Abstract: The invention provides a fluoropolymer composition capable of improving the characteristics of the cured material obtained therefrom. A fluoropolymer composition comprising a methylene group-containing fluoropolymer (A) and a hydrosilylation catalyst (B), wherein the methylene group-containing fluoropolymer (A) has methylene group-containing repeating units in the main chain thereof and is capable of hydrosilylation in the presence of the hydrosilylation catalyst (B) and one terminus of the chain is a carbon-carbon double bond or an Si—H group and the other terminus of the chain is an Si—H group or a carbon-carbon double bond.

Abstract: Blends of fluorinated ionomer with at least two nonionomeric fluoropolymers provide fuel cell membranes whose tensile strength and conductivity are superior to blends using a single fluoropolymer.

Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2?CFCH2CH-Q-CH2CH?CH2??(1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.

Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and a refractive index value n of less than 1.5 with respect to a radiation wavelength of 193 nm have been found which are especially useful as top antireflective coatings in 193 nm dry lithographic processes. Polymers with an ethylenic backbone and having fluorine and sulfonic acid moieties have been found to be especially useful. The compositions enable top reflection control at 193 nm while providing ease of use by virtue of their solubility in aqueous alkaline developer solutions.

Abstract: Polymerization products formed from a monomeric mixture comprising (a) one or more first monomers of the general formula I: A-L-R1—(X—CF?CF2)n??(I) wherein R1 represents one or more inertly substituted groups; X is independently a group which links the inertly substituted groups and the trifluorovinyl group; L is an optional linking group; A is CO2Z, SO2Z, PO3Z, or OPO3Z wherein Z is hydrogen or an alkali metal and n is an integer of 1 to about 1000; (b) one or more second crosslinking monomers comprising at least three trifluorovinyl groups and (c) one or more prepolymers comprising one or more trifluorovinyl groups are provided. Also provided are biomedical devices formed from such polymerization products.

Abstract: The present invention relates to novel polymerizable compounds, to processes and intermediates for the preparation thereof, and to the use thereof for optical, electro-optical and electronic purposes, in particular in liquid-crystal (LC) media and LC displays, especially in LC displays of the PS (polymer-stabilized) and PSA (polymer-sustained alignment) type.

Abstract: The present invention provides prepolymers based on poly(alkyl ethers) having terminal triflurovinyl aromatic containing groups and polymers produced from such polymers. The prepolymers and polymers are useful as biomedical devices such as contact lenses or intraocular lenses.

Abstract: Biomedical devices are provided herein which are formed from a polymerization product of a monomeric mixture comprising one or more monomers comprising one or more trifluorovinyl groups, e.g., a perfluorocyclobutane containing polymer.

Abstract: The present invention relates to a novel compound with a fluoroalkylsulfonium photoacid generating group and novel copolymers having superior solubility in organic solvents, which is prepared from radical polymerization of the novel compound with methacrylate monomers.

Abstract: Fluorovinyl ethers having the formula CFX?CXOCF2OR, wherein R is a C2-C6 linear, branched or C5-C6 cyclic (per) fluoroalkyl group, or a C2-C6 linear, branched (per)fluoro oxyalkyl group containing from one to three oxygen atoms; when R is fluoroalkyl or fluorooxyalkyl group as above defined, it can contain from 1 to 2 atoms, equal or different, selected from the following: H, Cl, Br, I; X?F, H; and homopolymers or polymers obtainable polymerizing said Fluorovinyl ethers with at least another polymerizable monomer.

Abstract: A polymerization process for producing a tetrafluoroethylene copolymer, and the copolymer produced thereby, are provided. The copolymer is of the dispersion/fine powder type and contains polymerized tetrafluoroethylene monomer units and co-polymerized higher homologous comonomer units having the formula (CnF(2n+1))CH?CH2, wherein 6?n<10, in which the primary particles are believed to have a core and shell structure and the polymerized comonomer units are present in an amount from 0.01 mol % to 0.3 mol %, based upon total copolymer composition. The copolymer has a raw dispersion primary particle size (RDPS) of less than 0.210 microns coupled with a standard specific gravity (SSG) of less than 2.143. Preferably the copolymer has comonomer units present in an amount from 0.05 mol % and 0.25 mol % and the RDPS is within the range between 0.178 microns and 0.200 microns, coupled with a SSG of less than 2.140.

Abstract: A process for producing a polyfluoroalkyl (meth)acrylate, which comprises isolating, from a reaction mixture containing a polyfluoroalkyl (meth)acrylate obtained by reacting a polyfluoroalkyl iodide of the formula CnF2n+1(CH2)mI (wherein n is an integer of from 2 to 7, and m is an integer of from 1 to 4) with a metal (meth)acrylate in tert-butanol, said polyfluoroalkyl (meth)acrylate by the following steps (1) to (3): (1) a step of taking out a crude liquid from the reaction mixture by solid-liquid separation; (2) a step of distilling the crude liquid to separate it into compound group A of compounds having a lower boiling point than the polyfluoroalkyl (meth)acrylate and compound group B of the polyfluoroalkyl (meth)acrylate and compounds having a higher boiling point than the polyfluoroalkyl (meth)acrylate; and (3) a step of distilling and purifying the polyfluoroalkyl (meth)acrylate from the compound group B in the presence of a polymerization inhibitor.

Abstract: A novel semi-batch emulsion polymerization process for the production of fluoroelastomers is disclosed wherein a hydrocarbon anionic surfactant is employed as the dispersing agent. The surfactant has the formula R-L-M wherein R is an alkyl group having between 6 and 17 carbon atoms, L is selected from the group consisting of ArSO3?, SO3?, SO4?, PO3? and COO? and M is a univalent cation. Preferred surfactants are sulfonates of the formula CH3—(CH2)n—SO3M, CH3—(CH2)n—C6H4—SO3M, or CH3—(CH2)n—CH?CHCH2—SO3M, where n is an integer from 6 to 17, or mixtures thereof, and M is a cation having a valence of 1. Surfactant is not introduced to the reactor until shortly after the polymerization reaction has begun.

Abstract: An aqueous semi-batch polymerization process is disclosed for the manufacture of dipolymers of tetrafluoroethylene and 3,3,3-trifluoropropene that contain between 45 and 95 mole percent tetrafluoroethylene and between 5 and 55 mole percent 3,3,3-trifluoropropene.

Abstract: Disclosed is a topcoat composition comprising a polymer having a dissolution rate of at least 1500 ?/second in an aqueous alkaline developer, and at least one solvent. The topcoat composition can be used to coat a photoresist layer on a material layer on a substrate, for example, a semiconductor chip. Also disclosed is a method of forming a pattern in the material layer of the coated substrate.

Abstract: To provide a polymerizable group-containing and fluorine-containing adamantane derivative capable of affording a cured product having good heat resistance, good mechanical properties such as mar resistance and a low refractive index, a resin composition containing such a polymerizable group-containing adamantane derivative, and a fluorine-containing adamantane derivative which is useful as a reaction intermediate used for the production of the polymerizable group-containing and fluorine-containing adamantane derivative. Specifically provided are a fluorine-containing adamantane derivative represented by the general formula (I) below, a polymerizable group-containing and fluorine-containing adamantane derivative represented by the general formula (II) below, and a resin composition containing such a polymerizable group-containing and fluorine-containing adamantane derivative.

Abstract: The present invention relates to polymeric compositions useful in the manufacture of biocompatible medical devices. More particularly, the present invention relates to certain hydrophilic monomers capable of polymerization to form polymeric compositions having desirable physical characteristics useful in the manufacture of ophthalmic devices. The polymeric compositions comprise polymerizable hydrophilic siloxanyl monomers.

Abstract: A process for the polymerization of a true tetrafluoroethylene (TFE) copolymer of the fine powder type is provided, wherein the copolymer contains polymerized comonomer units of at least one comonomer other than TFE in concentrations of at least or exceeding 1.0 weight percent, and which can exceed 5.0 weight percent, wherein the copolymer is expandable, that is, the copolymer may be expanded to produce strong, useful, expanded TFE copolymeric articles having a microstructure of nodes interconnected by fibrils.

Abstract: VDF-based curable fluoroelastomers having glass transition temperature lower than ?35° C. and an amount of —COF end groups in the polymer lower than the sensitivity limit of the method using the FT-IR spectroscopy described in the present application.

Abstract: Disclosed is a fluorine-containing polymer compound containing first and second repeating units respectively represented by formulas (a-1) and (a-2), wherein R3 represents a fluorine atom or fluorine-containing alkyl group, each of W and W1 independently represents a bivalent linking group, R2 represents an acid-labile protecting group, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R4, R5, R6 and W or W1 may be combined to form a cyclic structure in formula (a-1) or (a-2). This polymer compound has a weight-average molecular weight of 1,000 to 1,000,000 and can provide a resist composition capable of forming a pattern with no swelling and no pattern falling down.

Abstract: A fluoropolymer having functional groups and having high transparency in a wide wavelength range is provided, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer, wherein the fluoropolymer has monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1): CF2?CFCF2C(CF3)(OR1)—(CH2)nCR2?CHR3??(1) wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R2 and R3, which are independent of each other, is a hydrogen atom or an alkyl group having at most 12 carbon atoms, and n is 0 or 2, provided that when n is 0, at least one of R1, R2 and R3 is other than a hydrogen atom.

Abstract: Perfluoroelastomers curable by peroxidic way having glass transition temperature lower than ?10° C. and an amount of —COF end groups in the polymer lower than the sensitivity limit of the method using the IR spectroscopy in Fourier transform described in the present application.

Abstract: Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R1 is H or monovalent C1-C20 hydrocarbon group, R2 is H, F, methyl or trifluoromethyl, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, or R3 and R4 may form an aliphatic hydrocarbon ring, and A is a divalent C1-C6 hydrocarbon group.

Abstract: An object of the present invention is to provide a process for producing a conjugated polymer that enables a significant shortening of the reaction time. A process for producing a conjugated polymer according to the present invention is a process for producing a conjugated polymer by Suzuki coupling, wherein the process uses microwave irradiation. The conjugated polymer is preferably a polymer used as an organic electronics material, and is even more preferably a polymer used as an electroluminescent material.

Abstract: The present invention provides a water and oil proofing composition which imparts excellent water and oil resistance and comprises a fluorocopolymer comprising polymerized units of (Z-Y)nX (wherein Z: a C1-6 perfluoroalkyl group or the like, Y: an alkylene group or the like, n: 1 or 2, X: a polymerizable unsaturated group), polymerized units of CH2?CR1-G-(R2O)q—R3 (wherein R1: a hydrogen atom or the like, R2: a C2-4 alkylene group or the like, q: an integer of from 1 to 50, G: —COO(CH2)r— (r: an integer of from 0 to 4), R3: a hydrogen atom or the like, and polymerized units of CH2?CR4-M-Q-NR5R6 (wherein R4: a hydrogen atom or the like, Q: a C2-4 alkylene group or the like, R5 and R6: C1-8 alkyl groups or the like) and an aqueous medium.

Abstract: The invention at hand concerns hydrophobic polymer surfaces, in particular superhydrophobic polymer surfaces, comprising at least one homo- or copolymer, which comprises at least one side chain with at least one fluoro-substituted aryl group. Furthermore, the invention at hand concerns a method for the production of polymer surfaces of this type, their use and polymers of the general formula I: wherein n is an integer between 10 and 4,500, preferably between 20 and 2,200 and particularly preferably between 100 and 670.

Abstract: Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

Abstract: A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1 and R2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using a light having a wavelength of 190 nm or less, as a chemically amplified resist which exhibits excellent transparency with respect to the light for use in exposure and also is excellent in the adhesion to a substrate and the resistance to dry etching.

Abstract: A composition which provides surface effects to substrates comprising a polymer containing at least one urea linkage prepared by (i) reacting (1) at least one organic diioscyanate, polyisocyanate, or mixture thereof, and (2) at least one fluorochemical compound of Formula I Rf—O(CF2CF2)r(CH2CH2)q(R1)sXH??Formula (I) wherein Rf is a linear or branched C1 to C7 perfluoroalkyl optionally interrupted by one to three oxygen atoms, r is 1 to 3, q is 1 to 3, s is 0 or 1, X is O, S, or NR2 wherein R2 is H, or C1 to C6 alkyl, and R1 is a divalent radical selected from —S(CH2)n—, p is 1 to 50, and R3, R4 and R5 are each independently H or C1 to C6 alkyl; (ii) and then reacting with (3) water, a linking agent, or a mixture thereof.

Abstract: To provide a material having properties required for a chromatic aberration-free lens and excellent in moldability and impact resistance. A fluoropolymer for a chromatic aberration-free lens, which is an amorphous fluoropolymer containing a carbon atom chain as a main chain and containing a fluorinated atom-bonded carbon atom as a carbon atom of the main chain, characterized in that vd>75, ?gF>0.50, and ??gF>0.03, where vd represents an Abbe number, ?gF represents a relative partial dispersion of a g-F line, and ??gF represents a deviation from a standard line of the relative partial dispersion of the g-F line.

Abstract: The present invention provides an aqueous coating composition comprising (i) particles of a non-melt processible polymer of tetrafluoroethylene and (ii) a non-fluorinated polymer selected from the group consisting of a polysulfone, a polyamide, a polyimide, a polyamide-imide, a polybismaleimide and mixtures thereof, wherein said particles are core-shell particles whereby the shell comprises a copolymer of tetrafluoroethylene and a partially fluorinated or non-fluorinated comonomer. The aqueous coating composition may be used for providing a primer coating on a substrate such as a metal or glass substrate. Such primer coating may provide good or excellent non-stick coatings combined with good or excellent scratch and wear resistance of the coating. Also, such primer coating may provide for good to excellent PTFE coatings that can resist hot salt water. The aqueous coating composition may also be used to provide other coating layers of a multi-layer coating.

Abstract: The present invention provides fluorinated, thermosettable compositions that are photoimageable and which function as low dielectric materials. Such low dielectric materials are useful as passivation resist layers in liquid crystal displays, electroluminescent displays, light emitting diodes and semiconductor manufacture.

Abstract: A hybrid contact lens includes a substantially rigid center portion and a substantially flexible skirt portion connected to the center portion. The skirt portion is formed using xerogels compatible with diluents comprising at least one selected from polylactic acid, polyglycolic acid, lactide, glycolide, a polyacetal, a cyclic acetal, a polyketal, a cyclic ketal, a polyorthoester, a cyclic orthoester, di-t-butyl-dicarbonate, tris(trimethylsilyl)amine, and 2,2,2-trifluoroacetamide. These diluents are formulated to function as a stand-in for water in the xerogel polymer, allowing the xerogel to form and bond to the rigid center portion in its fully expanded state. Upon hydration of the hybrid lens, substantially little dimensional change, and thus substantially little distortion, is obtained in the skirt portion.

Abstract: A diamine compound of formula (I) is proposed as well as polymers, copolymers, polyamic acids, polyamic acid esters, or polyimides based on such compound.

Abstract: A fluoropolymer comprising: (A) repeating unit derived from an S-sulfate monomer having an —S—SO3— group and carbon to carbon double bond; and (B) repeating unit derived from a fluoromonomer having a fluorine atom and carbon to carbon double bond. This fluoropolymer can be a constituent of water/oil repellent agent having excellent water/oil repelling capability, and is stable in air and permits an arbitrary control of crosslinking.

Abstract: A process is provided for preparing an organic polymeric useful in the fabrication of optical waveguides or optical fiber. The polymer is a homo- or copolymer having an olefinic backbone with a pendant group comprising fluorinated aromatic and aliphatic moieties, and is cross-linkable. Polymers having refractive index over a wide range may be prepared by selecting specific constituents of the pendant group.

Abstract: A vinylidene fluoride-based resin film including polyvinylidene fluoride whose average spherocrystal diameter is less than 0.1 ?m that is a detection limit or lower by observation using a transmission electron microscope is provided, the average spherocrystal diameter being obtained by shaping a vinylidene fluoride-based resin in a molten state by sandwiching the resin between rollers or metal belts so as to let it cool down. Thereby, a vinylidene fluoride-based resin film and a vinylidene fluoride-based resin multilayered film having excellent transparency, weather resistance, chemical resistance, break resistance and formability are provided.

Abstract: Photochromic monomers and methods for preparing these photochromic monomers, photochromic polymers based on these photochromic monomers and methods for preparing these photochromic polymers, as well as the use of these photochromic polymers in a polymer binder as a two-photon recording medium for an optical 3D memory and photoswitches of optical signals are disclosed. The materials exhibit thermally irreversible photochromic transformations and other properties enabling the use of the photochromic polymers in an optical two-photon read/write memory.

Abstract: A stain remover which comprises a copolymer made from as essential ingredients (a) a polymerizable monomer having a polyfluoroalkyl group with less than 8 carbon atoms and represented by the general formula H2C?CXCOO—Y-Rf and (b) a fluorine-free polymerizable monomer represented by the following general formula: H2C?CXCOO—(RO)n—X. The stain remover is effective in minimizing the amount of an organic solvent to be used. It imparts to a substrate the excellent property of removing stains therefrom and a satisfactory texture.

Abstract: Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from approximately 150 nanometer to 260 nanometers.

Abstract: The present invention provides a process for preparing a fluorine-containing polymer having few branched chains and little weight change in high temperatures, which is a new process wherein composition distribution substantially does not occur. The fluorine-containing polymer is prepared by a batch copolymerization process conducted under conditions of reduced temperature of at least 0.95 and reduced pressure of at least 0.80 of the critical constant calculated from critical temperature, critical pressure and composition ratio of each monomer in the gaseous phase of the reaction vessel using the Peng-Robinson formula.

Abstract: To provide a fluorinated polymer which enables to reduce the amount of residual ink on partition walls and to form an ink layer having high uniformity in film thickness, and a negative photosensitive composition. A fluorinated polymer which is a copolymer made of at least two monomers each having an ethylenic double bond, and which has a side chain having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain an etheric oxygen atom between carbon atoms) and a side chain having at least two ethylenic double bonds per side chain.

Abstract: Provided is a method of manufacturing a perhalogenated elastomer comprising using an onium compound to coagulate a latex comprising polymer particles, the polymer particles consisting essentially of interpolymerized units of one or more perhalogenated comonomer(s) and at least one cure site monomer, wherein the coagulation is performed essentially free of metal ions and metal salts. Also provided is an elastomeric composition comprising a curable perhalogenated elastomer comprising interpolymerized units derived from a nitrogen-containing cure site monomer and coagulated with an onium compound, wherein the elastomer is capable of curing without adding further components and wherein the composition is essentially free of metal ions and metal salts. Also provided are fluoropolymer articles and methods of making fluoropolymer compositions and articles.

Abstract: The present invention relates to a partially-crystalline copolymer comprising tetrafluoroethylene, hexafluoropropylene in an amount corresponding to hexafluoropropylene index (HFPI) of from about 2.8 to 5.3, and preferably from about 0.2% to 3% by weight of perfluoro(alkyl vinyl ether), said copolymer being polymerized and isolated in the absence of added alkali metal salts, having a melt flow rate of within the range of about 30±3 g/10 min, and having no more than about 50 unstable endgroups/106 carbon atoms can be extruded at high speed onto conductor over a broad polymer melt temperature range to give insulated wire of high quality.

Abstract: This invention relates to compositions, and methods for producing compositions, for increasing oil repellency, water repellency, or both, of fabric or fibers, containing: (a) an effective amount of a repellent polymer selected from the group consisting of homopolymers and copolymers of one or more monomers having formula I: Rf—(CH2)n—P ??(I) wherein P is a polymerizable or copolymerizable moiety; and (b) a fluorinated carbon solvent.

Abstract: A method is provided for making a crosslinked polymer electrolyte, typically in the form of a membrane for use as a polymer electrolyte membrane in an electrolytic cell such as a fuel cell, by trimerization of nitrile groups contained on groups pendant from the polymer. The resulting polymer electrolyte membrane comprises a highly fluorinated polymer comprising: a perfluorinated backbone, first pendent groups which comprise sulfonic acid groups, and crosslinks comprising trivalent groups according to the formula: The first pendent groups are typically according to the formula: —R1—SO3H, where R1 is a branched or unbranched perfluoroalkyl or perfluoroether group comprising 1-15 carbon atoms and 0-4 oxygen atoms, most typically —O—CF2—CF2—CF2—CF2—SO3H or —O—CF2—CF(CF3)—O—CF2—CF2—SO3H.

Abstract: Polymerization products formed from a monomeric mixture comprising (a) one or more first monomers of the general formula I: A-L-R1—(X—CF?CF2)n??(I) wherein R1 represents one or more inertly substituted groups; X is independently a group which links the inertly substituted groups and the trifluorovinyl group; L is an optional linking group; A is CO2Z, SO2Z, PO3Z, or OPO3Z wherein Z is hydrogen or an alkali metal and n is an integer of 1 to about 1000; (b) one or more second crosslinking monomers comprising at least three trifluorovinyl groups and (c) one or more prepolymers comprising one or more trifluorovinyl groups are provided. Also provided are biomedical devices formed from such polymerization products.

Abstract: The present invention relates to the reduction of oligomer content of melt-processible fluoropolymer so that the fluoropolymer has at least 25 ppm less oligomer than the as-polymerized fluoropolymer.

Abstract: A composition comprising monomers copolymerized in the following percentages by weight: (a) from about 20% to about 95% of a monomer, or mixture of monomers, of formula (I): Rf—(CH2CF2)q(CH2CH2)r-Z-C(O)—C(R)?CH2 ??(I) wherein q and r are each independently integers of 1 to 3; Rf is a linear or branched perfluoroalkyl group having 2 to 6 carbon atoms; Z is —O—, —NR1— or —S—; R is hydrogen, Cl, F or CH3; R1 is hydrogen, or a C1 to C4 alkyl; and (b) from about 5% to about 80% of at least one of: (i) an alkyl (meth)acrylate monomer having a linear, branched or cyclic alkyl group of 6 to 18 carbons; or (ii) a monomer of formula (II): (R2)2N—R3—O—C(O)—C(R)?CH2 ??(II) wherein R is as defined above; each R2 is independently a C1 to C4 alkyl; and R3 is a divalent linear or branched C1 to C4 alkylene; and wherein the nitrogen is from about 40% to 100% salinized; or (iii) a mixture thereof; said composition providing oil repellency, water repellency, and stain resistance to substrates contacted therewi

Abstract: A polymer electrolyte of high durability consistent with the present invention is characterized as including a first repeating unit represented by a general formula —{C(Z1)(Z2)—C(Z3)(Z4—SO3H)}— (where Z1, Z2, Z3, and Z4 are respectively F or Rf1, F or Rf2, F or Rf3, and nothing or Rf4; and each of Rf1, to Rf4 is a perfluoroalkyl group in which the carbon number is from 1 to 10) in a polymer chain, and having an equivalent weight of 2500 g/eq or less.