Abstract: The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.

Abstract: A fluorocopolymer and film thereof exhibiting excellent transparency and mechanical strength at ambient and elevated temperatures, wherein the fluorocopolymer includes polymerized units based on ethylene (E), tetrafluoroethylene (TFE), hexafluoropropylene (HFP) and perfluoro(alkyl vinyl ether) (PFAV), wherein the molar ratio of polymerized units based on E/TFE is from 10/90 to 60/40, the content of polymerized units based on HFP is from 0.2 to 0.9 mol % based on the total number of polymerized units, and the content of polymerized units based on PFAV is from 0.1 to 1.0 mol % based on the total number of polymerized units.

Abstract: The present invention provides copolymer having repeating units based on polyoxyalkylene radicals, polysiloxane radicals and perfluorocyclobutane radicals. The copolymers are useful as biomedical devices such as contact lenses or intraocular lenses.

Abstract: The invention relates to a fluorine-containing allyl ether compound represented by the formula 1, wherein R represents an organic group containing at least one fluorine atom and an alicyclic structure. The invention further relates to a fluorine-containing copolymer containing a first unit derived from the fluorine-containing allyl ether represented by the formula 1; and a second unit derived from a vinyl monomer.

Abstract: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

Abstract: A proton conducting polymer includes a polymer backbone and a heterocyclic compound attached to the polymer backbone. The heterocyclic compound includes a sulfonyl functionality bonded to heterocyclic compound.

Abstract: A novel emulsion polymerization process for the production of fluoroelastomers is disclosed wherein the dispersing agent is a phosphate ester anionic surfactant of the formula [CH3—(CH2)n—O]x—P(OM)(4?x) where n is an integer from 0 to 8, or mixtures thereof, x is an integer from 1 to 3 and M is a cation having a valence of 1.

Abstract: The present invention provides a fluororubber molded article having a fluorinated surface, wherein the fluorinated surface has a ratio of the number of oxygen atoms to the number of fluorine atoms of 0.11 or less, and a ratio of the number of C—H bonds to the number of C—F2 bonds is 1.0 or less, and wherein the fluororubber molded article shows a leak amount 3 minutes after initiation of a helium leak test of 1.0×10?12 Pa·m3/sec or less.

Abstract: A resist material has a base polymer containing a compound including a copolymer of a first unit represented by a general formula of the following Chemical Formula 1 and a second unit represented by a general formula of the following Chemical Formula 2: wherein R1, R2, R3, R7, and R8 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and R9 is a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group

Abstract: The present invention relates to a monomer with anti-microbial characteristics, a polymeric compound with anti-microbial characteristics using the same, and manufacturing methods thereof, and more particularly, to an antimicrobial monomer comprising a saturated hydrocarbon having a polymerizable functional group within its structure. Also, the present invention provides a polymeric compound using the above antimicrobial monomer, a manufacturing method thereof, and a polymeric resin composition. The compounds according to the present invention have durable antimicrobial activity and high heat resistance, they do not give rise to toxicity when added to conventional resins by not eluting the antimicrobial compounds, and they do not have an effect on the properties of molded products.

Abstract: A fluorocopolymer film formed by molding at a molding temperature of at most 320° C. a fluorocopolymer comprising repeating units based on ethylene, repeating units based on tetrafluoroethylene, repeating units based on hexafluoropropylene and repeating units based on a fluoroalkyl vinyl ether represented by CF2?CFORf (wherein Rf represents a C1-10 fluoroalkyl group), having a molar ratio of the repeating units based on ethylene/the repeating units based on tetrafluoroethylene of from 10/90 to 60/40, a content of the repeating units based on hexafluoropropylene to the total repeating units of from 0.1 to 20 mol % and a content of the fluoroalkyl vinyl ether to the total repeating units of from 0.1 to 10 mol %, and having a volumetric flow rate of from 0.1 to 30 mm3/sec at 297° C.

Abstract: A heat sealable tape of a copolymer of tetrafluoroethylene and at least about 15% by weight of a highly fluorinated monomer. The copolymer has a melt viscosity of no greater than about 1000 Pa·S at 372° C. and an application temperature of no greater than about 250° C. The invention further provides for a seam formed from two sections of sheet material, especially fabric, wherein each sheet has at least one fluoropolymer surface. The sections are sealed one to the other by application of heat sealable composition over one fluoropolymer surface of each section. The heat sealable composition comprises a copolymer of tetrafluoroethylene and at least about 15% by weight of a highly fluorinated monomer, the copolymer having a melt viscosity of no greater than about 1000 Pa·S at 372° C. and an application temperature of no greater than about 250° C.

Abstract: The present invention relates to a method for producing a fluorocopolymer which comprises a polymerization reaction of a fluorine-containing ethylenic monomer with a fluorovinyl ether derivative represented by the following general formula (I): CF2?CF—O—[CF2CF(CF3)O]n—(CF2)m-A??(I) (wherein n represents an integer of 0 to 3, m represents an integer of 1 to 5, and A represents —SO2X or —COOY; X represents a halogen atom or —NR1R2; R1 and R2 are the same or different and each represents a hydrogen atom, an alkali metal, an alkyl group or a sulfonyl-containing group and Y represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms) to give a fluorocopolymer, said fluorine-containing ethylenic monomer being a perhaloethylenic monomer represented by the following general formula (II): CF2?CF—Rf1??(II) (wherein Rf1 represents a fluorine atom, a chlorine atom, Rf2 or ORf2; Rf2 represents a straight or branched perfluoroalkyl group having 1 to 9 carbon atoms, which may have an ether oxygen atom(s)) a

Abstract: Ethylene and allyl- or vinylsilanes are efficiently copolymerized by certain late transition metal complexes containing selected bidentate or tridentate ligands. The resulting novel polymers may be crosslinked by moisture when vinylsilane contains groups bound to silicon which are hydrolyzable. The polymers are useful for wire coating, crosslinked foams, pipes, and other uses.

Abstract: A composition comprises a copolymer comprising repeating units derived from at least one co-reactant comprising two or more acrylate groups and repeating units derived from a fluoroacrylate comprising the reaction product of: (a) at least one fluorochemical alcohol represented by the formula: C4F9—X—OH wherein: R=hydrogen or an alkyl group of 1 to 4 carbon atoms, m=2 to 8, Rf=CnF2n+1, n=1 to 5, y 32 0 to 6, and q=1 to 8; (b) at least one unbranched symmetric diisocyanate; and (c) at least one hydroxy-terminated alkyl (meth)acrylate or 2-fluoroacrylate monomer having 2 to about 30 carbon atoms in its alkylene portion; wherein the composition is coatable.

Abstract: The present invention provides an aqueous non-melt processible polytetrafluoroethylene dispersion comprising non-melt processible polytetrafluoroethylene particles in an amount between 30 and 70% by weight based on the total weight of the dispersion and one or more non-ionic surfactants and wherein at least a part of said non-melt processible polytetrafluoroethylene particles comprise polytetrafluoroethylene polymer chains having repeating units comprising ionic groups. The invention further provides a method for obtaining the dispersions.

Abstract: The present invention relates to photoresist polymers and photoresist compositions. The disclosed photoresist polymers and photoresist compositions containing the same have excellent transmittance, etching resistance, thermal resistance and adhesive property, low light absorbance and high affinity to a developing solution at a wavelength of 193 nm and 157 nm, thereby improving LER (line edge roughness).

Abstract: An ethylenically unsaturated group-containing fluoropolymer, which is obtained by reacting a compound containing one isocyanate group and at least one ethylenically unsaturated group, and a hydroxyl group-containing fluoropolymer at an isocyanate group/hydroxyl group molar ratio of 1.1 to 1.9. According to the present invention, an ethylenically unsaturated group-containing fluoropolymer having superior antiscratching property, coating property and durability, as well as a curable resin composition and an antireflection film using the same can be provided.

Abstract: The present invention is fluorine-containing ethylene copolymer composition and a process of preparing same. The ethylene copolymers of the present invention are melt processible fluorinated copolymers having surface energies of less than about 25 dynes/cm.

Abstract: A non-linear optical device composition includes a trifluorovinyl group containing poly(meth)acrylate that is crosslinkable and thermally stable after crosslinking. The poly(meth)acrylate composition may provide passive or active wave-guide optical capabilities. The composition may be used for an active wave guide material, such as modulator or switching device compositions. Furthermore, the composition may include a trifluorovinyl containing chromophore and poly(meth)acrylate which provides non-linear optical ability in the matrix polymer system.

Abstract: Provided is a method of manufacturing a perhalogenated elastomer comprising using an onium compound to coagulate a latex comprising polymer particles, the polymer particles consisting essentially of interpolymerized units of one or more perhalogenated comonomer(s) and at least one cure site monomer, wherein the coagulation is performed essentially free of metal ions and metal salts. Also provided is an elastomeric composition comprising a curable perhalogenated elastomer comprising interpolymerized units derived from a nitrogen-containing cure site monomer and coagulated with an onium compound, wherein the elastomer is capable of curing without adding further components and wherein the composition is essentially free of metal ions and metal salts. Also provided are fluoropolymer articles and methods of making fluoropolymer compositions and articles.

Abstract: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

Abstract: The invention relates to photochromic monomers based on benzothiophenes and a method for preparing them, and to photochromic polymers-polyazomethines that are reversibly photocontrollable due to the introduction of photochromic fragments from the class of dihetarylethenes into their structure. The invention provides photochromic photocontrollable polymers for the creation of new information technologies.

Abstract: An aqueous non-melt processible polytetrafluoroethylene dispersion having non-melt processible polytetrafluoroethylene particles in an amount of 30 to 70% by weight and an amount of non-ionic surfactant between 2 and 15% by weight based on the weight of polytetrafluoroethylene solids. The dispersion is free of fluorinated surfactant or contains fluorinated surfactant in amounts of not more than 200 ppm based on the amount of polytetrafluoroethylene solids. At least part of the non-melt processible polytetrafluoroethylene particles comprise an effective amount of ionic end groups in the polytetrafluoroethylene polymer chains.

Abstract: A copolymer comprises repeating units derived from at least one co-reactant comprising two or more mercapto functional groups, and repeating units derived from a fluoroacrylate comprising the reaction product of: (a) at least one fluorochemical alcohol represented by the formula: C4F9—X—OH wherein: R=hydrogen or an alkyl group of 1 to 4 carbon atoms, m=2 to 8, Rf=CnF2n+1, n=1 to 5, y=0 to 6, and q=1 to 8; (b) at least one unbranched symmetric diisocyanate; and (c) at least one hydroxy-terminated alkyl (meth)acrylate or 2-fluoroacrylate monomer having 2 to about 30 carbon atoms in its alkylene portion.

Abstract: A coating composition containing a film-forming organosilane polymer, optionally a non-aqueous dispersed polymer, and a crosslinking agent selected from one or both of an organic polyisocyanate and melamine crosslinker. Fluorine functionalities are incorporated in the organosilane polymer to enhance soil resistance and cleanability. The coating composition can be used as a clearcoat over a conventional pigmented basecoat. The coating composition provides improved soil resistance and cleanability.

Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 ?/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.

Abstract: Novel ester compounds having a sulfonamide structure are polymerizable into polymers having improved transparency at wavelength of up to 300 nm, especially ArF excimer laser light, and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

Abstract: The invention relates to a fluorine-containing compound containing a substituent represented by the formula 1: where R1 is (a) a straight-chain alkylene group, (b) a branched alkylene group, (c) a cyclic structure containing an aromatic ring group or aliphatic cyclic group, or (d) a substituent containing an aromatic ring group and an aliphatic cyclic group, and R1 optionally contains fluorine, another halogen, CN, oxygen, nitrogen, silicon, or alcohol, and R2 is a hydrogen atom, a straight-chain or branched alkyl group, an aromatic group, or a hydrocarbon group optionally containing an aliphatic cyclic group, and R2 optionally contains fluorine, oxygen, nitrogen, carbonyl bond, or alcohol, and a plural number of R2 having different structures are optionally contained in the molecule.

Abstract: Melt-processible, thermoplastic poly(tetrafluoroethylene) (PTFE) compositions are disclosed and methods for making and processing same. Additionally, products comprising these compositions are described.

Abstract: A fluorosulfonyl group-containing compound having a high polymerization reactivity, a process for its production, a sulfonyl group-containing polymerizable monomer led from the sulfonyl group-containing compound, and a polymer obtainable by polymerizing the sulfonyl group-containing polymerizable monomer

Abstract: Ionic perfluorovinyl compounds and their uses as components of ionic conductors of the polymer type, of selective membranes or of catalysts. The compounds comprise at least one perfluorovinyl group and at least one group chosen from —O or one of the groups C?N, —C(C?N)2, —NSO2R or —C[SO2R]2 or a pentacyclic group comprising at least one N, C—C?N, CR, CCOR or CSO2R group. The compounds and/or their polymers are of use in the preparation of ionically conducting materials, electrolytes and selective membranes.

Abstract: A fluorochemical compound comprises the reaction product of: (a) the reaction product of: (i) at least one fluorochemical alcohol represented by the formula: CnF2n+1—X—OH wherein: n=1 to 6, R=hydrogen or an alkyl group of 1 to 4 carbon atoms, m=2 to 8, Rf=CnF2n+1, y=0 to 6, q=1 to 8; and (ii) at least one unbranched symmetric diisocyanate, and (b) at least one co-reactant comprising two or more functional groups that are capable of reacting with an isocyanate group.

Abstract: A crosslinkable second-order nonlinear optical polymer having one or more polarizable chromophore moieties, one or more diene moieties, and one or more dienophile or dienophile precursor moieties, wherein the diene and dienophile moieties are reactive to form 4+2 cycloaddition products; a crosslinked second-order nonlinear optical polymer having aligned, polarizable chromophore moieties and one or more 4+2 cycloaddition moieties, wherein the 4+2 cycloaddition moieties are reversibly, thermally reactive to provide diene moieties and dienophile moieties; lattices and devices that include the crosslinkable second-order nonlinear optical polymer; lattices and devices that include the crosslinked second-order nonlinear optical polymer; and methods for making the crosslinked second-order nonlinear optical polymer.

Abstract: Telechelic polymers having two reactive functional groups at the same polymer chain end are disclosed. These polymers can be prepared by combining a cycloborane initiator, at least one free radical polymerizable monomer and oxygen to form a polymer segment having a borane residue at one end of the polymer segment resulting from the cycloborane initiator; and converting the borane residue to at least two functional groups to form the telechelic polymer.

Abstract: The use of perfluorinated polymers and/or fluorinated ionomers as surfactant emulsifiers in emulsion polymerization of fluorinated monomers.

Abstract: To provide a curable composition which gives a cured fluorinated product excellent in transparency, light resistance (particularly against a short wavelength light having a wavelength of from 200 to 500 nm) and heat resistance, and having a controlled volume particularly thickness. A curable composition which contains a perfluorocyclic polyene having alicyclic structures which comprise carbon atoms and which may contain an oxygen atom and having at least two carbon-carbon double bonds, at least one of which is a polymerizable carbon-carbon double bond in which at least one of the two carbon atoms forming the polymerizable carbon-carbon double bond is a carbon atom forming the alicyclic structure, and a polymerization initiator; a cured fluorinated product obtained by curing the curable composition; an optical material made of the cured fluorinated product; and a light emitting device encapsulated with the cured fluorinated product in a light-transmitting manner.

Abstract: Use of non-water-soluble organic fluorinated compounds, which are gaseous under the polymerization conditions and act as chain transfer agent in the gas phase, as explosion suppressors in the emulsion polymerization of tetrafluoroethylene.

Abstract: In one aspect, the invention provides a water-based release coating composition comprising a mixture of (A.) from about 5 to about 100 wt % of a polymer comprising the reaction product of (a.) from 1 to about 15 wt % of a fluorinated monomer selected from the group consisting of monomers according to the general formula: RfX—OC(O)—C(R)?CH2, wherein Rf represents a perfluorinated aliphatic group having 3 or 4 carbon atoms, X is an organic divalent linking group, and R represents a hydrogen or methyl group, (b.) from about 40 to about 70 wt % of an alkyl (meth)acrylate, wherein the alkyl group contains from 16 to 22 carbon atoms, (c.) from about 3 to about 20 wt % of (meth)acrylic acid, (d.) from about 20 to about 40 wt % acrylonitrile, and (e.) from 0 to about 15 wt % of vinyl monomer, other than acrylonitrile, wherein the sum of (a.) through (e.) equals 100%; and (B.) from 0 to about 95 wt % of an extender polymer, wherein the sum of (A.) and (B.

Abstract: Melt-fabricable, tough copolymer of tetrafluoroethylene and fluorinated vinyl ether is produced in a suspension polymerization process by copolymerizing tetrafluoroethylene and fluorinated vinyl ether in a pressurized, agitated reaction vessel which contains aqueous medium, free radical initiator, and a telogen, the aqueous medium being essentially free of fluorine containing organic solvent. The contents of the reaction vessel are agitated during polymerization sufficiently to coagulate copolymer of tetrafluoroethylene and fluorinated vinyl ether. The melt-fabricable, tough copolymer having a melt viscosity of less than about 1×106 Pa·S is isolated directly from the reaction vessel.

Abstract: Biocompatible polymers useful for making anterior chamber intraocular lenses (AC-IOL) are provided. The biocompatible polymers are generally composed of one or more acrylate monomers, crosslinked with at least one diacrylate ester and may include one or more additional components such as ultraviolet light and/or blue-violet light absorbing dyes. The AC-IOLs made using the biocompatible polymers disclosed herein are suitable for placement in phakic or aphakic eyes and are intended for refractive correction including myopia, hyperopia, presbyopia and astigmatisms.

Abstract: The present invention provides a fluorinated compound having functional groups in a high concentration so that adequate characteristics of the functional groups can be obtained and having high transparency in a wide wavelength region, a fluoropolymer, and a process for its production. The present invention provides a fluorinated diene represented by the following formula (1): CF2?CFCH2CH(C(R1)(R2)(OH))CH2CH?CH2??(1) wherein each of R1 and R2 which are independent of each other, is a fluorine atom or a fluoroalkyl group having at most 5 carbon atoms.

Abstract: Functional fluoro-monomers are polymerized with an organoborane functional initiator in the presence of oxygen to yield functional fluoropolymers and copolymers to produce functional polymers having functional groups at the beginning of the polymer chain.

Abstract: The present invention provides an ambient temperature curable fluoroelastomer coatings and coated articles to provide improved elongation, and adhesion to substrates especially flexible elastomeric substrates. The curable coating mixture is a mixture of two parts, part A containing a solution of a fluoroelastomer containing a specified acid number, and the other part B providing a curing component which is a mono-primary amine containing silane or condensate.

Abstract: A solid polymer electrolyte material made of a copolymer comprising a repeating unit based on a fluoromonomer A which gives a polymer having an alicyclic structure in its main chain by radical polymerization, and a repeating unit based on a fluoromonomer B of the following formula (1): CF2?CF(Rf)jSO2X??(1) wherein j is 0 or 1, X is a fluorine atom, a chlorine atom or OM {wherein M is a hydrogen atom, an alkali metal atom or a group of NR1R2R3R4 (wherein each of R1, R2, R3 and R4 which may be the same or different, is a hydrogen atom or a monovalent organic group)}, and Rf is a C1-20 polyfluoroalkylene group having a straight chain or branched structure which may contain ether oxygen atoms.

Abstract: An optical waveguide based on a photochromic diarylethene polymer dispersed in a polymeric matrix, and a method for preparing such waveguide is disclosed.

Abstract: There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): and the formula (14): respectively, wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, Cl or CF3; Rf1 and Rf2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, a fluorine-containing polymer having a structural unit of the above-mentioned monomer and a composition for a photoresist. The monomer has good polymerizability, particularly radical polymerizability, and the polymer obtained by polymerizing the monomer has excellent optical characteristics and is useful as a base polymer for an antireflection film and for a composition for a resist.

Abstract: The present invention provides a polyvinylidene fluoride copolymer capable of forming a uniform film, a solution of the copolymer and a thin film comprising the polyvinylidene fluoride copolymer. The polyvinylidene fluoride copolymer of the present invention is characterized in that the ratio of the scattered-light intensity (I) for a 15% solution of the polyvinylidene fluoride copolymer in dimethylformamide solvent to the scattered-light intensity (I0) for dimethylformamide, (I/I0), is 10 or lower. The polyvinylidene fluoride copolymer solution comprises the polyvinylidene fluoride copolymer and an organic solvent capable of dissolving the copolymer.

Abstract: A fluorocopolymer which comprises (a) polymerized units based on tetrafluoroethylene and/or chlorotrifluoroethylene, (b) polymerized units based on a fluorinated monomer (excluding tetrafluoroethylene and chlorotrifluoroethylene) and (c) polymerized units based on at least one member selected from the group consisting of itaconic acid, itaconic anhydride, citraconic acid and citraconic anhydride, wherein (a) is from 50 to 99.8 mol %, (b) is from 0.1 to 49.99 mol %, and (c) is from 0.01 to 5 mol %, based on ((a)+(b)+(c)), and which has a volume flow rate of from 0.1 to 1000 mm3/sec.

Abstract: An alkenyl- or crosslinkable silyl-terminated vinyl polymer is provided. Such a functional group is introduced into its terminus at a high ratio, not via sulfur atoms. Those polymers can be prepared by polymerizing a vinyl monomer for obtaining a halogen-terminated vinyl polymer, and then substituting an oxy anion or carbanion having such a functional group for the terminal halogen of said polymer.