Collimator for a physical vapor deposition chamber

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top isometric view of collimator for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a bottom isometric view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a front elevation view thereof.

FIG. 6 is a back elevation view thereof.

FIG. 7 is a left elevation view thereof.

FIG. 8 is a right elevation view thereof; and,

FIG. 9 is a cross-sectional view taken along line 9-9 in FIG. 3.

The dash-dash broken lines in the drawings illustrate portions of the article that form no part of the claimed design. The dot-dash broken lines are for the purpose of illustrating the indications of the cross-section and form no part of the claimed design.

Claims

The ornamental design for a collimator for a physical vapor deposition chamber, as shown and described.

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Patent History
Patent number: D1038901
Type: Grant
Filed: Jan 12, 2022
Date of Patent: Aug 13, 2024
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Fuhong Zhang (San Jose, CA), Martin Lee Riker (Round Rock, TX), Suhas Bangalore Umesh (Sunnyvale, CA), Madan Kumar Shimoga Mylarappa (Bengaluru)
Primary Examiner: Kevin K Rudzinski
Assistant Examiner: Justin M. Donaldson
Application Number: 29/822,866