Collimator for use in a physical vapor deposition (PVD) chamber

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top isometric view of collimator for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a bottom isometric view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a front elevation view thereof.

FIG. 6 is a back elevation view thereof.

FIG. 7 is a left elevation view thereof.

FIG. 8 is a right elevation view thereof.

FIG. 9 is a cross sectional view taken along line 9-9 in FIG. 3.

FIG. 10 is a top isometric view of collimator for a physical vapor deposition chamber, according to another embodiment of the novel design.

FIG. 11 is a bottom isometric view thereof.

FIG. 12 is a top plan view thereof.

FIG. 13 is a bottom plan view thereof.

FIG. 14 is a front elevation view thereof.

FIG. 15 is a back elevation view thereof.

FIG. 16 is a left elevation view thereof.

FIG. 17 is a right elevation view thereof; and,

FIG. 18 is a cross sectional view taken along line 18-18 in FIG. 12.

The dashed lines in FIGS. 10-18 represent unclaimed environment and form no part of the claimed design.

Claims

We claim the ornamental design for a collimator for use in a physical vapor deposition (PVD) chamber, as shown and described.

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Patent History
Patent number: D997111
Type: Grant
Filed: Apr 4, 2022
Date of Patent: Aug 29, 2023
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Martin Lee Riker (Milpitas, CA), Fuhong Zhang (San Jose, CA), Lanlan Zhong (Sunnyvale, CA), Kishor Kumar Kalathiparambil (Santa Clara, CA)
Primary Examiner: George D. Kirschbaum
Assistant Examiner: Antoinette Martine Suiter
Application Number: 29/833,398