matter as thin films or particles.

Abstract: A method of applying a varnish, whether or not it includes a solvent, on a component, in particular a vehicle headlight reflector, comprises the following steps: (i) selecting a varnish having a viscosity at ambient temperature of about 500 to 2000 mPa.s, and a viscosity at the application temperature which is lower than about 200 mPa.s, with a viscosity which is substantially independent of variation in the temperature within the range of application; (ii) heating the surface of the component before the step of moistening the varnish at a selected temperature &thgr;p1; (iii) heating the varnish at the moment of application to a selected temperature &thgr;v; and (iv) during the spreading step, maintaining the component at a selected temperature &thgr;p2 for a selected time tp2.

Abstract: In order to prevent the contamination of wafers made of a transition metal in a semiconductor mass production process, the mass production method of a semiconductor integrated circuit device of the invention comprises the steps of depositing an Ru film on individual wafers passing through a wafer process, removing the Ru film from outer edge portions of a device side and a back side of individual wafers, on which said Ru film has been deposited, by means of an aqueous solution containing orthoperiodic acid and nitric acid, and subjecting said individual wafers, from which said Ru film has been removed, to a lithographic step, an inspection step or a thermal treating step that is in common use relation with a plurality of wafers belonging to lower layer steps (an initial element formation step and a wiring step prior to the formation of a gate insulating film).

Abstract: Devices and methods for fabricating medical devices are disclosed. A device in accordance with the present inventions includes a laser beam source capable of producing a laser beam, a carrier coupled to a carrier motion actuator capable of moving the carrier relative to the laser beam, and a workpiece motion actuator capable of moving a workpiece relative the laser beam. A method in accordance with the present invention includes the steps of positioning the carrier between the laser beam source and the workpiece, illuminating a portion of the carrier with the laser beam, moving the carrier relative to the laser beam, and moving the workpiece relative to the laser beam.

Abstract: Particles have an ultrathin, conformal coating are made using atomic layer deposition methods. The base particles include ceramic and metallic materials. The coatings can also be ceramic or metal materials that can be deposited in a binary reaction sequence. The coated particles are useful as fillers for electronic packaging applications, for making ceramic or cermet parts, as supported catalysts, as well as other applications.

Abstract: A process for irradiating material in web form by means of electron beams and/or UV rays, wherein the material is applied to a transport means, the material on the transport means is guided through a first irradiation in which the material is irradiated on the open side, the material is transferred from the transport means to a substrate, and the material on the substrate is guided through a second irradiation in which the material is irradiated on the second, hitherto unirradiated, open side.

Abstract: A method for forming a pattern on a surface of a panel substrate, includes electrically charging pattern-forming material particles, jetting out the electrically charged pattern-forming material particles through a nozzle by applying electrostatic force to the pattern-forming material particles to form a pattern, and fixing the pattern onto the panel substrate.

Abstract: A method of vertically aligning pure carbon nanotubes on a large glass or silicon substrate at a low temperature using a low pressure DC thermal chemical vapor deposition method is provided. In this method, catalytic decomposition with respect to hydro-carbon gases is performed in two steps. Basically, an existing thermal chemical vapor deposition method using hydro-carbon gases such as acetylene, ethylene, methane or propane is used. To be more specific, the hydro-carbon gases are primarily decomposed at a low temperature of 400-500° C. by passing the hydro-carbon gases through a mesh-structure catalyst which is made of Ni, Fe, Co, Y, Pd, Pt, Au or an alloy of two or more of these materials.

Abstract: A method of producing a coating of solvent-free pressure-sensitive adhesive systems on substrates, especially release-coated substrates, in which a fluid film is applied to a rotating roller by means of a fluid applicator, the pressure-sensitive adhesive system is applied in one or more layers to the fluid film by means of an adhesive applicator, and the roller is contacted with the substrate, so that the pressure-sensitive adhesive system is transferred from the roller to the substrate.

Abstract: A method for treating substrates including the steps of: providing a substrate; exposing said substrate to a plasma glow discharge in the presence of a fluorocarbon gas; maintaining said gas at a pressure between about 50 mTorr and about 400 mTorr; generating said plasma as a modulated glow discharge; pulsing said discharge at an on time of 1-500 milliseconds; pulsing said glow at an off time of 1-1000 milliseconds; maintaining said plasma glow discharge at a power density of 0.02-10 watts/cm2; and applying a hydrophobic coating to said substrate.

Abstract: A method of modifying a surface of an ophthalmic lens, includes the steps of: generating plasma at an atmospheric pressure between electrodes of a plasma generating device; and blowing the plasma from the plasma generating device by introducing a gas between the electrodes. The ophthalmic lens, which is located outside the plasma generating device, is irradiated with the plasma blown out from the plasma generating device to modify the surface of the ophthalmic lens to form a final ophthalmic lens product.

Abstract: A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.

Abstract: A method of depositing nano-particles in a gas stream for efficiently depositing nano-particles by irradiating an electron beam on charged nano-particles in the stream of a first gas species containing the nano-particles, as well as a method of modifying the surface of the nano-particles in a gas stream by mixing them with the first gas species in a gas mixing chamber thereby activating the second gas species, intended for providing a method of depositing nano-particles and a method of modifying the surface thereof in a gas stream, capable of efficiently depositing the nano-particles in a charged state in a gas stream and modifying the surface of the nano-particles which are extremely sensitive to defects and impurities caused by large exposure ratio of surface atoms in a gas stream at a good controllability.

Abstract: Methods and apparatuses are disclosed which allow uniform coatings to be applied by pulsed laser deposition (PLD) on inner and outer surfaces of cylindrical objects, such as rods, pipes, tubes, and wires. The use of PLD makes this technique particularly suitable for complex multicomponent materials, such as superconducting ceramics. Rigid objects of any length, i.e., pipes up to a few meters, and with diameters from less than 1 centimeter to over 10 centimeters can be coated using this technique. Further, deposition is effected simultaneously onto an annular region of the pipe wall. This particular arrangement simplifies the apparatus, reduces film uniformity control difficulties, and can result in faster operation cycles. In addition, flexible wires of any length can be continuously coated using the disclosed invention.

Abstract: The invention relates to a method for electrically controlling a flow of material, wherein a single- or multi-component, essentially polymer-based material (1), such as plastics, elastomer or the like, is charged electrically (I) and sprayed (II) in an electrical field (E) to a three-dimensional mould (2)/target (3). The method of the invention makes use of the mould (2)/target (3) set at an electric potential and provided with two or more treatment blocks (Li) to be set at voltage levels different from each other, especially for coordinating the courses of sprayed material particles and the electrical field (E) affecting the same, in such a manner that each section/area of the mould/target surface forms a material layer of desirable thickness in the spraying cycle (II). The invention relates also to an apparatus operating in accordance with the method.

Abstract: Nanocomposite thin films with low dielectric constants are made by the simultaneous deposition of an oxide dielectric and an organic polymer at near room temperatures. Suitable oxides include SiO2, and suitable organic polymers include poly(chloro-para-xylylene). The two dielectric materials, when deposited, form nanocomposites characterized by nanometer-sized domains of dielectric material. The nanocomposite thin films of this invention are useful as dielectric layers for interlevel dielectric (ILD) and intermetal dielectric (IMD) dielectrics in the manufacture of semiconductor devices as well as for thin films for flat panel displays, food wraps, hybrid ceramics, glass, hard disk drives, and optical disk drives. Additionally, the invention comprises semiconductor devices and semiconductor chips made incorporating nanocomposites deposited by chemical vapor deposition.

Abstract: A method of forming an oriented film. A target is provided and material from the target is ablated onto a substrate to form a film. The film is heated in a synthesis gel of the target material to orient the film.

Abstract: A method for producing a nano-porous coating onto a substrate, including the steps of: (a) operating a twin-wire arc nozzle to heat and at least partially vaporize two wires of a metal for providing a stream of nanometer-sized vapor clusters of the metal into a chamber in which the substrate is disposed; (b) injecting a stream of reactive gas into the chamber to impinge upon the stream of metal vapor clusters and exothermically react therewith to produce substantially nanometer-sized metal compound or ceramic clusters; (c) operating heat treatment devices to heat treat the metal compound or ceramic clusters so that a non-zero proportion of the clusters is in a solid state when impinging upon the substrate; and (d) directing the metal compound or ceramic clusters to impinge and deposit onto the substrate for forming the nano-porous coating.

Abstract: Devices and methods for fabricating medical devices are disclosed. A device in accordance with the present inventions includes a laser beam source capable of producing a laser beam, a carrier coupled to a carrier motion actuator capable of moving the carrier relative to the laser beam, and a workpiece motion actuator capable of moving a workpiece relative the laser beam. A method in accordance with the present invention includes the steps of positioning the carrier between the laser beam source and the workpiece, illuminating a portion of the carrier with the laser beam, moving the carrier relative to the laser beam, and moving the workpiece relative to the laser beam.

Abstract: A method of coating a substrate with an oriented film. A target is ablated to create a plume. The substrate is manipulated, which may be by vibration, in the plume to coat the substrate with a film. The film is heated in a synthesis gel of the target to form the oriented film.

Abstract: The present invention relates to an enhanced non-sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive films. This is accomplished by 1) providing a non-thermal or non-pyrolytic means of triggering the deposition reaction; 2) providing a means of depositing a purer film of higher density at lower temperatures; and, 3) providing a faster and more efficient means of modulating the deposition sequence and hence the overall process rate resulting in an improved deposition method.

Abstract: The present invention relates to a method for carrying out a magnesium oxide based deposition on the dielectric surface of a glass plate of a display panel. The method includes the creation of a mist from a metalorganic compound of magnesium dissolved in a solvent, the conveying of the mist to the dielectric surface of the plate, the evaporation the solvent when approaching the dielectric surface of the plate which is taken to a temperature of about 380° to 430°, and the pyrolysis of the metalorganic compound leading to the magnesium oxide based deposit on the surface of the plate and the evaporation of the organic radical of the compound, this deposit being practically waterproof. The method is especially useful in the manufacture of plasma panels.

Abstract: An improved chemical vapor deposition apparatus and procedure is disclosed. The technique provides improved shielding of the reaction and deposition zones involved in providing CVD coatings, whereby coatings can be produced, at atmospheric pressure, of materials which are sensitive to components in the atmosphere on substrates which are sensitive to high temperatures and which are too large, or inconvenient, to process in vacuum or similar chambers. The improved technique can be used with various energy sources and is particularly compatible with Combustion Chemical Vapor Deposition (CCVD) techniques.

Abstract: A method for making an otical recording medium comprises providing a substrate which is encoded with information in the form of pits and/or a continuous groove beforehand at least on one side thereof, spraying a solution or dispersion of a film-forming material containing at least one organic compound having optical functionality in the form of a mist onto the encoded side of the substrate in a vacuum chamber under conditions sufficient to permit a thin film to be formed thereon in a substantially solvent-free condition, and drying the thin film. An optical recording medium obtained by the method is also described.

Abstract: The invention relates to a component having a substrate and a ceramic heat-insulating layer which is arranged thereon. This heat-insulating layer has a columnar structure having ceramic stems which are essentially oriented mainly normal to the surface of the substrate and have a respective stem diameter of less than 2.5 &mgr;m. The invention also relates to a coating apparatus for producing a heat-insulating layer on a substrate and to a method of coating a substrate in the manner of a reactive gas-flow sputtering method.

Abstract: The present invention relates to a method of producing at cast one coating film on at least one area of a substrate surface, which comprises at least the following steps in the following order: a) initiating at least one crosslinking reaction in at least one reactive coating formulation; b) applying said at least one reactive coating formulation before the onset of said at least one crosslinking reaction on said at least one area of said substrate surface.

Abstract: To provide a plating method, which enables wide industrial use of the redox system electroless plating method having excellent characteristics, and a plating bath precursor which is preferable for the plating method. The plating method comprises a process oxidizing first metal ions of a redox system of a plating bath from a lower oxidation state to a high oxidation state, and second metal ions of said redox system are reduced and deposited onto the surface of an object to be plated, wherein a process is provided in which by supplying the electrical current to the plating bath, the first metal ions are reduced from said lower oxidation state to thereby activate the plating bath. The plating bath precursor is formed stabilizing the plating bath so that reduction and deposition of the second metal ions substantially do not occur in order to improve its storing performance.