Carbon Attached Directly Or Indirectly To The Silicon By Nonionic Bonding (e.g., Silanes, Etc.) Patents (Class 556/465)
  • Patent number: 7662984
    Abstract: Si—Si bond-bearing compounds are effectively prepared by irradiating with radiation or heating Si—H group-bearing silicon compounds in organic solvents in the presence of iron complex catalysts. The Si—Si bond-bearing compounds are useful as a base material in photoresist compositions, ceramic precursor compositions, and conductive compositions.
    Type: Grant
    Filed: October 30, 2008
    Date of Patent: February 16, 2010
    Assignees: Public University Corporation Osaka City University, Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Nakazawa, Masumi Itazaki
  • Publication number: 20100031777
    Abstract: An ore containing crystal water (bond water) is heated to dehydrate the crystal water in the form of water vapor, thereby rendering the ore porous to generate a porous ore. Next, the porous ore is forced into contact with a dry-distilled gas (organic gas) obtained by dry-distillation of an organic substance such as wood and the like or an organic liquid such as tar and the like. An organic compound such as tar and the like contained in the dry-distilled gas or organic liquid adheres to the surface of the porous ore. Next, the porous ore adhered with an organic compound is heated at 500° C. or higher, to generate an ore in which a part of an oxide of an element such as iron and the like contained is reduced by carbon in the organic compound.
    Type: Application
    Filed: September 6, 2007
    Publication date: February 11, 2010
    Inventors: Tomohiro Akiyama, Yuichi Hata, Sou Hosokai, Xinghe Zhang, Purwanto Hadi, Junichiro Hayashi, Yoshiaki Kashiwaya, Hiroshi Uesugi
  • Patent number: 7655811
    Abstract: Hydroxyl-terminal organopolysiloxanes having diorganosiloxy groups and Si—H groups are prepared by reacting the appropriate chlorosilanes with less than 0.5 mol water per mol of hydrolyzable chlorine in a first step and recovering gaseous HCl, and more fully hydrolyzing with additional water in a second step.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: February 2, 2010
    Assignee: Wacker Chemie AG
    Inventors: Gilbert Geisberger, Christian Herzig, Tassilo Lindner
  • Publication number: 20090280052
    Abstract: This invention discloses the synthesis of metal chalcogenides using chemical vapor deposition (CVD) process, atomic layer deposition (ALD) process, or wet solution process. Ligand exchange reactions of organosilyltellurium or organosilylselenium with a series of metal compounds having neucleophilic substituents generate metal chalcogenides. This chemistry is used to deposit germanium-antimony-tellurium (GeSbTe) and germanium-antimony-selenium (GeSbSe) films or other tellurium and selenium based metal compounds for phase change memory and photovoltaic devices.
    Type: Application
    Filed: April 17, 2009
    Publication date: November 12, 2009
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Manchao Xiao, Liu Yang
  • Patent number: 7611828
    Abstract: An adhesion promoter to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer. A photoactive adhesion promoter (PAG) is described which helps reduce these and other undesired effects associated with the removal of photoresist in a semiconductor manufacturing process.
    Type: Grant
    Filed: November 24, 2008
    Date of Patent: November 3, 2009
    Inventor: Robert P. Meagley
  • Patent number: 7598409
    Abstract: The present invention relates to a process for preparing silicon compounds bearing fluoroalkyl groups by hydrosilylation of a fluoroolefin in the presence of a hydrosilylation catalyst, which comprises initially charging and heating a hydrogenchlorosilane, then metering in the fluoroolefin and reacting the reaction mixture and subsequently isolating the hydrosilylation product.
    Type: Grant
    Filed: October 21, 2004
    Date of Patent: October 6, 2009
    Assignee: Degussa AG
    Inventors: Eckhard Just, Sabine Giessler, Peter Jenkner
  • Publication number: 20090238781
    Abstract: A glycerin-modified silicone represented by the following formula (1): R1aR2bR3cSiO(4-a-b-c)/2 ??(1) wherein R1 is, independently, an unsubstituted or a partially halogen-substituted alkyl, aryl, aralkyl, aminoalkyl, or carboxyalkyl group, of 1 to 30 carbon atoms, R2 is, independently, an organosiloxyalkyl group represented by the following formula (3): wherein R5 is an unsubstituted or a partially halogen-substituted alkyl group of 1 to 30 carbon atoms, g is a number of from 1 to 5, and h is a number of from 1 to 500, R3 is a group represented by the following formula (4): wherein Q is a C2-20 divalent group, r is a number of from 1 to 200, s is a number of from 1 to 200, R6 is a hydrogen atom, a C1-30 alkyl group or an organic group of the formula: —(CO)—R7, wherein R7 is a C1-30 hydrocarbon group, and t is a number of from 1 to 10, a is a number of from 0.5 to 2.5, b is a number of from 0 to 1.5, and c is a number of from 0.001 to 1.5.
    Type: Application
    Filed: March 20, 2009
    Publication date: September 24, 2009
    Inventors: Koji Sakuta, Emi Akabane
  • Publication number: 20090208728
    Abstract: A surface modifier comprising an organosilicone compound represented by General Formula (A) and/or General Formula (B): F—(CF2)q—(OC3F6)m—(OC2F4)n—(OCF2)o(CH2)pX(CH2)rSi(X?)3-a(R1)a (A) and F—(CF2)q—(OC3F6)m—(OC2F4)n—(OCF2)o(CH2)pX(CH2)r(X?)2-a(R1)aSiO(F—(CF2)q—(OC3F6)m—(OC2F4)n—(OCF2)o(CH2)pX(CH2)r(X?)1-a(R1)aSiO)zF—(CF2)q—(OC3F6)m—(OC2F4)n—(OCF2)o(CH2)pX(CH2)r(X?)2-a(R1)aSi (B) wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 1 or 2; X is O or a bivalent organic group; r is an integer from 2 to 20; R1 is a C1-22 linear or branched hydrocarbon group; a is an integer from 0 to 2; X? is hydrolysable group; and z is an integer from 0 to 10 when a is 0 or 1.
    Type: Application
    Filed: March 30, 2006
    Publication date: August 20, 2009
    Applicants: DAIKIN INDUSTRIES, LTD., DOW CORNING CORPORATION
    Inventors: Yasuo Itami, Tetsuya Masutani, Peter C. Hupfield, Don Lee Kleyer
  • Patent number: 7557232
    Abstract: The current invention provides compositions, which are useful as stationary phases for a variety of chromatographic applications, such as high performance liquid chromatography (HPLC). The compositions include a substrate (e.g., silica gel), covalently bound to a compound, which includes both a hydrophobic moiety and a hydrophilic moiety, which is preferably a 1,2-diol moiety. The hydrophobic moiety is sufficiently hydrophobic for the compositions to exhibit reversed phase characteristics and typically incorporates at least 5 carbon atoms in sequence. Based on having both hydrophilic and hydrophobic functionalities, the new stationary phases exhibit unique chromatographic properties. For example, these media can be used in either hydrophilic (HILIC) mode, in which the mobile phase includes a high percentage of an organic solvent, or in reversed phase mode, in which the mobile phase contains a higher percentage of an aqueous solvent.
    Type: Grant
    Filed: May 25, 2007
    Date of Patent: July 7, 2009
    Assignee: Dionex Corporation
    Inventors: Xiaodong Liu, Christopher A. Pohl, Jinhua Chen
  • Patent number: 7550619
    Abstract: Intermediates useful in the preparation of the antiviral agent entecavir are disclosed. A resin adsorption process for the isolation and purification of entecavir is also disclosed. Various processes useful in the preparation of entecavir are also disclosed.
    Type: Grant
    Filed: December 19, 2005
    Date of Patent: June 23, 2009
    Assignee: Bristol-Myers Squibb Company
    Inventors: Yadagiri R. Pendri, Chung-Pin H. Chen, Jing Liang, Shaopeng Wang, Milan Stojanovic, Richard P. Polniaszek, John Thottathil, Dhileepkumar Krishnamurty
  • Patent number: 7544827
    Abstract: Chemical vapor deposition processes result in films having low dielectric constants when suitable chemical precursors are utilized. Preferred chemical precursors include siloxanes, (fluoroalkyl)fluorosiloxanes, (fluoroalkyl)silanes, (alkyl)fluorosilanes, (fluoroalkyl)fluorosilanes, alkylsiloxysilanes, alkoxysilanes, alkylalkoxysilanes, silylmethanes, alkoxysilylmethanes, alkylalkoxysilylmethanes, alkoxymethanes, alkylalkoxymethanes, and mixtures thereof. The precursors are particularly suited to thermal CVD for producing low dielectric constant films at relatively low temperatures, particularly without the use of additional oxidizing agents. Such films are useful in the microelectronics industry.
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: June 9, 2009
    Assignee: ASM Japan K.K.
    Inventor: Michael A. Todd
  • Patent number: 7541098
    Abstract: A light-emitting organic compound that is superior in electrochemical stability, chemical stability, and thermal stability is provided. The compound also, shows blue luminescence with favorable color purity, and is represented by the following general formula (1). In the formula, X1 represents a silyl group in which one or more aryl groups having 5 to 10 carbon atoms are bound to silicon or an alkyl group having 1 to 4 carbon atoms. Ar1 represents an unsubstituted or substituted aryl group having 5 to 15 carbon atoms. Ar2 represents an aryl group having 5 to 20 carbon atoms, and may have a substituent at a site different from a binding site to Ar1.
    Type: Grant
    Filed: July 26, 2004
    Date of Patent: June 2, 2009
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Ryoji Nomura, Atsushi Tokuda, Hiroko Abe, Satoshi Seo
  • Patent number: 7495120
    Abstract: The present invention provides a process for using nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and mixtures thereof, as sources of catalytic copper in the Direct Synthesis of trialkoxysilanes of the formula HSi(OR)3 wherein R is an alkyl group containing from 1 to 6 carbon atoms inclusive. The nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and their mixtures of this invention have average particle sizes that are in the range from about 0.1 to about 600 nanometers, preferably from about 0.1 to about 500 nanometers, and most preferably from about 0.1 to about 100 nanometers. Nanosized sources of catalytic copper afford high dispersion of catalytic sites on silicon and contribute to high reaction rates, high selectivity and high silicon conversion. The nanosized copper catalyst precursors of the invention permit the use of substantially reduced levels of copper compared to conventional practice.
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: February 24, 2009
    Assignee: Momentive Performance Materials Inc.
    Inventors: Kenrick M. Lewis, Regina Nelson Eng, Sabrina R. Cromer, Abellard T. Mereigh, Chi-Lin O'Young
  • Publication number: 20090023010
    Abstract: A method of surface modifying a polyimide film, a method of manufacturing a flexible copper clad laminate using the same, and a flexible copper clad laminate (FCCL) having a two-layer structure manufactured thereby. The method of surface modifying a polyimide film is conducted by modifying the surface of a polyimide film through a first plasma treatment, dipping the polyimide film into a solution containing an ethyleneimine-based silane coupling agent prepared by mixing the compound of Formula 1 and the compound of Formula 2 at a molar ratio of with 0.25˜1, and then modifying the surface of the polyimide film through a second plasma treatment. The method of surface modifying a polyimide film is advantageous because it may be substituted for a conventional surface treatment processes using ion beams.
    Type: Application
    Filed: May 18, 2006
    Publication date: January 22, 2009
    Applicant: Korea Research Institute of Chemical Technology
    Inventors: Young-Taik Hong, Hyung Dae Kang, Seog Je Kim, Jae Heung Lee
  • Patent number: 7479571
    Abstract: One aspect of the present invention relates to compounds, comprising at least two moieties selected from the group consisting of aryl sulfonates and aryl sulfates. A second aspect of the present invention relates to combinatorial libraries of the aforementioned compounds. The present invention also relates to compositions comprising a compound of the present invention. A fourth aspect of the present invention relates to the use of a compound or composition of the present invention in a method for inhibiting bioadhesion to a surface. Another aspect of the present invention relates to the use of a compound or composition of the present invention in a method for enhancing bioadhesion to a surface.
    Type: Grant
    Filed: February 7, 2005
    Date of Patent: January 20, 2009
    Assignee: Cernofina, LLC
    Inventors: Randall S. Alberte, Robert D. Smith
  • Publication number: 20080311514
    Abstract: In a mixture of silsesquioxane compounds comprising silsesquioxane units having a side chain including a direct bond between a silicon atom and a norbornane skeleton and having a degree of condensation of substantially 100%, a dimethylene chain of the norbornane skeleton remote from the silicon bonded side is substituted with at least one substituent group other than hydrogen, and an isomer having a bulkier substituent group on the dimethylene chain at an exo position is present in a higher proportion.
    Type: Application
    Filed: September 25, 2007
    Publication date: December 18, 2008
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Mutsuo NAKASHIMA, Yoshitaka HAMADA, Katsuya TAKEMURA, Kazumi NODA
  • Patent number: 7462683
    Abstract: It is an object of the invention to provide a novel ?-conjugated polymer compound capable of expecting an application as a functional material having a solubility, a heat resistance, an electrochemical activity and a fluorescence, and a method for producing the same. A dihalide is represented by the following formula: (wherein R1 represents a halogen, R2 represents an alkyl group or a silyl group having a substituent, and R3 represents a hydrogen or an alkyl group).
    Type: Grant
    Filed: February 15, 2005
    Date of Patent: December 9, 2008
    Assignee: Tokyo Institute of Technology
    Inventors: Takakazu Yamamoto, Hiroki Fukumoto, Takahiro Asao
  • Patent number: 7459577
    Abstract: A silane containing a bulky hydrocarbon group or groups R therein and having the formula (III) R3-(x+y)(R1)x(R2)ySi(OR3) can be produced by reacting a silane of the formula (I) (R1)x(R2)ySiCl3-(x+y)(OR3) with a Grignard reagent of the formula (II) RMgX Further, a tri-organo-chlorosilane of the formula (XIIa) (R1)(R2)(R3)SiCl can be produced by reacting a tri-organo-silane of the formula (XIa) (R1)(R2)(R3)SiZ1 with hydrochloric acid. Furthermore, a tri-organo-monoalkoxysilane of the formula (XXIII) R3-(x+y)(R1)x(R2)ySi(OR3) can be produced when a silane of the formula (XXI) (R1)x(R2)ySiCl4-(x+y) is reacted with a Grignard reagent of the formula (XXII) RMgX with addition of and reaction with an alcohol or an epoxy compound during the reaction.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: December 2, 2008
    Assignees: Shin-Etsu Chemical Co., Ltd., Hokko Chemical Industry Co., Ltd.
    Inventors: Tadashi Bannou, Shin Masaoka, Yoshiki Hayakawa
  • Patent number: 7449593
    Abstract: This invention is about anthracene, at least one having silyl substituted group on ring 9 and 10, the anthracene can be a organic light emitting diodes (OLED) material and used for organic electroluminescent device. wherein X is an triarylsilyl group having 6 to 20 carbon atoms, an trialkylsilyl group having 1 to 12 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a substituted or unsubstituted heteroaryl group having 2 to 20 carbon atoms, or a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms. R1 and R2 is independently a hydrogen, halogen, or a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms. R3 to R5 is independently a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, or a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms.
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: November 11, 2008
    Assignee: Au Optronics Corporation
    Inventors: Chen-Ping Yu, Chia-Liang Tai, Fan-Hsiu Chang
  • Publication number: 20080274627
    Abstract: Using a cyclic siloxane compound having a vinyl group directly attached to a silicon atom and a relatively bulky substituent group containing a primary carbon vicinal to the silicon, a dielectric film, especially a low-k interlayer dielectric film can be formed by the plasma-enhanced CVD process.
    Type: Application
    Filed: May 1, 2008
    Publication date: November 6, 2008
    Applicants: SHIN-ETSU CHEMICAL CO., LTD., NEC CORPORATION
    Inventors: Yoshitaka HAMADA, Jun KAWAHARA
  • Patent number: 7432386
    Abstract: Novel 4,4-diarylbutadiene-substituted methyltrialkylsilanes having the structural formula (I): are useful sunscreens for UV-photoprotecting human skin against the damaging effects of UV-radiation, notably UV-A radiation.
    Type: Grant
    Filed: May 9, 2007
    Date of Patent: October 7, 2008
    Assignee: L'Oreal
    Inventor: Herve Richard
  • Publication number: 20080207937
    Abstract: An asymmetric bis-silane compound of the formula A3Si—R1—SiB3 where A, B, and R1 are as defined herein, and to methods for making the bis-silane compound and their use to form layers or films of metal oxide particles, and which layers or films adhere to a suitable substrate. The materials and methods can be used, for example, to make photoactive devices.
    Type: Application
    Filed: November 29, 2007
    Publication date: August 28, 2008
    Inventors: Steven B. Dawes, James R. Matthews
  • Patent number: 7413817
    Abstract: A 4,4?-Bis(carbazol-9-yl)-biphenyl (CBP) based silicone compound and an organic electroluminescent device using the CBP based silicon compound have excellent blue light emission characteristics and hole transfer capability. The CBP based silicon compound may be used as a blue light emission material or as a host material for various phosphorescent or fluorescent dopants emitting red, green, blue, or white light. Therefore, the organic electroluminescent device using the CBP based silicon compound has excellent characteristics such as a high efficiency, a high luminance, a long life span, and a low power consumption.
    Type: Grant
    Filed: June 28, 2004
    Date of Patent: August 19, 2008
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Seok Jong Lee, Young-Kook Kim, Seok-Hwan Hwang
  • Patent number: 7408015
    Abstract: The present invention relates to silane adducts having a relatively higher adhesive strength as expressed formula X3SiR1, and manufacturing method thereof. wherein X is a hydrogenated form selected from one of epoxy compounds, amino compounds and bisphenolic, and R1 is selected from one of glycidyloxypropyl group, 2-(3,4-epoxycyclohexyl)ethyl group, 3-acryloxypropyl group, 3-methacryloxypropyl group, amino-propyl group, 3-[2-(2-aminoethylamino)ethylamino]propyl group, N-methylaminopropyl group, N-phenylaminopropyl group, N,N-dimethyl-3-aminopropyl group, mercapto-propyl group, cyano-propyl group, and isocyanato-propyl group.
    Type: Grant
    Filed: December 19, 2005
    Date of Patent: August 5, 2008
    Assignee: LG Cable, Ltd
    Inventors: Byoung Un Kang, Hyuk Soo Moon, Jong Kul Lee, Kyoung Tae Wi, Tae Sung Kim
  • Patent number: 7405262
    Abstract: A process for preparing a functionalized polymerization initiator, the process comprising combining a functionalized styryl compound and an organolithium compound.
    Type: Grant
    Filed: July 11, 2003
    Date of Patent: July 29, 2008
    Assignee: Bridgestone Corporation
    Inventors: Thomas Antkowiak, Christine Rademacher, Anthony Ramic, David F. Lawson
  • Publication number: 20080161514
    Abstract: A transition metal complex represented by the general formula [1]; a catalyst component for olefin polymerization comprising said transition metal complex; a catalyst for olefin polymerization using said transition metal complex as a catalyst component for olefin polymerization; a process for producing an olefin polymer comprising the step of polymerizing an olefin in the presence of said catalyst for olefin polymerization; a substituent-carrying fluorene compound; a process for producing said substituent-carrying fluorene compound; and a process for producing said transition metal complex using said substituent-carrying fluorene compound: wherein M is the group 4 transition metal atom in the periodic table of elements; A is the group 16 atom therein; J is the group 14 atom therein; R1, R2, R3, R4, R5, R6, X1 and X2 are independently of one another (1) a substituent selected from the group consisting of (1-1) an alkyl group having 1 to 20 carbon atoms, which may be substituted by a halogen atom, (1-2) an
    Type: Application
    Filed: January 24, 2006
    Publication date: July 3, 2008
    Inventors: Taichi Senda, Hidenori Hanaoka, Shinya Nakahara, Kenji Sogoh
  • Patent number: 7375170
    Abstract: Since the majority of conventional organic/inorganic composite materials are obtained by mechanical blending of a silsesquioxane and an organic polymer or other means, it was extremely difficult to control the structure of the composite as a molecular agglomerate. In order to solve such a problem, the invention is to provide a silicon compound represented by Formula (1). This novel silicon compound has a living radical polymerization initiating ability for addition polymerizable monomers of a wide range.
    Type: Grant
    Filed: December 27, 2005
    Date of Patent: May 20, 2008
    Assignees: Chisso Corporation, Chisso Petrochemical Corporation
    Inventors: Hisao Oikawa, Mikio Yamahiro, Koji Ohguma, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
  • Patent number: 7374771
    Abstract: Cosmetic formulations comprising alkyl-substituted siloxanes as vaporizable carriers.
    Type: Grant
    Filed: November 12, 2002
    Date of Patent: May 20, 2008
    Assignee: GE Bayer Silicones GmbH & Co., KG
    Inventors: Hubertus Eversheim, Martin Kropfgans, Sabine Nienstedt, Horst Lange
  • Publication number: 20080113266
    Abstract: Disclosed are electrodes for lithium secondary batteries having enhanced cycle performance and lithium secondary batteries comprising the same. More particularly, the present invention provides an electrode for lithium secondary battery with improved initial charge/discharge characteristics and cycle life characteristics at high temperature, which includes silane based additives as a constitutional component of the electrode and forms a passivation film during an initial charge/discharge process and, in addition, a lithium secondary battery comprising the above electrode.
    Type: Application
    Filed: November 5, 2007
    Publication date: May 15, 2008
    Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Jung-Ki PARK, Jun-Young LEE, Yong-Min LEE, Joong-Eun SEO
  • Publication number: 20080076898
    Abstract: The present invention relates to polymeric compositions useful in the manufacture of biocompatible medical devices. More particularly, the present invention relates to certain hydrophilic monomers capable of polymerization to form polymeric compositions having desirable physical characteristics useful in the manufacture of ophthalmic devices. The polymeric compositions comprise polymerizable hydrophilic siloxanyl monomers.
    Type: Application
    Filed: August 17, 2007
    Publication date: March 27, 2008
    Inventors: Joseph C. Salamone, Jay F. Kunzler
  • Patent number: 7339068
    Abstract: The present invention provides a process for using nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and mixtures thereof, as sources of catalytic copper in the Direct Synthesis of trialkoxysilanes of the formula HSi(OR)3 wherein R is an alkyl group containing from 1 to 6 carbon atoms inclusive. The nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and their mixtures of this invention have average particle sizes that are in the range from about 0.1 to about 600 nanometers, preferably from about 0.1 to about 500 nanometers, and most preferably from about 0.1 to about 100 nanometers. Nanosized sources of catalytic copper afford high dispersion of catalytic sites on silicon and contribute to high reaction rates, high selectivity and high silicon conversion. The nanosized copper catalyst precursors of the invention permit the use of substantially reduced levels of copper compared to conventional practice.
    Type: Grant
    Filed: October 9, 2001
    Date of Patent: March 4, 2008
    Assignee: Momentive Performance Materials Inc.
    Inventors: Kenrick M. Lewis, Regina Nelson Eng, Sabrina R. Cromer, Abellard T. Mereigh, Chi-Lin O'Young
  • Publication number: 20080048559
    Abstract: Provided herein are fluorene-based compounds including a fluorene or a spirofluorene structure at both terminals and a spacer including one or more atoms between the both terminals. The invention further provides an organo-electroluminescent device having an organic layer in which the fluorene-based compound is introduced. The fluorene-based compound can be readily manufactured using dry and wet processes, and the organo-electroluminescent device using the same has excellent properties in color purity, internal and external efficiency, and thermal, optical and electrical stability.
    Type: Application
    Filed: June 18, 2007
    Publication date: February 28, 2008
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yi-yeol LYU, Che-un YANG, Young-hun BYUN, O-hyun KWON
  • Publication number: 20080044735
    Abstract: Organic electrolyte solutions and lithium batteries using the same are provided. The organic electrolyte solutions use a silane compound that prevents crack formation caused by volumetric changes in the anode active material during battery charging/discharging. This improves charge/discharge characteristics, thereby also improving stability, reliability, and charge/discharge efficiency of the battery.
    Type: Application
    Filed: March 20, 2007
    Publication date: February 21, 2008
    Inventors: Young-gyoon Ryu, Sang-kook Mah, Jae-young Choi, Seok-soo Lee
  • Publication number: 20080038191
    Abstract: Positron emitting compounds and methods of their production are provided. The compounds have the formula: (F)m G (R)n wherein each R is a group comprising at least one carbon, nitrogen, phosphorus or sulfur atom and G is joined to R through said carbon, nitrogen, phosphorus or sulfur atom; G is silicon or boron; m is 2 to 5 and n is 1 to 3 with m+n=3 to 6 when G is silicon; m is 1 to 3 and n is 1 to 3 with m+n=3 to 4 when G is boron; and wherein the compound further comprises one or more counterions when the above formula is charged; and wherein at least one F is 18 F.
    Type: Application
    Filed: February 14, 2005
    Publication date: February 14, 2008
    Inventors: David M. Perrin, Richard Ting
  • Patent number: 7326746
    Abstract: Electron donor compounds, suitable for use as adhesives or as components in adhesives, contain a carbon to carbon double bond attached to an aromatic ring and conjugated with the unsaturation in the aromatic ring.
    Type: Grant
    Filed: February 17, 2005
    Date of Patent: February 5, 2008
    Inventors: Osama M. Musa, Donald E. Herr, Nikola A. Nikolic
  • Patent number: 7319159
    Abstract: Silane gas precursor compounds having the formula (I): wherein R1, R2, and R3 each can independently be hydrogen or halogen and wherein the cyclohexadiene ring can have one or more substituents selected from the group consisting of a saturated or unsaturated, straight chain or branched alkyl group, a halogen, NO2, and C?N are disclosed. In one form, the silane gas precursor compound is cyclohexadien-2,4-ylsilane, an air-stable liquid, that can be thermolyzed in a pyrolysis process to efficiently generate high purity silane gas. The compounds of the present invention can thus serve as a “point-of-use” precursor for silane gas.
    Type: Grant
    Filed: September 13, 2006
    Date of Patent: January 15, 2008
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Dovas A. Saulys, Thomas F. Kuech, John A. Roberts
  • Patent number: 7307178
    Abstract: A ?,?-unsaturated carboxylic acid silyl ester is prepared by reacting an ?,?-unsaturated carboxylic acid ester with a hydrosilane or hydrosiloxane in the presence of tris(pentafluorophenyl)borane. ?,?-Unsaturated carboxylic acid derivatives are readily prepared through fewer steps and in high yields.
    Type: Grant
    Filed: September 23, 2004
    Date of Patent: December 11, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ayumu Kiyomori, Tohru Kubota
  • Patent number: 7279118
    Abstract: In one aspect, the invention encompasses a semiconductor processing method wherein a conductive copper-containing material is formed over a semiconductive substrate and a second material is formed proximate the conductive material. A barrier layer is formed between the conductive material and the second material. The barrier layer comprises a compound having silicon chemically bonded to both nitrogen and an organic material. In another aspect, the invention encompasses a composition of matter comprising silicon chemically bonded to both nitrogen and an organic material. The nitrogen is not bonded to carbon. In yet another aspect, the invention encompasses a semiconductor processing method. A semiconductive substrate is provided and a layer is formed over the semiconductive substrate. The layer comprises a compound having silicon chemically bonded to both nitrogen and an organic material.
    Type: Grant
    Filed: February 10, 2004
    Date of Patent: October 9, 2007
    Assignee: Micron Technology, Inc.
    Inventors: Weimin Li, Zhiping Yin
  • Patent number: 7276618
    Abstract: The invention relates to a composition comprising a compound of formula (I): Rf—B—Ro—Z and a compound of formula (II): and/or their reaction product.
    Type: Grant
    Filed: June 21, 2002
    Date of Patent: October 2, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Didier Juhue, Marie-Jose Lina, Anne-Claire Gayon, Jean-Marc Corpart
  • Publication number: 20070213549
    Abstract: A vinyl- or allyl-containing compound represented by following Formula (3): wherein R2, R3, R4, R5, and R6 each represent hydrogen atom or a nonmetallic atom-containing group; R7 represents a nonmetallic atom-containing group; Y represents a group selected from the group consisting of —Si(R8) (R9) —, —Si(R10) (R11)—O—, the left hand of which is combined with R7, and —NR12—, wherein R8, R9, R10, R11, and R12 each represent hydrogen atom or a nonmetallic atom-containing group; and “n” represents 0 or 1, is prepared by reacting a vinyl or allyl ester compound represented by following Formula (1): wherein R1 represents hydrogen atom or a nonmetallic atom-containing group; R2, R3, R4, R5, R6, and “n” are as defined above, with a compound represented by following Formula (2): R7—Y—H ??(2) wherein R7 and Y are as defined above, in the presence of a transition element compound.
    Type: Application
    Filed: March 2, 2007
    Publication date: September 13, 2007
    Inventors: Yasutaka Ishii, Tatsuya Nakano, Takahiro Iwahama
  • Patent number: 7262313
    Abstract: The present invention relates to a novel organic silane compound, and more particularly, to a novel organic silane compound, useful in various applications, for the purpose of improving the affinity of an organic resin to an inorganic filler or improving the adhesion of a coating layer comprising matrix resin to a substrate. It is particularly useful for improving the adhesion of a polarizing plate adhesive for a liquid crystal display to a glass substrate, with little change over time even under hot and humid conditions.
    Type: Grant
    Filed: October 19, 2006
    Date of Patent: August 28, 2007
    Assignee: LG Chem, Ltd.
    Inventors: Michael J. Kim, Noma Kim, Anna Lee, Sera Kim, Sukky Chang, Sungchul Lim
  • Publication number: 20070191316
    Abstract: Compounds of formula IA or IB are provided where X1, X2 and X3 are independently selected from H or hydroxy protecting groups and R1 is selected from straight or branched chain alkyl groups having from 1 to 8 carbon atoms; straight or branched chain alkenyl groups having from 2 to 8 carbon atoms; straight or branched chain hydroxy-substituted alkyl groups having from 1 to 8 carbon atoms; straight and branched chain hydroxy-substituted alkenyl groups having from 2 to 8 carbon atoms. Such compounds are used in preparing pharmaceutical compositions and are useful in treating a variety of biological conditions.
    Type: Application
    Filed: January 30, 2007
    Publication date: August 16, 2007
    Applicant: WISCONSIN ALUMNI RESEARCH FOUNDATION
    Inventors: Hector F. DELUCA, Grazia CHIELLINI, Pawel GRZYWACZ, Lori A. PLUM, Margaret CLAGETT-DAME
  • Publication number: 20070191317
    Abstract: Compounds of formula IA or IB are provided where X1, X2 and X3 are independently selected from H or hydroxy protecting groups and R1 is selected from straight or branched chain alkyl groups having from 1 to 8 carbon atoms; straight or branched chain alkenyl groups having from 2 to 8 carbon atoms; straight or branched chain hydroxy-substituted alkyl groups having from 1 to 8 carbon atoms; straight and branched chain hydroxy-substituted alkenyl groups having from 2 to 8 carbon atoms. Such compounds are used in preparing pharmaceutical compositions and are useful in treating a variety of biological conditions.
    Type: Application
    Filed: January 30, 2007
    Publication date: August 16, 2007
    Applicant: WISCONSIN ALUMNI RESEARCH FOUNDATION
    Inventors: Hector F. DELUCA, Grazia CHIELLINI, Pawel GRZYWACZ, Lori A. PLUM, Margaret CLAGETT-DAME
  • Patent number: 7253243
    Abstract: There is provided a method of synthesizing an organosilicon compound. This method comprises polymerizing, as a starting material, allyl-(4-alkynyl-phenyl) silane represented by the following general formula (3) in a solvent selected from methylene chloride, chloroform, carbon tetrachloride and 1,2-dichloroethane and under the presence of hafnium tetrachloride to obtain an organosilicon compound represented by the following general formula (1). (wherein R is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a phenyl group, R's may be the same or different and are individually an alkyl group having 1 or 2 carbon atoms or a phenyl group, and n is an integer of 4 to 2500).
    Type: Grant
    Filed: August 18, 2006
    Date of Patent: August 7, 2007
    Assignee: Japan Science and Technology Agency
    Inventors: Yoshinori Yamamoto, Naoki Asao, Hisamitsu Tomeba
  • Patent number: 7233019
    Abstract: This invention relates to electroluminescent silylated pyrene compounds. It also relates to electronic devices in which the active layer includes an electroluminescent silylated pyrene compound.
    Type: Grant
    Filed: April 26, 2004
    Date of Patent: June 19, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Alex Sergey Ionkin, Ying Wang
  • Patent number: 7202374
    Abstract: A metal complex contains at least one ligand, each having the form of a molecule of a fullerene derivative or an anion of the fullerene derivative, where the fullerene derivative, with a solubility in n-hexane of not lower that 0.1 mg/ml at 250° C., includes a fullerene skeleton and three or more organic groups attached to the fullerene skeleton, where each of the organic groups is represented by the general formula (III): —CH2—X(R2)(R3)(R4) ??(III) where X represents an element belonging to the group 14 in the periodic table; and R2, R3 and R4 may be the same or different and each represents a hydrogen atom, hydrocarbon group, alkoxy group or amino group.
    Type: Grant
    Filed: June 10, 2005
    Date of Patent: April 10, 2007
    Assignees: Mitsubishi Chemical Corporation
    Inventors: Eiichi Nakamura, Yutaka Matsuo
  • Patent number: 7199249
    Abstract: In accordance with the present invention, there are provided novel coupling agents which are compatible with a wide variety of adhesive formulations and which provide substantial adhesion enhancement relative to base formulations to which they are added. Invention compounds comprise at least one free-radically polymerizable group (other than acrylate) and at least one reactive moiety which forms covalent bond(s) with substrates having free hydroxyl groups on the surface thereof. Thus, invention compounds are covalently linked to adhesive formulations upon free radical cure, while at the same time providing “residual” functionality which is capable of undergoing reaction with any substrate having reactive (e.g., hydroxyl) groups in the surface thereof.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: April 3, 2007
    Assignee: Henkel Corporation
    Inventors: Puwei Liu, Stephen M. Dershem, Benjamin Neff, Maria Villegas
  • Patent number: 7192684
    Abstract: Polymerizable silicon-containing compounds of formula (1) wherein R1 is hydrogen, halogen or monovalent organic group are polymerized into polymers.
    Type: Grant
    Filed: September 29, 2003
    Date of Patent: March 20, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeshi Kinsho, Takeru Watanabe, Koji Hasegawa
  • Patent number: 7169949
    Abstract: Including a triazine UV light absorber having a silane group in a coating improves scratch and mar resistance after weathering.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: January 30, 2007
    Assignee: BASF Corporation
    Inventors: John E. Boisseau, Swaminathan Ramesh
  • Patent number: 7148370
    Abstract: The present invention provides a novel method for the preparation of diorganosilanes by disproportionation of a hydridosiloxanes comprising at least one terminal SiH group and at least one siloxane bond in the presence of Lewis acid catalysts. The reaction is both selective and occurs under mild conditions. The triaryl borane, tris(petafluorophenyl)borane, is especially suited for use as a catalyst in the reaction. Organic catalysts such as tris(pentafluorophenyl)borane are typically preferred owing to their greater solubility and stability in the reaction mixture, relative to inorganic Lewis acid catalysts. The product, diorganosilane may be isolated from the product mixture by conventional techniques such as distillation.
    Type: Grant
    Filed: July 20, 2005
    Date of Patent: December 12, 2006
    Assignee: General Electric Company
    Inventors: Slawomir Rubinsztajn, James Anthony Cella, Julian Chojnowski, Witold Fortuniak, Jan Kurjata